JPH0829595B2 - Thermal head - Google Patents

Thermal head

Info

Publication number
JPH0829595B2
JPH0829595B2 JP31615486A JP31615486A JPH0829595B2 JP H0829595 B2 JPH0829595 B2 JP H0829595B2 JP 31615486 A JP31615486 A JP 31615486A JP 31615486 A JP31615486 A JP 31615486A JP H0829595 B2 JPH0829595 B2 JP H0829595B2
Authority
JP
Japan
Prior art keywords
substrate
thermal head
heating
recording
drive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP31615486A
Other languages
Japanese (ja)
Other versions
JPS63165154A (en
Inventor
敏光 高野
正典 八木野
美知 伊藤
理 石川
定利 菊地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP31615486A priority Critical patent/JPH0829595B2/en
Priority to GB8721483A priority patent/GB2194757B/en
Priority to DE19873730619 priority patent/DE3730619A1/en
Priority to US07/095,269 priority patent/US4841120A/en
Priority to KR1019870010124A priority patent/KR960012768B1/en
Publication of JPS63165154A publication Critical patent/JPS63165154A/en
Publication of JPH0829595B2 publication Critical patent/JPH0829595B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads
    • B41J2/33555Structure of thermal heads characterised by type
    • B41J2/3357Surface type resistors

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ファクシミリや各種プリンタ等に搭載され
るサーマルヘッドに関する。
The present invention relates to a thermal head mounted in a facsimile, various printers and the like.

〔発明の概要〕[Outline of Invention]

本発明は、基板上に複数の発熱抵抗体及び駆動回路部
が形成され、この発熱抵抗体を選択的に発熱させて感熱
記録を行うサーマルヘッドにおいて、基板は透明若しく
は半透明の耐摩耗性材により形成され、基板の発熱抵抗
体側に支持放熱板が接合されると共に基板の裏面側の少
なくとも一部を研削し、この研削面で感熱記録を行う構
成とすることにより、基板と支持放熱板の接合における
発熱抵抗体パターンの位置規制、基板の記録面の厚み設
定が正確にできて高信頼性のサーマルヘッドを得られる
ものである。
The present invention is a thermal head in which a plurality of heating resistors and a drive circuit unit are formed on a substrate, and the heating resistors are selectively heated to perform heat-sensitive recording. In the thermal head, the substrate is a transparent or semitransparent wear-resistant material. Is formed by bonding the support heat dissipation plate to the heating resistor side of the substrate and grinding at least a part of the back surface side of the substrate to perform heat-sensitive recording on this ground surface. It is possible to obtain a highly reliable thermal head by accurately controlling the position of the heating resistor pattern in bonding and setting the thickness of the recording surface of the substrate.

〔従来の技術〕[Conventional technology]

従来、ライン型あるいはシリアル型等のサーマルヘッ
ドでは、発熱抵抗体の駆動方式としてダイレクトドライ
ブ方式やダイオードマトリックス方式の何れかが主に採
用されている。そして、このような方式のサーマルヘッ
ドにおいては、駆動回路部等を構成するIC,ダイオード
等の半導体素子ペレットをサーマルヘッド基板に直接実
装して小型化を図っている。
Conventionally, in a line type or serial type thermal head, either a direct drive system or a diode matrix system has been mainly adopted as a drive system of a heating resistor. In such a type of thermal head, semiconductor device pellets such as ICs and diodes that constitute the drive circuit section and the like are directly mounted on the thermal head substrate to reduce the size.

しかしながら、この種のサーマルヘッドにおいては、
小型化,信頼性,製品価格等の点で制約が多く、その改
善が望まれている。
However, in this type of thermal head,
There are many restrictions in terms of downsizing, reliability, product price, etc., and improvements are desired.

すなわち、従来のサーマルヘッドは、第8図に示すよ
うに、基板(101)上に実装された駆動用半導体素子(1
02)を保護するために、この素子(102)を封止剤(10
3)でモールドし更に封止部カバー(104)にて被覆した
構造になっている。
That is, as shown in FIG. 8, a conventional thermal head has a driving semiconductor element (1) mounted on a substrate (101).
02) to protect the device (102) with a sealant (10).
The structure is such that it is molded in 3) and then covered with the sealing part cover (104).

