JPH08143671A - Photo-curing resin composition - Google Patents

Photo-curing resin composition

Info

Publication number
JPH08143671A
JPH08143671A JP6283662A JP28366294A JPH08143671A JP H08143671 A JPH08143671 A JP H08143671A JP 6283662 A JP6283662 A JP 6283662A JP 28366294 A JP28366294 A JP 28366294A JP H08143671 A JPH08143671 A JP H08143671A
Authority
JP
Japan
Prior art keywords
component
resin composition
alcohol
aromatic tetracarboxylic
photocurable resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6283662A
Other languages
Japanese (ja)
Other versions
JP3422103B2 (en
Inventor
Takeshi Nakato
毅 中藤
Kaoru Kanayama
薫 金山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP28366294A priority Critical patent/JP3422103B2/en
Publication of JPH08143671A publication Critical patent/JPH08143671A/en
Application granted granted Critical
Publication of JP3422103B2 publication Critical patent/JP3422103B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE: To obtain a photo-curing resin composition containing the ester of an aromatic tetracarboxylic acid dianhydride with an alcohol having a double bond, an aliphatic diamine, a photopolymerization initiator and an organic solvent, good in heat resisting properties and processabilities, and used for a coating material, a photoresist, etc. CONSTITUTION: This photo curing resin composition is obtained by blending (A) 100 pts.wt. esterification reaction product of an aromatic tetracarboxylic acid dianhydride (e.g. 4,4'-benzophenonetetracarboxylic acid dianhydride) with an alcohol having a carbon-carbon double bond polymerizable by an activating energy radiation (e.g. 2-hydroxyethylmethacrylate), (B) 1-2mol aliphatic diamine (e.g. hexamethylene diamine) based on the number of moles of the aromatic tetracarboxylic acid in the component (A), (C) 0.1-10 pts.wt. photopolymerization initiator (e.g. 1-phenyl-2-hydroxy-2-methylpropan-1-one) or a photosensitizer and (D) 10-1800 pts.wt. polar solvent (e.g. N,N-dimethylformamide).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、耐熱性、作業性に優れ
た、コーティング剤、接着剤、塗料、積層板、レジス
ト、複合材料に有用な光硬化性耐熱樹脂組成物に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocurable heat-resistant resin composition having excellent heat resistance and workability, which is useful for coating agents, adhesives, paints, laminates, resists and composite materials.

【0002】[0002]

【従来の技術】光硬化性樹脂は、塗料、接着剤、印刷イ
ンキ、ハードコート等に幅広く用いられている。しかし
ながら、従来用いられている樹脂は、耐熱性が低いため
に高温での使用は著しく制限を受けている。一方、耐熱
性の高い光硬化性樹脂として、ポリイミド前駆体である
ポリアミド酸のカルボキシル基に活性エネルギー線によ
り重合可能な炭素−炭素二重結合を有する化合物をイオ
ンあるいは共有結合で導入することにより光硬化性を付
与したポリイミド樹脂(たとえば、特開昭58−120
636号、特開昭63−99235号公報等)が提案さ
れている。
2. Description of the Related Art Photocurable resins are widely used in paints, adhesives, printing inks, hard coats and the like. However, the resins used hitherto have low heat resistance, and therefore their use at high temperatures is significantly limited. On the other hand, as a photocurable resin having high heat resistance, by introducing a compound having a carbon-carbon double bond polymerizable by an active energy ray into a carboxyl group of a polyamic acid as a polyimide precursor by an ionic or covalent bond A curable polyimide resin (for example, JP-A-58-120).
636, JP-A-63-99235 and the like) have been proposed.

【0003】[0003]

【発明が解決しようとする課題】前記公報に示されるポ
リイミド前駆体に光硬化性を付与した樹脂は、耐熱性改
良効果は見られるものの、ポリイミド前駆体を製造する
工程を必要とし、さらに光硬化後イミド化を行うために
200℃以上の高温下で後硬化を行う必要があるという
問題を抱えている。
The resin obtained by imparting a photocurable property to the polyimide precursor disclosed in the above publication requires a step of producing the polyimide precursor, though it has a heat resistance improving effect, and further has a photocurable property. There is a problem that it is necessary to carry out post-curing at a high temperature of 200 ° C. or higher in order to carry out post-imidization.

【0004】本発明は、上記問題点を解決した、耐熱性
および作業性に優れた光硬化性樹脂を与える樹脂組成物
を提供するものである。
The present invention provides a resin composition which solves the above problems and provides a photocurable resin having excellent heat resistance and workability.

