JPH0822499B2 - Method for polishing end face of single crystal substrate for optical element - Google Patents

Method for polishing end face of single crystal substrate for optical element

Info

Publication number
JPH0822499B2
JPH0822499B2 JP61268173A JP26817386A JPH0822499B2 JP H0822499 B2 JPH0822499 B2 JP H0822499B2 JP 61268173 A JP61268173 A JP 61268173A JP 26817386 A JP26817386 A JP 26817386A JP H0822499 B2 JPH0822499 B2 JP H0822499B2
Authority
JP
Japan
Prior art keywords
substrate
polishing
single crystal
optical waveguide
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61268173A
Other languages
Japanese (ja)
Other versions
JPS63123665A (en
Inventor
鈴木  誠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brother Industries Ltd
Original Assignee
Brother Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brother Industries Ltd filed Critical Brother Industries Ltd
Priority to JP61268173A priority Critical patent/JPH0822499B2/en
Publication of JPS63123665A publication Critical patent/JPS63123665A/en
Publication of JPH0822499B2 publication Critical patent/JPH0822499B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Description

【発明の詳細な説明】 技術分野 本発明は、光学素子用単結晶基板の端面研磨方法の改
良に関するものである。
TECHNICAL FIELD The present invention relates to an improvement in a method for polishing an end face of a single crystal substrate for an optical element.

従来技術 一般に、バーコードリーダやレーザプリンタなどにお
いては、一面に光導波路を備えた単結晶基板の一端面か
ら入射してその基板内を通過する光を電気光学効果など
に基づいて偏向させて他端面から出射する形式の光偏向
用の光学素子が用いられている。かかる光学素子に用い
られる単結晶基板において、光が入射且つ出射する両端
面には、入出射の際に光の進行方向に影響を与えること
のないよう、精度良く平滑な状態の光学的平面とするた
めの所謂光学研磨が施されるものである。
2. Description of the Related Art Generally, in a bar code reader, a laser printer, or the like, light that enters from one end surface of a single crystal substrate having an optical waveguide on one surface and passes through the substrate is deflected based on an electro-optical effect or the like. An optical element for deflecting light of the type that is emitted from the end face is used. In the single crystal substrate used for such an optical element, both end faces on which light enters and exits are provided with an optical flat surface in an accurate and smooth state so as not to affect the traveling direction of the light when entering and exiting. In order to do so, so-called optical polishing is performed.

しかしながら、かかる単結晶基板は、ニオブ酸リチウ
ム(LiNbO3)単結晶などにより形成されて比較的脆い材
質であるので、上述の光学研磨を施すことにより端面の
縁部、すなわち基板の角部などが欠けるという不都合が
生じていた。
However, since such a single crystal substrate is made of lithium niobate (LiNbO 3 ) single crystal or the like and is a relatively fragile material, the edge of the end face, that is, the corner of the substrate, etc. is formed by performing the above-mentioned optical polishing. The inconvenience of chipping occurred.

これに対して、研磨すべき単結晶基板の光導波路を備
えた側の一面と補助基板の一面とを重ね合わせ且つ両者
を締め着けて固定することによりそれぞれの両端面を同
時に研磨面に押し付けることにより、両端面の少なくと
も一方の縁部、すなわち光導波路が形成されている側の
縁部における欠けを防止しつつ研磨する方法を考えられ
ている。
On the other hand, by superposing one surface of the single crystal substrate to be polished on the side where the optical waveguide is provided and one surface of the auxiliary substrate and fastening and fixing them, both end surfaces of each substrate are pressed simultaneously against the polishing surface. Therefore, a method of polishing while preventing at least one edge portion of both end surfaces, that is, the edge portion on the side where the optical waveguide is formed, is considered.

発明が解決すべき問題点 しかしながら、かかる方法は、単結晶基板と補助基板
とを重ね合わせて締め着けることによって同時に研磨を
施すものであり、その締め着け作業の間あるいは研磨中
に両基板間のずれが生じて、補助基板と向かい合う側、
すなわち光導波路が形成されている側の基板の端縁部が
欠けてしまう場合があった。また、研磨終了後、両基板
に対する締着の解除などの取扱い時において、単結晶基
板の端縁部が締着用の治具と接触したりして欠けてしま
うおそれがあった。
Problems to be Solved by the Invention However, such a method is to perform polishing simultaneously by superposing and tightening a single crystal substrate and an auxiliary substrate. The side that is displaced and faces the auxiliary board,
That is, the edge portion of the substrate on the side where the optical waveguide is formed may be chipped. In addition, after polishing, when handling such as releasing the fastening to both substrates, there is a risk that the edge portion of the single crystal substrate may come into contact with the fastening jig and be chipped.

