JPH08127590A - 3'-glucosyladenosine derivative - Google Patents

3'-glucosyladenosine derivative

Info

Publication number
JPH08127590A
JPH08127590A JP22145995A JP22145995A JPH08127590A JP H08127590 A JPH08127590 A JP H08127590A JP 22145995 A JP22145995 A JP 22145995A JP 22145995 A JP22145995 A JP 22145995A JP H08127590 A JPH08127590 A JP H08127590A
Authority
JP
Japan
Prior art keywords
group
compound
formula
solvent
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22145995A
Other languages
Japanese (ja)
Inventor
Hitoshi Hotoda
仁 穂戸田
Masakatsu Kaneko
正勝 金子
Masaaki Takahashi
正明 高橋
Kazuhiko Tanzawa
和比古 丹沢
Hideji Takahashi
秀次 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sankyo Co Ltd
Original Assignee
Sankyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sankyo Co Ltd filed Critical Sankyo Co Ltd
Priority to JP22145995A priority Critical patent/JPH08127590A/en
Publication of JPH08127590A publication Critical patent/JPH08127590A/en
Pending legal-status Critical Current

Links

Landscapes

  • Saccharide Compounds (AREA)

Abstract

PURPOSE: To obtain the subject new derivative useful as a synthetic intermediate, etc., for substances raising Ca<2+> concentration by acting on inositol 1,4,5- triphosphate receptor, by condensing a specific adenosine derivative with a glucose derivative. CONSTITUTION: This new 3'-glucosyladenosine derivative is expressed by formula I [R<1> and R<2> are each an acyl; R<3> and R<5> are each a (substituted)benzyl, a trialkylsilyl, an alkoxyalkyl, etc.; R<4> is a (substituted)trrphenylmethyl or trialkylsilyl; R<6> to R<8> are each an acyl] and is useful as an important intermediate, etc., in the synthesis of adenophostins having activity to increase an intracellular calcium ion concentration by acting on inositol 1,4,5-triphosphate (InsP3) receptor. The derivative is obtained by condensing an adenosine derivative expressed by formula II with a glucose derivative expressed by formula III (X is an eliminable group).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、イノシトール1,4,
5−トリスホスフェート(InsP3)受容体に作用して
細胞内カルシウムイオン濃度を上昇させる活性を有する
アデノホスチン(adenophostin)類の合成における重要
中間体に関する。
The present invention relates to inositol 1,4.
The present invention relates to a key intermediate in the synthesis of adenophostins having an activity of acting on a 5-trisphosphate (InsP 3 ) receptor to increase intracellular calcium ion concentration.

【0002】[0002]

【従来の技術】Ca2+が細胞内情報伝達物質として神経
伝達や筋収縮及び細胞の増殖、分化に重要であることは
広く認められている。この細胞内へのCa2+の動員に、
イノシトール1,4,5−トリスホスフェート(Ins
3)は重要な役割を有している(Nature, 341 巻, 197-
205 頁(1989年))。すなわち、InsP3 は細胞膜のリ
ン脂質より生体内で生成し(同誌 312巻、 315〜321 頁
(1984年)、生成されたInsP3 は小胞体に存在する
InsP3 受容体に結合し(同誌 342巻、32〜38頁(19
89年)、その結果小胞体に貯蔵されているCa2+濃度を
上昇させる(同誌342巻、87〜89頁(1989年)。
2. Description of the Related Art It is widely accepted that Ca 2+ is important as an intracellular signal transmitter for neurotransmission, muscle contraction, cell proliferation and differentiation. To mobilize Ca 2+ into this cell,
Inositol 1,4,5-Trisphosphate (Ins
P 3 ) has an important role (Nature, 341, 197-
205 pages (1989)). That, InsP 3 is produced in vivo from phospholipids of cell membrane (ibid 312, pp. 315-321 (1984), InsP 3 thus generated bind to InsP 3 receptors located on the endoplasmic reticulum (ibid 342 Volume, Pages 32-38 (19
As a result, the Ca 2+ concentration stored in the endoplasmic reticulum is increased (Vol. 342, pp. 87-89 (1989)).

【0003】本発明者の高橋らは、InsP3 と同様に
InsP3 受容体に作用してCa2+濃度を上昇させる活
性を有する化合物として、式(II)のアデノホスチン
(Adenophostin)類をPenicillium brevicompactum SAN
K 11991 及びSANK 12177株の培養物より見い出した〔特
開平5−194580号公報、J. Antibiot. 47 巻、 95
-100頁(1994年)〕。
[0003] The present inventors Takahashi et al., The compound having the activity of increasing the Ca 2+ concentration acts similarly to InsP 3 receptors InsP 3, Penicillium the Adenohosuchin (Adenophostin) such formula (II) brevicompactum SAN
It was found from cultures of K 11991 and SANK 12177 strains [JP-A-5-194580, J. Antibiot. 47, 95.
-100 pages (1994)].

【0004】[0004]

【化3】 Embedded image

【0005】(式中、Rが水素原子を表すものはアデノ
ホスチンAであり、Rがアセチル基のものはアデノホス
チンBである) しかしながら、上記特開平5−194580号公報に記
載の醗酵法によってアデノホスチン類を大量生産するこ
とは困難であるので、本発明者らはアデノホスチン類の
全合成を試みた。
(In the formula, R represents a hydrogen atom is adenophostin A, and R represents an acetyl group is adenophostin B.) However, adenophostins are produced by the fermentation method described in JP-A-5-194580. Since it is difficult to mass-produce adenophosphine, the present inventors tried the total synthesis of adenophostins.

【0006】アデノホスチン類は上記式(II)に示すよ
うに、アデノシンの3´水酸基がグルコースにα配位で
グリコシル結合した特徴的な構造を有しているが、これ
までアデノシンの3´水酸基がグルコースによってグリ
コシル化された化合物の化学合成については知られてい
ない。F.W. Lichtenthalerらはリボヌクレオシドの5´
水酸基のグリコシル化について報告し〔Angew. Chem, 9
0 巻, 819-821 頁(1978年)〕、また鈴木らはアデノシ
ンの酵素的なグリコシル化によって5´水酸基がグリコ
シル化された化合物が優先的に得られることを報告して
いる(ビタミン、44巻、 196〜 200(1971年)が、いず
れもアデノシンの3´水酸基のグリコシル化ではない。
[0006] As shown in the above formula (II), adenophostins have a characteristic structure in which the 3'hydroxyl group of adenosine is glycosically bonded to glucose by α-coordinate, but until now, the 3'hydroxyl group of adenosine was Nothing is known about the chemical synthesis of compounds glycosylated by glucose. FW Lichtenthaler and colleagues 5'of ribonucleosides
Reported glycosylation of hydroxyl groups [Angew. Chem, 9
0, 819-821 (1978)], and Suzuki et al. Reported that the enzymatic glycosylation of adenosine preferentially yielded a compound in which the 5'hydroxyl group was glycosylated (vitamin, 44 Vol. 196-200 (1971), none of which is glycosylation of the 3'hydroxyl group of adenosine.

【0007】[0007]

【発明が解決しようとする課題】本発明はアデノホスチ
ン類の全合成を可能にする中間体として有用、かつ、新
規な3´−水酸基がグリコシル化されたアデノシン誘導
体を提供する。
DISCLOSURE OF THE INVENTION The present invention provides a novel 3'-hydroxyl-glycosylated adenosine derivative which is useful as an intermediate which enables the total synthesis of adenophostins.

【0008】[0008]

【課題を解決するための手段】本発明者らは、前記の課
題を解決すべく鋭意研究の結果、アデノシンの3´水酸
基がグルコシル化された式(I)の化合物の合成に成功
し、これを中間体としてアデノホスチン類の全合成を可
能にした。
Means for Solving the Problems As a result of intensive research to solve the above-mentioned problems, the present inventors succeeded in synthesizing a compound of formula (I) in which the 3'hydroxyl group of adenosine was glycosylated, and As an intermediate, it enabled the total synthesis of adenophostins.

【0009】[0009]

【化4】 [Chemical 4]

【0010】〔式中、R1 及びR2 は同一又は異なって
アシル基を表し、R3 及びR5 は同一又は異なって、置
換基を有していてもよいベンジル基、トリアルキルシリ
ル基、アルコキシアルキル基又はアルコキシアルコキシ
アルキル基を表し、R4 は置換基を有していてもよいト
リフェニルメチル基又はトリアルキルシリル基を表し、
6 、R7 及びR8 は同一又は異なってアシル基を表
す〕 上記式中、R1 及びR2 のアシル基としては、アルカノ
イル基、例えばアセチル、プロピオニル、ブチリル、イ
ソブチリル、ペンタノイル、ピバロイルのようなC2
8 のアルキルカルボニル基;クロロアセチル、ジクロ
ロアセチル、トリクロロアセチル、トリフルオロアセチ
ルのようなハロゲン化アルキルカルボニル基;メトキシ
アセチルのようなアルコキシアルキルカルボニル基、
2,2,2−トリクロロエトキシカルボニルのようなハ
ロゲン化アルコキシカルボニル基、並びに芳香族アシル
基、例えばベンゾイル、ブロモベンゾイル、クロロベン
ゾイル;トリメチルベンゾイル、トルオイル;アニソイ
ル、ニトロベンゾイル、2−(メトキシカルボニル)ベ
ンゾイルのようなハロゲン、低級アルキル、低級アルコ
キシ、ニトロ又は低級アルコキシカルボニルが置換して
いてもよいベンゾイル基、R1 とR2 が一緒になって示
すフタロイル基等が挙げられ、好ましくはアセチル及び
ベンゾイルである。
[In the formula, R 1 and R 2 are the same or different and each represents an acyl group, R 3 and R 5 are the same or different, and a benzyl group which may have a substituent, a trialkylsilyl group, Represents an alkoxyalkyl group or an alkoxyalkoxyalkyl group, R 4 represents a triphenylmethyl group or a trialkylsilyl group which may have a substituent,
R 6 , R 7 and R 8 are the same or different and represent an acyl group] In the above formula, the acyl group of R 1 and R 2 is an alkanoyl group such as acetyl, propionyl, butyryl, isobutyryl, pentanoyl and pivaloyl. Na C 2 ~
C 8 alkylcarbonyl group; halogenated alkylcarbonyl group such as chloroacetyl, dichloroacetyl, trichloroacetyl, trifluoroacetyl; alkoxyalkylcarbonyl group such as methoxyacetyl,
Halogenated alkoxycarbonyl groups such as 2,2,2-trichloroethoxycarbonyl, as well as aromatic acyl groups such as benzoyl, bromobenzoyl, chlorobenzoyl; trimethylbenzoyl, toluoyl; anisoyl, nitrobenzoyl, 2- (methoxycarbonyl) benzoyl. Examples thereof include a benzoyl group which may be substituted with halogen, lower alkyl, lower alkoxy, nitro or lower alkoxycarbonyl, a phthaloyl group represented by R 1 and R 2 together, and preferably acetyl and benzoyl. is there.