【0005】[0005]

【課題を解決するための手段】本発明は、下記(A)〜
(D)成分: (A)成分:芳香族テトラカルボン酸二無水物と活性エ
ネルギー線により重合可能な炭素−炭素二重結合を有す
るアルコールとのエステル化反応生成物 100重量部 (B)成分:脂肪族ジアミン 上記芳香族テトラカルボン酸二無水物のモル数に対して
1〜2モル (C)成分:光重合開始剤あるいは光増感剤 0.1〜10重量部 (D)成分:極性溶媒 10〜1800重量部 が上記割合で配合された光硬化性樹脂組成物を提供する
ものである。
The present invention includes the following (A)-
Component (D): Component (A): Esterification reaction product of aromatic tetracarboxylic dianhydride and alcohol having carbon-carbon double bond polymerizable by active energy rays 100 parts by weight Component (B): Aliphatic diamine 1 to 2 moles relative to the number of moles of the aromatic tetracarboxylic dianhydride (C) component: photopolymerization initiator or photosensitizer 0.1 to 10 parts by weight (D) component: polar solvent The present invention provides a photocurable resin composition containing 10 to 1800 parts by weight in the above proportion.

【0006】本発明の組成物から得られる光硬化性樹脂
は、耐熱性に優れ、また、ポリイミド前駆体を製造する
工程を必要とせず、さらに、光硬化時と同時あるいはそ
の前後に200℃以下の比較的低い温度で硬化を行うこ
とでポリイミドを製造できるため、作業性に優れた光硬
化性樹脂を与える。
The photocurable resin obtained from the composition of the present invention is excellent in heat resistance and does not require a step of producing a polyimide precursor, and further, it is 200 ° C. or lower at the same time as or before and after the photocuring. Since a polyimide can be produced by curing at a relatively low temperature, a photocurable resin having excellent workability is provided.

【0007】本発明に用いられる光硬化性樹脂組成物に
おける(A)成分は、芳香族テトラカルボン酸二無水物
と活性エネルギー線により重合可能な炭素−炭素二重結
合を有するアルコールとを生成物中に酸無水物由来のカ
ルボン酸基が残存するような条件でエステル化反応させ
ることにより得られる化合物である。エステル化反応生
成物としては芳香族テトラカルボン酸二無水物1モルに
対し、活性エネルギー線により重合可能な炭素−炭素二
重結合を有するアルコール2モルが反応して、分子内に
エステル結合を有し、かつ、残余のカルボン酸基を有す
る化合物、即ち、分子内に2個のハーフエステル体を有
する生成物が好ましい。用いられる芳香族テトラカルボ
ン酸二無水物としては、ピロメリット酸二無水物、ビフ
ェニルテトラカルボン酸二無水物、3,3’,4,4’
−ベンゾフェノンテトラカルボン酸二無水物等が挙げら
れる。また、使用にあたっては、1種類または2種類以
上の混合物でもよい。
The component (A) in the photocurable resin composition used in the present invention is a product of an aromatic tetracarboxylic dianhydride and an alcohol having a carbon-carbon double bond polymerizable by an active energy ray. It is a compound obtained by carrying out an esterification reaction under conditions such that a carboxylic acid group derived from an acid anhydride remains therein. As the esterification reaction product, 1 mol of an aromatic tetracarboxylic dianhydride is reacted with 2 mol of an alcohol having a carbon-carbon double bond which can be polymerized by an active energy ray to form an ester bond in the molecule. And a compound having a residual carboxylic acid group, that is, a product having two half-esters in the molecule is preferable. Examples of the aromatic tetracarboxylic dianhydride used include pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4 ′
-Benzophenone tetracarboxylic dianhydride and the like. In addition, one kind or a mixture of two or more kinds may be used.

【0008】活性エネルギー線により重合可能な炭素−
炭素二重結合を有するアルコールとしては、2−ヒドロ
キシエチルメタクリレート、2−ヒドロキシエチルアク
リレート、2−ヒドロキシプロピルメタクリレート、2
−ヒドロキシプロピルアクリレート、ポリエチレングリ
コール変性メタクリレート、ポリエチレン変性アクリレ
ート、ポリプロピレングリコール変性メタクリレート、
ポリプロピレン変性アクリレート、アリルアルコール等
が挙げられる。これらの中でも2−ヒドロキシエチルメ
タクリレート、アリルアルコールが好ましい。また、使
用にあたっては、1種類でも2種類以上の混合物でもよ
い。
Carbon which can be polymerized by active energy rays
As the alcohol having a carbon double bond, 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl methacrylate, 2
-Hydroxypropyl acrylate, polyethylene glycol modified methacrylate, polyethylene modified acrylate, polypropylene glycol modified methacrylate,
Examples thereof include polypropylene-modified acrylate and allyl alcohol. Among these, 2-hydroxyethyl methacrylate and allyl alcohol are preferable. In addition, in use, one kind or a mixture of two or more kinds may be used.

