JPH08203035A - Magnetoresistance effect film, magnetoresistance effect element, magnetic head and magnetic recording and reproducing device - Google Patents
Magnetoresistance effect film, magnetoresistance effect element, magnetic head and magnetic recording and reproducing deviceInfo
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- JPH08203035A JPH08203035A JP2892495A JP2892495A JPH08203035A JP H08203035 A JPH08203035 A JP H08203035A JP 2892495 A JP2892495 A JP 2892495A JP 2892495 A JP2892495 A JP 2892495A JP H08203035 A JPH08203035 A JP H08203035A
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- magnetic
- layer
- film
- magnetoresistive
- magnetic layer
- Prior art date
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、低磁界で高い磁気抵抗
効果を有する磁気抵抗効果膜、この磁気抵抗効果膜を用
いた磁気抵抗効果素子、この素子を用いた磁気ヘッド及
びこの磁気ヘッドを用いた磁気記録再生装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive effect film having a high magnetoresistive effect in a low magnetic field, a magnetoresistive effect element using this magnetoresistive effect film, a magnetic head using this element, and this magnetic head. The present invention relates to a magnetic recording / reproducing device used.
【0002】[0002]
【従来の技術】従来、再生用磁気ヘッドの磁気抵抗効果
材としてパーマロイが使用されていた。しかし、パーマ
ロイの磁気抵抗変化率は約3%と低く、これよりさらに
高い磁気抵抗変化率の材料が求められていた。このパー
マロイより磁気抵抗変化率が高い材料として多層構造を
持つFe/Cr磁性膜が提案され、また、Ta/NiF
e/Cu/NiFe/FeMn/Ta膜も提案されてい
た。2. Description of the Related Art Conventionally, permalloy has been used as a magnetoresistive effect material for reproducing magnetic heads. However, the magnetic resistance change rate of permalloy is as low as about 3%, and a material having a higher magnetic resistance change rate than that is required. A Fe / Cr magnetic film having a multilayer structure has been proposed as a material having a higher magnetoresistance change rate than this permalloy.
An e / Cu / NiFe / FeMn / Ta film has also been proposed.
【0003】[0003]
【発明が解決しようとする課題】しかし、上記多層構造
を持つFe/Cr磁性膜は、十分な磁気抵抗変化率を得
るために、800KA/mもの高い磁界が必要であり、
低い磁界で動作することが必要な磁気抵抗効果素子、磁
気ヘッドに使用することができなかった。また、Ta/
NiFe/Cu/NiFe/FeMn/Ta膜は比較的
低磁界で2.2%の磁気抵抗変化率を示しているが、ま
だ十分でなく、低磁界でより高い磁気抵抗変化率を示す
材料が求められていた。本発明は、低磁界でより高い磁
気抵抗変化率を示す磁気抵抗効果膜、磁気抵抗効果素
子、磁気ヘッド及び磁気記録再生装置を提供することを
目的とする。However, the Fe / Cr magnetic film having the above-mentioned multilayer structure requires a magnetic field as high as 800 KA / m in order to obtain a sufficient magnetoresistance change rate.
