JPH0812914A - Polyimide ink - Google Patents

Polyimide ink

Info

Publication number
JPH0812914A
JPH0812914A JP14755594A JP14755594A JPH0812914A JP H0812914 A JPH0812914 A JP H0812914A JP 14755594 A JP14755594 A JP 14755594A JP 14755594 A JP14755594 A JP 14755594A JP H0812914 A JPH0812914 A JP H0812914A
Authority
JP
Japan
Prior art keywords
polyimide
ink
diamine
added
filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14755594A
Other languages
Japanese (ja)
Inventor
Tetsuya Tsutsumi
哲也 堤
Yukihiro Nakajima
征洋 中島
Nobuhito Ishii
信人 石井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harima Chemical Inc
Original Assignee
Harima Chemical Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harima Chemical Inc filed Critical Harima Chemical Inc
Priority to JP14755594A priority Critical patent/JPH0812914A/en
Publication of JPH0812914A publication Critical patent/JPH0812914A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Abstract

PURPOSE:To obtain a polyimide ink which forms a film excellent in heat resistance, flexibility, adhesiveness, etc., by incorporating a polyimide resin obtd. by reacting terminal maleimide groups of a specific polyimide with a diamine compd. into an ink. CONSTITUTION:Maleimide groups of a polyimide of the formula (wherein n is 1-10) are reacted with a diamine compd. to produce a polyimide resin. An alicyclic diamine [e.g. 4,4'-bis(cyclohexylamine) or 4,4'-methylene-bis(cyclohexylamine)] is suitable as the diamine compd., and it is used pref. in an amt. of 0.3-1 mol based on 1mol of the polyimide. The resulting resin as the main component, a filler (e.g. a fine silica powder) surface-treated with a silane coupling agent, a defoaming agent, etc., are compounded to give a polyimide ink, which is suitable for a cover coat, etc., of a flexible printed circuit board.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、低温で硬化可能であり
かつ優れた可撓性を有する皮膜を与える熱硬化性ポリイ
ミドインキに関するもので、フレキシブルプリント基板
やTAB用銅張基板の保護膜、接着剤などに有用であ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermosetting polyimide ink which can be cured at a low temperature and gives a film having excellent flexibility, which is a protective film for a flexible printed circuit board or a copper clad board for TAB, It is useful as an adhesive.

【0002】[0002]

【従来の技術】近年、電子機器の発展に伴いプリント配
線板が多く用いられ、その一種であるフレキシブルプリ
ント配線板の需要もふえてきた。そこに使用される有機
材料としては、耐熱性、絶縁性は勿論のことその他に優
れた可撓性が要求される。
2. Description of the Related Art In recent years, printed wiring boards have been used more and more with the development of electronic equipment, and the demand for flexible printed wiring boards, one of them, has increased. The organic material used therein is required to have excellent flexibility as well as heat resistance and insulation.

【0003】フレキシブルプリント基板の回路保護用の
被覆基材としてはポリイミドのカバーレイフイルムが用
いられている。このものはポリイミドフイルムの片面に
接着剤を塗布したものであり、被覆前に端子接続の部分
のみ金型で打ち抜いてから、これを手作業により位置合
わせをした後、熱板プレスにより高温で圧着している。
しかし、金型はコストが高いうえに、実装密度が上がる
のに伴いパンチングの寸法精度や位置合わせの精度を高
めなければならないという問題が生じていた。また、フ
イルム自体の物性を良くしても、使用する接着剤によ
り、総合的には資材の物性が低下する恐れがある。
A polyimide coverlay film is used as a coating base material for circuit protection of a flexible printed circuit board. This is a polyimide film coated with adhesive on one side.Before coating, punch out only the terminal connection part with a mold, then align this by hand, then crimp at high temperature with a hot plate press. are doing.
However, there is a problem that the die cost is high and the dimensional accuracy of punching and the accuracy of alignment must be improved as the mounting density increases. Further, even if the physical properties of the film itself are improved, the physical properties of the material may be reduced as a whole depending on the adhesive used.

