JPH0827165A - Production of organosilicon compound - Google Patents
Production of organosilicon compoundInfo
- Publication number
- JPH0827165A JPH0827165A JP6181782A JP18178294A JPH0827165A JP H0827165 A JPH0827165 A JP H0827165A JP 6181782 A JP6181782 A JP 6181782A JP 18178294 A JP18178294 A JP 18178294A JP H0827165 A JPH0827165 A JP H0827165A
- Authority
- JP
- Japan
- Prior art keywords
- hydrosilane
- reaction
- mol
- catalyst
- organic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 150000003961 organosilicon compounds Chemical class 0.000 title abstract 2
- 239000003054 catalyst Substances 0.000 claims abstract description 21
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 16
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 15
- 239000002253 acid Substances 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- -1 aromatic nitrile Chemical class 0.000 claims abstract description 8
- 239000002210 silicon-based material Substances 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 abstract description 24
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 abstract description 5
- BOHCMQZJWOGWTA-UHFFFAOYSA-N 3-methylbenzonitrile Chemical compound CC1=CC=CC(C#N)=C1 BOHCMQZJWOGWTA-UHFFFAOYSA-N 0.000 abstract description 4
- 238000007259 addition reaction Methods 0.000 abstract description 4
- 239000006087 Silane Coupling Agent Substances 0.000 abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 150000001336 alkenes Chemical class 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 28
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 8
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 8
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000035484 reaction time Effects 0.000 description 6
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- NWPNXBQSRGKSJB-UHFFFAOYSA-N 2-methylbenzonitrile Chemical compound CC1=CC=CC=C1C#N NWPNXBQSRGKSJB-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- OHXAOPZTJOUYKM-UHFFFAOYSA-N 3-Chloro-2-methylpropene Chemical compound CC(=C)CCl OHXAOPZTJOUYKM-UHFFFAOYSA-N 0.000 description 3
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000004587 chromatography analysis Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 3
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- OZOQTENKIVKILK-UHFFFAOYSA-N 2,5-dimethylbenzonitrile Chemical compound CC1=CC=C(C)C(C#N)=C1 OZOQTENKIVKILK-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- LQZDDWKUQKQXGC-UHFFFAOYSA-N 2-(2-methylprop-2-enoxymethyl)oxirane Chemical compound CC(=C)COCC1CO1 LQZDDWKUQKQXGC-UHFFFAOYSA-N 0.000 description 1
- HLCPWBZNUKCSBN-UHFFFAOYSA-N 2-aminobenzonitrile Chemical compound NC1=CC=CC=C1C#N HLCPWBZNUKCSBN-UHFFFAOYSA-N 0.000 description 1
- NHWQMJMIYICNBP-UHFFFAOYSA-N 2-chlorobenzonitrile Chemical compound ClC1=CC=CC=C1C#N NHWQMJMIYICNBP-UHFFFAOYSA-N 0.000 description 1
- GDHXJNRAJRCGMX-UHFFFAOYSA-N 2-fluorobenzonitrile Chemical compound FC1=CC=CC=C1C#N GDHXJNRAJRCGMX-UHFFFAOYSA-N 0.000 description 1
- GOSKBDUIDDJITJ-UHFFFAOYSA-N 2-heptylbenzonitrile Chemical compound CCCCCCCC1=CC=CC=C1C#N GOSKBDUIDDJITJ-UHFFFAOYSA-N 0.000 description 1
- VXDHQYLFEYUMFY-UHFFFAOYSA-N 2-methylprop-2-en-1-amine Chemical compound CC(=C)CN VXDHQYLFEYUMFY-UHFFFAOYSA-N 0.000 description 1
- FASUFOTUSHAIHG-UHFFFAOYSA-N 3-methoxyprop-1-ene Chemical compound COCC=C FASUFOTUSHAIHG-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- VCZNNAKNUVJVGX-UHFFFAOYSA-N 4-methylbenzonitrile Chemical compound CC1=CC=C(C#N)C=C1 VCZNNAKNUVJVGX-UHFFFAOYSA-N 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- XUCKQPJKYWZURJ-UHFFFAOYSA-N cyclohexyl(dimethoxy)silane Chemical compound CO[SiH](OC)C1CCCCC1 XUCKQPJKYWZURJ-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical compound C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- XSAUEOCQIPDIQK-UHFFFAOYSA-N ethoxy(diethyl)silane Chemical compound CCO[SiH](CC)CC XSAUEOCQIPDIQK-UHFFFAOYSA-N 0.000 description 1
- FJKCDSVHCNEOOS-UHFFFAOYSA-N ethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](OCC)C1=CC=CC=C1 FJKCDSVHCNEOOS-UHFFFAOYSA-N 0.000 description 1
