JPH08227882A - Wafer baking device - Google Patents

Wafer baking device

Info

Publication number
JPH08227882A
JPH08227882A JP5655695A JP5655695A JPH08227882A JP H08227882 A JPH08227882 A JP H08227882A JP 5655695 A JP5655695 A JP 5655695A JP 5655695 A JP5655695 A JP 5655695A JP H08227882 A JPH08227882 A JP H08227882A
Authority
JP
Japan
Prior art keywords
heat
wafer
conductive members
heat pipe
baking device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5655695A
Other languages
Japanese (ja)
Inventor
Hiroshi Miyaji
浩 宮地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP5655695A priority Critical patent/JPH08227882A/en
Publication of JPH08227882A publication Critical patent/JPH08227882A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To realize a wafer baking device which is very uniform in temperature distribution throughout its surface by a method wherein two thermally conductive members are formed like a disk conforming to the shape of a wafer respectively, a heat pipe is symmetrically buried in the joint surface of each of the conductive members in a radial manner, the conductive members are joined together making their joint surfaces confront each other, and a heating member is provided to underside of the joined conductive members for the formation of a wafer baking device, wherein a wafer is placed on its surface for baking. CONSTITUTION: Material excellent in thermal conductivity is formed into a disklike thermal conductive member 2 conforming to the shape of a wafer, a heat pipe 1 is symmetrically buried in the joint surface of each of the conductive member 2 in a radial manner, the two conductive members 2 are joined together making their joint surfaces confront each other, and a heating member 3 is provided to underside of the joined conductive members 2 for the formation of a wafer baking device, wherein a wafer is placed on its surface for baking. By this setup, when heat released from the heating member 3 is conducted to a part of the heat pipe 1, heat is quickly and uniformly transmitted to all the thermal conductive members 2 by the heat conducting action of the heat pipes 1, so that all the thermal conductive members 2 are evenly heated almost uniform in temperature distribution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、IC等の半導体デバ
イスを形成するためのウエハの焼付装置に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer printing apparatus for forming semiconductor devices such as ICs.

【0002】[0002]

【従来の技術】半導体デバイス、例えばIC(集積回
路)等は、高純度のシリコン単結晶のウエハに対し、感
光性樹脂への露光によるパターン形成を行うフォトリソ
グラフィを行った後、熱酸化、不純物拡散、イオン注
入、エッチング、気相成長、金属蒸着等の各種作業工程
を経て形成されるものである。
2. Description of the Related Art A semiconductor device such as an IC (integrated circuit) is subjected to photolithography for forming a pattern on a highly pure silicon single crystal wafer by exposure to a photosensitive resin, followed by thermal oxidation and impurities. It is formed through various work processes such as diffusion, ion implantation, etching, vapor phase growth, metal deposition and the like.

【0003】このうち熱酸化工程時には、ウエハの加熱
酸化を行うため、例えば図5に示すような焼付装置が知
られている。即ち、この焼付装置は、ウエハ(図略)の
形状に合わせた円板型をなすアルミプレート100と、
このアルミプレート100の裏面に固着したヒータ10
1とを備えており、ヒータ101から発生する熱がウエ
ハを搭載した熱伝導性の良好なアルミプレート100に
伝播してウエハを熱酸化するようになっている。
Of these, a baking apparatus as shown in FIG. 5, for example, is known in order to oxidize the wafer by heating during the thermal oxidation step. That is, this printing apparatus includes a disc-shaped aluminum plate 100 that matches the shape of a wafer (not shown),
The heater 10 fixed to the back surface of the aluminum plate 100
1, the heat generated from the heater 101 is propagated to the aluminum plate 100 having good thermal conductivity on which the wafer is mounted, and the wafer is thermally oxidized.

