JPH08273392A - Semiconductor memory and its test method - Google Patents

Semiconductor memory and its test method

Info

Publication number
JPH08273392A
JPH08273392A JP7067645A JP6764595A JPH08273392A JP H08273392 A JPH08273392 A JP H08273392A JP 7067645 A JP7067645 A JP 7067645A JP 6764595 A JP6764595 A JP 6764595A JP H08273392 A JPH08273392 A JP H08273392A
Authority
JP
Japan
Prior art keywords
word line
potential
address signal
word lines
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7067645A
Other languages
Japanese (ja)
Inventor
Tomohito Kouno
智仁 河野
Makoto Takizawa
誠 滝沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP7067645A priority Critical patent/JPH08273392A/en
Publication of JPH08273392A publication Critical patent/JPH08273392A/en
Withdrawn legal-status Critical Current

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  • Tests Of Electronic Circuits (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)

Abstract

PURPOSE: To reduce the cost by detecting the short circuit of word line in a short time prior to die sort test thereby shortening the die sort time. CONSTITUTION: A plurality of word lines WL1-WLn are arranged in stripe on a memory cell array 13. Upon receiving a control signal CR from a pad 21, an address signal switching circuit 11 delivers an address signal for selecting every other word line in place of a normal address signal A. Consequently, a decoder 12 is alternately arranged with a word line being applied with a high potential and a word line being applied with a low potential. A detection circuit 14 detects the variation of potential owing to short circuit of at least one word line being applied with a high or low potential. Upon detection of potential variation, two detection pads 24, 25 are short-circuited.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ダイソ−タによる半導
体記憶装置のテスト時間を短縮する技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for reducing the test time of a semiconductor memory device using a die sorter.

【0002】[0002]

【従来の技術】従来、ストライプ状のワ−ド線を有する
半導体記憶装置においては、ワ−ド線の欠陥(短絡な
ど)は、ダイソ−ト時のファンクションチェックにより
発見している。
2. Description of the Related Art Conventionally, in a semiconductor memory device having a stripe-shaped word line, a defect (a short circuit or the like) in the word line has been found by a function check at the time of die-sorting.

【0003】しかし、このファンクションチェックで
は、全てのアドレスを順次選択して、得られた値を期待
値と比較する必要がある。このため、不良のワ−ド線が
選択されるまでは、ワ−ド線の欠陥が発見できず、ダイ
ソ−ト時間が長くなり、コストの増大を招いている。
However, in this function check, it is necessary to sequentially select all the addresses and compare the obtained value with the expected value. Therefore, until the defective word line is selected, the defect of the word line cannot be found, the die-sort time becomes long, and the cost increases.

【0004】[0004]

【発明が解決しようとする課題】このように、従来は、
ダイソ−ト時のファンクションチェックによりワ−ド線
の欠陥を発見していたため、ダイソ−ト時間が長くな
り、コストの増大を招くという欠点がある。
As described above, conventionally,
Since the defect of the word line has been found by the function check at the time of diat, there is a drawback that the die-sort time becomes long and the cost increases.

【0005】本発明は、上記欠点を解決すべくなされた
もので、その目的は、ダイソ−トテストを行う前にワ−
ド線の欠陥を短時間で発見し、良品のみについてダイソ
−トテストを行うことにより、ダイソ−ト時間を短縮し
てコストを削減することである。
The present invention has been made to solve the above-mentioned drawbacks, and an object of the present invention is to perform a work before performing a die-sort test.
This is to detect the defect of the lead wire in a short time and perform the die-sort test only for the good product, thereby shortening the die-sort time and reducing the cost.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、本発明の半導体記憶装置は、ストライプ状に配列さ
れた複数のワ−ド線と、前記複数のワ−ド線を1本おき
に選択し、高電位が印加されるワ−ド線と低電位が印加
されるワ−ド線が交互に配列されるようにする手段と、
前記高電位が印加されるワ−ド線又は低電位が印加され
るワ−ド線に接続され、少なくとも1本のワ−ド線の電
位変化を検出することにより、隣接するワ−ド線の短絡
を検査し得る検出回路とを備えている。
In order to achieve the above object, the semiconductor memory device of the present invention has a plurality of word lines arranged in stripes and the plurality of word lines every other line. A means for selecting a word line to which a high potential is applied and a word line to which a low potential is applied alternately arranged;
It is connected to the word line to which the high potential is applied or the word line to which the low potential is applied, and the potential change of at least one word line is detected to detect the adjacent word line. And a detection circuit capable of inspecting a short circuit.