【0011】R3 及びR5 の置換基を有していてもよい
ベンジル基としては、ベンジル、4−ブロモベンジル、
4−クロロベンジル、4−フェニルベンジル、メトキシ
ベンジル、ジメトキシベンジル、ニトロベンジルのよう
なハロゲン、フェニル、低級アルコキシ又はニトロが置
換していてもよいベンジル等が;トリアルキルシリル基
としては、トリメチルシリル、トリエチルシリル、イソ
プロピルジメチルシリル、t−ブチルジメチルシリル、
メチルジ−t−ブチルシリル、トリイソプロピルシリル
等が;アルコキシアルキル基としては、メトキシメチ
ル、エトキシメチル、プロポキシメチル、イソプロポキ
シメチル、ブトキシメチル、t−ブトキシメチル、ベン
ジルオキシメチル等が;アルコキシアルコキシアルキル
基としては、2−メトキシエトキシメチル、2−エトキ
シエトキシメチル等が挙げられる。好ましいR3 及びR
5 はベンジル、4−ニトロベンジル、4−メトキシベン
ジル、3,4−ジメトキシベンジル、t−ブチルジメチ
ルシリル、2−メトキシエトキシメチル及びメトキシメ
チルである。
The benzyl group which may have a substituent for R 3 and R 5 is benzyl, 4-bromobenzyl,
4-chlorobenzyl, 4-phenylbenzyl, methoxybenzyl, dimethoxybenzyl, halogen such as nitrobenzyl, benzyl optionally substituted by phenyl, lower alkoxy or nitro; trialkylsilyl group includes trimethylsilyl and triethyl. Silyl, isopropyldimethylsilyl, t-butyldimethylsilyl,
Methyldi-t-butylsilyl, triisopropylsilyl and the like; as the alkoxyalkyl group, methoxymethyl, ethoxymethyl, propoxymethyl, isopropoxymethyl, butoxymethyl, t-butoxymethyl, benzyloxymethyl and the like; as the alkoxyalkoxyalkyl group Examples include 2-methoxyethoxymethyl and 2-ethoxyethoxymethyl. Preferred R 3 and R
5 is benzyl, 4-nitrobenzyl, 4-methoxybenzyl, 3,4-dimethoxybenzyl, t-butyldimethylsilyl, 2-methoxyethoxymethyl and methoxymethyl.

【0012】R4 の置換基を有してもよいトリフェニル
メチル基としては、トリフェニルメチル、4−メトキシ
トリフェニルメチル、4,4’−ジメトキシトリフェニ
ルメチル、4,4’,4”−トリメトキシトリフェニル
メチル、4−シアノトリフェニルメチルのような低級ア
ルコキシ又はシアノが置換していてもよいトリフェニル
メチル基が挙げられ;トリアルキルシリル基としては前
記R3 及びR5 で例示したものが挙げられる。好ましい
4 はトリフェニルメチル、4−メトキシトリフェニル
メチル、4,4’−ジメトキシトリフェニルメチル及び
t−ブチルジメチルシリルである。
Examples of the triphenylmethyl group which may have a substituent of R 4 include triphenylmethyl, 4-methoxytriphenylmethyl, 4,4'-dimethoxytriphenylmethyl, 4,4 ', 4 "-. Lower alkoxy such as trimethoxytriphenylmethyl, 4-cyanotriphenylmethyl or a triphenylmethyl group optionally substituted by cyano; examples of the trialkylsilyl group include those exemplified above for R 3 and R 5. Preferred R 4 is triphenylmethyl, 4-methoxytriphenylmethyl, 4,4′-dimethoxytriphenylmethyl and t-butyldimethylsilyl.

【0013】R6 、R7 及びR8 のアシル基としては、
前記R1 及びR2 で例示したものが挙げられ、好ましく
はアセチル及びベンゾイルである。
The acyl group of R 6 , R 7 and R 8 is
Examples thereof include those exemplified for R 1 and R 2 , and acetyl and benzoyl are preferable.

【0014】式(I)のうち好ましい化合物は表1〜表
5に例示することができ、対応するR1 及びR2 がアセ
チルである化合物及び/又は対応するR6 、R7 及びR
8 がベンゾイルである化合物も等しく好ましい。表中、
及び下記参考例におけるR1〜R8 の略語は次の基を表
す。
Preferred compounds of the formula (I) can be exemplified in Tables 1 to 5, wherein the corresponding R 1 and R 2 are acetyl and / or the corresponding R 6 , R 7 and R
Equally preferred are compounds where 8 is benzoyl. In the table,
The abbreviations R 1 to R 8 in the following Reference Examples represent the following groups.

【0015】Bz=ベンゾイル Ac=アセチル Bn=ベンジル PNBn=4−ニトロベンジル MPM=4−メトキシベンジル DMPM=3,4−ジメトキシベンジル TBDMS=t−ブチルジメチルシリル MEM=2−メトキシエトキシメチル MOM=メトキシメチル Tr=トリフェニルメチル MMTr=4−メトキシトリフェニルメチル DMTr=4,4’−ジメトキシトリフェニルメチルBz = benzoyl Ac = acetyl Bn = benzyl PNBn = 4-nitrobenzyl MPM = 4-methoxybenzyl DMPM = 3,4-dimethoxybenzyl TBDMS = t-butyldimethylsilyl MEM = 2-methoxyethoxymethyl MOM = methoxymethyl Tr = triphenylmethyl MMTr = 4-methoxytriphenylmethyl DMTr = 4,4′-dimethoxytriphenylmethyl

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】[0018]

【表3】 [Table 3]

【0019】[0019]

【表4】 [Table 4]

【0020】[0020]

【表5】 [Table 5]

【0021】上記表中、本発明の中間体として最も好ま
しい化合物は、次の化合物番号のものである。1、2、
6、7、11、12、41、42、46、47、51、
52、61、62、63、67、68、69、73、7
4、75、85、86、87、91、92、93、9
7、98、99、109、121、133、134、1
35、136及び137。
In the above table, the most preferred compounds as the intermediates of the present invention are those having the following compound numbers. 1, 2,
6, 7, 11, 12, 41, 42, 46, 47, 51,
52, 61, 62, 63, 67, 68, 69, 73, 7
4, 75, 85, 86, 87, 91, 92, 93, 9
7, 98, 99, 109, 121, 133, 134, 1
35, 136 and 137.

【0022】式(I)の化合物は、アデノシン誘導体
(III)にグルコース誘導体(IV)を縮合させることによ
り製造される。
The compound of formula (I) is produced by condensing a glucose derivative (IV) with an adenosine derivative (III).

【0023】[0023]

【化5】 Embedded image

【0024】(式中、R1 乃至R8 は前述のものと同意
義を表し、Xは脱離基を表す) 脱離基としては、アルカノイルオキシ基、イミドエーテ
ル基、アルキルチオ基又はハロゲン原子が挙げられ、こ
れら脱離基の種類により、次の好適な反応条件を選択し
て実施することができる。
(In the formula, R 1 to R 8 have the same meanings as described above, and X represents a leaving group.) Examples of the leaving group include an alkanoyloxy group, an imide ether group, an alkylthio group and a halogen atom. The following suitable reaction conditions can be selected and carried out depending on the types of these leaving groups.

【0025】Xがアルカノイルオキシ基である場合は、
例えばアセチルオキシ基であり、クロロホルム、1,2
−ジクロロエタンのようなハロゲン化炭化水素溶媒中、
活性化剤としてFeCl3 等のルイス酸の存在下に、−
20〜50℃で1時間〜1日間反応させる。
When X is an alkanoyloxy group,
For example, acetyloxy group, chloroform, 1,2
In a halogenated hydrocarbon solvent such as dichloroethane,
In the presence of a Lewis acid such as FeCl 3 as an activator,
The reaction is carried out at 20 to 50 ° C for 1 hour to 1 day.

【0026】Xがイミドエーテル基である場合は、例え
ばトリクロロアセトイミドエーテル基、N−メチルアセ
トイミドエーテル基であり、エーテル、ニトロメタンの
ような溶媒中で、活性化剤としてトシル酸又はトリメチ
ルシリルトリフレートのような酸触媒の存在下に−20
〜50℃で1〜24時間反応させる。
When X is an imide ether group, it is, for example, a trichloroacetimide ether group or an N-methylacetimide ether group, which is tosylic acid or trimethylsilyl triflate as an activator in a solvent such as ether or nitromethane. -20 in the presence of an acid catalyst such as
React at -50 ° C for 1-24 hours.

【0027】Xがアルキルチオ基である場合は、例えば
メチルチオ基であり、エーテル;1,2−ジクロロエタ
ン、ジクロロメタンのようなハロゲン化炭化水素又はト
ルエンのような芳香族炭化水素溶媒中で、活性化剤とし
てメチルトリフレート、臭化第二銅とBu4 NF、又は
銀トリフレートと臭素とテトラメチル尿素の存在下に、
−20〜50℃で1時間〜5日間反応させる。
When X is an alkylthio group, it is, for example, a methylthio group and is an ether; an activator in a halogenated hydrocarbon such as 1,2-dichloroethane, dichloromethane or an aromatic hydrocarbon solvent such as toluene. In the presence of methyl triflate, cupric bromide and Bu 4 NF, or silver triflate, bromine and tetramethylurea,
The reaction is carried out at -20 to 50 ° C for 1 hour to 5 days.

【0028】Xがフッ素原子である場合は、ベンゼン、
アセトニトリルのような溶媒中で、活性化剤としてSn
Cl2 、又はAgBF4 と(シクロペンタジエニル)2
rCl2 の存在下に、−20〜50℃で1〜48時間反
応させる。
When X is a fluorine atom, benzene,
Sn as an activator in a solvent such as acetonitrile
Cl 2 , or AgBF 4 and (cyclopentadienyl) 2 Z
The reaction is carried out in the presence of rCl 2 at −20 to 50 ° C. for 1 to 48 hours.

【0029】Xが塩素又は臭素原子である場合は、ジク
ロロメタン、クロロホルムのようなハロゲン化炭化水
素、DMF、エーテル、ニトロメタンのような溶媒中
で、活性化剤としてHgBr2 、Ag2 CO3 、銀トリ
フレートとコリジン、Et4 NBr、又はAgClO4
とコリジンの存在下に、さらに必要に応じてモレキュラ
シーブを使用して−50〜100℃で5時間〜7日間反
応させる。
When X is a chlorine or bromine atom, HgBr 2 , Ag 2 CO 3 , silver as an activator in a halogenated hydrocarbon such as dichloromethane or chloroform, a solvent such as DMF, ether or nitromethane. Triflate and Collidine, Et 4 NBr, or AgClO 4
And in the presence of collidine, further using molecular sieves at -50 to 100 ° C for 5 hours to 7 days, if necessary.

【0030】反応終了後、反応液をセライトを用いてろ
過し、濾液をクロロホルム等の不活性有機溶剤で希釈
し、0.01N HCl、5%NaHCO3 水、飽和食塩
水で順次洗浄し、硫酸マグネシウムで乾燥し、溶剤を留
去することにより目的物を得ることができる。
After completion of the reaction, the reaction solution was filtered through Celite, the filtrate was diluted with an inert organic solvent such as chloroform, washed with 0.01N HCl, 5% NaHCO 3 water and saturated saline solution in that order, and sulfuric acid was added. The desired product can be obtained by drying over magnesium and distilling off the solvent.