- YSLVSGVAVRTLAV-UHFFFAOYSA-N ethyl(dimethoxy)silane Chemical compound CC[SiH](OC)OC YSLVSGVAVRTLAV-UHFFFAOYSA-N 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229930015698 phenylpropene Natural products 0.000 description 1
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical compound N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 description 1
- 229920006391 phthalonitrile polymer Polymers 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- UBLMWQYLVOVZMT-UHFFFAOYSA-N tert-butyl n-(3-acetylphenyl)carbamate Chemical compound CC(=O)C1=CC=CC(NC(=O)OC(C)(C)C)=C1 UBLMWQYLVOVZMT-UHFFFAOYSA-N 0.000 description 1
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- VVUUXYGSBMJAHC-UHFFFAOYSA-N trichloro-(3-chloro-2-methylpropyl)silane Chemical compound ClCC(C)C[Si](Cl)(Cl)Cl VVUUXYGSBMJAHC-UHFFFAOYSA-N 0.000 description 1
- WPPVEXTUHHUEIV-UHFFFAOYSA-N trifluorosilane Chemical compound F[SiH](F)F WPPVEXTUHHUEIV-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は有機含ケイ素化合物の製
造方法に関し、更に詳しくはヒドロシラン類をアルケニ
ル末端基を有する有機化合物に付加する際、触媒として
塩化白金酸のニトリル溶液或いは塩化白金酸およびニト
リルの反応生成物を用いる有機含ケイ素化合物の製造方
法に関する。本発明により製造された有機含ケイ素化合
物は、シランカップリング剤または吸水防止剤の原料等
に有用である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an organic silicon-containing compound, and more particularly to a nitrile solution of chloroplatinic acid or chloroplatinic acid as a catalyst when adding hydrosilanes to an organic compound having an alkenyl terminal group. The present invention relates to a method for producing an organic silicon-containing compound using a reaction product of nitrile. The organic silicon-containing compound produced by the present invention is useful as a raw material for a silane coupling agent or a water absorption inhibitor.
【0002】[0002]
【従来の技術】従来、ヒドロシラン類とアルケニル末端
基を有する有機化合物との付加反応によって種々の有用
な有機含ケイ素化合物が得られることはよく知られてい
るところであり、これにはこの付加反応の収率向上、反
応条件の緩和等を目的として種々の触媒が提案されてい
る。例えば、白金黒、白金−炭素、白金−アルミナ等の
活性化された白金触媒が提案されている(米国特許第2
632013号、米国特許第2637738号、米国特
許第2851473号)が、これら白金触媒を用いた場
合は反応系が不均一系となるため付加反応の速度が遅い
という問題点を有している。It has been well known that various useful organic silicon-containing compounds can be obtained by addition reaction of hydrosilanes with an organic compound having an alkenyl terminal group. Various catalysts have been proposed for the purpose of improving yield and relaxing reaction conditions. For example, activated platinum catalysts such as platinum black, platinum-carbon and platinum-alumina have been proposed (US Pat. No. 2).
632013, U.S. Pat. No. 2,637,738, and U.S. Pat. No. 2,851,473) have a problem that when these platinum catalysts are used, the reaction system becomes a heterogeneous system and the addition reaction rate is slow.
【0003】また、特公昭33−9969号および特公
昭43−27853号公報には塩化白金酸或いはアルコ
−ル、エ−テル、アルデヒド等と塩化白金酸との反応生
成物を触媒として使用することが記述されている。これ
ら触媒を用いた場合、反応系は均一になるものの触媒活
性が低いために反応時間が長くなるという問題点を有し
ている。さらに、特公昭50−24947号にはβ−ジ
ケトンと白金との錯化合物を、特開昭62−28398
3号にはアセトニトリルに溶解した白金錯体を触媒とし
て使用することが記述されているが、やはり触媒活性が
十分ではなく反応時間が満足いくものではない。In JP-B-33-9969 and JP-B-43-27853, chloroplatinic acid or a reaction product of alcohol, ether, aldehyde and the like and chloroplatinic acid is used as a catalyst. Is described. When these catalysts are used, the reaction system becomes uniform, but there is a problem that the reaction time becomes long because the catalytic activity is low. Further, Japanese Patent Publication No. 50-24947 discloses a complex compound of β-diketone and platinum.
No. 3 describes the use of a platinum complex dissolved in acetonitrile as a catalyst, but the catalytic activity is still insufficient and the reaction time is not satisfactory.
【0004】[0004]
【発明が解決しようとする課題】本発明は、上記のよう
な従来技術に伴う問題点を解決し、反応時間が短く、生
産性に優れた有機含ケイ素化合物の製造方法を提供する
ものである。SUMMARY OF THE INVENTION The present invention provides a method for producing an organic silicon-containing compound which solves the problems associated with the prior art as described above, has a short reaction time, and is excellent in productivity. .
