JPH08257887A - Device and method for polishing spherical surface - Google Patents

Device and method for polishing spherical surface

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Publication number
JPH08257887A
JPH08257887A JP7063854A JP6385495A JPH08257887A JP H08257887 A JPH08257887 A JP H08257887A JP 7063854 A JP7063854 A JP 7063854A JP 6385495 A JP6385495 A JP 6385495A JP H08257887 A JPH08257887 A JP H08257887A
Authority
JP
Japan
Prior art keywords
polishing
polishing plate
workpiece
plate
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7063854A
Other languages
Japanese (ja)
Other versions
JP2877158B2 (en
Inventor
Tadao Saito
忠男 斎藤
Akira Nagayama
昭 永山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7063854A priority Critical patent/JP2877158B2/en
Publication of JPH08257887A publication Critical patent/JPH08257887A/en
Application granted granted Critical
Publication of JP2877158B2 publication Critical patent/JP2877158B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

PURPOSE: To provide a spherical surface polishing device suited for polishing a point end of a ferrule mounted on a connecting part of an optical connector and to provide a spherical surface polishing method of using this spherical surface polishing device. CONSTITUTION: A device has a polishing disk 11, polishing disk on its own axis rotating means 12 of rotating the polishing disk 11 around its axial center, polishing disk revolving around means 13, 14 of rotating an axial center itself of the polishing disk 11 around a certain axial center, holding means 15a of positioning the end face center of a workpiece in a surface of the polishing disk 11 to hold the workpiece and a linear guide means 15b of pressing an end face of the workpiece held to the holding means 15a to a surface of the polishing disk 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、被加工物の先端を球面
又は斜め球面に研磨する球面研磨装置及びこれを用いた
球面研磨方法に係り、特に光ファイバのコネクタ(光コ
ネクタ)の接合部に取り付けられるフェルール(接合用
補強円筒棒材)の先端を研磨するために好適な球面研磨
装置及び方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spherical polishing apparatus for polishing the tip of an object to be processed into a spherical surface or an oblique spherical surface and a spherical polishing method using the same, and more particularly to a joint portion of an optical fiber connector (optical connector). TECHNICAL FIELD The present invention relates to a spherical polishing apparatus and method suitable for polishing the tip of a ferrule (reinforcing cylindrical rod for joining) attached to a substrate.

【0002】[0002]

【従来の技術】従来より光ファイバ同士を着脱可能に接
続するために、各種の光コネクタが使用されている。単
芯用の光コネクタとしては、例えば、軸ずれや角度ずれ
の少ない接合(例えば、コア径10μmのシングルモー
ド光ファイバにおいては軸ずれ1μm以下)を可能にす
る必要がある。
2. Description of the Related Art Conventionally, various optical connectors have been used in order to detachably connect optical fibers. As an optical connector for a single core, for example, it is necessary to enable splicing with a small axial deviation or an angular deviation (for example, an axial deviation of 1 μm or less in a single mode optical fiber having a core diameter of 10 μm).

【0003】そこで、光コネクタには、光ファイバをセ
ラミックス製のフェルールの中心に挿入して接着固定し
た後、この光コネクタフェルールを精密な内径を有する
割スリーブに挿入して、当該フェルールの先端同士を突
き当てて締結した構造のものがある。かかる光コネクタ
は優れた接続特性を有するので、特に光通信の分野では
広く・大量に使用されている。
Therefore, in an optical connector, an optical fiber is inserted into the center of a ceramic ferrule and fixed by adhesion, and then this optical connector ferrule is inserted into a split sleeve having a precise inner diameter, and the ends of the ferrule are connected to each other. There is a structure in which they are abutted and fastened. Since such an optical connector has excellent connection characteristics, it is widely used in large quantities, especially in the field of optical communication.

【0004】図5(a)及び(b)は、それぞれ光コネ
クタの接続状態を示している。割スリーブ1に挿入され
た光コネクタフェルール2a、2bは、光の接続特性を
良くするために、その先端が凸球面形状になっている。
FIGS. 5 (a) and 5 (b) respectively show the connection state of the optical connector. The optical connector ferrules 2a and 2b inserted in the split sleeve 1 have a convex spherical surface at the tip in order to improve the light connection characteristics.

【0005】光コネクタのフェルールの球面形状には、
図5(a)に示すように光軸に対して直角な端面をもと
に凸球面形状に研磨したもの(以下、PC−Phsical co
ntact −接続、或はPC研磨という)、図5(b)に示
すように光軸に対して傾き角8°前後傾けて凸球面形状
に研磨したもの(以下、斜めPC接続、あるいは斜めP
C研磨という)がある。
The spherical shape of the ferrule of the optical connector is
As shown in FIG. 5 (a), the end surface perpendicular to the optical axis is polished into a convex spherical shape (hereinafter referred to as PC-Phsical co
ntact-connection or PC polishing), as shown in FIG. 5 (b), which is tilted about 8 ° with respect to the optical axis and polished into a convex spherical shape (hereinafter, oblique PC connection or oblique P connection).
C polishing).

【0006】特に、後者の斜めPC研磨のフェルール2
bを備えた光コネクタでは、コネクタ端面の反射光が傾
き角の2倍で反射され、接続部における光の反射が60
dB以下となる。これらの値は、前者のPC研磨のフェ
ルール2aを備えた光コネクタに比べて1〜2桁小さ
い。したがって、斜めPC研磨のフェルール2bを備え
た光コネクタは、反射戻り光によるノイズの影響を抑え
ることができるので、高速ディジタル伝送又はアナログ
伝送等の光通信技術においては不可欠となっている。
In particular, the latter ferrule 2 for oblique PC polishing
In the optical connector provided with b, the reflected light at the connector end face is reflected at twice the tilt angle, and the light reflected at the connection portion is 60
It will be below dB. These values are 1 to 2 orders of magnitude smaller than those of the former optical connector equipped with the PC-polished ferrule 2a. Therefore, the optical connector equipped with the slanted PC-polished ferrule 2b can suppress the influence of noise due to the reflected return light, which is indispensable in optical communication technology such as high-speed digital transmission or analog transmission.

【0007】ところで、光コネクタのフェルール2a、
2bの端面の凸球面形状は、研磨によって形成される
が、例えば、球の頂点とファイバ中心とのズレは50μ
m以下というように、高精度の研磨が要求される。した
がって、研磨に際しての作業性、操作性の向上が課題に
なっている。
By the way, the ferrule 2a of the optical connector,
The convex spherical shape of the end surface of 2b is formed by polishing. For example, the deviation between the apex of the sphere and the fiber center is 50 μm.
High precision polishing is required such as m or less. Therefore, improvement of workability and operability at the time of polishing has been a problem.

【0008】次に従来例の研磨装置を使用したフェルー
ルの研磨方法について説明する。図6は第1の従来例の
研磨装置の外観構成を、図7(a)は同装置を用いたP
C研磨の場合のフェルールの保持方法を、図7(b)は
同装置を用いた斜めPC研磨の場合のフェルールの保持
方法を、それぞれ示している。
Next, a method of polishing a ferrule using the conventional polishing apparatus will be described. FIG. 6 is an external view of the polishing apparatus of the first conventional example, and FIG.
FIG. 7B shows a ferrule holding method in the case of C polishing, and FIG. 7B shows a ferrule holding method in the case of oblique PC polishing using the same apparatus.

【0009】PC研磨の場合は、図7(a)に示すよう
に、フェルール2の軸心を研磨盤面3に対して垂直にし
て取り付け金具4aにて固定し、複数本のフェルール2
を同時に研磨する。
In the case of PC polishing, as shown in FIG. 7 (a), the ferrule 2 has its axis centered perpendicularly to the polishing platen surface 3 and is fixed by a mounting metal fitting 4a.
Are simultaneously polished.

【0010】斜めPC研磨の場合は、図7(b)に示す
ように、フェルール2の軸心を研磨盤面3に対して規定
量傾けて取り付け金具4bにて固定し、複数本のフェル
ール2を同時に研磨する。
In the case of slanted PC polishing, as shown in FIG. 7 (b), the ferrules 2 are fixed to the polishing plate surface 3 by a specified amount, and fixed by the mounting brackets 4b. Polish at the same time.