上記に対し、単結晶基板と補助基板との両基板を接着
剤により接着した状態で光学研磨を施し、その後に接着
剤を除去して両基板を剥離させることも考えられる。し
かしながら、このような方法では、両基板の間で一旦硬
化した接着剤を溶出させることは極めて困難であり、た
とえ可能であるとしてもそのための特殊な高価な樹脂や
長時間の溶出作業時間を必要とし、現実的な応用は困難
であった。また、前述の場合と同様に、研磨終了後に両
基板の間で硬化した接着剤の解除などの取扱時におい
て、単結晶基板の端縁部が締着用の治具と接触したりし
て欠けてしまうおそれがあった。
On the other hand, it is also conceivable to perform optical polishing in a state where both the single crystal substrate and the auxiliary substrate are bonded with an adhesive, and then remove the adhesive to separate the two substrates. However, with such a method, it is extremely difficult to elute the adhesive once cured between both substrates, and even if it is possible, it requires a special expensive resin and a long elution work time. However, practical application was difficult. Also, as in the case described above, when handling such as releasing the cured adhesive between both substrates after polishing, the edge portion of the single crystal substrate may come into contact with the fastening jig and may be chipped. There was a risk of it.

問題点を解決するための手段 本発明は、以上の事情を背景として為されたものであ
り、その要旨とするところは、一面に光導波路を備えた
光学素子用単結晶基板の端面を光学的平面に研磨する方
法であって、(a)前記基板の一面に、その基板と略同
様の被研磨特性と前記光導波路よりも低い屈折率とを有
する補助基板を、その光導波路よりも低い屈折率を有す
る接着剤を用いて接着する接着工程と、(b)前記基板
の端面と前記補助基板の端面とを、研磨面に押圧するこ
とにより両端面を同時に研磨する研磨工程とを含むこと
にある。
Means for Solving the Problems The present invention has been made against the background of the above circumstances, and the gist thereof is to provide an optical device in which an end face of a single crystal substrate for an optical element having an optical waveguide on one face is optically formed. A method of polishing to a flat surface, comprising: (a) an auxiliary substrate having substantially the same polishing characteristics as that of the substrate and a refractive index lower than that of the optical waveguide on one surface of the substrate and having a refractive index lower than that of the optical waveguide. To include an adhering step of adhering using an adhesive having a ratio, and (b) a polishing step of simultaneously polishing both end surfaces of the substrate and the auxiliary substrate by pressing the end surfaces of the substrate and the auxiliary substrate against a polishing surface. is there.

作用および発明の効果 このような方法によれば、一面に光導波路を備えた基
板と補助基板とが接着されているので、研磨中などに互
いにずれることがなく光導波路を備えた側の基板の端縁
の欠けが生じないという効果が得られるとともに、補助
基板と基板とが略同様の研磨性を備えているので、研磨
作業が容易となる。
According to the method and the effect of the invention, since the substrate having the optical waveguide and the auxiliary substrate are bonded to each other on one surface, the substrate on the side having the optical waveguide does not shift from each other during polishing. The effect that no chipping of the edge is generated can be obtained, and since the auxiliary substrate and the substrate have substantially the same polishing property, the polishing operation becomes easy.