It could not be used for a magnetoresistive effect element or a magnetic head that needs to operate in a low magnetic field. Also, Ta /
The NiFe / Cu / NiFe / FeMn / Ta film shows a magnetoresistive change rate of 2.2% in a relatively low magnetic field, but it is not sufficient yet, and a material showing a higher magnetoresistive change rate in a low magnetic field is required. It was being done. An object of the present invention is to provide a magnetoresistive effect film, a magnetoresistive effect element, a magnetic head, and a magnetic recording / reproducing apparatus that exhibit a higher magnetoresistive change rate in a low magnetic field.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に、本発明においては、磁性層、非磁性層及び磁性層を
積層した三層膜、磁性層、非磁性層、磁性層、非磁性層
及び磁性層を積層した五層膜、若しくは磁性層の上又は
下に反強磁性層を有する磁気抵抗効果膜において、上記
磁性層の少なくとも一層にアモルファス磁性合金を用い
たことである。また、上記磁気抵抗効果膜は非磁性層を
挟む磁性層の磁化の向きのなす角度が変化するものであ
り、上記アモルファス磁性合金をB濃度が10〜25a
t%であるCo─Fe─B系アモルファス磁性合金とし
たことである。また、上記磁気抵抗効果膜の磁性層の少
なくとも1層がCo、Ni─FeあるいはNi─Fe─
Coを主成分とする合金であり、上記非磁性層の少なく
とも一層をCu、Ag又はAuとしたことである。In order to achieve the above object, in the present invention, a magnetic layer, a non-magnetic layer and a three-layer film in which a magnetic layer is laminated, a magnetic layer, a non-magnetic layer, a magnetic layer and a non-magnetic layer. In a five-layer film in which a magnetic layer and a magnetic layer are laminated, or in a magnetoresistive film having an antiferromagnetic layer above or below the magnetic layer, an amorphous magnetic alloy is used for at least one of the magnetic layers. In the magnetoresistive film, the angle formed by the magnetization directions of the magnetic layers sandwiching the non-magnetic layer changes, and the amorphous magnetic alloy has a B concentration of 10 to 25a.
That is, a Co—Fe—B-based amorphous magnetic alloy with t% is used. At least one of the magnetic layers of the magnetoresistive film is Co, Ni--Fe or Ni--Fe--.
It is an alloy containing Co as a main component, and at least one layer of the nonmagnetic layer is Cu, Ag, or Au.
【0005】また、上記磁気抵抗効果膜の非磁性層を挟
む磁性層の磁気異方性より生じる磁化容易方向のなす角
度が異なっており、磁気抵抗効果膜の磁性層の少なくと
も一層に交換バイアス磁界を印加する反強磁性層を付与
したことである。また、本発明の磁気抵抗効果素子は、
上記磁気抵抗効果膜を少なくとも1部に使用したことで
ある。また、本発明の磁気ヘッドは、上記磁気抵抗効果
素子を少なくとも1部に使用したことである。さらに、
本発明の磁気記録再生装置は、上記磁気ヘッドを少なく
とも1部に使用したことである。Further, the angles formed by the easy magnetization directions caused by the magnetic anisotropy of the magnetic layers sandwiching the non-magnetic layer of the magnetoresistive film are different, and at least one of the magnetic layers of the magnetoresistive film has an exchange bias magnetic field. That is, an antiferromagnetic layer for applying is applied. Further, the magnetoresistive effect element of the present invention,
That is, at least part of the magnetoresistive film was used. Further, the magnetic head of the present invention uses the magnetoresistive effect element at least in part. further,
The magnetic recording / reproducing apparatus of the present invention uses the above magnetic head in at least a part thereof.
【0006】本発明をさらに説明すると、本発明のアモ
ルファス磁性合金はCo─Fe─B系アモルファス磁性
合金でCo─Fe─B系アモルファス磁性合金は、B1
0〜25at%、Co81〜67at%、Fe9 〜
7.5at%の合金である。また、磁性層は、Co、N
i─Fe、Ni─Fe─Coなどの金属又は合金で、N
i─Feはパーマロイとして知られているNi35〜8
0%、残部Feからなるもので、Ni─Fe─CoはF
e16〜20%、Ni66〜11%、Co18〜73%
のものである。さらに、本発明の反強磁性層は、Ni
O、NiMn、CoMn、FeMnなどである。To further explain the present invention, the amorphous magnetic alloy of the present invention is a Co--Fe--B type amorphous magnetic alloy, and the Co--Fe--B type amorphous magnetic alloy is B1.