【0011】第1の従来例の研磨装置では、研磨する際
にフェルール2が取り付け金具4a、4bにて固定され
ているので、回転・揺動しないようになっている。ま
た、研磨盤5はゴム等の弾性体6の上面に研磨シート7
等を張り付けた構成をしている。本従来例の装置は、P
C研磨の際、回転する研磨シート7の上面に研摩液8を
供給しつつ、フェルール2の先端を押圧してフェルール
端面の研磨を行うようにしている。
In the first conventional polishing apparatus, since the ferrule 2 is fixed by the fittings 4a and 4b during polishing, it does not rotate or swing. In addition, the polishing board 5 has a polishing sheet 7 on the upper surface of an elastic body 6 such as rubber.
It has a structure in which the etc. are attached. The device of this conventional example is P
At the time of C polishing, while supplying the polishing liquid 8 to the upper surface of the rotating polishing sheet 7, the tip of the ferrule 2 is pressed to polish the end surface of the ferrule.

【0012】図9は第2の従来例の研磨装置の要部構成
を示している。第2の従来例の研磨装置は、回転駆動す
る弾性研磨盤9の上面に樹脂系フィルム10を一定張力
を付して張設した構成になっている。本従来例の装置
は、PC研磨の際、回転する樹脂系フィルム10の上面
に研摩液8を供給しながらフェルール2の先端を一定距
離だけ樹脂系フィルム10に押し込み、かつフェルール
2をその軸心回りに正逆回転させて研磨を行う。
FIG. 9 shows the construction of the essential parts of a second conventional polishing apparatus. The polishing apparatus of the second conventional example has a configuration in which a resin film 10 is stretched on the upper surface of an elastic polishing disk 9 that is driven to rotate with a constant tension. In the conventional apparatus, when polishing the PC, the tip of the ferrule 2 is pushed into the resin film 10 by a predetermined distance while the polishing liquid 8 is supplied to the upper surface of the rotating resin film 10, and the ferrule 2 is moved along the axis thereof. Rotate forward and backward to polish.

【0013】[0013]

【発明が解決しようとする課題】ところで、前記した従
来例の研磨装置には、以下のような問題がある。第1の
従来例の前記研磨装置は、複数本のフェルールを一括し
て研磨するためにフェルール自体を回転させることがで
きない。これでは、表面粗さ、面形状の対象性等におけ
る加工面精度が悪くなるという問題が生じる。そこで、
各フェルールの研磨軌跡が、図8に示す太い実線Lの螺
旋状になるように研磨盤5に回転と揺動を与えて加工面
精度を高める試みがなされている。
By the way, the above-mentioned conventional polishing apparatus has the following problems. The polishing apparatus of the first conventional example cannot rotate the ferrule itself in order to polish a plurality of ferrules at once. In this case, there arises a problem that the processed surface accuracy becomes poor in terms of surface roughness, symmetry of surface shape, and the like. Therefore,
Attempts have been made to increase the precision of the machined surface by rotating and rocking the polishing platen 5 so that the polishing locus of each ferrule has a spiral shape with a thick solid line L shown in FIG.

【0014】しかし、研磨盤に回転と揺動を与える構成
の前記研磨装置は、研磨盤の駆動機構の揺動による振動
が発生するので、駆動速度を早めることができず、研磨
速度の高速化に困難を来すという問題がある。
However, in the above-described polishing apparatus configured to give rotation and swing to the polishing plate, vibration is generated due to the swing of the drive mechanism of the polishing plate, so that the driving speed cannot be increased and the polishing speed can be increased. There is a problem that comes to difficulty.

【0015】また、かかる研磨装置は、フェルールを弾
性体研磨盤に押し付ける時に発生する略球面形状にフェ
ルール先端形状に従わして加工するので、複数本のフェ
ルールの長さに違いが生じたり、研磨圧力によりフェル
ール取付板の保持腕が倒れたりして研磨加工の精度にバ
ラツキが生じるという問題がある。
Further, since such a polishing machine processes the ferrule into a substantially spherical shape generated when it is pressed against the elastic body polishing plate in accordance with the ferrule tip shape, a plurality of ferrules may have different lengths or may be polished. There is a problem in that the holding arm of the ferrule mounting plate falls down due to the pressure and the precision of the polishing process varies.

【0016】さらに、同装置1台を用いてPC研磨と斜
めPC研磨を行う場合、フェルールの取付金具の交換及
び装置の設定条件の変更等が面倒であるため、作業性に
難があるという問題がある。
Further, when performing the PC polishing and the oblique PC polishing by using the same apparatus, it is troublesome to replace the ferrule mounting bracket and change the setting conditions of the apparatus, so that the workability is difficult. There is.

【0017】第2の従来例の前記研磨装置は、フェルー
ルを一本ずつ研磨するためにフェルール自体を回転させ
ることができる。したがって、一般の研磨方式に準じた
研磨を実現することができ、研磨盤の回転速度を高速化
することが可能である。
The polishing apparatus of the second conventional example can rotate the ferrule itself in order to polish the ferrules one by one. Therefore, it is possible to realize polishing according to a general polishing method, and it is possible to increase the rotation speed of the polishing plate.

【0018】ここで、一般の研磨方式とは、研磨盤の一
方向の回転に対して、被加工物にも回転を与え、かつ被
加工物の研磨の目(筋)の方向を移動させることによ
り、加工面精度を高める研磨方式をいう。
Here, the general polishing method means to rotate the work piece with respect to one rotation of the polishing plate and to move the direction of the polishing eye (streak) of the work piece. Therefore, it refers to a polishing method for improving the precision of the processed surface.

【0019】しかし、第2の従来例の前記研磨装置は、
フェルールの後方に長尺の光コードが付いているので、
1方向に回転させ続けることができず、研磨の際にフェ
ルールを約1回転の範囲で正逆回転させる繁雑な回転駆
動制御が必要となる。かかる正逆回転による研磨加工は
光コードの破断原因となり、結果的に歩留まりを悪くす
るという問題がある。
However, the polishing apparatus of the second conventional example is
Since there is a long optical cord behind the ferrule,
It cannot continue to rotate in one direction, and complicated polishing drive control is required to rotate the ferrule forward and backward in the range of about one rotation during polishing. The polishing process by the forward and reverse rotation causes breakage of the optical cord, resulting in a problem that the yield is deteriorated.

【0020】また、研磨盤の回転速度を高速化させて研
磨時間を短縮する場合には、正逆回転の反転時における
回転の停止時間の影響によって研磨の目の方向が不均等
になり、形状精度にバラツキが生じる等の問題がある。
Further, when the rotation speed of the polishing disk is increased to shorten the polishing time, the direction of the polishing eyes becomes uneven due to the influence of the rotation stop time at the time of reversing the forward and reverse rotation, and the shape of There are problems such as variations in accuracy.

【0021】さらに、第2の従来例の研磨装置は、PC
研磨を目的としているが、斜めPC研磨を可能にするに
は複雑化したフェルールの取り付け金具が必要になると
ともに、研磨作業を行う者に大変な熟練度が要求される
という問題がある。
Further, the second conventional polishing apparatus is a PC
Although it is intended for polishing, there is a problem that a complicated fitting for a ferrule is required to enable diagonal PC polishing, and a person who performs the polishing work requires a great degree of skill.

【0022】ここにおいて本発明の解決すべき主要な目
的は、次の通りである。本発明の第1の目的は、光コネ
クタの接合部に取り付けられるフェルールの先端を研磨
するために好適な球面研磨装置及びこれを用いた球面研
磨方法を提供せんとするものである。
The main objects to be solved by the present invention are as follows. A first object of the present invention is to provide a spherical polishing apparatus suitable for polishing the tip of a ferrule attached to a joint portion of an optical connector and a spherical polishing method using the same.

【0023】本発明の第2の目的は、高精度に再現性良
く、しかも高速に球面研磨することができる球面研磨装
置及びこれを用いた球面研磨方法を提供せんとするもの
である。
A second object of the present invention is to provide a spherical surface polishing apparatus and a spherical surface polishing method using the same, which are capable of highly accurate and reproducible spherical surface polishing at high speed.

