JPH08257524A - Spin coating machine - Google Patents

Spin coating machine

Info

Publication number
JPH08257524A
JPH08257524A JP6835495A JP6835495A JPH08257524A JP H08257524 A JPH08257524 A JP H08257524A JP 6835495 A JP6835495 A JP 6835495A JP 6835495 A JP6835495 A JP 6835495A JP H08257524 A JPH08257524 A JP H08257524A
Authority
JP
Japan
Prior art keywords
cup
waste liquid
liquid
cleaning liquid
waste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6835495A
Other languages
Japanese (ja)
Inventor
Yasushi Shinpo
泰史 新保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6835495A priority Critical patent/JPH08257524A/en
Publication of JPH08257524A publication Critical patent/JPH08257524A/en
Pending legal-status Critical Current

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Landscapes

  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To remove waste liquid sticking to the inside of a cup simply and sufficiently. CONSTITUTION: A spin chuck 6 is rotated at a high speed, an air current, etc., are straightened by a flow straightening plate 9, a chemical liquid is spread evenly on a glass substrate G to control the thickness of a coating film, and waste liquid is evaporated, received in a cup 1, and discharged from a waste liquid outlet 4. When the application of the chemical liquid on the glass substrate G is finished, a cup cover 7 and the flow straightening plate 9 is lifted by the elevation of a cup cover operation arm 8 to open a cup 1. Every time when a given number of the glass substrates G are treated, a valve 5 is closed to block the waste liquid outlet 4. Washing liquid is supplied from a washing liquid supply nozzle 10 to fill the cup 1 with the washing liquid. After the passage of a given time, the valve 5 is opened, and the washing liquid in the cup 1 is discarded to remove the waste liquid sticking to the inner wall of the cup 1, the flow straightening plate 9, and the lower surface of the cup cover 7.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、カップ内を自己洗浄す
るスピンコータに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin coater for self-cleaning the inside of a cup.

【0002】[0002]

【従来の技術】一般に、スピンコータは、スピンチャッ
クにより吸着保持したガラス基板上に薬液を定量滴下
し、ガラス基板の対向面に整流板を位置させた状態でガ
ラス基板を高速回転させることにより、ガラス基板上に
薬液を均一に塗布する装置である。そして、ガラス基板
を高速回転の際に、余分な薬液は飛散して廃液となりカ
ップ内に付着するが、この廃液をそのまま放置しておく
と、カップ内に残留した廃液は乾燥して剥れ落ち、ダス
トとしてガラス基板に付着して不良の原因となる。ま
た、ダストとして付着しなくとも、特にガラス基板の対
向面の整流板の洗浄が不十分の場合にも、塗布膜厚へ影
響をおよぼして不良の原因となり、歩留まりが低下して
しまう。このため、定期的にカップ内に付着した廃液を
除去する必要がある。
2. Description of the Related Art In general, a spin coater drops a chemical solution on a glass substrate sucked and held by a spin chuck in a fixed amount, and rotates the glass substrate at a high speed with a current plate positioned on the opposite surface of the glass substrate. This is a device for uniformly applying a chemical solution onto a substrate. Then, when the glass substrate is rotated at a high speed, excess chemical liquid is scattered and becomes waste liquid and adheres to the cup.If the waste liquid is left as it is, the waste liquid remaining in the cup dries and peels off. , Adheres to the glass substrate as dust and causes defects. Further, even if the dust does not adhere as dust, even if the rectifying plate on the facing surface of the glass substrate is not sufficiently cleaned, it affects the coating film thickness, causes defects, and lowers the yield. Therefore, it is necessary to regularly remove the waste liquid adhering to the inside of the cup.

【0003】そして、従来のカップ内自己洗浄は、薬液
供給ノズルに併設されたり、あるいは、薬液供給ノズル
とは別個にカップ内に設置された洗浄液供給ノズルより
洗浄液を滴下し、薬液塗布の動作と同様にスピンチャッ
クを高速回転させ、洗浄液をカップ内に飛散させること
により、カップ内に付着した薬液を除去している。
In the conventional self-cleaning in a cup, a cleaning liquid is dropped from a cleaning liquid supply nozzle which is installed in the cup separately from the chemical liquid supply nozzle or which is installed separately from the chemical liquid supply nozzle to apply the chemical liquid. Similarly, the spin chuck is rotated at a high speed to scatter the cleaning liquid into the cup, thereby removing the chemical liquid adhering to the cup.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、スピン
チャックを高速回転させることにより洗浄液をカップ内
に飛散させても、洗浄液は一様に拡がらないため、カッ
プ内に付着した廃液の一部は除去できずに残留する。
However, even if the cleaning liquid is spattered in the cup by rotating the spin chuck at a high speed, the cleaning liquid does not spread uniformly, so that a part of the waste liquid adhering to the cup is removed. It cannot be done and remains.

