KR100469945B1 - Manufacturing Method of Vinyl Chlorosilane - Google Patents
Manufacturing Method of Vinyl Chlorosilane Download PDFInfo
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- KR100469945B1 KR100469945B1 KR1019960078621A KR19960078621A KR100469945B1 KR 100469945 B1 KR100469945 B1 KR 100469945B1 KR 1019960078621 A KR1019960078621 A KR 1019960078621A KR 19960078621 A KR19960078621 A KR 19960078621A KR 100469945 B1 KR100469945 B1 KR 100469945B1
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- chloride
- hydrogen
- vinyl
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- DMZWVCJEOLBQCZ-UHFFFAOYSA-N chloro(ethenyl)silane Chemical compound Cl[SiH2]C=C DMZWVCJEOLBQCZ-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 238000006243 chemical reaction Methods 0.000 claims abstract description 62
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 24
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 239000003054 catalyst Substances 0.000 claims abstract description 15
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 15
- 239000010703 silicon Substances 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 14
- 239000010949 copper Substances 0.000 claims abstract description 14
- 239000000460 chlorine Substances 0.000 claims abstract description 13
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims abstract description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 11
- 239000001257 hydrogen Substances 0.000 claims abstract description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 10
- 229910052793 cadmium Inorganic materials 0.000 claims description 5
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 5
- 150000001805 chlorine compounds Chemical class 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
- 150000001348 alkyl chlorides Chemical class 0.000 abstract description 6
- 239000007789 gas Substances 0.000 abstract description 6
- 239000002243 precursor Substances 0.000 abstract description 5
- 229920002545 silicone oil Polymers 0.000 abstract description 5
- 238000002360 preparation method Methods 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 239000007795 chemical reaction product Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 6
- 239000005050 vinyl trichlorosilane Substances 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 5
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 4
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 3
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 3
- 239000005047 Allyltrichlorosilane Substances 0.000 description 3
- KGTZBTUOZOIOBJ-UHFFFAOYSA-N dichloro(ethenyl)silicon Chemical compound Cl[Si](Cl)C=C KGTZBTUOZOIOBJ-UHFFFAOYSA-N 0.000 description 3
- MJVFSDBAXDCTOC-UHFFFAOYSA-N dichloro(prop-2-enyl)silicon Chemical compound Cl[Si](Cl)CC=C MJVFSDBAXDCTOC-UHFFFAOYSA-N 0.000 description 3
- FBBDOOHMGLLEGJ-UHFFFAOYSA-N methane;hydrochloride Chemical compound C.Cl FBBDOOHMGLLEGJ-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- HKFSBKQQYCMCKO-UHFFFAOYSA-N trichloro(prop-2-enyl)silane Chemical compound Cl[Si](Cl)(Cl)CC=C HKFSBKQQYCMCKO-UHFFFAOYSA-N 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- 229910018594 Si-Cu Inorganic materials 0.000 description 2
- 229910008465 Si—Cu Inorganic materials 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- 229940045803 cuprous chloride Drugs 0.000 description 2
- VTEHVUWHCBXMPI-UHFFFAOYSA-N dichloro-bis(prop-2-enyl)silane Chemical compound C=CC[Si](Cl)(Cl)CC=C VTEHVUWHCBXMPI-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 238000004508 fractional distillation Methods 0.000 description 2
- 239000005055 methyl trichlorosilane Substances 0.000 description 2
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- AXCNWKLYKOYSCC-UHFFFAOYSA-N [Si](Cl)(Cl)(Cl)Cl.[P] Chemical compound [Si](Cl)(Cl)(Cl)Cl.[P] AXCNWKLYKOYSCC-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical class C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 229920003020 cross-linked polyethylene Polymers 0.000 description 1
- 239000004703 cross-linked polyethylene Substances 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- HVXTXDKAKJVHLF-UHFFFAOYSA-N silylmethylsilane Chemical class [SiH3]C[SiH3] HVXTXDKAKJVHLF-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/80—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with zinc, cadmium or mercury
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
본 발명은 다음 화학식 1로 표시되는 비닐클로로실란의 제조방법에 관한 것으로서, 더욱 상세하게는 유동층 반응조나 교반형 반응조에서 금속규소를 구리촉매화에서 비닐클로라이드와 염화수소 혹은 반응 중에 분해하여 염화수소를 발생시키는 알킬클로라이드의 혼합기체를 특정의 반응온도에서 직접 반응시킴으로써, 실리콘 오일의 제조물질, 알콕시실란의 전구체 등으로 매우 유용한 비닐클로로실란을 보다 온화한 반응조건에서 고수율로 제조하는 새롭고도 진보된 제조방법에 관한 것이다.The present invention relates to a method for producing vinyl chlorosilane represented by the following formula (1), and more particularly, in the fluidized bed reaction tank or stirred reactor, the metal silicon is decomposed to vinyl chloride and hydrogen chloride or reaction during copper catalyst to generate hydrogen chloride. By directly reacting the mixed gas of alkyl chloride at a specific reaction temperature, a new and advanced process for producing vinylchlorosilane, which is very useful as a material for the preparation of silicone oil, a precursor of alkoxysilane, etc. in high yield under milder reaction conditions It is about.