【0031】必要に応じて、シリカゲルクロマトグラフ
ィーを用いて精製することもできる。
If necessary, it can be purified by silica gel chromatography.

【0032】上記(III) の化合物は、R3 及びR4 の種
類により、次のA−1乃至4の方法で製造される。
The above compound (III) is produced by the following methods A-1 to A4 depending on the types of R 3 and R 4 .

【0033】(A−1法)R3 が置換基を有していても
よいベンジル基であり、R4 が置換基を有していてもよ
いトリフェニルメチル基又はトリアルキルシリル基であ
る化合物(III −1)は次の反応式に示す方法で製造さ
れる。
(Method A-1) Compound in which R 3 is a benzyl group which may have a substituent and R 4 is a triphenylmethyl group or a trialkylsilyl group which may have a substituent (III-1) is produced by the method represented by the following reaction formula.

【0034】[0034]

【化6】 [Chemical 6]

【0035】ここに原料の化合物(1−1)において、
3 がベンジルである化合物は、J.Org. Chem. 37, 339
8 (1972)に、R3 が4−メトキシベンジルである化合
物は、Chem. Lett. 189 (1982)に、またR3 が3,4−
ジメトキシベンジルである化合物は、Chem. Lett. 1005
(1986)に記載されている方法により製造できる。
In the starting compound (1-1),
The compound in which R 3 is benzyl is described in J. Org. Chem. 37 , 339.
8 (1972), R 3 is 4-methoxybenzyl, and Chem. Lett. 189 (1982), and R 3 is 3,4-.
The compound that is dimethoxybenzyl is Chem. Lett. 1005.
(1986).

【0036】第1工程は、それ自体3工程からなり、化
合物(1−1)に、ピリジン中、トリメチルシリルク
ロリドと−20〜50℃で、30分〜5時間反応させ、
この反応混合物にベンゾイルクロリド又はアセチルク
ロリド等を、−20〜50℃で、30分〜10時間反応
させ、次にこの反応混合物に少量の水を加え、−20
〜50℃で5分〜2時間反応させる。
The first step consists of 3 steps per se, and compound (1-1) is reacted with trimethylsilyl chloride in pyridine at -20 to 50 ° C for 30 minutes to 5 hours.
The reaction mixture is reacted with benzoyl chloride, acetyl chloride, or the like at -20 to 50 ° C for 30 minutes to 10 hours, and then a small amount of water is added to the reaction mixture to give -20
The reaction is carried out at -50 ° C for 5 minutes to 2 hours.

【0037】反応終了後、溶剤を留去し、残渣に塩化メ
チレンのような不活性溶剤を加え、5%NaHCO3
水、水で順次洗浄し、硫酸マグネシウムで乾燥させ、溶
媒を留去することにより目的物を得ることができる。
After completion of the reaction, the solvent was distilled off, an inert solvent such as methylene chloride was added to the residue, and 5% NaHCO 3 was added.
The desired product can be obtained by sequentially washing with water and water, drying over magnesium sulfate, and distilling off the solvent.

【0038】必要に応じて、シリカゲルクロマトグラフ
ィーを用いて精製することもできる。
If necessary, it can be purified by silica gel chromatography.

【0039】第2工程は、ピリジン又はDMF等の溶媒
中で化合物(1−2)にトリチルクロリド、4−メトキ
シフェニルジフェニルメチルクロリド、ジ(4−メトキ
シフェニル)フェニルメチルクロリド、t−ブチルジメ
チルシリルクロリド等を0〜100℃で30分〜7日間
反応させる。また、必要に応じて、イミダゾール類を活
性化剤として共存させてもよい。
In the second step, trityl chloride, 4-methoxyphenyldiphenylmethyl chloride, di (4-methoxyphenyl) phenylmethyl chloride and t-butyldimethylsilyl are added to compound (1-2) in a solvent such as pyridine or DMF. Chloride and the like are reacted at 0 to 100 ° C. for 30 minutes to 7 days. Moreover, you may make an imidazole coexist as an activator as needed.

【0040】反応終了後、少量の水を加え、溶媒を留去
する。残渣に酢酸エチルのような溶剤を加え、5%Na
HCO3 水で順次洗浄し、硫酸マグネシウムで乾燥し、
溶媒を留去することにより行うことができる。
After completion of the reaction, a small amount of water is added and the solvent is distilled off. Add a solvent such as ethyl acetate to the residue and add 5% Na.
Wash sequentially with HCO 3 water, dry over magnesium sulfate,
It can be carried out by distilling off the solvent.

【0041】必要に応じて、シリカゲルクロマトグラフ
ィーを用いて精製することもできる。
If necessary, it can be purified by silica gel chromatography.

【0042】(A−2法)R3 がトリアルキルシリル基
であり、R4 が置換基を有していてもよいトリフェニル
メチル基である化合物(III −2)は、次の反応式に示
す方法で製造される。
(Method A-2) The compound (III-2) in which R 3 is a trialkylsilyl group and R 4 is an optionally substituted triphenylmethyl group is represented by the following reaction formula. It is manufactured by the method shown.

【0043】[0043]

【化7】 [Chemical 7]

【0044】第3工程及び第4工程は、アデノシン(1
−3)を原料としてそれぞれ第1工程及び第2工程と同
様の反応条件でR1 、R2 及びR4 を導入し、第5工程
は、ピリジン又はDMF等の溶媒中で化合物(1−5)
にt−ブチルジメチルシリルクロリド等を−20〜50
℃で1時間〜5日間反応させてR3 を導入する。また、
第5工程では必要に応じて、イミダゾール類を活性化剤
として共存させてもよい。
The third and fourth steps are adenosine (1
-3) is used as a raw material and R 1 , R 2 and R 4 are introduced under the same reaction conditions as in the first step and the second step, respectively. In the fifth step, the compound (1-5 )
T-butyldimethylsilyl chloride, etc.
R 3 is introduced by reacting at 1 ° C. for 1 hour to 5 days. Also,
In the fifth step, imidazoles may coexist as an activator, if necessary.

【0045】(A−3法)R3 及びR4 がトリアルキル
シリル基である化合物(III −3)は、次の反応式に示
す方法で製造される。
(Method A-3) The compound (III-3) in which R 3 and R 4 are trialkylsilyl groups can be produced by the method shown in the following reaction formula.

【0046】[0046]

【化8】 Embedded image

【0047】第6工程は、ピリジン又はDMF等の溶媒
中で化合物(1−4)にt−ブチルジメチルシリルクロ
リド等を−20〜50℃で1〜7日間反応させる。ま
た、必要に応じて、イミダゾール類を活性化剤として共
存させてもよい。
In the sixth step, compound (1-4) is reacted with t-butyldimethylsilyl chloride or the like at -20 to 50 ° C. for 1 to 7 days in a solvent such as pyridine or DMF. Moreover, you may make an imidazole coexist as an activator as needed.

【0048】(A−4法)R3 がアルコキシアルキル基
又はアルコキシアルコキシアルキル基であり、R4 が置
換基を有していてもよいトリフェニルメチル基又はトリ
アルキルシリル基である化合物(III −4)は、次の反
応式に示す方法で製造される。
(Method A-4) A compound in which R 3 is an alkoxyalkyl group or an alkoxyalkoxyalkyl group and R 4 is a triphenylmethyl group or a trialkylsilyl group which may have a substituent (III- 4) is produced by the method represented by the following reaction formula.

【0049】[0049]

【化9】 [Chemical 9]

【0050】第7工程は、ピリジン中で化合物(1−
4)にテトライソプロピルジシロキサンジクロリドを−
20〜50℃で2時間〜3日間反応させる。
In the seventh step, the compound (1-
4) to tetraisopropyldisiloxane dichloride-
The reaction is carried out at 20 to 50 ° C for 2 hours to 3 days.

【0051】第8工程は、ジクロロメタン等の溶媒中で
化合物(1−6)にジイソプロピルエチルアミンのよう
な塩基の存在下にメトキシメチルクロリド又はメトキシ
エトキシメチルクロリド等を−20〜50℃で5時間〜
5日間反応させ、R3 を導入する。
In the eighth step, methoxymethyl chloride or methoxyethoxymethyl chloride or the like is added to compound (1-6) in the presence of a base such as diisopropylethylamine in a solvent such as dichloromethane at -20 to 50 ° C. for 5 hours to
After reacting for 5 days, R 3 is introduced.

【0052】第9工程は、THF溶媒中で化合物(1−
7)にテトラブチルアンモニウムフロリド等を−20〜
50℃で10分間〜5日間反応させる。
In the ninth step, the compound (1-
7) Tetrabutylammonium fluoride or the like in -20 to
The reaction is carried out at 50 ° C for 10 minutes to 5 days.

【0053】第10工程は、化合物(1−8)に第2工
程と同様の条件で反応させることによりR4 を導入す
る。
In step 10, R 4 is introduced by reacting compound (1-8) under the same conditions as in step 2.

【0054】他方の原料である式(IV)の化合物は、X
の脱離基の種類により、次のB−1〜5の方法で製造さ
れる。
The compound of the formula (IV) which is the other raw material is X
It is produced by the following methods B-1 to 5 depending on the type of the leaving group.

【0055】(B−1法)Xがアルカノイルオキシ基で
ある化合物(IV−1)は、次の反応式で示す方法で製造
される。
(Method B-1) The compound (IV-1) in which X is an alkanoyloxy group is produced by the method shown by the following reaction formula.

【0056】[0056]

【化10】 [Chemical 10]

【0057】第11工程は、出発物質がペンタアセチル
グルコース(2−1)である場合には、J. Am. Chem. S
oc. 74, 1498 (1952) に公知の方法で実施される。第1
1工程は、溶媒を使用せずに化合物(2−1)にピペリ
ジンを25±5℃で5分〜2時間作用させる。
The eleventh step is J. Am. Chem. S when the starting material is pentaacetyl glucose (2-1).
oc. 74 , 1498 (1952). First
In the first step, piperidine is allowed to act on compound (2-1) at 25 ± 5 ° C. for 5 minutes to 2 hours without using a solvent.

【0058】第12工程は、化合物(2−2)に置換基
を有していてもよいベンジルブロミド又はクロリド、t
−ブチルジメチルシリルクロリド、メトキシエトキシメ
チルクロリド又はメトキシメチルクロリド等を、Ag2
O、ジイソプロピルエチルアミンのような塩基の存在下
に−20〜50℃で10時間〜10日間反応させる。第
13工程は、アセトン−水−酢酸の混合溶媒中で化合物
(2−3)を還流下に1分間〜1時間処理する。
In the 12th step, benzyl bromide or chloride optionally having a substituent in compound (2-2), t
- butyldimethylsilyl chloride, methoxyethoxymethyl chloride or methoxymethyl chloride, etc., Ag 2
The reaction is carried out in the presence of O and a base such as diisopropylethylamine at −20 to 50 ° C. for 10 hours to 10 days. In the 13th step, compound (2-3) is treated under reflux in a mixed solvent of acetone-water-acetic acid for 1 minute to 1 hour.

【0059】第14工程は、ピリジン溶媒中で化合物
(2−4)に無水酢酸等を−20〜50℃で1時間〜2
日間反応させる。
In the fourteenth step, compound (2-4) is added with acetic anhydride or the like at -20 to 50 ° C. for 1 hour to 2 in a pyridine solvent.
React for days.