【0005】このため、残留した薬液により歩留まりの
低下を引き起こさない様、従来は、定期的にカップを分
解して清掃しなければならず、取扱いが煩雑である問題
を有している。
For this reason, conventionally, the cup must be disassembled and cleaned at regular intervals so that the yield may not be reduced due to the remaining chemical solution, and the handling is complicated.

【0006】本発明は、上記問題点に鑑みなされたもの
で、カップ内に付着した廃液を簡単にかつ十分に除去で
きるスピンコータを提供することを目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a spin coater capable of easily and sufficiently removing the waste liquid adhering to the inside of the cup.

【0007】[0007]

【課題を解決するための手段】本発明のスピンコータ
は、基板を吸着保持して高速回転させるチャックと、廃
液を廃棄する廃棄口を有し、前記チャックを前記基板と
ともに収納するカップと、前記廃棄口を開閉する開閉手
段と、前記カップに洗浄液を供給する洗浄液供給ノズル
とを具備し、前記開閉手段により前記廃棄口を閉塞し、
前記洗浄液供給ノズルより前記カップに洗浄液を供給
し、前記カップ内を洗浄液で満たしてこのカップ内に付
着した廃液を除去するものである。
A spin coater of the present invention has a chuck for adsorbing and holding a substrate and rotating it at a high speed, a disposal port for discarding waste liquid, a cup for accommodating the chuck together with the substrate, and the disposal. An opening / closing means for opening / closing the mouth, and a cleaning liquid supply nozzle for supplying a cleaning liquid to the cup are provided, and the waste opening is closed by the opening / closing means.
The cleaning liquid is supplied to the cup from the cleaning liquid supply nozzle, the interior of the cup is filled with the cleaning liquid, and the waste liquid adhering to the cup is removed.

【0008】[0008]

【作用】本発明は、廃棄口を開閉手段により閉塞し、洗
浄液供給ノズルよりカップ内に洗浄液を供給し、カップ
内を洗浄液で満たすことにより、カップ内に付着した廃
液を除去する。
According to the present invention, the waste port is closed by the opening / closing means, the cleaning liquid is supplied from the cleaning liquid supply nozzle into the cup, and the inside of the cup is filled with the cleaning liquid to remove the waste liquid adhering to the inside of the cup.

【0009】[0009]

【実施例】以下、本発明のスピンコータの一実施例を図
面を参照して説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the spin coater of the present invention will be described below with reference to the drawings.

【0010】図1において、1はカップで、このカップ
1は内部に上面が開口した収納部2が形成され、この収
納部2の底面は外方に向けて下降する形状のテーパ面3
にて形成され、この収納部2のテーパ面3の最下面から
廃棄口としての廃液・排気口4が形成されている。ま
た、廃液・排気口4にはこの廃液・排気口4を開閉する
開閉手段としての開閉バルブ5が設けられている。
In FIG. 1, reference numeral 1 denotes a cup, which is internally formed with a storage portion 2 having an open top surface, and the bottom surface of the storage portion 2 is a tapered surface 3 having a shape descending outward.
The waste liquid / exhaust port 4 as a waste port is formed from the lowermost surface of the taper surface 3 of the storage section 2. Further, the waste liquid / exhaust port 4 is provided with an opening / closing valve 5 as an opening / closing means for opening / closing the waste liquid / exhaust port 4.

【0011】そして、カップ1の収納部2の内部には、
ガラス基板Gを着脱自在に保持するスピンチャック6が
回転自在に設けられている。
Then, inside the storage portion 2 of the cup 1,
A spin chuck 6 that detachably holds the glass substrate G is rotatably provided.

【0012】また、カップ1の収納部2の上部の開口
は、着脱自在にカップカバー7が設けられ、このカップ
カバー7にはカップカバー開閉アーム8が取り付けら
れ、カップカバー開閉アーム8の上下動にて開閉され、
このカップカバー7の下面には、スピンチャック6に対
向する整流板9が取り付けられている。
Further, a cup cover 7 is detachably attached to an opening in the upper portion of the storage portion 2 of the cup 1, and a cup cover opening / closing arm 8 is attached to the cup cover 7 to move the cup cover opening / closing arm 8 up and down. Is opened and closed at
A current plate 9 facing the spin chuck 6 is attached to the lower surface of the cup cover 7.

【0013】さらに、カップ1の収納部2上には、洗浄
液を供給する洗浄液供給ノズル10が設けられているとと
もに、図2に示すように、薬液供給ノズル11が設けられ
ている。
Further, a cleaning liquid supply nozzle 10 for supplying a cleaning liquid is provided on the storage portion 2 of the cup 1, and a chemical liquid supply nozzle 11 is provided as shown in FIG.