【0005】[0005]
【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究した結果、本発明を完成させるに
至った。即ち本発明は、ヒドロシラン類を、少なくとも
1個のアルケニル末端基を有する有機化合物に付加する
ことにより有機含ケイ素化合物を製造するにあたり、触
媒として塩化白金酸の芳香族ニトリル溶液を用いること
を特徴とする有機含ケイ素化合物の製造方法である。The present inventors have completed the present invention as a result of intensive research to solve the above problems. That is, the present invention is characterized by using an aromatic nitrile solution of chloroplatinic acid as a catalyst in producing an organic silicon-containing compound by adding a hydrosilane to an organic compound having at least one alkenyl end group. Is a method for producing an organic silicon-containing compound.
【0006】以下、本発明を更に詳細に説明する。本発
明に用いるヒドロシラン類は、Si−H結合を1または
2個有する種々の化合物で、例えば前記一般式(I)で
示される化合物が挙げられる。なお、この化合物におい
てRまたはXが2つ以上あるときは、同じでも異なって
いてもよい。この一般式(I)で示される化合物の具体
例としては、トリメトキシシラン、トリエトキシシラ
ン、トリプロポキシシラン、メチルジメトキシシラン、
エチルジメトキシシラン、ジメチルメトキシシラン、ジ
エチルエトキシシラン、トリフェノキシシラン、フェニ
ルジメトキシシラン、ジフェニルエトキシシラン、シク
ロヘキシルジメトキシシラン、トリクロロシラン、メチ
ルジクロロシラン、エチルジクロロシラン、ジメチルク
ロロシラン、トリブロモシランおよびトリフルオロシラ
ン等が挙げられる。好ましいヒドロシラン類としては、
生成する化合物の安定性や取り扱いの容易さ等の理由か
らトリメトキシシランまたはトリエトキシシラン等のト
リアルコキシシランを挙げることができる。The present invention will be described in more detail below. The hydrosilanes used in the present invention are various compounds having 1 or 2 Si—H bonds, and examples thereof include the compounds represented by the general formula (I). When there are two or more R or X in this compound, they may be the same or different. Specific examples of the compound represented by the general formula (I) include trimethoxysilane, triethoxysilane, tripropoxysilane, methyldimethoxysilane,
Ethyldimethoxysilane, dimethylmethoxysilane, diethylethoxysilane, triphenoxysilane, phenyldimethoxysilane, diphenylethoxysilane, cyclohexyldimethoxysilane, trichlorosilane, methyldichlorosilane, ethyldichlorosilane, dimethylchlorosilane, tribromosilane, trifluorosilane, etc. Is mentioned. Preferred hydrosilanes include
Trialkoxysilanes such as trimethoxysilane and triethoxysilane can be mentioned for reasons such as stability of the produced compound and easy handling.
【0007】一方、本発明に用いるアルケニル末端基を
有する有機化合物の具体例としては、エチレン、プロピ
レン、ブチレン、1−ヘキセンおよび1−オクテン等で
例示されるオレフィン類;スチレン、アリルベンゼンお
よびメタリルベンゼン等の芳香族化合物;メチルビニル
エ−テル、アリルメチルエ−テル、アリルフェニルエ−
テル、アリルグリシジルエ−テルおよびメタリルグリシ
ジルエ−テル等のエ−テル類;アリルメタクリレ−ト、
メタリルメタクリレ−トおよびアリルフタレ−ト等のエ
ステル類;アリルアミン、メタリルアミン、ジアリルア
ミンおよびトリアリルアミン等の含窒素化合物類、アリ
ルメチルチオエ−テルおよびアリルグリシジルチオエ−
テル等の含イオウ化合物類;ビニルクロライド、アリル
クロライドおよびメタリルクロライド等の含ハロゲン化
合物類;ビニルトリメチルシランおよびアリルトリメト
キシシラン等の含ケイ素化合物類等を挙げることができ
る。更にアルケニル末端基を2個以上有するジアリルフ
タレート等も使用可能である。On the other hand, specific examples of the organic compound having an alkenyl terminal group used in the present invention include olefins such as ethylene, propylene, butylene, 1-hexene and 1-octene; styrene, allylbenzene and methallyl. Aromatic compounds such as benzene; methyl vinyl ether, allyl methyl ether, allyl phenyl ether
Ethers such as ter, allyl glycidyl ether and methallyl glycidyl ether; allyl methacrylate,
Esters such as methallyl methacrylate and allyl phthalate; nitrogen-containing compounds such as allylamine, methallylamine, diallylamine and triallylamine, allylmethylthioether and allylglycidylthioate
And sulfur-containing compounds such as tellurium; halogen-containing compounds such as vinyl chloride, allyl chloride and methallyl chloride; and silicon-containing compounds such as vinyltrimethylsilane and allyltrimethoxysilane. Further, diallyl phthalate having two or more alkenyl terminal groups can be used.