【0004】[0004]

【発明が解決しようとする課題】ところが、この焼付装
置は、ヒータからの発生する熱が各部均一であったとし
ても、この熱が伝導するアルミプレートはその形状から
周縁部側ほど外部へ散逸する熱も多いから、どうしても
加熱温度に位置的な分布むらを生み易く、この結果良好
な熱酸化作業を実現することができず、問題となってい
る。
However, in this printing apparatus, even if the heat generated from the heater is uniform in each part, the aluminum plate through which this heat is conducted dissipates to the outside from the shape of the aluminum plate. Since a large amount of heat is generated, it is inevitable that uneven distribution in the heating temperature is likely to occur, and as a result, good thermal oxidation work cannot be realized, which is a problem.

【0005】そこで、この発明は、上記した事情に鑑
み、均一な温度分布を全面に亙り精度高く実現し、良好
な加熱動作を得ることができるウエハの焼付装置を提供
することを目的とするものである。
In view of the above-mentioned circumstances, an object of the present invention is to provide a wafer printing apparatus which can realize a uniform temperature distribution over the entire surface with high accuracy and can obtain a good heating operation. Is.

【0006】[0006]

【課題を解決するための手段】即ち、この請求項1に記
載の発明は、熱伝導性の良好な材料を用い、ウエハの形
状に合わせた円板状に形成されて上面に焼き付けるべき
ウエハが搭載され、互いに接合する接合面側にヒートパ
イプが放射状に対称的に設けられた熱伝導部材と、この
熱伝導部材の下面に設けた発熱部材とを備えたものであ
る。また、この請求項2に記載の発明は、内部全体に亙
り空洞状の熱伝導部を設けた熱伝導部材と、前記熱伝導
部材の下面に設けた発熱部材とを備えたものである。
That is, according to the invention described in claim 1, a wafer having a good thermal conductivity is used, which is formed into a disk shape corresponding to the shape of the wafer and is to be baked on the upper surface. The heat-conducting member which is mounted and in which the heat pipes are radially symmetrically provided on the joint surface side to be joined to each other and the heat-generating member provided on the lower surface of the heat-conducting member are provided. Further, the invention according to claim 2 is provided with a heat conducting member provided with a hollow heat conducting portion over the entire inside thereof, and a heat generating member provided on a lower surface of the heat conducting member.

【0007】[0007]

【作用】この請求項1に記載の発明では、熱伝導部材に
埋設されるヒートパイプがその熱伝導部材に対して放射
状かつ、対称的に配置されており、この発熱部材から発
生する熱がヒートパイプの一部に伝導すると、このヒー
トパイプによる熱伝導作用によって、その熱が位置的む
らを起こすことなく直ちに熱伝導部材全体に速やかに伝
播し、熱伝導部材全体が略一定温度に均等に加熱され
る。
According to the invention of claim 1, the heat pipes embedded in the heat conducting member are arranged radially and symmetrically with respect to the heat conducting member, and the heat generated from the heat generating member is the heat. When the heat is conducted to a part of the pipe, the heat conduction effect of this heat pipe causes the heat to immediately propagate to the entire heat conducting member without causing positional unevenness, and the entire heat conducting member is uniformly heated to a substantially constant temperature. To be done.

【0008】[0008]

【実施例】以下、この発明の実施例について、添付図面
を参照しながら説明する。図1は、この実施例に係るウ
エハの焼付装置を示す概略断面である。この実施例のウ
エハの焼付装置は、ヒートパイプ1を図2に示すように
放射状に対称的に埋設させて挟着した上下一対の熱伝導
部材2と、下部側の熱伝導部材2の下面に固着した発熱
部材3とから構成されている。
Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a schematic sectional view showing a wafer printing apparatus according to this embodiment. The wafer printing apparatus of this embodiment has a pair of upper and lower heat transfer members 2 in which a heat pipe 1 is radially symmetrically embedded and sandwiched between them, and a lower surface of the heat transfer member 2 on the lower side. The heat generating member 3 is fixedly attached.