[화학식 1][Formula 1]
상기 화학식 1에서, R1은 수소 또는 염소를 나타낸다.In Formula 1, R 1 represents hydrogen or chlorine.
Description
본 발명은 다음 화학식 1로 표시되는 비닐클로로실란의 제조방법에 관한 것으로서, 더욱 상세하게는 유동층 반응조나 교반형 반응조에서 금속규소를 구리촉매화에서 비닐클로라이드와 염화수소 혹은 반응 중에 분해하여 염화수소를 발생시키는 알킬클로라이드의 혼합기체를 특정의 반응온도에서 직접 반응시킴므로써, 실리콘 오일의 제조물질, 알콕시실란의 전구체 등으로 매우 유용한 비닐클로로실란을 보다 온화한 반응조건에서 고수율로 제조하는 새롭고도 진보된 제조방법에 관한 것이다.The present invention relates to a method for producing vinyl chlorosilane represented by the following formula (1), and more particularly, in the fluidized bed reaction tank or stirred reactor, the metal silicon is decomposed to vinyl chloride and hydrogen chloride or reaction during copper catalyst to generate hydrogen chloride. A new and advanced process for producing vinylchlorosilane, which is very useful as a preparation material for silicone oils, precursors of alkoxysilanes, etc. at high yields under milder reaction conditions by directly reacting mixed gases of alkyl chlorides at specific reaction temperatures. It is about.
[화학식 1][Formula 1]
상기 화학식 1에서, R1은 수소 또는 염소를 나타낸다.In Formula 1, R 1 represents hydrogen or chlorine.
종래에도 비닐기와 Si-H 결합을 동시에 갖는 비닐실란 화합물들은 비닐기로 인한 자체중합이나 자체 수소규소화 반응을 통해 쉽게 고분자화가 가능한 것으로 알려져 있다 [Korshak, V. V. ; Polvakova, A. M. ; Mironov, V. F. ; Petrov, A. D. Izvst. Akad. Nauk S.S.S.R., Otdel. Khim, Nauk, 1116, 1959].Conventionally, vinylsilane compounds having a vinyl group and a Si-H bond at the same time are known to be easily polymerized through self-polymerization or self-siliconization reaction due to vinyl groups [Korshak, V. V.; Polvakova, A. M.; Mironov, V. F.; Petrov, A. D. Izvst. Akad. Nauk S.S.S.R., Otdel. Khim, Nauk, 1116, 1959].
일반적으로 일액형 실리콘 고무는 비닐기를 갖는 실리콘 오일을 Si-H 결합이 포함된 직쇄형 실리콘 오일과 백금촉매 등을 이용하여 가교시킴으로써 실리콘 고무를 제조하게 되므로 비닐실란들은 비닐기를 갖는 실리콘 오일을 제조하는데 중요한 출발물질로 이용되고 있다. 또, 비닐트리클로로실란은 비닐트리알콕시실란의 제조를 위한 전구체로서 비닐트리알콕시실란은 수가교 폴리에틸렌의 가교도를 높여주는 커플링제로서도 중요한 화합물이다.In general, one-component silicone rubber crosslinks a silicone oil having a vinyl group with a straight-type silicone oil containing a Si-H bond and a platinum catalyst. Thus, vinylsilanes are used to prepare a silicone oil having a vinyl group. It is used as an important starting material. In addition, vinyltrichlorosilane is a precursor for the production of vinyltrialkoxysilane, and vinyltrialkoxysilane is also an important compound as a coupling agent for increasing the degree of crosslinking of the crosslinked polyethylene.
