JPH0813457B2 - Semiconductor cutting equipment - Google Patents
Semiconductor cutting equipmentInfo
- Publication number
- JPH0813457B2 JPH0813457B2 JP63322747A JP32274788A JPH0813457B2 JP H0813457 B2 JPH0813457 B2 JP H0813457B2 JP 63322747 A JP63322747 A JP 63322747A JP 32274788 A JP32274788 A JP 32274788A JP H0813457 B2 JPH0813457 B2 JP H0813457B2
- Authority
- JP
- Japan
- Prior art keywords
- inner peripheral
- peripheral blade
- cut
- semiconductor
- cutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D59/00—Accessories specially designed for sawing machines or sawing devices
- B23D59/001—Measuring or control devices, e.g. for automatic control of work feed pressure on band saw blade
- B23D59/002—Measuring or control devices, e.g. for automatic control of work feed pressure on band saw blade for the position of the saw blade
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、シリコン単結晶棒等のワーク(インゴッ
ト)を内周刃(ブレード)により順次切断して多数のウ
ェーハを得るための半導体切断装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a semiconductor cutting apparatus for sequentially cutting a work (ingot) such as a silicon single crystal rod by an inner peripheral blade (blade) to obtain a large number of wafers. Regarding
従来より、この種の半導体切断装置には、切断作業中
における内周刃の反りを検出する変位センサーが付設さ
れている。そして、この変位センサーによる内周刃の反
りの検出結果に基づいて、切断した半導体単結晶棒の切
断面形状を算出してウェーハの良否の判定データとして
利用している。Conventionally, this type of semiconductor cutting device is provided with a displacement sensor for detecting the warp of the inner peripheral blade during the cutting work. Then, based on the detection result of the warp of the inner peripheral blade by the displacement sensor, the cut surface shape of the cut semiconductor single crystal ingot is calculated and used as the judgment data of the quality of the wafer.
ところで、上記従来の変位センサーにおいては、第3
図に示すように、その設置位置が、切断対象となるワー
ク(インゴット)1より左右にずれて(第3図において
は右にずれて)いる。なお、図において符号2は内周
刃、3は変位センサーを示している。By the way, in the above-mentioned conventional displacement sensor,
As shown in the figure, the installation position is displaced left and right (shifted to the right in FIG. 3) from the work (ingot) 1 to be cut. In the figure, reference numeral 2 indicates an inner peripheral blade, and 3 indicates a displacement sensor.
しかしながら、上記従来のように、変位センサー3の
位置が内周刃2のワーク1切断位置から遠く離れている
と、内周刃2の変位が必ずしもワーク1の切断面形状と
等価にならないため、本来の測定目的であるワーク1の
切断面形状を正確に把握することができないという問題
があった。However, when the position of the displacement sensor 3 is far away from the cutting position of the workpiece 1 of the inner peripheral blade 2 as in the above-described conventional case, the displacement of the inner peripheral blade 2 is not necessarily equivalent to the shape of the cut surface of the workpiece 1. There is a problem that the cut surface shape of the work 1 which is the original measurement purpose cannot be accurately grasped.
本発明は、上記事情に鑑みてなされたもので、その目
的とするところは、ワークの切断に直接関与している内
周刃の部分の変位を測定することができ、かつ切断され
た半導体単結晶棒の切断面形状を正確に把握することが
できる半導体切断装置を提供することにある。The present invention has been made in view of the above circumstances, and an object thereof is to be able to measure the displacement of the portion of the inner peripheral blade that is directly involved in the cutting of the workpiece, and to cut the cut semiconductor unit. It is an object of the present invention to provide a semiconductor cutting device capable of accurately grasping the cut surface shape of a crystal rod.
上記目的を達成するために、本発明は、内周刃の変位
を測定する変位センサーを、切断中のワークを挟んで内
周刃に対向する位置に設けたものである。In order to achieve the above object, the present invention provides a displacement sensor for measuring the displacement of the inner peripheral blade at a position facing the inner peripheral blade with the workpiece being cut therebetween.
本発明の半導体切断装置にあっては、切断中のワーク
を挟んで内周刃に対向する位置に設けた変位センサーに
よって、内周刃の、ワークの切断に直接関与している部
分の変位を、ワークを通して測定する。In the semiconductor cutting device of the present invention, the displacement sensor provided at a position facing the inner peripheral blade across the workpiece being cut, the displacement of the portion of the inner peripheral blade, which is directly involved in the cutting of the workpiece, , Through the work.
以下、第1図と第2図に基づいて本発明の一実施例を
説明する。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.