そして、この種のサーマルヘッドでは良好な印字を得
るため、プラテン(105)の当たり特性を確保すること
が必要不可欠となっている。すなわち、このサーマルヘ
ッドにおいては、封止部カバー(104)がプラテン(10
5)からのペーパーパスPより逃れる必要があった。言
い換えれば、発熱抵抗体から駆動用半導体素子(102)
までの距離W1は封止部カバー(104)の厚みtとプラテ
ン(105)の外形寸法によって制約されるので、ヘッド
の小型化には限界があった。また、この制約は基板(10
1)の小型化の妨げとなり、従来より基板材として多用
されているグレーズセラミック(Al2O3)が高価である
ことより、材料コストの点からもこの改善が望まれてい
る。
In order to obtain good printing with this type of thermal head, it is essential to secure the contact characteristics of the platen (105). That is, in this thermal head, the sealing portion cover (104) has the platen (10
It was necessary to escape from the paper path P from 5). In other words, from the heating resistor to the driving semiconductor element (102)
Since the distance W 1 to is limited by the thickness t of the sealing portion cover (104) and the outer dimensions of the platen (105), there is a limit to downsizing the head. In addition, this constraint is
This is an obstacle to the miniaturization of 1), and since glaze ceramic (Al 2 O 3 ) that has been widely used as a substrate material is expensive, it is desired to improve the material cost.

一方、従来のサーマルヘッドでは、発熱抵抗体に耐酸
化層を介して耐摩耗層が形成され、プラテン(105)か
ら発熱抵抗体を保護する構造となっている。
On the other hand, in the conventional thermal head, a wear resistant layer is formed on the heating resistor via the oxidation resistant layer to protect the heating resistor from the platen (105).

しかしながら、これら耐酸化層や耐摩耗層はスペッタ
リング等の薄膜形成技術で積層しているので、耐摩耗層
を厚膜構造とし摩耗寿命を確保するには限界があった。
例えば、耐摩耗層を10μm以上膜付けしようとすると、
この膜付けに長時間を要するとともに、成膜時の膜応力
によりクラック等が発生し、ヘッドの信頼性が低下して
しまう。
However, since the oxidation resistant layer and the wear resistant layer are laminated by a thin film forming technique such as spattering, there is a limit in ensuring the wear life by making the wear resistant layer a thick film structure.
For example, if you try to apply a wear resistant layer of 10 μm or more,
This film deposition requires a long time, and the film stress at the time of film formation causes cracks and the like, which lowers the reliability of the head.

さらに、上記当たり特性を確保するには、発熱抵抗体
に給電する電極の膜厚も0.5〜1.5μm程度に制限される
ので、ワイヤボンディング作業が煩雑となるとともに、
この接続の信頼性の点で問題が残されていた。
Furthermore, in order to secure the above-mentioned hitting characteristic, the film thickness of the electrode for supplying power to the heating resistor is limited to about 0.5 to 1.5 μm, which makes the wire bonding work complicated and
There was a problem with the reliability of this connection.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

ところで近年、感熱記録の分野では、サーマルヘッド
の小型化、高信頼性化の傾向にあり、上述の如く従来の
サーマルヘッドでは、これら要望を十分に満足すること
ができず、この改善が望まれている。
By the way, in recent years, in the field of thermal recording, there is a trend toward miniaturization and high reliability of thermal heads, and as described above, conventional thermal heads cannot sufficiently satisfy these demands, and improvement thereof is desired. ing.

そこで一方の面に発熱抵抗体及び半導体素子を有する
駆動回路を形成した基板の他方の面、即ち裏面側をプラ
テンが当接される記録面としたサーマルヘッドが提案さ
れている。
Therefore, a thermal head has been proposed in which the other surface of the substrate, on which the drive circuit having the heating resistor and the semiconductor element is formed on one surface, that is, the back surface side, is used as the recording surface with which the platen is brought into contact.

しかし、このサーマルヘッドでは発熱抵抗体は基板の
記録面に対して内面側に位置するたため外側から見えず
組立てにおいて発熱抵抗体パターンの位置に対する基板
の切削精度が悪い場合は発熱抵抗体パターンを支持板に
対し所定位置に正確に対応させることが困難で、また発
熱抵抗体に対する記録面の厚みを所定の厚さに調整する
ことも困難であり、そのため基板の切削位置及び板厚の
ばらつきを抑える等、基板を高精度で形成しなければな
らず製作上に難点がある。
However, in this thermal head, the heating resistor is located inside the recording surface of the substrate and cannot be seen from the outside. It is difficult to accurately correspond to a predetermined position on the plate, and it is also difficult to adjust the thickness of the recording surface with respect to the heating resistor to a predetermined thickness. Therefore, variations in the cutting position of the substrate and the plate thickness are suppressed. Therefore, the substrate must be formed with high precision, which is a problem in manufacturing.