【0024】本発明の第3の目的は、簡易な傾き調整手
段にてフェルールの取付角度を変更することにより、P
C研磨、斜めPC研磨の変更が容易にでき、作業性の良
い球面研磨装置及びこれを用いた球面研磨方法を提供せ
んとするものである。
A third object of the present invention is to change the mounting angle of the ferrule by a simple tilt adjusting means so that P
It is intended to provide a spherical polishing apparatus and a spherical polishing method using the same, which can easily change C polishing and oblique PC polishing and have good workability.

【0025】本発明のその他の目的は、明細書、図面、
特に特許請求の範囲の記載から自ずと明らかとなろう。
Other objects of the present invention include the specification, drawings,
In particular, it will be apparent from the description of the claims.

【0026】[0026]

【課題を解決するための手段】前記した課題の解決は、
本発明が次に列挙する新規な特徴的構成手段及び手法を
採用することにより達成される。すなわち、本発明装置
の第1の特徴は、研磨盤と、前記研磨盤を当該研磨盤の
軸心回りに回転させる研磨盤自転手段と、前記研磨盤の
軸心自体をある軸心回りに回転させる研磨盤公転手段
と、前記研磨盤の研磨盤面に被加工物の端面中心を位置
付けて、当該被加工物を保持する保持手段と、前記保持
手段に保持された被加工物の端面を前記研磨盤の研磨盤
面に押し付ける直線案内手段とを有する球面研磨装置に
ある。
[Means for Solving the Problems] To solve the above-mentioned problems,
The present invention is achieved by adopting the novel characteristic construction means and techniques listed below. That is, the first feature of the device of the present invention is a polishing plate, a polishing plate rotating means for rotating the polishing plate around the axis of the polishing plate, and an axis itself of the polishing plate about a certain axis. A polishing plate revolving means, holding means for holding the workpiece by positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, and polishing the end face of the workpiece held by the holding means. A spherical polishing device having a linear guide means for pressing the polishing plate surface of the plate.

【0027】本発明装置の第2の特徴は、研磨盤面が同
心円状に複数の研磨帯領域に分割された研磨盤と、前記
研磨盤の研磨帯領域を当該研磨盤の軸心回りに回転させ
る研磨盤自転手段と、前記研磨盤の軸心自体をある軸心
回りに回転させる研磨盤公転手段と、前記研磨盤の各研
磨盤面に被加工物の端面中心を位置付けて、当該被加工
物を保持する保持手段と、前記保持手段に保持された被
加工物の端面を前記研磨盤の研磨盤面に押し付ける直線
案内手段とを有する球面研磨装置にある。
The second feature of the apparatus of the present invention is that the surface of the polishing plate is concentrically divided into a plurality of polishing band regions, and the polishing band region of the polishing plate is rotated around the axis of the polishing plate. Polishing disk rotation means, polishing disk revolution means for rotating the axis itself of the polishing disk around a certain axis, and positioning the end face center of the workpiece on each polishing disk surface of the polishing disk to move the workpiece. A spherical polishing apparatus having a holding means for holding and a linear guide means for pressing the end surface of the workpiece held by the holding means against the polishing plate surface of the polishing plate.

【0028】本発明装置の第3の特徴は、前記本発明装
置の第2の特徴における前記研磨盤公転手段が、前記研
磨盤の軸心自体を各研磨帯領域に相当する半径で回転さ
せる球面研磨装置にある。
A third feature of the device of the present invention is that the polishing plate revolution means in the second feature of the device of the present invention rotates the shaft center of the polishing plate itself at a radius corresponding to each polishing zone. It is in the polishing machine.

【0029】本発明装置の第4の特徴は、前記本発明装
置の第1、第2又は第3の特徴における前記直線案内手
段と前記保持手段との間に、さらに、前記研磨盤の研磨
盤面に対して被加工物の軸心の傾きを調整する傾き調整
手段を備えた球面研磨装置にある。
A fourth feature of the device of the present invention is that between the linear guide means and the holding means in the first, second or third feature of the device of the present invention, further, the polishing plate surface of the polishing plate. On the other hand, the spherical polishing apparatus is provided with an inclination adjusting means for adjusting the inclination of the axis of the workpiece.

【0030】本発明装置の第5の特徴は、前記本発明装
置の第1、第2、第3又は第4の特徴における前記研磨
盤公転手段による研磨盤の公転中心を、被加工物の先端
の中心よりも数mm程度離隔することにより、研磨盤面を
広く使用できるように設定した球面研磨装置にある。
A fifth feature of the device of the present invention is that the center of revolution of the polishing plate by the polishing plate revolution means in the first, second, third or fourth feature of the device of the present invention is the tip of the workpiece. This is a spherical polishing device that is set so that the polishing plate surface can be widely used by being separated from the center of the plate by several mm.

【0031】本発明装置の第6の特徴は、前記本発明装
置の第1、第2、第3、第4又は第5の特徴における前
記前記被加工物が、光コネクタフェルール(接合用補強
円筒棒材)である球面研磨装置にある。
A sixth feature of the device of the present invention is that the work piece in the first, second, third, fourth or fifth feature of the device of the present invention is an optical connector ferrule (reinforcing cylinder for joining). It is in a spherical polishing device which is a bar material.

【0032】本発明方法の第1の特徴は、研磨盤と、前
記研磨盤を当該研磨盤の軸心回りに回転させる研磨盤自
転手段と、前記研磨盤の軸心自体をある軸心回りに回転
させる研磨盤公転手段と、前記研磨盤の研磨盤面に被加
工物の端面中心を位置付けて、当該被加工物を保持する
保持手段と、前記保持手段にて保持された被加工物の端
面を前記研磨盤の研磨盤面に押し付ける直線案内手段と
を有する球面研磨装置において、前記研磨盤の研磨盤面
に研磨液を供給しながら、前記被加工物の端面を前記研
磨盤の公転中心に押し付けた状態にし、前記研磨盤自転
手段にて研磨盤面を回転させつつ、前記研磨盤公転手段
にて前記研磨盤の軸心自体をある軸心回りに回転させて
前記被加工物の端面を球面状に研磨する球面研磨方法に
ある。
The first feature of the method of the present invention is that a polishing plate, a polishing plate rotation means for rotating the polishing plate around the axis of the polishing plate, and an axis itself of the polishing plate around a certain axis. The polishing plate revolving means for rotating, the holding means for holding the workpiece by positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, and the end face of the workpiece held by the holding means. In a spherical polishing device having a linear guide means for pressing against the polishing plate surface of the polishing plate, a state in which an end surface of the workpiece is pressed against the revolution center of the polishing plate while supplying a polishing liquid to the polishing plate surface of the polishing plate. Then, while rotating the polishing plate surface by the polishing plate rotating means, the axis of the polishing plate itself is rotated around a certain axis by the polishing plate revolution means to polish the end surface of the workpiece into a spherical shape. There is a spherical polishing method.

【0033】本発明方法の第2の特徴は、研磨盤と、前
記研磨盤を当該研磨盤の軸心回りに回転させる研磨盤自
転手段と、前記研磨盤の軸心自体をある軸心回りに回転
させる研磨盤公転手段と、前記研磨盤の研磨盤面に被加
工物の端面中心を位置付けて、当該被加工物を保持する
保持手段と、前記保持手段にて保持された被加工物の端
面を前記研磨盤の研磨盤面に押し付ける直線案内手段
と、前記直線案内手段と前記保持手段との間に設けら
れ、前記研磨盤の研磨盤面に対して被加工物の軸心の傾
きを調整する傾き調整手段とを有する球面研磨装置にお
いて、前記傾き調整手段にて被加工物の軸心を傾け、か
つ当該被加工物の端面を前記研磨盤の公転中心に押し付
けた状態にして、前記研磨盤自転手段にて研磨盤面を回
転させ、前記研磨盤の研磨盤面に研磨液を供給しなが
ら、前記研磨盤公転手段にて前記研磨盤の軸心自体をあ
る軸心回りに回転させて前記被加工物の端面を球面状に
研磨する球面研磨方法にある。
The second feature of the method of the present invention is that a polishing plate, a polishing plate rotation means for rotating the polishing plate around the axis of the polishing plate, and an axis itself of the polishing plate around a certain axis. The polishing plate revolving means for rotating, the holding means for holding the workpiece by positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, and the end face of the workpiece held by the holding means. A linear guide means for pressing against the polishing plate surface of the polishing plate, and an inclination adjustment provided between the linear guide device and the holding means for adjusting the inclination of the axis of the workpiece with respect to the polishing plate surface of the polishing plate. In the spherical polishing apparatus having the means, the tilt adjusting means tilts the axis of the workpiece, and the end surface of the workpiece is pressed against the revolution center of the polishing board, and the polishing board rotation means is provided. Rotate the surface of the polishing plate with There is a spherical polishing method for polishing the end surface of the workpiece into a spherical shape by supplying the polishing liquid to the polishing surface while rotating the axis of the polishing disk itself around a certain axis by the polishing disk revolution means. .