【0060】(B−2法)Xがイミドエーテル基である
化合物(IV−2)は、次の反応式で示す方法で製造され
る。
(Method B-2) The compound (IV-2) in which X is an imide ether group is produced by the method shown by the following reaction formula.

【0061】[0061]

【化11】 [Chemical 11]

【0062】第15工程は、ジクロロメタン溶媒中で、
水素化ナトリウムのような塩基の存在下に、化合物(2
−4)にトリクロロアセトニトリル等を−20〜50℃
で5分間〜10時間反応させる。
In the fifteenth step, in a dichloromethane solvent,
In the presence of a base such as sodium hydride, the compound (2
-4) with trichloroacetonitrile or the like at -20 to 50 ° C
And react for 5 minutes to 10 hours.

【0063】(B−3法)Xがアルキルチオ基である化
合物(IV−3)は、次の反応式で示す方法で製造され
る。
(Method B-3) The compound (IV-3) in which X is an alkylthio group can be produced by the method shown by the following reaction formula.

【0064】[0064]

【化12】 [Chemical 12]

【0065】第16工程は、無水酢酸を用いて第14工
程と同様に実施される。
The 16th step is carried out in the same manner as the 14th step using acetic anhydride.

【0066】第17工程は、クロロホルム、1,2−ジ
クロロエタンのようなハロゲン化炭化水素溶媒中で、化
合物(2−5)にBu3 SnSMe等を−20〜50℃
で1〜24時間反応させる。
[0066] Step 17 is chloroform, 1,2-halogenated hydrocarbon solvent such as dichloroethane, -20 to 50 ° C. The Bu 3 SnSMe like compound (2-5)
And react for 1 to 24 hours.

【0067】(B−4法)Xがフッ素原子である化合物
(IV−4)は、次の反応式で示す方法で製造される。
(Method B-4) The compound (IV-4) in which X is a fluorine atom is produced by the method shown by the following reaction formula.

【0068】[0068]

【化13】 [Chemical 13]

【0069】第18工程は、THF、ジクロロメタンの
ような溶媒中で、化合物(2−4)にEt2 NSF3
−20〜50℃で1〜24時間反応させる。
In the eighteenth step, compound (2-4) is reacted with Et 2 NSF 3 at −20 to 50 ° C. for 1 to 24 hours in a solvent such as THF and dichloromethane.

【0070】(B−5法)Xが塩素又は臭素原子である
化合物(IV−5)は、次の反応式で示す方法で製造され
る。
(Method B-5) The compound (IV-5) in which X is a chlorine or bromine atom is produced by the method represented by the following reaction formula.

【0071】[0071]

【化14】 Embedded image

【0072】第19工程は、ジクロロメタン、クロロホ
ルム、酢酸のような溶媒中で、化合物(2−5)にHB
r、TiBr4 、HCl、TiCl4 等を0〜100℃
で1〜24時間反応させる。
In the 19th step, HB was added to compound (2-5) in a solvent such as dichloromethane, chloroform or acetic acid.
r, TiBr 4 , HCl, TiCl 4 etc. at 0-100 ° C
And react for 1 to 24 hours.

【0073】本発明の式(I)の化合物は、例えば次の
反応式に示す方法によりアデノホスチンAを合成するこ
とができる。具体的には後記参考例を参照のこと。
With the compound of the formula (I) of the present invention, adenophostin A can be synthesized, for example, by the method shown in the following reaction scheme. For details, see the reference example below.

【0074】[0074]

【化15】 [Chemical 15]

【0075】[0075]

【化16】 Embedded image

【0076】[0076]

【実施例1】 (1)2´−O−(4−メトキシベンジル)−N,N−
ジベンゾイルアデノシン(1) 2´−O−(4−メトキシベンジル)アデニン〔H. Tak
aku et al., Chem. Lett., 189 (1982)〕2.022g
(5.22mmol)をピリジンと共沸させて乾燥した後
に、ピリジン50mlに溶解して氷水浴中で撹拌した。こ
れに塩化トリメチルシラン3.39ml(26.1mmol)
を加えて30分間撹拌した後に、塩化ベンゾイル3.1
3ml(26.1mmol)を加え、室温で撹拌した。2時間
後に、氷水浴中で冷却しながら水5mlを加えた。20分
後に溶媒を留去し、残渣を塩化メチレン200mlに溶か
し、5%NaHCO3 水200mlで2回洗浄してから有
機層をMgSO4 で乾燥させた。溶媒を留去した後に、
残渣を200g(230−400mesh)のシリカゲルカラ
ムにアプライし、1〜3%メタノール−塩化メチレンで
溶出して目的物0.846g を得た。単離しきれなかっ
た目的物を含む分画を60g(230−400mesh)のシ
リカゲルカラムに再度アプライして、1%メタノール−
塩化メチレンで溶出して目的物(1)0.9939g を
得た。したがって目的物の合計1.8399g(59%)
を得た。
Example 1 (1) 2'-O- (4-methoxybenzyl) -N, N-
Dibenzoyladenosine (1) 2'-O- (4-methoxybenzyl) adenine [H. Tak
aku et al., Chem. Lett., 189 (1982)] 2.022 g
(5.22 mmol) was azeotropically distilled with pyridine, dried, and then dissolved in 50 ml of pyridine and stirred in an ice-water bath. Trimethylsilane chloride 3.39 ml (26.1 mmol)
Was added and stirred for 30 minutes, and then benzoyl chloride 3.1 was added.
3 ml (26.1 mmol) was added and the mixture was stirred at room temperature. After 2 hours, 5 ml of water was added while cooling in an ice water bath. After 20 minutes, the solvent was distilled off, the residue was dissolved in 200 ml of methylene chloride, washed twice with 200 ml of 5% NaHCO 3 water, and then the organic layer was dried over MgSO 4 . After distilling off the solvent,
The residue was applied to a 200 g (230-400 mesh) silica gel column and eluted with 1 to 3% methanol-methylene chloride to obtain 0.846 g of the desired product. The fraction containing the target compound that could not be isolated was applied again to a 60 g (230-400 mesh) silica gel column, and 1% methanol-
Elution with methylene chloride gave 0.9939 g of the desired product (1). Therefore, the total amount of the target product is 1.8399 g (59%)
I got

【0077】1H-NMR(270MHz, CDCl3, TMS)δ: 8.51(s,
1H, H-8); 8.06(s, 1H, H-2); 7.87(d, J=7.26Hz, 4H,
Bz); 7.52(t, J=7.26Hz, 2H, Bz); 7.38(t, J=7.26Hz,
4H,Bz); 6.98(d, J=8.58Hz, 2H, MPM); 6.76(d, J=8.58
Hz, 2H, MPM); 5.91(d, J=7.26Hz, 1H, H-1'); 5.52(d,
J=11.21Hz, 1H, OH); 4.87(dd, J=7.26Hz, J=4.62Hz,
1H, H-2'); 4.52-4.32(m, 4H, H-3', H-4', PhCH2 ); 3.
95-3.65(m, 2H, H-5'); 3.75(s, 3H, CH3 O); 2.60(brs,
1H, OH). IR(CHCl3): 3300, 3000, 2925, 1705, 1599, 1579 MS: m/z 596(〔M+H 〕+) (2)2´−O−(4−メトキシベンジル)−5´−O
−(4−メトキシフェニルジフェニルメチル)−N,N
−ジベンゾイルアデノシン(2) 化合物(1)0.9939g(1.669mmol)をピリジ
ンと共沸させて乾燥した後に、ピリジン20mlに溶か
し、4−メトキシフェニルジフェニルメチルクロリド
0.773g(2.5mmol) を加えて室温で攪拌した。6
6時間後に水1mlを加えて反応を停止させ、溶媒を留去
した。残渣を酢酸エチル100mlに溶かし、5%NaH
CO3 水100mlで2回洗浄した後に、MgSO4 で乾
燥した。溶媒を留去した後に,100g(70−230
mesh)のシリカゲルカラムにアプライし、ヘキサン
−酢酸エチル(1:1、v/v)で溶出して目的物
(2)1.3206g(91%)を得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.51 (s,
1H, H-8); 8.06 (s, 1H, H-2); 7.87 (d, J = 7.26Hz, 4H,
Bz); 7.52 (t, J = 7.26Hz, 2H, Bz); 7.38 (t, J = 7.26Hz,
4H, Bz); 6.98 (d, J = 8.58Hz, 2H, MPM); 6.76 (d, J = 8.58
Hz, 2H, MPM); 5.91 (d, J = 7.26Hz, 1H, H-1 '); 5.52 (d,
J = 11.21Hz, 1H, OH); 4.87 (dd, J = 7.26Hz, J = 4.62Hz,
1H, H-2 '); 4.52-4.32 (m, 4H, H-3', H-4 ', PhC H 2 ); 3.
95-3.65 (m, 2H, H-5 '); 3.75 (s, 3H, C H 3 O); 2.60 (brs,
1H, OH). IR (CHCl 3 ): 3300, 3000, 2925, 1705, 1599, 1579 MS: m / z 596 ([M + H] + ) (2) 2′-O- (4-methoxybenzyl) -5'-O
-(4-Methoxyphenyldiphenylmethyl) -N, N
-Dibenzoyladenosine (2) Compound (1) 0.9939 g (1.669 mmol) was azeotroped with pyridine and dried, and then dissolved in 20 ml of pyridine and 0.773 g (2.5 mmol) of 4-methoxyphenyldiphenylmethyl chloride. Was added and the mixture was stirred at room temperature. 6
After 6 hours, 1 ml of water was added to stop the reaction, and the solvent was distilled off. The residue was dissolved in 100 ml of ethyl acetate and 5% NaH
After washing twice with 100 ml of CO 3 water, it was dried over MgSO 4 . After distilling off the solvent, 100 g (70-230
applied to a silica gel column of (mesh) and eluted with hexane-ethyl acetate (1: 1, v / v) to obtain 1.3206 g (91%) of the desired product (2).