【0004】これに対し、印刷法によりプリント配線基
板上に絶縁保護皮膜を形成する方法が開発されている。
しかし現在使用されているカバーレイインキ剤は、従来
リジッド基板に使用されてきたソルダーレジストを改良
したもので、可撓性に乏しく、また耐熱性、電気特性が
必ずしも充分とはいえない問題もある。耐熱性に優れた
ポリイミドに可撓性をもたすためポリイミド骨格にエー
テル結合、シロキサン結合などを導入したポリアミド酸
溶液やポリイミド溶液が開発されているが、それらでは
塗膜形成に200℃以上の高温が要求されるため、回路
を形成する銅箔の酸化が進み、回路の電気的信頼性が危
惧されるという大きな問題点があった。さらに、ポリア
ミド酸溶液やポリイミド溶液を印刷インキに構成して用
いるためには、フィラーや添加剤が通常必要とされ、更
に溶媒も用いられているが、従来用いられてきたフィラ
ーや添加剤は、樹脂を溶解させる溶媒の極性のために充
分な性能が発揮できないとか、また、処理温度が高いこ
とによるこれら材料の変質という問題もあった。
On the other hand, a method of forming an insulating protective film on a printed wiring board by a printing method has been developed.
However, the coverlay ink agent currently used is an improved version of the solder resist that has been conventionally used for rigid substrates, and it has poor flexibility and also has the problem that it is not always sufficient in heat resistance and electrical characteristics. . Polyamic acid solutions and polyimide solutions in which ether bonds, siloxane bonds, etc. are introduced into the polyimide skeleton have been developed in order to give polyimides with excellent heat resistance flexibility. Since high temperature is required, there has been a serious problem that the electrical reliability of the circuit is feared due to the progress of oxidation of the copper foil forming the circuit. Furthermore, in order to use the polyamic acid solution and the polyimide solution in the printing ink, a filler and an additive are usually required, and a solvent is also used, but the filler and the additive that have been conventionally used are There are also problems that sufficient performance cannot be exhibited due to the polarity of the solvent that dissolves the resin, and that these materials are altered due to the high processing temperature.

【0005】[0005]

【発明が解決しようとする課題】この発明は、上記のよ
うな従来技術の欠点を解消するためになされたものであ
り、低温で硬化可能なポリイミドインキで、しかも可撓
性、耐熱性に優れた塗膜を与えるものを目的とした。
The present invention has been made to solve the above-mentioned drawbacks of the prior art, and is a polyimide ink curable at a low temperature, and is excellent in flexibility and heat resistance. The purpose was to provide a coated film.

【0006】[0006]

【課題を解決するための手段】本発明者らは、前記課題
を解決するため鋭意研究を重ねた結果、一般式(I)
(式中、nは1〜10の整数を示す。)で示されるポリ
イミドとジアミン、特に脂環式ジアミンを反応させたポ
リイミド樹脂を主成分とするインキ組成物が低温で塗膜
を形成し、しかもその塗膜は耐熱性、可撓性などの優れ
た物性を有することを見出し、更にインキ組成物として
の充分は実用性の為に添加するフィラーとの相互関係に
ついても検討を重ねて本発明に至った。
Means for Solving the Problems The inventors of the present invention have conducted extensive studies to solve the above problems, and as a result, a compound represented by the general formula (I)
(In the formula, n represents an integer of 1 to 10.) An ink composition containing a polyimide resin obtained by reacting a polyimide and a diamine, particularly an alicyclic diamine as a main component forms a coating film at a low temperature, Moreover, it was found that the coating film has excellent physical properties such as heat resistance and flexibility, and further, the mutual relationship with the filler added for practical use is sufficient as an ink composition, and the present invention was further studied. Came to.

【0007】本発明に使用される一般式(I)のポリイ
ミドは、骨格にスピロアセタール環を有しているから優
れた可撓性、耐熱性を与える。しかしフレキシブルプリ
ント配線板の被覆基材などの用途では、その使用目的上
または工程上、高度の可撓性、密着性、耐熱性などの膜
としての諸物性を満足する必要があり高分子体であるこ
とが不可欠である。一般には、一般式(I)のポリイミ
ドをパーオキサイドの存在下、加熱によりラジカル重合
させ高分子体を形成することができるが、これは230
℃以上の高温が必要である。そこで低温で高分子体を得
るため本発明においては、末端のマレイミド基とジアミ
ン特に脂環式ジアミンとを付加反応させることにより優
れた物性を有する高分子体の形成が可能となった。
The polyimide of the general formula (I) used in the present invention has excellent flexibility and heat resistance because it has a spiroacetal ring in its skeleton. However, in applications such as coating base materials for flexible printed wiring boards, it is necessary to satisfy various physical properties as a film such as high flexibility, adhesiveness, heat resistance, etc. in terms of the purpose of use or process, and it is necessary to use a polymer. It is essential to be. Generally, the polyimide of the general formula (I) can be radically polymerized by heating in the presence of peroxide to form a polymer.
High temperature above ℃ is required. Therefore, in order to obtain a polymer at a low temperature, in the present invention, it becomes possible to form a polymer having excellent physical properties by subjecting a terminal maleimide group to a diamine, particularly an alicyclic diamine.

