JPH08211117A - Method for measuring radiation pattern of antenna - Google Patents
Method for measuring radiation pattern of antennaInfo
- Publication number
- JPH08211117A JPH08211117A JP1600195A JP1600195A JPH08211117A JP H08211117 A JPH08211117 A JP H08211117A JP 1600195 A JP1600195 A JP 1600195A JP 1600195 A JP1600195 A JP 1600195A JP H08211117 A JPH08211117 A JP H08211117A
- Authority
- JP
- Japan
- Prior art keywords
- antenna
- error
- radiation pattern
- alignment error
- field data
- Prior art date
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- Variable-Direction Aerials And Aerial Arrays (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、衛星に搭載される開口
面アンテナのアンテナ放射パターン（指向性）を測定す
るアンテナ放射パターン測定方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antenna radiation pattern measuring method for measuring an antenna radiation pattern (directivity) of an aperture antenna mounted on a satellite.
【０００２】[0002]
【従来の技術】図５は、従来のアンテナ放射パターン測
定システムの構成を示す。図において、１１はアンテナ
反射鏡、１２は給電装置、１３は近傍界測定装置、１４
はプローブ、１５は３次元測定装置である。プローブ１
４は、近傍界測定装置１３の走査面内を移動して電界分
布を測定する。近傍界測定装置１３は、プローブ１４の
位置を設定した平面内で移動させるスキャン機構と、各
点でプローブ１４の位置および測定された位相振幅を記
録する手段とにより構成される。アンテナ反射鏡１１
と、その開口面の垂直方向の焦点位置に配置される給電
装置１２と、それらを所定の位置に固定するための治具
によりアンテナ系が構成される。2. Description of the Related Art FIG. 5 shows the configuration of a conventional antenna radiation pattern measuring system. In the figure, 11 is an antenna reflector, 12 is a power feeding device, 13 is a near-field measuring device, and 14 is a near-field measuring device.
Is a probe, and 15 is a three-dimensional measuring device. Probe 1
4 moves in the scanning plane of the near-field measuring device 13 to measure the electric field distribution. The near-field measuring device 13 is composed of a scanning mechanism that moves the position of the probe 14 within a set plane, and a unit that records the position of the probe 14 and the measured phase amplitude at each point. Antenna reflector 11
An antenna system is composed of the power feeding device 12 arranged at a vertical focus position of the opening surface and a jig for fixing them at a predetermined position.
【０００３】アンテナ放射パターンを測定する際には、
アンテナ反射鏡１１の開口面と近傍界測定装置１３の走
査面が正確に平行になるように配置しなければならな
い。３次元測定装置１５はこれらを平行に配置するため
に用いられ、アンテナ反射鏡１１の基準点と近傍界測定
装置１３の走査面内の基準点を少なくとも３点ずつ合計
６点について測定する。アンテナ反射鏡１１は治具を介
して床面に設置されるが、通常は微調整装置がないので
測定結果に基づいて方向調整することが難しい。このた
め、アンテナ放射パターンの測定時間の大部分が３次元
測定作業（アラインメント作業）に費やされるのが実情
である。When measuring an antenna radiation pattern,
The aperture surface of the antenna reflecting mirror 11 and the scanning surface of the near-field measuring device 13 must be arranged so as to be exactly parallel to each other. The three-dimensional measuring device 15 is used to arrange these in parallel, and measures at least three reference points of the antenna reflecting mirror 11 and at least three reference points in the scanning plane of the near-field measuring device 13 for a total of six points. Although the antenna reflecting mirror 11 is installed on the floor surface via a jig, it is usually difficult to adjust the direction based on the measurement result because there is no fine adjustment device. Therefore, most of the measurement time of the antenna radiation pattern is actually spent on the three-dimensional measurement work (alignment work).