0-25at%, Co81-67at%, Fe9-
The alloy is 7.5 at%. The magnetic layer is made of Co, N
Metals or alloys such as i-Fe and Ni-Fe-Co, N
i-Fe is Ni35-8 known as permalloy
0%, balance Fe, Ni-Fe-Co is F
e16-20%, Ni66-11%, Co18-73%
belongs to. Further, the antiferromagnetic layer of the present invention is made of Ni
O, NiMn, CoMn, FeMn and the like.
【0007】[0007]
【作用】本発明は、磁性層、非磁性層及び磁性層を積層
した三層膜、磁性層、非磁性層、磁性層、非磁性層及び
磁性層を積層した五層膜、若しくは磁性層の上又は下に
反強磁性層を有する磁気抵抗効果膜において、上記磁性
層の少なくとも一層にアモルファス磁性合金を用いるこ
とにより、比較的低磁界で高い磁気抵抗変化率が得られ
る。これは、アモルファス磁性合金を用いることによ
り、軟磁気特性が向上したためであると考えられる。ま
た、本発明の磁気抵抗効果素子は上記特性が優れた磁気
抵抗効果膜を使用したことにより、本発明の磁気ヘッド
は上記特性が優れた磁気抵抗効果素子を少なくとも1部
に使用したことにより、また本発明の磁気記録再生装置
は上記特性が優れた磁気ヘッドを少なくとも1部に使用
したことにより優れた特性のものが得られる。According to the present invention, a magnetic layer, a non-magnetic layer and a magnetic layer are laminated in three layers, a magnetic layer, a non-magnetic layer, a magnetic layer, a non-magnetic layer and a magnetic layer are laminated in five layers, or a magnetic layer. In the magnetoresistive effect film having the antiferromagnetic layer above or below, by using an amorphous magnetic alloy for at least one of the magnetic layers, a high magnetoresistive change rate can be obtained in a relatively low magnetic field. It is considered that this is because the soft magnetic characteristics were improved by using the amorphous magnetic alloy. Further, since the magnetoresistive effect element of the present invention uses the magnetoresistive effect film having excellent characteristics described above, the magnetic head of the present invention uses at least part of the magnetoresistive effect element having excellent characteristics described above. Further, the magnetic recording / reproducing apparatus of the present invention can obtain a magnetic recording medium having excellent characteristics by using at least part of the magnetic head having the above characteristics.
【0008】[0008]
【実施例】以下、本発明の実施例について説明する。 実施例1 下記三層膜とスピンバルブ膜は高周波マグネトロンスパ
ッタ装置を用いて作製した。スパツタ時のAr圧は0.
68〜1.32Paで、製膜速度は0.1〜0.2nm
/sである。基板にスライドガラスを用い、その上にア
モルファスCoFeB層、Cu層、Co層を順次作製
し、CoFeB(6nm)/Cu(2.1nm)/Co
(1.5nm)の膜を作製した。なお、アモルファス磁
性合金のCoFeBの組成は、Co:72at%、F
e;8at%、B:20at%であった。この膜の特性
は、図1に示したように磁気抵抗変化率(MR ratio)
が5%のものが800A/mの磁界(H)を中心として
280A/mの磁界変化で得られ、磁界感度は17.8
%/kAm-1であった。Embodiments of the present invention will be described below. Example 1 The following three-layer film and spin valve film were produced using a high frequency magnetron sputtering device. Ar pressure during spattering is 0.
68 to 1.32 Pa, film forming rate is 0.1 to 0.2 nm
/ S. A glass slide was used as a substrate, and an amorphous CoFeB layer, a Cu layer, and a Co layer were sequentially formed thereon, and CoFeB (6 nm) / Cu (2.1 nm) / Co
A (1.5 nm) film was prepared. The composition of CoFeB of the amorphous magnetic alloy is Co: 72 at%, F
e: 8 at%, B: 20 at%. The characteristics of this film are as shown in FIG.
Of 5% is obtained with a magnetic field change of 280 A / m centering on a magnetic field (H) of 800 A / m, and the magnetic field sensitivity is 17.8.