【0078】1H-NMR(270MHz, CDCl3, TMS)δ: 8.55(s,
1H, H-8); 8.14(s, 1H, H-2); 7.88-6.75(m, 28H, Ar);
6.13(d, J=4.62Hz, 1H, H-1'); 4.75-4.59(m, 3H, H-
2', PhCH2 ); 4.35-4.30(m, 1H, H-3'); 4.24-4.20(m, 1
H, H-4'); 3.77(s, 3H, CH3 O); 3.76(s, 3H, CH3 O); 3.
50-3.28(m, 2H, H-5'); 2.61(d, J=5.28Hz, 1H, OH). IR(CHCl3): 3000, 2925, 1700, 1599, 1575, 1510 FAB-MS: m/z 868(〔M+H 〕+) (3)2´−O−(4−メトキシベンジル)−5´−O
−(4−メトキシフェニルジフェニルメチル)−3´−
O−(3″,4″、6″−トリ−O−アセチル−2″−
O−ベンジル−α−D−グルコピラノシル)−N,N−
ジベンゾイルアデノシン(3) 化合物(2)347mg(0.4mmol)と3,4,6−ト
リ−O−アセチル−2−O−ベンジル−α−D−グルコ
ピラノシルブロミド〔S. Brennan et al., J.Chem. So
c. (C) 1742 (1970)〕550.7mg(1.2mmol)をク
ロロホルム4mlに溶かし、モレキュラーシーブ(4A)
2g と、2,4,6−トリメチルピリジン160μl
(1.2mmol)及びAgClO4 249mg(1.2mmo
l)を加えて、室温で撹拌した。24時間後にセライト
でろ過し、クロロホルム100mlで希釈し、0.01N
HCl、5%NaHCO3 水、飽和食塩水の100mlづ
つで洗浄した後に、MgSO4 で乾燥した。溶媒を留去
した後に残渣を100g(70−230mesh)のシリカゲ
ルカラムにアプライし、ヘキサン−酢酸エチル(3:
2、v/v)で溶出して目的物(3)240.5mg(48
%)を得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.55 (s,
1H, H-8); 8.14 (s, 1H, H-2); 7.88-6.75 (m, 28H, Ar);
6.13 (d, J = 4.62Hz, 1H, H-1 '); 4.75-4.59 (m, 3H, H-
2 ', PhC H 2 ); 4.35-4.30 (m, 1H, H-3'); 4.24-4.20 (m, 1
H, H-4 '); 3.77 (s, 3H, C H 3 O); 3.76 (s, 3H, C H 3 O); 3.
50-3.28 (m, 2H, H- 5 '); 2.61 (d, J = 5.28Hz, 1H, O H) IR (CHCl 3):. 3000, 2925, 1700, 1599, 1575, 1510 FAB-MS: m / z 868 ([M + H] + ) (3) 2'-O- (4-methoxybenzyl) -5'-O
-(4-Methoxyphenyldiphenylmethyl) -3'-
O- (3 ", 4", 6 "-tri-O-acetyl-2"-
O-benzyl-α-D-glucopyranosyl) -N, N-
Dibenzoyladenosine (3) Compound (2) 347 mg (0.4 mmol) and 3,4,6-tri-O-acetyl-2-O-benzyl-α-D-glucopyranosyl bromide [S. Brennan et al. ., J. Chem. So
c. (C) 1742 (1970)] 550.7 mg (1.2 mmol) was dissolved in 4 ml of chloroform, and the molecular sieve (4A) was dissolved.
2 g and 160 μl of 2,4,6-trimethylpyridine
(1.2 mmol) and 249 mg of AgClO 4 (1.2 mmo
l) was added and the mixture was stirred at room temperature. After 24 hours, filter through Celite, dilute with 100 ml of chloroform, and add 0.01N
It was washed with 100 ml each of HCl, 5% aqueous NaHCO 3 and saturated saline and then dried over MgSO 4 . After distilling off the solvent, the residue was applied to a silica gel column of 100 g (70-230 mesh), and hexane-ethyl acetate (3:
2, v / v) to elute target product (3) 240.5 mg (48
%) Was obtained.

【0079】1H-NMR(270MHz, CDCl3, TMS)δ: 8.37(s,
1H, H-8); 8.03(s, 1H, H-2); 7.87-6.67(m, 33H, Ar);
6.09(d, J=6.60Hz, 1H, H-1'); 5.45(t, J=9.24Hz, 1
H, H-3"); 5.37(d, J=3.30Hz, 1H, H-1"); 5.04-4.98
(m, 2H, H-2', H-4"); 4.66-4.32(m, 6H, H-3', H-4',
PhCH2 ); 4.15-4.08(m, 2H, H-6"); 3.89(m, 1H, H-5");
3.77(s, 3H, CH3 O); 3.72(s, 3H, CH3 O); 3.62-3.57(m,
1H, H-2"); 3.57-3.27(m, 2H, H-5'); 2.01(m, 9H, A
c). IR(KBr): 3062, 3032, 2937, 1752, 1706, 1600, 1576 FAB-MS: m/z 1246(〔M+H 〕+)
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.37 (s,
1H, H-8); 8.03 (s, 1H, H-2); 7.87-6.67 (m, 33H, Ar);
6.09 (d, J = 6.60Hz, 1H, H-1 '); 5.45 (t, J = 9.24Hz, 1
H, H-3 "); 5.37 (d, J = 3.30Hz, 1H, H-1"); 5.04-4.98
(m, 2H, H-2 ', H-4 "); 4.66-4.32 (m, 6H, H-3', H-4 ',
PhC H 2 ); 4.15-4.08 (m, 2H, H-6 "); 3.89 (m, 1H, H-5");
3.77 (s, 3H, C H 3 O); 3.72 (s, 3H, C H 3 O); 3.62-3.57 (m,
1H, H-2 "); 3.57-3.27 (m, 2H, H-5 '); 2.01 (m, 9H, A
c). IR (KBr): 3062, 3032, 2937, 1752, 1706, 1600, 1576 FAB-MS: m / z 1246 ((M + H) + )

【0080】[0080]

【実施例2】 (1)N,N−ジベンゾイルアデノシン(5) アデノシン(4)5.34g(20mmol)をピリジンで
共沸して乾燥させた後に、ピリジン200mlに溶かし、
氷水浴中で撹拌した。塩化トリメチルシラン15.6ml
(120mmol)を加えて30分間撹拌した後に、塩化ベ
ンゾイル14.4ml(120mmol)を加え、氷水浴をは
ずして2時間撹拌した。反応後、再び氷水浴中で撹拌
し、水20mlを加えて撹拌した。30分後に溶媒を留去
し、残渣を水200mlに溶かし、酢酸エチル100mlづ
つで4回抽出し、硫酸マグネシウムで乾燥した。溶媒を
留去した後に、残渣を400g(70−230mesh)の
シリカゲルカラムにアプライし、3〜6%メタノール−
塩化メチレンで溶出して、目的物(5)7.84g(8
2%)を得た。
Example 2 (1) 5.34 g (20 mmol) of N, N-dibenzoyladenosine (5) adenosine (4) was azeotropically dried with pyridine and then dissolved in 200 ml of pyridine,
Stir in an ice water bath. Trimethylsilane chloride 15.6 ml
(120 mmol) was added and the mixture was stirred for 30 minutes, then 14.4 ml (120 mmol) of benzoyl chloride was added, and the ice water bath was removed and the mixture was stirred for 2 hours. After the reaction, the mixture was stirred again in an ice-water bath, 20 ml of water was added, and the mixture was stirred. After 30 minutes, the solvent was distilled off, the residue was dissolved in 200 ml of water, extracted four times with 100 ml of ethyl acetate each time, and dried over magnesium sulfate. After the solvent was distilled off, the residue was applied to a silica gel column of 400 g (70-230 mesh), and 3-6% methanol-
Elute with methylene chloride to obtain 7.84 g (8) of the desired product (5).
2%) was obtained.

【0081】1H-NMR(270MHz, CDCl3, TMS)δ:8.60(s,
1H, H-8); 8.18-7.32(m, 11H, Ph,H-6); 5.89(d, 1H, J
=6.60Hz, H-1'); 4.90-4.82(m, 1H, H-2'); 4.34(d, 1
H, J=4.62Hz, H-3'); 4.29(s, 1H, H-4'); 3.95-3.65
(m, 2H, H-5') .(2)5´−O−(4−メトキシフェニルジフェニルメ
チル)−N,N−ジベンゾイルアデノシン(6) 化合物(5)4.277g(8.99mmol)をピリジン
90mlに溶かし、4−メトキシフェニルジフェニルメチ
ルクロリド4.167g(13.49mmol)を加えて室
温で撹拌した。20時間後に水2mlを加えて、10分間
撹拌した後に溶媒を留去した。残渣を酢酸エチル300
mlに溶かし、5%NaHCO3 水300mlづつで3回洗
浄した後に、Na2 SO4 で乾燥した。溶媒を留去した
後に、残渣を150g(70−230mesh)のシリカゲ
ルカラムにアプライし、ヘキサン−酢酸エチル(1:
2、v/v)で溶出して、目的物(6)5.19g(77
%)を得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.60 (s,
1H, H-8); 8.18-7.32 (m, 11H, Ph, H-6); 5.89 (d, 1H, J
= 6.60Hz, H-1 '); 4.90-4.82 (m, 1H, H-2'); 4.34 (d, 1
H, J = 4.62Hz, H-3 '); 4.29 (s, 1H, H-4'); 3.95-3.65
(m, 2H, H-5 '). (2) 5'-O- (4-methoxyphenyldiphenylme
(CHIL ) -N, N-dibenzoyladenosine (6) Compound (5) 4.277 g (8.99 mmol) was dissolved in pyridine 90 ml, 4-methoxyphenyldiphenylmethyl chloride 4.167 g (13.49 mmol) was added, and room temperature was added. It was stirred at. After 20 hours, 2 ml of water was added, the mixture was stirred for 10 minutes, and then the solvent was distilled off. The residue is ethyl acetate 300
The extract was dissolved in 3 ml of water, washed with 300 ml of 5% NaHCO 3 water three times, and dried with Na 2 SO 4 . After distilling off the solvent, the residue was applied to a silica gel column of 150 g (70-230 mesh), and hexane-ethyl acetate (1:
2, v / v), and 5.19 g (77) of the target product (6).
%) Was obtained.

【0082】1H-NMR(270MHz, CDCl3, TMS)δ:8.60(s,
1H, H-8); 8.32(s, 1H, H-2); 7.87-6.73(m, 24H, Ph);
6.01(d, 1H, J=5.69MHz, H-1'); 5.10(brs, 1H, OH);
4.83-4.78(m, 1H, H-2'); 4.41-4.35(m, 2H, H-3', H-
4'); 3.76(s, 3H, CH3O); 3.50-3.23(m, 2H, H-5'); 2.
97(brs, 1H, OH). IR(KBr): 3436, 3060, 2933, 1706, 1599, 1576, 1510,
1449 MS: m/z 748 (〔M+H 〕+) (3)2´−O−(t−ブチルジメチルシリル)−5´
−O−(4−メトキシフェニルジフェニルメチル)−
N,N−ジベンゾイルアデノシン(7) 化合物(6)2.905g(3.885mmol)をピリジ
ン8mlに溶かし、t−ブチルジメチルシリルクロリド
1.756g(11.65mmol)を加え、室温で撹拌し
た。2日後に酢酸エチル300mlで希釈し、5%NaH
CO3 水200mlづつで2回洗浄した後に、MgSO4
で乾燥した。溶媒を留去した後に、残渣を300g(7
0−230mesh)のシリカゲルカラムにアプライし、ヘ
キサン−酢酸エチル(7:3、v/v)で溶出して、目的物
(7)0.8755gを得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.60 (s,
1H, H-8); 8.32 (s, 1H, H-2); 7.87-6.73 (m, 24H, Ph);
6.01 (d, 1H, J = 5.69MHz, H-1 '); 5.10 (brs, 1H, OH);
4.83-4.78 (m, 1H, H-2 '); 4.41-4.35 (m, 2H, H-3', H-
4 '); 3.76 (s, 3H, CH 3 O); 3.50-3.23 (m, 2H, H-5'); 2.
97 (brs, 1H, OH). IR (KBr): 3436, 3060, 2933, 1706, 1599, 1576, 1510,
1449 MS: m / z 748 ([M + H] + ) (3) 2'-O- (t-butyldimethylsilyl) -5 '
-O- (4-methoxyphenyldiphenylmethyl)-
2.905 g (3.885 mmol) of N, N-dibenzoyladenosine (7) compound (6) was dissolved in 8 ml of pyridine, 1.756 g (11.65 mmol) of t-butyldimethylsilyl chloride was added, and the mixture was stirred at room temperature. After 2 days, dilute with 300 ml of ethyl acetate and add 5% NaH.
After washing twice with 200 ml each of CO 3 water, MgSO 4
Dried in. After distilling off the solvent, 300 g (7
0-230 mesh) was applied to a silica gel column and eluted with hexane-ethyl acetate (7: 3, v / v) to obtain 0.8755 g of the desired product (7).