【０００４】図６は、従来のアンテナ放射パターンの測
定手順を示す。アンテナ反射鏡１１を設置した後に、３
次元測定装置１５を用いてアンテナ反射鏡１１と近傍界
測定装置１３のアラインメント誤差を測定する。アンテ
ナ反射鏡１１と近傍界測定装置１３が所定の精度で平行
になるまで、アンテナ反射鏡１１の方向調整と３次元位
置の測定を繰り返す。アラインメントが完全にとれた状
態で近傍界測定を行い、得られた近傍界データを遠方界
データに変換して所望のアンテナ放射パターンを得る。
以上の手順により、鏡面誤差の小さいアンテナ反射鏡１
１についてはアンテナ放射パターンを求めることができ
る。しかし、被測定アンテナが大型で鏡面誤差を含んで
いるような場合は、アンテナ開口面の定義自体があいま
いであり、設置の基準を明確にすることが非常に困難に
なっている。FIG. 6 shows a conventional procedure for measuring an antenna radiation pattern. After installing the antenna reflector 11, 3
The dimension measuring device 15 is used to measure the alignment error between the antenna reflector 11 and the near-field measuring device 13. Until the antenna reflecting mirror 11 and the near-field measuring device 13 are parallel to each other with a predetermined accuracy, the direction adjustment of the antenna reflecting mirror 11 and the measurement of the three-dimensional position are repeated. Near-field measurement is performed with the alignment perfectly taken, and the obtained near-field data is converted into far-field data to obtain a desired antenna radiation pattern.
Through the above procedure, the antenna reflector 1 with a small mirror surface error
For 1, the antenna radiation pattern can be determined. However, when the antenna to be measured is large and includes a mirror surface error, the definition of the antenna aperture plane is ambiguous, and it is very difficult to clarify the installation standard.
【０００５】[0005]
【発明が解決しようとする課題】従来のアンテナ放射パ
ターン測定方法では、アラインメント作業に時間がかか
り効率が著しく悪い。また、製造時にすでに誤差を有し
ており、これを修正して使用するようなアンテナの場合
には、アンテナ開口面の基準となる点が誤差を有してお
り、開口面自体がアラインメント誤差を有したまま定義
されてしまうので、正確なアンテナ放射パターンを測定
することが困難であった。In the conventional antenna radiation pattern measuring method, the alignment work is time-consuming and the efficiency is extremely poor. Also, in the case of an antenna that already has an error at the time of manufacture and is used by correcting this, the point serving as the reference of the antenna aperture surface has an error, and the aperture surface itself causes an alignment error. Since it is defined as it is, it is difficult to measure an accurate antenna radiation pattern.
【０００６】本発明は、測定時間を短縮でき、さらに初
期鏡面誤差を有している開口面に対しても正確にアンテ
ナ放射パターンを測定することができるアンテナ放射パ
ターン測定方法を提供することを目的とする。It is an object of the present invention to provide an antenna radiation pattern measuring method capable of shortening the measurement time and accurately measuring the antenna radiation pattern even on an aperture plane having an initial mirror surface error. And
【０００７】[0007]
【課題を解決するための手段】本発明のアンテナ放射パ
ターン測定方法は、アンテナ反射鏡の鏡面誤差、アンテ
ナ反射鏡と近傍界測定装置のアラインメント誤差を含め
たまま近傍界測定を行い、得られた近傍界データを遠方
界データに変換した後に逆フーリエ変換してアンテナ反
射鏡の開口面での位相分布を求め、得られた位相分布の
平均的な傾きをアラインメント誤差として求め、得られ
たアラインメント誤差を近傍界データの位相誤差として
位相分布を再計算し、アンテナ反射鏡のアンテナ放射パ
ターンを算出することを特徴とする。The antenna radiation pattern measuring method of the present invention is obtained by performing near-field measurement while including the mirror surface error of the antenna reflecting mirror and the alignment error between the antenna reflecting mirror and the near-field measuring device. After converting the near-field data to the far-field data, the inverse Fourier transform is performed to obtain the phase distribution at the aperture surface of the antenna reflector, the average slope of the obtained phase distribution is obtained as an alignment error, and the obtained alignment error It is characterized in that the phase distribution is recalculated by using as the phase error of the near field data, and the antenna radiation pattern of the antenna reflector is calculated.
