JPH08264746A - Drive method for solid state image sensor - Google Patents

Drive method for solid state image sensor

Info

Publication number
JPH08264746A
JPH08264746A JP7067271A JP6727195A JPH08264746A JP H08264746 A JPH08264746 A JP H08264746A JP 7067271 A JP7067271 A JP 7067271A JP 6727195 A JP6727195 A JP 6727195A JP H08264746 A JPH08264746 A JP H08264746A
Authority
JP
Japan
Prior art keywords
charge
bias
solid
accumulating portion
state image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7067271A
Other languages
Japanese (ja)
Inventor
Shinji Osawa
慎治 大澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP7067271A priority Critical patent/JPH08264746A/en
Publication of JPH08264746A publication Critical patent/JPH08264746A/en
Pending legal-status Critical Current

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  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE: To obtain a drive method for a solid state image sensor in which the fixed pattern noise, caused by the fluctuation in the difference of the quantity of charges being read out, can be reduced along with the capacitive residual image. CONSTITUTION: A reverse bias is applied between a charge storing section 19 and a semiconductor substrate and bias charges are injected directly into the charge storing section 19 by the reverse current thus partially resetting the bias charges to a charge transfer section 18.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はテレビカメラ等に使用さ
れる固体撮像装置に係わり、特に電荷蓄積部に対してバ
イアス電荷の注入・排出動作を行う固体撮像装置の駆動
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device used in a television camera or the like, and more particularly to a method of driving a solid-state image pickup device for performing bias charge injection / discharge operations to / from a charge storage section.

【0002】[0002]

【従来の技術】近年、放送用カメラや家庭用ビデオムー
ビー等の撮像装置として、信号走査部に電荷結合素子
(Charge Coupled Device:CC
D)を用いた固体撮像装置が広く利用されている。また
最近では、受光部領域の上に光電変換膜を積層した二階
建て構造の固体撮像装置が開発されている。この二階建
て構造の光導電膜積層型の固体撮像装置は、微小画素に
おいても高い感度を維持できるという優れた特徴を持っ
ており、光精細テレビジョン用等のカメラの撮像装置と
して最も期待されている。
2. Description of the Related Art In recent years, a charge coupled device (CC) is provided in a signal scanning section as an image pickup apparatus for a broadcast camera, a home video movie or the like.
Solid-state imaging devices using D) are widely used. In addition, recently, a solid-state imaging device having a two-story structure in which a photoelectric conversion film is laminated on a light receiving region has been developed. The solid-state image pickup device of the photoconductive film laminated type of the two-story structure has an excellent feature that it can maintain high sensitivity even in a minute pixel, and is most expected as an image pickup device of a camera for optical definition television. There is.

【0003】ところで、光導電膜積層型の固体撮像装置
には、素子の特性を劣化させる容量性残像が生じるとい
う問題がある。容量性残像は、画素に蓄積された信号電
荷を完全に読み出し切れないために生じ、特に低照度で
の画像を劣化させる。そのため、この容量性残像をなく
すために、通常は次のような駆動方法が採用されてい
る。
By the way, the photoconductive film laminated type solid-state image pickup device has a problem that a capacitive afterimage which deteriorates the characteristics of the element occurs. The capacitive afterimage occurs because the signal charge accumulated in the pixel cannot be completely read out, and deteriorates the image particularly in low illuminance. Therefore, in order to eliminate this capacitive afterimage, the following driving method is usually adopted.

【0004】図4は固体撮像装置の平面概略図である。
画素領域12内に形成された、電荷蓄積部15内の信号
電荷は、電荷転送部14に読み出された後、メモリ部1
3へと転送され、TV信号フォーマットに合わせて水平
CCD10を通り、電荷検出器11で検出され、電気信
号として出力される。一方容量性残像をなくすために、
電荷注入排出ダイオード1より、電荷転送部14を通し
て電荷蓄積部15にバイアス電荷が注入される。この注
入されたバイアス電荷と残像電荷を電荷蓄積部15から
電荷転送部14へリセットすることで容量性残像は低減
される。
FIG. 4 is a schematic plan view of the solid-state image pickup device.
The signal charge in the charge storage section 15 formed in the pixel region 12 is read out to the charge transfer section 14, and then the memory section 1
3 is transferred to the digital camera 3, passed through the horizontal CCD 10 according to the TV signal format, detected by the charge detector 11, and output as an electric signal. On the other hand, in order to eliminate the capacitive afterimage,
Bias charges are injected from the charge injection / discharge diode 1 into the charge storage unit 15 through the charge transfer unit 14. By resetting the injected bias charge and afterimage charge from the charge storage section 15 to the charge transfer section 14, the capacitive afterimage is reduced.