% / KAm −1 .
【0009】なお、図1は、上記膜のH(磁化困難軸の
磁界)とMR ratio(磁気抵抗変化率)の関係を示した
グラフである。図2は、上記膜の磁化容易軸の磁界と磁
気抵抗変化率を示したグラフで、上のグラフは下のグラ
フのHが0付近を拡大したものである。図2の磁気抵抗
変化率の傾きが大きくて高いほど感度がよい膜である。
上記膜の磁界感度は従来のNiFe系合金を主体とした
材料で得られるものの約3倍であった。これはアモルフ
ァス材料を使用したことにより軟磁気特性が向上したた
めであると考えられる。FIG. 1 is a graph showing the relationship between H (magnetic field on the hard axis of magnetization) and MR ratio (rate of change in magnetoresistance) of the film. FIG. 2 is a graph showing the magnetic field of the easy axis of the film and the rate of change in magnetoresistance. The upper graph is an enlargement of H in the vicinity of 0 in the lower graph. The larger the gradient of the magnetoresistance change rate in FIG. 2 is, the higher the sensitivity is.
The magnetic field sensitivity of the above film was about three times that obtained with the conventional material mainly composed of NiFe alloy. It is considered that this is because the soft magnetic characteristics were improved by using the amorphous material.
【0010】実施例2 実施例1と同様な方法によりCoFeB(9nm)/C
u(2.1nm)/Co(1.5nm)の膜を作製し
た。なお、アモルファス磁性合金のCoFeBの組成
は、Co:72at%、Fe;8at%、B:20at
%であった。この膜の磁気抵抗変化率は3%であった。
この膜を12.8kA/mの磁界中で250℃で1時間
熱処理を行ったところ、磁気抵抗変化率は4%と高くな
った。この結果から膜がガラス融着などにおいて加熱さ
れる温度である250℃でも劣化しないことが分かっ
た。これはアモルファス材料の層の結晶化による特性の
劣化がないからであると考えられる。Example 2 In the same manner as in Example 1, CoFeB (9 nm) / C
A film of u (2.1 nm) / Co (1.5 nm) was prepared. The composition of CoFeB of the amorphous magnetic alloy is as follows: Co: 72 at%, Fe; 8 at%, B: 20 at%.
%Met. The rate of change in magnetoresistance of this film was 3%.
When this film was heat-treated at 250 ° C. for 1 hour in a magnetic field of 12.8 kA / m, the magnetoresistive change rate increased to 4%. From this result, it was found that the film did not deteriorate even at 250 ° C., which is the temperature at which the film is heated for glass fusion. It is considered that this is because there is no deterioration of characteristics due to crystallization of the layer of amorphous material.
【0011】実施例3 実施例1と同様な方法で、反強磁性層からの交換バイア
ス磁界が印加されるようにしたNiO(50nm)/C
o(1.5nm)/Cu(2.1nm)/CoFeB
(9nm)/Cu(3nm)の膜を作製した。なお、ア
モルファス磁性合金のCoFeBの組成は、Co:72
at%、Fe;8at%、B:20at%であった。こ
の膜の特性は、図3に示したように磁気抵抗変化率(Δ
R/R)が2.7%のものが得られた。この値は従来の
NiFe系合金を主体とする材料で得られるものと同等
であり、また250℃の熱処理後も特性の劣化はなかっ
た。さらに、この膜は、交換バイアス磁界が印加されて
おり、磁気ヘッドの用途に使用することができることが
分かった。なお、この膜の磁化曲線は図4に示したとう
りである。Example 3 In the same manner as in Example 1, NiO (50 nm) / C was prepared so that an exchange bias magnetic field from the antiferromagnetic layer was applied.
o (1.5nm) / Cu (2.1nm) / CoFeB
A (9 nm) / Cu (3 nm) film was prepared. The composition of CoFeB of the amorphous magnetic alloy is Co: 72
At%, Fe; 8 at%, and B: 20 at%. The characteristics of this film are as shown in FIG.
