JPH08151599A - Composition for finish washing and method for finish washing - Google Patents

Composition for finish washing and method for finish washing

Info

Publication number
JPH08151599A
JPH08151599A JP29634594A JP29634594A JPH08151599A JP H08151599 A JPH08151599 A JP H08151599A JP 29634594 A JP29634594 A JP 29634594A JP 29634594 A JP29634594 A JP 29634594A JP H08151599 A JPH08151599 A JP H08151599A
Authority
JP
Japan
Prior art keywords
hexamethyldisiloxane
cleaning
composition
dodecamethylpentasiloxane
boiling point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29634594A
Other languages
Japanese (ja)
Inventor
Michio Shirai
道雄 白井
雅道 ▲ひじ▼野
Masamichi Hijino
Kazuhisa Karaki
和久 唐木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP29634594A priority Critical patent/JPH08151599A/en
Publication of JPH08151599A publication Critical patent/JPH08151599A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)

Abstract

PURPOSE: To obtain the subject composition, containing hexamethyldisiloxane of controlled purity as one of principal components, excellent in safety, permeability and drying properties without any corrosiveness for materials, capable of providing clean surfaces without any stains, residues, etc., after drying and useful for cleaning optical elements, electronic parts, etc. CONSTITUTION: This composition contains hexamethyldisiloxane as one of principal, components and has <50ppm content of dodecamethylpentasiloxane without substantially containing a compound having a higher boiling point than that of the dodecamethylpentasiloxane. For example, hexamethyldisiloxane commercially available for general industrial uses is distilled and purified with a still having 30 theoretical plate number to provide the purified hexamethyldisiloxane. The resultant purified hexamethyldisiloxane in an amount of 63.3-64.3 pts.wt. is stirred and mixed with 35.7-36.7 pts.wt. first class grade reagent ethanol to afford 100 pts.wt. composition.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガラスレンズ、プラス
チック部品等の光学素子やモールド部品、金属部品、セ
ラミック部品、電子部品等の手拭き洗浄や最終仕上げ洗
浄に用いることにより、シミ、残渣等がなく清浄な表面
とすることが可能な仕上げ洗浄組成物および仕上げ洗浄
方法に関する。特に、本発明はフロンの使用を不要とし
た仕上げ洗浄組成物および仕上げ洗浄方法に関する。
BACKGROUND OF THE INVENTION The present invention can be applied to optical elements such as glass lenses and plastic parts, mold parts, metal parts, ceramic parts, electronic parts and the like for hand-wiping cleaning and final finishing cleaning so that stains, residues, etc. TECHNICAL FIELD The present invention relates to a finish cleaning composition and a finish cleaning method, which can provide a clean surface without scratches. In particular, the present invention relates to a finish cleaning composition and a finish cleaning method that do not require the use of CFCs.

【0002】[0002]

【従来の技術】一般に光学素子やモールド部品は製造後
に指紋やゴミ・ほこりなどを除去する最終仕上げ洗浄と
して、溶剤を染み込ませた綿紙や布等によりを用いた手
拭きによる簡易洗浄を行っている。一方、光学素子、電
気部品や電子部品等の工業用部品は、精密洗浄を行うと
ともに、この精密洗浄後に、乾燥用溶剤を使用した乾燥
を行っている。このような洗浄や乾燥の処理に用いる溶
剤としては、従来より1,1,2−トリクロロ−1,
2,2−トリフルオロエタン(フロン113)が使用さ
れている。このフロン113は不燃性で、生体に対する
毒性が小さく、乾燥速度が早いという特徴を有し、加え
てプラスチック、ゴム等の高分子材料を侵食しないが油
脂等を溶解するという選択的溶解特性を有しているとこ
ろから、広く工業用の洗浄乾燥溶剤として用いられてき
た。一方、フロン113の使用量削減や脱脂能力工場の
ため数多くの混合溶剤や共沸組成物が開発されている。
たとえば、特開昭59−17328号公報には、フロン
113とトリクロロエタンとジクロロメタンとを混合し
た溶剤が脱脂に有効であると記載されている。また、特
開平1−318094号公報には、フロン113とイソ
プロピルアルコールとメチルエチルケトンとを混合した
溶剤が記載され、特開平2−289693号公報には、
ジクロロテトラフルオロプロパン(フロン234)とエ
タノール等の脱脂族低級アルコールとの共沸組成物が記
載されている。さらに、イソプロピルアルコールやエタ
ノール等の脂肪族低級アルコール系、アセトン等のケト
ン系、エーテル系を用いることが検討されている。
2. Description of the Related Art Generally, optical elements and molded parts are subjected to simple cleaning by hand-wiping with a solvent-impregnated cotton paper or cloth as a final finishing cleaning for removing fingerprints, dust, and the like after manufacturing. On the other hand, industrial parts such as optical elements, electric parts, and electronic parts are subjected to precision cleaning, and after this precision cleaning, they are dried using a drying solvent. As a solvent used for such washing and drying treatment, 1,1,2-trichloro-1,
2,2-trifluoroethane (Freon 113) is used. The chlorofluorocarbon 113 is non-flammable, has low toxicity to living organisms, and has a fast drying rate. In addition, it has a selective dissolution characteristic that it does not corrode polymer materials such as plastic and rubber but dissolves fats and oils. Therefore, it has been widely used as an industrial washing and drying solvent. On the other hand, a large number of mixed solvents and azeotropic compositions have been developed to reduce the amount of CFC 113 used and to degrease factories.
For example, JP-A-59-17328 describes that a solvent obtained by mixing Freon 113, trichloroethane and dichloromethane is effective for degreasing. Further, JP-A 1-318094 discloses a solvent in which CFC 113, isopropyl alcohol and methyl ethyl ketone are mixed, and JP-A-2-289693 discloses.
An azeotropic composition of dichlorotetrafluoropropane (CFC 234) and a defatted lower alcohol such as ethanol is described. Furthermore, the use of aliphatic lower alcohols such as isopropyl alcohol and ethanol, ketones such as acetone, and ethers has been studied.

