JPH08197093A - Water treatment and device therefor - Google Patents

Water treatment and device therefor

Info

Publication number
JPH08197093A
JPH08197093A JP7014091A JP1409195A JPH08197093A JP H08197093 A JPH08197093 A JP H08197093A JP 7014091 A JP7014091 A JP 7014091A JP 1409195 A JP1409195 A JP 1409195A JP H08197093 A JPH08197093 A JP H08197093A
Authority
JP
Japan
Prior art keywords
water
treated
exchange resin
ozone
ion exchange
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7014091A
Other languages
Japanese (ja)
Inventor
Tsugi Abe
嗣 阿部
Naomichi Yonekawa
直道 米川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nomura Micro Science Co Ltd
Original Assignee
Nomura Micro Science Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nomura Micro Science Co Ltd filed Critical Nomura Micro Science Co Ltd
Priority to JP7014091A priority Critical patent/JPH08197093A/en
Publication of JPH08197093A publication Critical patent/JPH08197093A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE: To suppress the generation of hydrogen peroxide and to effectively oxidize and decompose org. matter by adding the ozonized water obtained from an electrolytic ozonized water producing device to the water to be treated and adding the water passed through an anion-exchange resin or the hydroxide of an alkali metal to make the water alkaline. CONSTITUTION: The ozonized water of an electrolytic ozonized water producing device is added to the water to be treated from an ozonized water inlet 5 directly before a UV irradiation device 8. In this case, the water is regulated to pH 8-9 on this side of the inlet 5 by the water passed through an anion-exchange resin or the aq. alkali metal hydroxide soln. adding device 7. The org. matter in the water is then allowed to react with ozone by UV of the irradiation device 8 and decomposed into org. acid or carbonic acid. The water contg. H<+> ion and H free radical is added from a water inlet 6 of the electrode counter to an ozone generating electrode to return the water to neutral. The org. acid, carbonic acid, excess OH<-> ion and H<+> ion are removed in a mixed-bed ion- exchange resin tower 9. The by-produced hydrogen peroxide is removed in the water without using an activated-carbon treatment or a pH regulating chemical.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は水中の有機物(TOC)
を除去するための水処理方法および装置に係わり、特に
純水または超純水を製造するために、被処理水に紫外線
を照射して溶存有機物を分解し、この処理水をイオン交
換樹脂塔で処理して分解生成物である有機酸および炭酸
を除去する方法において、紫外線照射に先立ってオゾン
水を被処理水に添加して分解効率を高め、そのオゾン水
添加前に被処理水をアルカリ条件に調整し、オゾンと有
機酸の反応を促進するとともに紫外線照射により副生し
た過酸化水素を除去するようにした水処理方法および装
置に関する。
FIELD OF THE INVENTION The present invention relates to organic matter (TOC) in water.
The present invention relates to a water treatment method and apparatus for removing water, and in particular, in order to produce pure water or ultrapure water, the water to be treated is irradiated with ultraviolet rays to decompose dissolved organic matters, and this treated water is treated with an ion exchange resin tower. In the method of treating to remove organic acids and carbonic acid which are decomposition products, ozone water is added to the water to be treated prior to irradiation of ultraviolet rays to enhance the decomposition efficiency, and the water to be treated is treated under alkaline conditions before the addition of the ozone water. The present invention relates to a water treatment method and apparatus for controlling the reaction between ozone and an organic acid to remove hydrogen peroxide by-produced by ultraviolet irradiation.

【0002】[0002]

【従来の技術】半導体の製造プラントの洗浄工程におい
ては、純水や超純水が大量に用いられているが、近年、
純水や超純水中に溶存する有機物除去の問題が大きく取
り上げられている。
2. Description of the Related Art A large amount of pure water or ultrapure water is used in the cleaning process of a semiconductor manufacturing plant.
The problem of removing organic matter dissolved in pure water or ultrapure water has been widely taken up.