【0005】図5は図4におけるA−A´の画素部断面
図である。光導電膜積層型固体撮像素子においては、入
射光は透明電極25を通り、光電変換膜24内で光電変
換され、信号電荷として、画素電極23、引き出し電極
21を通り電荷蓄積部19に蓄積される。この信号電荷
は転送ゲート20をONすることで電荷転送部18に読
み出され、この電荷転送部18内を順次転送されてい
く。なお各画素は半導体基板16上に形成され、素子分
離領域17により分離されている。バイアス電荷は図6
のポテンシャル図に示すようにして注入、リセットされ
る。なお図中斜線部は電荷の存在していることを示す。
まず、信号電荷が転送された直後は図6(a)のよう
に、電荷蓄積部19内に残留電荷27があるのみであ
る。その後、電荷転送部18を通してバイアス電荷28
が電荷蓄積部19内まで注入される図6(b)。注入さ
れたバイアス電荷28は電荷蓄積部19より電荷転送部
18へリセットされる(図6(c))。このときに電荷
転送部18には、バイアス電荷の残留電荷28が残って
いる。しかしこのようにバイアス電荷28が、電荷転送
部に残っている場合には、図7に示すように、電荷読み
出しゲート26のポテンシャルが変動しやすく、それ
が、各画素ごとにばらついてしまう。この電位のバラツ
キ29により電荷蓄積部19内にとり残されるバイアス
電荷28の変動分30も大きくなり、これが固定パター
ン雑音となって現れてしまう。また、図8には、図6の
動作を行うときの、転送ゲート2〜5、注入ダイオード
1、透明電極25のタイミング図を概略してある。
FIG. 5 is a sectional view of the pixel portion taken along the line AA 'in FIG. In the photoconductive film stack type solid-state imaging device, incident light passes through the transparent electrode 25 and is photoelectrically converted within the photoelectric conversion film 24, and is accumulated in the charge accumulating portion 19 as a signal charge through the pixel electrode 23 and the extraction electrode 21. It This signal charge is read out to the charge transfer unit 18 by turning on the transfer gate 20, and sequentially transferred in the charge transfer unit 18. Each pixel is formed on the semiconductor substrate 16 and is separated by the element separation region 17. Bias charge is shown in Figure 6.
Is injected and reset as shown in the potential diagram of FIG. The shaded area in the figure indicates the presence of electric charges.
First, immediately after the signal charge is transferred, there is only the residual charge 27 in the charge storage unit 19 as shown in FIG. 6A. After that, the bias charge 28 is passed through the charge transfer unit 18.
Is injected into the charge storage portion 19 (FIG. 6B). The injected bias charge 28 is reset from the charge storage unit 19 to the charge transfer unit 18 (FIG. 6C). At this time, the residual charge 28 of the bias charge remains in the charge transfer unit 18. However, when the bias charge 28 remains in the charge transfer portion as described above, the potential of the charge read gate 26 easily fluctuates as shown in FIG. 7, and it varies from pixel to pixel. Due to this potential variation 29, the variation 30 of the bias charge 28 left in the charge storage section 19 also becomes large, and this appears as fixed pattern noise. Further, FIG. 8 schematically shows a timing chart of the transfer gates 2 to 5, the injection diode 1, and the transparent electrode 25 when the operation of FIG. 6 is performed.

【0006】[0006]

【発明が解決しようとする課題】このように従来の固体
撮像装置の駆動方法では、バイアス電荷のリセット時
に、電荷蓄積部にとり残される電荷量に大きなバラツキ
が各画素ごとに生じるために、画像上、固定パターン雑
音が発生する問題があった。
As described above, in the conventional method for driving the solid-state image pickup device, when the bias charge is reset, a large variation occurs in the amount of charge left in the charge storage section for each pixel, and therefore, an image is not displayed. There was a problem that fixed pattern noise was generated.

【0007】本発明は、上記問題点を考慮してなされた
ものであり、その目的とするところは、読み出し電荷量
のバラツキにより生じる固定パターン雑音を低減するこ
とができる固体撮像装置の駆動方法を提供することにあ
る。
The present invention has been made in consideration of the above problems, and an object of the present invention is to provide a method for driving a solid-state image pickup device capable of reducing fixed pattern noise caused by variations in the amount of read charges. To provide.