【0034】本発明方法の第3の特徴は、前記本発明方
法の第1又は第2の特徴における前記研磨盤の研磨盤面
が、同心円状に複数の研磨帯領域に分割されてなる球面
研磨方法にある。
A third feature of the method of the present invention is that the polishing plate surface of the polishing plate in the first or second feature of the method of the present invention is concentrically divided into a plurality of polishing zone regions. It is in.

【0035】本発明方法の第4の特徴は、前記本発明方
法の第1、第2又第3の特徴における前記研磨盤公転手
段が、前記研磨盤の軸心自体を各研磨帯領域に相当する
半径で回転させる球面研磨方法にある。
A fourth feature of the method of the present invention is that the polishing plate revolution means in the first, second or third feature of the method of the present invention corresponds to the polishing belt axis center itself in each polishing zone region. It is in the spherical polishing method of rotating with a radius of

【0036】本発明方法の第5の特徴は、前記本発明方
法の第1、第2、第3又は第4の特徴における前記研磨
盤公転手段による研磨盤の公転中心を、被加工物の先端
の中心よりも数mm程度離隔することにより、研磨盤面を
広く使用した球面研磨方法にある。
The fifth feature of the method of the present invention is that the center of revolution of the polishing plate by the revolution plate revolution means in the first, second, third or fourth feature of the method of the present invention is the tip of the workpiece. This is a spherical polishing method in which the polishing plate surface is widely used by being separated from the center of by about several mm.

【0037】本発明方法の第6の特徴は、前記本発明方
法の第1、第2、第3、第4又は第5の特徴における前
記被加工物が、光コネクタフェルール(接合用補強円筒
棒材)である球面研磨方法にある。
A sixth feature of the method of the present invention is that the workpiece in the first, second, third, fourth or fifth feature of the method of the present invention is an optical connector ferrule (reinforcing cylindrical rod for joining). Material) is a spherical polishing method.

【0038】[0038]

【作用】本発明は、前記のような新規な手段及び手法を
講じているので、以下のような作用をなす。
The present invention takes the following actions because it takes the novel means and method as described above.

【0039】本発明によれば、被加工物を回転させずに
固定しても、研磨盤の公転によって、研磨の目の方向が
順次移動するので、被加工物に回転を与えたと同じ作用
が生じる。したがって、高精度の研磨形状を得ることが
できる。
According to the present invention, even if the workpiece is fixed without being rotated, the revolving of the polishing disk causes the direction of the polishing eyes to move sequentially, so that the same effect as rotating the workpiece can be obtained. Occurs. Therefore, a highly accurate polished shape can be obtained.

【0040】本発明では、被加工物を回転させないの
で、被加工物の保持機構(把持機構)を簡易な構造にで
き、しかも被加工物の軸心の傾き調整機構をも簡易に実
現することができる。なお、 PC研磨又は斜めPC研
磨は、研磨盤面に対して被加工物の軸心を垂直に押し当
てて研磨するか、又は斜めに押し当てて研磨するかによ
って行う。
According to the present invention, since the workpiece is not rotated, the holding mechanism (grasping mechanism) of the workpiece can have a simple structure and the tilt adjustment mechanism of the axial center of the workpiece can be easily realized. You can The PC polishing or the oblique PC polishing is performed depending on whether the axial center of the work piece is vertically pressed against the surface of the polishing plate or is obliquely pressed.

【0041】さらに、本発明は、研磨盤を正逆回転させ
る繁雑な回転駆動制御が不要なので、研磨盤の回転数の
高速化により研磨能率を向上させることができる。特
に、光コネクタの接合部に取り付けられるフェルールの
先端を球面状に研磨する場合に好適である。
Further, according to the present invention, since complicated rotation drive control for rotating the polishing disc in the forward and reverse directions is unnecessary, the polishing efficiency can be improved by increasing the rotation number of the polishing disc. In particular, it is suitable for polishing the tip of the ferrule attached to the joint portion of the optical connector into a spherical shape.

【0042】[0042]

【実施例】以下、添付図面を参照し、本発明をその装置
例及び方法例に基づいて、より詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in more detail with reference to the accompanying drawings on the basis of its apparatus and method.

【0043】本装置例及び方法例では、研磨対象の被加
工物を光ファイバのコネクタ(光コネクタ)の接合部に
取り付けるフェルール(接合用補強円筒棒材)とした
が、本発明装置及び方法は、その他の被加工物にも適用
できるものである。
In the example of the apparatus and the example of the method, the workpiece to be polished is the ferrule (reinforcing cylindrical rod for joining) attached to the joining portion of the connector (optical connector) of the optical fiber. It can also be applied to other workpieces.

【0044】(装置例)図1は本装置例の球面研磨装置
Aの全体構成を、図2は本装置例で使用する研磨盤の構
成を、図3は同球面研磨装置の研磨盤の公転方法を、図
4(a)及び(b)はフェルールの保持部の構成を、そ
れぞれ示している。
(Example of Apparatus) FIG. 1 shows the overall structure of the spherical polishing apparatus A of this apparatus example, FIG. 2 shows the structure of the polishing disk used in this example of the apparatus, and FIG. 3 shows the revolution of the polishing disk of this spherical polishing apparatus. 4 (a) and 4 (b) show the construction of the ferrule holder, respectively.

【0045】図1に示すように、本装置例の球面研磨装
置20は、研磨盤11、スピンドルモータ12、Zステ
ージ13、Xステージ14、フェルール2を保持する保
持部15を備えている。
As shown in FIG. 1, the spherical polishing apparatus 20 of this apparatus example comprises a polishing plate 11, a spindle motor 12, a Z stage 13, an X stage 14, and a holding portion 15 for holding the ferrule 2.

【0046】研磨盤11は、外周側から内周側に向かっ
て設けられたダイヤモンド砥石11a、粗研磨砥石11
b、仕上げ研磨砥石11cを組合わせた構成をしてい
る。
The polishing plate 11 includes a diamond grindstone 11a and a rough polishing grindstone 11 provided from the outer peripheral side toward the inner peripheral side.
b, the finishing polishing grindstone 11c is combined.

【0047】粗研磨砥石11b及び仕上げ研磨砥石11
cには、1枚の太鼓状に張り上げた弾性研磨フィルムが
用いられ、分割リング11dにて粗研磨帯域と仕上げ研
磨帯域とが分割されている。
Rough polishing whetstone 11b and finish polishing whetstone 11
For c, a single drum-shaped elastic polishing film is used, and a rough polishing zone and a finish polishing zone are divided by a dividing ring 11d.

【0048】ダイヤモンド砥石11aはフェルール2の
端面の接着剤除去及び平面形成のための研削帯域を構成
し、粗研磨砥石11bはフェルール2の端面を凸球面に
形成する研磨帯域を構成し、仕上げ研磨砥石11cはフ
ェルール2の凸球面を無擾乱鏡面研磨する研磨帯域を構
成している。
The diamond grindstone 11a constitutes a grinding zone for removing the adhesive from the end face of the ferrule 2 and forming a flat surface, and the rough polishing grindstone 11b constitutes a polishing zone for forming the end surface of the ferrule 2 into a convex spherical surface for finish polishing. The grindstone 11c constitutes a polishing zone for polishing the convex spherical surface of the ferrule 2 without disturbing mirror surface polishing.

【0049】なお、研磨盤11を用いて実際に研磨する
場合には、フェルール2を外周側から中心に向かい各研
磨帯域の半径r1、r2、r3の位置に順次押し当てて
研磨する。
When actually polishing with the polishing plate 11, the ferrule 2 is sequentially pressed from the outer peripheral side toward the center at the radii r1, r2, r3 of the respective polishing zones to perform polishing.