【0003】すなわち、純水または超純水の原水として
一般に使用される市水または井水中には腐敗した動植物
や微生物に起因する有機物が含まれていることが多いた
め、純水または超純水の製造プロセスにおいて、これら
の有機物を除去する必要がある。また、半導体プロセス
における洗浄工程では、イソプロピルアルコールのよう
な有機系洗浄剤が洗浄廃水に混入するが、大量に発生す
る洗浄廃水を再利用する場合には、廃水中の有機物を除
去する必要がある。
That is, since city water or well water generally used as raw water for pure water or ultrapure water often contains organic substances derived from spoiled animals and plants or microorganisms, pure water or ultrapure water is used. In the manufacturing process of, it is necessary to remove these organic substances. Further, in a cleaning process in a semiconductor process, an organic cleaning agent such as isopropyl alcohol is mixed into cleaning wastewater, but when recycling a large amount of cleaning wastewater, it is necessary to remove organic substances in the wastewater. .

【0004】従来から、市水、井水あるいは洗浄廃水か
ら純水・超純水を製造する方法として、凝集ろ過、逆浸
透膜処理、イオン交換処理、限外ろ過膜処理などを組み
合わせた処理が行われているが、これらの方法によって
は有機物の完全な除去は困難である。
Conventionally, as a method for producing pure water / ultra pure water from city water, well water or washing wastewater, a combined treatment of coagulation filtration, reverse osmosis membrane treatment, ion exchange treatment, ultrafiltration membrane treatment, etc. has been used. However, it is difficult to completely remove organic substances by these methods.

【0005】近年、このように被処理水中に微量残存す
る有機物濃度を減少させるために、被処理水に紫外線を
照射して水中の有機物を有機酸または炭酸に酸化分解
し、酸化分解によって生成した有機酸または炭酸を後段
に設置したイオン交換樹脂塔で除去する方法が用いられ
るようになってきている。しかしながらこの方法では、
紫外線照射だけで有機物を完全に分解するためには多量
の電力消費を必要とし、このため処理コストが高くつく
という問題があった。
In recent years, in order to reduce the concentration of a small amount of organic matter remaining in the water to be treated, the water to be treated is irradiated with ultraviolet rays to oxidize and decompose the organic matter in the water into an organic acid or carbonic acid, which is produced by oxidative decomposition. A method of removing an organic acid or carbonic acid by an ion exchange resin tower installed in a subsequent stage has come to be used. However, with this method,
There is a problem that a large amount of power consumption is required to completely decompose the organic matter only by irradiating with ultraviolet rays, which results in a high processing cost.

【0006】この問題を解決する方法として、被処理水
中にオゾンを添加し、オゾン添加後の被処理水に紫外線
照射を行い、被処理水中の有機物を効率よく酸化分解さ
せる方法が提案されている。この方法によれば、オゾン
と水の光反応が行われて酸化力の強い・OHラジカルが
生成され、効果的に有機物の酸化分解が行われる。
As a method for solving this problem, a method has been proposed in which ozone is added to the water to be treated and the water to be treated after the ozone addition is irradiated with ultraviolet rays to efficiently oxidize and decompose organic substances in the water to be treated. . According to this method, the photoreaction of ozone and water is performed to generate .OH radicals having a strong oxidizing power, and the oxidative decomposition of organic substances is effectively performed.

【0007】しかしながら、この方法では、オゾンと水
との反応により過酸化水素が発生し後段に設置されてい
るイオン交換樹脂を酸化劣化させたり、配管を腐食させ
るといつた新たな問題が生じている。
However, in this method, hydrogen peroxide is generated by the reaction between ozone and water, which causes oxidative deterioration of the ion-exchange resin installed in the subsequent stage, or corrodes the pipe, which causes new problems. There is.