また、単結晶基板の光導波路よりも屈折率が低い補助
基板が、同様に基板の光導波路よりも屈折率が低い接着
剤を用いて単結晶基板の光導波路側の一面に接着される
ので、光導波路内を伝播する光は上記接着剤や補助基板
側へ漏れ出ることがなく、上記単結晶基板は補助基板を
剥離除去しなくても光学素子として使用することが可能
となる。したがって、本発明方法によれば、補助基板を
剥離除去しなくてもよいことから、両基板の間で一旦硬
化した接着剤を溶出させるという極めて困難でありしか
も特殊な高価な樹脂や長時間の溶出作業時間を必要とす
る接着剤溶出作業が不要となると同時に、研磨終了後に
両基板の間で硬化した接着剤の解除などの取扱時におい
て、単結晶基板の端縁部が締着用の治具と接触したりし
て欠けてしまうおそれが好適に解消される。
Further, since the auxiliary substrate whose refractive index is lower than that of the optical waveguide of the single crystal substrate is similarly bonded to one surface of the optical waveguide side of the single crystal substrate using an adhesive whose refractive index is lower than that of the optical waveguide of the substrate, The light propagating in the optical waveguide does not leak to the adhesive or the auxiliary substrate side, and the single crystal substrate can be used as an optical element without peeling and removing the auxiliary substrate. Therefore, according to the method of the present invention, since it is not necessary to peel and remove the auxiliary substrate, it is extremely difficult to elute the adhesive once cured between both substrates, and a special expensive resin or a long time The adhesive elution work, which requires a time for elution work, is not required, and at the same time when the adhesive that has hardened between the two substrates is released after polishing, the edge of the single crystal substrate is a jig for fastening. It is possible to suitably eliminate the possibility that it may come into contact with and be chipped.

実施例 以下、本発明の一実施例を図面に基づいて詳細に説明
する。
Embodiment Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第1図は、光偏向用の光学素子に用いられる基板10を
示すものである。ニオブ酸リチウム(LiNbO3)単結晶か
ら成る基板10は、0.5mm程度の厚みを備えており、その
一面には、二次元光導波路12が設けられている。この二
次元光導波路12は、たとえば2.2〜2.22程度の屈折率を
有し、基板10の他の部分よりもその屈折率が大きくされ
て厚み方向に光を閉じ込める特性により光が好適に導か
れるようになっており、たとえば基板10の表面からTi
(チタン)を拡散させることにより数μm程度の比較的
薄い層状に形成されている。なお、基板10と二次元光導
波路12とは屈折率が異なるのみでありしかもその屈折率
は連続的に変化するため、それらの境界は破線にて示さ
れている。
FIG. 1 shows a substrate 10 used for an optical element for deflecting light. A substrate 10 made of lithium niobate (LiNbO 3 ) single crystal has a thickness of about 0.5 mm, and a two-dimensional optical waveguide 12 is provided on one surface thereof. The two-dimensional optical waveguide 12 has a refractive index of, for example, about 2.2 to 2.22, and the refractive index thereof is made larger than that of the other portions of the substrate 10 so that the light is preferably guided by the characteristic of confining the light in the thickness direction. From the surface of the substrate 10
Diffusion of (titanium) forms a relatively thin layer of about several μm. The substrate 10 and the two-dimensional optical waveguide 12 only have different refractive indexes, and the refractive indexes thereof continuously change. Therefore, the boundaries between them are shown by broken lines.

このような基板10の両端面、すなわち光の入射面およ
び出射面にいわゆる光学研磨を施すために、第2図に示
すように、基板10の二次元光導波路12が設けられている
側の一面上において互いに対向する両端面の端縁に沿っ
て、接着剤14を用いて一対の補助基板16をそれぞれ接着
する。この接着剤14は、トリクロールプロパントリアク
リレート,ペンタエリスリトールトリアクリレートなど
の紫外線硬化性の樹脂製であり、硬化後には二次元光導
波路12よりも低い屈折率を有し且つ光の減衰の少ないも
のである。また補助基板16は、基板10と略同じ材質であ
って略同様の被研磨性を備えた物質、たとえばLiNbO3
結晶から成る0.5mm程度の厚みを備えたものであるが、
その一面は鏡面であって光導波路は形成されていないの
で、前記二次元光導波路12よりも低い屈折率を有してい
る。そして、補助基板16が接着された基板10の両端面と
一対の補助基板16の一端面とを互いに精度良く平滑とす
るために面出し切断加工を施した後、その両端面を光学
研磨用のラッピングマシンなどの研磨面18に押圧してそ
れぞれ研磨するのである。
In order to perform so-called optical polishing on both end surfaces of the substrate 10, that is, the light incident surface and the light emitting surface, one surface of the substrate 10 on which the two-dimensional optical waveguide 12 is provided, as shown in FIG. A pair of auxiliary substrates 16 are bonded using an adhesive agent 14 along the edges of both end surfaces facing each other above. The adhesive 14 is made of an ultraviolet curable resin such as trichlorpropane triacrylate or pentaerythritol triacrylate, and has a lower refractive index than the two-dimensional optical waveguide 12 and little light attenuation after curing. Is. The auxiliary substrate 16 is made of the same material as the substrate 10 and has substantially the same abradability as that of the substrate 10, and has a thickness of about 0.5 mm made of, for example, LiNbO 3 single crystal.
Since one surface thereof is a mirror surface and no optical waveguide is formed, it has a lower refractive index than the two-dimensional optical waveguide 12. Then, after both end surfaces of the substrate 10 to which the auxiliary substrate 16 is adhered and one end surface of the pair of auxiliary substrates 16 are subjected to chamfering and cutting processing in order to make them smooth with respect to each other, both end surfaces thereof are used for optical polishing. The polishing surface 18 of a lapping machine or the like is pressed to perform polishing.

