JPH0812621A - Purification of lactic acid ester - Google Patents

Purification of lactic acid ester

Info

Publication number
JPH0812621A
JPH0812621A JP17047894A JP17047894A JPH0812621A JP H0812621 A JPH0812621 A JP H0812621A JP 17047894 A JP17047894 A JP 17047894A JP 17047894 A JP17047894 A JP 17047894A JP H0812621 A JPH0812621 A JP H0812621A
Authority
JP
Japan
Prior art keywords
lactic acid
acid ester
absorption
activated carbon
ethyl lactate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17047894A
Other languages
Japanese (ja)
Other versions
JP3862290B2 (en
Inventor
Taketaka Matsuzaki
威毅 松崎
Norio Takahashi
則雄 高橋
Michihiko Saotome
道彦 五月女
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toho Chemical Industry Co Ltd
Original Assignee
Toho Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toho Chemical Industry Co Ltd filed Critical Toho Chemical Industry Co Ltd
Priority to JP17047894A priority Critical patent/JP3862290B2/en
Publication of JPH0812621A publication Critical patent/JPH0812621A/en
Application granted granted Critical
Publication of JP3862290B2 publication Critical patent/JP3862290B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide a process for the purification of a lactic acid ester useful as a safe solvent for a photoresist resin having high dissolving power of the resin. CONSTITUTION:A lactic acid ester produced by a fermentation process is purified by distilling the ester after treating with an activated carbon to lower the absorption of UV of <=300nm wavelength. This process gives a high-purity lactic acid ester having UV absorption at 280nm decreased to <=1, a purity of >=99.9% and a low metal content (<=10ppb).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、乳酸エステルの精製方
法に関する。更に詳しくは、醗酵法で製造された乳酸を
原料として製造された乳酸エステルを活性炭処理した
後、蒸留精製することを特徴とするフォトレジスト用溶
剤として有用な乳酸エステルの精製方法に関する。
FIELD OF THE INVENTION The present invention relates to a method for purifying a lactate ester. More specifically, the present invention relates to a method for purifying a lactic acid ester useful as a solvent for a photoresist, which comprises subjecting a lactic acid ester produced from a lactic acid produced by a fermentation method as a raw material to active carbon treatment and then performing distillation purification.

【0002】[0002]

【従来の技術】従来、リゾグラフィ技術を利用して製造
される半導体ディバイス、プリント配線板、あるいは印
刷板などの広範囲な分野で用いられるフォトレジスト樹
脂溶剤としては、エチルセロソルブアセテ−ト(以下E
CAと呼ぶ)、ピルビン酸エチル、ジグライム、メチル
セロソルブアセテ−ト等の有機溶剤が用いられてきた。
特に、ECAはフォトレジスト用溶剤として優れた性能
が評価され、その主流を占めてきた。
2. Description of the Related Art Conventionally, as a photoresist resin solvent used in a wide range of fields such as semiconductor devices, printed wiring boards, and printed boards manufactured by utilizing the lithography technique, ethyl cellosolve acetate (hereinafter referred to as E
CA), ethyl pyruvate, diglyme, methyl cellosolve acetate, etc. have been used.
In particular, ECA has been dominated by its excellent performance as a photoresist solvent.

【発明が解決しようとする課題】[Problems to be Solved by the Invention]

【0003】しかし、ECAが体内に吸収されると生殖
機能等の障害が出ることが発表されて以来、ECA代替
溶剤の早急な出現が当該業界より強く要望されてきてい
る。この様な状況の中でECA代替溶剤として、乳酸エ
ステル、特に乳酸エチルがレジスト樹脂の溶解性の良い
こと、あるいは安全性が高いこと等からフォトレジスト
樹脂の溶剤として検討されている。
However, since it was announced that reproductive function and other disorders would occur when ECA is absorbed into the body, there has been a strong demand from the industry for the immediate emergence of ECA alternative solvents. Under such circumstances, lactate ester, particularly ethyl lactate, has been investigated as a solvent for photoresist resin because of its good solubility of resist resin, high safety, etc. as an ECA substitute solvent.