R / R) of 2.7% was obtained. This value is equivalent to that obtained with a conventional material mainly composed of NiFe alloy, and there was no deterioration in characteristics even after heat treatment at 250 ° C. Further, it has been found that this film is applied with an exchange bias magnetic field and can be used for magnetic head applications. The magnetization curve of this film is as shown in FIG.
【0012】実施例4 本発明の磁気抵抗効果膜を使用した本発明の磁気抵抗効
果素子の一例を図5に示す。本発明の磁気抵抗効果素子
は、本発明の磁気抵抗効果膜(1)を、2個の電極(2
1 、22 )で挟み、これらを上下からシールド層
(31 、32 )で挟んだ構造のものである。 実施例5 本発明の磁気抵抗効果素子を使用した本発明の録再型磁
気ヘッドの一例を図6に示す。本発明の録再型磁気ヘッ
ドは、本発明の磁気抵抗効果膜(1)、2個の電極(2
1 、22 )、2枚のシールド層(31 、32 )からなる
磁気抵抗効果素子の上に2個の磁極(41 、42 )の間
に複数のコイル(51 、52 、53 )を挟んだものを置
いた構造のものである。Example 4 An example of the magnetoresistive element of the present invention using the magnetoresistive film of the present invention is shown in FIG. The magnetoresistive effect element of the present invention comprises the magnetoresistive effect film (1) of the present invention and two electrodes (2
It has a structure in which it is sandwiched by 1 , 2 2 ) and these are sandwiched by shield layers (3 1 , 3 2 ) from above and below. Embodiment 5 FIG. 6 shows an example of the recording / reproducing magnetic head of the present invention using the magnetoresistive effect element of the present invention. The recording / reproducing magnetic head of the present invention comprises a magnetoresistive film (1) and two electrodes (2) of the present invention.
1 , 2 2 ) and a plurality of coils (5 1 , 5 2 ) between two magnetic poles (4 1 , 4 2 ) on a magnetoresistive effect element composed of two shield layers (3 1 , 3 2 ). 5 3 ) is sandwiched between the two.
【0013】本発明は、上記以外の点においても実施例
に限定されることなく、要旨を変更しない範囲において
種々の変更をすることが出来ることはもちろんである。The present invention is not limited to the embodiments in other points than the above, and it is needless to say that various modifications can be made without departing from the scope of the invention.
【0014】[0014]
【本発明の効果】本発明は、上記構成にしたことによ
り、低磁界で高い磁気抵抗変化率を示し、また250℃
程度に加熱されても特性が劣化しないという優れた特性
を有する。EFFECTS OF THE INVENTION The present invention, having the above-mentioned structure, exhibits a high magnetoresistance change rate in a low magnetic field, and has a temperature of 250 ° C.
It has excellent characteristics that the characteristics do not deteriorate even if it is heated to a certain degree.
【図1】 本発明のCoFeB(6nm)/Cu(2.
1nm)/Co(1.5nm)の膜の磁化困難軸のH
(磁界)とMR ratio(磁気抵抗変化率)の関係を示し
たグラフである。FIG. 1 shows the CoFeB (6 nm) / Cu (2.
H of the hard axis of the film of 1 nm) / Co (1.5 nm)
6 is a graph showing the relationship between (magnetic field) and MR ratio (rate of change in magnetic resistance).
【図2】 図1の膜の磁化容易軸のH(磁界)とMR r
atio(磁気抵抗変化率)の関係を示したグラフである。FIG. 2 is a graph showing the H (magnetic field) of the easy axis of the film of FIG.
It is a graph which showed the relationship of atio (magnetic resistance change rate).