【0008】従来、このような過酸化水素を除去するた
めに、後段に活性炭塔を設置して過酸化水素を接触分解
する方法がとられていたが、この方法においては活性炭
塔内で微生物が増殖し、微生物から生成した有機物の一
部が活性炭に吸着されて再溶出し、水質に大きな影響を
与えるという問題があった。また、活性炭塔内で微生物
が増殖すると、後段のイオン交換樹脂塔もその影響を受
けて通水性が低下するようになるが、このような状態に
なるとイオン交換塔は分解洗浄などのメンテナンスが必
要となって運用コストが上昇し、管理上も繁雑になると
いう問題もあった。
Conventionally, in order to remove such hydrogen peroxide, a method has been used in which an activated carbon tower is installed in the latter stage to catalytically decompose hydrogen peroxide. In this method, microorganisms are generated in the activated carbon tower. There has been a problem that a part of the organic substances that grow and are produced by the microorganisms are adsorbed on the activated carbon and redissolved, which greatly affects the water quality. Also, when microorganisms grow in the activated carbon tower, the ion exchange resin tower in the latter stage is also affected and the water permeability decreases, but in such a state, the ion exchange tower requires maintenance such as decomposition and cleaning. There was also a problem that the operating cost increased and the management became complicated.

【0009】[0009]

【発明が解決しようとする課題】前述したように、純水
または超純水の製造システムにおいて、被処理水中に微
量残存する有機物濃度を減少させるために、紫外線照射
とイオン交換樹脂塔により分解生成物を除去する方法で
は、多量の電力消費を必要とし、処理コストが高くつく
という問題があり、また、被処理水中にオゾンを添加し
て紫外線照射を行うことにより有機物を効率よく酸化分
解させる方法では、オゾンと水との反応により過酸化水
素が発生し、この過酸化水素によりイオン交換樹脂が酸
化劣化したり、配管が腐食するという問題があり、ま
た、後段に活性炭塔を配置して、発生した過酸化水素を
接触分解する方法では、活性炭塔内で微生物が増殖し微
生物が起因する有機物の一部が活性炭に吸着されて再溶
出したり、後段のイオン交換樹脂塔の通水性を低下させ
て、分解洗浄などのメンテナンスが必要となり運用コス
トが上昇し管理上も繁雑になるという問題もあった。
As described above, in the system for producing pure water or ultrapure water, in order to reduce the concentration of a small amount of organic substances remaining in the water to be treated, it is decomposed and produced by ultraviolet irradiation and an ion exchange resin tower. In the method of removing the substances, there is a problem that a large amount of power consumption is required and the treatment cost is high, and the method of efficiently oxidizing and decomposing the organic substances by adding ozone into the water to be treated and irradiating with ultraviolet rays. Then, there is a problem that hydrogen peroxide is generated by the reaction of ozone and water, and this hydrogen peroxide causes the oxidative deterioration of the ion exchange resin and the corrosion of the pipes. In the method of catalytically decomposing the generated hydrogen peroxide, microorganisms grow in the activated carbon tower and some of the organic substances caused by the microorganisms are adsorbed on the activated carbon and redissolved. Reduce the water permeability of-exchange resin column, operating costs are required maintenance such as brush cleaning there is a problem in that it becomes complicated administrative increases.

【0010】本発明は、かかる従来の問題を解決すべく
なされたもので、多量の電力消費を必要とせず、また、
紫外線照射により副生した過酸化水素を活性炭塔を使用
することなく除去することができ、したがって、活性炭
塔内での微生物の増殖や、有機物の再溶出の問題がな
く、運用コストの安い水処理方法および水処理装置を提
供することを目的とする。
The present invention has been made to solve the above conventional problems, does not require a large amount of power consumption, and
Hydrogen peroxide generated as a by-product of UV irradiation can be removed without using an activated carbon tower. Therefore, there is no problem of microbial growth in the activated carbon tower or re-elution of organic matter, and water treatment with low operating costs. It is an object to provide a method and a water treatment device.