【0014】次に、上記実施例の動作について説明す
る。
Next, the operation of the above embodiment will be described.

【0015】まず、ガラス基板Gに薬液を供給する場合
には、図2に示すように、ガラス基板Gを搬送しスピン
チャック6にて吸着保持し、カップ1内に薬液供給ノズ
ル11を移動してガラス基板Gの中央近傍上に位置させ、
この薬液供給ノズル11から薬液をガラス基板G上に供給
し、再び薬液供給ノズル11をカップ1外に移動させ、カ
ップカバー開閉アーム8を下降させてカップカバー7で
カップ1の収納部2の開口を閉塞するとともに、整流板
9をガラス基板Gに対向させる。
First, when supplying a chemical solution to the glass substrate G, as shown in FIG. 2, the glass substrate G is conveyed and held by suction by the spin chuck 6, and the chemical solution supply nozzle 11 is moved into the cup 1. The glass substrate G near the center,
The chemical liquid is supplied from the chemical liquid supply nozzle 11 onto the glass substrate G, the chemical liquid supply nozzle 11 is again moved to the outside of the cup 1, the cup cover opening / closing arm 8 is lowered, and the cup cover 7 opens the storage portion 2 of the cup 1. Is closed and the current plate 9 is opposed to the glass substrate G.

【0016】そして、この状態で、スピンチャック6を
所定のプロファイルで高速回転させ、整流板9により気
流などを整流してガラス基板G上の薬液を均一に広げて
塗布膜厚を制御し、廃液となる余分な薬液を飛ばして、
カップ1内に収容して廃液・排気口4から排出する。
Then, in this state, the spin chuck 6 is rotated at a high speed with a predetermined profile, the air current is rectified by the current plate 9 to uniformly spread the chemical liquid on the glass substrate G to control the coating film thickness, and the waste liquid is discharged. The extra chemical solution that becomes
It is stored in the cup 1 and discharged from the waste liquid / exhaust port 4.

【0017】さらに、ガラス基板G上の薬液の塗布が終
了すると、カップカバー開閉アーム8の上昇により、カ
ップカバー7および整流板9が上昇し、カップ1が開口
する。
Further, when the application of the chemical liquid on the glass substrate G is completed, the cup cover opening / closing arm 8 is moved up, the cup cover 7 and the flow regulating plate 9 are moved up, and the cup 1 is opened.

【0018】なお、スピンチャック9を高速回転する際
に、余分な薬液が飛散してカップ1の内壁、整流板9お
よびカップカバー7の下面に付着する。
When the spin chuck 9 is rotated at a high speed, excess chemical liquid scatters and adheres to the inner wall of the cup 1, the rectifying plate 9 and the lower surface of the cup cover 7.

【0019】そこで、ガラス基板Gを一定枚数処理する
毎にカップ1内の自己洗浄を行なう。
Therefore, every time a certain number of glass substrates G are processed, the inside of the cup 1 is self-cleaned.

【0020】この洗浄は、開閉バルブ5を閉じ、廃液・
排気口4を閉塞する。そして、カップカバー7に設置さ
れた洗浄液供給ノズル10より洗浄液を供給し、カップ1
内を洗浄液で満たす。さらに、一定時間経過後に、開閉
バルブ5を開き、廃液・排気口4よりカップ1内の洗浄
液を廃棄することで、カップ1の内壁、整流板9、およ
び、カップカバー7の下面に付着した廃液を除去する。
For this cleaning, the on-off valve 5 is closed and the waste liquid
The exhaust port 4 is closed. Then, the cleaning liquid is supplied from the cleaning liquid supply nozzle 10 installed in the cup cover 7, and the cup 1
Fill the inside with cleaning liquid. Further, after a lapse of a certain time, the opening / closing valve 5 is opened, and the cleaning liquid in the cup 1 is discarded through the waste liquid / exhaust port 4, so that the waste liquid attached to the inner wall of the cup 1, the rectifying plate 9, and the lower surface of the cup cover 7 is discharged. To remove.

【0021】上記の様な簡単な構造でカップ内に付着し
た薬液を容易に除去することができ、歩留まりおよび稼
働率を向上させることができる。
With the simple structure as described above, the chemical liquid adhering to the inside of the cup can be easily removed, and the yield and the operating rate can be improved.