【0050】スピンドルモータ12は、その駆動軸に研
磨盤11の軸心が同一に直結され、研磨盤11を回転駆
動させる機構(研磨盤自転手段)になっている。
The spindle motor 12 has a mechanism (polishing disk rotation means) in which the axis of the polishing disk 11 is directly connected to the drive shaft of the spindle motor 12 to drive the polishing disk 11 to rotate.

【0051】Zステージ13は、図3に示すように、上
下方向(垂直方向)に移動する可動部13aが設けら
れ、この可動部13aにはスピンドルモータ12が載置
されて固定されている。
As shown in FIG. 3, the Z stage 13 is provided with a movable portion 13a which moves in the vertical direction (vertical direction), and the spindle motor 12 is mounted and fixed on the movable portion 13a.

【0052】Xステージ14は、横方向(水平方向)に
移動する可動部14aが設けられ、この可動部14aに
はZステージ13が載置されて固定されている。
The X stage 14 is provided with a movable portion 14a which moves in the lateral direction (horizontal direction), and the Z stage 13 is mounted and fixed on the movable portion 14a.

【0053】Zステージ13及びXステージ14の駆動
制御(研磨盤公転手段)により、図2に示すように、フ
ェルール2の軸心を中心にそれぞれの半径r1、r2、
r3で円運動するように研磨盤11が公転する。
By controlling the drive of the Z stage 13 and the X stage 14 (polishing disk revolution means), as shown in FIG. 2, the radii r1, r2, and r2 around the axial center of the ferrule 2, respectively.
The polishing plate 11 revolves so as to make a circular motion at r3.

【0054】保持部15は、図4(b)に示すように、
研磨盤11に対向させた位置にフェルール2を保持する
保持手段と、研磨盤11にフェルール2の先端を押し付
けたり、退避させたりする直線案内手段と、研磨盤11
の面に対してフェルール2の軸心の傾きを調整する傾き
調整手段とを備えている。
The holding portion 15 is, as shown in FIG.
Holding means for holding the ferrule 2 at a position opposed to the polishing board 11, linear guide means for pressing or retracting the tip of the ferrule 2 to the polishing board 11, and polishing board 11
And a tilt adjusting means for adjusting the tilt of the axial center of the ferrule 2 with respect to the plane.

【0055】さらに詳細に説明すると、保持部15は、
チャック15a、直線案内機構15b、ボイスコイルモ
ータ15c、可動部15d、可動ボビン15e及び傾き
調整機構15fから構成されている。
More specifically, the holding section 15 is
The chuck 15a, the linear guide mechanism 15b, the voice coil motor 15c, the movable portion 15d, the movable bobbin 15e, and the tilt adjusting mechanism 15f are included.

【0056】チャック15aは、フェルール2を把持し
て固定できる構造になっており、可動ボビン15eと連
動する可動部15dに取り付けられている。したがっ
て、ボイスコイルモータ15cへの印加電流の極性を変
えることにより、直線案内機構15bの可動部15dが
往復運動するので、チャック15aに把持されたフェル
ール2の先端を研磨盤11に押し付けたり、退避させた
りすることができる。
The chuck 15a has a structure capable of gripping and fixing the ferrule 2, and is attached to the movable portion 15d which is interlocked with the movable bobbin 15e. Therefore, since the movable portion 15d of the linear guide mechanism 15b reciprocates by changing the polarity of the current applied to the voice coil motor 15c, the tip of the ferrule 2 held by the chuck 15a is pressed against the polishing plate 11 or retracted. It can be done.

【0057】傾き調整機構15fは、水平面上で軸回転
させて研磨盤11の研磨面に対するフェルール2の軸心
の傾きを調整する働きをする。なお、斜めPC研磨の場
合には、図4(a)に示すようにθ傾けて、研磨盤11
に研磨剤を供給しながら研磨することとなる。
The tilt adjusting mechanism 15f serves to adjust the tilt of the axial center of the ferrule 2 with respect to the polishing surface of the polishing table 11 by rotating the shaft on a horizontal plane. In the case of oblique PC polishing, as shown in FIG.
Polishing is performed while supplying the polishing agent to the.

【0058】(方法例)次に、上述した本装置例の装置
を用いてPC研磨する場合の研磨工程(研削工程、粗研
磨工程、仕上げ研磨工程)について説明する。なお、本
方法例では、公転速度が100rpm前後、自転速度が
数千rpmの範囲で、それぞれ任意の回転速度が得られ
る装置を使用することとした。
(Example of Method) Next, a polishing step (grinding step, rough polishing step, finish polishing step) in the case of performing PC polishing using the apparatus of the present apparatus example will be described. In addition, in this example of the method, it was decided to use an apparatus capable of obtaining an arbitrary rotation speed in a revolution speed of about 100 rpm and a rotation speed of several thousands rpm.

【0059】[研削工程]先ず、退避しているチャック
15aにフェルール2を取り付けて固定する。次に、研
磨盤11を回転速度Nで自転させるとともに、Zステー
ジ13及びXステージ14の運動により研磨盤11の軸
心がフェルール2の軸心を中心にして半径r1、回転速
度nで公転するように駆動制御する。
[Grinding Step] First, the ferrule 2 is attached and fixed to the retracted chuck 15a. Next, the polishing disk 11 is rotated at a rotation speed N, and the axis of the polishing disk 11 revolves around the axis of the ferrule 2 at a radius r1 and a rotation speed n by the movements of the Z stage 13 and the X stage 14. Drive control.

【0060】続いて、ボイスコイルモータ15cに徐々
に(+)電流を印加してチャック15aを移動させると
ともに、研磨盤11のダイヤモンド砥石11aに研磨液
を流しながらフェルール2をダイヤモンド砥石11aに
押し当てて、押し付け力Fで一定時間保持して研削す
る。
Subsequently, a (+) current is gradually applied to the voice coil motor 15c to move the chuck 15a, and the ferrule 2 is pressed against the diamond whetstone 11a while flowing a polishing liquid to the diamond whetstone 11a of the polishing plate 11. Then, the pressing force F is maintained for a certain period of time to perform grinding.

【0061】そして、所定時間の研削が終了した後、ボ
イスコイルモータ15cの印加電流の極性を切り替え、
(−)電流を印可してチャック15aを移動させてフェ
ルール2を退避させる。
After the grinding for a predetermined time is completed, the polarity of the applied current to the voice coil motor 15c is switched,
(-) A current is applied to move the chuck 15a to retract the ferrule 2.

【0062】[粗研磨工程]まず、研磨盤11を回転速
度Nで自転させるとともに、Zステージ13及びXステ
ージ14の運動により研磨盤11の軸心がフェルール2
の軸心を中心にして半径r2、回転速度nで公転するよ
うに駆動制御する。
[Rough Polishing Step] First, the polishing plate 11 is rotated at a rotation speed N, and the axis of the polishing plate 11 is moved to the ferrule 2 by the movement of the Z stage 13 and the X stage 14.
Drive control is performed so as to revolve at a radius r2 and a rotation speed n around the axis of.

【0063】次にボイスコイルモータ15cに徐々に
(+)電流を印加してチャック15aを移動させるとと
もに、研磨盤11の粗研磨砥石11bに研磨液を流しな
がらフェルール2を粗研磨砥石11bに押し当てて、押
し付け力Fで一定時間保持して研磨する。
Next, a (+) current is gradually applied to the voice coil motor 15c to move the chuck 15a, and the ferrule 2 is pressed against the rough polishing grindstone 11b while flowing a polishing liquid to the rough polishing grindstone 11b of the polishing plate 11. It is abutted and held with a pressing force F for a certain period of time for polishing.

【0064】そして、所定時間の研磨が終了した後、ボ
イスコイルモータ15cの印加電流の極性を切り替え、
(−)電流を印可してチャック15aを移動させてフェ
ルール2を退避させる。
After polishing for a predetermined time, the polarity of the current applied to the voice coil motor 15c is switched,
(-) A current is applied to move the chuck 15a to retract the ferrule 2.

【0065】[仕上げ研磨工程]まず、研磨盤11を回
転速度Nで自転させるとともに、Zステージ13及びX
ステージ14の運動により研磨盤11の軸心がフェルー
ル2の軸心を中心にして半径r3、回転速度nで公転す
るように駆動制御する。
[Finishing Step] First, the polishing table 11 is rotated at a rotation speed N, and the Z stage 13 and the X stage are rotated.
By the movement of the stage 14, drive control is performed so that the axis of the polishing plate 11 revolves around the axis of the ferrule 2 at a radius r3 and a rotation speed n.