【0009】ヒートパイプ1は、部分的に(一部を)加
熱させるだけでその熱が速やかに全体に広がり、全体が
略一定温度に加熱されるものであり、この実施例では例
えばアルミニウム等の材料で形成されている。またこの
ヒートパイプ1の内部には、図3に示すように、ウイッ
ク11とよばれる金属の髭状のものが内壁面に多数植設
されている。ヒートパイプ1の一部が加熱されると、内
部の水分が水蒸気となって冷熱(低温)部分へ速やかに
流動し、その冷熱部分のウイック11では水蒸気が凝結
して付着したり、毛細管現象でヒートパイプ1の内壁面
に付着していた水分がウイック11の間に吸い上げられ
るようになっている。なお、この実施例のヒートパイプ
1は、図2に示すように、寸法的に長短2種類のもの1
L、1Sから構成されて交互に配置されている。
The heat pipe 1 is one in which the heat is quickly spread to the whole by only partially (partly) heating, and the whole is heated to a substantially constant temperature. In this embodiment, for example, aluminum or the like is used. Made of material. Further, inside the heat pipe 1, as shown in FIG. 3, a large number of metal whiskers called wicks 11 are planted on the inner wall surface. When a part of the heat pipe 1 is heated, the moisture inside becomes steam and quickly flows to the cold (low temperature) part, and the wick 11 in the cold part condenses and adheres with steam, or due to a capillary phenomenon. Water adhering to the inner wall surface of the heat pipe 1 is sucked up between the wicks 11. The heat pipe 1 of this embodiment is, as shown in FIG.
It is composed of L and 1S and arranged alternately.

【0010】熱伝導部材2は、この実施例では材料的に
熱伝導性の良好なアルミニュウムを用いて形成されてお
り、焼き付けるウエハの大きさに合わせた径を有する略
円板状に形成した一対のアルミプレートで構成されてい
る。なお、これらの熱伝導部材2の互いに接合する接合
面の一部には、ヒートパイプ1を埋設するための凹所2
Aが形成されている。
In this embodiment, the heat conducting member 2 is made of aluminum, which has a good heat conductivity, and is a pair of substantially discs having a diameter corresponding to the size of the wafer to be baked. It is composed of an aluminum plate. In addition, a recess 2 for burying the heat pipe 1 is formed in a part of a joint surface where these heat conducting members 2 are joined to each other.
A is formed.

【0011】この実施例の発熱部材3は、熱伝導部材2
と同様の大きさに形成されたおよそ1mm程度の厚さを
有するシリコンラバのヒータが使用されており、電気的
に通電させて発熱させるようになっている。
The heat generating member 3 of this embodiment is the heat conducting member 2
A silicon rubber heater having a thickness of about 1 mm formed in the same size as the above is used, and is electrically energized to generate heat.

【0012】なお、この発明にかかるウエハの焼付装置
としては、特にこの実施例にかぎるものではなく、例え
ば図4に示すように、熱伝導部材2′の内面全体を空洞
状に形成し、この内壁面にウイック11を設けてヒート
パイプの代わりにヒートスペースとしてもよい。この場
合には、先の実施例の場合よりも、表面温度の均一化を
一層図ることができる。
The wafer printing apparatus according to the present invention is not particularly limited to this embodiment. For example, as shown in FIG. 4, the entire inner surface of the heat conducting member 2'is formed into a hollow shape. A wick 11 may be provided on the inner wall surface to serve as a heat space instead of the heat pipe. In this case, the surface temperature can be made more uniform than in the case of the previous embodiment.