【図3】 反強磁性層からの交換バイアス磁界が印加さ
れるようにしたNiO(50nm)/Co(1.5n
m)/Cu(2.1nm)/CoFeB(9nm)/C
u(3nm)のH(磁界)とΔR/R(磁気抵抗変化
率)の関係を示したグラフである。FIG. 3 is NiO (50 nm) / Co (1.5 n) in which an exchange bias magnetic field from the antiferromagnetic layer is applied.
m) / Cu (2.1 nm) / CoFeB (9 nm) / C
7 is a graph showing the relationship between H (magnetic field) of u (3 nm) and ΔR / R (rate of change in magnetoresistance).
【図4】 図3の磁化曲線である。FIG. 4 is a magnetization curve of FIG.
【図5】 本発明の磁気抵抗効果素子の一部を示した斜
視図である。FIG. 5 is a perspective view showing a part of the magnetoresistive effect element of the present invention.
【図6】 録再型磁気ヘッドの一部を示した斜視図であ
る。FIG. 6 is a perspective view showing a part of a recording / reproducing magnetic head.
1 磁気抵抗効果膜 21 、22 電極 31 、32 シールド層 41 、42 磁極 51 、52 、53 コイル1 Magnetoresistive film 2 1 , 2 2 Electrode 3 1 , 3 2 Shield layer 4 1 , 4 2 Magnetic pole 5 1 , 5 2 , 5 3 Coil
Claims (12)
三層膜、磁性層、非磁性層、磁性層、非磁性層及び磁性
層を積層した五層膜、並びにこれら三層膜及び五層膜の
磁性層の上又は下に反強磁性層を有する磁気抵抗効果膜
において、上記磁性層の少なくとも一層にアモルファス
磁性合金を用いたことを特徴とする磁気抵抗効果膜。1. A three-layer film in which a magnetic layer, a non-magnetic layer and a magnetic layer are laminated, a magnetic layer, a non-magnetic layer, a magnetic layer, a five-layer film in which a non-magnetic layer and a magnetic layer are laminated, and these three-layer films and A magnetoresistive effect film having an antiferromagnetic layer above or below a five-layer magnetic layer, wherein an amorphous magnetic alloy is used for at least one of the magnetic layers.
て、非磁性層を挟む磁性層の磁化の向きのなす角度が互
いに異なったものであることを特徴とする磁気抵抗効果
膜。2. The magnetoresistive film according to claim 1, wherein the directions of magnetization of the magnetic layers sandwiching the nonmagnetic layer are different from each other.
果膜において、上記磁性層の少なくとも一層がCo─F
e─B系アモルファス磁性合金であることを特徴とする
磁気抵抗効果膜。3. The magnetoresistive film according to claim 1, wherein at least one of the magnetic layers is Co—F.
e-A magnetoresistive film characterized by being a B-based amorphous magnetic alloy.
て、上記Co─Fe─B系アモルファス磁性合金のB濃
度が10〜25at%であることを特徴とする磁気抵抗
効果膜。4. The magnetoresistive film according to claim 3, wherein the Co—Fe—B-based amorphous magnetic alloy has a B concentration of 10 to 25 at%.
気抵抗効果膜において、磁性層の少なくとも1層がC
o、Ni─FeあるいはNi─Fe─Coを主成分とす
る合金であることを特徴とする磁気抵抗効果膜。5. The magnetoresistive film according to claim 1, wherein at least one of the magnetic layers is C.
A magnetoresistive film characterized by being an alloy containing o, Ni-Fe or Ni-Fe-Co as a main component.
気抵抗効果膜において、上記非磁性層の少なくとも一層
がCu、Ag又はAuであることを特徴とする磁気抵抗
効果膜。6. The magnetoresistive film according to claim 1, wherein at least one of the non-magnetic layers is Cu, Ag or Au.
気抵抗効果膜において、非磁性層を挟む磁性層の磁気異
方性より生じる磁化容易方向のなす角度が異なっている
ことを特徴とする磁気抵抗効果膜。7. The magnetoresistive film according to claim 1, wherein an angle formed by easy directions of magnetization caused by magnetic anisotropy of the magnetic layers sandwiching the nonmagnetic layer is different. And a magnetoresistive effect film.