【0004】しかしながら、醗酵法により製造された乳
酸(以下醗酵乳酸と云う)を原料として製造された乳酸エ
ステル(以下醗酵乳酸エステルと呼ぶ)の欠点は、微量の
不純物(例えば、アクリル酸エステル等)の影響により、
300nm以下の波長、所謂ディ−プUV(紫外線)領域
の光を吸収する。このUV吸収の原因となる微量の不純
物成分は、従来の精製手段(例えば、蒸留精製)では実質
的に除去することは出来ない。
However, the disadvantage of lactic acid ester (hereinafter referred to as fermented lactic acid ester) produced by using lactic acid produced by the fermentation method (hereinafter referred to as fermented lactic acid) as a raw material is that trace amounts of impurities (such as acrylic acid ester) Due to
It absorbs light in the so-called deep UV (ultraviolet) region having a wavelength of 300 nm or less. The minute amount of impurity components that cause the UV absorption cannot be substantially removed by conventional purification means (for example, distillation purification).

【0005】例えば、醗酵乳酸エステルは糖類(甜菜、
トウモロコシ、等)を醗酵させて造った醗酵乳酸をアル
コ−ル(メタノ−ル、エタノ−ル、ブタノ−ル等)とエス
テル化反応させて造る。このようにして製造された醗酵
乳酸エステル、例えば醗酵乳酸エチルは280nmのU
V吸収が2.0以上であり、場合によっては3.0以上に
達することもある。
For example, fermented lactic acid ester is a sugar (sugar beet,
Fermented lactic acid produced by fermenting corn, etc.) is esterified with alcohol (methanol, ethanol, butanol, etc.). The fermented lactic acid ester produced in this way, for example fermented ethyl lactate, has a U of 280 nm.
V absorption is 2.0 or more, and may reach 3.0 or more in some cases.

【0006】一方、半導体ディバイスにおける高密度
化、高集積度化、又プリント配線板や印刷板におけるパ
タ−ンプロフィルの高解像度化の要求はますます強くな
ってきている。それに伴いリソグラフィ技術に関しては
0.5μm以下の所謂ハ−フミクロンリソグラフィ技術
による微細加工や高解像度化が要求される。それ故、レ
ジストに照射される光は例えば低圧水銀灯やエキシマレ
−ザ−を光源とするディ−プUVが使われるが、この時
の波長は300nm以下の光が使用される。
On the other hand, there is an increasing demand for higher density and higher integration of semiconductor devices and higher resolution of pattern profiles for printed wiring boards and printed boards. Along with this, with respect to the lithography technique, fine processing and sophistication with a resolution of 0.5 μm or less by so-called half micron lithography technique are required. Therefore, as the light with which the resist is irradiated, for example, a low pressure mercury lamp or a deep UV having an excimer laser as a light source is used, and the wavelength at this time is 300 nm or less.

【0007】従って、醗酵乳酸エステルを従来の精製方
法で精製して、フォトレジスト用溶剤として使うと、照
射する放射線量の増加、あるいは深部まで光が到達しな
いと云う問題が発生したり、更には、不純物、含有金属
による半導体ディバイスの性能不良などの問題を発生す
る。従って、フォトレジスト用溶剤としては例えば28
0nmのUV吸収を1.0以下、好ましくは0.6以下
で、しかも不純物が少なくて低金属の乳酸エステルが必
要となっている。本発明はこれらの問題を解決するもの
である。即ち、本発明の目的は300nm以下のUV吸
収を実質的に無視出来る程度まで低減し、しかも不純物
が少なく低金属のフォトレジスト用に好適な乳酸エステ
ルを得る為の醗酵乳酸エステルの精製方法を提供するこ
とである。
Therefore, when the fermented lactate ester is purified by a conventional purification method and used as a photoresist solvent, there arises a problem that the amount of radiation to be irradiated increases or that light does not reach a deep portion. However, problems such as poor performance of semiconductor devices due to impurities and contained metals occur. Therefore, as a solvent for photoresist, for example, 28
There is a need for a low-metal lactate ester having a UV absorption of 0 nm of 1.0 or less, preferably 0.6 or less, and a small amount of impurities. The present invention solves these problems. That is, an object of the present invention is to provide a method for purifying a fermented lactic acid ester for reducing UV absorption of 300 nm or less to a substantially negligible level and obtaining a lactic acid ester having few impurities and suitable for a photoresist having a low metal content. It is to be.