미국특허 제2,380,995호에서 금속규소와 염화메탄을 구리촉매 하에서 직접 반응시켜 메틸클로로실란들을 제조하는 것이 소개된 이후 오늘날 실리콘 공업에서는 이 기술을 이용하여 모노머들을 생산하고 있다.Since the introduction of US Pat. No. 2,380,995 to the production of methylchlorosilanes by direct reaction of metal silicon chloride with methane under a copper catalyst, today the silicon industry uses this technique to produce monomers.
[반응식 1]Scheme 1
상기 반응식 1에서 주생성물인 디메틸디클로로실란 이외에 부산물로서 메틸트리클로로실란, 트리메틸클로로실란, 메틸디클로로실란 등이 얻어지는데, 이들 부산물의 조성은 촉매, 조촉매, 반응온도, 반응압력에 따라 달라진다.In addition to the main product dimethyldichlorosilane in Scheme 1, methyl trichlorosilane, trimethylchlorosilane, methyldichlorosilane, and the like are obtained as by-products, and the composition of these by-products depends on the catalyst, the promoter, the reaction temperature, and the reaction pressure.
염화메탄 이외의 유기염화물과 금속규소와의 반응도 많은 연구가 진행되어 왔다 [Voorhoeve, R. J. H. Organohalosilanes; Precursors to Silicones, Elsevier Publishing Company, 1967]. 특히, 허드는 비닐클로라이드와 금속규소의 직접반응에 의한 비닐클로로실란의 제조에 관하여 처음 보고하였다 [Hurd, D. T. J. Am. Chem. Soc. 1945, 67, 1813, 미국특허 제 2,420,912 호(1947)]. 그는 300∼400 ℃의 반응온도에서 반응시켰을 때 디비닐디클로로실란 및 비닐트리클로로실란을 각각 10 % 및 20 %의 수율로 합성할 수 있다고 보고하였다.Many studies have been conducted on the reaction between organic chlorides and metal silicon other than methane [Voorhoeve, R. J. H. Organohalosilanes; Precursors to Silicones, Elsevier Publishing Company, 1967. In particular, Hurd first reported on the preparation of vinylchlorosilanes by the direct reaction of vinyl chloride and metal silicon [Hurd, D. T. J. Am. Chem. Soc. 1945, 67, 1813, US Pat. No. 2,420,912 (1947). He reported that when reacted at a reaction temperature of 300-400 ° C., divinyldichlorosilane and vinyltrichlorosilane could be synthesized in yields of 10% and 20%, respectively.
[반응식 2]Scheme 2
그러나 상기 반응식 2와 같은 방법의 반응은 수율이 낮아 현재 공업적으로는 사용되고 있지 않은 방법이다.However, the reaction of the same method as in Scheme 2 has a low yield and is not currently used industrially.
현재 비닐실란을 제조하는 방법으로는 규소-수소 결합을 갖고 있는 히드로실란과 비닐클로라이드를 500∼550 ℃에서 고온 축합반응시켜 얻거나 히드로실란과 아세틸렌을 백금촉매 하에서 수소규소화 반응시켜 얻는 방법 등이 이용되고 있다.Currently, a method of preparing vinyl silane is obtained by high-temperature condensation reaction of hydrosilane and silicon chloride having a silicon-hydrogen bond at 500 to 550 ° C., or by hydrogenation of hydrosilane and acetylene under a platinum catalyst. It is used.
그러나, 이러한 제조방법들은 비닐실란을 얻기 위해서 직접 합성에 의한 히드로실란의 합성을 먼저 거쳐야하기 때문에 2단계의 반응을 거쳐야 하는 단점이 있다. 또, 아세틸렌의 수소규소화 반응에 의한 제조법의 경우 값비싼 백금촉매를 사용해야하고 반응에 압력을 필요로 하므로 폭발의 위험성 등과 같은 치명적인 단점이 있다.However, these production methods have a disadvantage of having to undergo two-step reaction because the hydrosilane must be first synthesized by direct synthesis to obtain vinylsilane. In addition, in the case of the manufacturing method by the hydrogen silicide reaction of acetylene, expensive platinum catalyst and the pressure required for the reaction has a fatal disadvantage, such as the risk of explosion.