【0003】[0003]

【発明が解決しようとする課題】ところが、フロン11
3等のパーハロエタンは、化学的に特に安定であるた
め、対流圏内での寿命が長く、拡散して成層圏に達し、
ここで太陽光線により分解してハロゲンラジカルを発生
する。このハロゲンラジカルがオゾン層のオゾンと連鎖
反応を起こし、オゾン層を破壊することから、これらの
使用削減が必要となっている。このため、記述のように
フロン113とパーハロエタン以外の有機溶剤との混合
溶剤を開発することにより、その使用量の削減を図って
いるが、フロン113を必須とするため、その使用量を
ある程度以上削減することができない問題がある。また
記述のように、フロン113に比較してオゾン層の破壊
性が比較的小さいフロン234との混合溶剤も開発され
ているが、オゾン層の破壊を完全になくすことはできな
い。一方、脂肪族低級アルコール系、ケトン系、エーテ
ル系を使用した混合溶剤は、生体への毒性が大きな化合
物が多いため、使用時における作業者の健康への悪影響
が問題となる。
However, the CFC 11
Since perhaloethanes such as 3 are chemically stable, they have a long life in the troposphere and diffuse to reach the stratosphere.
Here, it is decomposed by sunlight to generate halogen radicals. This halogen radical causes a chain reaction with ozone in the ozone layer and destroys the ozone layer, so that it is necessary to reduce the use of these. Therefore, as described above, we are trying to reduce the usage amount by developing a mixed solvent of CFC 113 and an organic solvent other than perhaloethane, but since CFC 113 is essential, the usage amount is above a certain level. There is a problem that cannot be reduced. Further, as described above, a mixed solvent with CFCs 234, which has a relatively low ozone layer destructiveness as compared with CFC 113, has been developed, but the destruction of the ozone layer cannot be completely eliminated. On the other hand, a mixed solvent using an aliphatic lower alcohol type, a ketone type, or an ether type has many compounds that are highly toxic to the living body, and therefore has a problem of adversely affecting the health of workers during use.

【0004】また、上記のようにフロンの代替溶剤やア
ルコール等の有機溶剤を仕上げ洗浄、精密洗浄に適用す
る場合において、特に厳しく純度管理されていない有機
溶剤は、揮発性の悪い高沸点分が含有されていることが
多く、この高沸点分が洗浄適用に残留して、乾燥後にシ
ミ等が発生する。このため厳しく純度管理されていない
有機溶剤を仕上げ洗浄には使用できなかった。
In addition, when an organic solvent such as a CFC alternative solvent or an alcohol is applied to finish cleaning and precision cleaning as described above, an organic solvent that is not strictly controlled in purity has a high boiling point component with poor volatility. It is often contained, and the high boiling point remains in the cleaning application, causing spots and the like after drying. Therefore, an organic solvent whose purity is not strictly controlled cannot be used for finish cleaning.

【0005】本発明は、上記事情を考慮してなされたも
のであり、、オゾン層を破壊することなく、生体への安
全性に優れ、最終仕上げ洗浄に用いることができる仕上
げ洗浄用組成物および仕上げ洗浄方法を提供することを
目的とする。また、本発明は上述した特性を有するとと
もに、洗浄性や乾燥性にも優れ、特に高度な洗浄表面が
必要な各種工業部品の手拭きによる仕上げ洗浄さらには
乾燥に好適に使用することが可能な仕上げ洗浄用組成物
および仕上げ洗浄方法を提供することを目的とする。
The present invention has been made in consideration of the above circumstances, and is a composition for finish cleaning, which is excellent in safety to living organisms without destroying the ozone layer and can be used for final finish cleaning, and An object is to provide a finish cleaning method. In addition, the present invention has the above-mentioned characteristics, and also has excellent cleaning properties and drying properties, and particularly finishing cleaning by hand-wiping of various industrial parts that require a highly cleaned surface and further finishing that can be suitably used for drying It is an object to provide a cleaning composition and a finishing cleaning method.