【0009】芳香族テトラカルボン酸二無水物と活性エ
ネルギー線により重合可能な炭素−炭素二重結合を有す
るアルコールとのエステル化反応は、通常、芳香族テト
ラカルボン酸二無水物1モルに対し、活性エネルギー線
により重合可能な炭素−炭素二重結合を有するアルコー
ルが2〜4モル、好ましくは2〜3モルの過剰量になる
ように配合し、無溶媒または後述する(D)成分の極性
溶媒中、50〜150℃に加熱して10分〜2時間加熱
撹拌することにより行われる。それにより分子内に2個
のハーフエステル体を有する生成物が得られる。(D)
成分の極性溶媒中反応を行う場合、芳香族テトラカルボ
ン酸二無水物100重量部に対して(D)成分の極性溶
媒が10〜1800重量部の濃度で行う。反応条件によ
っては残余のカルボン酸がエステル化されたトリおよび
テトラエステル体も生成するが、それらの割合は得られ
るエステル体の10モル%以下であることが好ましい。
The esterification reaction of an aromatic tetracarboxylic dianhydride with an alcohol having a carbon-carbon double bond capable of being polymerized by an active energy ray is usually carried out with respect to 1 mol of the aromatic tetracarboxylic dianhydride. Alcohol having a carbon-carbon double bond that can be polymerized by an active energy ray is blended in an excess amount of 2 to 4 mol, preferably 2 to 3 mol, without solvent or as a polar solvent of component (D) described later. It is carried out by heating to 50 to 150 ° C. and heating and stirring for 10 minutes to 2 hours. As a result, a product having two half-esters in the molecule is obtained. (D)
When the reaction of the component in a polar solvent is performed, the concentration of the polar solvent of the component (D) is 10 to 1800 parts by weight with respect to 100 parts by weight of the aromatic tetracarboxylic dianhydride. Depending on the reaction conditions, the remaining carboxylic acid is esterified to form tri- and tetra-esters, but the proportion thereof is preferably 10 mol% or less of the obtained ester.

【0010】得られたエステル化反応生成物は分子内に
2個のハーフエステル体を有する生成物または該エステ
ルとトリおよびテトラエステル体、過剰に用いたアルコ
ール等を含む混合物である。得られたエステル化反応生
成物はそのまま(A)成分として用いるか、分子内に2
個のハーフエステル体を有する生成物を単離して(A)
成分として用いてもよい。
The obtained esterification reaction product is a product having two half-esters in the molecule, or a mixture containing the ester and tri- and tetra-esters, alcohol used in excess, and the like. The obtained esterification reaction product may be used as it is as the component (A) or may be used in the molecule.
A product having one half ester is isolated (A)
You may use it as an ingredient.

【0011】(B)成分の脂肪族ジアミンとしては、ヘ
キサメチレンジアミン、ドデカメチレンジアミン、エチ
レンジアミン、3,9−ビス(3−アミノプロピル)−
2,4,8,10−テトラオキサスピロ[5,5]−ウ
ンデカン、3,9−ビス(3−アミノエチル)−2,
4,8,10−テトラオキサスピロ[5,5]−ウンデ
カン、3,9−ビス(3−アミノブチル)−2,4,
8,10−テトラオキサスピロ[5,5]−ウンデカン
等が挙げられる。また、使用にあたっては、1種類でも
2種類以上の混合物でもよい。配合割合は(A)成分の
エステル化反応生成物の原料である芳香族テトラカルボ
ン酸二無水物1モルに対し、1〜2モルである。(B)
成分が少ない場合には、硬化物が脆弱となり、逆に多い
場合には硬化性が低下する。
As the aliphatic diamine as the component (B), hexamethylene diamine, dodecamethylene diamine, ethylene diamine, 3,9-bis (3-aminopropyl)-
2,4,8,10-Tetraoxaspiro [5,5] -undecane, 3,9-bis (3-aminoethyl) -2,
4,8,10-Tetraoxaspiro [5,5] -undecane, 3,9-bis (3-aminobutyl) -2,4
8,10-tetraoxaspiro [5,5] -undecane and the like can be mentioned. In addition, in use, one kind or a mixture of two or more kinds may be used. The compounding ratio is 1 to 2 mol with respect to 1 mol of the aromatic tetracarboxylic dianhydride which is a raw material of the esterification reaction product of the component (A). (B)
When the amount of the component is small, the cured product becomes brittle, and when it is large, the curability is lowered.