비닐클로라이드 이외의 다른 클로로알켄류의 금속규소와의 직접반응에 관한 기술내용 중에서 알릴클로라이드의 경우는 반응의 주 생성물로 기대되는 디알릴디클로로실란의 생성률이 가장 낮고 알릴디클로로실란 및 알릴트리클로로실란이 주생성물로 생성된다는 보고가 있었다. 이는 반응온도에서 알릴클로라이드가 분해하여 염화수소를 내고 이 염화수소가 반응에 참여하여 알릴디클로로실란 및 알릴트리클로로실란이 형성되는 것으로 보고되었다. 또 디알릴디클로로실란의 생성량이 적은 것은 이 화합물이 반응온도에서 자체 중합하여 고분자물질을 생성시키기 때문이며 이는 금속규소의 활성을 저하시키는 원인이 되기도 한다.In the description of the direct reaction of chloroalkenes other than vinyl chloride with metal silicon, allyl chloride has the lowest production rate of diallyldichlorosilane, which is expected as the main product of the reaction, and allyldichlorosilane and allyltrichlorosilane. It has been reported to be produced as the main product. It has been reported that allyl chloride decomposes at the reaction temperature to give hydrogen chloride, which hydrogen chloride participates in the reaction to form allyldichlorosilane and allyltrichlorosilane. In addition, the small amount of diallyldichlorosilane produced is because the compound self-polymerizes at the reaction temperature to generate a polymer material, which may cause a decrease in the activity of the metal silicon.
이러한 현상을 막기 위한 방법으로 대한민국특허 공고 제95-2860호에서는 다음 반응식 3과 같이 알릴클로라이드와 염화수소의 혼합물을 220∼350 ℃에서 금속 규소와 반응시키면 규소-수소결합을 가진 알릴디클로로실란을 주 생성물로 얻고 부산물로 알릴트리클로로실란을 얻을 수 있는 기술이 개시되어 있다.In order to prevent such a phenomenon, Korean Patent Publication No. 95-2860 discloses an allyldichlorosilane having a silicon-hydrogen bond when a mixture of allyl chloride and hydrogen chloride is reacted with metal silicon at 220 to 350 ° C. as in Scheme 3 below. A technique for obtaining allyltrichlorosilane as a byproduct is disclosed.
[반응식 3]Scheme 3
염화수소와 클로로메틸기를 갖는 화합물의 혼합물이 직접반응에 이용된 또 다른 예로는 클로로메틸기를 가진 실란화합물과 염화수소의 혼합물을 반응시켜 비스(실릴)메탄들을 합성하는 것으로서, 여기에서는 규소-수소결합을 갖는 비스(실릴)메탄 화합물을 주 생성물로 얻을 수 있다고 기재하고 있다 [대한민국특허 출원 제91-24243호].Another example where a mixture of hydrogen chloride and a compound having a chloromethyl group is used in the direct reaction is a reaction of a mixture of a silane compound having a chloromethyl group and a hydrogen chloride to synthesize bis (silyl) methanes, in which a silicon-hydrogen bond It is described that a bis (silyl) methane compound can be obtained as a main product [Korean Patent Application No. 91-24243].
본 발명은 종래와는 달리 비닐트리알콕시실란의 제조방법에서 촉매로서 구리를 사용하고 또 비닐클로라이드와 염화수소 혹은 반응 중에 염화수소를 발생시키는 알킬클로라이드의 혼합기체를 특정온도에서 반응시킴으로써 보다 온화한 조건에서 고수율로 목적물인 비닐클로로실란을 제조하는 개선된 방법을 제공하는데 그 목적이 있다.The present invention, unlike the prior art, by using copper as a catalyst in the production method of vinyltrialkoxysilane and by reacting a mixture gas of vinyl chloride and hydrogen chloride or alkyl chloride which generates hydrogen chloride during the reaction at a specific temperature, high yield under milder conditions It is an object of the present invention to provide an improved method for preparing vinylchlorosilane, which is a target.
본 발명은 비닐클로로실란을 제조함에 있어서, 다음 화학식 2로 표시되는 비닐클로라이드 화합물과 다음 화학식 3으로 표시되는 클로라이드 화합물의 혼합기체를 금속규소와 직접 반응시켜서 다음 화학식 1로 표시되는 비닐클로로실란을 제조하는 것을 그 특징으로 한다.In the present invention, in preparing a vinylchlorosilane, a mixed gas of a vinyl chloride compound represented by the following Chemical Formula 2 and a chloride compound represented by the following Chemical Formula 3 is directly reacted with metal silicon to produce a vinylchlorosilane represented by the following Chemical Formula 1. It is characterized by that.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
[화학식 3][Formula 3]
상기 화학식들 중에서,Among the above formula,
R1은 수소 또는 염소를 나타내며,R 1 represents hydrogen or chlorine,
R2는 수소, 염소, C1∼C4의 저급알킬기 또는 -CH2CH2Cl을 나타낸다.R 2 represents a lower alkyl group or a -CH 2 CH 2 Cl of hydrogen, chlorine, C 1 ~C 4.