【0006】[0006]

【課題を解決するための手段および作用】本発明の仕上
げ洗浄用組成物は、ヘキサメチルジシロキサンを主成分
とし、ドデカメチルペンタシロキサンの含有量が50p
pm未満であり、ドデカメチルペンタシロキサンよりも
高沸点化合物を実質的に含有しないものである。また、
本発明の方法は、ヘキサメチルジシロキサンを主成分と
し、ドデカメチルペンタシロキサンの含有量が50pp
m未満であり、ドデカメチルペンタシロキサンよりも高
沸点化合物を実質的に含有しない洗浄用組成物に被洗浄
物を浸漬し、洗浄後に引き上げるものである。さらに本
発明の方法は、上述した洗浄よう組成物を手拭き洗浄用
布、手拭き洗浄用紙等の手拭き用具に浸み込ませて、被
洗浄物を拭き上げるものである。ここで、実質的に含有
しない状態とはガスクロマトグラフィーにおいて、検出
されない程度の濃度を示している。
The finish cleaning composition of the present invention comprises hexamethyldisiloxane as a main component and a dodecamethylpentasiloxane content of 50 p.
It is less than pm and does not substantially contain a high boiling point compound than dodecamethylpentasiloxane. Also,
The method of the present invention comprises hexamethyldisiloxane as a main component and a dodecamethylpentasiloxane content of 50 pp.
It is less than m, and the object to be cleaned is immersed in a cleaning composition that does not substantially contain a high boiling point compound than dodecamethylpentasiloxane, and after cleaning, it is pulled up. Furthermore, in the method of the present invention, the above-mentioned cleaning composition is soaked in a hand-wiping tool such as a hand-wiping cleaning cloth or a hand-wiping cleaning paper, and the object to be cleaned is wiped up. Here, the state of “substantially not containing” means a concentration that is not detected in gas chromatography.

【0007】一般に、シロキサン化合物は、生体不活性
な物質であることが知られており、本発明で用いるヘキ
サメチルジシロキサンもシロキサン化合物であるところ
から、同様に生体に対して不活性である。このため、人
体に対し、ほとんど毒性を示すことがなく、高い安全性
を有している。また、このヘキサメチルジシロキサン
は、プラスチック、ゴム、金属、ガラス、セラミックス
等の固体の素材に対し、ほとんど影響を与えることがな
く、洗浄に適用しても素材を損傷することがない。表1
は各種素材の試験片(サイズ5×50×2mm、表面は
鏡面仕上げ)をヘキサメチルジシロキサン200ccに
常温で2時間浸漬した結果を示す。評価の「○」は、重
量変化1%未満を示している。また、表1における浸漬
2時間後の各試験片の実体顕微鏡による目視観察では、
浸漬前と変化はなく、くもり、クラック、変色等は観察
されなかった。
Generally, siloxane compounds are known to be inactive substances in the living body, and since hexamethyldisiloxane used in the present invention is also a siloxane compound, it is similarly inactive to living organisms. Therefore, it is highly safe with almost no toxicity to the human body. Further, this hexamethyldisiloxane has almost no effect on solid materials such as plastics, rubbers, metals, glasses, and ceramics, and even if applied to cleaning, the materials are not damaged. Table 1
Shows the results of immersing test pieces of various materials (size 5 × 50 × 2 mm, the surface of which is mirror finished) in 200 cc of hexamethyldisiloxane at room temperature for 2 hours. "○" in the evaluation indicates a weight change of less than 1%. Further, in the visual observation of each test piece 2 hours after immersion in Table 1 by a stereoscopic microscope,
There was no change from before immersion, and no haze, cracks, discoloration, etc. were observed.

【0008】[0008]

【表1】 [Table 1]

【0009】また、ヘキサメチルジジロキサンは切削油
や手脂などの油脂類に対して、溶解性を示すため、被洗
浄物に付着した汚れである油脂類に対しては、溶解によ
る洗浄作用が得られる。しかもヘキサメチルジシロキサ
ンは、表面張力が約16dyne/cm程度と低く、粘度が
0.65cStと低いため浸透性が高く、狭い隙間など
の浸透性が要求される部位への洗浄にも適用できる。ま
た、ヘキサメチルジシロキサンは、沸点が100℃、蒸
発潜熱が約40cal/g程度と低く、揮発性が高いた
め、ワイパー紙に浸み込ませて行う手拭き洗浄後や浸漬
洗浄後に速やかに乾燥を行うことができる。本発明の仕
上げ洗浄用組成物に用いるヘキサメチルジシロキサン
は、蒸留・精留および/または活性炭等による吸着等の
精製処理によって、ドデカメチルペンタシロキサン等の
揮発性の悪い化合物を除去したものである。すなわち揮
発性の悪いドデカメチルペンタシロキサンの含有量を5
0ppm未満とし、ドデカメチルペンタシロキサンより
も高沸点の物質を実質的に含んでいない高純度であり、
このため、洗浄の後の常温における乾燥でも被洗浄物の
表面に残留する成分がないためシミ、残渣等がない高精
度な清浄表面を得ることが可能となる。
Hexamethyldidyloxane is soluble in oils and fats such as cutting oils and hand oils, and therefore has a cleaning action by dissolution on oils and fats which are stains adhering to the object to be washed. Is obtained. In addition, hexamethyldisiloxane has a low surface tension of about 16 dyne / cm and a low viscosity of 0.65 cSt, so it has high permeability, and can be applied to cleaning even a portion requiring permeability such as a narrow gap. Hexamethyldisiloxane has a low boiling point of 100 ° C and a latent heat of vaporization of about 40 cal / g, and is highly volatile. It can be carried out. The hexamethyldisiloxane used in the final cleaning composition of the present invention is one in which a compound having poor volatility such as dodecamethylpentasiloxane is removed by a purification treatment such as distillation / rectification and / or adsorption with activated carbon. . That is, the content of dodecamethylpentasiloxane, which has poor volatility, should be 5
It has a high purity of less than 0 ppm and substantially does not contain a substance having a boiling point higher than that of dodecamethylpentasiloxane.
For this reason, even after drying at room temperature after cleaning, there is no component remaining on the surface of the object to be cleaned, so that it is possible to obtain a highly accurate clean surface free from stains and residues.

