JPH08167562A - Semiconductor manufacturing device and manufacture of device - Google Patents

Abstract

PURPOSE: To change a production lot quickly and accurately in a semiconductor device manufacturing operation by a method wherein a cue table for preengaging a reticule in lot processing is former if a reticule is used in lot processing when operational parameters are required to be changed. CONSTITUTION: A semiconductor manufacturing device executes only the required lot processing out of partial processing by operating a console scope 102 and a main body CPU 321 of an EWS display device 2. When operational parameters used in lot processing are required to be changed, operational parameters are read out from the outside (meta) 322 through a console CPU 331, processed, and formed. When a reticule is used in lot processing, an additional button is pushed down to form a cue table for preengaging a reticule through a keyboard 104 and the like. By this setup, a lot change is capable of being quickly and acccurately made in a semiconductor device manufacturing operation.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus such as a semiconductor exposure apparatus for manufacturing semiconductor devices such as LSI and VLSI, and a device manufacturing method.

[0002]

2. Description of the Related Art In a semiconductor exposure apparatus that operates according to a large number of operation parameters, a job (partial processing of one lot processing) required to process a certain lot is selected from a database in which the operation parameters are stored. Further, after selecting the reticle to be used in the lot, the start of the exposure process is instructed.

In recent years, the number of wafers per lot has decreased and the number of lots has tended to increase as the quantity of semiconductors and the variety of semiconductors have increased.

Further, even when a plan is set such that the order of processing a plurality of lots is determined in advance, an urgent lot may occur and interrupt processing may be performed.

Under such circumstances, in order to perform the lot switching in the exposure operation of the semiconductor device quickly and efficiently, it is necessary to preset the jobs and reticles necessary for performing the lot processing. I won't.

Further, the preset order of lot processing must be such that deletion and addition can be performed before processing.

In the conventional method called a multi-job, the order of processing a plurality of lots is determined in advance and the work is performed.

[0008]

However, the above-mentioned conventional example has the following drawbacks. (1) Once decided, the order cannot be deleted or added. (2) Once exposure processing is started, lot processing can be performed only in a determined order.

The present invention has been made in view of the problems in the above-mentioned conventional example, and can quickly and accurately switch lots in a semiconductor device manufacturing operation, and interrupt processing is performed even when an urgent lot occurs. The purpose is to be able to.

[0010]

To achieve the above object, in the present invention, when a device is manufactured using a manufacturing apparatus that operates according to a large number of operating parameters, the manufacturing apparatus executes a predetermined lot process. If you want to change the partial process (job) of the lot process that is necessary to change the operation parameter used in the lot process, and the operation parameter that you want to use in the lot process, and reserve the reticle when you use the reticle A queue table is created for executing each partial process according to the order reserved in the queue table.

In a preferred embodiment of the present invention, the queue table is provided in the manufacturing apparatus, and means for starting the processing of the next lot by the operator intervening at the break of the lot in the manufacturing apparatus, and the operator. Means for automatically starting processing of the next lot without any intervention.
Further, if the partial process reserved in the queue table is before the start of the lot process including the partial process, means for deleting the reservation from the table or changing the order of execution by the reservation, and the lot process A means for adding a reservation for partial processing of a lot before starting to the table, and whether the lot including the reserved partial processing is a processed lot, is currently being processed, or is waiting for processing. And means for determining In this case, the means for deleting the reservation, the means for changing the reservation order, the means for adding the reservation, and the means for determining the processing status of the lot processing to which the reserved partial processing belongs are the console screen of the manufacturing apparatus. And a host computer that integrally controls a plurality of semiconductor manufacturing apparatuses including the manufacturing apparatus.

[0012]

According to the present invention, the queue table of the manufacturing apparatus can be used to reserve the jobs necessary for processing a certain lot (and also the reticle in the semiconductor manufacturing apparatus), and the jobs reserved in the table can be reserved. Before starting lot processing, reservations can be deleted, reservations can be added, and the order of reservations can be changed. In addition, it is possible to select whether or not operator intervention is required when processing the next lot at the lot break.

