JPH0812076A - Work sensing method and device of magnetic levitation conveying device - Google Patents

Work sensing method and device of magnetic levitation conveying device

Info

Publication number
JPH0812076A
JPH0812076A JP15363494A JP15363494A JPH0812076A JP H0812076 A JPH0812076 A JP H0812076A JP 15363494 A JP15363494 A JP 15363494A JP 15363494 A JP15363494 A JP 15363494A JP H0812076 A JPH0812076 A JP H0812076A
Authority
JP
Japan
Prior art keywords
work
magnetic levitation
control
value
moving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15363494A
Other languages
Japanese (ja)
Other versions
JP3599782B2 (en
Inventor
Muneyoshi Nishitsuji
宗芳 西辻
Toshio Koike
土志夫 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP15363494A priority Critical patent/JP3599782B2/en
Publication of JPH0812076A publication Critical patent/JPH0812076A/en
Application granted granted Critical
Publication of JP3599782B2 publication Critical patent/JP3599782B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Non-Mechanical Conveyors (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Vehicles With Linear Motors And Vehicles That Are Magnetically Levitated (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

PURPOSE:To sense a work certainly without equipping a moving element with any special apparatus, by sensing work holding of the moving element from change in the control voltage to be distributed to electric magnets on the basis of the sensing value given by a sensor of a magnetic levitation device. CONSTITUTION:Differential signals obtained by taking difference between signals given by levitation control sensors 7 mounted on an actuation controller 9 and the set value are subjected to PID control by a magnetic levitation device 3, and voltage is distributed to a plurality of electric magnets 6 of the actuation controller 9 so that they generate magnetism. Then a magnetic substance 5 of a moving element 4 is attracted so that the element 4 is levitated magnetically, and if the actuation controller 9 is moved in the desired direction, the element 4 restrained magnetically moves also in the same direction. Because the element 4 is levitated magnetically, its attitude is inclined from the level by movement of the center of gravity depending upon existence of any work (a), but the element 4 can be corrected to the levitating attitude approx. horizontally by analyzing the sensing values of the sensors 7 as classified by purposes and controlling the distributed values for the magnets 6 upon subjecting the values to the PID control.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体製造工程に使用
されるスパッタリング装置やエッチング装置等の真空処
理装置の室内に於いて基板その他のワークを磁気浮上状
態で搬送する磁気浮上搬送装置のワークの有無を検出す
る方法と装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic levitation transfer device for transferring a substrate or other work in a magnetic levitation state in a chamber of a vacuum processing apparatus such as a sputtering apparatus or an etching apparatus used in a semiconductor manufacturing process. The present invention relates to a method and apparatus for detecting the presence or absence of

【0002】[0002]