【0083】1H-NMR(270MHz, CDCl3, TMS)δ:8.56(s,
1H, H-8); 8.26(s, 1H, H-2); 7.87-6.79(m, 24H, Ph);
6.07(d, 1H, J=5.45Hz, H-1'); 5.01-4.96(m, 1H, H-
2');4.35-4.25(m, 2H, H-3', H-4'); 3.77(s, 3H, CH
3O); 3.56-3.33(m, 2H, H-5');2.66(d, 1H, J=3.85Hz,
OH); 0.82(s, 9H, tBu); -0.03(s, 3H, CH3 -Si); -0.21
(s, 3H, CH3 -Si). IR(KBr): 3538, 3061, 2952, 2930, 2858, 1708, 1600,
1576, 1510, 1449 MS: m/z 862 (〔M+H 〕+)(4)2´−O−(t−ブチルジメチルシリル)−5´
−O−(4−メトキシフェニルジフェニルメチル)−3
´−O−(3″,4″,6″−トリ−O−アセチル−
2″−O−ベンジル−α−D−グルコピラノシル)−
N,N−ジベンゾイルアデノシン(8) 化合物(7)86mg(0.1mmol)と3,4,6−トリ
−O−アセチル−2−O−ベンジル−α−D−グルコピ
ラノシルブロミド〔S. Brennan et al., J. Chem. Soc.
(C) 1742 (1970)〕138mg(0.3mmol)をクロロホ
ルム1mlに溶かし、モレキュラーシーブ(4A)0.5
gと2,4,6−トリメチルピリジン40μl (0.3
mmol)及びAgClO4 62mg(0.3mmol)を加え
て、室温で撹拌した。5日後にセライトでろ過し、クロ
ロホルム50mlで希釈し、0.01N HCl、5%Na
HCO3 水及び飽和食塩水のそれぞれ50mlづつで洗浄
した後に、MgSO4 で乾燥した。溶媒を留去した後
に、残渣を20g(70−230mesh)のシリカゲルカ
ラムにアプライし、ヘキサン−酢酸エチル(2:1、v/
v)で溶出して目的物(8)43.6mg(35%)を得
た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.56 (s,
1H, H-8); 8.26 (s, 1H, H-2); 7.87-6.79 (m, 24H, Ph);
6.07 (d, 1H, J = 5.45Hz, H-1 '); 5.01-4.96 (m, 1H, H-
2 '); 4.35-4.25 (m, 2H, H-3', H-4 '); 3.77 (s, 3H, CH
3 O); 3.56-3.33 (m, 2H, H-5 '); 2.66 (d, 1H, J = 3.85Hz,
OH); 0.82 (s, 9H, tBu); -0.03 (s, 3H, C H 3 -Si); -0.21
(s, 3H, C H 3 -Si). IR (KBr): 3538, 3061, 2952, 2930, 2858, 1708, 1600,
1576, 1510, 1449 MS: m / z 862 ([M + H] + ) (4) 2'-O- (t-butyldimethylsilyl) -5 '
-O- (4-methoxyphenyldiphenylmethyl) -3
′ -O- (3 ″, 4 ″, 6 ″ -tri-O-acetyl-
2 ″ -O-benzyl-α-D-glucopyranosyl)-
86 mg (0.1 mmol) of N, N-dibenzoyladenosine (8) compound (7) and 3,4,6-tri-O-acetyl-2-O-benzyl-α-D-glucopyranosyl bromide [S Brennan et al., J. Chem. Soc.
(C) 1742 (1970)] 138 mg (0.3 mmol) was dissolved in 1 ml of chloroform, and molecular sieve (4A) 0.5 was prepared.
g and 40 μl of 2,4,6-trimethylpyridine (0.3
mmol) and 62 mg (0.3 mmol) of AgClO 4 were added, and the mixture was stirred at room temperature. After 5 days, filter through Celite, dilute with 50 ml of chloroform, add 0.01N HCl, 5% Na.
After washing with 50 ml each of HCO 3 water and saturated saline, it was dried with MgSO 4 . After the solvent was distilled off, the residue was applied to a silica gel column of 20 g (70-230 mesh), and hexane-ethyl acetate (2: 1, v /
Elution with v) gave 43.6 mg (35%) of the desired product (8).

【0084】1H-NMR(270MHz, CDCl3, TMS)δ:8.48(s,
1H, H-8); 8.11(s, 1H, H-2); 7.86-6.78(m, 29H, Ph);
6.01(d, 1H, J=6.33Hz, H-1'); 5.48(t, 1H, J=9.68H
z, H-3"); 5,46(d, 1H, J=3.77Hz, H-1"); 5.19-5.14
(m, 1H, H-2'); 5.00(t, 1H, J=9.68Hz, H-4"); 4.75
(d, 1H, J=11.67Hz, PhCH); 4.57(d, 1H, J=11.67Hz, P
hCH); 4.45-4.30(m, 2H, H-3', H-4'); 4.18-4.08(m, 2
H, H-6"); 3.95-3.85(m, 1H, H-5"); 3.77(s, 3H, CH
3O); 3.66-3.60(m, 2H, H-2", H-5'a); 3.40-3.33(m,1
H, H-5'b); 2.01(s, 3H, Ac); 1.99(s, 3H, Ac); 1.98
(s, 3H, Ac); 0.72(s, 9H, tBu); -0.13(s, 3H, CH3 -S
i); -0.31(s, 3H, CH3 -Si). IR(KBr): 3062, 3033, 2953, 2931, 2858, 1752, 1703,
1600, 1576, 1510, 1450 MS: m/z 1240(〔M+H 〕+)
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.48 (s,
1H, H-8); 8.11 (s, 1H, H-2); 7.86-6.78 (m, 29H, Ph);
6.01 (d, 1H, J = 6.33Hz, H-1 '); 5.48 (t, 1H, J = 9.68H
z, H-3 "); 5,46 (d, 1H, J = 3.77Hz, H-1"); 5.19-5.14
(m, 1H, H-2 '); 5.00 (t, 1H, J = 9.68Hz, H-4 "); 4.75
(d, 1H, J = 11.67Hz, PhC H ); 4.57 (d, 1H, J = 11.67Hz, P
hC H ); 4.45-4.30 (m, 2H, H-3 ', H-4'); 4.18-4.08 (m, 2
H, H-6 "); 3.95-3.85 (m, 1H, H-5"); 3.77 (s, 3H, CH
3 O); 3.66-3.60 (m, 2H, H-2 ", H-5'a); 3.40-3.33 (m, 1
H, H-5'b); 2.01 (s, 3H, Ac); 1.99 (s, 3H, Ac); 1.98
(s, 3H, Ac); 0.72 (s, 9H, tBu); -0.13 (s, 3H, C H 3 -S
i); -0.31 (s, 3H, C H 3 -Si). IR (KBr): 3062, 3033, 2953, 2931, 2858, 1752, 1703,
1600, 1576, 1510, 1450 MS: m / z 1240 ((M + H) + )

【0085】[0085]

【参考例1】 (1)2´−O−(4−メトキシベンジル)−3´−O
−(3″,4″,6″−トリ−O−アセチル−2″−O
−ベンジル−α−D−グルコピラノシル)−N,N−ジ
ベンゾイルアデノシン(9) 実施例1で得られた化合物(3)240mg(0.192
mmol)をクロロホルム75mlに溶かし、氷水浴中で撹拌
した。ここにトリフルオロ酢酸1.5mlを加え、10分
間撹拌した後に、5%NaHCO3 水100mlを加え
た。有機層を5%NaHCO3 水100mlで洗浄した後
に、MgSO4 で乾燥した。溶媒を留去した後に、残渣
を60g(70−230mesh)のシリカゲルカラムにアプ
ライし、酢酸エチル−ヘキサン[(1:1、v/v)及び
(2:1、v/v)]で溶出して目的物(9)129.3mg
(69%)を得た。
Reference Example 1 (1) 2'-O- (4-methoxybenzyl) -3'-O
-(3 ", 4", 6 "-tri-O-acetyl-2" -O
-Benzyl-α-D-glucopyranosyl) -N, N-di
Benzoyl adenosine (9 ) 240 mg (0.192) of the compound (3) obtained in Example 1
mmol) in 75 ml of chloroform and stirred in an ice-water bath. To this, 1.5 ml of trifluoroacetic acid was added, and after stirring for 10 minutes, 100 ml of 5% NaHCO 3 water was added. The organic layer was washed with 100 ml of 5% aqueous NaHCO 3 and then dried over MgSO 4 . After distilling off the solvent, the residue was applied to a 60 g (70-230 mesh) silica gel column and eluted with ethyl acetate-hexane [(1: 1, v / v) and (2: 1, v / v)]. Target product (9) 129.3 mg
(69%) was obtained.

【0086】1H-NMR(270MHz, CDCl3, TMS)δ: 8.40(s,
1H, H-8); 7.90(s, 1H, H-2); 7.88-6.64(m, 19H, Ar);
5.94(d, J=8.17Hz, 1H, H-1'); 5.61-5.45(m, 3H, H-
1", H-3", OH); 5.03-4.93(m, 2H, H-2', H-4"); 4.73-
3.62(m, 12H, H-3', 4', 5',2", 5", 6", PhCH 2); 3.69
(s, 3H, CH3 O); 2.12(s, 3H, Ac); 2.04(s, 6H, Ac). IR(KBr): 2937, 1750, 1712, 1600, 1579, 1514 FAB-MS: m/z 974(〔M+H 〕+) (2)3′−O−(3″,4″,6″−トリ−O−アセ
チル−2″−O−ベンジル−α−D−グルコピラノシ
ル)−N,N−ジベンゾイルアデノシン(10) 化合物(9)126mg(0.129mmol)を塩化メチレ
ン1.3mlに溶かし、水0.14mlと2,3−ジクロロ
−5,6−ジシアノ−1,4−ベンゾキノン50mg
(0.22mmol)を加えて室温で撹拌した。41時間後
に不溶物をろ過し、塩化メチレンで洗浄した。ろ液と洗
浄液を合わせて5%NaHCO3 水と飽和食塩水100
mlづつで洗浄し、MgSO4 で乾燥した。溶媒を留去し
た後に、残渣を20g(70−230mesh)のシリカゲル
カラムにアプライし、酢酸エチル−ヘキサン(2:1、
v/v)で溶出して、目的物(10)88.3mg(80%)
を得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.40 (s,
1H, H-8); 7.90 (s, 1H, H-2); 7.88-6.64 (m, 19H, Ar);
5.94 (d, J = 8.17Hz, 1H, H-1 '); 5.61-5.45 (m, 3H, H-
1 ", H-3", OH); 5.03-4.93 (m, 2H, H-2 ', H-4 "); 4.73-
3.62 (m, 12H, H-3 ', 4', 5 ', 2 ", 5", 6 ", PhC H 2 ); 3.69
(s, 3H, C H 3 O); 2.12 (s, 3H, Ac); 2.04 (s, 6H, Ac). IR (KBr): 2937, 1750, 1712, 1600, 1579, 1514 FAB-MS: m / z 974 ([M + H] + ) (2) 3'-O- (3 ", 4", 6 "-tri-O-acetate
Chill-2 ″ -O-benzyl-α-D-glucopyranos
) -N, N-Dibenzoyladenosine (10) Compound (9) 126 mg (0.129 mmol) was dissolved in methylene chloride 1.3 ml, water 0.14 ml and 2,3-dichloro-5,6-dicyano-1. , 4-benzoquinone 50mg
(0.22 mmol) was added and the mixture was stirred at room temperature. After 41 hours, the insoluble matter was filtered and washed with methylene chloride. The filtrate and the washing solution are combined, and 5% NaHCO 3 water and saturated saline solution are added.
It was washed with each ml and dried over MgSO 4 . After evaporating the solvent, the residue was applied to a silica gel column of 20 g (70-230 mesh), and ethyl acetate-hexane (2: 1,
v / v) to elute the desired product (10) 88.3 mg (80%)
I got