From the above, it becomes possible to switch the lots in the exposure operation of the semiconductor device quickly and accurately, and it is possible to perform the interrupt processing promptly even if an urgent lot occurs. Become.
Further, since information remains in this cue table unless the operator intentionally deletes it even after the exposure processing is completed, it can be used for checking the lot history and lot processing status of the semiconductor manufacturing apparatus.

[0014]

1 is a perspective view showing the appearance of a semiconductor exposure apparatus according to an embodiment of the present invention. As shown in the figure, this semiconductor exposure apparatus includes a temperature control chamber 101 that controls the environmental temperature of the apparatus main body, an EWS main body 106 that is disposed inside the chamber and has a CPU that controls the apparatus main body, and
An EWS display device 102 that displays predetermined information in the device, a monitor TV 105 that displays image information obtained through an image pickup unit in the device body, an operation panel 103 for performing predetermined input to the device, and an EWS keyboard 104. It is equipped with a console section including the above. In the figure, 107 is an ON-OFF switch, 108 is an emergency stop switch, 109 is various switches, a mouse, etc., 110 is a LAN communication cable, 111 is an exhaust duct for heat generated from the console function, and 112 is a chamber exhaust device. . The main body of the semiconductor exposure apparatus is installed inside the chamber 101.

The EWS display 102 is a thin flat type such as EL, plasma, liquid crystal, etc., is housed in the front of the chamber 101, and is connected to the EWS main body 106 by a LAN cable 110. Operation panel 10
3, a keyboard 104, a monitor TV 105 and the like are also installed on the front surface of the chamber 101 so that the console operation similar to the conventional one can be performed from the front surface of the chamber 101.

FIG. 2 is a diagram showing the internal structure of the apparatus shown in FIG. In the figure, a stepper as a semiconductor exposure apparatus is shown. In the figure, 202 is a reticle, and 203 is a wafer. When the light flux emitted from the light source device 204 passes through the illumination optical system 205 and illuminates the reticle 202, the pattern on the reticle 202 is exposed on the wafer 203 by the projection lens 206. It can be transferred to a layer. The reticle 202 is supported by a reticle stage 207 for holding and moving the reticle 202. Wafer 203
Is exposed by the wafer chuck 291 while being vacuum-adsorbed. The wafer chuck 291 is the wafer stage 20.
It is possible to move in each axial direction by 9. A reticle optical system 281 for detecting a positional deviation amount of the reticle is arranged above the reticle 202. An off-axis microscope 282 is arranged above the wafer stage 209 and adjacent to the projection lens 206. Off-axis microscope 282
The main role is to detect the relative position between the internal reference mark and the alignment mark on the wafer 203.
Further, adjacent to the stepper body, peripheral devices such as a reticle library 220 and a wafer carrier elevator 2 are provided.
30 is arranged, and necessary reticles and wafers are transferred to the stepper main body by the reticle transfer device 221 and the wafer transfer device 231.

The chamber 101 is mainly composed of an air conditioner room 210 for controlling the temperature of the air, a filter box 213 for filtering fine foreign matters to form a uniform flow of clean air, and a booth 214 for shutting off the environment of the apparatus from the outside. Has been done. In the chamber 101, air whose temperature is adjusted by the cooler 215 and the reheat heater 216 in the air conditioner room 210 is supplied by the blower 217 into the booth 214 via the air filter g. The air supplied to the booth 214 is again returned from the return port ra to the air conditioner room 210.
And is circulated in the chamber 101. Usually, this chamber 101 is not a complete circulation system in a strict sense, and about 10% of the amount of circulating air outside the booth 214 is introduced into the air conditioning chamber 210 in order to maintain the positive pressure inside the booth 214 at all times. It is introduced through the blower from the mouth oa. In this way, the chamber 101 makes it possible to keep the ambient temperature in which the apparatus is placed constant and keep the air clean. Further, the light source device 204 is provided with an intake port sa and an exhaust port e in preparation for cooling of the ultra-high pressure mercury lamp and preparation of toxic gas in the event of a laser abnormality.
a is provided, and a part of the air in the booth 214 is forcedly exhausted to the factory equipment via the light source device 204 and the exclusive exhaust fan provided in the air conditioner room 210. Further, a chemical adsorption filter cf for removing chemical substances in the air is provided by being connected to the outside air introduction port oa and the return port ra of the air conditioner chamber 210, respectively.