【０００８】また、複数の周波数の測定用信号を用いて
アンテナ放射パターンを測定することを特徴とする。Further, the antenna radiation pattern is measured by using measurement signals of a plurality of frequencies.
【０００９】[0009]
【作用】本発明のアンテナ放射パターン測定方法では、
被測定アンテナを設置する際にアラインメント誤差を予
測しておく。この状態で近傍界測定を行い、所定の計算
によってアンテナ反射鏡の開口面での位相分布を求め、
アラインメント誤差を求める。このアラインメント誤差
を近傍界データの位相誤差として位相分布を再計算す
る。これにより、当初のアンテナ放射パターンからアラ
インメント誤差分が差し引かれ、正確にアラインメント
をとった場合のアンテナ放射パターンを算出することが
できる。In the antenna radiation pattern measuring method of the present invention,
Predict the alignment error when installing the antenna under test. Perform near-field measurement in this state, and obtain the phase distribution on the aperture surface of the antenna reflector by the predetermined calculation,
Find the alignment error. The phase distribution is recalculated by using this alignment error as the phase error of the near field data. As a result, the alignment error component is subtracted from the initial antenna radiation pattern, and the antenna radiation pattern in the case of accurate alignment can be calculated.
【００１０】また、複数の周波数の信号を用いて測定を
行うことにより、低い周波数信号では広いレンジで、高
い周波数信号では高分解能で測定することができる。Further, by performing measurement using signals of a plurality of frequencies, it is possible to measure a wide range for low frequency signals and a high resolution for high frequency signals.
【００１１】[0011]
【実施例】図１は、本発明によるアンテナ放射パターン
測定のためのシステム構成を示す。図において、１１は
アンテナ反射鏡、１２は給電装置、１３は近傍界測定装
置、１４はプローブである。プローブ１４は、近傍界測
定装置１３の走査面内を移動して電界分布を測定する。
本発明では、近傍界測定の方法は従来技術と同じである
が、データ処理手順が異なっている。1 shows a system configuration for antenna radiation pattern measurement according to the present invention. In the figure, 11 is an antenna reflector, 12 is a power feeding device, 13 is a near-field measuring device, and 14 is a probe. The probe 14 moves in the scanning plane of the near-field measuring device 13 to measure the electric field distribution.
In the present invention, the method of near field measurement is the same as the conventional technique, but the data processing procedure is different.
【００１２】図２は、本発明のアンテナ放射パターンの
測定手順の一例を示す。ここでは、簡単のために１軸の
みで考える。アンテナ反射鏡１１の開口面と近傍界測定
装置１３にアラインメント誤差が存在すると仮定する。
このまま近傍界測定を行い、遠方界データに変換した後
に逆フーリエ変換を行い、アンテナ反射鏡１１の開口面
での位相分布を求める。この位相分布は、鏡面誤差を含
んだアラインメント誤差と考えることができる。すなわ
ち、開口面と近傍界走査面とが平行でない場合の誤差分
と、鏡面誤差による誤差分の両者が一括して測定され
る。測定されたアラインメント誤差分を近傍界データの
位相誤差として位相分布を再計算する。このアラインメ
ント誤差を補正した近傍界データを遠方界データに変換
し、所望のアンテナ放射パターンを得る。FIG. 2 shows an example of the procedure for measuring the antenna radiation pattern of the present invention. Here, for simplicity, only one axis will be considered. It is assumed that there is an alignment error between the aperture plane of the antenna reflector 11 and the near field measuring device 13.
The near field measurement is performed as it is, and after the data is converted into the far field data, the inverse Fourier transform is performed to obtain the phase distribution on the aperture surface of the antenna reflecting mirror 11. This phase distribution can be considered as an alignment error including a mirror surface error. That is, both the error amount when the aperture surface and the near-field scanning surface are not parallel and the error amount due to the mirror surface error are collectively measured. The phase distribution is recalculated using the measured alignment error as the phase error of the near field data. Near-field data in which this alignment error has been corrected is converted into far-field data to obtain a desired antenna radiation pattern.