【0008】本発明で特に用いる脂環式ジアミンとして
は、4,4′−ビス(シクロヘキシルアミン)、4,4
−メチレンビス(シクロヘキシルアミン)、4,4′−
エチレンビス(シクロヘキシルアミン)、4,4′−プ
ロピレンビス(シクロヘキシルアミン)、4,4′−テ
トラメチレンビス(シクロヘキシルアミン)、4,4′
−ビス(アミノシクロヘキシル)エーテル、4,4′−
ビス(アミノシクロヘキシル)スルフィド、4,4′−
ビス(アミノシクロヘキシル)ケトン、イソフォロンジ
アミンなどであるが、脂肪族アミンでは、トリメチレン
ジアミン、テトラメチレンジアミン、ヘキサメチレンジ
アミン、2,11−ドデカンジアミンなどが、芳香族ア
ミンでは4,4′−ジアミノジフェニルメタン、3,
3′−ジアミノジフェニルメタン、4,4′−ジアミノ
ジフェニルエーテル、4,4′−ジアミノジフェニルス
ルホン、4,4′−ジアミノジフェニルスルフィド、
3,3′−ジメチル−4,4′−ジアミノジフェニルメ
タン、3,3′−ジメチル−4,4′−ジアミノジフェ
ニル、1,3−ビス(4−アミノフェノキシ)ベンゼ
ン、2,2−ビス(4−アミノフェノキシフェニル)プ
ロパン、オルトフェニレンジアミン、メタフェニレンジ
アミン、パラフェニレンジアミン、ベンジジンなどが使
用できる。
The alicyclic diamines particularly used in the present invention include 4,4'-bis (cyclohexylamine) and 4,4 '.
-Methylenebis (cyclohexylamine), 4,4'-
Ethylenebis (cyclohexylamine), 4,4'-propylenebis (cyclohexylamine), 4,4'-tetramethylenebis (cyclohexylamine), 4,4 '
-Bis (aminocyclohexyl) ether, 4,4'-
Bis (aminocyclohexyl) sulfide, 4,4'-
Examples of the bis (aminocyclohexyl) ketone and isophoronediamine include aliphatic amines such as trimethylenediamine, tetramethylenediamine, hexamethylenediamine, and 2,11-dodecanediamine, and aromatic amines such as 4,4′-. Diaminodiphenylmethane, 3,
3'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfide,
3,3′-dimethyl-4,4′-diaminodiphenylmethane, 3,3′-dimethyl-4,4′-diaminodiphenyl, 1,3-bis (4-aminophenoxy) benzene, 2,2-bis (4 -Aminophenoxyphenyl) propane, orthophenylenediamine, metaphenylenediamine, paraphenylenediamine, benzidine and the like can be used.

【0009】ここでジアミンとして脂環式ジアミンを用
いる場合の利点としては、第一に付加反応が容易に進む
こと、第二に得られた高分子体の硬化が低温で達成でき
ることが上げられる。つまり、付加反応は、用いるジア
ミンの求核性により反応性が大きく影響され、脂肪族系
ジアミンは反応性が高い傾向にあるため反応の制御が微
妙であり、また芳香族系ジアミンでは、高温で長時間の
反応が必要となる傾向にあるためである。さらに得られ
た高分子体を硬化させるのに必要な最低温度が、芳香族
系ジアミンでは高いということもあり、反応性および低
温硬化の点で脂環式ジアミンが本発明では最も適切であ
ると云える。
The advantages of using an alicyclic diamine as the diamine are, firstly, that the addition reaction proceeds easily and secondly that the obtained polymer can be cured at a low temperature. In other words, in the addition reaction, the reactivity is greatly affected by the nucleophilicity of the diamine used, and the aliphatic diamine tends to have high reactivity, so the control of the reaction is delicate. This is because a reaction for a long time tends to be required. Further, the minimum temperature required for curing the obtained polymer is sometimes high in aromatic diamines, and alicyclic diamines are most suitable in the present invention in terms of reactivity and low temperature curing. Can say

【0010】本発明に用いるポリイミド樹脂は、末端に
マレイミドを有する一般式(I)のポリイミドに対しジ
アミンを0.3〜1好ましくは0.5〜1モルの割合で
反応させることにより得られる。反応濃度は、通常1〜
50%、好ましくは2〜40%である。使用するアミン
の種類に応じて最適の反応温度、反応時間があるが、通
常、150℃以下、1〜100時間である。好ましく
は、芳香族アミンを用いる場合100〜150℃、脂環
式アミンを用いる場合20〜140℃、脂肪族アミンの
場合0〜50℃が好ましい。なお、ここで用いる溶剤と
してはジメチルホルムアミド、ジメチルアセトアミド、
N−メチルピロリドン、ジオキサンなどが挙げられる。
The polyimide resin used in the present invention is obtained by reacting a polyimide of the general formula (I) having a maleimide at the terminal with a diamine in a proportion of 0.3 to 1, preferably 0.5 to 1 mol. The reaction concentration is usually 1 to
50%, preferably 2-40%. There are optimum reaction temperature and reaction time depending on the type of amine used, but it is usually 150 ° C. or less and 1 to 100 hours. Preferably, the aromatic amine is used at 100 to 150 ° C, the alicyclic amine is used at 20 to 140 ° C, and the aliphatic amine is preferably 0 to 50 ° C. The solvent used here is dimethylformamide, dimethylacetamide,
Examples thereof include N-methylpyrrolidone and dioxane.

【0011】本発明のポリイミドインキの組成物は、上
記の反応で得られるポリイミド樹脂を主成分として含有
するが、この他にフィラー、消泡剤、カップリング剤な
どが必要に応じて使用してよい。
The composition of the polyimide ink of the present invention contains the polyimide resin obtained by the above reaction as a main component. In addition to this, a filler, a defoaming agent, a coupling agent, etc. may be used if necessary. Good.