【0007】前記手段は、制御信号が入力されると、通
常のアドレス信号に変えて前記複数のワ−ド線を1本お
きに選択するアドレス信号を出力するアドレス信号切替
回路と、前記アドレス信号切替回路からのアドレス信号
に基づいてワ−ド線を選択するデコ−ダとから構成され
ている。
When the control signal is input, the means changes the address signal to a normal address signal and outputs an address signal for selecting every other one of the plurality of word lines, and the address signal switching circuit. And a decoder for selecting a word line based on the address signal from the switching circuit.

【0008】前記検出回路は、ゲ−トが前記高電位が印
加されるワ−ド線又は低電位が印加されるワ−ド線に接
続され、ソ−ス又はドレインが2つの検出用端子間に接
続される複数のMOSトランジスタから構成されてい
る。
In the detection circuit, the gate is connected to the word line to which the high potential is applied or the word line to which the low potential is applied, and the source or the drain is between two detection terminals. It is composed of a plurality of MOS transistors connected to.

【0009】本発明の半導体記憶装置のテスト方法は、
ストライプ状に配列された複数のワ−ド線を1本おきに
選択し、高電位が印加されるワ−ド線と低電位が印加さ
れるワ−ド線を交互に配列させ、前記高電位が印加され
るワ−ド線又は低電位が印加されるワ−ド線の少なくと
も1本のワ−ド線の電位変化を検出することにより、隣
接するワ−ド線の短絡を検査するという一連の工程を備
える。
A method of testing a semiconductor memory device according to the present invention is
A plurality of word lines arranged in stripes are selected every other line, and a word line to which a high potential is applied and a word line to which a low potential is applied are arranged alternately to obtain the high potential. A short circuit between adjacent word lines is detected by detecting a potential change in at least one of the word lines to which a voltage is applied or a word line to which a low potential is applied. Equipped with the process of.

【0010】本発明の半導体記憶装置のテスト方法は、
さらに、2つの検出用端子間に外部から電圧を印加し、
前記電位変化に基づいて前記2つの検出用端子間を短絡
させ、前記2つの検出用端子間に流れる電流を検出する
ことにより、隣接するワ−ド線の短絡を検査するという
一連の工程を備える。
The semiconductor memory device testing method of the present invention is
Furthermore, an external voltage is applied between the two detection terminals,
A series of steps for inspecting a short circuit between adjacent word lines by short-circuiting the two detection terminals based on the potential change and detecting a current flowing between the two detection terminals is provided. .

【0011】[0011]

【作用】上記構成によれば、ワ−ド線を1本おきに選択
するアドレス信号をデコ−ダに与え、かつ、高電位が印
加されるワ−ド線(選択されたワ−ド線)又は低電位が
印加されるワ−ド線(非選択のワ−ド線)に検出回路を
接続して少なくとも1本のワ−ド線の電位の変化を検出
することにより、ワ−ド線に欠陥(短絡など)があるか
否かをテストしている。
According to the above construction, a word line (selected word line) to which an address signal for selecting every other word line is applied to the decoder and a high potential is applied. Alternatively, by connecting a detection circuit to a word line (non-selected word line) to which a low potential is applied and detecting a change in the potential of at least one word line, Testing for defects (shorts, etc.).

【0012】即ち、従来では、ダイソ−ト時のファンク
ションチェックにおいて全てのアドレスを順次選択して
いかなければならなかったのに対し、本発明では、制御
信号を与え、検出用端子間に流れる電流を検出するのみ
で、ワ−ド線の欠陥を確認できる。
That is, in the prior art, all the addresses had to be sequentially selected in the function check at the time of die-sorting, whereas in the present invention, a control signal is applied and a current flowing between the detection terminals is supplied. The defect of the word line can be confirmed only by detecting

【0013】従って、簡単かつ短時間にワ−ド線のテス
トを行うことができ、また、そのテスト結果に合格した
製品についてのみダイソ−トテストを行えば足りるた
め、ダイソ−ト時間を短縮でき、コストを大幅に削減で
きる。
Therefore, it is possible to easily and quickly test the wire line, and it is sufficient to perform the die-sort test only on the products that pass the test result, so that the die-sort time can be shortened. The cost can be reduced significantly.