【0008】[0008]

【課題を解決するための手段】本発明の骨子は、電荷蓄
積部へのバイアス電荷の注入を、電荷転送部と介さず
に、直接注入することにある。すなわち、本発明は、電
荷蓄積部と、半導体基板、素子分離部などの反導伝型半
導体領域間に、逆バイアス状態となる電圧を印加し、逆
方向電流によって、電荷蓄積部にバイアス電荷を注入す
ることにある。
The essence of the present invention is to directly inject the bias charge into the charge storage section without interposing the charge transfer section. That is, according to the present invention, a voltage in a reverse bias state is applied between the charge storage portion and a semiconductor substrate, an element isolation portion, or other anticonducting semiconductor region, and a bias current is applied to the charge storage portion by a reverse current. To inject.

【0009】[0009]

【作用】本発明によれば、電荷蓄積部へのバイアス電荷
の注入を、電荷転送部を介さずに、直接注入できるた
め、バイアス電荷のリセット時に電荷転送部に残留電荷
がないことから、電荷蓄積部にとり残されるバイアス電
荷のバラツキを小さくおさえることができ、ひいては固
定パターン雑音を低減することができる。
According to the present invention, since the bias charge can be directly injected into the charge storage section without passing through the charge transfer section, there is no residual charge in the charge transfer section when the bias charge is reset. It is possible to reduce variations in the bias charges left in the storage section, and it is possible to reduce fixed pattern noise.

【0010】[0010]

【実施例】本発明におけるバイアス電荷の注入、リセッ
ト動作を図1に示す。尚、構造については、従来技術で
説明した図4、図5を用いて説明する。まず、信号電荷
が転送された直後は図1(a)のように電荷蓄積部19
に残留電荷27があるのみである。その後、たとえば、
従来技術の図5における透明電極25に、半導体基板2
6に対して、正の電圧を印加することで、電荷蓄積部1
9と半導体基板26間に逆バイアスを印加し、逆方向電
流により電荷蓄積部19にバイアス電荷28を注入する
図1(b)。注入されたバイアス電荷28は、電荷蓄積
部19より電荷転送部18へとリセットされる図1
(c)。このとき、電荷転送部18には残留電荷が残っ
ていない。よって、従来の場合とは異なり図2に示すよ
うに、バイアス電荷28を電荷転送部18にリセットす
る場合、電荷読み出しゲート26のポテンシャルは変動
しにくい。このバラツキ31が小さいので、電荷蓄積部
19内にとり残されるバイアス電荷の変動分32が小さ
くなり、固定パターン雑音も低減することができる。ま
た図3には従来技術の図6に示した動作と同様に行うと
きの、転送ゲート2〜5、注入ダイオード1、透明電極
25のタイミング図を概略してある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the injection and reset operation of bias charges according to the present invention. The structure will be described with reference to FIGS. 4 and 5 described in the related art. First, immediately after the signal charges are transferred, as shown in FIG.
There is only a residual charge 27 in the. Then, for example,
The semiconductor substrate 2 is formed on the transparent electrode 25 in FIG.
By applying a positive voltage to the charge storage unit 6,
9B, a reverse bias is applied between the semiconductor substrate 26 and the semiconductor substrate 26, and the bias charge 28 is injected into the charge storage portion 19 by the reverse current. The injected bias charges 28 are reset from the charge storage unit 19 to the charge transfer unit 18.
(C). At this time, no residual charge remains in the charge transfer unit 18. Therefore, unlike the conventional case, as shown in FIG. 2, when the bias charge 28 is reset to the charge transfer unit 18, the potential of the charge read gate 26 is unlikely to change. Since this variation 31 is small, the variation 32 of the bias charge left in the charge storage section 19 is small, and fixed pattern noise can also be reduced. Further, FIG. 3 schematically shows a timing chart of the transfer gates 2 to 5, the injection diode 1, and the transparent electrode 25 when the same operation as that shown in FIG. 6 of the prior art is performed.

【0011】[0011]

【発明の効果】以上説明したように本発明によれば、電
蓄積部にバイアス電荷を注入するのに、電荷転送部を介
さずに、直接注入するために、バイアス電荷の注入、リ
セット時に発生していた固定パターン雑音を低減するこ
とが可能となる。
As described above, according to the present invention, in order to inject the bias charge into the charge storage portion without directly passing through the charge transfer portion, the bias charge is injected at the time of resetting and resetting. It is possible to reduce the fixed pattern noise that was used.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明による固体撮像素子動作ポテンシャル
概念図。
FIG. 1 is a conceptual diagram of an operating potential of a solid-state image sensor according to the present invention.

【図2】 本発明による固体撮像素子リセット時ポテン
シャル概念図
FIG. 2 is a conceptual diagram of the potential of the solid-state image sensor according to the present invention when resetting.