【0066】次にボイスコイルモータ15cに徐々に
(+)電流を印加してチャック15aを移動させるとと
もに、研磨盤11の仕上げ砥石11c研磨液を流しなが
らフェルール2を仕上げ砥石11cに押し当てて、押し
付け力Fで一定時間保持して研磨する。
Next, a (+) current is gradually applied to the voice coil motor 15c to move the chuck 15a, and the ferrule 2 is pressed against the finishing whetstone 11c while flowing the finishing whetstone 11c polishing liquid of the polishing table 11. The pressing force F is maintained for a certain time for polishing.

【0067】そして、所定時間の研磨が終了した後、ボ
イスコイルモータ15cの印加電流の極性を切り替え、
(−)電流を印可してチャック15aを移動させてフェ
ルール2を退避させる。最後にチャック15aからフェ
ルール2を外すことにより一連の研磨工程が終了する。
After polishing for a predetermined time, the polarity of the current applied to the voice coil motor 15c is switched,
(-) A current is applied to move the chuck 15a to retract the ferrule 2. Finally, the ferrule 2 is removed from the chuck 15a to complete a series of polishing steps.

【0068】なお、斜めPC研磨の場合は、PC研磨と
同様の研磨工程にて研磨するが、傾き調整機構15fに
よりフェルール2の軸心をθ傾けて、フェルール2の先
端の位置を移動量Dだけ移動させ、公転位置の制御量を
修正すれば良い。
In the case of oblique PC polishing, polishing is performed in the same polishing step as PC polishing, but the tilt adjusting mechanism 15f tilts the axis of the ferrule 2 by θ, and the position of the tip of the ferrule 2 is moved by a movement amount D. It is only necessary to move it and correct the control amount of the revolution position.

【0069】以上説明した装置例及び方法例によれば、
研磨盤11の自転と公転は独立して制御されるので、研
磨盤11の自転をより高速化することが可能となり、研
磨工程の所要時間の短縮化が図れる。また、各工程に適
した速度を選定することにより高能率な研磨ができる。
According to the apparatus example and the method example described above,
Since the rotation and revolution of the polishing disc 11 are controlled independently, the rotation of the polishing disc 11 can be sped up faster, and the time required for the polishing process can be shortened. Further, by selecting a speed suitable for each step, highly efficient polishing can be performed.

【0070】なお、本装置例の装置を用いた本方法例に
おける上記研磨工程の正味研磨時間を測定したところ、
約30秒程度であった。従来の技術の欄で説明した第1
及び第2の従来例の研磨装置と比較すると、例えば、第
1の従来例の装置では12本一活して研磨するが、その
一本当たりの研磨時間に換算すると1分強となり、第2
の従来例では2分強となる。
When the net polishing time of the above polishing step in this method example using the apparatus of this device example was measured,
It was about 30 seconds. 1st explained in the section of conventional technology
When compared with the polishing apparatus of the second conventional example, for example, 12 pieces of the polishing apparatus of the first conventional example are used for polishing, but when converted to the polishing time per one, it becomes a little over 1 minute.
In the conventional example of, it takes a little over 2 minutes.

【0071】したがって、本装置例の球面研磨装置を使
用すれば、光コネクタのフェルール先端の研磨時間を従
来の装置と比較して1/2〜1/4に短縮することが可
能となる。
Therefore, by using the spherical polishing apparatus of this apparatus example, the polishing time at the ferrule tip of the optical connector can be shortened to 1/2 to 1/4 as compared with the conventional apparatus.

【0072】また、本装置例及び方法例によれば、公転
方向を1方向に設定できるので、被加工物であるフェル
ール2を回転させなくても、研磨盤11の公転によっ
て、研磨の目の方向が順次移動し、あたかもフェルール
2に回転を与えたと同じ作用が生じて、高精度の研磨面
形状を得ることができる。
Further, according to the present apparatus example and method example, since the revolution direction can be set to one direction, the revolution of the polishing plate 11 revolves even if the ferrule 2 as the workpiece is not rotated. The direction is sequentially moved, and the same action as if the ferrule 2 is rotated is generated, and a highly accurate polished surface shape can be obtained.

【0073】形状精度の比較の1例として、光ファイバ
の中心と凸球面頂点のずれ(頂点ずれ)は、従来では最
大50μmであったものが、本装置例の球面研磨装置で
は30μm以下になり研磨精度の向上を確認することが
できた。
As one example of the comparison of the shape accuracy, the deviation between the center of the optical fiber and the apex of the convex spherical surface (apex deviation) was 50 μm at maximum in the past, but it becomes 30 μm or less in the spherical polishing apparatus of this example. It was possible to confirm the improvement in polishing accuracy.

【0074】上記装置例及び方法例の説明では、研磨盤
11の公転中心とフェルール2の先端の中心とは合致し
ているが、研磨盤11の公転中心とフェルール2先端の
中心とを僅かの量、例えば、Hmm程度Z方向(垂直方
向)あるいはX方向(水平方向)にずらすことにより2
Hmmだけ研磨盤11の研磨に使用する範囲を広げ、研磨
盤11の耐久性を高めるようにしても良い。
In the description of the above apparatus example and method example, the center of revolution of the polishing plate 11 and the center of the tip of the ferrule 2 are coincident with each other, but the center of revolution of the polishing plate 11 and the center of the tip of the ferrule 2 are slightly different. Amount, for example, about Hmm 2 by shifting in the Z direction (vertical direction) or the X direction (horizontal direction)
The range used for polishing the polishing table 11 may be expanded by Hmm to improve the durability of the polishing table 11.

【0075】また、上記装置例及び方法例では数工程を
1個の研磨盤11で処理する分割研磨盤を使用したが、
研磨盤11に第1及び第2の従来例の装置のような1工
程のみを処理する研磨盤を用いて研磨しても同様に高速
・高精度の研磨が可能となる。
Further, in the above-mentioned apparatus example and method example, the divided polishing plate in which several steps are processed by one polishing plate 11 is used.
High-speed and high-precision polishing is also possible when polishing is performed using a polishing plate for the polishing plate 11 that processes only one step, such as the devices of the first and second conventional examples.

【0076】さらに、本装置例では、研磨盤11の研磨
面を横向き(垂直)に構成したが、研磨盤面を水平にし
た装置構成にしても良い。
Further, in this example of the apparatus, the polishing surface of the polishing plate 11 is configured to be horizontal (vertical), but the configuration may be such that the polishing plate surface is horizontal.

【0077】以上本発明の代表的な装置例及び方法例に
ついて説明したが、本発明は必ずしもこれらの装置例の
手段及び方法例の手法だけに限定されるものではなく、
本発明にいう目的を達成し、後述する効果を有する範囲
内において適宜変更して実施することができるものであ
る。
Although the typical apparatus examples and method examples of the present invention have been described above, the present invention is not necessarily limited to the means and method examples of these apparatus examples.
The present invention can be appropriately modified and carried out within a range where the object of the present invention is achieved and the effects described later are obtained.

【0078】[0078]

【発明の効果】以上説明したように本発明によれば、研
磨盤の自転と公転は独立して制御することができるの
で、研磨盤の自転を高速化することができ、研磨工程の
所要時間の短縮化が図れるとともに、各工程に適した速
度を選定することにより高能率な研磨ができるという効
果を奏する。
As described above, according to the present invention, since the rotation and the revolution of the polishing plate can be controlled independently, the rotation of the polishing plate can be sped up and the time required for the polishing process can be increased. In addition to the effect of shortening the process, it is possible to achieve highly efficient polishing by selecting a speed suitable for each process.

【0079】特に、光コネクタの接合部に取り付けられ
るフェルールの先端を研磨するのに好適な球面研磨装置
及び方法を提供することができる。
In particular, it is possible to provide a spherical polishing apparatus and method suitable for polishing the tip of the ferrule attached to the joint portion of the optical connector.