【0087】1H-NMR(270MHz, CDCl3, TMS)δ: 8.59(s,
1H, H-8); 8.10(s, 1H, H-2); 7.90-7.25(m, 15H, Ar);
5.79(d, J=7.59Hz, 1H, H-1'); 5.70(d, J=10.88Hz, 1
H, OH); 5.54(t, J=9.73Hz, 1H, H-3"); 5.05-4.95(m,
3H, H-2', 1", 4"); 4.72(d,J=11.55Hz, 1H, PhCH 2);
4.61(d, J=11.55Hz, 1H, PhCH2 ); 4.43(d, J=5.28Hz,1
H, H-3'); 4.32-3.70(m, 8H, H-4', 5', 2", 5", 6", O
H); 2.08(s, 3H, Ac);2.07(s, 3H, Ac); 2.05(s, 3H, A
c). IR(KBr): 3468, 2935, 1751, 1713, 1600, 1578 FAB-MS: m/z 854(〔M+H 〕) (3)5′−O−〔ジ(4−メトキシフェニル)フェニ
ルメチル〕−3′−O−〔6″−O−ジ(4−メトキシ
フェニル)フェニルメチル−2″−O−ベンジル−α−
D−グルコピラノシル〕−N−〔ジ(4−メトキシフェ
ニル)フェニルメチル〕アデノシン(11) 化合物(10)87.5mg(0.102mmol)をピリ
ジン1mlに溶かし、29%アンモニア水4mlを加えて室
温で撹拌した。26時間後に溶媒を留去し、ピリジンに
よる共沸を3回行った。残渣をピリジン2mlに溶かし、
ジ(4−メトキシフェニル)フェニルメチルクロリド1
21mg(0.359mmol)を加えて室温で撹拌した。9
時間後に溶媒を留去し、残渣を酢酸エチル100mlに溶
かして、5%NaHCO3 水100mlづつで3回洗浄し
た。Na2 SO4 で乾燥後、溶媒を留去し、残渣を20
g(70−230mesh)のシリカゲルカラムにアプライ
し、0.5〜2%メタノール−塩化メチレンで溶出して
目的物(11)99.4mg(68%)を得た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 8.59 (s,
1H, H-8); 8.10 (s, 1H, H-2); 7.90-7.25 (m, 15H, Ar);
5.79 (d, J = 7.59Hz, 1H, H-1 '); 5.70 (d, J = 10.88Hz, 1
H, OH); 5.54 (t, J = 9.73Hz, 1H, H-3 "); 5.05-4.95 (m,
3H, H-2 ', 1 ", 4"); 4.72 (d, J = 11.55Hz, 1H, PhC H 2 );
4.61 (d, J = 11.55Hz, 1H, PhC H 2 ); 4.43 (d, J = 5.28Hz, 1
H, H-3 '); 4.32-3.70 (m, 8H, H-4', 5 ', 2 ", 5", 6 ", O
H); 2.08 (s, 3H, Ac); 2.07 (s, 3H, Ac); 2.05 (s, 3H, A
c). IR (KBr): 3468, 2935, 1751, 1713, 1600, 1578 FAB-MS: m / z 854 ([M + H] + ) (3) 5'-O- [di (4-methoxyphenyl) ) Pheny
Lumethyl] -3'-O- [6 "-O-di (4-methoxy)
Phenyl) phenylmethyl-2 "-O-benzyl-α-
D-glucopyranosyl] -N- [di (4-methoxyphen]
Nyl ) phenylmethyl] adenosine (11) Compound (10) (87.5 mg, 0.102 mmol) was dissolved in pyridine (1 ml), 29% aqueous ammonia (4 ml) was added, and the mixture was stirred at room temperature. After 26 hours, the solvent was distilled off, and azeotropic distillation with pyridine was performed three times. Dissolve the residue in 2 ml of pyridine,
Di (4-methoxyphenyl) phenylmethyl chloride 1
21 mg (0.359 mmol) was added and the mixture was stirred at room temperature. 9
After hours, the solvent was distilled off, the residue was dissolved in 100 ml of ethyl acetate and washed 3 times with 100 ml of 5% NaHCO 3 water. After drying over Na 2 SO 4 , the solvent was distilled off and the residue was washed with 20
It was applied to a silica gel column of g (70-230 mesh) and eluted with 0.5-2% methanol-methylene chloride to obtain 99.4 mg (68%) of the desired product (11).

【0088】1H-NMR(270MHz, 6mg in 0.5ml of CDCl3,
TMS)δ: 7.96(s, 1H, H-8); 7.83(s, 1H, H-2); 7.37-
6.66(m, 44H, Ar); 6.06(d, J=6.93Hz, 1H, H-1'); 4.8
2-3.10(m, 35H, H-2', 3', 4', 5', 1", 2", 3", 4",
5", 6", CH 3O, OH, PhCH 2). IR(KBr): 3412, 2929, 1607, 1509, 1465 FAB-MS: m/z 1426(〔M+H 〕+) (4)5′−O−〔ジ(4−メトキシフェニル)フェニ
ルメチル〕−2′−O−(O,O´−キシリルホスホ
ノ)−3´−O−〔2″−O−ベンジル−3″,4″−
O−ビス(O,O´−キシリルホスホノ)−6″−O−
〔ジ(4−メトキシフェニル)フェニルメチル〕〕−N
−〔ジ(4−メトキシフェニル)フェニルメチル〕アデ
ノシン(12) 化合物(11)58.5mg(0.041mmol)に1H−
テトラゾール20mg(0.287mmol)を加え、ピリジ
ンと共沸させて乾燥した。残渣をアセトニトリル1mlに
溶かし、2−ジエチルアミノ−1,3,2−ベンゾジオ
キサホスフェパン〔Y. Watanabe et al., Tetrahedron
Lett,, 31, 255 (1990) 〕を加え、室温で撹拌した。3
0分後に反応液を−40℃に冷却し、アセトニトリル1
mlに溶かしたメタクロロ過安息香酸64mg(0.369
mmol)を加えて、室温にもどしながら20分間撹拌し
た。反応液を塩化メチレン100mlで希釈した後に、1
0%Na225 水、0.01N HCl及び5%Na
HCO3 水の100mlづつで洗浄し、Na2 SO4 で乾
燥した。溶媒を留去し、残渣を10g(70−230mes
h)のシリカゲルカラムにアプライし、0.5〜1.5
%メタノール−塩化メチレンで溶出して目的物(12)
75.9mg(93%)を得た。
1 H-NMR (270 MHz, 6 mg in 0.5 ml of CDCl 3 ,
TMS) δ: 7.96 (s, 1H, H-8); 7.83 (s, 1H, H-2); 7.37-
6.66 (m, 44H, Ar); 6.06 (d, J = 6.93Hz, 1H, H-1 '); 4.8
2-3.10 (m, 35H, H-2 ', 3', 4 ', 5', 1 ", 2", 3 ", 4",
5 ", 6", C H 3 O, OH, PhC H 2 ). IR (KBr): 3412, 2929, 1607, 1509, 1465 FAB-MS: m / z 1426 ([M + H] + ) (4 ) 5'-O- [di (4-methoxyphenyl) phenyl
Lumethyl] -2'-O- (O, O'-xylylphospho
No) -3'-O- [2 "-O-benzyl-3", 4 "-
O-bis (O, O'-xylylphosphono) -6 "-O-
[Di (4-methoxyphenyl) phenylmethyl]]-N
-[Di (4-methoxyphenyl) phenylmethyl] ade
1H- in 58.5 mg (0.041 mmol) of nosin (12) compound (11)
20 mg (0.287 mmol) of tetrazole was added, and the mixture was azeotropically distilled with pyridine and dried. The residue was dissolved in 1 ml of acetonitrile, and 2-diethylamino-1,3,2-benzodioxaphosphane [Y. Watanabe et al., Tetrahedron was used.
Lett ,, 31 , 255 (1990)] was added and stirred at room temperature. Three
After 0 minutes, the reaction solution was cooled to -40 ° C, and acetonitrile 1
64 mg of metachloroperbenzoic acid dissolved in 0.3 ml (0.369
mmol) was added and the mixture was stirred for 20 minutes while returning to room temperature. After diluting the reaction solution with 100 ml of methylene chloride, 1
0% Na 2 S 2 O 5 water, 0.01N HCl and 5% Na
It was washed with 100 ml of HCO 3 water and dried over Na 2 SO 4 . The solvent was distilled off, and 10 g (70-230 mes) of the residue was added.
Apply to h) silica gel column, 0.5 ~ 1.5
Elution with% methanol-methylene chloride (12)
Obtained 75.9 mg (93%).