【0008】本発明に用いる芳香族ニトリル化合物の具
体例としては、ベンゾニトリル、o−トルニトリル、m
−トルニトリル、p−トルニトリル、2,5−ジメチル
ベンゾニトリル、アミノベンゾニトリル、フルオロベン
ゾニトリル、クロロベンゾニトリル、ヘプチルベンゾニ
トリル、フタロニトリルおよびナフチルニトリル等を挙
げることができる。好ましい芳香族ニトリル化合物とし
ては、触媒活性および取り扱いの容易さ等の理由からベ
ンゾニトリル、o−トルニトリルおよびm−トルニトリ
ルを挙げることができ、中でもベンゾニトリルおよびm
−トルニトリルが更に好ましい。Specific examples of the aromatic nitrile compound used in the present invention include benzonitrile, o-tolunitrile and m.
-Tolunitrile, p-tolunitrile, 2,5-dimethylbenzonitrile, aminobenzonitrile, fluorobenzonitrile, chlorobenzonitrile, heptylbenzonitrile, phthalonitrile, naphthylnitrile and the like can be mentioned. Preferred aromatic nitrile compounds include benzonitrile, o-tolunitrile and m-tolunitrile for reasons of catalytic activity and ease of handling, among which benzonitrile and m
-Tolunitrile is more preferred.
【0009】本発明における触媒の使用量は特に限定さ
れないが、ヒドロシラン類1モルに対し、10-2〜10
-7モル(白金換算)、好ましくは10-4〜10-6モルの
量で用いるのがよい。触媒量が10-7モルより少ないと
反応時間が長くかかり、10-2モルよりも多く使用する
と逆に反応速度が速すぎ発熱するため反応制御が困難に
なる。また、触媒は市販の塩化白金酸または塩化白金酸
6水和物を、芳香族ニトリル化合物に室温または加熱し
て溶解させて得られる。The amount of the catalyst used in the present invention is not particularly limited, but it is 10 -2 to 10 with respect to 1 mol of hydrosilanes.
-7 mol (as platinum), preferably 10 -4 to 10 -6 mol. If the amount of the catalyst is less than 10 -7 mol, the reaction time will be long, and if it is more than 10 -2 mol, the reaction rate will be too fast and heat will be generated. The catalyst is obtained by dissolving commercially available chloroplatinic acid or chloroplatinic acid hexahydrate in an aromatic nitrile compound at room temperature or by heating.
【0010】本発明におけるヒドロシラン類とアルケニ
ル末端基を有する有機化合物の仕込み割合は一律の条件
に設定することはできないが、ヒドロシラン類の活性水
素1当量に対し、アルケニル末端基を有する有機化合物
のアルケニル基を0.5〜2当量、好ましくは0.8〜
1.5当量になるように仕込むのが好ましい。また、ヒ
ドロシラン類、アルケニル末端基を有する有機化合物お
よび触媒の仕込み方法は、ヒドロシラン類と触媒を先に
仕込み、アルケニル末端基を有する有機化合物を滴下し
ても良いし、アルケニル末端基を有する有機化合物と触
媒を先に仕込み、ヒドロシラン類を滴下してもよい。更
にこれら3種類を同時に滴下する仕込み方法および1種
類を先に仕込み残り2種類の混合物を滴下する方法も挙
げられる。The charging ratio of the hydrosilanes and the organic compound having an alkenyl terminal group in the present invention cannot be set to a uniform condition, but the alkenyl of the organic compound having an alkenyl terminal group is equivalent to 1 equivalent of active hydrogen of the hydrosilane. The group is 0.5 to 2 equivalents, preferably 0.8 to
It is preferable to charge so that the amount becomes 1.5 equivalents. The method for charging the hydrosilanes, the organic compound having an alkenyl terminal group and the catalyst may be such that the hydrosilanes and the catalyst are charged first and the organic compound having an alkenyl terminal group is added dropwise, or the organic compound having an alkenyl terminal group is added. The catalyst may be charged first and the hydrosilanes may be added dropwise. Furthermore, a charging method in which these three kinds are simultaneously dropped and a method in which one kind is charged first and the remaining two kinds of mixtures are dropped are also included.
【0011】本発明においては反応熱の除去や濃度調整
のために、ベンゼン、トルエン、キシレンまたは塩素化
炭化水素等の溶媒を用いても良い。In the present invention, a solvent such as benzene, toluene, xylene or chlorinated hydrocarbon may be used for removing the heat of reaction and adjusting the concentration.