【0012】(C)成分の光重合開始剤は、1−フェニ
ル−2−ヒドロキシ−2−メチルプロパン−1−オン、
1−ヒドロキシシクロヘキシルフェニルケトン、4−ジ
フェノキシジクロロアセトフェノン、ジエトキシアセト
フェノン、1−(4−イソプロピルフェニル)−2−ヒ
ドロキシ−2−メチルプロパン−1−オン等のアセトフ
ェノン系化合物、ベンゾフェノン、ベンゾイル安息香酸
メチル、4−フェニルベンゾフェノン、ヒドロキシベン
ゾフェノン、3,3’−ジメチル−4−メトキシベンゾ
フェノン等のベンゾフェノン系化合物が挙げられる。こ
れらのなかで好ましい光重合開始剤は、1−フェニル−
2−ヒドロキシ−2−メチルプロパン−1−オン、1−
ヒドロキシシクロヘキシルフェニルケトン、ベンゾフェ
ノン及びベンゾイル安息香酸メチルである。これらは単
独で、または2種類以上併用して用いられる。
The photopolymerization initiator of the component (C) is 1-phenyl-2-hydroxy-2-methylpropan-1-one,
Acetophenone compounds such as 1-hydroxycyclohexyl phenyl ketone, 4-diphenoxydichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, benzophenone, benzoylbenzoic acid Examples thereof include benzophenone compounds such as methyl, 4-phenylbenzophenone, hydroxybenzophenone, and 3,3′-dimethyl-4-methoxybenzophenone. Among these, the preferred photopolymerization initiator is 1-phenyl-
2-hydroxy-2-methylpropan-1-one, 1-
Hydroxycyclohexyl phenyl ketone, benzophenone and benzoyl methyl benzoate. These may be used alone or in combination of two or more.

【0013】光重合開始剤の添加量は、(B)成分10
0重量部に対して0.1〜10重量部が望ましい。0.
1重量部未満では、添加量が少なすぎるため未硬化部分
が残り、10重量部を超えると系中の光重合開始剤が硬
化物の強度を低下させ好ましくない。光増感剤を使用す
る場合は硬化促進時に使用し、具体的には、n−ブチル
アミン、トリエチルアミン、N−メチルジエタノールア
ミン、トリエチル−n−ブチルホスフィン、ジエチルア
ミノエチルメタクリレート、p−ジメチルアミノ安息香
酸エチル、2−ジメチルアミノエチルベンゾエート等が
挙げられるが、使用にあたっては1種類または2種類以
上の混合物でもよい。添加量は光重合開始剤と同量以下
で用いる。
The amount of the photopolymerization initiator added is 10 parts of the component (B).
0.1 to 10 parts by weight is desirable with respect to 0 parts by weight. 0.
If it is less than 1 part by weight, the uncured portion remains because the addition amount is too small, and if it exceeds 10 parts by weight, the photopolymerization initiator in the system lowers the strength of the cured product, which is not preferable. When a photosensitizer is used, it is used at the time of curing acceleration, and specifically, n-butylamine, triethylamine, N-methyldiethanolamine, triethyl-n-butylphosphine, diethylaminoethyl methacrylate, p-dimethylaminoethyl benzoate, 2-Dimethylaminoethyl benzoate and the like can be mentioned, but when used, one kind or a mixture of two or more kinds may be used. The amount added is the same as or less than that of the photopolymerization initiator.

【0014】(D)成分の極性溶媒は、上記(A)〜
(C)成分を溶解する有機溶媒であり、具体的には、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド、N−メチル−2−ピロリドン、1,3−ジメ
チル−2−イミダゾリジノン、ジメチルスルホキシド、
ヘキサメチルホスホロアミド等の非プロトン性極性溶
媒、上記のアルコール、エチレングリコールモノ置換エ
ーテル、ポリエチレングリコールモノ置換エーテル等の
アルコールを用いることができる。このうち作業性、反
応性、安定性、コストの面からN,N−ジメチルホルム
アミドあるいはN,N−ジメチルアセトアミドが好まし
い。
The polar solvent of the component (D) is selected from the above (A) to (A).
An organic solvent that dissolves the component (C), and specifically,
N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide,
An aprotic polar solvent such as hexamethylphosphoramide, the above alcohols, and alcohols such as ethylene glycol mono-substituted ether and polyethylene glycol mono-substituted ether can be used. Of these, N, N-dimethylformamide or N, N-dimethylacetamide is preferred from the viewpoints of workability, reactivity, stability and cost.