かかる状況より、本発明は提案されたものであり、基
板に形成される発熱抵抗体の支持板に対する位置規制が
正確になされ、また記録面も所定の厚みに形成されてプ
ラテンの当りが良好で優れた印字品質が得られるサーマ
ルヘッドを提供することを目的とする。
Under such circumstances, the present invention has been proposed, and the position of the heating resistor formed on the substrate is accurately regulated with respect to the support plate, and the recording surface is also formed to have a predetermined thickness, so that the platen hits well. It is an object of the present invention to provide a thermal head that can obtain excellent print quality.

〔問題点を解決するための手段〕[Means for solving problems]

前述の目的を達成するために、本発明のサーマルヘッ
ドは、基板上に複数の発熱抵抗体及び駆動回路が形成さ
れ、この発熱抵抗体を選択的に発熱させて感熱記録を行
うサーマルヘッドにおいて、基板を透明若しくは半透明
の耐摩耗性材により形成し、この基板の発熱抵抗体側に
支持放熱板が接合されると共に、この基板の裏面側の発
熱抵抗体位置に対応する部面を研削し、この研削面で感
熱記録を行うことを特徴とするものである。
In order to achieve the above-mentioned object, the thermal head of the present invention is a thermal head in which a plurality of heating resistors and a drive circuit are formed on a substrate, and the heating resistors are selectively heated to perform thermal recording. The substrate is formed of a transparent or semi-transparent wear-resistant material, the support heat radiating plate is joined to the heating resistor side of this substrate, and the part surface corresponding to the heating resistor position on the back side of this substrate is ground. The heat-sensitive recording is performed on this ground surface.

〔作用〕[Action]

本発明のサーマルヘッドは、一方の面に発熱抵抗体及
び駆動回路を形成した基板の他方の面、即ち、裏面側で
感熱記録を行う構造としており、発熱抵抗体及び駆動回
路部はプラテンの摺接面(感熱記録面)に対して内面側
に位置することになるが、基板は透明若しくは半透明の
耐摩耗性材により形成されていることにより、発熱抵抗
体等は外面側から認識することができるので支持放熱板
に対する発熱抵抗体等の位置規制が正確にでき、また発
熱抵抗体に対する記録面の厚みを、研削加工を調整する
ことにより正確に設定できることから優れた印字品質が
得られヘッドの信頼性の向上が図れる。
The thermal head of the present invention has a structure in which thermal recording is performed on the other surface of the substrate on which the heating resistor and the driving circuit are formed on one surface, that is, on the back surface side. Although it is located on the inner side with respect to the contact surface (heat-sensitive recording surface), since the substrate is made of a transparent or semi-transparent wear-resistant material, the heating resistors, etc. must be recognized from the outer side. Since it is possible to accurately control the position of the heat generating resistor with respect to the support heat radiating plate, and the thickness of the recording surface with respect to the heat generating resistor can be accurately set by adjusting the grinding process, excellent print quality can be obtained. The reliability of can be improved.

〔実施例〕〔Example〕

以下、本発明を適用した具体的な実施例について説明
する。
Specific examples to which the present invention is applied will be described below.

本例のサーマルヘッドは第1図及び第2図に示すよう
に、透明若しくは半透明の耐摩耗性基板(1)の一平面
(1a)上に前半部と後半部に分断される発熱抵抗パター
ン(2a),(2b)及び駆動回路部(本実施例ではIC等の
半導体素子)(3)が形成され、これら発熱抵抗パター
ン(2a),(2b)及び半導体素子(以下ドライブICと云
う)(3)側に耐酸化層(8)及び接着層(9)を介し
て支持放熱板(10)が接合一体化された構造を有してい
る。耐摩耗性基板(1)としては石英,アルカリ成分を
有しないガラス等を用い、本例においてはホウケイ酸ガ
ラスを用いる。
As shown in FIGS. 1 and 2, the thermal head of this example has a heating resistance pattern divided into a first half and a second half on one plane (1a) of a transparent or semitransparent abrasion resistant substrate (1). (2a), (2b) and a drive circuit section (semiconductor element such as IC in this embodiment) (3) are formed, and these heating resistance patterns (2a), (2b) and semiconductor element (hereinafter referred to as drive IC) It has a structure in which the support heat radiating plate (10) is joined and integrated on the (3) side through the oxidation resistant layer (8) and the adhesive layer (9). Quartz, glass having no alkali component, or the like is used as the abrasion resistant substrate (1), and borosilicate glass is used in this example.