FIG. 3 is a block diagram showing an electric circuit configuration of the apparatus shown in FIG. In the figure, reference numeral 321 denotes a main body C incorporated in the EWS main body 106, which controls the entire apparatus.
The PU is a central processing unit such as a microcomputer or a minicomputer. 322 is a wafer stage drive device, 323 is the off-axis microscope 28
2 and the like alignment detection system, 324 a reticle stage drive device, 325 an illumination system such as the light source device 204, 3
26 is a shutter drive device, 327 is a focus detection system,
Reference numeral 328 denotes a Z drive device, which is a main body CPU 32.
Controlled by 1. Reference numeral 329 denotes the reticle transport device 2
21, a wafer transfer device 231, and the like. 330
Is a console unit having the display 102, the keyboard 104, etc., and is for giving various commands and parameters relating to the operation of the exposure apparatus to the main body CPU 321. That is, it is for exchanging information with the operator. 331 is a console CPU, and 332 is an external memory that stores parameters and the like. The console CPU 331 is provided with a working memory (RAM) in which registers and flags are set for temporarily storing various data generated when the CPU executes a predetermined process.

FIG. 4 shows an example of the job queue window displayed on the display 102 of the apparatus shown in FIG. In FIG. 4, a button with a black triangle is a cursor button for scrolling the display in the direction of the black triangle.
Each button is a button that scrolls by one line each time the button is pressed once, and two black triangles are buttons that scroll by several lines each time the button is pressed once. The button marked with "<" is a cursor button that scrolls to the left, and the button marked with ">" is a cursor button that scrolls to the right. The Start button is a button for starting the processing displayed in the queue table, and the Stop button is for stopping the processing displayed in the queue table as soon as the processing of the job being executed is completed. It is a button. The Add button is a button for registering the job to be reserved in the last line in the queue table, and the Delete button is
The te button has a status (Status) waiting for a turn (Qu
The buttons for deleting unnecessary jobs and the Change button are the status (Status)
“Tus” is a button for changing the order of processing jobs in queue (Queued). Quit
The button is a button for ending this job queue window. The contents of the queue table are displayed in the display portion of the queue table in FIG. However, the parameter contents are not displayed. State (Status) has been processed (D
One), processing in progress (Running), or queued (Queued) is displayed. Source (When
ce) is online (On) as a display and input device.
Line), Console (Console), (Sel
Any of Job) is displayed.

Next, the operation of the apparatus shown in FIG. 1 will be described with reference to FIGS. When sequentially processing a plurality of lots, the operator uses the input means (touch panel 10) of the apparatus.
3. A job queue (queue) mode is selected by the keyboard 104, a mouse (not shown), or the like. This allows
The screen (window) shown in FIG. 4 is displayed on the display (and touch panel) 102. While looking at this screen, the operator uses the input means to execute the job name (Job Name) and its execution mode (M
ode) is automatic (Auto) and semi-automatic (SemiAut)
o) or manual (Manual), the number of wafers (Wafer), and when using a reticle, display of the reticle (Reticle) and the like are input according to the job execution order. The queue table as shown in FIG. 4 may be set in a separate queue table registration mode, and may be created and registered in advance in that mode.
It should be created by another device such as a host computer that controls a plurality of semiconductor manufacturing devices including the semiconductor exposure device of FIG. 1 and input to the device of FIG. 1 using online, magnetic tape, magnetic desk, etc. You may In either case, when the desired cue table is displayed, the operator presses the start button.

As a result, the CPU 331 of FIG. 3 starts the job start process shown in the flowchart of FIG.
That is, first, the execution flag and the load flag are cleared (S101), and the queue table (Queue Tab) is set.
le) is searched from the beginning in the order of reservation and the order is waited (Q
It is determined whether or not there is a job of (ueued) (S10).
5). If there are no queued jobs (Queued), this job start process is terminated (S16).
0). On the other hand, if there is a queued job, it is determined whether the mode of the job is manual (Manual) (S110). If not manual, the process is S12.
If 0, the process proceeds to S112 if it is manual. S
At 112, the screen of the display 102 is displayed, "Can I load the next job? (OK / NO)". If the operator selects "NO", the job start process is terminated (S160). On the other hand, the operator
If "S" is selected, the load flag is set (S11
5) After that, the process proceeds to S120.