【0015】溶媒の使用量は、固形分が10〜90wt
%となるように配合するのが作業性の点で好ましい。
(A)成分を合成するエステル化反応において(D)成
分の極性溶媒を用い、エステル化反応生成物を単離しな
いでそのまま組成物として用いるときは(D)成分の極
性溶媒を添加または留去することにより本発明の光硬化
性樹脂組成物の濃度を調製する。固形分濃度を調節する
ことにより、溶液粘度の調整およびフイルムに硬化性樹
脂組成物を塗布した場合に塗膜の厚みを調節することが
出来る。
The amount of solvent used is such that the solid content is 10 to 90 wt.
From the viewpoint of workability, it is preferable to mix them so as to be%.
When the polar solvent of the component (D) is used in the esterification reaction for synthesizing the component (A) and the esterification reaction product is used as it is as a composition without isolation, the polar solvent of the component (D) is added or distilled off. By doing so, the concentration of the photocurable resin composition of the present invention is adjusted. By adjusting the solid content concentration, it is possible to adjust the solution viscosity and the thickness of the coating film when the curable resin composition is applied to the film.

【0016】本発明による光硬化性樹脂溶液組成物に
は、接着助剤、禁止剤、レベリング剤その他各種添加剤
を添加しても良い。本発明の光硬化性樹脂溶液組成物の
硬化物は、耐熱性のコーティング膜、接着剤、塗料ある
いはフォトレジストとして使用される。硬化物は、光硬
化性樹脂溶液組成物を基材に塗布し、乾燥することによ
り溶媒を除去し、活性エネルギー線を照射および加熱に
より得られる。
The photocurable resin solution composition according to the present invention may contain various additives such as an adhesion aid, an inhibitor, a leveling agent and the like. The cured product of the photocurable resin solution composition of the present invention is used as a heat resistant coating film, an adhesive, a paint or a photoresist. The cured product is obtained by applying the photocurable resin solution composition onto a substrate, drying the solvent to remove the solvent, and irradiating with active energy rays and heating.

【0017】光硬化性樹脂組成物の塗布方法は、浸漬
法、流延法、バーコーター法、スクリーン印刷法等を用
いることが可能である。乾燥条件は用いる溶媒によって
異なるが、50〜200℃、好ましくは80〜150℃
で10分〜2時間乾燥を行う。
As the method for applying the photocurable resin composition, a dipping method, a casting method, a bar coater method, a screen printing method or the like can be used. Drying conditions vary depending on the solvent used, but are 50 to 200 ° C., preferably 80 to 150 ° C.
Dry for 10 minutes to 2 hours.

【0018】光硬化は、活性エネルギー線の照射のもと
で行われる。活性エネルギー線を照射する雰囲気は、通
常の大気中および不活性ガス雰囲気中のいずれでもよ
い。活性エネルギー線としては、紫外線や電子線があ
る。紫外線の光源としては、ケミカルランプ、キセノン
ランプ、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀
ランプ、メタルハライドランプ等のランプから放出され
る10〜500mj/cm 2 、好ましくは30〜200
mj/cm2 のエネルギーを有する紫外線が利用され
る。
Photocuring is performed under irradiation of active energy rays.
Done in. The atmosphere for irradiating with active energy rays is
Either in normal air or in an inert gas atmosphere
Yes. Ultraviolet rays and electron beams are available as active energy rays.
It As a light source of ultraviolet rays, chemical lamps, xenon
Lamp, low pressure mercury lamp, high pressure mercury lamp, ultra high pressure mercury
Emitted from lamps, metal halide lamps, etc.
10 to 500 mj / cm 2 , Preferably 30-200
mj / cm2 The ultraviolet rays that have the energy of
It

【0019】電子線としては、コックロフトワルトン
型、バンデグラフ型、共振変圧型、絶縁コア変圧器型、
直接型、ダイナミトロン型、高周波型等の各種電子線加
速器から放出される50〜100KeV、好ましくは1
00〜500KeVのエネルギーを有する電子線が利用
される。光硬化中あるいは光硬化後、イミド化及び残留
溶媒の除去を行うために加熱硬化を行うが、作業性から
光硬化時に行うのが好ましい。加熱は、100〜200
℃で10分〜2時間行う。
As the electron beam, Cockloft-Walton type, Van de Graaff type, resonance transformer type, insulating core transformer type,
50 to 100 KeV, preferably 1 emitted from various electron beam accelerators such as direct type, dynamitron type and high frequency type.
An electron beam having an energy of 00 to 500 KeV is used. During or after the photo-curing, heat-curing is carried out to carry out imidization and removal of residual solvent, but it is preferably carried out at the time of photo-curing from the viewpoint of workability. Heating is 100-200
It is carried out at 10 ° C. for 10 minutes to 2 hours.

【0020】光硬化性樹脂組成物の硬化層の厚みは、特
に制約はないが、5〜100μmが好ましい。5μm以
下であれば耐熱性向上の効果が少なく、また、100μ
m以上では可撓性が低下する。
The thickness of the cured layer of the photocurable resin composition is not particularly limited, but is preferably 5 to 100 μm. If it is 5 μm or less, the effect of improving heat resistance is small, and 100 μm
When it is m or more, flexibility is lowered.