【0010】以下に、微量に含有される揮発性の悪い成
分が仕上げ洗浄後の仕上げ状態にどのように影響を及ぼ
すかを示す。理論段数30段以上の高精度の蒸留装置に
より得られた純度99.999%以上のヘキサメチルジ
シロキサンにドデカメチルペンタシロキサンを0.00
1重量%ずつ加え、各濃度の溶液に清浄なシミが付着し
たスライドガラスを浸漬・引き上げ後、常温で乾燥させ
て直ちに双眼実体顕微鏡による表面観察および呼気をか
けたときの曇り状態からシミ・残渣の評価を行う呼気試
験を実施した。この結果を表2に示す。評価は、各評価
法でシミ・残渣が認められないものを「○」、僅かに認
められるものを「△」、ハッキリと認められるものを
「×」とした。
The following will show how a trace amount of poorly volatile components affect the finish state after finish cleaning. 0.003% of dodecamethylpentasiloxane was added to hexamethyldisiloxane having a purity of 99.999% or more obtained by a highly accurate distillation apparatus having a theoretical plate number of 30 or more.
Add 1% by weight each, soak and pull up the slide glass with clean stains on each concentration solution, dry it at room temperature and immediately observe the surface with a binocular stereomicroscope. The exhalation test which evaluates was carried out. The results are shown in Table 2. In the evaluation, in each evaluation method, no stains / residues were observed, “◯”, slightly recognized stains were evaluated as “Δ”, and clear ones were evaluated as “×”.

【0011】[0011]

【表2】 [Table 2]

【0012】また、ドデカメチルペンタシロキサンより
も高沸点であるテトラデカヘキサシロキサンの濃度を同
様の手順で変化させたときの結果を表3に示す。この結
果から、ドデカメチルペンタシロキサンの濃度が50p
pm以上になると僅かにシミ・残渣の発生が見られはじ
め、ドデカメチルペンタシロキサンよりも高沸点である
テトラデカメチルヘキサシロキサン等が微量でも含有さ
れると、シミ・残渣の発生が見られた。このことからシ
ミ・残渣がない清浄な表面を得るには、ドデカメチルペ
ンタシロキサンの濃度が50ppm未満で、これより高
沸点の成分が含有されないことが必要であることが判
る。
Table 3 shows the results when the concentration of tetradecahexasiloxane, which has a higher boiling point than dodecamethylpentasiloxane, was changed by the same procedure. From this result, the concentration of dodecamethylpentasiloxane was 50p.
The generation of spots / residues started to be slightly observed at pm or more, and the formation of spots / residues was observed when a small amount of tetradecamethylhexasiloxane having a higher boiling point than dodecamethylpentasiloxane was contained. This shows that in order to obtain a clean surface free from stains and residues, the concentration of dodecamethylpentasiloxane should be less than 50 ppm, and components having a boiling point higher than this should not be contained.

【0013】[0013]

【表3】 [Table 3]

【0014】以上述べたように、本発明の仕上げ洗浄用
組成物は、人体に対して安全性が高く、プラスチック、
金属、ガラス、セラミックス等各種素材に対し、ほとん
ど影響を与えることなく洗浄を行うことができ、優れた
浸透性、乾燥性を有しており、乾燥後はシミ・残渣等が
ない高精度な洗浄表面を得ることが可能となる。
As described above, the finish cleaning composition of the present invention is highly safe for the human body and is made of plastic,
It can wash various materials such as metal, glass and ceramics with almost no effect, has excellent penetrability and dryness, and has high precision washing without stains and residues after drying. It becomes possible to obtain the surface.

【0015】[0015]