このとき、基板10の材質であるLiNbO3単結晶は研磨に
対して比較的脆い性質を有するものであるが、基板10の
二次元光導波路12が備えられた一面側の両端縁はそれぞ
れ接着剤14および補助基板16により保護された状態であ
るので、上述のような光学研磨を行っても基板10の二次
元光導波路12が形成された側の端縁は欠けたりすること
がない。
At this time, the LiNbO 3 single crystal that is the material of the substrate 10 has a relatively fragile property with respect to polishing, but the two edges of the substrate 10 on the one surface side where the two-dimensional optical waveguide 12 is provided are adhesive respectively. Since it is protected by the auxiliary substrate 16 and the auxiliary substrate 16, the edge of the substrate 10 on the side where the two-dimensional optical waveguide 12 is formed will not be chipped off even if the above optical polishing is performed.

以上のように光学研磨を施した基板10を偏向用光学素
子に用いる場合には、その一端面に第3図に示すように
半導体レーザ20を貼着し、この半導体レーザ20から基板
10の一端面を通して基板10内の二次元光導波路12内に光
が入射される。このとき、接着剤14および補助基板16は
基板10の二次元光導波路12が形成された側の一面に接着
されたままの状態であるが、接着剤14の屈折率はたとえ
ば1.5程度であって二次元光導波路12の屈折率よりも低
くされているため、二次元光導波路12内を通過する入射
光が接着剤14へ向かって漏れることは殆どない。そし
て、入射光が二次元光導波路12内を導かれる過程で図示
しない複数の電極により制御電圧が印加されると、その
制御電圧に従って基板10内に形成される電界から電気光
学効果に基づいて形成される屈折率分布により、入射光
が所望の角度で偏向されるのである。基板10内で偏向さ
れた光は、上述のように光学研磨が施された基板10の他
端面から出射されるのである。
When the substrate 10 that has been optically polished as described above is used for a deflecting optical element, a semiconductor laser 20 is attached to one end surface of the substrate 10 as shown in FIG.
Light is incident on the two-dimensional optical waveguide 12 in the substrate 10 through one end surface of 10. At this time, the adhesive 14 and the auxiliary substrate 16 remain adhered to one surface of the substrate 10 on the side where the two-dimensional optical waveguide 12 is formed, but the refractive index of the adhesive 14 is, for example, about 1.5. Since the refractive index is lower than that of the two-dimensional optical waveguide 12, incident light passing through the two-dimensional optical waveguide 12 hardly leaks toward the adhesive 14. Then, when a control voltage is applied by a plurality of electrodes (not shown) in the process of the incident light being guided through the two-dimensional optical waveguide 12, an electric field formed in the substrate 10 according to the control voltage is formed based on the electro-optic effect. The incident light is deflected at a desired angle due to the refractive index distribution. The light deflected in the substrate 10 is emitted from the other end surface of the substrate 10 which has been optically polished as described above.