【0014】[0014]

【実施例】以下、図面を参照しながら、本発明の半導体
記憶装置について詳細に説明する。図1は、本発明の半
導体記憶装置の概念を示すブロック図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A semiconductor memory device of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a block diagram showing the concept of the semiconductor memory device of the present invention.

【0015】アドレス信号切替回路11には、制御信号
用パッド21、第1電源パッド22及び第2電源パッド
23が接続されている。第1電源パッド22には、高電
位(例えば5V)VDDが印加され、第2電源パッド2
3には、低電位(例えば0V)VSSが印加される。制
御信号用パッド21には、通常時のアドレス信号Aとワ
−ド線の欠陥をテストする際のアドレス信号との切り替
えを制御する制御信号CRが入力される。
A control signal pad 21, a first power supply pad 22 and a second power supply pad 23 are connected to the address signal switching circuit 11. A high potential (for example, 5V) VDD is applied to the first power supply pad 22, and the second power supply pad 2
A low potential (for example, 0V) VSS is applied to 3. The control signal pad 21 is supplied with a control signal CR for controlling switching between the address signal A in the normal state and the address signal in testing the defect of the word line.

【0016】ワ−ド線の欠陥をテストする際に制御信号
CRが入力されると、アドレス信号切替回路11は、ワ
−ド線を1本おきに選択し得るアドレス信号をデコ−ダ
12に与える。
When the control signal CR is input when testing the defect of the word line, the address signal switching circuit 11 supplies to the decoder 12 an address signal which can select every other word line. give.

【0017】例えば、デコ−ダ12は、メモリセルアレ
イ13の奇数本目のワ−ド線WL1,WL3,…WL
(n−1)を選択し、これらのワ−ド線WL1,WL
3,…WL(n−1)の電位を高電位(例えば5V)V
DDに設定する。
For example, the decoder 12 includes odd-numbered word lines WL1, WL3, ... WL of the memory cell array 13.
(N-1) is selected and these word lines WL1, WL
3, ... WL (n-1) potential is high potential (for example, 5 V) V
Set to DD.

【0018】また、デコ−ダ12は、メモリセルアレイ
13の偶数本目のワ−ド線WL2,WL4,…WLnを
非選択とし、これらのワ−ド線WL1,WL3,…WL
(n−1)の電位を低電位(例えば0V)VSSに設定
する。
Further, the decoder 12 deselects the even-numbered word lines WL2, WL4, ... WLn of the memory cell array 13, and these word lines WL1, WL3 ,.
The potential of (n-1) is set to a low potential (for example, 0V) VSS.

【0019】メモリセルアレイ13の非選択のワ−ド
線、即ち偶数本目のワ−ド線WL2,WL4,…WL
n、には、検出回路14が接続されている。検出回路1
4は、これら偶数本目のワ−ド線WL2,WL4,…W
Ln、の電位を検出し、所定電位(しきい値)を越えて
いるワ−ド線が1本でもあれば、ワ−ド線に欠陥(短絡
など)がある旨を示す検出信号を出力する。
Non-selected word lines of the memory cell array 13, that is, even-numbered word lines WL2, WL4, ... WL.
The detection circuit 14 is connected to n. Detection circuit 1
4 is an even-numbered word line WL2, WL4, ... W
The potential of Ln is detected, and if at least one word line exceeds the predetermined potential (threshold value), a detection signal indicating that there is a defect (short circuit, etc.) in the word line is output. .