【0012】本発明に使用できるフィラーとしては、シ
リカ、アルミナの微粉末状品が好ましいが、表面処理さ
れたものも好ましく用いることができる。フィラーの配
合比は、固形ポリイミド樹脂100部に対して、2〜2
0重量部添加することができるが、好ましくは5〜15
重量部である。フィラーの添加割合が高すぎると可撓
性、密着性が低下し、また低すぎると印刷性が悪く耐熱
性も低下する。
As the filler which can be used in the present invention, finely powdered products of silica and alumina are preferred, but surface-treated products can also be preferably used. The mixing ratio of the filler is 2 to 2 with respect to 100 parts of the solid polyimide resin.
0 parts by weight can be added, but preferably 5 to 15
Parts by weight. If the proportion of the filler added is too high, the flexibility and adhesion will be reduced, and if it is too low, the printability will be poor and the heat resistance will be reduced.

【0013】なお本発明で用いるフィラーの表面処理に
カップリング剤を使用する場合は、γ−アミノプロピル
トリエトキシシラン、N−フェニル−γ−アミノプロピ
ルトリメトキシシラン、N−β(アミノエチル)γ−ア
ミノプロピルトリメトキシシランなどのシラン系カップ
リング剤が使用されるが、中でもγ−アミノプロピルト
リエトキシシランが好ましい。
When a coupling agent is used for the surface treatment of the filler used in the present invention, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ A silane-based coupling agent such as -aminopropyltrimethoxysilane is used, among which γ-aminopropyltriethoxysilane is preferable.

【0014】本発明に消泡剤を使用するにはシリコン系
消泡剤が好ましい。前記ポリイミドインキ組成物100
重量部に対し0.1〜5重量部添加するのが好ましい
が、印刷時の消泡性に応じて実用可能となるようにその
使用量を調節する。
To use the defoaming agent in the present invention, a silicon type defoaming agent is preferable. The polyimide ink composition 100
It is preferable to add 0.1 to 5 parts by weight with respect to parts by weight, but the amount used is adjusted so as to be practical depending on the defoaming property during printing.

【0015】本発明のポリイミドインキの組成物を調製
する方法としては、方法それ自体は従来公知の方法が使
用できる。例えば、一般式(I)のポリイミドとアミン
との付加反応物であるポリイミド樹脂の極性溶剤溶液に
フィラー、消泡剤、添加剤を加え三本ロールミル、攪拌
機、ボールミルなどで均一に分散させることによって行
われる。このインキのスクリーン印刷は、フレキシブル
プリント基板上に150メッシュのステンレススクリー
ンを用いて行うことができる。塗布した樹脂は150℃
の熱風乾燥炉で30分乾燥させ、さらに200〜250
℃で3分加熱させ硬化被膜を得ることができる。
As a method for preparing the composition of the polyimide ink of the present invention, a method known per se can be used. For example, by adding a filler, a defoaming agent, and an additive to a polar solvent solution of a polyimide resin, which is an addition reaction product of a polyimide of the general formula (I) and an amine, and uniformly dispersing the mixture with a three-roll mill, a stirrer, a ball mill, or the like. Done. Screen printing of this ink can be performed using a 150 mesh stainless screen on a flexible printed board. The applied resin is 150 ℃
30 minutes in a hot air drying oven, and then 200-250
A cured coating can be obtained by heating at 3 ° C. for 3 minutes.

【0016】[0016]

【実施例】以下、本発明について実施例をもって詳細に
説明する。但し、本発明は以下の実施例に限定されるも
のではない。 [調製例]一般式(I)のポリイミドの合成 温度計、攪拌装置、冷却器及び乾燥窒素ガス吹き込み口
を備えた2000mlの四つ口フラスコに3,3′,
4,4′−ベンゾフェノンテトラカルボン酸二無水物2
14.26g、無水マレイン酸65.2g、N,N′−
ジメチルホルムアミド674.69gを加え、50℃に
加熱、溶解させた。
The present invention will be described in detail below with reference to examples. However, the present invention is not limited to the following examples. [Preparation Example] Synthesis of Polyimide of General Formula (I) 3,3 ′, in a 2000 ml four-necked flask equipped with a thermometer, a stirrer, a cooler and a dry nitrogen gas inlet.
4,4'-benzophenone tetracarboxylic acid dianhydride 2
14.26 g, maleic anhydride 65.2 g, N, N'-
674.69 g of dimethylformamide was added and heated to 50 ° C. to dissolve.

【0017】次いで3,9−ビス(3−アミノプロピ
ル)−2,4,8,10テトラオキサスピロ〔5,5〕
ウンデカン273.62g(この化合物は公知であり、
もしその製造方法が必要なら、特開昭62−21239
0を参照)をN,N′−ジメチルホルムアミド508.
15gに溶解した液をフラスコの温度を50〜60℃に
保ちながら、2時間かけて滴下し、滴下終了後、同温度
で2時間攪拌を続けた。
Then 3,9-bis (3-aminopropyl) -2,4,8,10 tetraoxaspiro [5,5]
273.62 g undecane (this compound is known
If the manufacturing method is required, it is disclosed in JP-A-62-21239.
0) to N, N'-dimethylformamide 508.
The liquid dissolved in 15 g was added dropwise over 2 hours while maintaining the temperature of the flask at 50 to 60 ° C., and after completion of the addition, stirring was continued at the same temperature for 2 hours.