【0008】[0008]

【課題を解決するための手段】本発明者らは、前述の問
題点を解決すべく鋭意検討を重ねた結果、醗酵乳酸エス
テルを活性炭処理した後、蒸留精製することにより、3
00nm以下のUV吸収の低減された乳酸エステルが得
られることを見い出し、本発明に到達したものである。
即ち、本発明は醗酵乳酸エステルを蒸留精製するにあた
り、あらかじめ活性炭処理して300nm以下のUV吸
収を低減してから蒸留することを特徴とする乳酸エステ
ルの精製方法である。
Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that the fermented lactic acid ester is treated with activated carbon and then purified by distillation.
The inventors of the present invention have found that a lactate ester having a UV absorption of 00 nm or less and a reduced UV absorption can be obtained, and arrived at the present invention.
That is, the present invention is a method for purifying a lactic acid ester, which comprises distilling and purifying a fermented lactic acid ester, which is previously treated with activated carbon to reduce UV absorption at 300 nm or less and then distilled.

【0009】本発明に使われる醗酵乳酸エステルとして
は、例えば乳酸メチル、乳酸エチル、乳酸ブチル、乳酸
プロピル等が挙げられる。又、本発明で使用される活性
炭は特に限定されないが、その平均細孔径(D)が100
Å以下のものが有効で、特に50Å以下のものが有効で
ある。平均細孔径が100Å以上になると効果は若干減
少する。活性炭の原料(ピ−ト、やし殻、木材、リグナ
イト、コ−ル 等)、賦活方法(化学賦活、水蒸気賦活)
および形状(粒状炭、粉末炭)による処理効果への影響は
実質的には小さい。
Examples of the fermented lactic acid ester used in the present invention include methyl lactate, ethyl lactate, butyl lactate, propyl lactate and the like. The activated carbon used in the present invention is not particularly limited, but its average pore diameter (D) is 100.
Those below Å are effective, and those below 50 Å are particularly effective. When the average pore size is 100 Å or more, the effect is slightly reduced. Raw material for activated carbon (Peat, palm shell, wood, lignite, call, etc.), activation method (chemical activation, steam activation)
And the influence of the shape (granular coal, powdered coal) on the treatment effect is substantially small.

【0010】本発明の方法に係わる活性炭処理方法は、
通常の活性炭処理と同様に実施することが可能である。
一般的には乳酸エステルと活性炭とを数分〜約10時間
混合撹拌後濾過するか、あるいは活性炭をカラムに充填
した固定床に乳酸エステルを通過させることにより実施
される。いずれの方法においても活性炭中の成分の溶出
を避けるため、活性炭処理は常温ないし若干の加温下で
行うことが好ましい。粉末活性炭の場合は混合撹拌の方
法が一般的で、通常処理すべき乳酸エステルに対し活性
炭を0.1〜20wt%、一般的には0.5〜10wt%
を添加して数分〜約10時間撹拌後、濾過して活性炭を
除去する。又、粒状活性炭の場合は固定床の方法が適当
で、通常処理すべき乳酸エステルに対し活性炭を0.3
〜10wt%、一般的には0.5〜5wt%をカラムに
充填し、活性炭量(体積)の0.5〜10容量/時間の乳
酸エステルを通して接触させる。活性炭処理により乳酸
エステルの280nmのUV吸収が通常2〜4であった
ものが、1以下に低減する。混合撹拌式の場合は濾過し
て活性炭を除去してから蒸留するが、固定床式の場合は
特に濾過の必要はなく、流出液を直ちに蒸留することが
出来る。
The activated carbon treatment method according to the method of the present invention is
It can be carried out in the same manner as the usual activated carbon treatment.
Generally, it is carried out by mixing and stirring the lactic acid ester and the activated carbon for several minutes to about 10 hours and then filtering, or by passing the lactic acid ester through a fixed bed packed with activated carbon in a column. In either method, in order to avoid elution of the components in the activated carbon, the activated carbon treatment is preferably carried out at room temperature or under slight heating. In the case of powdered activated carbon, the method of mixing and stirring is generally used, and the activated carbon is usually 0.1 to 20 wt%, generally 0.5 to 10 wt% with respect to the lactic acid ester to be treated.
Is added and stirred for several minutes to about 10 hours, and then filtered to remove the activated carbon. In the case of granular activated carbon, a fixed bed method is suitable, and the activated carbon is usually added to the lactate ester to be treated in an amount of 0.3
-10 wt%, generally 0.5-5 wt% is packed in a column and contacted through 0.5-10 volume / hour of lactate ester of activated carbon amount (volume). By the activated carbon treatment, UV absorption of lactic acid ester at 280 nm was usually 2 to 4, but it is reduced to 1 or less. In the case of the mixed stirring system, the activated carbon is removed by filtration before distillation, but in the case of the fixed bed system, no particular filtration is necessary, and the effluent can be immediately distilled.