【従来の技術】従来、例えば半導体製造工程に於いて、
シリコンウエハのワークにスパッタリングやエッチング
の処理を施す場合、図1に示すような、ワークaを磁気
浮上した移動子bによりスパッタリング室等の真空処理
室c内へ搬送することが行なわれている。該移動子bが
磁気浮上した搬送装置は、機械的な摺動部を隔離でき、
摺動部から発生するダストがワークに付着することもな
く、ワーク搬送室dには磁気浮上の移動子bのみの存在
に限定することができるため放出ガスも少なくなってワ
ーク搬送室dを超高真空の雰囲気とすることが可能にな
り、スパッタリング室やエッチング室等の処理室c内の
雰囲気を損なわないから処理室内を超高真空に維持する
ことができて高密度の半導体の製造に適している。該移
動子の作動制御のためにこれとは無接触で作動する作動
制御子eが設けられ、該移動子bと作動制御子eに磁気
浮上装置が設けられる。該磁気浮上装置は例えば移動子
に設けた永久磁石等の磁性体fと該作動制御子eに設け
た電磁石gとで構成され、該電磁石gの電圧を制御する
ことにより該移動子bが磁気浮上し、該作動制御子eを
例えばロボットのハンドに取付けてこれを旋回または往
復移動させると、その動きに追従して該移動子bが旋回
または往復移動する。該移動子bの姿勢を制御するため
に、該作動制御子eに磁気センサ等の浮上制御用センサ
hを設け、これの検出値に基づいて電磁石gの電圧を制
御し、該移動子eの姿勢が制御される。
2. Description of the Related Art Conventionally, for example, in a semiconductor manufacturing process,
When a workpiece such as a silicon wafer is subjected to sputtering or etching, the workpiece a is transferred into a vacuum processing chamber c such as a sputtering chamber by a magnetically levitated moving element b as shown in FIG. The transfer device in which the moving element b is magnetically levitated can isolate the mechanical sliding part,
Since the dust generated from the sliding portion does not adhere to the work and the work transfer chamber d can be limited to the presence of only the magnetically levitated mover b, the amount of released gas is reduced and the work transfer chamber d is kept above the work transfer chamber d. It is possible to create a high-vacuum atmosphere, and since the atmosphere in the processing chamber c such as the sputtering chamber or the etching chamber is not impaired, the processing chamber can be maintained in an ultra-high vacuum and is suitable for manufacturing high-density semiconductors. ing. An operation controller e that operates in a contactless manner is provided for operation control of the mover, and a magnetic levitation device is provided on the mover b and the operation controller e. The magnetic levitation device is composed of, for example, a magnetic body f such as a permanent magnet provided on a moving element and an electromagnet g provided on the operation control element e, and the moving element b is magnetized by controlling the voltage of the electromagnet g. When the robot floats and the operation controller e is attached to, for example, a robot hand and is turned or reciprocated, the mover b turns or reciprocates following the movement. In order to control the posture of the mover b, a levitation control sensor h such as a magnetic sensor is provided on the operation controller e, and the voltage of the electromagnet g is controlled based on the detection value of the levitation control sensor h to move the mover e. Attitude is controlled.

【0003】該移動子bにワークaを受け渡しするため
に、ワーク搬送室dと真空処理室cに受け渡し手段i、
iが設けられ、また、該処理室cに搬入する前と、該処
理室cから搬出後に所定の位置にワークaが存在するか
どうかを検出するために、ウエハ検出装置jが設けられ
る。該ウエハ検出装置jは、通常、ワーク搬送室dの外
部の大気中に設けた一対のウエハ有無検出センサl、l
と、これの信号を通過させる覗き窓k、kとを有する光
学式に構成される。
In order to transfer the work a to the mover b, the transfer means i is transferred to the work transfer chamber d and the vacuum processing chamber c.
i is provided, and a wafer detection device j is provided to detect whether the work a is present at a predetermined position before being carried into the processing chamber c and after being carried out from the processing chamber c. The wafer detection device j is usually a pair of wafer presence / absence detection sensors 1, 1 provided in the atmosphere outside the work transfer chamber d.
And an observation window k, k through which a signal of this is passed.

【0004】[0004]

【発明が解決しようとする課題】光学式のウエハ有無検
出センサlは、真空のワーク搬送室c内に組み込むこと
が出来ず、大気中にこれを設けて検出するために搬送室
cには2箇所に覗き窓kが必要になるが、近時の半導体
製造装置は搬送室の形状も複雑で、ウエハ有無検出セン
サlを取付ける場所が得られにくい状況にあり、搬送室
内の空間形状も複雑で該センサlの誤作動が起き易い不
都合がある。また、移動子bのウエハが保持される箇所
に、例えば接触式のウエハ有無検出センサを組込むこと
も考えられるが、これのために真空中に放出ガスを防止
する特別の構造や配線が必要になり、その製作は容易で
ない。
The optical wafer presence / absence detection sensor 1 cannot be incorporated in the vacuum work transfer chamber c, and the transfer sensor is provided in the atmosphere to detect the wafer presence / absence sensor 2 in the transfer chamber c. Although a peep window k is required at some place, the shape of the transfer chamber in recent semiconductor manufacturing apparatuses is complicated, and it is difficult to find a place to mount the wafer presence / absence detection sensor l, and the space shape inside the transfer chamber is complicated. There is an inconvenience that the sensor 1 is likely to malfunction. It is also conceivable to incorporate a contact type wafer presence / absence detection sensor, for example, at a portion of the mover b where the wafer is held, but this requires a special structure or wiring for preventing the released gas in a vacuum. And its production is not easy.