【0018】次に、このフラスコ内に、酢酸ニッケル1
g、トリエチルアミン24.93g、および無水酢酸2
03.65gを加え、60℃に保ちながら3時間攪拌し
て脱水環化反応を行った。
Next, nickel acetate 1
g, triethylamine 24.93 g, and acetic anhydride 2
03.65 g was added, and the mixture was stirred for 3 hours while maintaining the temperature at 60 ° C. to carry out a dehydration cyclization reaction.

【0019】反応終了後、反応生成物を大量の水に投入
し、結晶を析出させた。これを濾別後、水洗し、乾燥し
て白色の一般式(I)のポリイミド粉末を420g得
た。 [実施例1]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに調
製例1のポリイミド粉末46.6g、N−メチル−2−
ピロリドン100gを加え50℃に加熱、溶解させた。
次いで4,4′−ジアミノジフェニルエーテル6.0g
のN−メチル−2−ピロリドン22.8g溶液を同温度
で滴下した。その後、溶液温度を140℃に上げ、この
温度で3時間攪拌し、付加反応を行った。
After the reaction was completed, the reaction product was poured into a large amount of water to precipitate crystals. This was separated by filtration, washed with water, and dried to obtain 420 g of a white polyimide powder of the general formula (I). [Example 1] In a 200 ml four-necked flask equipped with a thermometer, a stirrer, a cooler and a dry nitrogen gas inlet, 46.6 g of the polyimide powder of Preparation Example 1 and N-methyl-2-
Pyrrolidone (100 g) was added, and the mixture was heated to 50 ° C. and dissolved.
Then 4,4'-diaminodiphenyl ether 6.0 g
22.8 g solution of N-methyl-2-pyrrolidone of was added dropwise at the same temperature. Then, the solution temperature was raised to 140 ° C., and the mixture was stirred at this temperature for 3 hours to carry out an addition reaction.

【0020】上記樹脂溶液(30%濃度)100gに、
微粉末シリカを3.33g、シリコーン系消泡剤を0.
1g、γ−アミノプロピルトリエトキシシラン0.66
gを加え、三本ロールで5回混練してインキである組成
物を得た。 [実施例2]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに調
製例1のポリイミド粉末46.6g、N−メチル−2−
ピロリドン100gを加え50℃に加熱、溶解させた。
次いで4,4′−ジアミノジシクロヘキシルメタン5.
68gのN−メチル−2−ピロリドン22.0g溶液を
同温度で滴下した。その後、50℃で10時間攪拌し、
付加反応を行った。
To 100 g of the above resin solution (30% concentration),
3.33 g of fine powder silica and 0.30 g of a silicone-based defoaming agent.
1 g, γ-aminopropyltriethoxysilane 0.66
g and kneaded 5 times with a three-roll mill to obtain a composition as an ink. Example 2 In a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet, 46.6 g of the polyimide powder of Preparation Example 1 and N-methyl-2-
Pyrrolidone (100 g) was added, and the mixture was heated to 50 ° C. and dissolved.
Then 4,4'-diaminodicyclohexylmethane 5.
68 g of N-methyl-2-pyrrolidone 22.0 g solution was added dropwise at the same temperature. Then, stir at 50 ° C. for 10 hours,
An addition reaction was performed.

【0021】上記樹脂溶液を、実施例1と同様の割合、
同様の方法でインキである組成物を得た。 [実施例3]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに調
製例1のポリイミド粉末46.6g、N,N′−ジメチ
ルホルムアミド100gを加え50℃に加熱、溶解させ
た。次いで室温まで放冷後、3,9−ビス(3−アミノ
プロピル)−2,4,8,10テトラオキサスピロ
〔5,5〕ウンデカン5.75gをN,N′−ジメチル
ホルムアミド22.2g溶液を滴下した。その後、50
℃で4時間攪拌し、付加反応を行った。
The above resin solution was added in the same ratio as in Example 1,
A composition which is an ink was obtained by the same method. [Example 3] 46.6 g of the polyimide powder of Preparation Example 1 and 100 g of N, N'-dimethylformamide were added to a 200 ml four-necked flask equipped with a thermometer, a stirrer, a cooler and a dry nitrogen gas blowing port, and added. It was heated to ℃ and dissolved. Then, after cooling to room temperature, 5.75 g of 3,9-bis (3-aminopropyl) -2,4,8,10-tetraoxaspiro [5,5] undecane was dissolved in 22.2 g of N, N'-dimethylformamide. Was dripped. Then 50
The mixture was stirred at 0 ° C for 4 hours to carry out addition reaction.