【0022】上記実施例によれば、廃液・排気口4を閉
塞し、洗浄液供給ノズル10より洗浄液を供給し、カップ
1内を洗浄液で満たすことにより、カップ1の内壁、整
流板9、および、カップカバー7の下面に付着した薬液
を除去することができる。特に、ガラス基板Gの対向面
の整流板9については、構造的に設置が困難な専用の洗
浄液供給ノズルがなくとも、付着した薬液を除去するこ
とができる。
According to the above-described embodiment, the waste liquid / exhaust port 4 is closed, the cleaning liquid is supplied from the cleaning liquid supply nozzle 10, and the inside of the cup 1 is filled with the cleaning liquid, whereby the inner wall of the cup 1, the straightening plate 9, and The chemical liquid adhering to the lower surface of the cup cover 7 can be removed. In particular, with respect to the current plate 9 on the opposite surface of the glass substrate G, the attached chemical liquid can be removed without a dedicated cleaning liquid supply nozzle that is structurally difficult to install.

【0023】そして、カップ1内に薬液が残留しないた
め、薬液がダストとしてガラス基板Gに付着したり、塗
布膜厚へ悪影響をおよぼしたりせず、歩留まりを向上で
きる。
Since the chemical solution does not remain in the cup 1, the chemical solution does not adhere to the glass substrate G as dust and does not adversely affect the coating film thickness, and the yield can be improved.

【0024】また、カップ1を定期的に分解し清掃する
必要がないため、危険を伴う溶剤の取り扱い回数を削減
でき、さらに、稼働率を向上できる。
Further, since it is not necessary to periodically disassemble and clean the cup 1, it is possible to reduce the number of times of handling a dangerous solvent and to improve the operation rate.

【0025】[0025]

【発明の効果】本発明のスピンコータによれば、廃棄口
を閉塞してカップ内を洗浄液で満たすことにより、簡単
にカップ内に付着した廃液を十分に除去できる。
According to the spin coater of the present invention, by closing the waste port and filling the inside of the cup with the cleaning liquid, the waste liquid attached to the cup can be easily and sufficiently removed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のスピンコータの一実施例のカップの自
己洗浄を示す断面図である。
FIG. 1 is a sectional view showing self-cleaning of a cup of an embodiment of a spin coater of the present invention.

【図2】同上カップカバーの開口時の断面図である。FIG. 2 is a sectional view of the same cup cover when opened.

【符号の説明】[Explanation of symbols]

1 カップ 4 廃棄口としての廃液・排気口 6 スピンチャック 5 開閉手段としての開閉バルブ 10 洗浄液供給ノズル G ガラス基板 1 cup 4 waste liquid / exhaust port as waste port 6 spin chuck 5 open / close valve as opening / closing means 10 cleaning liquid supply nozzle G glass substrate

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基板を吸着保持して高速回転させるチャ
ックと、 廃液を廃棄する廃棄口を有し、前記チャックを前記基板
とともに収納するカップと、 前記廃棄口を開閉する開閉手段と、 前記カップに洗浄液を供給する洗浄液供給ノズルとを具
備し、 前記開閉手段により前記廃棄口を閉塞し、前記洗浄液供
給ノズルより前記カップに洗浄液を供給し、前記カップ
内を洗浄液で満たしてこのカップ内に付着した廃液を除
去することを特徴としたスピンコータ。
1. A chuck that holds a substrate by suction and rotates at a high speed, a cup that has a waste port that discards waste liquid, and a cup that houses the chuck together with the substrate, an opening / closing unit that opens and closes the waste port, and the cup. A cleaning liquid supply nozzle for supplying a cleaning liquid to the cup, the waste opening is closed by the opening / closing means, the cleaning liquid is supplied to the cup from the cleaning liquid supply nozzle, and the inside of the cup is filled with the cleaning liquid and adhered to the cup. A spin coater characterized by removing the waste liquid produced.
JP6835495A 1995-03-27 1995-03-27 Spin coating machine Pending JPH08257524A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6835495A JPH08257524A (en) 1995-03-27 1995-03-27 Spin coating machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6835495A JPH08257524A (en) 1995-03-27 1995-03-27 Spin coating machine

Publications (1)

Publication Number Publication Date
JPH08257524A true JPH08257524A (en) 1996-10-08

Family

ID=13371406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6835495A Pending JPH08257524A (en) 1995-03-27 1995-03-27 Spin coating machine

Country Status (1)

Country Link
JP (1) JPH08257524A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306175A (en) * 2007-05-09 2008-12-18 Elpida Memory Inc Substrate production method
JP2012256743A (en) * 2011-06-09 2012-12-27 Tokyo Electron Ltd Liquid processing apparatus and liquid processing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306175A (en) * 2007-05-09 2008-12-18 Elpida Memory Inc Substrate production method
JP4534175B2 (en) * 2007-05-09 2010-09-01 エルピーダメモリ株式会社 Substrate manufacturing method
JP2012256743A (en) * 2011-06-09 2012-12-27 Tokyo Electron Ltd Liquid processing apparatus and liquid processing method

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