본 발명에서는 상기 화학식 2와 같은 비닐클로라이드와 상기 화학식 3과 같은 염화수소 혹은 알킬클로라이드와의 혼합기체를 금속규소와 직접 반응시키면 목적하는 상기 화학식 1의 비닐클로로실란들을 얻을 수 있는 바, 상기 화학식 3의 알킬클로라이드는 반응조건에서 염화수소나 염소를 발생시켜 염화수소나 염소의 공급원으로 사용되는 화합물이다. 본 발명에 따르면 상기 화학식 3 화합물의 예로는 염화수소, 탄소수 1∼4개의 알킬클로라이드, 1,2-디클로로에탄 등을 들 수 있는데, 1,2-디클로로에탄을 사용하는 경우 비닐트리클로로실란을 주 생성물로 얻을 수 있다. 본 발명의 반응과정을 보다 자세히 설명하면, 유동층 반응조나 교반형 반응조를 이용하여 금속규소를 구리촉매 하에서 비닐클로라이드와 염화수소 혹은 반응중에 염화수소를 낼 수 있는 상기 화학식 3과 같은 유기염화물의 혼합기체를 300∼500 ℃에서 직접 반응시키면 다음 반응식 4와 같은 반응을 통해 비닐클로로실란을 얻을 수 있다. 본 발명에 따르면, 규소-수소 결합을 가진 비닐디클로로실란의 생성량을 높이기 위해서는 상기 화학식 2 화합물에 대하여 유입되는 상기 화학식 3 화합물을 몰비로 1.0∼5.0 배 사용할 수 있겠으나 바람직하게는 1.0∼3.0 배가 적당하다. 또 실란커플링제의 전구체로 사용되는 비닐트리클로로실란의 생성량을 높이기 위해서는 염소나 1,2-디클로로에탄을 사용하는 것이 좋다. 다만 직접 염소를 사용하는 경우에는 반응열이 과다하게 발생되므로 효과적으로 반응열을 제거해 주는 것이 중요하다. 본 발명에서는 스텐레스 스틸로 제작된 유동층 반응조를 사용하였으며 연속적으로 반응시키는 것이 가능하였다. 금속규소는 98 % 이상의 순도를 갖는 것을 사용하는 것이 바람직하며, 반응조의 온도는 300∼500 ℃까지 가능하나, 바람직하게는 400∼450 ℃가 적합하다. 반응압력은 상압에서 6 kg/㎠까지 사용할 수 있으며 압력을 높일수록 반응속도가 빨라진다. 한편, 본 발명에서 촉매로는 구리 또는 반응조건에서 구리를 낼 수 있는 구리화합물들을 사용할 수 있다. 구리의 사용량은 전체 접촉혼합물 무게의 5∼10 %가 적합하다. 또한, 구리촉매에 대하여 0.001∼5 %의 조촉매를 사용하면 반응속도를 높일 수도 있고 특정화합물의 선택성도 높일 수 있다. 이 반응을 위한 조촉매로는 아연, 카드뮴, 티타늄, 망간, 마그네슘, 은, 주석 등을 사용할 수 있으나 이들에 국한하지는 않는다.In the present invention, by directly reacting a mixed gas of vinyl chloride such as Chemical Formula 2 with hydrogen chloride or alkyl chloride such as Chemical Formula 3 with metal silicon, the desired vinyl chlorosilanes of Chemical Formula 1 may be obtained. Alkyl chloride is a compound used as a source of hydrogen chloride or chlorine by generating hydrogen chloride or chlorine under the reaction conditions. According to the present invention, examples of the compound represented by Formula 3 include hydrogen chloride, alkyl chloride having 1 to 4 carbon atoms, 1,2-dichloroethane, and the like, and vinyl trichlorosilane may be used when 1,2-dichloroethane is used. Can be obtained. In more detail, the reaction process of the present invention, using a fluidized bed reaction tank or a stirred reactor, the mixture of organic chlorides such as the formula (3) that can produce vinyl chloride and hydrogen chloride or hydrogen chloride during the reaction of metal silicon in copper catalyst 300 When directly reacted at ˜500 ° C., vinylchlorosilane may be obtained through a reaction as in Scheme 4 below. According to the present invention, in order to increase the amount of vinyldichlorosilane having a silicon-hydrogen bond, the compound of Formula 3 introduced into the compound of Formula 2 may be used in a molar ratio of 1.0 to 5.0 times, but preferably 1.0 to 3.0 times. Do. In order to increase the amount of vinyl trichlorosilane used as a precursor of the silane coupling agent, it is preferable to use chlorine or 1,2-dichloroethane. However, when using chlorine directly, it is important to remove the heat of reaction effectively because the heat of reaction is excessively generated. In the present invention, a fluidized bed reactor made of stainless steel was used, and it was possible to react continuously. Metal silicon is preferably used having a purity of 98% or more, the temperature of the reaction tank can be up to 300 ~ 500 ℃, preferably 400 ~ 450 ℃. The reaction pressure can be used up to 6 kg / ㎠ at normal pressure and the higher the pressure, the faster the reaction rate. Meanwhile, in the present invention, as a catalyst, copper or copper compounds capable of producing copper under reaction conditions may be used. The amount of copper used is 5-10% of the total weight of the contact mixture. In addition, the use of 0.001 to 5% of a cocatalyst relative to the copper catalyst can increase the reaction rate and enhance the selectivity of a specific compound. Cocatalysts for this reaction may include, but are not limited to, zinc, cadmium, titanium, manganese, magnesium, silver, tin, and the like.
이하, 본 발명을 실시예에 의해 더욱 상세히 설명하겠는 바, 본 발명이 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited by Examples.
실시예 1Example 1
염화제일구리(CuCl) 124.6 g을 막자사발에 넣고 미세하게 분쇄한 후 금속규소 720 g과 잘 섞어서 반응조에 넣은 다음 반응조의 온도를 270 ℃로 높인 후 건조된 질소를 300 ㎖/min의 속도로 흘려주면서 2 시간동안 건조시켰다. 건조 후 반응조의 온도를 370 ℃ 이상으로 가열하면 반응생성물로 테트라클로로실란이 부산물로 생성되고 활성이 큰 Si-Cu 접촉혼합물이 생성되게 되는데, 이 온도에서 3 시간동안 유지시켜 접촉혼합물을 제조하고 부산물인 테트라클로로실란은 받아냈다. 주촉매인 구리 이외에 조촉매로 아연을 사용하는 경우에는 접촉혼합물 제조가 완료된 후에 질소대기하에서 반응조의 온도를 상온까지 내린 후 반응조의 윗 부분으로부터 필요량의 조촉매를 투입하고 온도를 올리면서 잘 섞어주었다.124.6 g of cuprous chloride (CuCl) was put in a mortar and finely ground. After mixing finely with 720 g of metal silicon, the mixture was placed in a reactor. After raising the temperature of the reactor to 270 ° C, flowing dried nitrogen at a rate of 300 ml / min. Allowed to dry for 2 hours. After drying, the temperature of the reaction tank is heated to 370 ° C. or higher to produce tetrachlorosilane as a by-product as a reaction product, and a highly active Si-Cu contact mixture is produced. The mixture is maintained at this temperature for 3 hours to prepare a contact mixture. Phosphorus tetrachlorosilane was received. In the case of using zinc as a promoter other than copper as the main catalyst, after the preparation of the contact mixture was completed, the temperature of the reactor was lowered to room temperature under nitrogen atmosphere, and then the required amount of promoter was added from the upper part of the reactor and the temperature was well mixed. .
실시예 2Example 2
금속규소 720 g과 구리촉매 80 g을 잘 혼합한 후에 300 ℃에서 약 2 시간동안 건조시키고 반응조의 온도를 350 ℃로 올린 후 염화메탄을 반응조 아래로부터 반응조에 투입하면 반응 초기에는 약간의 물이 생성되다가 약 1 시간 후에는 반응 생성물인 디메틸디클로로실란과 메틸트리클로로실란 등이 생성되어 받게 플라스크에 모아지게 된다. 이들이 생성되기 시작하는 것은 Si-Cu의 접촉혼합물이 생성되고 있다는 증거이며 이후 약 2 시간동안 염화메탄과 반응시킨 후 염화메탄의 공급을 중단하고 조촉매가 필요한 경우에는 상기 실시예 1과 같은 방법으로 조촉매를 투입하고 반응에 사용하였다.720 g of metal silicon and 80 g of copper catalyst are mixed well, dried at 300 ° C. for about 2 hours, the temperature of the reactor is raised to 350 ° C., and methane chloride is introduced into the reactor from below. After about 1 hour, dimethyldichlorosilane and methyltrichlorosilane, which are reaction products, are generated and collected in the flask. They are starting to produce evidence that a contact mixture of Si-Cu is being produced. After reacting with methane chloride for about 2 hours, the supply of methane chloride is stopped and a promoter is required in the same manner as in Example 1 above. A promoter was added and used for the reaction.