【0020】即ち、良品の半導体記憶装置においては、
非選択のワ−ド線は全て低電位VSSとなるが、隣接す
るワ−ド線の短絡が発生している不良の半導体記憶装置
においては、非選択の不良のワ−ド線の電位が上昇す
る。
That is, in a good semiconductor memory device,
All the non-selected word lines have the low potential VSS, but in the defective semiconductor memory device in which the adjacent word lines are short-circuited, the potential of the non-selected defective word line rises. To do.

【0021】なお、メモリセルアレイ13の選択ワ−ド
線、即ち奇数本目のワ−ド線WL1,WL3,…WL
(n−1)に検出回路14を接続してもよい。この場
合、検出回路14は、これら奇数本目のワ−ド線WL
1,WL3,…WL(n−1)、の電位を検出し、所定
電位(しきい値)未満のワ−ド線が1本でもあれば、ワ
−ド線に欠陥(短絡など)がある旨を示す検出信号を出
力する。
The selected word lines of the memory cell array 13, that is, odd-numbered word lines WL1, WL3, ... WL.
The detection circuit 14 may be connected to (n-1). In this case, the detection circuit 14 uses these odd-numbered word lines WL.
1, WL3, ... WL (n-1) are detected, and if there is at least one word line below a predetermined potential (threshold value), there is a defect (short circuit, etc.) in the word line. A detection signal indicating the effect is output.

【0022】即ち、良品の半導体記憶装置においては、
選択のワ−ド線は全て高電位VDDとなるが、隣接する
ワ−ド線の短絡が発生している不良の半導体記憶装置に
おいては、不良のワ−ド線の電位が下昇する。
That is, in a good semiconductor memory device,
All the selected word lines have the high potential VDD, but in the defective semiconductor memory device in which the adjacent word lines are short-circuited, the potential of the defective word line rises.

【0023】図2は、図1のアドレス信号切替回路11
の一例を示すものである。このアドレス信号切替回路
は、図1のデコ−タ12が図3に示すようなAND回路
(論理積)から構成されている場合に使用される。
FIG. 2 shows the address signal switching circuit 11 of FIG.
FIG. This address signal switching circuit is used when the decoder 12 of FIG. 1 is composed of an AND circuit (logical product) as shown in FIG.

【0024】ワ−ド線を1本おきに選択する、即ちメモ
リセルアレイの奇数本目のワ−ド線WL1,WL3,…
WL(n−1)を選択する場合(但し、nは偶数)に
は、アドレス信号A1,A2,A5,A6…A(2n−
1),A2nを“H”レベルにすればよい(但し、nは
奇数)。
Every other word line is selected, that is, an odd-numbered word line WL1, WL3, ... Of the memory cell array.
When WL (n-1) is selected (where n is an even number), address signals A1, A2, A5, A6 ... A (2n-
1) and A2n may be set to "H" level (however, n is an odd number).

【0025】従って、アドレス信号A1,A2を与える
信号線は、共に高電位VDDが印加される電源パッド2
2にMOSトランジスタ(スイッチ)T11,T21を
介して接続される。同様に、アドレス信号A(2n−
1),A2n(但し、nは奇数)を与える信号線も、共
に高電位VDDが印加される電源パッド22にMOSト
ランジスタ(スイッチ)を介して接続される。
Therefore, the signal lines for supplying the address signals A1 and A2 are connected to the power supply pad 2 to which the high potential VDD is applied.
2 is connected via MOS transistors (switches) T11 and T21. Similarly, the address signal A (2n-
Signal lines 1) and A2n (where n is an odd number) are also connected to the power supply pad 22 to which the high potential VDD is applied via a MOS transistor (switch).

【0026】しかし、アドレス信号A3,A4を与える
信号線は、いずれか一方の信号線が低電位VSSが印加
される電源パッド23に接続される。例えば、アドレス
信号A3,A4を与える信号線は、共に低電位VSSが
印加される電源パッド23にMOSトランジスタ(スイ
ッチ)T31,T41を介して接続される。同様に、ア
ドレス信号A(2n−1),A2n(但し、nは偶数)
を与える信号線も、いずれか一方の信号線が低電位VS
Sが印加される電源パッド23にMOSトランジスタ
(スイッチ)を介して接続される。
However, one of the signal lines for supplying the address signals A3 and A4 is connected to the power supply pad 23 to which the low potential VSS is applied. For example, the signal lines for supplying the address signals A3 and A4 are connected to the power supply pad 23 to which the low potential VSS is applied via MOS transistors (switches) T31 and T41. Similarly, address signals A (2n-1) and A2n (where n is an even number)
As for the signal line that supplies the signal, one of the signal lines has a low potential VS.
The power supply pad 23 to which S is applied is connected via a MOS transistor (switch).