【実施例1】ガラス研削加工油(ユシロ化学(社)製、
商品名ユシロンCG)が付着した芯取り加工後の20m
m直径のガラスレンズ(オハラ(社)製硝材FSL5)
を図1に示した洗浄工程により洗浄時間3分/各槽で洗
浄し、最後にヘキサメチルジシロキサンに浸透後、引き
上げて常温で乾燥を行った。ここで、水系洗浄剤には、
ノニオン系界面活性剤を主成分とした商品名EE−11
10(オリンパス光学工業(社)製)を16倍希釈した
ものおよびアルカリ性水系洗浄剤、商品名EE−112
0(オリンパス光学工業(社)製)を32倍希釈したも
のを使用し、純水は電気抵抗が1MΩ程度のものを使用
した。また、水置換を行う2−プロパノール(IPA)
は、一般工業グレードのものを使用した。ここで用いた
ヘキサメチルジシロキサンは、工業用に市販されている
ものを高精度な蒸留機により蒸留精製したものを使用し
た。この蒸留精製されたヘキサメチルジシロキサンをガ
スクロマトグラフィーにより分析したところ、純度が9
8.7%であり、ドデカメチルペンタシロキサンの含有
率は、48ppmであった。また、ガスクロマトグラフ
ィによる分析では、ドデカメチルペンタシロキサンより
もリテンションタイムが大きい成分の検出はなかった。
また、ドデカメチルペンタシロキサンの含有率は、n−
ラトラデカンによる内部標準法により求めた。ここでの
ガスクロマトグラフィーの条件は、ガスクロマトグラフ
ィー本体に商品名GC14B(島津製作所(社)製)、
カラムにOV−1相当のキャピラリカラム、検出器にF
IDを用い、注入部温度210℃、検出部温度230
℃、カラム温度を50℃より200℃まで10℃/分の
昇温で行った。
[Example 1] Glass grinding processing oil (manufactured by Yushiro Chemical Co., Ltd.,
20m after centering with the product name Yusilon CG)
m-diameter glass lens (glass material FSL5 made by OHARA CORPORATION)
Was washed in each tank by the washing process shown in FIG. 1 for 3 minutes / finally, after finally permeating into hexamethyldisiloxane, it was pulled up and dried at room temperature. Here, in the water-based cleaning agent,
Product name EE-11 containing nonionic surfactant as main component
10 (manufactured by Olympus Optical Co., Ltd.) diluted 16 times and an alkaline water-based detergent, trade name EE-112
0 (manufactured by Olympus Optical Co., Ltd.) was diluted 32 times, and pure water having an electric resistance of about 1 MΩ was used. Also, 2-propanol (IPA) for water replacement
Used a general industrial grade. The hexamethyldisiloxane used here was obtained by distilling and refining a commercially available product for industrial use with a highly accurate distillation machine. When this distillation-purified hexamethyldisiloxane was analyzed by gas chromatography, the purity was found to be 9
It was 8.7%, and the content rate of dodecamethylpentasiloxane was 48 ppm. In addition, the analysis by gas chromatography did not detect a component having a longer retention time than dodecamethylpentasiloxane.
The content of dodecamethylpentasiloxane is n-
It was determined by the internal standard method using ratradecane. The conditions of the gas chromatography here are that the gas chromatography body has a product name of GC14B (manufactured by Shimadzu Corporation),
The column is a capillary column equivalent to OV-1, and the detector is F
Using ID, injection part temperature 210 ℃, detection part temperature 230
The column temperature was increased from 50 ° C to 200 ° C at a temperature increase of 10 ° C / min.

【0016】この洗浄で洗浄されたガラスレンズ100
個を呼気試験および光学薄膜蒸着後の目視試験により評
価したところ、シミ、残渣はみられなかった。同様の洗
浄工程で、ヘキサメチルジシロキサン中のドデカメチル
ペンタシロキサンの含有率が75ppmのものを使用し
たところ、呼気試験および目視試験でわずかにシミの発
生がみられ、充分清浄な洗浄結果が得られなかった。
The glass lens 100 washed by this washing
When the individual pieces were evaluated by the breath test and the visual test after the optical thin film deposition, no spots or residues were found. In the same washing process, when the content of dodecamethylpentasiloxane in hexamethyldisiloxane was 75 ppm, slight spots were found in the breath test and the visual test, and a sufficiently clean washing result was obtained. I couldn't do it.

【0017】[0017]

【実施例2】実施例1で蒸留精製したヘキサメチルジシ
ロキサンを無塵ワイパー紙(旭化成(社)製、商品名ベ
ンコット)に浸み込ませて、PMMA(ポリメチルメタ
クリレート)製の透明板を1回擦るようにして手拭き洗
浄を行った。PMMA製透明板には、手脂による指紋後
が付着していたが手拭きの結果、透明板上の指紋跡は除
去されて洗浄表面が得られた。
EXAMPLE 2 Hexamethyldisiloxane distilled and purified in Example 1 is soaked in dust-free wiper paper (Bencot, trade name, manufactured by Asahi Kasei Corp.) to form a transparent plate made of PMMA (polymethylmethacrylate). It was rubbed once and washed by hand. The PMMA transparent plate was adhered after fingerprints by hand oil, but as a result of hand-wiping, fingerprint marks on the transparent plate were removed and a cleaned surface was obtained.

【0018】[0018]