そして、基板(1)の他面(裏面側)(1b)が感熱記
録面となっており、この裏面側(1b)は一方の発熱抵抗
パターン(2a)の発熱部(2A)に対抗する部面が肉厚、
本例では傾斜面(1b1)に形成されてこの傾斜面(1b1
は感熱記録紙pを摺接させてプラテンPにより押圧保持
することにより感熱記録紙pに対し感熱記録を行うよう
に成されている。
The other surface (back surface side) (1b) of the substrate (1) is a thermal recording surface, and this back surface side (1b) is a portion that opposes the heating portion (2A) of one heating resistance pattern (2a). The surface is thick,
In this example, the inclined surface (1b 1 ) is formed on the inclined surface (1b 1 ).
Is adapted to perform heat-sensitive recording on the heat-sensitive recording paper p by slidingly contacting the heat-sensitive recording paper p and pressing and holding it by the platen P.

発熱抵抗パターン(2a),(2b)とドライブIC(3)
とは電極パターン(4a),(4b),(4c)を介してAu等
の導線(5a),(5b)をワイヤボンディング等の手段に
て接続し導通されている。そして一方の発熱抵抗パター
ン(2a)上に分断して積層形成された電極パターン(4
a)と(4b)の間が前述した発熱部(2A)となって発熱
して印字に寄与する構成となっており、電極パターン
(4b)の後半部で他方の発熱抵抗パターン(2b)の前半
部上に積層形成された共通電極パターン(4B)上に耐酸
化層(8)を介してドライブIC(3)が実装されてい
る。
Heat resistance pattern (2a), (2b) and drive IC (3)
Is connected to the conducting wires (5a) and (5b) of Au or the like by means of wire bonding or the like through the electrode patterns (4a), (4b) and (4c) for electrical continuity. Then, the electrode pattern (4
The area between (a) and (4b) serves as the above-mentioned heat generating section (2A), which generates heat and contributes to printing, and the latter half of the electrode pattern (4b) has the other heat generating resistance pattern (2b). The drive IC (3) is mounted on the common electrode pattern (4B) formed on the first half through the oxidation resistant layer (8).

また、他方の発熱抵抗パターン(2b)の後半部上に積
層形成された外部端子としての電極パターン(4c)には
その後半部に外部駆動回路との導通を図るフレキシブル
プリントサーキットプレート(7)が異方導電膜(11)
を介して接続されている。
The electrode pattern (4c), which is formed as an external terminal on the latter half of the other heating resistance pattern (2b), has a flexible printed circuit plate (7) for conducting the external drive circuit in the latter half of the electrode pattern (4c). Anisotropic conductive film (11)
Connected through.

従って、本実施例のサーマルヘッドにおいては、サー
キットプレート(7)を介して供給される駆動電流によ
りドライブ1C(8)が駆動し、一方の発熱抵抗パターン
(2a)の発熱部(2A)を選択的に発熱させ、基板(1)
の裏面側、即ち傾斜面(1b1)の端部近傍において感熱
記録を行う構成となっている。なお、この感熱記録に直
接関与しない他方の発熱抵抗パターン(2b)は形成しな
くてもよいが、本実施例においては基板(1)の表面側
(1a)を同一平面とするために、また耐酸化層(8)の
基板(1)に対する密着性を良好にするために形成して
ある。
Therefore, in the thermal head of the present embodiment, the drive 1C (8) is driven by the drive current supplied through the circuit plate (7), and the heating portion (2A) of one heating resistance pattern (2a) is selected. Substrate (1)
The heat-sensitive recording is performed on the back surface side, that is, near the end of the inclined surface (1b 1 ). The other heating resistance pattern (2b) not directly involved in the thermal recording does not have to be formed, but in the present embodiment, in order to make the front surface side (1a) of the substrate (1) flush, It is formed in order to improve the adhesion of the oxidation resistant layer (8) to the substrate (1).