【0022】上記樹脂溶液を、実施例1と同様の割合、
同様の方法でインキである組成物を得た。 [実施例4]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに調
製例1のポリイミド粉末46.6g、N−メチル−2−
ピロリドン100gを加え50℃に加熱、溶解させた。
次いで4,4’−ジアミノジシクロヘキシルメタン5.
68gのN−メチル−2−ピロリドン22.0g溶液を
同温度で滴下した。その後、50℃で10時間攪拌し、
付加反応を行った。
The above resin solution was added in the same ratio as in Example 1,
A composition which is an ink was obtained by the same method. Example 4 In a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet, 46.6 g of the polyimide powder of Preparation Example 1 and N-methyl-2-
Pyrrolidone (100 g) was added, and the mixture was heated to 50 ° C. and dissolved.
Then 4,4'-diaminodicyclohexylmethane 5.
68 g of N-methyl-2-pyrrolidone 22.0 g solution was added dropwise at the same temperature. Then, stir at 50 ° C. for 10 hours,
An addition reaction was performed.

【0023】上記樹脂溶液(30%濃度)100gに、
微粉末シリカを3.33g(固形樹脂に対し10%),
シリコーン系消泡剤を0.1g,γ−アミノプロピルト
リエトキシシラン0.66gを加え、三本ロールで5回
混練してインキの組成物を得た。 [実施例5]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに調
製例1のポリイミド粉末46.6g、N−メチル−2−
ピロリドン100gを加え50℃に加熱、溶解させた。
次いでイソホロンジアミン4.60gのN−メチル−2
−ピロリドン22.0g溶液を同温度で滴下した。その
後、50℃で6時間攪拌し、付加反応を行った。
To 100 g of the above resin solution (30% concentration),
3.33 g of fine powder silica (10% based on solid resin),
An ink composition was obtained by adding 0.1 g of a silicone-based defoaming agent and 0.66 g of γ-aminopropyltriethoxysilane, and kneading the mixture with a triple roll 5 times. Example 5 In a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet, 46.6 g of the polyimide powder of Preparation Example 1 and N-methyl-2-
Pyrrolidone (100 g) was added, and the mixture was heated to 50 ° C. and dissolved.
Then isophorone diamine 4.60 g of N-methyl-2
-Pyrrolidone 22.0 g solution was added dropwise at the same temperature. Then, it stirred at 50 degreeC for 6 hours, and performed the addition reaction.

【0024】上記樹脂溶液を実施例1と同様な割合、同
様な方法でインキの組成物を得た。 [実施例6]実施例1で得た樹脂溶液(30%濃度)1
00gに、微粉末シリカを1.58g(固形樹脂に対し
5%),シリコーン系消泡剤を0.1g,γ−アミノプ
ロピルトリエトキシシラン0.66gを加え、三本ロー
ルで5回混練してインキの組成物を得た。 [実施例7]実施例1で得た樹脂溶液(30%濃度)1
00gに、微粉末シリカを5.30g(固形樹脂に対し
15%),シリコーン系消泡剤を0.1g,γ−アミノ
プロピルトリエトキシシラン0.66gを加え、三本ロ
ールで5回混練してインキの組成物を得た。 [比較例1]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに
4,4′−ビスマレイミドジフェニルメタン35.8
g、N−メチル−2−ピロリドン110gを加え50℃
に加熱、溶解させた。次いで4,4′−ジアミノジフェ
ニルメタン20.0gのN−メチル−2−ピロリドン2
0.02g溶液を同温度で滴下した。その後、溶液温度
を140℃に上げ、この温度で2時間攪拌し、付加反応
を行った。
An ink composition was obtained using the above resin solution in the same ratio and in the same manner as in Example 1. [Example 6] Resin solution (30% concentration) 1 obtained in Example 1
To 00 g, 1.58 g of fine powder silica (5% based on solid resin), 0.1 g of silicone antifoaming agent and 0.66 g of γ-aminopropyltriethoxysilane were added and kneaded 5 times with a three-roll mill. To obtain an ink composition. [Example 7] Resin solution (30% concentration) 1 obtained in Example 1
To 00 g, 5.30 g of fine powder silica (15% based on solid resin), 0.1 g of silicone antifoaming agent, and 0.66 g of γ-aminopropyltriethoxysilane were added, and the mixture was kneaded 5 times with a three-roll mill. To obtain an ink composition. [Comparative Example 1] 4,4'-Bismaleimidediphenylmethane 35.8 was placed in a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet.
g, N-methyl-2-pyrrolidone 110 g was added, and the temperature was 50 ° C.
It was heated and melted. Then 4,4'-diaminodiphenylmethane 20.0 g of N-methyl-2-pyrrolidone 2
A 0.02 g solution was added dropwise at the same temperature. Then, the solution temperature was raised to 140 ° C., and the mixture was stirred at this temperature for 2 hours to carry out an addition reaction.