第1図は本発明の半導体切断装置の一実施例を示す正
面図、第2図は同側面図である。これらの図において、
符号10は内周刃であり、この内周刃10は、薄板ドーナツ
状の台金11の内周部に砥粒部12が電着によって形成され
たものである。そして、この内周刃は、その中心を通る
軸線を中心として定位置で回転するように、図示しない
エアベアリングに回転自在に支持された回転体に取付け
られている。また、上記内周刃10の中央の空間内には、
切断対象の半導体単結晶棒(ワーク)13が配置されてお
り、図示しない切断送り装置によって、半導体単結晶棒
13が下方から上方に移動させられる間に、上記砥粒部12
によって切断されてウェーハが得られるようになってい
る。FIG. 1 is a front view showing an embodiment of a semiconductor cutting device of the present invention, and FIG. 2 is a side view of the same. In these figures,
Reference numeral 10 denotes an inner peripheral blade, and this inner peripheral blade 10 is one in which an abrasive grain portion 12 is formed by electrodeposition on an inner peripheral portion of a thin plate donut-shaped base metal 11. The inner peripheral blade is attached to a rotating body rotatably supported by an air bearing (not shown) so as to rotate at a fixed position around an axis passing through the center thereof. Also, in the central space of the inner peripheral blade 10,
A semiconductor single crystal ingot (work) 13 to be cut is arranged, and the semiconductor single crystal ingot is cut by a cutting and feeding device (not shown).
While 13 is moved from the bottom to the top, the abrasive grain portion 12
The wafer is obtained by being cut by.
さらに、符号14は内周刃10の変位を測定する磁気セン
サー、渦電流センサー等の変位センサーである。この変
位センサー14は、上記内周刃10の内周部の直接半導体単
結晶棒13の切断に関与する部分に対向して配置され、上
記内周刃10が取付けられた回転体を回転自在に支持した
固定部に固定されている。そして、上記内周刃10と変位
センサー14との間には、切断中の半導体単結晶棒13が進
入することができるだけの間隔(切断されたウェーハの
厚さより若干大きい間隔)があけられている。Further, reference numeral 14 is a displacement sensor such as a magnetic sensor or an eddy current sensor for measuring the displacement of the inner peripheral blade 10. The displacement sensor 14 is arranged so as to face a portion of the inner peripheral blade 10 directly involved in the cutting of the semiconductor single crystal ingot 13 and rotatably rotates the rotating body to which the inner peripheral blade 10 is attached. It is fixed to the fixed part that it supports. Then, between the inner peripheral blade 10 and the displacement sensor 14, there is provided an interval (an interval slightly larger than the thickness of the cut wafer) through which the semiconductor single crystal ingot 13 being cut can enter. .
上記のように構成された半導体切断装置にあっては、
従来同様、内周刃10の中心部に半導体単結晶棒13を挿し
込んで上下方向に移動することにより、該半導体単結晶
棒13が薄いウェーハとして切断され、順次一枚ずつ回収
される。In the semiconductor cutting device configured as described above,
Similarly to the conventional case, the semiconductor single crystal ingot 13 is inserted into the central portion of the inner peripheral blade 10 and moved in the vertical direction, so that the semiconductor single crystal ingot 13 is cut as a thin wafer and sequentially collected one by one.
この場合、半導体単結晶棒13を切断している間、半導
体単結晶棒13の切断部13a越しに、内周刃10の変形が変
位センサー14によって検出される。そして、この変位セ
ンサー14の検出した内周刃10の変位データは、切断中の
半導体単結晶棒13の切断面形状と表裏一体のものであ
り、かつ内周刃10と変位センサー14との間に位置してい
る切断部13aが半導体で変位センサー14に影響を及ぼさ
ないから、正確な内周刃10の変位、切断半導体単結晶棒
13の切断面形状が得られる。In this case, while the semiconductor single crystal ingot 13 is being cut, the deformation of the inner peripheral blade 10 is detected by the displacement sensor 14 over the cutting portion 13a of the semiconductor single crystal ingot 13. Then, the displacement data of the inner peripheral blade 10 detected by the displacement sensor 14 is a cut surface shape of the semiconductor single crystal ingot 13 being cut and the front and back are integrated, and between the inner peripheral blade 10 and the displacement sensor 14. Since the cutting portion 13a located at the semiconductor does not affect the displacement sensor 14 with the semiconductor, the accurate displacement of the inner peripheral blade 10, the cutting semiconductor single crystal rod
13 cut surface shapes are obtained.