このように本実施例のサーマルヘッドにおいては、基
板(1)の裏面側(1b)を記録面としているので、プラ
テンPの当たり特性は良好のものとなる。また、発熱抵
抗パターン(2a),(2b)や駆動回路(ドライブIC
(3))の形成面は表面側(1a)で裏面側(1b)の記録
面とは異なることによりプラテンPからのペーパーパス
を考慮することなく、ドライブIC(3)等の配置スペー
スを自由に設定できる。従って基板(1)の寸法制約が
大幅に緩和されるので、基板(1)の小型化を図ること
ができる。
As described above, in the thermal head of this embodiment, since the back surface side (1b) of the substrate (1) is used as the recording surface, the contact characteristics of the platen P are good. In addition, the heating resistance patterns (2a), (2b) and the drive circuit (drive IC
The formation surface of (3)) is different on the front side (1a) and the recording surface on the back side (1b), so the drive IC (3) etc. can be arranged freely without considering the paper path from the platen P. Can be set to. Therefore, the dimensional restrictions of the substrate (1) are greatly relaxed, and the substrate (1) can be downsized.

また、基板(1)の厚みは後述する裏面側(1b)の記
録面の研削量を調節することにより自由に設定できて厚
みを10〜20μm程度まで厚くすることができ、耐摩耗性
が向上すると共にその表面側(1a)に形成される駆動回
路のドライブIC(3)を保護できてヘッドの長寿命化を
図ることができる。
In addition, the thickness of the substrate (1) can be freely set by adjusting the grinding amount of the recording surface on the back side (1b), which will be described later, and the thickness can be increased to about 10 to 20 μm, which improves wear resistance. In addition, the drive IC (3) of the drive circuit formed on the surface side (1a) of the head can be protected and the life of the head can be extended.

この基板(1)の材料としては従来のようにグレース
ドセラミック等の高価な材料に比しガラスや石英等を使
用するので、前述した小型化と相って材料コストの大幅
な低減化が可能となる。さらに、基板(1)にはSiウエ
ハ等の薄板を使用することも出来る。又、発熱抵抗パタ
ーン(2a)は、基板(1)の表面側に形成されていて、
感熱記録紙との接触面とは逆面であるため、従来のよう
に発熱抵抗パターン上に厚い耐摩耗層を形成する必要が
なくなった。従って、生産作業能率の低い、スパッタリ
ングによる耐摩耗層形成の工程が不要となり生産性の向
上がなされた。発熱抵抗パターン(2a)及び電極パター
ン(4a)(4b)等を、厚膜にて形成する場合には、スパ
ッタリング装置等の高価な装置がなくても製造可能とな
る。
As the material of this substrate (1), glass or quartz is used as compared with the conventional expensive materials such as glazed ceramics, so the material cost can be greatly reduced in combination with the above-mentioned miniaturization. Becomes Furthermore, a thin plate such as a Si wafer can be used as the substrate (1). The heating resistance pattern (2a) is formed on the front surface side of the substrate (1),
Since it is the surface opposite to the contact surface with the thermal recording paper, it is no longer necessary to form a thick wear-resistant layer on the heating resistance pattern as in the conventional case. Therefore, the process of forming a wear-resistant layer by sputtering, which has a low production work efficiency, is unnecessary, and the productivity is improved. When the heating resistance pattern (2a), the electrode patterns (4a), (4b), etc. are formed by a thick film, it can be manufactured without using an expensive device such as a sputtering device.

そして、ドライブIC(3)及びこれと電極パターン
(4b),(4c)とのワイヤボンディング部はシリコーン
樹脂等の封止材(12)にてモールドされている。このド
ライブIC(3)や電極パターン(4a),(4b),(4c)
上に耐酸化層(8),接着層(9)を介して固着一体化
される支持放熱板(10)にはドライブIC(3)と対向す
る部分に略凹字状の切欠き部(10a)が形成されて前述
した封止材(12)によるモールド部が収納されてドライ
ブIC(3)等は支持放熱板(10)にて保護される。即ち
支持放熱板(10)は放熱作用とドライブIC(3)を保護
する収納パッケージとしての作用を併せ持っている。
The drive IC (3) and the wire bonding portion between the drive IC (3) and the electrode patterns (4b) and (4c) are molded with a sealing material (12) such as silicone resin. This drive IC (3) and electrode patterns (4a), (4b), (4c)
The support heat radiating plate (10) fixed and integrated with the oxidation resistant layer (8) and the adhesive layer (9) on top has a substantially concave notch (10a) at a portion facing the drive IC (3). ) Is formed and the mold portion formed by the sealing material (12) described above is housed, and the drive IC (3) and the like are protected by the support heat dissipation plate (10). That is, the support heat radiating plate (10) has both a heat radiating function and a function as a storage package for protecting the drive IC (3).