【0011】レジスト用溶剤はUV吸収の少ないことと
同時に高純度品、例えば99.9%以上の純度が要求さ
れる為、活性炭処理後の蒸留操作も重要な工程で、蒸留
中の乳酸エステルの分解によるアルコ−ル、乳酸、及び
縮合による乳酸ダイマ−の生成を極力抑制することが肝
要である。それ故、本発明の方法における蒸留は上記乳
酸エステルの性質から、温度は100℃以下、圧力は1
00torr以下の条件で実施することが好ましい。蒸
留温度が100℃以上になると乳酸エステルが分解や縮
合を起し、高純度品(99.9%以上)を得ることはむず
かしい。尚、安定剤等の添加も有効であるが、基本的に
は温度コントロ−ルによる分解抑制が最も有効である。
Since the resist solvent is required to have a high degree of UV absorption as well as a high-purity product, for example, a purity of 99.9% or more, the distillation operation after the treatment with activated carbon is also an important step. It is essential to suppress the formation of alcohol, lactic acid by decomposition and lactic acid dimer by condensation as much as possible. Therefore, the distillation in the method of the present invention is carried out at a temperature of 100 ° C. or lower and a pressure of 1 due to the nature of the lactate ester.
It is preferable to carry out under the condition of 00 torr or less. When the distillation temperature is 100 ° C. or higher, the lactate ester is decomposed or condensed, and it is difficult to obtain a high-purity product (99.9% or higher). Although addition of a stabilizer or the like is effective, basically, suppression of decomposition by temperature control is most effective.

【0012】[0012]

【実施例】以下に実施例を挙げて本発明の方法を更に具
体的に説明する。
EXAMPLES The method of the present invention will be described in more detail with reference to the following examples.

【実施例】植物系粒状炭(日本ノリット社製、PK 0.
6−2mm)の100mlをガラスカラムに充填し、醗
酵乳酸エチル(純度98.1%、280nmのUV吸収は
3.710)3リットルを500ml/hの速度で挿入
し、活性炭処理を行った。処理後の乳酸エチルの280
nmのUV吸収は0.414であった。次にこの乳酸エ
チル(2リットル)を段数20段相当の蒸留塔で温度90
〜95℃、圧力100〜110torrの条件下に蒸留
し、純度 99.987%、280nmのUV吸収 0.
225の乳酸エチル1.8リットルを得た。又、金属類
含有量は、Na:11ppb、K:0.5ppb、F
e:1.8ppbで低金属の乳酸エチルであることが分
かった。
[Examples] Plant-based granular charcoal (Norito Japan, PK 0.
(6-2 mm) 100 ml was packed in a glass column, and fermented ethyl lactate (purity 98.1%, UV absorption at 280 nm of 3.710) 3 liters was inserted at a rate of 500 ml / h, and treated with activated carbon. 280 of ethyl lactate after treatment
The UV absorption at nm was 0.414. Next, this ethyl lactate (2 liters) was heated at a temperature of 90 in a distillation column corresponding to 20 plates.
Purity 99.987%, UV absorption at 280 nm of 0.9 by distillation under conditions of ˜95 ° C. and pressure of 100˜110 torr.
1.8 liters of 225 ethyl lactate was obtained. The metal content is Na: 11 ppb, K: 0.5 ppb, F
e: It was found to be a low metal ethyl lactate at 1.8 ppb.

【0013】[0013]

【実施例2】活性炭粒状炭(日本ノリット社製、RAX
−1)の100mlを実施例−1と同じガラスカラムに
充填し、醗酵乳酸エチル(純度 98.6%、280nm
のUV吸収は2.874)3リットルを400ml/hr
の速度で挿入し、活性炭処理を行った。処理後の乳酸エ
チルの280nmのUV吸収は0.524であった。つ
ぎにこの乳酸エチル(1リットル)を実施例−1と同じ蒸
留塔で、温度80〜85℃、圧力450〜50torr
の条件下に蒸留し、純度 99.992%、280nm
のUV吸収 0.315の乳酸エチル0.78リットルを
得た。又、金属類含有量はNa:1.0、K:0.9、F
e:1.1、Cu:0.4、Mn:1.2(ppb)で低金
属の乳酸エチルであることが分かった。
[Example 2] Activated carbon granular carbon (RAX, manufactured by Nippon Norit Co., Ltd.)
100 ml of -1) was packed in the same glass column as in Example-1, and fermented ethyl lactate (purity 98.6%, 280 nm
UV absorption of 2.874) 3 liters 400ml / hr
It was inserted at the speed of and activated carbon treatment was performed. The UV absorption of ethyl lactate after treatment at 280 nm was 0.524. Next, this ethyl lactate (1 liter) was placed in the same distillation column as in Example 1 at a temperature of 80 to 85 ° C. and a pressure of 450 to 50 torr.
Distilled under the conditions of 99.992% purity, 280nm
UV absorption of 0.715 l of ethyl lactate of 0.315 was obtained. The metal content is Na: 1.0, K: 0.9, F
e: 1.1, Cu: 0.4, Mn: 1.2 (ppb) and it was found to be a low metal ethyl lactate.