【0012】反応温度や反応時間は、用いるヒドロシラ
ン類およびアルケニル末端基を有する有機化合物の種
類、触媒量によって異なるので一律に設定することはで
きないが、通常、室温〜150℃の温度で0.5〜24
時間、好ましくは40〜100℃の温度で1〜12時間
反応させるのがよい。反応は、常圧下または加圧下のい
ずれの条件下でも実施できる。反応雰囲気は空気中でも
良く、窒素またはアルゴン等の不活性ガスの雰囲気下で
も良い。The reaction temperature and the reaction time cannot be set uniformly because they vary depending on the type of hydrosilanes and organic compounds having an alkenyl terminal group and the amount of catalyst used, but usually 0.5 to 0.5 at a temperature of room temperature to 150 ° C. ~ 24
The reaction is carried out at a temperature of preferably 40 to 100 ° C. for 1 to 12 hours. The reaction can be carried out under either normal pressure or increased pressure. The reaction atmosphere may be air, or may be an atmosphere of an inert gas such as nitrogen or argon.
【0013】[0013]
【実施例】以下、実施例および比較例を掲げて本発明を
より具体的に説明する。 (実施例1)温度計、冷却器、撹拌器および滴下ロート
を取り付けた100mlのガラス製4つ口フラスコに、
1−ヘキセン20g(0.22mol)および0.05
M−H2 PtCl6 ・6H2 Oのベンゾニトリル溶液4
4マイクロリットルを仕込み加熱撹拌を行った。内温が
60℃になった後、トリエトキシシラン35.6g
(0.22mol)をゆっくりと滴下し、滴下終了後更
に内温60±3℃で5時間反応させた。反応終了後、ガ
スクロ分析した結果、目的物であるヘキシルトリエトキ
シシランが収率86.7%(仕込み1−ヘキセン基準)
で得られた。EXAMPLES The present invention will be described more specifically with reference to Examples and Comparative Examples. (Example 1) In a 100 ml glass four-necked flask equipped with a thermometer, a cooler, a stirrer and a dropping funnel,
1-hexene 20 g (0.22 mol) and 0.05
M-H 2 PtCl 6 · 6H 2 O benzonitrile solution 4
4 microliters were charged and heated and stirred. After the internal temperature reached 60 ° C, 35.6 g of triethoxysilane
(0.22 mol) was slowly added dropwise, and after the addition was completed, the reaction was further performed at an internal temperature of 60 ± 3 ° C. for 5 hours. After completion of the reaction, gas chromatographic analysis showed that the target product, hexyltriethoxysilane, was in a yield of 86.7% (based on the charged 1-hexene).
Obtained in.
【0014】(比較例1)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、1−ヘキセン20g(0.22mol)お
よび0.05M−H2 PtCl6 ・6H2 Oのイソプロ
パノ−ル溶液88マイクロリットルを仕込み加熱撹拌を
行った。内温が60℃になった後、トリエトキシシラン
35.6g(0.22mol)をゆっくりと滴下し、滴
下終了後更に内温60±3℃で7時間反応させた。反応
終了後、ガスクロ分析した結果、目的物であるヘキシル
トリエトキシシランが収率73.8%(仕込み1−ヘキ
セン基準)で得られた。(Comparative Example 1) 20 g (0.22 mol) of 1-hexene and 0.05M-H 2 PtCl 6 were placed in a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel. 88 ml of an isopropanol solution of 6H 2 O was charged and heated and stirred. After the internal temperature reached 60 ° C., 35.6 g (0.22 mol) of triethoxysilane was slowly added dropwise, and after completion of the addition, the reaction was continued at an internal temperature of 60 ± 3 ° C. for 7 hours. After completion of the reaction, gas chromatography analysis showed that the desired product, hexyltriethoxysilane, was obtained in a yield of 73.8% (based on the charged 1-hexene).
【0015】(比較例2)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、1−ヘキセン20g(0.22mol)お
よび特公昭50−24974号に従い合成した0.05
M−アセチルアセトン白金錯塩のベンゼン溶液88マイ
クロリットルを仕込み加熱撹拌を行った。内温が60℃
になった後、トリエトキシシラン35.6g(0.22
mol)をゆっくりと滴下し、滴下終了後更に内温60
±3℃で5時間反応させた。反応終了後、ガスクロ分析
した結果、目的物であるヘキシルトリエトキシシランが
収率14.7%(仕込み1−ヘキセン基準)で得られ
た。(Comparative Example 2) In a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel, 20 g (0.22 mol) of 1-hexene was synthesized according to JP-B-50-24974. Done 0.05
88 microliters of a benzene solution of M-acetylacetone platinum complex salt was charged and stirred with heating. Inner temperature is 60 ° C
35.6 g (0.22
mol) is slowly added dropwise, and after the addition is complete, the internal temperature is 60
The reaction was carried out at ± 3 ° C for 5 hours. After completion of the reaction, gas chromatography analysis revealed that the desired product, hexyltriethoxysilane, was obtained in a yield of 14.7% (based on the charged 1-hexene).