この基板(1)と支持放熱板(10)の接合固着におい
て、前述の如く、基板(1)はガラス等の透明若しくは
半透明の耐摩耗性材により形成するので、発熱抵抗パタ
ーン(2a),(2b)は記録面となる裏面(1b)から容易
に透視認識できて、第3図Aに示すように基板(1)の
切断において切断ずれaが生じていても、同図Bに示す
ように発熱抵抗パターン(2a),(2b)の支持放熱板
(10)に対する位置規制が正確にでき、またこの基板
(1)と支持放熱板(10)とを接着する接着層(9)と
しては紫外線硬化形接着剤を使用できて基板(1)等に
加熱による悪影響を与えることなく接着できることにな
り基板(1)と支持放熱板(10)との接合が一層確実に
行える。
When the substrate (1) and the supporting heat radiation plate (10) are bonded and fixed to each other, as described above, the substrate (1) is made of a transparent or semi-transparent wear resistant material such as glass, so that the heating resistance pattern (2a), (2b) can be easily seen and recognized from the back surface (1b) which is the recording surface, and even if a cutting deviation a occurs in the cutting of the substrate (1) as shown in FIG. 3A, as shown in FIG. 3B. The position of the heat generation resistance patterns (2a) and (2b) with respect to the support heat dissipation plate (10) can be accurately adjusted, and the adhesive layer (9) for adhering the substrate (1) and the support heat dissipation plate (10) is Since an ultraviolet-curable adhesive can be used and the substrate (1) and the like can be bonded without being adversely affected by heating, the substrate (1) and the supporting heat dissipation plate (10) can be bonded more reliably.

ここで支持放熱板(10)の材料としては、Al2O3等の
セラミックや、Fe−Ni系合金、Fe,Al等の熱伝導性に優
れた金属材料等が使用される。この支持放熱板(10)の
接着には接着作用の他、従来のグレーズ層としての作用
も有し、適性な熱伝導性を持たせるために接着面側には
低融点ガラス層(13)が形成されている。
Here, as the material of the support heat dissipation plate (10), ceramics such as Al 2 O 3 or the like, Fe—Ni alloys, metallic materials such as Fe and Al having excellent thermal conductivity are used. The support heat dissipation plate (10) has an adhesion function as well as a conventional glaze layer function, and a low melting point glass layer (13) is provided on the bonding surface side in order to provide appropriate heat conductivity. Has been formed.

このようにして基板(1)と支持放熱板(10)に固着
した後、基板(1)の裏面(1b)側を、発熱部(2A)上
の厚さが所定の厚さになるように傾斜状に研削して記録
面(1b1)を形成する。
After fixing to the substrate (1) and the supporting heat dissipation plate (10) in this way, the back surface (1b) side of the substrate (1) is adjusted so that the thickness on the heat generating portion (2A) becomes a predetermined thickness. The recording surface (1b 1 ) is formed by grinding in an inclined shape.

この基板(1)の研削においては第4図に示すように
地学的に顕微鏡モニター(20)を用いて裏面(1b)側か
ら発熱抵抗パターン(2a),(2b)を透視してこのパタ
ーンが鮮明な映像になる点に調整し、これを基準にして
加工台(21)の加工基準面Sを調整し、この状態で記録
面(1b1)を縦軸又は横軸の平面研削機構により所定厚
さに研削する。この記録面(1b1)は前述した如く所定
の角度の傾斜面で、この傾斜角は5゜〜45゜の範囲が好
ましく、5゜以下は材料強度が弱く、45゜以上は厚すぎ
て良質の印字が得られない。
In the grinding of this substrate (1), as shown in FIG. 4, the pattern of the heating resistances (2a) and (2b) is viewed through from the backside (1b) side by using a microscope monitor (20). Adjust to a point that produces a clear image, and adjust the machining reference surface S of the machining table (21) with this as the reference, and in this state, the recording surface (1b 1 ) is specified by the vertical or horizontal axis surface grinding mechanism. Grind to thickness. The recording surface (1b 1 ) is an inclined surface having a predetermined angle as described above, and the inclination angle is preferably in the range of 5 ° to 45 °, the material strength is weak at 5 ° or less, and too thick if 45 ° or more. Cannot be printed.