上述したように、本実施例の端面研磨方法を適用する
ことにより、光学素子に用いられる基板10の入射面およ
び出射面の光学研磨に際しては接着剤14により一対の補
助基板16が二次元光導波路12が備えられた側の一面に両
端縁に沿ってそれぞれ接着されているので、基板の光導
波路が備えられた側の一面と補助基板の一面とを重ね合
わせて締着することにより研磨する従来の方法に比較し
て、研磨中などに補助基板16がずれたりすることに起因
して基板10の端縁に欠けが生じることが防止されるとい
う効果が得られる。また、補助基板16と基板10とが略同
じ材質であるため、同様の被研磨性が得られ、研磨作業
が容易となる。
As described above, by applying the end face polishing method of the present embodiment, the pair of auxiliary substrates 16 are two-dimensional optical waveguides with the adhesive 14 when the incident surface and the emission surface of the substrate 10 used for the optical element are optically polished. Since it is adhered to one surface of the side on which 12 is provided along both edges, polishing is performed by overlapping and tightening one surface of the substrate on the side on which the optical waveguide is provided and one surface of the auxiliary substrate. Compared with the method described above, it is possible to obtain an effect of preventing the edge of the substrate 10 from being chipped due to the displacement of the auxiliary substrate 16 during polishing or the like. Further, since the auxiliary substrate 16 and the substrate 10 are made of substantially the same material, the same grindability can be obtained, and the polishing work becomes easy.

また、接着剤14は、その屈折率が二次元光導波路12の
屈折率よりも低くされており、接着剤14が付着した状態
のまま基板10内に光が入射されても光が接着剤14に向か
って屈折して光の進行方向に影響を与えることが殆どな
いため、光学研磨後に接着剤14および補助基板16を基板
10から取り外す必要がない。したがって、本実施例の方
法を適用することにより、研磨後に基板および補助基板
に対する締着を解除するために締着治具などを取り外す
際の取り扱いが困難であった従来の方法と比較して、基
板10の端縁が接着剤14により保護されて研磨後の基板10
の取り扱いが容易となるのである。また、単結晶基板に
接着された補助基板を研磨後において剥離する従来の方
法と比較して、一旦硬化した接着剤を溶出させるという
極めて困難でありしかも特殊な高価な樹脂や長時間の溶
出作業時間を必要とする接着剤溶出作業が不要となると
同時に、研磨終了後に両基板の間で硬化した接着剤の解
除などの取扱時において、単結晶基板の端縁部が締着用
の治具と接触したりして欠けてしまうおそれが好適に解
消される。
Further, the adhesive 14 has a refractive index lower than that of the two-dimensional optical waveguide 12, and even if light is incident on the substrate 10 while the adhesive 14 is still attached, the light will be adhesive 14 Since it hardly refracts toward and affects the traveling direction of light, after the optical polishing, the adhesive 14 and the auxiliary substrate 16 are formed on the substrate.
No need to remove from 10. Therefore, by applying the method of the present embodiment, compared with the conventional method that was difficult to handle when removing the fastening jig or the like to release the fastening to the substrate and the auxiliary substrate after polishing, The edge of the substrate 10 is protected by the adhesive 14 and the substrate 10 after polishing
Is easy to handle. In addition, compared to the conventional method of peeling the auxiliary substrate adhered to the single crystal substrate after polishing, it is extremely difficult to elute the adhesive once hardened, and a special expensive resin or long elution work is required. The time-consuming adhesive elution work is not required, and the edge of the single crystal substrate comes into contact with the fastening jig when handling, such as releasing the cured adhesive between both substrates after polishing. It is possible to preferably eliminate the possibility of chipping.

なお、上述の実施例においては接着剤14をトリクロー
ルプロパントリアクリレート,ペンタエリスリトールト
リアクリレートなどの紫外線硬化性の樹脂から構成して
いたが、他の形式の接着剤でも良い。要するに、接着剤
14は二次元光導波路12内の屈折率よりも低い屈折率を有
し且つ光の減衰の少ないものであれば良いのである。
In the above embodiment, the adhesive 14 is made of an ultraviolet curable resin such as trichloropropane triacrylate and pentaerythritol triacrylate, but other types of adhesives may be used. In short, the adhesive
It suffices that 14 has a refractive index lower than that in the two-dimensional optical waveguide 12 and has little light attenuation.

また、第4図に示すように、基板10の二次元光導波路
12上、すなわち二次元光導波路12と接着剤14との間に、
SiO2層などのハッファ層22を設けても良い。このように
すれば、導波光に対する接着剤の屈折率の影響を無くす
ることができ、接着剤の選択範囲を拡大することができ
る。
In addition, as shown in FIG. 4, the two-dimensional optical waveguide of the substrate 10 is
12 above, that is, between the two-dimensional optical waveguide 12 and the adhesive 14,
A Huffer layer 22 such as a SiO 2 layer may be provided. By doing so, the influence of the refractive index of the adhesive on the guided light can be eliminated, and the selection range of the adhesive can be expanded.