실시예 3Example 3
상기 실시예 2에서 제조한 접촉혼합물 800 g에 조촉매로 카드뮴 4 g을 유동층 반응조에 넣은 후 반응온도를 420 ℃로 올리고 반응조의 아랫부분에 장치한 예열관을 통하여 비닐클로라이드를 183 ㎖/min(1.473 mole/hr)의 속도로 불어넣어 주면서 동시에 염화수소를 550 ㎖/min(2.946 mole/hr)의 속도로 반응조에 유입시켰다. 이때 접촉혼합물의 유동화를 돕기 위하여 건조된 질소를 400 ㎖/min의 속도로 함께 사용하였다.4 g of cadmium was added to 800 g of the contact mixture prepared in Example 2 as a cocatalyst in a fluidized bed reactor, and the reaction temperature was raised to 420 ° C., and vinyl chloride was added to 183 ml / min. While blowing at a rate of 1.473 mole / hr, hydrogen chloride was introduced into the reactor at a rate of 550 ml / min (2.946 mole / hr). At this time, the dried nitrogen was used together at a rate of 400 ml / min to help fluidize the contact mixture.
반응시작 직후부터 발열반응에 의한 온도상승이 관찰되었고 반응생성물은 반응조의 윗 부분에 장치된 받게 플라스크에 모아지기 시작하였다. 이와 같은 반응조건을 계속 유지하면서 매 1 시간마다 반응생성물을 받아냈다. 3 시간동안의 반응에 사용된 비닐클로라이드는 276 g이었으며 여기서 얻어진 반응생성물의 총량은 486 g이었다.Immediately after the start of the reaction, an increase in temperature due to exothermic reaction was observed, and the reaction product began to collect in the receiving flask installed in the upper part of the reactor. The reaction product was received every hour while maintaining these reaction conditions. The vinyl chloride used for the reaction for 3 hours was 276 g and the total amount of reaction product obtained was 486 g.
생성된 반응생성물은 기체 크로마트그라프를 이용하여 분석하고 분별증류를 통하여 각 성분을 분리하였다. 분별증류 결과 비닐디클로로실란 181 g(37 %), 비닐트리클로로실란 155 g(32 %) 생성되었으며, 그 외의 부산물로 트리클로로실란과 테트라클로로실란이 각각 85 g(18 %) 및 12 g(3 %)이 생성되었다. 그 외의 고비점화합물이 약 10 % 포함되어 있었다.The resulting reaction product was analyzed using gas chromatograph and separated through the fractional distillation. Fractional distillation produced 181 g (37%) of vinyldichlorosilane and 155 g (32%) of vinyltrichlorosilane. Other byproducts were 85 g (18%) and 12 g (3) of trichlorosilane and tetrachlorosilane, respectively. %) Was generated. Other high boiling point compounds contained about 10%.
실시예 4Example 4
상기 실시예 1에서 제조한 접촉혼합물 800 g과 조촉매로 카드뮴 4 g을 유동층 반응조에 넣고 상기 실시예 3과 같은 반응조건에서 반응시켰다. 3 시간동안의 반응에서 얻어진 반응생성물의 양은 452 g이었다.800 g of the contact mixture prepared in Example 1 and 4 g of cadmium were added to a fluidized bed reactor as a cocatalyst and reacted under the same reaction conditions as in Example 3. The amount of reaction product obtained in the reaction for 3 hours was 452 g.
반응생성물의 조성을 분석해본 결과 비닐디클로로실란 136 g(30 %), 비닐트리클로로실란 167 g(37 %), 트리클로로실란 90 g(20 %), 테트라클로로실란 23 g(5 %) 생성되었으며 그 밖의 고비점 화합물이 8 % 생성되었다.Analysis of the reaction product yielded 136 g (30%) of vinyldichlorosilane, 167 g (37%) of vinyltrichlorosilane, 90 g (20%) of trichlorosilane, and 23 g (5%) of tetrachlorosilane. 8% of the high boiling point compound was produced.