【0011】[0011]

【課題を解決するための手段】本発明の水処理方法は、
被処理水に電解式オゾン水製造装置で生成されたオゾン
水を添加する工程と、前記被処理水をアルカリ条件に調
整する工程と、前記オゾン水が添加され、かつ、アルカ
リ条件に調整された被処理水に紫外線を照射して有機物
を分解する工程と、前記有機物が分解された被処理水に
前記電解式オゾン水製造装置で生成されたH+ イオンま
たは・Hラジカルを含有する水を添加する工程と、前記
+ イオンまたは・Hラジカルを含有する水が添加され
た被処理水をイオン交換樹脂塔で処理する工程とを有す
ることを特徴としており、また本発明の水処理装置は、
被処理水をアルカリ条件に調整する手段と、アルカリ条
件に調整された被処理水に有機物を分解する紫外線を照
射する紫外線照射装置とこの紫外線照射装置による処理
水を入口水とするイオン交換樹脂塔と、前記紫外線照射
装置の入口水にオゾン水を供給するとともに前記イオン
交換樹脂塔の入口水にH+ イオンまたは・Hラジカルを
含有する水を供給する電解式オゾン水製造装置とを有す
ることを特徴としている。
The water treatment method of the present invention comprises:
A step of adding ozone water generated by an electrolytic ozone water producing apparatus to the water to be treated, a step of adjusting the water to be treated to an alkaline condition, and the ozone water being added and adjusted to an alkaline condition A step of irradiating the water to be treated with ultraviolet rays to decompose organic substances, and adding water containing H + ions or H radicals generated in the electrolytic ozone water producing apparatus to the water to be treated in which the organic substances have been decomposed And a step of treating water to be treated to which water containing H + ions or H radicals is added in an ion exchange resin tower, and the water treatment apparatus of the present invention comprises:
Means for adjusting the treated water to alkaline conditions, an ultraviolet irradiation device for irradiating the treated water adjusted to alkaline conditions with ultraviolet rays for decomposing organic substances, and an ion exchange resin tower using the treated water by the ultraviolet irradiation device as inlet water And an electrolytic ozone water producing apparatus for supplying ozone water to the inlet water of the ultraviolet irradiation apparatus and supplying water containing H + ions or H radicals to the inlet water of the ion exchange resin tower. It has a feature.

【0012】本発明において、被処理水をアルカリ条件
に調整するに、例えば、被処理水の少なくとも一部をア
ニオン系イオン交換樹脂に通過させるか、または被処理
水にアルカリ金属の水酸化物を添加すればよい。なお、
アニオン系イオン交換樹脂は極力不純物レベルの低いも
のを使用するようにし、また、アルカリ金属の水酸化物
も、電子工業用あるいはそれに準ずるグレードのものを
使用する。アニオン系イオン交換樹脂通過水またはアル
カリ金属の水酸化物の導入口は、紫外線照射装置の直前
または紫外線照射装置本体内、または2分割された紫外
線照射装置の前側と後側の中間に設けられる。アルカリ
条件としては、pHで8〜9程度が適している。
In the present invention, in order to adjust the water to be treated to alkaline conditions, for example, at least a part of the water to be treated is passed through an anion ion exchange resin, or the hydroxide of an alkali metal is added to the water to be treated. It may be added. In addition,
The anion type ion exchange resin should be as low as possible in the impurity level, and the alkali metal hydroxide should be of the grade for the electronics industry or a grade equivalent thereto. The inlet for the water passing through the anion-based ion exchange resin or the hydroxide of the alkali metal is provided immediately before the ultraviolet irradiation device, in the main body of the ultraviolet irradiation device, or in the middle between the front side and the rear side of the two-part ultraviolet irradiation device. As alkaline conditions, pH of about 8 to 9 is suitable.

【0013】本発明における紫外線照射装置としては、
低圧あるいは中圧水銀ランプが使用され、チャンバー内
は耐薬品性のある樹脂ライニングを行うかあるいはステ
ンレス鋼を用いることが好ましい。樹脂ライニングの材
質としては、耐薬品性の強いPFA等のフッ素系樹脂が
例示され、ステンレス鋼としては電解研磨や複合電解研
磨などの耐薬品・耐腐食処理を施したものがより好まし
い。
The ultraviolet irradiation device in the present invention is as follows:
A low or medium pressure mercury lamp is used, and it is preferable that the inside of the chamber is lined with a resin having chemical resistance or stainless steel is used. Examples of the material of the resin lining include fluorine-based resins such as PFA having strong chemical resistance, and stainless steel is more preferably subjected to chemical resistance / corrosion resistance treatment such as electrolytic polishing or complex electrolytic polishing.