【0080】本発明の構成に、傾き調整手段を設けた場
合は、同手段でフェルールの取付角度を容易に調整でき
るので、PC研磨と斜めPC研磨との変更を容易にする
ことができる。
When the inclination adjusting means is provided in the structure of the present invention, the attachment angle of the ferrule can be easily adjusted by the same means, and therefore the PC polishing and the oblique PC polishing can be easily changed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る本装置例の球面研磨装置の全体構
成を示す平面図である。
FIG. 1 is a plan view showing the overall configuration of a spherical polishing apparatus of this apparatus example according to the present invention.

【図2】本装置例で使用する研磨盤の構成を示す斜視図
である。
FIG. 2 is a perspective view showing a configuration of a polishing board used in this apparatus example.

【図3】本装置例の研磨盤の公転方法を示した説明図で
ある
FIG. 3 is an explanatory view showing a method of revolving the polishing plate of this device example.

【図4】(a)は本装置例の保持部の構成を示した平面
図、(b)は本装置例の保持部の構成を示した側面図で
ある。
FIG. 4A is a plan view showing a configuration of a holding unit of the present apparatus example, and FIG. 4B is a side view showing a configuration of a holding unit of the present apparatus example.

【図5】(a)は光コネクタの接続状態を示した要部拡
大断面図、(b)は別例の光コネクタの接続状態を示し
た要部拡大断面図である。
5A is an enlarged cross-sectional view of an essential part showing a connected state of an optical connector, and FIG. 5B is an enlarged cross-sectional view of an essential part showing a connected state of an optical connector of another example.

【図6】第1の従来例の研磨装置の外観構成を示した斜
視図である。
FIG. 6 is a perspective view showing an external configuration of a first conventional polishing apparatus.

【図7】(a)はPC研磨の場合のフェルールの保持方
法を示した断面図、(b)は斜めPC研磨の場合のフェ
ルールの保持方法を示した断面図である。
7A is a sectional view showing a method of holding a ferrule in the case of PC polishing, and FIG. 7B is a sectional view showing a method of holding a ferrule in the case of oblique PC polishing.

【図8】従来例のフェルール端面の研磨方法を示した図
である。
FIG. 8 is a diagram showing a method of polishing a ferrule end surface of a conventional example.

【図9】第2の従来例の研磨装置の要部構成を示した断
面図である。
FIG. 9 is a cross-sectional view showing a main configuration of a polishing apparatus of a second conventional example.

【符号の説明】[Explanation of symbols]

1…割スリーブ 2、2a、2b…フェルール(光コネクタフェルール) 3…研磨盤面 4a、4b…取り付け金具 5…研磨盤 6…弾性体 7…研磨シート 8…研磨液 9…弾性研磨盤 10…樹脂系フィルム 11…研磨盤 11a…ダイヤモンド砥石 11b…粗研磨砥石 11c…仕上げ研磨砥石 11d…分割リング 12…スピンドルモータ 13…Zステージ 13a、14a…可動部 14…Xステージ 15…保持部 15a…チャック 15b…直線案内機構 15c…ボイスコイルモータ 15d…可動部 15e…可動ボビン 15f…傾き調整機構 A…球面研磨装置 DESCRIPTION OF SYMBOLS 1 ... Split sleeve 2, 2a, 2b ... Ferrule (optical connector ferrule) 3 ... Polishing board surface 4a, 4b ... Mounting metal fitting 5 ... Polishing board 6 ... Elastic body 7 ... Polishing sheet 8 ... Polishing liquid 9 ... Elastic polishing board 10 ... Resin System film 11 ... Polishing machine 11a ... Diamond grindstone 11b ... Rough grinding grindstone 11c ... Finishing grinding grindstone 11d ... Dividing ring 12 ... Spindle motor 13 ... Z stage 13a, 14a ... Movable part 14 ... X stage 15 ... Holding part 15a ... Chuck 15b・ ・ ・ Linear guide mechanism 15c ・ ・ ・ Voice coil motor 15d ・ ・ ・ Movable part 15e ・ ・ ・ Movable bobbin 15f ・ ・ ・ Tilt adjusting mechanism A ・ ・ ・ Spherical polishing device