また、補助基板16には、基板10と同じ材質のみなら
ず、被研磨性が略同様であれば他の材質の基板も補助基
板として採用され得る。
Further, as the auxiliary substrate 16, not only the same material as the substrate 10 but also substrates made of other materials can be adopted as the auxiliary substrate as long as the abradability is substantially the same.

なお、上述したのはあくまでも本発明の一実施例であ
り、本発明はその精神を逸脱しない範囲において種々変
更が加えられ得るものである。
The above description is merely one embodiment of the present invention, and the present invention can be variously modified without departing from the spirit thereof.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例の方法が適用される光学素子
用の基板の斜視図である。第2図は第1図の基板に補助
基板が接着された状態を側面から見た部分拡大図であ
る。第3図は研磨後の基板が光学素子に用いられた状態
を示す側面図である。第4図は本発明の他の実施例にお
いて基板に補助基板が接着された状態を示す側面図であ
る。 10:基板 12:二次元光導波路(光導波路) 16:補助基板 18:研磨面
FIG. 1 is a perspective view of a substrate for an optical element to which the method of one embodiment of the present invention is applied. FIG. 2 is a partially enlarged view of a state where an auxiliary substrate is bonded to the substrate of FIG. 1 as seen from a side surface. FIG. 3 is a side view showing a state in which the substrate after polishing is used for an optical element. FIG. 4 is a side view showing a state in which an auxiliary substrate is bonded to a substrate in another embodiment of the present invention. 10: Substrate 12: Two-dimensional optical waveguide (optical waveguide) 16: Auxiliary substrate 18: Polished surface

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】一面に光導波路を備えた光学素子用単結晶
基板の端面を光学的平面に研磨する方法であって、 前記基板の一面に、該基板と略同様の被研磨特性と前記
光導波路よりも低い屈折率とを有する補助基板を、該光
導波路よりも低い屈折率を有する接着剤を用いて接着す
る接着工程と、 前記基板の端面と前記補助基板の端面とを、研磨面に押
圧することにより両端面を同時に研磨する研磨工程と を含むことを特徴とする光学素子用単結晶基板の端面研
磨方法。
1. A method of polishing an end surface of a single crystal substrate for an optical element having an optical waveguide on one surface into an optical plane, wherein one surface of the substrate has substantially the same polishing characteristics as the substrate and the optical property. A bonding step of bonding an auxiliary substrate having a refractive index lower than that of the waveguide with an adhesive having a refractive index lower than that of the optical waveguide, and an end surface of the substrate and an end surface of the auxiliary substrate to a polishing surface. And a polishing step of polishing both end surfaces at the same time by pressing, thereby polishing the end surface of the single crystal substrate for an optical element.
JP61268173A 1986-11-11 1986-11-11 Method for polishing end face of single crystal substrate for optical element Expired - Fee Related JPH0822499B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61268173A JPH0822499B2 (en) 1986-11-11 1986-11-11 Method for polishing end face of single crystal substrate for optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61268173A JPH0822499B2 (en) 1986-11-11 1986-11-11 Method for polishing end face of single crystal substrate for optical element

Publications (2)

Publication Number Publication Date
JPS63123665A JPS63123665A (en) 1988-05-27
JPH0822499B2 true JPH0822499B2 (en) 1996-03-06

Family

ID=17454926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61268173A Expired - Fee Related JPH0822499B2 (en) 1986-11-11 1986-11-11 Method for polishing end face of single crystal substrate for optical element

Country Status (1)

Country Link
JP (1) JPH0822499B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106538A (en) * 1987-07-21 1992-04-21 Raychem Corporation Conductive polymer composition
CN105127883B (en) * 2015-06-26 2017-10-03 中国科学技术大学 Regulate and control method and apparatus for preparing the monocrystalline spatial orientation that surface is particular crystal plane

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120958A (en) * 1979-03-14 1980-09-17 Nippon Gakki Seizo Kk Method for finishing end surface of metal sheet piece

Also Published As

Publication number Publication date
JPS63123665A (en) 1988-05-27

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