【0013】[0013]

【発明の効果】従って、この請求項1の発明によれば、
熱伝導部材に埋設されるヒートパイプがその熱伝導部材
に対して放射状かつ、対称的に配置されており、この発
熱部材から発生する熱がヒートパイプの一部に伝導する
と、このヒートパイプによる熱伝導作用によって、その
熱が部分的なむらを起こすことなく直ちに熱伝導部材全
体に速やかに波及・伝播し、熱伝導部材全体が略一定温
度に均等に加熱されるから、均一な温度分布を全面に亙
り極く短時間に精度高く実現することができ、その結果
ウエハに対して良好な加熱作用を発揮することができ
る。
Therefore, according to the invention of claim 1,
The heat pipe embedded in the heat conducting member is arranged radially and symmetrically with respect to the heat conducting member, and when the heat generated from this heat generating member is conducted to a part of the heat pipe, the heat generated by this heat pipe Due to the conduction effect, the heat immediately spreads and propagates to the entire heat conducting member without causing partial unevenness, and the entire heat conducting member is evenly heated to a substantially constant temperature, resulting in a uniform temperature distribution over the entire surface. In addition, it can be realized with high accuracy in a very short time, and as a result, a good heating action for the wafer can be exhibited.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明に係るウエハの焼付装置を示す概略断
面図。
FIG. 1 is a schematic sectional view showing a wafer printing apparatus according to the present invention.

【図2】同装置の平面図。FIG. 2 is a plan view of the device.

【図3】同装置の部分拡大図。FIG. 3 is a partially enlarged view of the device.

【図4】この発明に係るウエハの焼付装置の変形例を示
す概略断面図。
FIG. 4 is a schematic sectional view showing a modified example of the wafer printing apparatus according to the present invention.

【図5】従来例を示す概略断面図。FIG. 5 is a schematic cross-sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1 ヒートパイプ 2 2′ 熱伝導部材 3 発熱部材 11 ウイック 1 heat pipe 2 2'heat conducting member 3 heat generating member 11 wick

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 熱伝導性の良好な材料を用い、ウエハの
形状に合わせた円板状に形成されて上面に焼き付けるべ
きウエハが搭載され、互いに接合する接合面側にヒート
パイプ(1)が放射状に対称的に設けられた熱伝導部材
(2)と、この熱伝導部材(2)の下面に設けた発熱部
材(3)とを備えたことを特徴とするウエハの焼付装
置。
1. A wafer, which is made of a material having good thermal conductivity, is formed into a disc shape matching the shape of a wafer, and a wafer to be baked is mounted on the upper surface of the heat pipe (1). A wafer printing apparatus comprising: a heat conducting member (2) provided radially and symmetrically; and a heat generating member (3) provided on a lower surface of the heat conducting member (2).
【請求項2】 内部全体に亙り空洞状の熱伝導部を設け
た熱伝導部材(2′)と、 前記熱伝導部材(2′)の下面に設けた発熱部材(3)
とを備えたことを特徴とするウエハの焼付装置。
2. A heat-conducting member (2 ′) having a hollow heat-conducting portion throughout the inside, and a heat-generating member (3) provided on the lower surface of the heat-conducting member (2 ′).
An apparatus for printing a wafer, comprising:
JP5655695A 1995-02-21 1995-02-21 Wafer baking device Pending JPH08227882A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5655695A JPH08227882A (en) 1995-02-21 1995-02-21 Wafer baking device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5655695A JPH08227882A (en) 1995-02-21 1995-02-21 Wafer baking device

Publications (1)

Publication Number Publication Date
JPH08227882A true JPH08227882A (en) 1996-09-03

Family

ID=13030396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5655695A Pending JPH08227882A (en) 1995-02-21 1995-02-21 Wafer baking device

Country Status (1)

Country Link
JP (1) JPH08227882A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001307978A (en) * 2000-04-18 2001-11-02 Tokyo Electron Ltd Substrate mounting table
CN100346450C (en) * 2003-06-04 2007-10-31 三星电子株式会社 Cooling apparatus for wafer baking plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001307978A (en) * 2000-04-18 2001-11-02 Tokyo Electron Ltd Substrate mounting table
CN100346450C (en) * 2003-06-04 2007-10-31 三星电子株式会社 Cooling apparatus for wafer baking plate

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