【００１３】図３は、アラインメント誤差を含んだアン
テナ開口面の位相分布を示す。ここでは、簡単のために
Ｘ軸方向、すなわちアジマス方向のみにアラインメント
誤差を与えている。仮にアラインメント誤差および鏡面
誤差がなければ完全な平面になるはずである。これらの
誤差による全体的な傾きがあることがわかる。アンテナ
面内の部分的な変形はアンテナ反射鏡１１がもつ鏡面誤
差である。これらの誤差のうち指向誤差に影響を与える
成分は、この位相分布をアジマス方向のｘで偏微分する
ことにより抽出することができる。鏡面形状をｆ(x,y)
とすると、アジマス方向のアラインメント誤差Ｅx は、 Ｅx ＝∂f(x,y)／∂ｘ …(1) と表すことができる。この傾きの分だけプローブ１４で
受信した電界の位相の部分を補正し、再度遠方界データ
に変換する計算を行うことにより、これらの誤差を除去
することができる。FIG. 3 shows a phase distribution of an antenna aperture plane including an alignment error. Here, for simplification, the alignment error is given only in the X-axis direction, that is, in the azimuth direction. If there is no alignment error or specular error, it should be a perfect plane. It can be seen that there is an overall slope due to these errors. The partial deformation in the antenna plane is a mirror surface error of the antenna reflector 11. The component that affects the pointing error among these errors can be extracted by partially differentiating this phase distribution with respect to x in the azimuth direction. Mirror surface shape is f (x, y)
Then, the alignment error Ex in the azimuth direction can be expressed as Ex = ∂f (x, y) / ∂x ... (1). These errors can be removed by correcting the phase portion of the electric field received by the probe 14 by the amount of this inclination and performing the calculation for converting into the far field data again.
【００１４】アラインメント誤差を除去した後のアンテ
ナ開口面の位相分布を図４に示すが、全体的な傾きが除
去されていることがわかる。例では六角形のアンテナを
用いて説明しているが、誤差除去後に残っている凹凸が
実際の鏡面誤差である。すなわち、アンテナ反射鏡１１
と近傍界測定装置１３とを正確に平行に設置した場合と
同様のアンテナ放射パターンを得られることがわかる。The phase distribution of the antenna aperture plane after removing the alignment error is shown in FIG. 4, and it can be seen that the overall tilt is removed. In the example, the hexagonal antenna is used for explanation, but the unevenness remaining after error removal is the actual mirror surface error. That is, the antenna reflector 11
It can be seen that an antenna radiation pattern similar to that when the antenna and the near-field measuring device 13 are installed exactly in parallel can be obtained.
【００１５】なお、エレベーション方向のアラインメン
ト誤差Ｅy は、同様に Ｅy ＝∂f(x,y)／∂y …(2) と表すことができる。また、得られたアラインメント誤
差が大きい場合には、収差を含んだアンテナ放射パター
ンを測定している可能性があるので、測定されたアライ
ンメント誤差を用いてアンテナ反射鏡１１を設置し直す
ことにより、さらに正確な測定が可能となる。The alignment error Ey in the elevation direction can be similarly expressed as Ey = ∂f (x, y) / ∂y (2). Further, when the obtained alignment error is large, it is possible that the antenna radiation pattern including the aberration is being measured. Therefore, by re-installing the antenna reflecting mirror 11 using the measured alignment error, Further accurate measurement becomes possible.
【００１６】また、アラインメント誤差あるいは鏡面誤
差が測定信号の１波長より大きい場合は、複数の周波数
の信号を用いて測定を行う。すなわち、低い周波数信号
を用いて広いレンジで粗く測定し、高い周波数信号を用
いて高い分解能で測定することにより、大きな誤差を有
する場合でも所定の精度を確保することができる（請求
項２）。When the alignment error or the mirror surface error is larger than one wavelength of the measurement signal, the measurement is performed by using signals of a plurality of frequencies. That is, by using the low frequency signal to measure roughly over a wide range and using the high frequency signal to measure with high resolution, it is possible to ensure a predetermined accuracy even when there is a large error (claim 2).