【0027】MOSトランジスタT11,T21…のオ
ン、オフは、制御信号CRにより制御されている。即
ち、MOSトランジスタT11,T21…は、ワ−ド線
の検査時においては、通常のアドレス信号Aを遮断し、
上述のようなワ−ド線を1本おきに選択するためのアド
レス信号を出力する。
ON / OFF of the MOS transistors T11, T21 ... Is controlled by a control signal CR. That is, the MOS transistors T11, T21 ... Cut off the normal address signal A during the inspection of the word line,
An address signal for selecting every other word line as described above is output.

【0028】図4は、図1の検出回路の一例を示すもの
である。この検出回路は、非選択のワ−ド線、例えばメ
モリセルアレイの偶数本目のワ−ド線WL2,WL4,
…WLnが当該検出回路に接続されている場合に使用さ
れる。
FIG. 4 shows an example of the detection circuit of FIG. This detection circuit includes non-selected word lines, for example, even-numbered word lines WL2, WL4 of the memory cell array.
... Used when WLn is connected to the detection circuit.

【0029】即ち、MOSトランジスタT2のゲ−ト
は、ワ−ド線WL2に接続され、ソ−ス・ドレイン端子
は、検出用パッド24,25の間に接続されている。同
様に、MOSトランジスタTnのゲ−トは、ワ−ド線W
Lnに接続され、ソ−ス・ドレイン端子は、検出用パッ
ド24,25の間に接続されている。
That is, the gate of the MOS transistor T2 is connected to the word line WL2, and the source / drain terminal is connected between the detection pads 24 and 25. Similarly, the gate of the MOS transistor Tn is the word line W
It is connected to Ln, and the source / drain terminal is connected between the detection pads 24 and 25.

【0030】なお、各MOSトランジスタは、メモリセ
ルを構成するトランジスタと同じ構造を有しているのが
よい。通常は、ワ−ド線WL2,WL4,…WLnは、
選択されておらず、低電位VSSのため、MOSトラン
ジスタT2,T4,…Tnは、全てオフ状態となってい
る。
Each MOS transistor preferably has the same structure as the transistor forming the memory cell. Normally, the word lines WL2, WL4, ... WLn are
Since they are not selected and have the low potential VSS, the MOS transistors T2, T4, ... Tn are all off.

【0031】しかし、互いに隣接する2つのワ−ド線、
例えばワ−ド線WL3,WL4が短絡していると、抵抗
Rによりワ−ド線WL4の電位は、低電位VSSから高
電位VDDと低電位VSSの中間電位に上昇する。
However, two word lines adjacent to each other,
For example, when the word lines WL3 and WL4 are short-circuited, the resistance R raises the potential of the word line WL4 from the low potential VSS to an intermediate potential between the high potential VDD and the low potential VSS.

【0032】そして、ワ−ド線WL4の電位がMOSト
ランジスタT4のしきい値を越えると、MOSトランジ
スタT2がオン状態になるため、検出用パッド24と2
5が短絡される。
When the potential of the word line WL4 exceeds the threshold value of the MOS transistor T4, the MOS transistor T2 is turned on, so that the detection pads 24 and 2 are connected.
5 is short-circuited.

【0033】従って、予め検出用パッド24と25の間
に所定の電圧を印加しておけば、検出用パッド24と2
5の間に流れる電流を検出することにより、メモリセル
のワ−ド線の短絡をテストすることができる。
Therefore, if a predetermined voltage is applied between the detection pads 24 and 25 in advance, the detection pads 24 and 2 are detected.
By detecting the current flowing during 5, the short circuit of the word line of the memory cell can be tested.