실시예 5Example 5
상기 실시예 2에서 제조한 접촉화합물을 이용하여 상기 실시예 3과 같은 반응조건 중 반응온도만을 변화시켜 반응시킨 결과를 다음 표 1에 수록하였다.Using the contact compound prepared in Example 2, the reaction result of only changing the reaction temperature in the same reaction conditions as in Example 3 is listed in Table 1 below.
[표 1]TABLE 1
실시예 6Example 6
상기 실시예 2에서 제조한 접촉혼합물을 이용하여 실시예 3과 같은 반응조건 중 비닐클로라이드와 염화수소의 몰비만을 변화시켜 반응시킨 결과를 다음 표 2에 수록하였다.Table 2 shows the results of reacting only the molar ratio of vinyl chloride and hydrogen chloride in the reaction conditions as in Example 3 using the contact mixture prepared in Example 2.
[표 2]TABLE 2
실시예 7Example 7
상기 실시예 2에서 제조한 접촉혼합물을 이용하여 실시예 3과 같은 반응조건 중 반응압력만을 변화시켜 반응시킨 결과를 다음 표 3에 수록하였다.Using the contact mixture prepared in Example 2, only the reaction pressure was changed in the same reaction conditions as in Example 3, and the results are shown in Table 3 below.
[표 3]TABLE 3
실시예 8Example 8
상기 실시예 2에서 제조한 접촉혼합물을 사용하여 실시예 3과 같은 반응조건에서 반응시켰으나 염화수소의 공급원으로서 염화수소 대신에 여러 가지 유기염화물을 사용하여 반응시킨 결과를 다음 표 4에 나타내었다. 여기서 유기염화물의 사용량을 반으로 줄이고 줄인 양 만큼의 염화수소를 사용하였을 경우에도 같은 결과를 얻었다.The reaction mixture prepared in Example 2 was reacted under the same reaction conditions as in Example 3, but the reaction results using various organic chlorides instead of hydrogen chloride as a source of hydrogen chloride are shown in Table 4 below. The same result was obtained when the amount of the organic chloride was reduced by half and the amount of hydrogen chloride used was reduced.
[표 4]TABLE 4
상술한 바와 같이, 본 발명에 따른 제조방법은 종래보다 경제적이고 간단하면서도 온화한 조건에서 고수율의 비닐클로로실란을 제조할 수 있는 효과가 있는 것이다.As described above, the production method according to the present invention has the effect of producing a high yield of vinyl chlorosilane in a simpler and more economical conditions than conventional.
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US2770634A (en) * | 1953-07-17 | 1956-11-13 | Dow Corning | Method of producing vinylchlorosilanes |
US3666782A (en) * | 1970-09-30 | 1972-05-30 | Union Carbide Corp | Process for producing vinylchlorosilanes |
US3706776A (en) * | 1970-01-20 | 1972-12-19 | Dynamit Nobel Ag | Process for the manufacture of vinyl trichlorosilane |
US5075480A (en) * | 1990-05-18 | 1991-12-24 | Huels Aktiengesellschaft | Process for the preparation of vinyltrichlorosilane |
US5338876A (en) * | 1992-06-13 | 1994-08-16 | Korea Institute Of Science And Technology (Kist) | Alkenylchlorosilanes and direct synthesis thereof |
US5344950A (en) * | 1990-01-23 | 1994-09-06 | Huls Aktiengesellschaft | Process for the preparation of vinylchlorosilanes |
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US2770634A (en) * | 1953-07-17 | 1956-11-13 | Dow Corning | Method of producing vinylchlorosilanes |
US3706776A (en) * | 1970-01-20 | 1972-12-19 | Dynamit Nobel Ag | Process for the manufacture of vinyl trichlorosilane |
US3666782A (en) * | 1970-09-30 | 1972-05-30 | Union Carbide Corp | Process for producing vinylchlorosilanes |
US5344950A (en) * | 1990-01-23 | 1994-09-06 | Huls Aktiengesellschaft | Process for the preparation of vinylchlorosilanes |
US5075480A (en) * | 1990-05-18 | 1991-12-24 | Huels Aktiengesellschaft | Process for the preparation of vinyltrichlorosilane |
US5338876A (en) * | 1992-06-13 | 1994-08-16 | Korea Institute Of Science And Technology (Kist) | Alkenylchlorosilanes and direct synthesis thereof |
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Title |
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Donor-stabilized Vinychlorosilane의 합성과 반응성 연구[연세대학교 대학원 화학과 이수흥) * |
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