【0014】本発明において、紫外線照射装置の後段に
設置されるイオン交換樹脂塔としてはアニオン系もしく
はアニオン・カチオン系のイオン交換樹脂塔が用いられ
る。イオン交換樹脂塔に充填されるイオン交換樹脂は、
新品もしくはそれに類する破砕のないものが好ましく、
イオン交換樹脂そのものの性能が高く、溶出の少ないも
のがより好ましい。
In the present invention, an anion-type or anion-cation-type ion-exchange resin column is used as the ion-exchange resin column installed after the ultraviolet irradiation device. The ion exchange resin packed in the ion exchange resin tower is
It is preferable that it is new or that does not have crushing similar to it,
It is more preferable that the ion exchange resin itself has high performance and little elution.

【0015】[0015]

【作用】本発明においては、被処理水中の有機物を有機
酸あるいは炭酸に分解するために、被処理水に電解式オ
ゾン水製造装置で生成されたオゾン水を添加し、アニオ
ン系イオン交換樹脂の通過水もしくはアルカリ金属の水
酸化物を添加することで被処理水をpHで8〜9程度の
アルカリ条件に調整する。
In the present invention, in order to decompose the organic matter in the water to be treated into organic acid or carbonic acid, the ozone water produced by the electrolytic ozone water producing apparatus is added to the water to be treated, and the anionic ion exchange resin The water to be treated is adjusted to an alkaline condition of about pH 8-9 by adding passing water or an alkali metal hydroxide.

【0016】その後、紫外線照射を行い、有機物を有機
酸または炭酸に分解する。
After that, ultraviolet rays are irradiated to decompose organic substances into organic acids or carbonic acids.

【0017】紫外線照射装置の出口水に、電解式オゾン
水製造装置内のオゾン発生電極の対極側で生成されたH
+ イオンまたは・Hラジカルを含有する水を供給してオ
ゾン水添加の際に副生成物として発生する過酸化水素を
除去し、被処理水の液性を中性領域付近に戻す。
H generated in the outlet water of the ultraviolet irradiation device on the opposite side of the ozone generating electrode in the electrolytic ozone water producing device.
By supplying water containing + ions or H radicals, hydrogen peroxide generated as a by-product when ozone water is added is removed, and the liquid property of the water to be treated is returned to around the neutral region.

【0018】さらに、後段に設けられた前記イオン交換
樹脂塔によって前記被処理水中の有機酸と余剰のOH-
イオンおよびH+ イオンを除去する。
Furthermore, the excess organic acid of the for-treatment water by the ion exchange resin column disposed downstream OH -
Ions and H + ions are removed.

【0019】[0019]

【実施例】次に本発明の実施例について説明するが、本
発明は以下の実施例のみに限定されるものではない。
EXAMPLES Next, examples of the present invention will be described, but the present invention is not limited to the following examples.

【0020】図1本発明に用いられた電解式オゾン水製
造装置電極概略図を示す。
FIG. 1 is a schematic view of electrodes of an electrolytic ozone water producing apparatus used in the present invention.

【0021】電気分解により発生したオゾンとH+ イオ
ンはそれぞれ、陽極1側はオゾン水陰極4側はH+ イオ
ン水として分離する。分離したオゾン水とH+ イオン水
はそれぞれ水処理装置内に導入する。
[0021] Each ozone generated by electrolysis H + ions, the anode 1 side is ozone water cathode 4 side separated as H + ionized water. The separated ozone water and H + ion water are introduced into the water treatment device.

【0022】図2〜図4にそれぞれの水処理装置流れ図
を示す。
2 to 4 are flow charts of the respective water treatment devices.