【0025】上記樹脂溶液を、実施例1と同様の割合、
同様の方法でインキの組成物を得た。 [比較例2]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに
4,4′−ビスマレイミドジフェニルメタン35.8
g、ジオンサン100gを加え50℃に加熱、溶解させ
た。次いで4,4′−ジアミノジシクロヘキシルメタン
14.73gのジオキサン18.0g溶液を同温度で滴
下した。その後、50℃で4時間攪拌し、付加反応を行
った。
The above resin solution was added in the same ratio as in Example 1,
An ink composition was obtained in the same manner. [Comparative Example 2] 4,4'-Bismaleimidodiphenylmethane 35.8 was placed in a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet.
g and 100 g of dionsan were added and heated to 50 ° C. to dissolve. Then, a solution of 14.73 g of 4,4'-diaminodicyclohexylmethane in 18.0 g of dioxane was added dropwise at the same temperature. Then, it stirred at 50 degreeC for 4 hours, and performed the addition reaction.

【0026】上記樹脂溶液を、実施例1と同様の割合、
同様の方法でインキの組成物を得た。 [比較例3]温度計、攪拌装置、冷却器及び乾燥窒素ガ
ス吹き込み口を備えた200mlの四つ口フラスコに
4,4′−ビスマレイミドジフェニルメタン34.0
g、ジオキサン100gを加え50℃に加熱、溶解させ
た。次いで室温まで放冷後、3,9−ビス(3−アミノ
プロピル)−2,4,8,10テトラオキサスピロ
〔5,5〕ウンデカン18.2gのジオキサン21.8
g溶液を滴下した。その後、室温で20時間攪拌し、付
加反応を行った。
The above resin solution was added in the same ratio as in Example 1,
An ink composition was obtained in the same manner. [Comparative Example 3] 4,4'-Bismaleimidodiphenylmethane 34.0 was placed in a 200 ml four-necked flask equipped with a thermometer, a stirrer, a condenser and a dry nitrogen gas inlet.
g and 100 g of dioxane were added, and the mixture was heated to 50 ° C. and dissolved. Then, after cooling to room temperature, 3,9-bis (3-aminopropyl) -2,4,8,10 tetraoxaspiro [5,5] undecane 18.2 g of dioxane 21.8.
g solution was added dropwise. Then, the mixture was stirred at room temperature for 20 hours to carry out an addition reaction.

【0027】上記樹脂溶液を、実施例1と同様の割合、
同様の方法でインキの組成物を得た。
The resin solution was added in the same ratio as in Example 1,
An ink composition was obtained in the same manner.

【0028】次に、このようにして得たインキ組成物を
フレキシブルプリント基板の銅箔側に硬化後の塗膜の厚
さが約15μmになるようスクリーン印刷した。その
後、150℃の熱風乾燥炉で30分乾燥させ、さらに2
00〜250℃で3分加熱して硬化被膜を得た。
Next, the ink composition thus obtained was screen-printed on the copper foil side of the flexible printed circuit board so that the thickness of the coating film after curing was about 15 μm. After that, it is dried in a hot air drying oven at 150 ° C for 30 minutes, and further 2
It heated at 00-250 degreeC for 3 minutes, and obtained the hardened film.

【0029】硬化膜の特性を、硬度、可撓性、耐熱性、
密着性について評価した。その結果を表1に示した。硬
度は、JISK5400の鉛筆引っかき抵抗性試験を用
い、可撓性は、直径1mmの針金に試験片を180℃折
り曲げ、その後のひび、割れ、はがれを目視判定した。
耐熱性は、300℃のはんだ浴に試験片を10秒間フロ
ートさせた時の被膜の剥がれ、膨れ、変色を目視判定し
た。密着性はJISK5400碁盤目試験に準じてクロ
スカットし、セロハンテープを付着、次いで引き剥して
1〜100個の中の残存升目を数えた。
The characteristics of the cured film are hardness, flexibility, heat resistance,
The adhesion was evaluated. The results are shown in Table 1. For the hardness, the pencil scratch resistance test of JIS K5400 was used, and for the flexibility, the test piece was bent at 180 ° C. on a wire having a diameter of 1 mm, and thereafter cracks, cracks, and peeling were visually judged.
Regarding the heat resistance, peeling, swelling, and discoloration of the coating film when the test piece was floated in a solder bath at 300 ° C. for 10 seconds were visually judged. The adhesiveness was determined by cross-cutting in accordance with the JISK5400 cross cut test, attaching cellophane tape, and then peeling it off to count the remaining squares in 1 to 100 pieces.

【0030】[0030]

【表1】 [Table 1]

【0031】[0031]