【0021】[0021]

【実施例】以下に、本発明を実施例に基づき、更に詳細
に説明する。 〔実施例1〕100mlのナスフラスコに3,3’,
4,4’−ベンゾフェンノンテトラカルボン酸二無水物
3.11g、アリルアルコール1.12g、N,N−ジ
メチルホルムアミド2.82gを仕込み、ロータリーエ
バポレーターにナスフラスコを取り付けた後、系内を窒
素置換し、80℃に昇温し、同温度で2時間反応させる
ことによりジアリルエステルを合成した。この溶液に
3,9−ビス(3−アミノプロピル)−2,4,8,1
0−テトラオキサスピロ[5,5]−ウンデカン1.7
7gにN,N−ジメチルホルムアミド1.18gを加え
た溶液を配合し、次いで1−フェニル−2−ヒドロキシ
−2−メチルプロパン−1−オン0.1gを加えて光硬
化性樹脂組成物溶液とした。
EXAMPLES The present invention will be described in more detail based on the following examples. [Example 1] 3,3 'in a 100 ml eggplant flask,
3,4 g of 4,4′-benzophenone tetracarboxylic acid dianhydride, 1.12 g of allyl alcohol, and 2.82 g of N, N-dimethylformamide were charged, and the eggplant flask was attached to the rotary evaporator. After substitution, the temperature was raised to 80 ° C., and the reaction was carried out at the same temperature for 2 hours to synthesize a diallyl ester. 3,9-bis (3-aminopropyl) -2,4,8,1 was added to this solution.
0-Tetraoxaspiro [5,5] -undecane 1.7
A solution obtained by adding 1.18 g of N, N-dimethylformamide to 7 g was added, and then 0.1 g of 1-phenyl-2-hydroxy-2-methylpropan-1-one was added to obtain a photocurable resin composition solution. did.

【0022】この溶液をアルミニウム板上に25μmの
アプリケーターを用いて均一にキャストし、80℃で5
分次いで150℃で5分乾燥させ、続いて150℃の雰
囲気下、アルミ板から40cmの高さから出力80W/
cmの高圧水銀灯で10分紫外線を照射し硬化させ、黄
褐色の強靱な塗膜を得た。溶液の貯蔵安定性及び塗膜の
特性を表1に示す。
This solution was uniformly cast on an aluminum plate using a 25 μm applicator, and the solution was cast at 80 ° C. for 5 hours.
Min, then dried at 150 ° C for 5 minutes, and then in an atmosphere of 150 ° C, output from a height of 40 cm from the aluminum plate 80 W /
It was irradiated with ultraviolet rays for 10 minutes by a high pressure mercury lamp of cm to cure it, and a yellowish brown tough coating film was obtained. Table 1 shows the storage stability of the solution and the characteristics of the coating film.

【0023】〔実施例2〕実施例1で3,3’,4,
4’−ベンゾフェンノンテトラカルボン酸二無水物3.
11gを3.75g、アリルアルコール1.12gを
1.35g、N,N−ジメチルホルムアミド2.82g
を3.4gに代えた以外は同様の操作をし、ジアリルエ
ステルを合成した。この溶液にヘキサメチレンジアミン
0.9gにN,N−ジメチルホルムアミド0.6gを加
えた溶液を配合し、次いで1−フェニル−2−ヒドロキ
シ−2−メチルプロパン−1−オン0.1gを加えて光
硬化性樹脂組成物溶液とした。この溶液を用いて実施例
1と同様の操作を行い、黄褐色の塗膜を得た。得た塗膜
の特性を表1に示す。
[Embodiment 2] In Embodiment 1, 3, 3 ', 4,
4'-benzophenone tetracarboxylic dianhydride 3.
11 g 3.75 g, allyl alcohol 1.12 g 1.35 g, N, N-dimethylformamide 2.82 g
The same operation was performed except that the amount of was changed to 3.4 g to synthesize diallyl ester. A solution of 0.9 g of hexamethylenediamine and 0.6 g of N, N-dimethylformamide was added to this solution, and then 0.1 g of 1-phenyl-2-hydroxy-2-methylpropan-1-one was added. A photocurable resin composition solution was prepared. Using this solution, the same operation as in Example 1 was carried out to obtain a yellowish brown coating film. The characteristics of the obtained coating film are shown in Table 1.