気抵抗効果膜の磁性層の少なくとも一層に交換バイアス
磁界を印加する反磁性層を設けたことを特徴とする磁気
抵抗効果膜。8. A magnetoresistive effect film comprising a diamagnetic layer for applying an exchange bias magnetic field to at least one of the magnetic layers of the magnetoresistive effect film according to claim 1. Description:
気抵抗効果膜を少なくとも一部に用いたことを特徴とす
る磁気抵抗効果素子。9. A magnetoresistive effect element comprising the magnetoresistive effect film according to claim 1 in at least a part thereof.
くとも一部に用いた磁気ヘッド。10. A magnetic head using the magnetoresistive effect element according to claim 9 in at least a part thereof.
ヘッドを組み合わせた複合型磁気ヘッド。11. A composite type magnetic head comprising a combination of the magnetic head according to claim 10 and an induction type magnetic head.
を用いた磁気記録再生装置。12. A magnetic recording / reproducing apparatus using the magnetic head according to claim 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2892495A JPH08203035A (en) | 1995-01-26 | 1995-01-26 | Magnetoresistance effect film, magnetoresistance effect element, magnetic head and magnetic recording and reproducing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2892495A JPH08203035A (en) | 1995-01-26 | 1995-01-26 | Magnetoresistance effect film, magnetoresistance effect element, magnetic head and magnetic recording and reproducing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08203035A true JPH08203035A (en) | 1996-08-09 |
Family
ID=12261959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2892495A Pending JPH08203035A (en) | 1995-01-26 | 1995-01-26 | Magnetoresistance effect film, magnetoresistance effect element, magnetic head and magnetic recording and reproducing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08203035A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6133732A (en) * | 1996-11-21 | 2000-10-17 | Nec Corporation | Magnetoresistive effect element and shield magnetoresistive effect sensor |
US6154349A (en) * | 1996-04-26 | 2000-11-28 | Fujitsu Limited | Magnetoresistive transducer including CoFeZ soft magnetic layer |
WO2004013919A1 (en) * | 2002-08-02 | 2004-02-12 | Sony Corporation | Magnetoresistance effect element and magnetic memory unit |
US7270896B2 (en) * | 2004-07-02 | 2007-09-18 | International Business Machines Corporation | High performance magnetic tunnel barriers with amorphous materials |
US7351483B2 (en) * | 2004-11-10 | 2008-04-01 | International Business Machines Corporation | Magnetic tunnel junctions using amorphous materials as reference and free layers |
JP2013232661A (en) * | 2013-06-19 | 2013-11-14 | Sony Corp | Magnetic resistance effect element and magnetic memory device |
-
1995
- 1995-01-26 JP JP2892495A patent/JPH08203035A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6154349A (en) * | 1996-04-26 | 2000-11-28 | Fujitsu Limited | Magnetoresistive transducer including CoFeZ soft magnetic layer |
US6133732A (en) * | 1996-11-21 | 2000-10-17 | Nec Corporation | Magnetoresistive effect element and shield magnetoresistive effect sensor |
WO2004013919A1 (en) * | 2002-08-02 | 2004-02-12 | Sony Corporation | Magnetoresistance effect element and magnetic memory unit |
US7034348B2 (en) | 2002-08-02 | 2006-04-25 | Sony Corporation | Magnetoresistive effect element and magnetic memory device |
US7270896B2 (en) * | 2004-07-02 | 2007-09-18 | International Business Machines Corporation | High performance magnetic tunnel barriers with amorphous materials |
US7351483B2 (en) * | 2004-11-10 | 2008-04-01 | International Business Machines Corporation | Magnetic tunnel junctions using amorphous materials as reference and free layers |
JP2013232661A (en) * | 2013-06-19 | 2013-11-14 | Sony Corp | Magnetic resistance effect element and magnetic memory device |
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