【0005】更に、ウエハを監視する箇所がウエハ有無
検出センサ取付位置に限られてしまうため、搬送中に何
らかの障害でウエハの保持位置がずれたり落下した場合
にはウエハの状態が分からなかった。ウエハ保持位置の
ずれが大きいと、搬送中に例えば処理室内の他の機構と
干渉してウエハが落下したり破損する事故を発生して好
ましくない。
Further, since the position where the wafer is monitored is limited to the wafer presence / absence detection sensor mounting position, the state of the wafer cannot be known when the wafer holding position is displaced or dropped due to some trouble during the transportation. If the deviation of the wafer holding position is large, it is not preferable because the wafer may drop or be damaged during transfer, for example, by interfering with other mechanisms in the processing chamber.

【0006】本発明は、磁気浮上した移動子に保持する
ワークの有無を該移動子に特別の機器を設けることなく
その搬送中常時監視する方法を提供すること及び該ワー
クのずれや落下も検出可能なワーク検出方法を提供する
ことを目的とするものである。
The present invention provides a method for constantly monitoring the presence or absence of a work held by a magnetically levitated moving element during the transportation of the moving element without providing any special equipment on the moving element, and detecting a deviation or a drop of the workpiece. The object is to provide a possible work detection method.

【0007】[0007]

【課題を解決するための手段】本発明では、ワークを保
持する移動子とこれに対向して設けた作動制御子とに、
複数個の電磁石により該移動子を磁気浮上させ且つ浮上
制御用センサにより該移動子の磁気浮上姿勢の制御可能
な磁気浮上装置を設け、該磁気浮上装置により磁気浮上
させた該移動子が該作動制御子の移動に追従して移動す
る磁気浮上搬送装置に於いて、該磁気浮上装置の浮上制
御用センサの検出値に基づき該電磁石へ分配する制御電
圧の変化により該移動子のワークの保持の有無を検出す
ることにより、上記の目的を達成するようにした。該磁
気浮上装置を、該移動子に設けた複数個の磁性体と該作
動制御子に設けた複数個の電磁石及び複数個の浮上制御
用センサとで構成し、該センサにより検出した信号と設
定値との差の信号をPID制御して各電磁石への電圧の分
配値を制御することにより該移動子の磁気浮上とその姿
勢を制御するようにし、該センサ信号と設定値との差の
信号のPID制御値のP値の変化をワーク保持の有無検出
用設定値と比較して該移動子のワーク保持の有無を検出
することにより、上記の目的を一層適切に達成すること
ができる。
According to the present invention, a moving element for holding a work and an operation control element provided opposite to the moving element are provided.
A magnetic levitation device capable of magnetically levitating the mover by a plurality of electromagnets and controlling a magnetic levitation posture of the mover by a levitation control sensor is provided, and the mover magnetically levitated by the magnetic levitation device operates. In a magnetic levitation transfer device that moves following the movement of a control element, the movement of a work piece of the movement element is controlled by a change in a control voltage distributed to the electromagnet based on a detection value of a levitation control sensor of the magnetic levitation apparatus. The above object was achieved by detecting the presence or absence. The magnetic levitation device is composed of a plurality of magnetic bodies provided on the moving element, a plurality of electromagnets provided on the operation controller, and a plurality of levitation control sensors, and a signal detected by the sensor and setting The signal of the difference between the sensor signal and the set value is controlled by PID controlling the signal of the difference between the sensor signal and the set value by controlling the distribution value of the voltage to each electromagnet. By comparing the change in the P value of the PID control value with the setting value for detecting the presence / absence of the work holding to detect the presence / absence of the work holding of the mover, the above object can be achieved more appropriately.