【0024】〔実施例3〕実施例1でアリルアルコール
1.12gをヒドロキシエチルメタクリレート2.04
gに代え、3,3’,4,4’−ベンゾフェンノンテト
ラカルボン酸二無水物3.11gを2.52g、、N,
N−ジメチルホルムアミド2.82gを3.04gに代
え、温度を110℃、時間を1.5時間に代えた以外は
同様の操作をし、ジエステルを合成した。この溶液に
3,9−ビス(3−アミノプロピル)−2,4,8,1
0−テトラオキサスピロ[5,5]−ウンデカン1.7
7gにN,N−ジメチルホルムアミド1.43gを加え
た溶液を配合し、次いで1−フェニル−2−ヒドロキシ
−2−メチルプロパン−1−オン0.1gを加えて光硬
化性樹脂組成物溶液とした。この溶液を用いて実施例1
と同様の操作を行い、黄褐色の塗膜を得た。得た塗膜の
特性を表1に示す。
[Example 3] 1.12 g of allyl alcohol in Example 1 was mixed with 2.04 of hydroxyethyl methacrylate.
2.52 g of 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride 3.11 g in place of g, N,
Diester was synthesized in the same manner except that N-dimethylformamide (2.82 g) was replaced with 3.04 g, the temperature was changed to 110 ° C., and the time was changed to 1.5 hours. 3,9-bis (3-aminopropyl) -2,4,8,1 was added to this solution.
0-Tetraoxaspiro [5,5] -undecane 1.7
A solution obtained by adding 1.43 g of N, N-dimethylformamide to 7 g was added, and then 0.1 g of 1-phenyl-2-hydroxy-2-methylpropan-1-one was added to obtain a photocurable resin composition solution. did. Example 1 using this solution
The same operation as above was performed to obtain a yellowish brown coating film. The characteristics of the obtained coating film are shown in Table 1.

【0025】〔実施例4〕実施例1の3,3’,4,
4’−ベンゾフェンノンテトラカルボン酸二無水物3.
11gをピロメリット酸二無水物2.53gに代え、ア
リルアルコール1.12gを1.35g、N,N−ジメ
チルホルムアミド2.82gを2.59gに代えた以外
は同様の操作をし、ジアリルエステルを合成した。この
溶液に3,9−ビス(3−アミノプロピル)−2,4,
8,10−テトラオキサスピロ[5,5]−ウンデカン
2.12gにN,N−ジメチルホルムアミド1.41g
を加えた溶液を配合し、次いで1−フェニル−2−ヒド
ロキシ−2−メチルプロパン−1−オン0.1gを加え
て光硬化性樹脂組成物溶液とした。この溶液を用いて実
施例1と同様の操作を行い、黄褐色の塗膜を得た。得た
塗膜の特性を表1に示す。
[Embodiment 4] 3, 3 ', 4, of Embodiment 1
4'-benzophenone tetracarboxylic dianhydride 3.
The same procedure was repeated except that 11 g was replaced with 2.53 g of pyromellitic dianhydride, 1.12 g of allyl alcohol was replaced with 1.35 g, and 2.82 g of N, N-dimethylformamide was replaced with 2.59 g. Was synthesized. 3,9-bis (3-aminopropyl) -2,4, was added to this solution.
2.10 g of 8,10-tetraoxaspiro [5,5] -undecane in 1.41 g of N, N-dimethylformamide
Was added, and then 0.1 g of 1-phenyl-2-hydroxy-2-methylpropan-1-one was added to prepare a photocurable resin composition solution. Using this solution, the same operation as in Example 1 was carried out to obtain a yellowish brown coating film. The characteristics of the obtained coating film are shown in Table 1.

【0026】〔実施例5〕実施例1の3,3’,4,
4’−ベンゾフェンノンテトラカルボン酸二無水物3.
11gをビフェニルテトラカルボン酸二無水物2.98
gに代え、アリルアルコール1.12gを1.17g、
N,N−ジメチルホルムアミド2.82gを2.77g
に代えた以外は同様の操作をし、ジアリルエステルを合
成した。この溶液に3,9−ビス(3−アミノプロピ
ル)−2,4,8,10−テトラオキサスピロ[5,
5]−ウンデカン1.85gにN,N−ジメチルホルム
アミド1.23gを加えた溶液を配合し、次いで1−フ
ェニル−2−ヒドロキシ−2−メチルプロパン−1−オ
ン0.1gを加えて光硬化性樹脂組成物溶液とした。こ
の溶液を用いて実施例1と同様の操作を行い、黄褐色の
塗膜を得た。得た塗膜の特性を表1に示す。
[Embodiment 5] 3, 3 ', 4, of Embodiment 1
4'-benzophenone tetracarboxylic dianhydride 3.
11 g of biphenyl tetracarboxylic dianhydride 2.98
Instead of g, 1.12 g of allyl alcohol 1.12 g,
2.77 g of N, N-dimethylformamide 2.82 g
A diallyl ester was synthesized by the same operation except that To this solution was added 3,9-bis (3-aminopropyl) -2,4,8,10-tetraoxaspiro [5,5].
5] -Undecane (1.85 g) was mixed with N, N-dimethylformamide (1.23 g) to prepare a solution, and then 1-phenyl-2-hydroxy-2-methylpropan-1-one (0.1 g) was added to perform photocuring. Resin composition solution. Using this solution, the same operation as in Example 1 was carried out to obtain a yellowish brown coating film. The characteristics of the obtained coating film are shown in Table 1.