【0023】実施例1 図2に水処理装置流れ図1を示す。電解式オゾン水製造
装置で発生したオゾン水は、紫外線照射装置8直前で被
処理水に添加され、続いてオゾン水の添加された被処理
水は紫外線照射装置8に導入される。その際、オゾン水
導入口5の手前でアニオン系イオン交換樹脂通過水また
はアルカリ金属水酸化物水溶液添加装置7によって液性
をpH8〜9程度にコントロールする。
Embodiment 1 FIG. 2 shows a flow chart 1 of a water treatment device. The ozone water generated by the electrolytic ozone water producing apparatus is added to the water to be treated just before the ultraviolet irradiation device 8, and the treated water to which the ozone water is added is subsequently introduced into the ultraviolet irradiation device 8. At that time, the liquid property is controlled to about pH 8-9 by the anion-based ion exchange resin passing water or the alkali metal hydroxide aqueous solution addition device 7 before the ozone water inlet 5.

【0024】次に紫外線による光励起により被処理水中
の有機物とオゾンを反応させ、有機物を有機酸または炭
酸に分解する。しかし、このとき同時に過酸化水素の生
成が起こるので、被処理水に電解式オゾン水製造装置内
のオゾン発生電極の対極側で生成したH+ イオン及び・
Hラジカルを含有する水をオゾン発生電極対極水導入口
6から添加して過酸化水素を分解するとともにアルカリ
側になっている液性を中性領域に戻す。
Next, the organic matter in the water to be treated is reacted with ozone by photoexcitation by ultraviolet rays, and the organic matter is decomposed into organic acid or carbonic acid. However, since hydrogen peroxide is simultaneously generated at this time, H + ions generated on the counter electrode side of the ozone generating electrode in the electrolytic ozone water producing apparatus and
Water containing H radicals is added from the ozone generating electrode counter electrode water inlet 6 to decompose hydrogen peroxide and return the liquidity on the alkaline side to the neutral region.

【0025】最後に被処理水をアニオン系イオン交換樹
脂搭または混床式イオン交換樹脂搭9に導入し、有機酸
および炭酸と余剰のOH- イオンおよび・H+ イオンを
除去する。
Finally, the water to be treated is introduced into the anion type ion exchange resin column or the mixed bed type ion exchange resin column 9 to remove the organic acid and carbonic acid and excess OH ions and · H + ions.

【0026】実施例2 図3は、実施例2の水処理装置流れ図2を示している。
図2と同一の機器には図2と同一符号を付して重複する
説明を省略する。
Example 2 FIG. 3 shows a flow chart 2 of the water treatment apparatus of Example 2.
The same devices as those in FIG. 2 are designated by the same reference numerals as those in FIG.

【0027】アニオン系イオン交換樹脂通過水またはア
ルカリ金属水酸化物水溶液添加装置7によって、紫外線
照射装置8本体にアニオン系イオン交換樹脂通過水また
はアルカリ金属水酸化物水溶液を添加して、液性をpH
8〜9程度にコントロールする。
The anion type ion exchange resin passing water or the alkali metal hydroxide aqueous solution is added to the main body of the ultraviolet irradiation device 8 by the anion type ion exchange resin passing water or the alkali metal hydroxide aqueous solution adding device 7 to make the liquid property. pH
Control to about 8-9.

【0028】実施例3 図4は、実施例3の水処理装置流れ図を示している。図
2と同一の機器には図2と同一符号を付して重複する説
明を省略する。
Example 3 FIG. 4 shows a flow chart of the water treatment device of Example 3. The same devices as those in FIG. 2 are designated by the same reference numerals as those in FIG.

【0029】紫外線照射装置8を2段に分け、アニオン
系イオン交換樹脂通過水またはアルカリ金属水酸化物水
溶液添加装置7からの導入口の位置を前段紫外線照射装
置8aと後段紫外線照射装置8bの中間に設け、アニオ
ン系イオン交換樹脂通過水またはアルカリ金属水酸化物
水溶液液性を添加して液性をpH8〜9程度にコントロ
ールする。
The ultraviolet irradiation device 8 is divided into two stages, and the position of the introduction port from the anion-type ion exchange resin passing water or the alkali metal hydroxide aqueous solution addition device 7 is located between the front ultraviolet irradiation device 8a and the rear ultraviolet irradiation device 8b. The pH is controlled to about 8 to 9 by adding water passing through the anion-based ion exchange resin or aqueous alkali metal hydroxide solution.