【0008】[0008]

【作用】磁気浮上装置で、浮上制御用センサの信号と設
定値との差の信号をPID制御し、作動制御子の複数個の
電磁石に電圧を分配してこれに磁気を発生させると、移
動子の磁性体が吸引されて移動子が磁気浮上し、作動制
御子を所望の方向へ移動させると、磁気的に拘束された
移動子も同方向に移動する。該移動子は、例えばその先
端に受け渡し手段から受け取ったシリコンウエハ等のワ
ークを保持してスパッタリング室等の処理室の内部へ運
び込み、該処理室内の受け渡し手段にワークを渡す。該
移動子は磁気浮上しているため、ワークの有無による重
心の移動により姿勢が水平状態から傾くことになるが、
その姿勢の矯正は、該作動制御子に設けた複数個の浮上
制御用センサの検出値を目的別に分析すると共にPID 制
御して各電磁石の電圧の分配値を制御することにより行
なわれ、下方に傾いた側の移動子の磁性体と対向した電
磁石の電圧を上方に傾いた側の移動子の磁性体と対向し
た電磁石の電圧よりも高める制御により、該移動子は略
水平の浮上姿勢に矯正される。
[Operation] In the magnetic levitation device, the signal of the difference between the levitation control sensor signal and the set value is PID-controlled, and the voltage is distributed to a plurality of electromagnets of the operation controller to generate magnetism, which causes movement. When the magnetic body of the child is attracted and the mover magnetically levitates, and the operation controller is moved in a desired direction, the magnetically restrained mover also moves in the same direction. The mover holds, for example, a work such as a silicon wafer received from the transfer means at its tip and carries it into the inside of a processing chamber such as a sputtering chamber, and transfers the work to the transfer means inside the processing chamber. Since the mover is magnetically levitated, the posture will be tilted from the horizontal state due to the movement of the center of gravity depending on the presence or absence of the work,
The posture is corrected by analyzing the detection values of a plurality of levitation control sensors provided in the operation controller according to the purpose and controlling the distribution value of the voltage of each electromagnet by PID control. By correcting the voltage of the electromagnet facing the magnetic body of the tilted side mover to a higher level than the voltage of the electromagnet facing the magnetic body of the mover tilted up, the mover is corrected to a substantially horizontal levitation posture. To be done.

【0009】該移動子のワーク保持の有無の判断は、そ
の有無による傾きが最も大きく現れる電磁石の電圧の分
配値を設定値と比較して行ない、その差が大きいときに
ワーク無しの判断が出力されて警報や作動制御子の作動
停止が行なわれ、ワーク無しのまま移動子が作動するこ
との不都合が防止される。該電磁石の電圧の分配値は浮
上制御用センサの出力と設定値との差の信号をPID制御
したときのP値の変化に比例するので、例えば浮上制御
用センサの出力からピッチング検出回路でピッチング角
度を検出し、設定値との差をなくすように差の信号をPI
D制御したとき得られるP出力値を設定値と比較するこ
とによって移動子上のワークの有無を検出することがで
きる。
Whether the work piece is held by the mover is judged by comparing the distribution value of the voltage of the electromagnet, which shows the largest inclination depending on the presence of the work piece, with the set value. When the difference is large, the judgment that there is no work piece is output. As a result, an alarm is issued and the operation controller is deactivated, and the inconvenience that the mover operates without a workpiece is prevented. Since the distribution value of the voltage of the electromagnet is proportional to the change of the P value when the signal of the difference between the output of the levitation control sensor and the set value is PID controlled, for example, the pitching detection circuit uses the pitching from the output of the levitation control sensor. The angle signal is detected and the difference signal is set to PI to eliminate the difference from the set value.
By comparing the P output value obtained when the D control is performed with the set value, the presence or absence of the work on the mover can be detected.