【0034】なお、少なくとも1ヶ所に互いに隣接する
2つのワ−ド線の短絡があると、必ず少なくとも1つの
MOSトランジスタがオン状態になるため、検出用パッ
ド24と25の間に電流が流れる。つまり、短時間にワ
−ド線の短絡を検出することができる。
When at least one of the two word lines adjacent to each other is short-circuited, at least one MOS transistor is always turned on, so that a current flows between the detection pads 24 and 25. That is, the short circuit of the word line can be detected in a short time.

【0035】図5は、図1のアドレス信号切替回路11
の他の一例を示すものである。このアドレス信号切替回
路は、図1のデコ−タ12が図6に示すようなOR回路
(論理和)から構成されている場合に使用される。
FIG. 5 shows the address signal switching circuit 11 of FIG.
It shows another example. This address signal switching circuit is used when the decoder 12 of FIG. 1 is composed of an OR circuit (logical sum) as shown in FIG.

【0036】ワ−ド線を1本おきに選択する、即ちメモ
リセルアレイの奇数本目のワ−ド線WL1,WL3,…
WL(n−1)を選択する場合(但し、nは偶数)に
は、アドレス信号A1,A2,A5,A6…A(2n−
1),A2nを“L”レベルにすればよい(但し、nは
奇数)。
Every other word line is selected, that is, odd-numbered word lines WL1, WL3, ... Of the memory cell array.
When WL (n-1) is selected (where n is an even number), address signals A1, A2, A5, A6 ... A (2n-
1) and A2n may be set to "L" level (however, n is an odd number).

【0037】従って、アドレス信号A1,A2を与える
信号線は、共に低電位VSSが印加される電源パッド2
3にMOSトランジスタ(スイッチ)T11,T21を
介して接続される。同様に、アドレス信号A(2n−
1),A2n(但し、nは奇数)を与える信号線も、共
に低電位VSSが印加される電源パッド23にMOSト
ランジスタ(スイッチ)を介して接続される。
Therefore, the signal lines for supplying the address signals A1 and A2 are connected to the power supply pad 2 to which the low potential VSS is applied.
3 via MOS transistors (switches) T11 and T21. Similarly, the address signal A (2n-
Signal lines 1) and A2n (where n is an odd number) are also connected to the power supply pad 23 to which the low potential VSS is applied via a MOS transistor (switch).

【0038】しかし、アドレス信号A3,A4を与える
信号線は、いずれか一方の信号線が高電位VDDが印加
される電源パッド22に接続される。例えば、アドレス
信号A3,A4を与える信号線は、共に高電位VDDが
印加される電源パッド22にMOSトランジスタ(スイ
ッチ)T31,T41を介して接続される。同様に、ア
ドレス信号A(2n−1),A2n(但し、nは偶数)
を与える信号線も、いずれか一方の信号線が高電位VD
Dが印加される電源パッド22にMOSトランジスタ
(スイッチ)を介して接続される。
However, one of the signal lines for supplying the address signals A3 and A4 is connected to the power supply pad 22 to which the high potential VDD is applied. For example, the signal lines for supplying the address signals A3 and A4 are connected to the power supply pad 22 to which the high potential VDD is applied, via MOS transistors (switches) T31 and T41. Similarly, address signals A (2n-1) and A2n (where n is an even number)
As for the signal line that gives the
The power supply pad 22 to which D is applied is connected via a MOS transistor (switch).

【0039】MOSトランジスタT11,T21…のオ
ン、オフは、制御信号CRにより制御されている。即
ち、MOSトランジスタT11,T21…は、ワ−ド線
の検査時においては、通常のアドレス信号Aを遮断し、
上述のようなワ−ド線を1本おきに選択するためのアド
レス信号を出力する。
ON / OFF of the MOS transistors T11, T21 ... Is controlled by a control signal CR. That is, the MOS transistors T11, T21 ... Cut off the normal address signal A during the inspection of the word line,
An address signal for selecting every other word line as described above is output.