【実施例3】一般工業用に市販されているヘキサメチル
ジシロキサンを理論段数約30段の蒸留器により蒸留精
製し、純度が99.0%であり、ドデカメチルペンタシ
ロキサンの含有量が37ppm、ドデカメチルペンタシ
ロキサンよりも高沸点成分が検出されないヘキサメチル
ジシロキサンを得た。この精製したヘキサメチルジシロ
キサン63.5重量部と試薬1級のエタノール(純度9
9.5%以上)36.5重量部とを攪拌・混合して、ヘ
キサメチルジシロキサンを主成分とする混合組成物を得
た。これを実施例2と同様にして無塵ワイパー紙に浸み
込ませて、ガラスフィラー入りポリカーボネート製のコ
ンパクトカメラボディーへの手拭き洗浄を行った。この
結果、表面にシミはなく清浄な表面が得られた。
Example 3 Hexamethyldisiloxane commercially available for general industry was purified by distillation using a distiller having about 30 theoretical plates, the purity was 99.0%, the content of dodecamethylpentasiloxane was 37 ppm, Hexamethyldisiloxane was obtained in which a higher boiling point component than dodecamethylpentasiloxane was not detected. 63.5 parts by weight of this purified hexamethyldisiloxane and ethanol of a first grade reagent (purity 9
9.5% or more) and 36.5 parts by weight were stirred and mixed to obtain a mixed composition containing hexamethyldisiloxane as a main component. This was impregnated with dust-free wiper paper in the same manner as in Example 2, and the compact camera body made of polycarbonate containing glass filler was hand-washed. As a result, a clean surface was obtained without stains on the surface.

【0019】また、このヘキサメチルジジロキサンとエ
タノールの組成物は、上述の配合比率で共沸状態とな
り、沸点71.4℃と単独組成の場合よりも低沸点とな
って、より乾燥性の向上がみられた。ヘキサメチルジシ
ロキサン63.3〜64.3重量%、エタノール35.
7〜36.7重量%の範囲では、71.4℃の沸点が観
測され、この配合比の範囲で共沸状態となり、沸点の低
下および組成比の安定化が得られた。この結果、この共
沸状態の混合物を仕上げ手拭き洗浄液として用いること
により、より良好な乾燥性および洗浄性の安定が得られ
る。
Further, the composition of hexamethyldidyloxane and ethanol is in an azeotropic state at the above-mentioned mixing ratio and has a boiling point of 71.4 ° C., which is lower than that of the single composition, and is more dry. There was an improvement. Hexamethyldisiloxane 63.3-64.3% by weight, ethanol 35.
A boiling point of 71.4 ° C. was observed in the range of 7 to 36.7% by weight, and an azeotropic state was achieved in the range of this compounding ratio, and the boiling point was lowered and the composition ratio was stabilized. As a result, by using this mixture in the azeotropic state as the finishing hand-wiping cleaning liquid, better stability of drying property and cleaning property can be obtained.

【0020】また、ヘキサメチルジシロキサンとエタノ
ールの混合系では、ヘキサメチルジシロキサンが35重
量%以上、99重量%以下の範囲で沸点が72.4〜7
2.2℃となり、洗浄液としてのより良い乾燥性を示
し、ヘキサメチルジシロキサンが55〜70重量%の範
囲で蒸留した場合の組成の変化が5重量%以内となるこ
とから、この範囲の混合比の組成物では洗浄性能の安定
性が得られる。また、本実施例で用いたヘキサメチルジ
シロキサンとエタノールとの混合組成物に80ppmの
含有量となるようにドデカメチルペンタシロキサンを添
加し、同様の洗浄を行ったところ、10個中の5個にわ
ずかにシミの発生がみられた。
Further, in the mixed system of hexamethyldisiloxane and ethanol, the boiling point is 72.4 to 7 in the range of 35% by weight or more and 99% by weight or less of hexamethyldisiloxane.
It becomes 2.2 ° C., which shows better drying property as a cleaning solution, and the composition change when hexamethyldisiloxane is distilled in the range of 55 to 70% by weight is within 5% by weight. Stability of cleaning performance is obtained with the ratio composition. Further, dodecamethylpentasiloxane was added to the mixed composition of hexamethyldisiloxane and ethanol used in this example so that the content thereof was 80 ppm, and the same washing was performed. A slight stain was observed on the surface.

【0021】[0021]

【実施例4】実施例3で精製したヘキサメチルジシロキ
サン59.1重量部と試薬1級のメタノール(純度9
9.5%以上)40.9重量部とを攪拌・混合して、ヘ
キサメチルジシロキサンを主成分とする混合系の手拭き
仕上げ洗浄用組成物を得た。これを実施例2と同様にし
て、無塵ワイパー紙に浸み込ませて、アルミニウム製カ
メラレンズ鏡筒への手拭き洗浄を行った。この結果、表
面にシミはなく清浄な表面が得られた。
Example 4 59.1 parts by weight of hexamethyldisiloxane purified in Example 3 and reagent grade 1 methanol (purity 9
9.5% or more) and 40.9 parts by weight were stirred and mixed to obtain a mixed-type hand-cleaning cleaning composition containing hexamethyldisiloxane as a main component. This was impregnated with dust-free wiper paper in the same manner as in Example 2, and the aluminum camera lens barrel was washed by hand wiping. As a result, a clean surface was obtained without stains on the surface.