【0010】また、移動子に保持したワークにずれが生
じ、該移動子が例えば進行方向に対して左右に傾いた場
合、この傾きの修正のために左右の電磁石の何れかの電
圧の分配値が変化することになるが、この変化を検出す
ることによりワークのずれの程度を知ることが出来、そ
の変化が大きくずれの大きいときには搬送中に他の機構
と干渉する恐れがあるので、これを未然に防ぐために警
報を出し作動制御子の作動を止めてワークのずれを修正
することができる。
Further, when the work held by the mover is displaced and the mover tilts, for example, left and right with respect to the traveling direction, the voltage distribution value of one of the left and right electromagnets is adjusted to correct this tilt. However, it is possible to know the degree of deviation of the work by detecting this change, and if there is a large deviation, it may interfere with other mechanisms during conveyance. In order to prevent this, an alarm is issued and the operation of the operation controller is stopped to correct the work deviation.

【0011】[0011]

【実施例】本発明の実施例を図面に基づき説明すると、
図2はスパッタリング室やエッチング室等の真空処理室
1と搬送室2との間に磁気浮上装置3により磁気浮上さ
れた移動子4でワークaを搬送する実施例を示し、該磁
気浮上装置3は、永久磁石や鉄片等の磁性体5を複数個
設けた移動子4と、複数個の電磁石6と浮上制御用セン
サ7とが設けられてロボットや案内杆8により所定の作
動を行なう作動制御子9とで構成される。該移動子4の
詳細は図3の如くであり、先端に分岐したワーク保持部
4aを有し、後方に磁性体5を取付けるための取付板4
bを設けた長手の部材で構成され、該移動子4と取付板
4bの材料には非磁性体が使用される。該取付板4bに
は前後左右に対称に例えば4個の永久磁石等の磁性体5
a、5b、5c、5dを配置し、各磁性体5に対向する
ように作動制御子9に電磁石6a、6b、6c、6d及
び浮上制御用センサ7a、7b、7c、7dが4個ずつ
図4に示すように配置される。尚、図示の例では、搬送
室2を気密の隔壁2aにより移動子4を収めた下方の室
2bと作動制御子9を収容した上方の室2cとに区画し
た。該浮上制御用センサ7としては、隔壁2aを通して
移動子4の位置を検出しなければならないため、移動子
4の取付板4bに配置された浮上用の永久磁石5の磁束
を検出する例えばホール素子や磁気トランス、または磁
束密度の変化によりインダクタンスが変化するインダク
タ型のセンサが用いられ、センサ7と永久磁石5との距
離を磁束密度の変化で検出できる。尚、浮上用の永久磁
石5とは別にセンサ用磁石を設けるようにしてもよい。
Embodiments of the present invention will be described with reference to the drawings.
FIG. 2 shows an embodiment in which a workpiece a is transported by a mover 4 which is magnetically levitated by a magnetic levitation device 3 between a vacuum processing chamber 1 such as a sputtering chamber or an etching chamber and a transfer chamber 2. The magnetic levitation device 3 Is an operation control in which a mover 4 provided with a plurality of magnetic bodies 5 such as permanent magnets and iron pieces, a plurality of electromagnets 6 and a levitation control sensor 7 are provided to perform a predetermined operation by a robot or a guide rod 8. And child 9. The details of the mover 4 are as shown in FIG. 3, which has a work holding portion 4a branched at the tip, and a mounting plate 4 for mounting the magnetic body 5 on the rear side.
The movable member 4 and the mounting plate 4b are made of a non-magnetic material. The mounting plate 4b has four magnetic bodies 5 such as four permanent magnets symmetrically in the front-rear direction and the left-right direction.
a, 5b, 5c, 5d are arranged, and four electromagnets 6a, 6b, 6c, 6d and four levitation control sensors 7a, 7b, 7c, 7d are arranged in the operation controller 9 so as to face each magnetic body 5. It is arranged as shown in FIG. In the illustrated example, the transfer chamber 2 is partitioned by the airtight partition wall 2a into a lower chamber 2b in which the moving element 4 is housed and an upper chamber 2c in which the operation controller 9 is housed. The levitation control sensor 7 must detect the position of the mover 4 through the partition wall 2a, and therefore detects the magnetic flux of the levitation permanent magnet 5 arranged on the mounting plate 4b of the mover 4, for example, a Hall element. A magnetic transformer or an inductor-type sensor whose inductance changes due to a change in magnetic flux density is used, and the distance between the sensor 7 and the permanent magnet 5 can be detected by the change in magnetic flux density. Incidentally, a sensor magnet may be provided separately from the levitation permanent magnet 5.