【0040】[0040]

【発明の効果】以上、説明したように、本発明の半導体
記憶装置によれば、次のような効果を奏する。ワ−ド線
を1本おきに選択するアドレスをデコ−ダに与え、か
つ、選択されたワ−ド線又は非選択のワ−ド線に検出回
路を接続して当該ワ−ド線の電位の変化を検出すること
により、ワ−ド線に欠陥(短絡など)があるか否かをテ
ストしている。
As described above, the semiconductor memory device of the present invention has the following effects. An address for selecting every other word line is given to the decoder, and a detection circuit is connected to the selected word line or non-selected word line, and the potential of the word line concerned is connected. By detecting the change of the test line, it is tested whether or not there is a defect (short circuit, etc.) in the word line.

【0041】従って、従来では、ダイソ−ト時のファン
クションチェックにおいて全てのアドレスを順次選択し
ていかなければならなかったのに対し、本発明では、制
御信号を与え、検出用端子間に流れる電流を検出するの
みで、ワ−ド線の欠陥を確認できる。
Therefore, in the prior art, all addresses had to be sequentially selected in the function check at the time of die-sorting, whereas in the present invention, a control signal is applied and a current flowing between the detection terminals is supplied. The defect of the word line can be confirmed only by detecting

【0042】つまり、簡単かつ短時間にワ−ド線のテス
トを行うことができ、また、そのテスト結果に合格した
製品についてのみダイソ−トテストを行えば足りるた
め、ダイソ−ト時間を短縮でき、コストを大幅に削減で
きる。
In other words, it is possible to easily and quickly test the wire line, and it is sufficient to perform the die-sort test only on the products that pass the test result, so that the die-sort time can be shortened. The cost can be reduced significantly.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体記憶装置を示すブロック図。FIG. 1 is a block diagram showing a semiconductor memory device of the present invention.

【図2】図1のアドレス信号切替回路の一例を示す回路
図。
FIG. 2 is a circuit diagram showing an example of an address signal switching circuit of FIG.

【図3】図1のデコ−ダの一例を示す回路図。FIG. 3 is a circuit diagram showing an example of the decoder shown in FIG.

【図4】図1の検出回路の一例を示す回路図。FIG. 4 is a circuit diagram showing an example of the detection circuit of FIG.

【図5】図1のアドレス信号切替回路の他の一例を示す
回路図。
5 is a circuit diagram showing another example of the address signal switching circuit of FIG.

【図6】図1のデコ−ダの他の一例を示す回路図。6 is a circuit diagram showing another example of the decoder shown in FIG.

【符号の説明】[Explanation of symbols]