In step S120, it is determined whether the waiting job is automatic (Auto). If it is not automatic, the process proceeds directly to S130. If it is automatic, the execution flag is set (S125), and then the process proceeds to S130.
In S130, the waiting job is semi-automatic (Semi
Auto) is determined. If not semi-automatic, the process proceeds directly to S140. On the other hand, if it is semi-automatic, S
At 135, the screen of the display 102 is displayed, "Can I execute the next job? (OK / NO)". If the operator selects "NO", the job start process is terminated (S160). On the other hand, if the operator selects "YES", the execution flag is set in S137, and then the process proceeds to S140.

In S140, it is determined whether or not the execution flag is set. If the execution flag is set, the job is started in S145, and if it is not set, S14 is executed.
The process proceeds directly from 0 to S150. In S150, it is determined whether the load flag is set. If the load flag is set, after loading the job in S155,
If the road fluff is not standing, the job start process is directly terminated from S150 (S160).

When the lot process is started in S145 of FIG. 5, the lot process start time process of FIG. 6 is executed. That is, first in S201, it is determined whether or not the state of the queue (Queue) is stop (Stop), that is, whether or not the stop button in FIG. 4 is pressed. If it is a stop, the processing at the start of the lot processing is ended as it is (S210), and if it is not a stop, the current time is entered in the start time (Start Time) of the job whose status (Status) is Queued in S205, and Executing the status (Status) (Runni)
ng), the processing at the start of the lot processing is ended (S210).

When the started lot process is completed, the lot process end process shown in FIG. 7 is executed. That is, first, in step S301, the status (Status) is being executed (Runni).
ng), the current time is entered in the end time (End Time) of the job, and it is determined in the next S305 whether or not the state of the queue (Queue) is stop (Stop). If it is a stop, the processing at the end of this lot processing is finished as it is (S370), and if it is not a stop, S307
After clearing the execution flag and load flag with
At 10, it is determined whether or not there is a queued job in the queue table. If there are no queued jobs (Queued), this lot process end process is terminated (S37).
0). On the other hand, if there is a queued job, the mode of the job is set to Manual (Manual) in S320.
l) is determined. If not manual, the process is S330.
If it is manual, the process proceeds to S325. S3
At 25, the display 102 displays “Are you sure you want to load the next job? (OK / NO)”. If the operator selects "NO", the lot processing end processing is ended (S370). On the other hand, the operator
If "S" is selected, the load flag is set (S32
7) After that, the process proceeds to S330.

In step S330, it is determined whether the waiting job is automatic (Auto). If it is not automatic, the process proceeds directly to S340. If it is automatic, the execution flag is set in S335, and then the process proceeds to S340. S
In 340, the waiting job is semi-automatic (SemiA
uto) or not. If not semi-automatic, the process proceeds directly to S350. On the other hand, if it is semi-automatic, S3
At 45, the display 102 displays "Can I execute the next job? (OK / NO)". If the operator selects "NO", the lot processing end processing is ended (S370). On the other hand, if the operator selects “YES”, the execution flag is set in S347, and then the process proceeds to S350.

In S350, it is determined whether or not the execution flag is set. If the execution flag is set, the job is started in S355, and if not set, S35
The process proceeds directly from 0 to S360. In S360, it is determined whether or not the load flag is set. If the load flag is set, after loading the job in S365,
If the road fluff is not standing, the processing at the end of this lot processing is directly ended from S360 (S370).

As described above, in the apparatus of FIG. 1, the waiting jobs registered in the queue table are sequentially executed, the start time (Start) and the end time (End) of the lot are entered, and the job is further executed. A mark of Done is added. Then, it is confirmed whether or not the stop button has been pressed at the start of lot processing and each time one lot processing ends. When the stop button is pressed, execution of the next job in the queue is stopped, and the operator can add, delete, change, etc. jobs on the screen of FIG. For example, when the job to be reserved is input using the keyboard 104 or the like by pressing the Add button, the input job can be registered in the last line in the queue table. Also, use the cursor button to change the status (St
When the delete button is pressed after the job has selected queued job (Queued), the selected line can be deleted. In addition, the cursor button waits for the status (Status) to wait (Queue).
After selecting the job of d), if the Change button is pressed, the selected line can be moved.