【0014】[0014]

【実施例3】植物系粉末炭(日本ノリット社製 SX−
1)の40gを撹拌装置及び温度計の付いた1リットル
四ッ口フラスコに仕込み、更に実施例−2と同じ醗酵乳
酸エチル800gを仕込んで、室温(20〜25℃)下に
6時間撹拌混合し、吸着処理を行った。処理後の乳酸エ
チルの280nmのUV吸収は0.308であった。次
にこの乳酸エチル(0.7リットル)を実施例−1と同じ
蒸留塔で、温度90〜95℃、圧力70〜100tor
rの条件下に蒸留し、純度 99.978%、280n
mのUV吸収 0.273の乳酸エチル0.62リットル
を得た。又、金属類の含有量はNa:0.8、K:0.
6、Fe:1.0、Cu:0.5、Mn:0.8、Mg:
0.4、Ca:1.2(ppb)で低金属の乳酸エチルであ
ることが分かった。
[Example 3] Plant-based powdered coal (SX- manufactured by Nippon Norit Co., Ltd.)
40 g of 1) was charged into a 1 liter four-necked flask equipped with a stirrer and a thermometer, 800 g of the same fermented ethyl lactate as in Example-2 was charged, and the mixture was stirred and mixed at room temperature (20 to 25 ° C.) for 6 hours. Then, adsorption treatment was performed. The UV absorption at 280 nm of the treated ethyl lactate was 0.308. Next, this ethyl lactate (0.7 liter) was placed in the same distillation column as in Example 1 at a temperature of 90 to 95 ° C. and a pressure of 70 to 100 torr.
Distilled under the condition of r, purity 99.978%, 280n
m UV absorption 0.273 liter of ethyl lactate 0.273 was obtained. The metal content is Na: 0.8, K: 0.0.
6, Fe: 1.0, Cu: 0.5, Mn: 0.8, Mg:
It was found to be ethyl lactate having a low metal content of 0.4 and Ca: 1.2 (ppb).

【0015】[0015]

【実施例4】石炭系粒状炭(日本ノリット社製 GRA
NULAR DARCO)の50gを実施例−3と同じ
四ッ口フラスコに仕込み、更に実施例−1と同じ醗酵乳
酸エチル800gを仕込んで、室温(20〜25℃)下に
10時間撹拌混合し、吸着処理を行った。処理後の乳酸
エチルの280nmのUV吸収は0.647であった。
次に処理後の乳酸エチル(0.7リットル)を実施例−1
と同じ蒸留塔で、温度55〜60℃、圧力15〜30t
orrの条件下に蒸留し、純度 99.995%、28
0nmのUV吸収 0.528であった。又、金属類の
含有量はNa:2.1、K:1.2、Fe:2.8、C
a:1.0、Mn:0.8、Cu:0.9(ppb)で、低
金属の乳酸エチルであることが分かった。
[Example 4] Coal-based granular coal (GRA manufactured by Nippon Norit Co., Ltd.
50 g of (NULAR DARCO) was charged into the same four-necked flask as in Example-3, 800 g of the same fermented ethyl lactate as in Example-1 was charged, and the mixture was stirred and mixed at room temperature (20 to 25 ° C.) for 10 hours, and then adsorbed. Processed. The UV absorption of ethyl lactate after treatment at 280 nm was 0.647.
Next, the treated ethyl lactate (0.7 liter) was used in Example-1.
In the same distillation column as above, temperature 55 ~ 60 ℃, pressure 15 ~ 30t
Distilled under the conditions of orr to obtain a purity of 99.995%, 28
The UV absorption at 0 nm was 0.528. The metal content is Na: 2.1, K: 1.2, Fe: 2.8, C
A: 1.0, Mn: 0.8, Cu: 0.9 (ppb), and it was found to be a low metal ethyl lactate.