11 :アドレス信号切替回路、 12 :デコ−ダ、 13 :メモリセルアレイ、 14 :検出回路、 21 :制御信号用パッド、 22 :電源(VDD)用パッド、 23 :電源(VSS)用パッド、 24,25 :検出用パッド、 T11,T21,T12,T22,T31,T41,T
32,T42 :Nチャネル型MOSトランジスタ(ス
イッチ)、 T2,T4,…Tn :Nチャネル型MOSトランジス
タ(検出用スイッチ)、 I :インバ−タ。 WL1〜WLn :ワ−ド線。
11: address signal switching circuit, 12: decoder, 13: memory cell array, 14: detection circuit, 21: control signal pad, 22: power supply (VDD) pad, 23: power supply (VSS) pad, 24, 25: Detection pad, T11, T21, T12, T22, T31, T41, T
32, T42: N channel type MOS transistor (switch), T2, T4, ... Tn: N channel type MOS transistor (detection switch), I: Inverter. WL1 to WLn: word lines.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 ストライプ状に配列された複数のワ−ド
線と、 前記複数のワ−ド線を1本おきに選択し、高電位が印加
されるワ−ド線と低電位が印加されるワ−ド線が交互に
配列されるようにする手段と、 前記高電位が印加されるワ−ド線又は低電位が印加され
るワ−ド線に接続され、少なくとも1本のワ−ド線の電
位変化を検出することにより、隣接するワ−ド線の短絡
を検査し得る検出回路とを具備することを特徴とする半
導体記憶装置。
1. A plurality of word lines arranged in a stripe pattern and a plurality of every other word lines are selected, and a word line to which a high potential is applied and a word line to which a low potential is applied. At least one word line connected to the word line to which the high potential is applied or the word line to which the low potential is applied, A semiconductor memory device comprising: a detection circuit capable of inspecting a short circuit of an adjacent word line by detecting a potential change of the line.
【請求項2】 前記手段は、 制御信号が入力されると、通常のアドレス信号に変えて
前記複数のワ−ド線を1本おきに選択するアドレス信号
を出力するアドレス信号切替回路と、 前記アドレス信号切替回路からのアドレス信号に基づい
てワ−ド線を選択するデコ−ダとから構成されているこ
とを特徴とする請求項1に記載の半導体記憶装置。
2. The address signal switching circuit for outputting an address signal for selecting every other one of the plurality of word lines instead of a normal address signal when a control signal is input, 2. A semiconductor memory device according to claim 1, further comprising a decoder for selecting a word line based on an address signal from an address signal switching circuit.
【請求項3】 前記検出回路は、 ゲ−トが前記高電位が印加されるワ−ド線又は低電位が
印加されるワ−ド線に接続され、ソ−ス又はドレインが
2つの検出用端子間に接続される複数のMOSトランジ
スタから構成されていることを特徴とする半導体記憶装
置。
3. The detection circuit has a gate connected to the word line to which the high potential is applied or the word line to which the low potential is applied, and has two sources or drains for detection. A semiconductor memory device comprising a plurality of MOS transistors connected between terminals.
【請求項4】 ストライプ状に配列された複数のワ−ド
線を1本おきに選択し、高電位が印加されるワ−ド線と
低電位が印加されるワ−ド線を交互に配列させ、前記高
電位が印加されるワ−ド線又は低電位が印加されるワ−
ド線の少なくとも1本のワ−ド線の電位変化を検出する
ことにより、隣接するワ−ド線の短絡を検査するように
したことを特徴とする半導体記憶装置のテスト方法。
4. A plurality of word lines arranged in stripes are selected every other line, and word lines to which a high potential is applied and word lines to which a low potential are applied are alternately arranged. And the word line to which the high potential is applied or the word line to which the low potential is applied.
A method for testing a semiconductor memory device, characterized in that a change in potential of at least one word line among the word lines is detected to inspect a short circuit between adjacent word lines.
【請求項5】 2つの検出用端子間に外部から電圧を印
加し、前記電位変化に基づいて前記2つの検出用端子間
を短絡させ、前記2つの検出用端子間に流れる電流を検
出することにより、隣接するワ−ド線の短絡を検査する
ようにしたことを特徴とする請求項4に記載の半導体記
憶装置のテスト方法。
5. A voltage is externally applied between the two detection terminals, the two detection terminals are short-circuited based on the potential change, and a current flowing between the two detection terminals is detected. 5. The method for testing a semiconductor memory device according to claim 4, wherein a short circuit between adjacent word lines is inspected.
JP7067645A 1995-03-27 1995-03-27 Semiconductor memory and its test method Withdrawn JPH08273392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7067645A JPH08273392A (en) 1995-03-27 1995-03-27 Semiconductor memory and its test method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7067645A JPH08273392A (en) 1995-03-27 1995-03-27 Semiconductor memory and its test method

Publications (1)

Publication Number Publication Date
JPH08273392A true JPH08273392A (en) 1996-10-18

Family

ID=13350968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7067645A Withdrawn JPH08273392A (en) 1995-03-27 1995-03-27 Semiconductor memory and its test method

Country Status (1)

Country Link
JP (1) JPH08273392A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100394574B1 (en) * 2001-04-10 2003-08-14 삼성전자주식회사 non-volatile semiconductor memory device having word line defect check circuit
US7042778B2 (en) * 2001-12-12 2006-05-09 Micron Technology, Inc. Flash array implementation with local and global bit lines
JP2009169829A (en) * 2008-01-18 2009-07-30 Denso Corp Electronic equipment and program

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100394574B1 (en) * 2001-04-10 2003-08-14 삼성전자주식회사 non-volatile semiconductor memory device having word line defect check circuit
US7042778B2 (en) * 2001-12-12 2006-05-09 Micron Technology, Inc. Flash array implementation with local and global bit lines
JP2009169829A (en) * 2008-01-18 2009-07-30 Denso Corp Electronic equipment and program

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