【図3】 本発明による固体撮像素子駆動パルス波形
図。
FIG. 3 is a pulse waveform diagram for driving a solid-state image sensor according to the present invention.

【図4】 固体撮像素子平面図。FIG. 4 is a plan view of a solid-state image sensor.

【図5】 積層型固体撮像素子セル断面図。FIG. 5 is a sectional view of a stacked solid-state imaging device cell.

【図6】 従来の固体撮像素子動作ポテンシャル概念
図。
FIG. 6 is a conceptual diagram of a conventional solid-state imaging device operating potential.

【図7】 従来の固体撮像素子リセット動作時ポテンシ
ャル概念図。
FIG. 7 is a conceptual diagram of a potential during a reset operation of a conventional solid-state image sensor.

【図8】 従来の固体撮像素子駆動パルス波形図。FIG. 8 is a conventional solid-state image sensor drive pulse waveform diagram.

【符号の説明】[Explanation of symbols]

1 バイアス電荷注入、排出ダイオード 2〜5、6〜9 電荷転送ゲート 10 水平CCD 11 電荷検出器 12 画素領域 13 メモリ部 15 ユニットセル 16 半導体基板 17 素子分離部 18 電荷転送部 19 電荷蓄積部 20 電荷転送ゲート 21 引き出し電極 22 絶縁膜 23 画素電極 24 光電変換膜 25 透明電極 1 Bias Charge Injection / Ejection Diodes 2-5, 6-9 Charge Transfer Gate 10 Horizontal CCD 11 Charge Detector 12 Pixel Region 13 Memory Section 15 Unit Cell 16 Semiconductor Substrate 17 Element Separation Section 18 Charge Transfer Section 19 Charge Storage Section 20 Charge Transfer gate 21 Extraction electrode 22 Insulating film 23 Pixel electrode 24 Photoelectric conversion film 25 Transparent electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】電荷蓄積部にバイアス電荷を注入した後、
注入されたバイアス電荷の一部をリセットして電荷転送
部に排出し、その後に電荷蓄積部で一定時間の信号蓄積
を行い、蓄積された信号と電荷をバイアス電荷と共に読
み出す固体撮像装置の駆動方法において、前記電荷蓄積
部と前記電荷蓄積部と反導伝型の半導体素子領域間に逆
バイアスを印加し、逆方向電流を流すことで、前記電荷
蓄積部へのバイアス電荷注入を行うことを特徴とする、
固体撮像装置の駆動方法。
1. Injecting a bias charge into a charge storage part,
A driving method of a solid-state imaging device, in which a part of the injected bias charge is reset and discharged to a charge transfer unit, and thereafter, a signal is accumulated in a charge accumulating unit for a fixed time and the accumulated signal and the charge are read out together with the bias charge. In the above, in the method, a reverse bias is applied between the charge accumulating portion and the charge accumulating portion and a semiconductor device region of anti-conduction type, and a reverse current is caused to flow to inject bias charge into the charge accumulating portion. And
Driving method of solid-state imaging device.
【請求項2】前記電荷蓄積部と前記電荷蓄積部と反導伝
型の半導体素子領域間に逆バイアスを印加するのに、前
記電荷蓄積部と電気的に接続されている画素電極に対し
て、光電変換膜を介して電気的にカップリングしている
電極に電気パルスを印加することで行うことを特徴とし
た請求項1に記載した固体撮像装置の駆動方法。
2. In order to apply a reverse bias between the charge accumulating portion and the charge accumulating portion and an anti-conduction type semiconductor element region, a pixel electrode electrically connected to the charge accumulating portion is applied. The method for driving a solid-state imaging device according to claim 1, wherein the method is performed by applying an electric pulse to an electrode electrically coupled through a photoelectric conversion film.
JP7067271A 1995-03-27 1995-03-27 Drive method for solid state image sensor Pending JPH08264746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7067271A JPH08264746A (en) 1995-03-27 1995-03-27 Drive method for solid state image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7067271A JPH08264746A (en) 1995-03-27 1995-03-27 Drive method for solid state image sensor

Publications (1)

Publication Number Publication Date
JPH08264746A true JPH08264746A (en) 1996-10-11

Family

ID=13340140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7067271A Pending JPH08264746A (en) 1995-03-27 1995-03-27 Drive method for solid state image sensor

Country Status (1)

Country Link
JP (1) JPH08264746A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010010188A (en) * 2008-06-24 2010-01-14 Fujifilm Corp Solid-state image sensor and imaging device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010010188A (en) * 2008-06-24 2010-01-14 Fujifilm Corp Solid-state image sensor and imaging device

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