【0016】[0016]

【比較例】[Comparative example]

【比較例1】実施例−1と同じ醗酵乳酸エチル(1リッ
トル)を実施例−1で使用した蒸留塔で、温度80〜8
5℃、圧力45〜50torrの条件下に蒸留し、純度
99.991%、280nmのUV吸収 3.518の
乳酸エチルを0.85リットルを得た。蒸留精製だけで
は280nmのUV吸収はほとんど削減していない。
[Comparative Example 1] The same fermented ethyl lactate (1 liter) as in Example-1 was used in the distillation column used in Example-1 at a temperature of 80-8.
Distillation was performed under the conditions of 5 ° C. and a pressure of 45 to 50 torr to obtain 0.85 liter of ethyl lactate having a purity of 99.991%, a UV absorption of 280 nm of 3.518. The UV absorption at 280 nm is hardly reduced by distillation purification alone.

【0017】[0017]

【比較例2】実施例−1と同じ醗酵乳酸エチル(3リッ
トル)を実施例−1と同じ条件下に活性炭処理を行った
乳酸エチル(280nmのUV吸収 0.408)1リッ
トルを実施例−1と同じ蒸留塔を使用して、温度110
〜120℃、圧力130〜140torrの条件下に蒸
留し、純度 99.08%、280nmのUV吸収 0.
210の乳酸エチルを0.83リットルを得た。純度は
99.9%に達していないことが分かった。
Comparative Example 2 1 liter of ethyl lactate (UV absorption 0.408 at 280 nm) obtained by treating the same fermented ethyl lactate (3 liters) as in Example 1 with activated carbon under the same conditions as in Example 1 was used. Using the same distillation column as in No. 1, the temperature of 110
˜120 ° C., pressure 130-140 torr, distilled under conditions of 99.08% purity, UV absorption at 280 nm.
0.83 liter of 210 ethyl lactate was obtained. It was found that the purity did not reach 99.9%.

【0018】[0018]

【発明の効果】本発明の方法によれば、高純度(99.9
%以上)で且つUV吸収の削減された(1以下)乳酸エチ
ルを得ることができる。又、本発明の方法によれば、高
純度、且つUV吸収の削減されたことに加え、低金属品
(Na、K、Fe、Ca、Mn、その他の金属等が10
ppb以下)を得ることができる。
According to the method of the present invention, high purity (99.9)
It is possible to obtain ethyl lactate having a UV absorption of 1% or less and a UV absorption of 1% or less. According to the method of the present invention, in addition to high purity and reduced UV absorption, low metal products
(Na, K, Fe, Ca, Mn and other metals are 10
ppb or less) can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】醗酵法で製造された乳酸を原料として製造
された乳酸エステルを活性炭処理した後、蒸留精製する
ことを特徴とする乳酸エステルの精製方法。
1. A method for purifying a lactic acid ester, which comprises subjecting a lactic acid ester produced from a lactic acid produced by a fermentation method as a raw material to a treatment with activated carbon, followed by distillation and purification.
【請求項2】蒸留精製が100℃以下で実施されること
を特徴とする請求項1記載の乳酸エステルの精製方法。
2. The method for purifying a lactic acid ester according to claim 1, wherein the distillation purification is carried out at 100 ° C. or lower.
JP17047894A 1994-06-30 1994-06-30 Purification method of lactate ester Expired - Fee Related JP3862290B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17047894A JP3862290B2 (en) 1994-06-30 1994-06-30 Purification method of lactate ester

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17047894A JP3862290B2 (en) 1994-06-30 1994-06-30 Purification method of lactate ester

Publications (2)

Publication Number Publication Date
JPH0812621A true JPH0812621A (en) 1996-01-16
JP3862290B2 JP3862290B2 (en) 2006-12-27

Family

ID=15905700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17047894A Expired - Fee Related JP3862290B2 (en) 1994-06-30 1994-06-30 Purification method of lactate ester

Country Status (1)