【発明の効果】本発明によるポリイミドインキ組成物
は、従来硬化に高温が必要なため使用できなかった用途
に利用でき、かつ耐熱性、可撓性、密着性などで充分な
膜特性を備えたポリイミドインキ組成物である。フレキ
シブルプリント基板のカバーコートに使用すると、印刷
法によって信頼性の高い保護膜を形成することができる
ので、カバーレイフイルムの張り合わせ作業を要せず、
また、高価な金型を必要としないので設備費、材料費の
面でも極めて有利である。
EFFECTS OF THE INVENTION The polyimide ink composition according to the present invention can be used in applications where it could not be used because high temperature is conventionally required for curing, and has sufficient film characteristics such as heat resistance, flexibility and adhesion. It is a polyimide ink composition. When used as a cover coat of a flexible printed circuit board, a highly reliable protective film can be formed by a printing method, so that the work of laminating a coverlay film is unnecessary,
Further, since an expensive mold is not required, it is extremely advantageous in terms of equipment cost and material cost.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(I) 【化1】 (式中、nは1〜10の整数を示す)で表わされるポリ
イミドの末端のマレイミド基とジアミン化合物とを反応
させて得られるポリイミド樹脂を含有することを特徴と
するポリイミドインキ。
1. A compound represented by the following general formula (I) (In the formula, n represents an integer of 1 to 10) A polyimide ink containing a polyimide resin obtained by reacting a terminal maleimide group of a polyimide with a diamine compound.
【請求項2】 ジアミン化合物はポリイミド1モルに対
して0.3ないし1モルの割合であることを特徴とする
請求項1に記載のポリイミドインキ。
2. The polyimide ink according to claim 1, wherein the ratio of the diamine compound is 0.3 to 1 mol per 1 mol of the polyimide.
【請求項3】 ジアミン化合物は脂環式ジアミンである
ことを特徴とする請求項1または2に記載のポリイミド
インキ。
3. The polyimide ink according to claim 1, wherein the diamine compound is an alicyclic diamine.
【請求項4】 フィラーをポリイミド樹脂に対して固形
物換算量で2ないし20対100の割合で添加してある
請求項1ないし3のいずれかに記載のポリイミドイン
キ。
4. The polyimide ink according to claim 1, wherein the filler is added to the polyimide resin at a ratio of 2 to 20: 100 in terms of solid matter.
【請求項5】 フィラーの添加量が5ないし15対10
0の割合である請求項4に記載のポリイミドインキ。
5. The amount of filler added is 5 to 15:10.
The polyimide ink according to claim 4, which has a ratio of 0.
【請求項6】 フィラーはシリカまたはアルミナの微粉
末である請求項4または5のいずれかに記載のポリイミ
ドインキ。
6. The polyimide ink according to claim 4, wherein the filler is fine powder of silica or alumina.
【請求項7】 フィラーはシラン系カップリング剤で表
面処理されていることを特徴とする請求項4ないし6の
いずれかに記載のポリイミドインキ。
7. The polyimide ink according to claim 4, wherein the filler is surface-treated with a silane coupling agent.
JP14755594A 1994-06-29 1994-06-29 Polyimide ink Pending JPH0812914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14755594A JPH0812914A (en) 1994-06-29 1994-06-29 Polyimide ink

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14755594A JPH0812914A (en) 1994-06-29 1994-06-29 Polyimide ink

Publications (1)

Publication Number Publication Date
JPH0812914A true JPH0812914A (en) 1996-01-16

Family

ID=15432989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14755594A Pending JPH0812914A (en) 1994-06-29 1994-06-29 Polyimide ink

Country Status (1)

Country Link
JP (1) JPH0812914A (en)

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* Cited by examiner, † Cited by third party
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US6841425B2 (en) * 2001-10-30 2005-01-11 Samsung Electronics Co., Ltd. Wafer treatment method for protecting fuse box of semiconductor chip
JP2006036913A (en) * 2004-07-27 2006-02-09 Hitachi Chem Co Ltd Method for producing resin paste and resin paste
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841425B2 (en) * 2001-10-30 2005-01-11 Samsung Electronics Co., Ltd. Wafer treatment method for protecting fuse box of semiconductor chip
JP2006036913A (en) * 2004-07-27 2006-02-09 Hitachi Chem Co Ltd Method for producing resin paste and resin paste
WO2016114286A1 (en) * 2015-01-13 2016-07-21 日立化成株式会社 Resin composition, support with resin layer, prepreg, laminate, multilayered printed wiring board, and printed wiring board for millimeter-wave radar
JPWO2016114286A1 (en) * 2015-01-13 2017-11-02 日立化成株式会社 Resin composition, support with resin layer, prepreg, laminate, multilayer printed wiring board, and printed wiring board for millimeter wave radar
US11286346B2 (en) 2015-01-13 2022-03-29 Showa Denko Materials Co., Ltd. Resin composition, support with resin layer, prepreg, laminate, multilayered printed wiring board, and printed wiring board for millimeter-wave radar
JP2017110208A (en) * 2015-12-11 2017-06-22 ユニチカ株式会社 Oligoimide composition
JP2021105185A (en) * 2015-12-11 2021-07-26 ユニチカ株式会社 Oligoimide composition
JP2017145230A (en) * 2016-02-19 2017-08-24 ユニチカ株式会社 Production method of oligoimide with terminal maleimide
JP2018012764A (en) * 2016-07-20 2018-01-25 日立化成株式会社 Resin composition, resin layer-attached support, prepreg, laminate, multilayer printed board and printed wiring board for millimeter wave radar
JP2018021184A (en) * 2016-07-20 2018-02-08 ユニチカ株式会社 Manufacturing method of terminal maleimidized oligoimide
JP2020105210A (en) * 2020-03-05 2020-07-09 ユニチカ株式会社 Production method of oligoimide with terminal maleimide
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