[0029]

As described above, according to the present invention,
The lots can be switched quickly and accurately in the exposure operation of the semiconductor device, and even if an urgent lot occurs, the interrupt processing can be promptly performed.

The queue table can also be used to confirm the lot history and lot processing status of the semiconductor manufacturing apparatus.

[Brief description of drawings]

FIG. 1 is a perspective view showing the outer appearance of a semiconductor exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing an internal structure of the apparatus of FIG.

FIG. 3 is a block diagram showing an electric circuit configuration of the apparatus of FIG.

4 is a diagram showing an example of an operation screen displaying a job queue window displayed on a console screen in the apparatus of FIG.

FIG. 5 is a flowchart when the Start button of the job queue window in the apparatus of FIG. 1 is pressed.

FIG. 6 is a flowchart at the start of lot processing in the apparatus of FIG.

FIG. 7 is a flowchart at the end of lot processing in the apparatus of FIG.

[Explanation of symbols]

101: temperature control chamber, 102: EWS display device, 103: operation panel, 104: EWS keyboard, 105: monitor TV, 106: EWS body, 10
7: ON-OFF switch, 108: Emergency stop switch, 109: Various switches, mouse, etc., 110: LAN
Communication cable, 111: exhaust duct, 112: exhaust device, 202: reticle, 203: wafer, 204: light source device, 205: illumination optical system, 206: projection lens, 20
7: Reticle stage, 209: Wafer stage, 28
1: reticle microscope, 282: off-axis microscope, 2
10: air conditioner room, 213: filter box, 214:
Booth 217: Blower, g: Air filter, cf: Chemical adsorption filter, oa: Outside air introduction port, ra: Return port, 321: Main body CPU, 330: Console, 33
1: console CPU, 332: external memory,

Claims (5)

[Claims] 1. A semiconductor manufacturing apparatus that operates according to a large number of operating parameters, and a partial processing of the lot processing necessary for the semiconductor manufacturing apparatus to execute a predetermined lot processing, and operating parameters used in the lot processing. The semiconductor manufacturing apparatus is provided with operating parameters for changing the reticle and a queue table for reserving the reticle when the reticle is used in the lot processing. 2. The queue table is provided with means for starting an operation of the next lot by an operator intervention at a lot break and means for automatically starting the processing of the next lot without operator intervention. Claim 1 characterized by the above.
The semiconductor manufacturing apparatus described. 3. In the queue table, if a partial process reserved in the table is before the start of a lot process including the partial process, the reservation is deleted from the table or the order of execution by the reservation is changed. Means for adding a reservation for the partial processing of the lot before the start of the lot processing to the table, and whether the lot including the reserved partial processing is a processed lot or is currently being processed, 3. The semiconductor manufacturing apparatus according to claim 1, further comprising: a unit for determining whether the lot is a process waiting queue. 4. The means for deleting the reservation, the means for changing the reservation order, the means for adding the reservation, and the means for determining the processing status of the lot processing to which the reserved partial processing belongs are provided in the manufacturing apparatus. 4. The semiconductor manufacturing apparatus according to claim 1, wherein the semiconductor manufacturing apparatus is operated by both a console screen and a host computer that integrally controls a plurality of semiconductor manufacturing apparatuses including the manufacturing apparatus. 5. In a method of manufacturing a device using a device manufacturing apparatus that operates according to a large number of operating parameters, a partial processing of the lot processing necessary for executing a predetermined lot processing in the semiconductor manufacturing apparatus, If you want to change the operation parameters used in lot processing, create a queue table to reserve the operation parameters and the reticle if you use the reticle in the lot processing, and reserve the partial processing in the table. Performs one or more lot processes by executing in the specified order, and adds, deletes, or changes the reservation order of all or some of the partial processes that belong to the lot process before execution. When you add, delete or change the reservation order, A device manufacturing method characterized by executing a partial process.