また前述した顕微鏡モニター(20)は要求される精度
に応じて総合倍率を決定する。実用例は400倍を使用し
ている。なお、基板としてのガラスは一般に5〜100μ
m位で5μm以下ではガラス強度が保てず、100μm以
上では印字に滲みが生じ易く不鮮明となる。また表面粗
度は0.1〜3μmRa位で#400砥石で が得られ、実用上十分である。
The microscope monitor (20) described above determines the total magnification according to the required accuracy. The practical example uses 400 times. The glass used as the substrate is generally 5 to 100 μm.
If the m-position is 5 μm or less, the glass strength cannot be maintained. In addition, the surface roughness is about 0.1 to 3 μmRa with a # 400 grindstone. Is obtained, which is practically sufficient.

このように本実施例によれば、基板(1)の小型化、
すなわちプラテンの当接面の狭小化が可能となるので、
いわゆる垂直型のサーマルヘッドも可能となる。したが
って、1プラテン・マルチヘッドのカラープリンタ等が
小型,安価に製造可能となる。
As described above, according to this embodiment, the substrate (1) is downsized,
That is, since the contact surface of the platen can be narrowed,
A so-called vertical type thermal head is also possible. Therefore, a one-platen multi-head color printer or the like can be manufactured at a small size and at low cost.

以上、本発明の一実施例について説明したが、本発明
はこの実施例に限定されることなく、本発明の趣旨を逸
脱しない範囲で種々の構造が取り得ることはいうまでも
ない。
Although one embodiment of the present invention has been described above, the present invention is not limited to this embodiment, and it goes without saying that various structures can be adopted without departing from the spirit of the present invention.

特に、駆動回路部を薄膜化(例えば薄膜トランジス
タ)し、他の各構成部分をも全て基板上に直接薄膜形成
すれば更に小型のサーマルヘッドが完成する。
In particular, if the drive circuit unit is made thin (for example, a thin film transistor) and all the other components are directly formed on the substrate, a smaller thermal head is completed.

〔発明の効果〕〔The invention's effect〕

以上の説明からも明らかなように、本発明のサーマル
ヘッドは、基板の一平面上に発熱抵抗パターンや駆動回
路部を設け、この一平面の裏面側で感熱記録を行うの
で、プラテンからのペーパーパスを考慮することなく、
また発熱抵抗パターンや駆動回路部の配置スペースを自
由に設定できて、基板の寸法制約が緩和される。したが
って、ヘッドの小型化が容易に実現できる。また、プラ
テンの摺接面となる裏面が傾斜面等の平坦な構造である
ことから、感熱記録紙やプラテンの当たり特性が大幅に
向上し優れた印字品質が得られる。
As is clear from the above description, the thermal head of the present invention is provided with the heating resistance pattern and the drive circuit portion on one plane of the substrate, and the thermal recording is performed on the back side of this one plane. Without considering the path
In addition, the arrangement space of the heating resistance pattern and the drive circuit section can be freely set, and the dimensional constraints of the substrate are relaxed. Therefore, miniaturization of the head can be easily realized. Further, since the back surface, which is the sliding contact surface of the platen, has a flat structure such as an inclined surface, the contact property of the thermal recording paper or the platen is significantly improved, and excellent print quality can be obtained.

また、基板を透明若しくは半透明の耐摩耗性材により
形成したので発熱抵抗パターンを裏面、即ち記録面側か
ら直接的に認識できるので製作加工時の位置合せ、記録
面の厚さ調整が容易となり、加工の自動化が可能となっ
て量産化が図れる。
In addition, since the substrate is made of a transparent or semi-transparent wear resistant material, the heat generation resistance pattern can be directly recognized from the back surface, that is, the recording surface side, which facilitates alignment during manufacturing and adjustment of the recording surface thickness. , Automation of processing is possible and mass production can be achieved.