Country Link
JP (1) JP3862290B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002363135A (en) * 2001-06-05 2002-12-18 Toho Chem Ind Co Ltd Method for removing impurity in ethyl lactate
WO2009119821A1 (en) * 2008-03-28 2009-10-01 太陽インキ製造株式会社 Curable resin composition, cured article thereof, and printed circuit board
US8048919B2 (en) 2004-06-28 2011-11-01 Archer Daniels Midland Company Use of ethyl lactate as an excipient for pharmaceutical compositions
WO2018051716A1 (en) * 2016-09-15 2018-03-22 富士フイルム株式会社 Organic solvent refining method and organic solvent refining apparatus
US9963368B2 (en) 2010-11-15 2018-05-08 Archer Daniels Midland Company Microemulsions and uses thereof in dispersing catalysts

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002363135A (en) * 2001-06-05 2002-12-18 Toho Chem Ind Co Ltd Method for removing impurity in ethyl lactate
US8048919B2 (en) 2004-06-28 2011-11-01 Archer Daniels Midland Company Use of ethyl lactate as an excipient for pharmaceutical compositions
WO2009119821A1 (en) * 2008-03-28 2009-10-01 太陽インキ製造株式会社 Curable resin composition, cured article thereof, and printed circuit board
JPWO2009119821A1 (en) * 2008-03-28 2011-07-28 太陽ホールディングス株式会社 Curable resin composition, cured product thereof, and printed wiring board
JP5787516B2 (en) * 2008-03-28 2015-09-30 太陽ホールディングス株式会社 Curable resin composition, cured product thereof, and printed wiring board
US9963368B2 (en) 2010-11-15 2018-05-08 Archer Daniels Midland Company Microemulsions and uses thereof in dispersing catalysts
WO2018051716A1 (en) * 2016-09-15 2018-03-22 富士フイルム株式会社 Organic solvent refining method and organic solvent refining apparatus

Also Published As

Publication number Publication date
JP3862290B2 (en) 2006-12-27

Similar Documents

Publication Publication Date Title
DE3232236A1 (en) SOLID ADSORBENT FOR CARBON MONOXIDE AND METHOD FOR SEPARATING IT FROM A GAS MIXTURE
EP0641314B1 (en) Method for purification of acetonitrile
JPH0812621A (en) Purification of lactic acid ester
KR100487035B1 (en) Catalyst Recovery
AU618567B2 (en) Purification of acetic acid with ozone
FR2732024A1 (en) PROCESS FOR THE PURIFICATION OF CHEMICALLY MODIFIED CYCLODEXTRINS TO REMOVE IMPURITIES
EP0484153B1 (en) Improved method for the purification of acetaminophen
JP2004339112A (en) Method for producing high-purity acetonitrile
US4532318A (en) Process for removing trace amounts of hydrazine
US5202481A (en) Purification of acetic acid produced by the low water carbonylation of methanol by treatment with ozone
US5155265A (en) Purification of acetic acid with ozone followed by treatment with activated carbon and/or an ion-exchange resin
US5155266A (en) Purification of acetic acid with ozone in the presence of an oxidation catalyst
WO2022141229A1 (en) Sucralose preparation method, crude product solution, and sucralose
EP0361785B1 (en) Removal of iodine or iodide impurities
DE2901359A1 (en) METHOD FOR REMOVING IODINE FROM ORGANIC COMPOUNDS
US4126638A (en) Process for purifying benzene dicarboxylic acids
JP5000814B2 (en) Method for removing impurities in ethyl lactate
JPH0725814A (en) Production of highly pure acetic acid
CA2413901C (en) An acid washed adsorbent carbon used in a method for the purification of acetaminophen
JP2823431B2 (en) Epichlorohydrin decolorization method
JP2005097160A (en) Method for producing highly pure terephthalic acid
US4144254A (en) Process for the purification of steroids
JP3812597B2 (en) Purification method of hydrogen peroxide
US2101998A (en) Purification of lactic acid
JP3079260B2 (en) Highly active adsorbent and method for producing the same

Legal Events

Date Code Title Description
A977 Report on retrieval

Effective date: 20050315

Free format text: JAPANESE INTERMEDIATE CODE: A971007

A131 Notification of reasons for refusal

Effective date: 20050411

Free format text: JAPANESE INTERMEDIATE CODE: A131

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050525

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Effective date: 20060926

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Effective date: 20060926

Free format text: JAPANESE INTERMEDIATE CODE: A61

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091006

Year of fee payment: 3

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101006

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 5

Free format text: PAYMENT UNTIL: 20111006

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20121006

LAPS Cancellation because of no payment of annual fees