【0089】1H-NMR(270MHz, CDCl3, TMS)δ: 7.94(s,
1H, H-8); 7.88(s, 1H, H-2); 7.50-6.65(m, 56H, Ar);
6.42(d, J=6.94Hz, 1H, H-1'); 5.91(m, 1H, H-2');
5.48-4.13(m, 21H, H-3', 4', 5', 1", 3", 4", PhC
H2 ); 3.75-3.24(m, 22H, H-2", 5", 6", CH3 O). IR(KBr): 2928, 1607, 1509, 1465 FAB-MS: m/z 1972(〔M+H 〕+) (5)アデノホスチンA(13) 化合物(12)36.4mg(0.0184mmol)を80
%酢酸3mlに溶かし、1時間放置した後に溶媒を留去
し、エタノールで数回共沸した。残渣をエタノール3ml
と水1mlに溶かし、Pd−黒3mgを加えて、水素雰囲気
下(1気圧)で撹拌した。24時間後に、セライトでろ
過し、希アンモニア水とエタノールで洗い込んだ。ろ液
と洗浄液を合わせて溶媒を留去し、残渣を水と酢酸エチ
ル20mlづつで分液して水層を濃縮した後に凍結乾燥し
てアデノホスチンA(13)12.2mg(92%)を得
た。
1 H-NMR (270 MHz, CDCl 3 , TMS) δ: 7.94 (s,
1H, H-8); 7.88 (s, 1H, H-2); 7.50-6.65 (m, 56H, Ar);
6.42 (d, J = 6.94Hz, 1H, H-1 '); 5.91 (m, 1H, H-2');
5.48-4.13 (m, 21H, H-3 ', 4', 5 ', 1 ", 3", 4 ", PhC
H 2 ); 3.75-3.24 (m, 22H, H-2 ", 5", 6 ", C H 3 O). IR (KBr): 2928, 1607, 1509, 1465 FAB-MS: m / z 1972 ( [M + H] + ) (5) Adenophostin A (13) Compound (12) 36.4 mg (0.0184 mmol) 80
% Acetic acid 3 ml, the mixture was allowed to stand for 1 hour, then the solvent was distilled off and azeotropically distilled several times with ethanol. 3 ml of the residue is ethanol
And dissolved in 1 ml of water, 3 mg of Pd-black was added, and the mixture was stirred under a hydrogen atmosphere (1 atm). After 24 hours, the mixture was filtered through Celite and washed with diluted aqueous ammonia and ethanol. The filtrate and the washing solution were combined, the solvent was distilled off, the residue was separated with water and 20 ml of ethyl acetate each time, the aqueous layer was concentrated, and then freeze-dried to obtain 12.2 mg (92%) of adenophostin A (13). It was

【0090】1H-NMR(270MHz, D2O, 内部標準としてDOH
(4.7ppm) )δ:8.22(s, 1H, H−8);
8.11(s, 1H, H−2); 6.19(d,
J=6.4Hz, 1H, H−1’); 5.27
(d, J=3.3Hz, 1H, H−1”);
5.18(m, 1H, H−2’); 4.55
(m, 1H, H−3’); 4.43−4.32
(m, 2H, H−4’, H−3”); 3.96
−3.60(m, 7H, H−5’, 2”,
4”, 5”, 6”). IR(KBr): 3174, 1656, 140
2, 1044, 939 FAB−MS: m/z 668([M−H]);
m/z 670([M+H]
1 H-NMR (270 MHz, D 2 O, DOH as internal standard
(4.7 ppm)) δ: 8.22 (s, 1H, H-8);
8.11 (s, 1H, H-2); 6.19 (d,
J = 6.4 Hz, 1H, H-1 ′); 5.27
(D, J = 3.3 Hz, 1H, H-1 ″);
5.18 (m, 1H, H-2 '); 4.55
(M, 1H, H-3 ′); 4.43-4.32
(M, 2H, H-4 ', H-3 "); 3.96
-3.60 (m, 7H, H-5 ', 2 ",
4 ", 5", 6 "). IR (KBr): 3174, 1656, 140
2, 1044, 939 FAB-MS: m / z 668 ([M-H] - );
m / z 670 ([M + H] + )

───────────────────────────────────────────────────── フロントページの続き (72)発明者 丹沢 和比古 東京都品川区広町1丁目2番58号 三共株 式会社内 (72)発明者 高橋 秀次 東京都品川区広町1丁目2番58号 三共株 式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor, Waiko, 1-2-2, Hiromachi, Shinagawa-ku, Tokyo Sankyo stock company (72) Hideji Takahashi, 1-258, Hiromachi, Shinagawa-ku, Tokyo Sankyo stock company

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】下記の構造式(I)で示されるアデノホス
チン類中間体化合物。 【化1】 (式中、R1 及びR2 は同一又は異なってアシル基を表
し、R3 及びR5 は同一又は異なって、置換基を有して
いてもよいベンジル基、トリアルキルシリル基、アルコ
キシアルキル基又はアルコキシアルコキシアルキル基を
表し、R4 は置換基を有していてもよいトリフェニルメ
チル基又はトリアルキルシリル基を表し、R6 、R7
びR8 は同一又は異なってアシル基を表す)
1. An adenophostin intermediate compound represented by the following structural formula (I): Embedded image (In the formula, R 1 and R 2 are the same or different and represent an acyl group, and R 3 and R 5 are the same or different, and may have a benzyl group, a trialkylsilyl group, an alkoxyalkyl group. Or an alkoxyalkoxyalkyl group, R 4 represents an optionally substituted triphenylmethyl group or a trialkylsilyl group, and R 6 , R 7 and R 8 are the same or different and represent an acyl group)
【請求項2】R1 及びR2 はベンゾイル基又はアセチル
基を表し、R3 及びR5 は同一又は異なって、ベンジル
基、4−ニトロベンジル基、4−メトキシベンジル基、
3,4−ジメトキシベンジル基、t−ブチルジメチルシ
リル基、メトキシメチル基又は2−メトキシエトキシメ
チル基を表し、R4 はトリフェニルメチル基、4−メト
キシトリフェニルメチル基、4,4’−ジメトキシトリ
フェニルメチル基又はt−ブチルジメチルシリル基を表
し、R6 、R7 及びR8 はベンゾイル基又はアセチル基
を表す、請求項1の化合物。
2. R 1 and R 2 represent a benzoyl group or an acetyl group, and R 3 and R 5 are the same or different and each represents a benzyl group, a 4-nitrobenzyl group, a 4-methoxybenzyl group,
3,4-dimethoxybenzyl group, t-butyldimethylsilyl group, methoxymethyl group or 2-methoxyethoxymethyl group, R 4 is triphenylmethyl group, 4-methoxytriphenylmethyl group, 4,4′-dimethoxy The compound according to claim 1, wherein the compound represents a triphenylmethyl group or a t-butyldimethylsilyl group, and R 6 , R 7 and R 8 represent a benzoyl group or an acetyl group.
【請求項3】式(III)で示されるアデノシン誘導体に式
(IV)で示されるグルコース誘導体を縮合させる請求項
1のアデノホスチン中間体化合物(I)の製造法。 【化2】 (式中、R1 及びR2 は同一又は異なってアシル基を表
し、R3 及びR5 は同一又は異なって、置換基を有して
いてもよいベンジル基、トリアルキルシリル基、アルコ
キシアルキル基又はアルコキシアルコキシアルキル基を
表し、R4 は置換基を有していてもよいトリフェニルメ
チル基又はトリアルキルシリル基を表し、R6 、R7
びR8 は同一又は異なってアシル基を表し、Xは脱離基
を表す)
3. A process for producing an adenophostin intermediate compound (I) according to claim 1, wherein the adenosine derivative represented by the formula (III) is condensed with the glucose derivative represented by the formula (IV). Embedded image (In the formula, R 1 and R 2 are the same or different and represent an acyl group, and R 3 and R 5 are the same or different, and may have a benzyl group, a trialkylsilyl group, an alkoxyalkyl group. Or an alkoxyalkoxyalkyl group, R 4 represents an optionally substituted triphenylmethyl group or a trialkylsilyl group, R 6 , R 7 and R 8 are the same or different and represent an acyl group, X represents a leaving group)
JP22145995A 1994-09-07 1995-08-30 3'-glucosyladenosine derivative Pending JPH08127590A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22145995A JPH08127590A (en) 1994-09-07 1995-08-30 3'-glucosyladenosine derivative

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6-213729 1994-09-07
JP21372994 1994-09-07
JP22145995A JPH08127590A (en) 1994-09-07 1995-08-30 3'-glucosyladenosine derivative

Publications (1)

Publication Number Publication Date
JPH08127590A true JPH08127590A (en) 1996-05-21

Family

ID=26519961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22145995A Pending JPH08127590A (en) 1994-09-07 1995-08-30 3'-glucosyladenosine derivative

Country Status (1)

Country Link
JP (1) JPH08127590A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012105542A1 (en) * 2011-02-01 2012-08-09 株式会社林原生物化学研究所 External preparation for skin
US8877121B2 (en) 2007-12-20 2014-11-04 Ati Properties, Inc. Corrosion resistant lean austenitic stainless steel

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8877121B2 (en) 2007-12-20 2014-11-04 Ati Properties, Inc. Corrosion resistant lean austenitic stainless steel
WO2012105542A1 (en) * 2011-02-01 2012-08-09 株式会社林原生物化学研究所 External preparation for skin
CN103501757A (en) * 2011-02-01 2014-01-08 株式会社林原 External preparation for skin
JPWO2012105542A1 (en) * 2011-02-01 2014-07-03 株式会社林原 Topical skin preparation
JP5913138B2 (en) * 2011-02-01 2016-04-27 株式会社林原 Topical skin preparation
US9492368B2 (en) 2011-02-01 2016-11-15 Hayashibara Co., Ltd. External preparation for skin

Similar Documents

Publication Publication Date Title
EP0576229A1 (en) Low temperature process for preparing alpha-anomer enriched 2-deoxy-2, 2-difluoro-D-ribofuranosyl sulfonates
Verdegaal et al. Acid-catalysed isomerization of the tetraisopropyldisiloxane-1, 3-diyl group. Simultaneous protection of two secondary alcoholic functions.
EP0508792A1 (en) Anti-tumor and anti-psoriatic agents
JP7146067B2 (en) Preparation of Intermediates Useful for Synthesis of SGLT Inhibitors
JPH08127590A (en) 3&#39;-glucosyladenosine derivative
US5508393A (en) Process for the preparation of ribonucleotide reductase inhibitors
KR100255258B1 (en) A process for the preparation of ribonucleotide reductase inhibitors
JP3138834B2 (en) Method for producing fucopyranose analog and intermediate compound thereof
Brandstetter et al. α-Azidoesters as divergent intermediates for combinatorial generation of glucofuranose libraries of novel N-linked glycopeptides
JP3194581B2 (en) Gibberellin separation method
JP3046359B2 (en) D-pentofuranose derivative and method for producing the same
JP3165420B2 (en) D-pentofuranose derivative and method for producing the same
Pankiewicz et al. Nucleosides. 130. Synthesis of 2′‐Deoxy‐2′‐substituted‐and 5′‐Deoxy‐5′‐substituted‐ψ‐uridine Derivatives. Crystalline and Molecular Structure of 2′‐Chloro‐2′‐deoxy‐1, 3‐dimethyl‐ψ‐uridine. Studies Directed Toward the Synthesis of 2′‐Deoxy‐2′‐substituted‐arabino‐Nucleosides. 1
JP3049565B2 (en) Method for producing trehalose isomer
JPH05230058A (en) 4&#39;-carbon substituted pyrimidine nucleoside and its production
JPH09507864A (en) Taxane derivative
JPH0655754B2 (en) 3-deoxymycaminosyl tylonolide compound
JP2784658B2 (en) Hygromycin synthetic intermediate
JP2832356B2 (en) Synthetic intermediates and production methods for hygromycins
JPS62240622A (en) Antitumor substance
JPH01104092A (en) Nucleoside derivative
JPH07109289A (en) 1&#39;-position carbon-substituted pyrimidine nucleoside and production thereof
JPH08119987A (en) Gla-60 analog
JP2003252891A (en) Intermediate for synthesizing cytosaminomycin and method for producing the same
JPH04264082A (en) Novel oxetanocyl maleimide derivative and its production