以上説明したように、本発明は、内周刃の変位を測定
する変位センサーを、切断中のワークを挟んで内周刃に
対向する位置に設けたものであるから、上記変位センサ
ーによって、内周刃の、ワークの切断に直接関与してい
る部分の変位を、ワークを通して測定することにより、
切断時の内周刃の状態及び切断された半導体単結晶棒の
切断面形状を正確に把握することができる。従って、内
周刃の切断性能の管理が確実にでき、切断ウェーハの品
質のランク付が容易にできる上に、不良ウェーハを後工
程に流さないようにでき、かつ測定操作を簡略化できる
という優れた効果を有する。As described above, the present invention provides the displacement sensor for measuring the displacement of the inner peripheral blade at a position facing the inner peripheral blade across the workpiece being cut. By measuring the displacement of the peripheral blade, which is directly involved in the cutting of the workpiece, through the workpiece,
The state of the inner peripheral blade at the time of cutting and the cut surface shape of the cut semiconductor single crystal ingot can be accurately grasped. Therefore, the cutting performance of the inner peripheral blade can be surely controlled, the quality of the cut wafers can be easily ranked, the defective wafer can be prevented from flowing to the subsequent process, and the measurement operation can be simplified. Have the effect.
第1図と第2図は本発明の一実施例を示すもので、第1
図は正面図、第2図は側面図、第3図は従来の半導体切
断装置の正面図である。 10……内周刃、13……半導体単結晶棒(ワーク)、14…
…変位センサー。1 and 2 show an embodiment of the present invention.
FIG. 1 is a front view, FIG. 2 is a side view, and FIG. 3 is a front view of a conventional semiconductor cutting device. 10 …… Inner peripheral blade, 13 …… Semiconductor single crystal rod (work), 14…
… Displacement sensor.
Claims (1)
ハを得る半導体切断装置において、 上記内周刃の変位を測定する変位センサーを、上記切断
中のワークを挟んで上記内周刃に対向する位置に設けた
ことを特徴とする半導体切断装置。1. A semiconductor cutting apparatus for cutting a work by an inner peripheral blade to obtain a wafer, wherein a displacement sensor for measuring the displacement of the inner peripheral blade is opposed to the inner peripheral blade with the work being cut being sandwiched therebetween. A semiconductor cutting device, which is provided at a position where
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63322747A JPH0813457B2 (en) | 1988-12-21 | 1988-12-21 | Semiconductor cutting equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63322747A JPH0813457B2 (en) | 1988-12-21 | 1988-12-21 | Semiconductor cutting equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02167703A JPH02167703A (en) | 1990-06-28 |
JPH0813457B2 true JPH0813457B2 (en) | 1996-02-14 |
Family
ID=18147186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63322747A Expired - Lifetime JPH0813457B2 (en) | 1988-12-21 | 1988-12-21 | Semiconductor cutting equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0813457B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1303363C (en) * | 2002-09-25 | 2007-03-07 | Lg电子株式会社 | Microwave oven with toaster |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3826698A1 (en) * | 1988-08-05 | 1990-02-08 | Wacker Chemitronic | METHOD AND DEVICE FOR CONTROLLING THE CUTTING PROCESS WHEN DISCONNECTING DISKS FROM NON-MAGNETIZABLE WORKPIECES |
JP2604061B2 (en) * | 1990-09-28 | 1997-04-23 | トーヨーエイテック株式会社 | Slicing equipment |
JPH04138211A (en) * | 1990-09-28 | 1992-05-12 | Toyo A Tec Kk | Slicing device |
JP2554079Y2 (en) * | 1991-06-27 | 1997-11-12 | トーヨーエイテック株式会社 | Blade deflection detecting device in slicing device |
JPH06712U (en) * | 1992-06-16 | 1994-01-11 | トーヨーエイテック株式会社 | Slicing equipment |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3826698A1 (en) * | 1988-08-05 | 1990-02-08 | Wacker Chemitronic | METHOD AND DEVICE FOR CONTROLLING THE CUTTING PROCESS WHEN DISCONNECTING DISKS FROM NON-MAGNETIZABLE WORKPIECES |
-
1988
- 1988-12-21 JP JP63322747A patent/JPH0813457B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3826698A1 (en) * | 1988-08-05 | 1990-02-08 | Wacker Chemitronic | METHOD AND DEVICE FOR CONTROLLING THE CUTTING PROCESS WHEN DISCONNECTING DISKS FROM NON-MAGNETIZABLE WORKPIECES |
JPH0281608A (en) * | 1988-08-05 | 1990-03-22 | Wacker Chemitronic Ges Elektron Grundstoffe Mbh | Method and device for monitoring state of cutting at time when wafer is cut from non-magnetized work |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1303363C (en) * | 2002-09-25 | 2007-03-07 | Lg电子株式会社 | Microwave oven with toaster |
Also Published As
Publication number | Publication date |
---|---|
JPH02167703A (en) | 1990-06-28 |
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