【0027】[0027]

【表1】 *1: 不溶分析出および粘度変化の生じる点 *2: DMA法 Tan δピーク *3: JIS K5400 *4: 260℃の溶融ハンダに浸漬した際に塗膜の外
観に異常が出る点
[Table 1] * 1: Point where insoluble analysis occurs and viscosity changes * 2: Tan δ peak of DMA method * 3: JIS K5400 * 4: Point where appearance of coating film becomes abnormal when immersed in molten solder at 260 ° C

【0028】[0028]

【発明の効果】本発明の組成物から得られる光硬化性樹
脂は、耐熱性に優れ、また、ポリイミド前駆体を製造す
る工程を必要とせず、さらに、光硬化時と同時あるいは
その前後に200℃以下の比較的低い温度で硬化を行う
ことでポリイミドを製造できるため、作業性に優れた光
硬化性樹脂を与える。
The photocurable resin obtained from the composition of the present invention is excellent in heat resistance, does not require a step of producing a polyimide precursor, and is 200 times before or after the photocuring. Since a polyimide can be produced by curing at a relatively low temperature of ℃ or less, it provides a photocurable resin having excellent workability.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】(A)成分:芳香族テトラカルボン酸二無
水物と活性エネルギー線により重合可能な炭素−炭素二
重結合を有するアルコールとのエステル化反応生成物 100重量部 (B)成分:脂肪族ジアミン 上記芳香族テトラカルボン酸二無水物のモル数に対して
1〜2モル (C)成分:光重合開始剤あるいは光増感剤 0.1〜10重量部 (D)成分:極性溶媒 10〜1800重量部 上記成分が上記割合で配合された光硬化性樹脂組成物。
1. Component (A): 100 parts by weight of an esterification reaction product of an aromatic tetracarboxylic dianhydride and an alcohol having a carbon-carbon double bond which is polymerizable by active energy rays. Component (B): Aliphatic diamine 1 to 2 moles relative to the number of moles of the aromatic tetracarboxylic dianhydride (C) component: photopolymerization initiator or photosensitizer 0.1 to 10 parts by weight (D) component: polar solvent 10-1800 parts by weight A photocurable resin composition containing the above components in the above proportions.
【請求項2】(A)成分のエステル化反応生成物が分子
内に2個のハーフエステル体を有する請求項1記載の光
硬化性樹脂組成物。
2. The photocurable resin composition according to claim 1, wherein the esterification reaction product of the component (A) has two half-esters in the molecule.
【請求項3】(A)成分のアルコールが2−ヒドロキシ
エチルメタクリレートまたはアリルアルコールから選ば
れる請求項1記載の光硬化性樹脂組成物。
3. The photocurable resin composition according to claim 1, wherein the alcohol as the component (A) is selected from 2-hydroxyethyl methacrylate or allyl alcohol.
JP28366294A 1994-11-17 1994-11-17 Photocurable resin composition Expired - Fee Related JP3422103B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28366294A JP3422103B2 (en) 1994-11-17 1994-11-17 Photocurable resin composition

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Application Number Priority Date Filing Date Title
JP28366294A JP3422103B2 (en) 1994-11-17 1994-11-17 Photocurable resin composition

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JPH08143671A true JPH08143671A (en) 1996-06-04
JP3422103B2 JP3422103B2 (en) 2003-06-30

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ID=17668441

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Country Status (1)

Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11327135A (en) * 1998-05-20 1999-11-26 Fujitsu Ltd Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method
JP2006201670A (en) * 2005-01-24 2006-08-03 Hitachi Chemical Dupont Microsystems Ltd Photosensitive polymer composition, pattern producing method and electronic component
JP2015071765A (en) * 2008-12-31 2015-04-16 長興材料工業股▲ふん▼有限公司 Precursor composition for polyimide and use thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11327135A (en) * 1998-05-20 1999-11-26 Fujitsu Ltd Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method
JP2006201670A (en) * 2005-01-24 2006-08-03 Hitachi Chemical Dupont Microsystems Ltd Photosensitive polymer composition, pattern producing method and electronic component
JP2015071765A (en) * 2008-12-31 2015-04-16 長興材料工業股▲ふん▼有限公司 Precursor composition for polyimide and use thereof

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