【0016】(実施例2)実施例1で用いたヒドロシラ
ンの種類をトリエトキシシランの変わりにトリメトキシ
シラン26.5g(0.22mol)を用いた以外は実
施例1と同様に行った。反応終了後、ガスクロ分析した
結果、目的物であるヘキシルトリメトキシシランが収率
88.9%で得られた。Example 2 Example 1 was repeated except that 26.5 g (0.22 mol) of trimethoxysilane was used instead of triethoxysilane as the kind of hydrosilane used in Example 1. After completion of the reaction, gas chromatography analysis revealed that the desired product, hexyltrimethoxysilane, was obtained in a yield of 88.9%.
【0017】(実施例3)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、アリルメタクリレ−ト20g(0.155
mol)および0.05M−H2 PtCl6 ・6H2 O
のベンゾニトリル溶液62マイクロリットルを仕込み加
熱撹拌を行った。内温が60℃になった後、トリエトキ
シシラン25.5g(0.155mol)をゆっくりと
滴下し、滴下終了後更に内温60±3℃で4時間反応さ
せた。反応終了後、ガスクロ分析した結果、目的物であ
るトリエトキシシリルプロピルメタクリレ−トが収率8
7.7%(仕込みアリルメタクリレ−ト基準)で得られ
た。(Example 3) 20 g (0.155) of allyl methacrylate was added to a 100 ml four-neck glass flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel.
mol) and 0.05M-H 2 PtCl 6 .6H 2 O
62 microliters of the benzonitrile solution of was charged and heated and stirred. After the internal temperature reached 60 ° C., 25.5 g (0.155 mol) of triethoxysilane was slowly added dropwise, and after completion of the addition, the reaction was continued at an internal temperature of 60 ± 3 ° C. for 4 hours. After completion of the reaction, gas chromatography analysis showed that the target product, triethoxysilylpropyl methacrylate, was in a yield of 8
It was obtained at 7.7% (based on charged allyl methacrylate).
【0018】(実施例4)実施例3で用いたヒドロシラ
ンの種類をトリエトキシシランの変わりにトリメトキシ
シラン18.9g(0.155mol)を用いた以外は
実施例3と同様に行った。反応終了後、ガスクロ分析し
た結果、目的物であるトリメトキシシリルプロピルメタ
クリレ−トが収率85.9%(仕込みアリルメタクリレ
−ト基準)で得られた。Example 4 Example 4 was repeated except that 18.9 g (0.155 mol) of trimethoxysilane was used instead of triethoxysilane as the kind of hydrosilane used in Example 3. After completion of the reaction, gas chromatography analysis revealed that the desired product, trimethoxysilylpropyl methacrylate, was obtained in a yield of 85.9% (based on the charged allyl methacrylate).
【0019】(比較例3)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコにアリルメタクリレ−ト20g(0.155m
ol)および0.05M−H2 PtCl6 ・6H2 Oの
イソプロパノ−ル溶液62マイクロリットルを仕込み加
熱撹拌を行った。内温が60℃になった後、トリエトキ
シシラン25.5g(0.155mol)をゆっくりと
滴下し、滴下終了後更に内温60±3℃で6時間反応さ
せた。反応終了後、ガスクロ分析した結果、目的物であ
るトリエトキシシリルプロピルメタクリレ−トが収率7
8.2%(仕込みアリルメタクリレ−ト基準)で得られ
た。Comparative Example 3 20 g (0.155 m) of allyl methacrylate was added to a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel.
)) and 0.05 M-H 2 PtCl 6 .6H 2 O in 62 μl of isopropanol solution were charged and stirred with heating. After the internal temperature reached 60 ° C., 25.5 g (0.155 mol) of triethoxysilane was slowly added dropwise, and after completion of the addition, the reaction was continued at an internal temperature of 60 ± 3 ° C. for 6 hours. After completion of the reaction, gas chromatography analysis showed that the target product, triethoxysilylpropyl methacrylate, was in a yield of 7
It was obtained at 8.2% (based on charged allyl methacrylate).
【0020】(比較例4)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、アリルメタクリレ−ト20g(0.155
mol)および0.05M−H2 PtCl6 ・6H2 O
のアセトニトリル溶液62マイクロリットルを仕込み加
熱撹拌を行った。内温が60℃になった後、トリエトキ
シシラン25.5g(0.155mol)をゆっくりと
滴下し、滴下終了後更に内温60±3℃で7時間反応さ
せた。反応終了後、ガスクロ分析した結果、目的物であ
るトリエトキシシリルプロピルメタクリレ−トが収率6
9.8%(仕込みアリルメタクリレ−ト基準)で得られ
た。Comparative Example 4 20 g (0.155) of allyl methacrylate was added to a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel.
mol) and 0.05M-H 2 PtCl 6 .6H 2 O
62 microliters of the acetonitrile solution of was charged and heated and stirred. After the internal temperature reached 60 ° C., 25.5 g (0.155 mol) of triethoxysilane was slowly added dropwise, and after completion of the addition, the reaction was continued at an internal temperature of 60 ± 3 ° C. for 7 hours. After completion of the reaction, gas chromatography analysis revealed that the target product, triethoxysilylpropyl methacrylate, had a yield of 6
It was obtained at 9.8% (based on charged allyl methacrylate).