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】研磨盤と、前記研磨盤を当該研磨盤の軸心
回りに回転させる研磨盤自転手段と、 前記研磨盤の軸心自体をある軸心回りに回転させる研磨
盤公転手段と、 前記研磨盤の研磨盤面に被加工物の端面中心を位置付け
て、当該被加工物を保持する保持手段と、 前記保持手段に保持された被加工物の端面を前記研磨盤
の研磨盤面に押し付ける直線案内手段とを有する、 ことを特徴とする球面研磨装置。
1. A polishing plate, a polishing plate rotation means for rotating the polishing plate around the axis of the polishing plate, and a polishing plate revolution means for rotating the axis itself of the polishing plate around a certain axis. Positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, holding means for holding the workpiece, and a straight line for pressing the end face of the workpiece held by the holding part against the polishing plate surface of the polishing plate And a guide means.
【請求項2】研磨盤面が同心円状に複数の研磨帯領域に
分割された研磨盤と、 前記研磨盤の研磨帯領域を当該研磨盤の軸心回りに回転
させる研磨盤自転手段と、 前記研磨盤の軸心自体をある軸心回りに回転させる研磨
盤公転手段と、 前記研磨盤の各研磨盤面に被加工物の端面中心を位置付
けて、当該被加工物を保持する保持手段と、 前記保持手段に保持された被加工物の端面を前記研磨盤
の研磨盤面に押し付ける直線案内手段とを有する、 ことを特徴とする球面研磨装置。
2. A polishing plate having a polishing plate surface concentrically divided into a plurality of polishing band regions, a polishing plate rotating means for rotating the polishing band region of the polishing plate around the axis of the polishing plate, and the polishing. A polishing disk revolving means for rotating the axis of the disk itself around a certain axis; a holding means for positioning the end face center of the workpiece on each polishing disk surface of the polishing disk and holding the workpiece; And a linear guide means for pressing the end surface of the workpiece held by the means against the polishing plate surface of the polishing plate.
【請求項3】前記研磨盤公転手段は、 前記研磨盤の軸心自体を各研磨帯領域に相当する半径で
回転させる、 ことを特徴とする請求項2に記載の球面研磨装置。
3. The spherical polishing apparatus according to claim 2, wherein the polishing disk revolving means rotates the axis of the polishing disk itself at a radius corresponding to each polishing band region.
【請求項4】前記直線案内手段と前記保持手段との間
に、さらに、 前記研磨盤の研磨盤面に対して被加工物の軸心の傾きを
調整する傾き調整手段を備えた、 ことを特徴とする請求項1、2又は3に記載の球面研磨
装置。
4. An inclination adjusting means for adjusting the inclination of the axis of the workpiece with respect to the surface of the polishing plate of the polishing plate is further provided between the straight line guiding device and the holding device. The spherical polishing device according to claim 1, 2 or 3.
【請求項5】前記研磨盤公転手段による研磨盤の公転中
心を、 被加工物の先端の中心よりも数mm程度離隔することによ
り、研磨盤面を広く使用できるように設定した、 ことを特徴とする請求項1、2、3又は4に記載の球面
研磨装置。
5. A polishing plate surface can be widely used by separating the revolution center of the polishing plate by the polishing plate revolution means from the center of the tip of the workpiece by about several mm. The spherical polishing apparatus according to claim 1, 2, 3, or 4.
【請求項6】前記被加工物が、 光コネクタフェルール(接合用補強円筒棒材)である、 ことを特徴とする請求項1、2、3、4又は5に記載の
球面研磨装置。
6. The spherical polishing apparatus according to claim 1, wherein the workpiece is an optical connector ferrule (reinforcing cylindrical rod for joining).
【請求項7】研磨盤と、前記研磨盤を当該研磨盤の軸心
回りに回転させる研磨盤自転手段と、前記研磨盤の軸心
自体をある軸心回りに回転させる研磨盤公転手段と、前
記研磨盤の研磨盤面に被加工物の端面中心を位置付け
て、当該被加工物を保持する保持手段と、前記保持手段
にて保持された被加工物の端面を前記研磨盤の研磨盤面
に押し付ける直線案内手段とを有する球面研磨装置にお
いて、 前記研磨盤の研磨盤面に研磨液を供給しながら、前記被
加工物の端面を前記研磨盤の公転中心に押し付けた状態
にし、前記研磨盤自転手段にて研磨盤面を回転させつ
つ、前記研磨盤公転手段にて前記研磨盤の軸心自体をあ
る軸心回りに回転させて前記被加工物の端面を球面状に
研磨する、 ことを特徴とする球面研磨方法。
7. A polishing disk, a polishing disk rotation means for rotating the polishing disk around the axis of the polishing disk, and a polishing disk revolution means for rotating the axis of the polishing disk itself around a certain axis. Positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, holding means for holding the workpiece, and pressing the end face of the workpiece held by the holding part against the polishing plate surface of the polishing plate. In a spherical polishing device having a linear guide means, while supplying a polishing liquid to the polishing plate surface of the polishing plate, the end surface of the workpiece is pressed against the revolution center of the polishing plate, the polishing plate rotation means While rotating the polishing plate surface, the polishing plate revolving means rotates the axis of the polishing plate itself around a certain axis to polish the end surface of the workpiece into a spherical surface. Polishing method.
【請求項8】研磨盤と、前記研磨盤を当該研磨盤の軸心
回りに回転させる研磨盤自転手段と、前記研磨盤の軸心
自体をある軸心回りに回転させる研磨盤公転手段と、前
記研磨盤の研磨盤面に被加工物の端面中心を位置付け
て、当該被加工物を保持する保持手段と、前記保持手段
にて保持された被加工物の端面を前記研磨盤の研磨盤面
に押し付ける直線案内手段と、前記直線案内手段と前記
保持手段との間に設けられ、前記研磨盤の研磨盤面に対
して被加工物の軸心の傾きを調整する傾き調整手段とを
有する球面研磨装置において、 前記傾き調整手段にて被加工物の軸心を傾け、かつ当該
被加工物の端面を前記研磨盤の公転中心に押し付けた状
態にして、前記研磨盤自転手段にて研磨盤面を回転さ
せ、前記研磨盤の研磨盤面に研磨液を供給しながら、前
記研磨盤公転手段にて前記研磨盤の軸心自体をある軸心
回りに回転させて前記被加工物の端面を球面状に研磨す
る、 ことを特徴とする球面研磨方法。
8. A polishing disk, a polishing disk rotation means for rotating the polishing disk around the axis of the polishing disk, and a polishing disk revolution means for rotating the axis itself of the polishing disk around a certain axis. Positioning the end face center of the workpiece on the polishing plate surface of the polishing plate, holding means for holding the workpiece, and pressing the end face of the workpiece held by the holding part against the polishing plate surface of the polishing plate. A spherical polishing apparatus having linear guide means and inclination adjusting means provided between the linear guide means and the holding means for adjusting the inclination of the axis of the workpiece with respect to the polishing plate surface of the polishing plate Inclining the shaft center of the workpiece by the inclination adjusting means, and in a state where the end surface of the workpiece is pressed against the revolving center of the polishing disk, the polishing disk surface is rotated by the polishing disk rotation means, Do not supply polishing liquid to the polishing plate surface of the polishing plate. In addition, the polishing disk revolving means rotates the axis of the polishing disk itself around a certain axis to polish the end surface of the workpiece into a spherical surface.
【請求項9】前記研磨盤の研磨盤面は、 同心円状に複数の研磨帯領域に分割されてなる、 ことを特徴とする請求項7又は8に記載の球面研磨方
法。
9. The spherical polishing method according to claim 7, wherein the polishing plate surface of the polishing plate is concentrically divided into a plurality of polishing band regions.
【請求項10】前記研磨盤公転手段は、 前記研磨盤の軸心自体を各研磨帯領域に相当する半径で
回転させる、 ことを特徴とする請求項7、8又は9に記載の球面研磨
方法。
10. The spherical polishing method according to claim 7, wherein the polishing disk revolution means rotates the axis of the polishing disk itself at a radius corresponding to each polishing band area. .
【請求項11】前記研磨盤公転手段による研磨盤の公転
中心を、 被加工物の先端の中心よりも数mm程度離隔することによ
り、研磨盤面を広く使用した、 ことを特徴とする請求項7、8、9又は10に記載の球
面研磨方法。
11. The polishing plate surface is widely used by separating the revolution center of the polishing plate by the polishing plate revolution means from the center of the tip of the workpiece by about several mm. The method for polishing a spherical surface according to item 8, 8, 9 or 10.
【請求項12】前記被加工物が、 光コネクタフェルール(接合用補強円筒棒材)である、 ことを特徴とする請求項7、8、9、10又は11に記
載の球面研磨方法。
12. The spherical polishing method according to claim 7, wherein the work piece is an optical connector ferrule (reinforcing cylindrical rod for joining).
JP7063854A 1995-03-23 1995-03-23 Spherical polishing device and spherical polishing method Expired - Fee Related JP2877158B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7063854A JP2877158B2 (en) 1995-03-23 1995-03-23 Spherical polishing device and spherical polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7063854A JP2877158B2 (en) 1995-03-23 1995-03-23 Spherical polishing device and spherical polishing method

Publications (2)

Publication Number Publication Date
JPH08257887A true JPH08257887A (en) 1996-10-08
JP2877158B2 JP2877158B2 (en) 1999-03-31

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0929599A (en) * 1995-07-21 1997-02-04 Nec Corp Spherically processing method and device therefor
JP2001322061A (en) * 2000-05-16 2001-11-20 Nippon Telegraph & Telephone East Corp Device and method for polishing end face of optical fiber
JP2014121752A (en) * 2012-12-20 2014-07-03 Nippon Telegr & Teleph Corp <Ntt> Optical fiber polishing sheet, optical fiber tip processing device, and polishing processing method

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Publication number Priority date Publication date Assignee Title
JPS5528058A (en) * 1978-08-22 1980-02-28 Nippon Telegr & Teleph Corp <Ntt> End face forming device of connector for optical fiber connection
JPS59109452U (en) * 1983-01-11 1984-07-24 株式会社デイスコ Electroplated whetstone
JPS6322263A (en) * 1986-07-10 1988-01-29 Nippon Telegr & Teleph Corp <Ntt> Tip machining device for optical connector part
JPS63207552A (en) * 1987-02-23 1988-08-26 Nippon Telegr & Teleph Corp <Ntt> Face polishing device for bar stock
JPS63278759A (en) * 1987-05-08 1988-11-16 Toyo Shinku Kako Kk Polishing device for curved surface of cylindrical member
JPS6471659A (en) * 1987-06-11 1989-03-16 Tektronix Inc Optical-fiber tip grinder
JPH01121160A (en) * 1987-11-04 1989-05-12 Nakamuratome Seimitsu Kogyo Kk Spherical surface grinding attachment for ferrule tip
JPH0727923A (en) * 1993-07-06 1995-01-31 Honda Tsushin Kogyo Kk End face polishing machine for ferrule

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528058A (en) * 1978-08-22 1980-02-28 Nippon Telegr & Teleph Corp <Ntt> End face forming device of connector for optical fiber connection
JPS59109452U (en) * 1983-01-11 1984-07-24 株式会社デイスコ Electroplated whetstone
JPS6322263A (en) * 1986-07-10 1988-01-29 Nippon Telegr & Teleph Corp <Ntt> Tip machining device for optical connector part
JPS63207552A (en) * 1987-02-23 1988-08-26 Nippon Telegr & Teleph Corp <Ntt> Face polishing device for bar stock
JPS63278759A (en) * 1987-05-08 1988-11-16 Toyo Shinku Kako Kk Polishing device for curved surface of cylindrical member
JPS6471659A (en) * 1987-06-11 1989-03-16 Tektronix Inc Optical-fiber tip grinder
JPH01121160A (en) * 1987-11-04 1989-05-12 Nakamuratome Seimitsu Kogyo Kk Spherical surface grinding attachment for ferrule tip
JPH0727923A (en) * 1993-07-06 1995-01-31 Honda Tsushin Kogyo Kk End face polishing machine for ferrule

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0929599A (en) * 1995-07-21 1997-02-04 Nec Corp Spherically processing method and device therefor
JP2001322061A (en) * 2000-05-16 2001-11-20 Nippon Telegraph & Telephone East Corp Device and method for polishing end face of optical fiber
JP2014121752A (en) * 2012-12-20 2014-07-03 Nippon Telegr & Teleph Corp <Ntt> Optical fiber polishing sheet, optical fiber tip processing device, and polishing processing method

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