【００１７】[0017]
【発明の効果】以上説明したように、本発明のアンテナ
放射パターン測定方法では、３次元測定装置を用いてア
ラインメント誤差を測定し、アンテナの向きを調整する
必要がないので、アンテナ放射パターンの測定時間を大
幅に短縮することができる。また、初期鏡面誤差を有す
るアンテナ反射鏡に対しても正確にアンテナ放射パター
ンを測定することが可能である。As described above, in the antenna radiation pattern measuring method of the present invention, since it is not necessary to measure the alignment error using the three-dimensional measuring device and adjust the antenna orientation, the antenna radiation pattern is measured. The time can be greatly reduced. Further, it is possible to accurately measure the antenna radiation pattern even for an antenna reflector having an initial mirror surface error.
【図１】本発明によるアンテナ放射パターン測定システ
ムの構成を示す図。FIG. 1 is a diagram showing a configuration of an antenna radiation pattern measurement system according to the present invention.
【図２】本発明のアンテナ放射パターンの測定手順の一
例を示す図。FIG. 2 is a diagram showing an example of a procedure for measuring an antenna radiation pattern of the present invention.
【図３】アラインメント誤差を含んだアンテナ開口面の
位相分布を示す図。FIG. 3 is a diagram showing a phase distribution of an antenna aperture plane including an alignment error.
【図４】アラインメント誤差を除去した後のアンテナ開
口面の位相分布を示す図。FIG. 4 is a diagram showing a phase distribution of an antenna aperture surface after removing an alignment error.
【図５】従来のアンテナ放射パターン測定システムの構
成を示す図。FIG. 5 is a diagram showing a configuration of a conventional antenna radiation pattern measurement system.
【図６】従来のアンテナ放射パターンの測定手順を示す
図。FIG. 6 is a diagram showing a conventional antenna radiation pattern measurement procedure.
１１ アンテナ反射鏡 １２ 給電装置 １３ 近傍界測定装置 １４ プローブ １５ ３次元測定装置 11 Antenna Reflector 12 Feed Device 13 Near Field Measuring Device 14 Probe 15 3D Measuring Device
Claims (2)
射鏡と近傍界測定装置のアラインメント誤差を含めたま
ま近傍界測定を行い、 得られた近傍界データを遠方界データに変換した後に逆
フーリエ変換してアンテナ反射鏡の開口面での位相分布
を求め、 得られた位相分布の平均的な傾きを前記アラインメント
誤差として求め、 得られたアラインメント誤差を前記近傍界データの位相
誤差として位相分布を再計算し、前記アンテナ反射鏡の
アンテナ放射パターンを算出することを特徴とするアン
テナ放射パターン測定方法。1. Near-field measurement is performed with the mirror surface error of the antenna reflector and the alignment error between the antenna reflector and the near-field measuring device included, and the obtained near-field data is converted into far-field data and then the inverse Fourier transform is performed. Then, the phase distribution on the aperture plane of the antenna reflector is obtained, the average slope of the obtained phase distribution is obtained as the alignment error, and the obtained alignment error is taken as the phase error of the near-field data to re-create the phase distribution. An antenna radiation pattern measuring method comprising: calculating and calculating an antenna radiation pattern of the antenna reflector.