【0021】(実施例5)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、トリエトキシシラン28.8g(0.17
5mol)および0.05M−H2 PtCl6 ・6H2
Oのベンゾニトリル溶液17.6マイクロリットルを仕
込み加熱撹拌を行った。内温が80℃になった後、アリ
ルグリシジルエ−テル20g(0.175mol)をゆ
っくりと滴下し、滴下終了後更に内温80±3℃で3時
間反応させた。反応終了後、ガスクロ分析した結果、目
的物であるトリエトキシシリルプロピルグリシジルエ−
テルが収率81.6%(仕込みアリルグリシジルエ−テ
ル基準)で得られた。Example 5 28.8 g (0.17 g) of triethoxysilane was added to a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel.
5 mol) and 0.05M-H 2 PtCl 6 · 6H 2
A benzonitrile solution of O (17.6 microliters) was charged and heated and stirred. After the internal temperature reached 80 ° C., 20 g (0.175 mol) of allyl glycidyl ether was slowly added dropwise, and after completion of the addition, the reaction was continued at an internal temperature of 80 ± 3 ° C. for 3 hours. After completion of the reaction, gas chromatographic analysis revealed that the desired product, triethoxysilylpropylglycidyl ether
The yield was 81.6% (based on the charged allylglycidyl ether).
【0022】(実施例6)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、トリエトキシシラン28.8g(0.17
5mol)および0.05M−H2 PtCl6 ・6H2
Oのm−トルニトリル溶液17.6マイクロリットルを
仕込み加熱撹拌を行った。内温が80℃になった後、ア
リルグリシジルエ−テル20g(0.175mol)を
ゆっくりと滴下し、滴下終了後更に内温80±3℃で3
時間反応させた。反応終了後、ガスクロ分析した結果、
目的物であるトリエトキシシリルプロピルグリシジルエ
−テルが収率82.8%(仕込みアリルグリシジルエ−
テル基準)で得られた。Example 6 28.8 g (0.17) of triethoxysilane was added to a 100 ml glass four-necked flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel.
5 mol) and 0.05M-H 2 PtCl 6 · 6H 2
17.6 microliters of a m-tolunitrile solution of O was charged and stirred with heating. After the internal temperature reached 80 ° C., 20 g (0.175 mol) of allylglycidyl ether was slowly added dropwise, and after the addition was completed, the internal temperature was further adjusted to 80 ± 3 ° C. for 3 days.
Allowed to react for hours. After the reaction, the result of gas chromatography analysis,
The target product, triethoxysilylpropyl glycidyl ether, was obtained in a yield of 82.8% (charged allyl glycidyl ether).
It was obtained according to tell standard).
【0023】(実施例7)温度計、冷却器、撹拌器およ
び滴下ロートを取り付けた100mlのガラス製4つ口
フラスコに、メタリルクロライド19.9g(0.22
mol),トルエン15mlおよび0.05M−H2 P
tCl6 ・6H2 Oのベンゾニトリル溶液132マイク
ロリットルを仕込んだ。その後、トリクロロシラン2
9.8g(0.22mol)をゆっくりと滴下し、滴下
終了後更に室温で4時間反応させた。反応終了後、ガス
クロ分析した結果、目的物である3−クロロ−2−メチ
ルプロピルトリクロロシランが収率90.1%(仕込み
メタリルクロライド基準)で得られた。Example 7 In a 100 ml glass four-necked flask equipped with a thermometer, a cooler, a stirrer and a dropping funnel, 19.9 g (0.22 g) of methallyl chloride was added.
mol), toluene 15ml and 0.05M-H 2 P
tCl benzonitrile 6 · 6H 2 O solution 132 were charged microliters. Then trichlorosilane 2
9.8 g (0.22 mol) was slowly added dropwise, and after completion of the addition, the reaction was continued at room temperature for 4 hours. After completion of the reaction, gas chromatographic analysis revealed that the desired product, 3-chloro-2-methylpropyltrichlorosilane, was obtained in a yield of 90.1% (based on the charged methallyl chloride).