【0030】前段紫外線照射装置8aでは紫外線照射の
みによる有機物の分解、後段紫外線照射装置8bでは紫
外線照射の光励起によるオゾンとの有機物反応分解を行
う。
The front-stage ultraviolet irradiation device 8a decomposes organic substances only by ultraviolet irradiation, and the rear-stage ultraviolet irradiation device 8b decomposes organic substances by ozone by photoexcitation of ultraviolet irradiation.

【0031】[0031]

【発明の効果】本発明によれば、半導体の製造プラント
の洗浄工程において大量に用いられる純水・超純水の洗
浄廃水の再利用のための溶存有機物の除去において、副
生成物として発生する過酸化水素を、活性炭塔やpHコ
ントロール用の薬品を用いることなく除去可能とし通常
の装置運転時の繁雑な管理も不必要になる。従来排水さ
れていた電解式オゾン製造装置内のオゾン発生電極の対
極側水を効率よく、効果的に利用することができるよう
になり、薬液注入・活性炭交換・活性炭塔メンテナンス
・活性炭からのイオン交換樹脂塔への負荷等がなくなる
ためにイニシャル及びランニングコストの削減が可能と
なる。
EFFECTS OF THE INVENTION According to the present invention, it is generated as a by-product in the removal of dissolved organic substances for reuse of cleaning waste water of pure water / ultra pure water used in large quantities in the cleaning process of semiconductor manufacturing plants. The hydrogen peroxide can be removed without using an activated carbon tower or chemicals for pH control, and complicated management during normal equipment operation becomes unnecessary. It is now possible to efficiently and effectively use the water on the counter electrode side of the ozone generation electrode in the electrolytic ozone production equipment that was conventionally drained, chemical injection, activated carbon exchange, activated carbon tower maintenance, ion exchange from activated carbon. Since the load on the resin tower is eliminated, the initial and running costs can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】電解式オゾン製造装置電極概略図FIG. 1 Schematic diagram of electrodes for electrolytic ozone production equipment

【図2】水処理装置流れ図1FIG. 2 Flow chart of water treatment device 1

【図3】水処理装置流れ図2FIG. 3 Flow chart of water treatment device 2

【図4】水処理装置流れ図3FIG. 4 Flow chart of water treatment device 3

【符号の説明】[Explanation of symbols]

1 ………陽極 2 ………隔膜 3 ………固体電解質 4 ………陰極 5 ………オゾン水導入口 6 ………オゾン発生電極対極導入口 7 ………アニオン系イオン交換樹脂水またはアルカリ
金属水酸化物水溶液添加装置 8 ………紫外線照射装置 8a………前段側紫外線照射装置 8b………後段側紫外線照射装置 9 ………アニオンイオン交換樹脂塔または混床式イオ
ン交換樹脂塔
1 Anode 2 A diaphragm 3 Solid electrolyte 4 A cathode 5 Ozone water inlet 6 An ozone generating electrode counter electrode inlet 7 Anion ion exchange resin water or Alkali metal hydroxide aqueous solution addition device 8 ………… Ultraviolet irradiation device 8a ………… Previous stage ultraviolet irradiation device 8b ………… Post stage ultraviolet irradiation device 9 ………… Anion ion exchange resin tower or mixed bed type ion exchange resin tower

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C02F 9/00 504 B E 1/32 1/42 B 1/46 Z 1/78 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C02F 9/00 504 BE 1/32 1/42 B 1/46 Z 1/78