測定方法において、 複数の周波数の測定用信号を用いてアンテナ放射パター
ンを測定することを特徴とするアンテナ放射パターン測
定方法。2. The antenna radiation pattern measuring method according to claim 1, wherein the antenna radiation pattern is measured using measurement signals of a plurality of frequencies.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1600195A JPH08211117A (en) | 1995-02-02 | 1995-02-02 | Method for measuring radiation pattern of antenna |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1600195A JPH08211117A (en) | 1995-02-02 | 1995-02-02 | Method for measuring radiation pattern of antenna |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08211117A true JPH08211117A (en) | 1996-08-20 |
Family
ID=11904398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1600195A Pending JPH08211117A (en) | 1995-02-02 | 1995-02-02 | Method for measuring radiation pattern of antenna |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08211117A (en) |
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| WO2002023205A1 (en) * | 2000-09-13 | 2002-03-21 | University Of Northumbria At Newcastle | Microwave holographic measuring method and apparatus |
| JP2002243783A (en) * | 2001-02-21 | 2002-08-28 | Communication Research Laboratory | Antenna characteristics measuring device using neighboring field measurement and its method |
| JP2003524777A (en) * | 1999-12-30 | 2003-08-19 | アストリウム・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | Traveling system for determining the characteristics of an outdoor radiated electromagnetic field in a wide range and with high accuracy, and a method for implementing the same |
| US7088287B2 (en) | 2003-12-11 | 2006-08-08 | Electronics And Telecommunications Research Institute | Antenna aligning apparatus for near-field measurement |
| JP2011107135A (en) * | 2009-11-17 | 2011-06-02 | Astrium Gmbh | High-frequency characteristic measurement system and method for measuring characteristic of high-frequency characteristic test object such as antenna |
| JP2012149901A (en) * | 2011-01-17 | 2012-08-09 | Japan Aerospace Exploration Agency | Sub-millimeter wave proximate field measuring device having high precision non-contact position measuring mechanism |
| CN102854401A (en) * | 2012-09-11 | 2013-01-02 | 电子科技大学 | Array antenna pattern time domain measurement method |
| JP2015127718A (en) * | 2015-04-03 | 2015-07-09 | 国立研究開発法人宇宙航空研究開発機構 | Sub-millimeter wave proximate field measuring device having high precision non-contact position measuring mechanism |
| CN107219410A (en) * | 2017-06-21 | 2017-09-29 | 西安空间无线电技术研究所 | A kind of Planar Near-Field Measurement modification method based on probe frequency sweep shift offset |
| WO2024164874A1 (en) * | 2023-02-06 | 2024-08-15 | 中兴通讯股份有限公司 | Planar near-field testing method and apparatus, electronic device, and readable storage medium |
-
1995
- 1995-02-02 JP JP1600195A patent/JPH08211117A/en active Pending
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|---|---|---|---|---|
| JP2001165975A (en) * | 1999-12-10 | 2001-06-22 | Mitsubishi Electric Corp | Apparatus and method for measuring antenna |
| JP2003524777A (en) * | 1999-12-30 | 2003-08-19 | アストリウム・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | Traveling system for determining the characteristics of an outdoor radiated electromagnetic field in a wide range and with high accuracy, and a method for implementing the same |
| WO2002023205A1 (en) * | 2000-09-13 | 2002-03-21 | University Of Northumbria At Newcastle | Microwave holographic measuring method and apparatus |
| JP2002243783A (en) * | 2001-02-21 | 2002-08-28 | Communication Research Laboratory | Antenna characteristics measuring device using neighboring field measurement and its method |
| US7088287B2 (en) | 2003-12-11 | 2006-08-08 | Electronics And Telecommunications Research Institute | Antenna aligning apparatus for near-field measurement |
| JP2011107135A (en) * | 2009-11-17 | 2011-06-02 | Astrium Gmbh | High-frequency characteristic measurement system and method for measuring characteristic of high-frequency characteristic test object such as antenna |
| JP2012149901A (en) * | 2011-01-17 | 2012-08-09 | Japan Aerospace Exploration Agency | Sub-millimeter wave proximate field measuring device having high precision non-contact position measuring mechanism |
| CN102854401A (en) * | 2012-09-11 | 2013-01-02 | 电子科技大学 | Array antenna pattern time domain measurement method |
| JP2015127718A (en) * | 2015-04-03 | 2015-07-09 | 国立研究開発法人宇宙航空研究開発機構 | Sub-millimeter wave proximate field measuring device having high precision non-contact position measuring mechanism |
| CN107219410A (en) * | 2017-06-21 | 2017-09-29 | 西安空间无线电技术研究所 | A kind of Planar Near-Field Measurement modification method based on probe frequency sweep shift offset |
| WO2024164874A1 (en) * | 2023-02-06 | 2024-08-15 | 中兴通讯股份有限公司 | Planar near-field testing method and apparatus, electronic device, and readable storage medium |
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