【0024】[0024]
【発明の効果】本発明の有機含ケイ素化合物の製造方法
は、ヒドロシラン類をアルケニル末端基を有する有機化
合物に付加する際、触媒として塩化白金酸のニトリル溶
液を用いることによって構成したもので、用いる触媒の
活性が高く、付加反応時間を短くすることができるた
め、工業的に有用なシランカップリング剤等の生産性を
高めることができ、その工業的価値は著しく大きいもの
である。INDUSTRIAL APPLICABILITY The method for producing an organic silicon-containing compound of the present invention is constituted by using a nitrile solution of chloroplatinic acid as a catalyst when adding hydrosilanes to an organic compound having an alkenyl end group. Since the activity of the catalyst is high and the addition reaction time can be shortened, the productivity of industrially useful silane coupling agents and the like can be increased, and its industrial value is extremely large.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07F 7/12 R // C07B 61/00 300 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location C07F 7/12 R // C07B 61/00 300
Claims (3)
ルケニル末端基を有する有機化合物に付加することによ
り有機含ケイ素化合物を製造するにあたり、触媒として
塩化白金酸の芳香族ニトリル溶液を用いることを特徴と
する有機含ケイ素化合物の製造方法。1. An aromatic nitrile solution of chloroplatinic acid is used as a catalyst for producing an organic silicon-containing compound by adding a hydrosilane to an organic compound having at least one alkenyl terminal group. A method for producing an organic silicon-containing compound.
れる化合物であることを特徴とする請求項1の有機含ケ
イ素化合物の製造方法。 Ha SiRb X4-(a+b) (I) (式中、Xはアルコキシ基、アリ−ルオキシ基またはハ
ロゲン原子を表し、Rはアルキル基、シクロアルキル基
またはアリ−ル基を表し、aは1または2であり、bは
0、1または2であり、かつa+bは3以下である。)2. The method for producing an organic silicon-containing compound according to claim 1, wherein the hydrosilane is a compound represented by the general formula (I). H a SiR b X 4- (a + b) (I) (wherein, X represents an alkoxy group, an aryloxy group or a halogen atom, R represents an alkyl group, a cycloalkyl group or an aryl group, a is 1 or 2, b is 0, 1 or 2, and a + b is 3 or less.)
であることを特徴とする請求項2の有機含ケイ素化合物
の製造方法。3. The method for producing an organic silicon-containing compound according to claim 2, wherein the hydrosilanes are trialkoxysilanes.
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JP18178294A JP3658777B2 (en) | 1994-07-11 | 1994-07-11 | Method for producing organic silicon-containing compound |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010285363A (en) * | 2009-06-10 | 2010-12-24 | Shin-Etsu Chemical Co Ltd | Method for producing chlorosilyl group-having ethylnorbornene compound |
JP2012121853A (en) * | 2010-12-09 | 2012-06-28 | Shin-Etsu Chemical Co Ltd | Hydrosilylation method, method of producing organosilicon compound, and organosilicon compound |
US8946464B2 (en) | 2010-12-09 | 2015-02-03 | Shin-Etsu Chemical Co., Ltd. | Hydrosilylation method, method for producing organosilicon compound, and organosilicon compound |
US10894801B2 (en) * | 2018-07-03 | 2021-01-19 | Evonik Operations Gmbh | Process for producing alkylalkoxysilanes |
CN113717211A (en) * | 2021-08-31 | 2021-11-30 | 石家庄圣泰化工有限公司 | Synthesis method of nitrile-group functionalized organic silicon compound |
-
1994
- 1994-07-11 JP JP18178294A patent/JP3658777B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010285363A (en) * | 2009-06-10 | 2010-12-24 | Shin-Etsu Chemical Co Ltd | Method for producing chlorosilyl group-having ethylnorbornene compound |
JP2012121853A (en) * | 2010-12-09 | 2012-06-28 | Shin-Etsu Chemical Co Ltd | Hydrosilylation method, method of producing organosilicon compound, and organosilicon compound |
US8946464B2 (en) | 2010-12-09 | 2015-02-03 | Shin-Etsu Chemical Co., Ltd. | Hydrosilylation method, method for producing organosilicon compound, and organosilicon compound |
US9156864B2 (en) | 2010-12-09 | 2015-10-13 | Shin-Etsu Chemical Co., Ltd. | Hydrosilylation method, method for producing organosilicon compound, and organosilicon compound |
US9163037B2 (en) | 2010-12-09 | 2015-10-20 | Shin-Etsu Chemical Co., Ltd. | Hydrosilylation method, method for producing organosilicon compound, and organosilicon compound |
US10894801B2 (en) * | 2018-07-03 | 2021-01-19 | Evonik Operations Gmbh | Process for producing alkylalkoxysilanes |
CN113717211A (en) * | 2021-08-31 | 2021-11-30 | 石家庄圣泰化工有限公司 | Synthesis method of nitrile-group functionalized organic silicon compound |
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