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 被処理水に電解式オゾン水製造装置で生
成されたオゾン水を添加する工程と、前記被処理水をア
ルカリ条件に調整する工程と、前記オゾン水が添加さ
れ、かつ、アルカリ条件に調整された被処理水に紫外線
を照射して有機物を分解する工程と、前記有機物が分解
された被処理水に前記電解式オゾン水製造装置で生成さ
れたH+ イオンまたは・Hラジカルを含有する水を添加
する工程と、前記H+ イオンまたは・Hラジカルを含有
する水が添加された被処理水をイオン交換樹脂塔で処理
する工程とを有することを特徴とする水処理方法。
1. A step of adding ozone water generated by an electrolytic ozone water producing apparatus to the water to be treated, a step of adjusting the water to be treated to an alkaline condition, and the ozone water being added, and an alkali The step of irradiating the treated water adjusted to the conditions with ultraviolet rays to decompose the organic matter, and the treated water in which the organic matter is decomposed are treated with H + ions or H radicals generated in the electrolytic ozone water producing apparatus. A water treatment method comprising: a step of adding contained water; and a step of treating water to be treated to which water containing H + ions or · H radicals is added in an ion exchange resin tower.
【請求項2】 アルカリ条件に調整する工程が、前記被
処理水の少なくとも一部をアニオン系イオン交換樹脂を
通過させる工程か、またはアルカリ金属の水酸化物を添
加する工程であることを特徴とする請求項1記載の水処
理方法。
2. The step of adjusting to alkaline conditions is a step of passing at least a part of the water to be treated through an anion ion exchange resin or a step of adding a hydroxide of an alkali metal. The water treatment method according to claim 1.
【請求項3】 被処理水をアルカリ条件に調整する手段
と、アルカリ条件に調整された被処理水に有機物を分解
する紫外線を照射する紫外線照射装置と、この紫外線照
射装置による処理水を入口水とするイオン交換樹脂塔
と、前記紫外線照射装置の入口水にオゾン水を供給する
とともに前記イオン交換樹脂塔の入口水にH+ イオンま
たは・Hラジカルを含有する水を供給する電解式オゾン
水製造装置とを有することを特徴とする水処理装置。
3. A means for adjusting treated water to an alkaline condition, an ultraviolet irradiation device for irradiating the treated water adjusted to an alkaline condition with ultraviolet rays for decomposing organic substances, and the treated water by the ultraviolet irradiation device to the inlet water. And an ion exchange resin tower to supply ozone water to the inlet water of the ultraviolet irradiation device and to supply water containing H + ions or H radicals to the inlet water of the ion exchange resin tower. And a water treatment device.
【請求項4】 イオン交換樹脂塔が、アニオン交換樹脂
塔またはアニオン・カチオン交換樹脂の混床式塔である
ことを特徴とする請求項3記載の水処理装置
4. The water treatment apparatus according to claim 3, wherein the ion exchange resin tower is an anion exchange resin tower or an anion / cation exchange resin mixed bed tower.
【請求項5】 アルカリ条件が、pH8〜9である請求
項1記載の水処理方法または請求項3記載の水処理装
置。
5. The water treatment method according to claim 1 or the water treatment device according to claim 3, wherein the alkaline condition is pH 8-9.
JP7014091A 1995-01-31 1995-01-31 Water treatment and device therefor Withdrawn JPH08197093A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7014091A JPH08197093A (en) 1995-01-31 1995-01-31 Water treatment and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7014091A JPH08197093A (en) 1995-01-31 1995-01-31 Water treatment and device therefor

Publications (1)

Publication Number Publication Date
JPH08197093A true JPH08197093A (en) 1996-08-06

Family

ID=11851449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7014091A Withdrawn JPH08197093A (en) 1995-01-31 1995-01-31 Water treatment and device therefor

Country Status (1)

Country Link
JP (1) JPH08197093A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098244A (en) * 2005-10-03 2007-04-19 Nippon Rensui Co Ltd Recycling method of ozone-containing drain
EP3873857A4 (en) * 2018-10-29 2022-08-24 Evoqua Water Technologies LLC Removal of ozone from process streams with ultraviolet radiation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098244A (en) * 2005-10-03 2007-04-19 Nippon Rensui Co Ltd Recycling method of ozone-containing drain
EP3873857A4 (en) * 2018-10-29 2022-08-24 Evoqua Water Technologies LLC Removal of ozone from process streams with ultraviolet radiation
US11926550B2 (en) 2018-10-29 2024-03-12 Evoqua Water Technologies Llc Removal of ozone from process streams with ultraviolet radiation

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