以上から本発明によれば各種感熱プリンタの小型,高
信頼性のサーマルヘッドを安価に提供できる。
As described above, according to the present invention, it is possible to inexpensively provide a compact and highly reliable thermal head for various thermal printers.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明を適用したサーマルヘッドの一例を示す
概略的な断面図、第2図は同サーマルヘッドの基板部を
内面側から見た平面図、第3図は基板の接合状態の説明
図、第4図は基板の研削加工の説明図、第5図は従来の
サーマルヘッドを模式的に示す側面図である。 図中(1)は基板、(1b1)は記録面としての傾斜面、
(2a),(2b)は発熱抵抗パターン、(2A)は発熱部、
(3)は半導体素子としてのドライブIC、(4a),(4
b),(4c)は電極パターン、(5a),(5b)は導線、
(8)は耐酸化層、(10)は支持放熱板、(20)は顕微
鏡モニターである。
FIG. 1 is a schematic cross-sectional view showing an example of a thermal head to which the present invention is applied, FIG. 2 is a plan view of the substrate portion of the thermal head as seen from the inner surface side, and FIG. 3 is an explanation of the bonding state of the substrates. 4 and 5 are explanatory views of the grinding process of the substrate, and FIG. 5 is a side view schematically showing a conventional thermal head. In the figure, (1) is the substrate, (1b 1 ) is the inclined surface as the recording surface,
(2a) and (2b) are heating resistance patterns, (2A) is a heating part,
(3) is a drive IC as a semiconductor device, (4a), (4
b) and (4c) are electrode patterns, (5a) and (5b) are conductors,
(8) is an oxidation resistant layer, (10) is a support heat sink, and (20) is a microscope monitor.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石川 理 東京都品川区北品川6丁目5番6号 ソニ ー・マグネ・プロダクツ株式会社内 (72)発明者 菊地 定利 東京都品川区北品川6丁目5番6号 ソニ ー・マグネ・プロダクツ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Osamu Ishikawa 6-5-6 Kita-Shinagawa, Shinagawa-ku, Tokyo Inside Sony Magne Products Co., Ltd. (72) Satoru Kikuchi 6 Kita-Shinagawa, Shinagawa-ku, Tokyo 5th-6th, Sony Magne Products Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】基板上に複数の発熱抵抗体及び駆動回路部
が形成され、該発熱抵抗体を選択的に発熱させて感熱記
録を行うサーマルヘッドにおいて、 前記基板は透明若しくは半透明の耐摩耗性材により形成
され、 前記基板の発熱抵抗体側に支持放熱板が接合されると共
に、 前記基板の裏面側の前記発熱抵抗体位置に対応する部面
を研削して成り、 該研削面で感熱記録を行うことを特徴とするサーマルヘ
ッド。
1. A thermal head in which a plurality of heating resistors and a drive circuit section are formed on a substrate and the heating resistors are selectively heated to perform thermal recording, wherein the substrate is transparent or semi-transparent wear-resistant. And a support heat radiating plate is joined to the heating resistor side of the substrate, and a part surface corresponding to the position of the heating resistor on the back side of the substrate is ground. The thermal head is characterized by performing.
JP31615486A 1986-09-12 1986-12-26 Thermal head Expired - Fee Related JPH0829595B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP31615486A JPH0829595B2 (en) 1986-12-26 1986-12-26 Thermal head
GB8721483A GB2194757B (en) 1986-09-12 1987-09-11 Thermal heads
DE19873730619 DE3730619A1 (en) 1986-09-12 1987-09-11 THERMAL PRINT HEAD
US07/095,269 US4841120A (en) 1986-09-12 1987-09-11 Thermal head
KR1019870010124A KR960012768B1 (en) 1986-09-12 1987-09-12 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31615486A JPH0829595B2 (en) 1986-12-26 1986-12-26 Thermal head

Publications (2)

Publication Number Publication Date
JPS63165154A JPS63165154A (en) 1988-07-08
JPH0829595B2 true JPH0829595B2 (en) 1996-03-27

Family

ID=18073878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31615486A Expired - Fee Related JPH0829595B2 (en) 1986-09-12 1986-12-26 Thermal head

Country Status (1)

Country Link
JP (1) JPH0829595B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6407764B1 (en) 1996-12-19 2002-06-18 Tdk Corporation Thermal head and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6407764B1 (en) 1996-12-19 2002-06-18 Tdk Corporation Thermal head and method of manufacturing the same

Also Published As

Publication number Publication date
JPS63165154A (en) 1988-07-08

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