【0022】また、このヘキサメチルジシロキサンとメ
タノールの組成物は、上述した配合比率で共沸状態とな
り、沸点58.7℃と単独組成の場合よりも低沸点とな
って、より乾燥性の向上がみられた。ヘキサメチルジシ
ロキサン58.9〜59.3重量%、メタノール40.
7〜41.1重量%の範囲では、58.7℃の沸点が観
測され、この配合比の範囲で共沸状態となり、沸点の低
下および組成比の安定化が得られた。この共沸状態の混
合物を仕上げ手拭き洗浄液として用いることにより、よ
り良好な乾燥性および洗浄性の安定が得られる。ヘキサ
メチルジシロキサンとメタノールの混合系においては、
ヘキサメチルジシロキサンが30〜95重量%の範囲で
も沸点が単体組成の場合よりも低くなり、洗浄液として
より良い乾燥性を示す。従って、上述した混合比率範囲
の組成物を仕上げ洗浄に適用することにより、良好な乾
燥性が得られる。
Further, the composition of hexamethyldisiloxane and methanol is in an azeotropic state at the above-mentioned blending ratio, and has a boiling point of 58.7 ° C., which is lower than that of a single composition, so that the drying property is further improved. Was seen. Hexamethyldisiloxane 58.9-59.3% by weight, methanol 40.
A boiling point of 58.7 ° C. was observed in the range of 7 to 41.1% by weight, and an azeotropic state was achieved in the range of this compounding ratio, and the boiling point was lowered and the composition ratio was stabilized. By using this mixture in the azeotropic state as the finishing hand-wiping cleaning liquid, better drying property and stable cleaning property can be obtained. In the mixed system of hexamethyldisiloxane and methanol,
Even in the range of 30 to 95% by weight of hexamethyldisiloxane, the boiling point is lower than that of the simple substance composition, and the drying property as a cleaning liquid is better. Therefore, by applying the composition in the mixing ratio range described above to the finish cleaning, good drying property can be obtained.

【0023】[0023]

【実施例5】実施例3で精製したヘキサメチルジシロキ
サン54.3重量部と試薬1級の2−プロパノール(純
度99.5%以上)45.7重量部とを攪拌・混合して
ヘキサメチルジシロキサンを主成分とする混合系の手拭
き仕上げ洗浄用組成物を得た。これを実施例2と同様に
して無塵ワイパー紙に浸み込ませて、ガラス製光学レン
ズへの手拭き洗浄を行った。この結果、表面にシミはな
く清浄な表面が得られた。
Example 5 Hexamethyl was prepared by stirring and mixing 54.3 parts by weight of hexamethyldisiloxane purified in Example 3 and 45.7 parts by weight of reagent primary 2-propanol (purity 99.5% or more). A mixed-type hand-cleaning finishing cleaning composition containing disiloxane as a main component was obtained. This was soaked in a dust-free wiper paper in the same manner as in Example 2, and the glass optical lens was hand-washed. As a result, a clean surface was obtained without stains on the surface.

【0024】また、このヘキサメチルジシロキサンと2
−プロパノールの組成物は、上述した配合比率で共沸状
態となり、沸点76.4℃と単独組成の場合よりも低沸
点となって、より乾燥性の向上がみられた。ヘキサメチ
ルジシロキサン54.1〜54.5重量%、2−プロパ
ノール45.5〜45.9重量%の範囲では、76.4
℃の沸点が観測され、この配合比の範囲で共沸状態とな
り、沸点の低下および組成比の安定化が得られた。この
状態の混合物を仕上げ手拭き洗浄液として用いることに
より、より良好な乾燥性および洗浄性の安定が得られ
る。ヘキサメチルジシロキサンと2−プロパノールの混
合系では、ヘキサメチルジシロキサンが25〜95重量
%の範囲でも沸点が単体組成の場合よりも低くなり、洗
浄液としてより良い乾燥性を示す。従って、上述した配
合比率範囲の組成物を仕上げ洗浄に適用しても、良好な
乾燥性が得られる。
Further, this hexamethyldisiloxane and 2
The propanol composition was in the azeotropic state at the above-mentioned blending ratio and had a boiling point of 76.4 ° C., which was a lower boiling point than in the case of the single composition, and the drying property was further improved. Hexamethyldisiloxane 54.1 to 54.5% by weight, 2-propanol 45.5 to 45.9% by weight in the range of 76.4
A boiling point of ℃ was observed, and an azeotropic state was achieved in the range of this mixing ratio, and the boiling point was lowered and the composition ratio was stabilized. By using the mixture in this state as the finishing hand-wiping cleaning liquid, better drying property and stable cleaning property can be obtained. In the mixed system of hexamethyldisiloxane and 2-propanol, the boiling point becomes lower than that of the simple substance composition even in the range of 25 to 95% by weight of hexamethyldisiloxane, and the drying property as a cleaning liquid is better. Therefore, even if the composition in the above-mentioned blending ratio range is applied to finish cleaning, good drying property can be obtained.

【0025】[0025]

【発明の効果】本発明の仕上げ洗浄用組成物は、人体に
対して安全性が高く、プラスチック、金属、ガラス、セ
ラミックス等各種素材に対し、ほとんど影響を与えるこ
となく洗浄を行うことができ、優れた浸透性、乾燥性を
有しており、乾燥後にはシミ・残渣等がない高精度な清
浄表面を得ることが可能である。
EFFECTS OF THE INVENTION The finish cleaning composition of the present invention is highly safe for the human body and can be used for cleaning various materials such as plastic, metal, glass and ceramics with almost no effect. It has excellent penetrability and dryness, and it is possible to obtain a highly accurate clean surface without stains and residues after drying.

【0026】本発明の仕上げ洗浄方法は、シミ、残渣の
ない洗浄を行うことができる。
The finish cleaning method of the present invention can perform cleaning without stains and residues.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1の洗浄工程のフローチャートである。FIG. 1 is a flowchart of a cleaning process of Example 1.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ヘキサメチルジシロキサンを主成分のひ
とつとし、ドデカメチルペンタシロキサンの含有量が5
0ppm未満であり、かつドデカメチルペンタシロキサ
ンよりも高沸点である化合物を実質的に含有しないこと
を特徴とする仕上げ洗浄用組成物。
1. Hexamethyldisiloxane is one of the main components, and the content of dodecamethylpentasiloxane is 5
A finishing cleaning composition, which is substantially free of a compound having a boiling point of less than 0 ppm and higher than that of dodecamethylpentasiloxane.
【請求項2】 ヘキサメチルジシロキサンを主成分のひ
とつとし、ドデカメチルペンタシロキサンの含有量が5
0ppm未満であり、かつドデカメチルペンタシロキサ
ンよりも高沸点である化合物を実質的に含有しない仕上
げ洗浄用組成物に被洗浄物を浸漬し、洗浄後に引き上げ
ることを特徴とする仕上げ洗浄方法。
2. Hexamethyldisiloxane as one of the main components, and the content of dodecamethylpentasiloxane is 5
A final cleaning method comprising immersing an object to be cleaned in a composition for final cleaning which does not substantially contain a compound having a boiling point of less than 0 ppm and higher than that of dodecamethylpentasiloxane, and pulling the object after cleaning.
【請求項3】 ヘキサメチルジシロキサンを主成分のひ
とつとし、ドデカメチルペンタシロキサンの含有量が5
0ppm未満であり、かつドデカメチルペンタシロキサ
ンよりも高沸点である化合物を実質的に含有しない仕上
げ洗浄用組成物を実質的に含有しない仕上げ洗浄用組成
物を手拭き用具に浸み込ませ、当該手拭き用具により被
洗浄物を拭き上げることを特徴とする仕上げ洗浄方法。
3. Hexamethyldisiloxane as one of the main components, and the content of dodecamethylpentasiloxane is 5
A finishing cleaning composition substantially free of a compound having a boiling point of less than 0 ppm and a boiling point higher than that of dodecamethylpentasiloxane is soaked in a hand-wiping tool, A finishing cleaning method characterized by wiping up an object to be cleaned with a tool.
JP29634594A 1994-11-30 1994-11-30 Composition for finish washing and method for finish washing Pending JPH08151599A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29634594A JPH08151599A (en) 1994-11-30 1994-11-30 Composition for finish washing and method for finish washing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29634594A JPH08151599A (en) 1994-11-30 1994-11-30 Composition for finish washing and method for finish washing

Publications (1)

Publication Number Publication Date
JPH08151599A true JPH08151599A (en) 1996-06-11

Family

ID=17832353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29634594A Pending JPH08151599A (en) 1994-11-30 1994-11-30 Composition for finish washing and method for finish washing

Country Status (1)

Country Link
JP (1) JPH08151599A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014050700A1 (en) * 2012-09-26 2014-04-03 大日本印刷株式会社 Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014050700A1 (en) * 2012-09-26 2014-04-03 大日本印刷株式会社 Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same
JPWO2014050700A1 (en) * 2012-09-26 2016-08-22 大日本印刷株式会社 Glass regeneration processing method, recycled glass substrate, and photomask blanks and photomasks using the same

Similar Documents

Publication Publication Date Title
US5741367A (en) Method for drying parts using a polyorganosiloxane
KR960006561B1 (en) Cleaning method using azeotropic mixtures of perfluoro-n-hexane with di-isopropyl ehter or isohexane and cleaning apparatus using the same
JPH08117685A (en) Method for two-stage cleaning or dehydration using siloxane azeotropic mixture
KR100272002B1 (en) Cleaning agent, method and equipment
JPH08259995A (en) Solvent composition
US5562945A (en) Method for post-cleaning finishing drying
US5478493A (en) Hexamethyldisiloxane containing azeotropes
US5902412A (en) Method of cleaning/coating a substrate
JPH08151599A (en) Composition for finish washing and method for finish washing
JPH03176433A (en) Azeotropic and pseudoazeotropic composition containing trichlorodifluoroethane as principal component
WO2006038655A1 (en) Azeotrope-like solvent composition and mixed solvent composition
JP2003082390A (en) Detergent composition for lens and prism production step
JPH06122898A (en) Detergent composition and deterging method
JP3272479B2 (en) Finish drying method
JP3194622B2 (en) Azeotropic or azeotrope-like composition and dry liquid
KR970002044B1 (en) Detergent and drying compositions and their method
JP3002261B2 (en) Cleaning agent, cleaning method and cleaning device
JPH081112A (en) Finish cleaning
JPH1135991A (en) Solvent composition
JP3280451B2 (en) Cleaning agent and cleaning method
JPH09302391A (en) Cleansing composition and method for cleaning
JPH06136388A (en) Azeotropic and pseudo-azeotropic composition and detergent
JP2797610B2 (en) Fluorinated chlorinated hydrocarbon-based mixed solvent composition
JPH09302388A (en) Cleansing agent composition and cleaning method
TW202337712A (en) Fluorinated cleaning fluid mixtures

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20020827