【0012】各浮上制御用センサ7は、図5に示すよう
な、変換回路10、浮上誤差検出回路11、ピッチング
検出回路12、ローリング検出回路13、及び分配回路
14を有する浮上状態制御回路15を介して各電磁石6
のコイル6eに接続され、各検出回路11、12、13
に於ける検出値は、PID 演算回路16a、16b、16
cに於いてPID 制御(比例・積分・微分制御)され、そ
の出力値に応じて分配回路14により各コイル6aの電
圧値の配分を行ない、これにより所望の状態に該移動子
4の磁気浮上状態が制御される。該浮上誤差検出回路1
1は浮上制御用センサ7の検出値を浮上設定値と比較
し、移動子4の浮上距離を設定値に維持するように電磁
石6への電圧を制御する作用を営み、ピッチング検出回
路13は該移動子4の前後の浮上制御用センサ7の検出
値を比較して前後の電磁石6の電圧を調整し、該移動子
4の前後の傾き即ちピッチング方向の角度と設定値との
差をなくすようにして該移動子4が保持したワークaの
前後方向への落下を防止する作用を営み、ローリング検
出回路13は該移動子4の左右の浮上制御用センサ7の
検出値を比較して左右の電磁石6間の電圧を調整し、該
移動子4の左右の傾き即ちローリング方向の角度と設定
値との差をなくすようにして該移動子4が保持したワー
クaの左右方向への落下を防止する作用を営む。
Each levitation control sensor 7 includes a levitation state control circuit 15 having a conversion circuit 10, a levitation error detection circuit 11, a pitching detection circuit 12, a rolling detection circuit 13, and a distribution circuit 14, as shown in FIG. Through each electromagnet 6
Connected to the coil 6e of each of the detection circuits 11, 12, 13
The detected value in the PID calculation circuit 16a, 16b, 16
In c, PID control (proportional / integral / derivative control) is performed, and the voltage value of each coil 6a is distributed by the distribution circuit 14 according to the output value, whereby the magnetic levitation of the mover 4 is made in a desired state. The state is controlled. The floating error detection circuit 1
The reference numeral 1 compares the detection value of the levitation control sensor 7 with the levitation set value, and controls the voltage to the electromagnet 6 so as to maintain the levitation distance of the mover 4 at the set value. The voltages of the front and rear electromagnets 6 are adjusted by comparing the detection values of the levitation control sensor 7 before and after the moving element 4 so as to eliminate the difference between the front and rear inclination of the moving element 4, that is, the angle in the pitching direction and the set value. The rolling detection circuit 13 compares the detection values of the left and right levitation control sensors 7 of the moving element 4 to prevent the workpiece a held by the moving element 4 from falling in the front-back direction. The voltage between the electromagnets 6 is adjusted to eliminate the horizontal inclination of the moving element 4, that is, the difference between the angle in the rolling direction and the set value, to prevent the work a held by the moving element 4 from falling in the horizontal direction. Carry out the action.

【0013】該移動子4の磁気浮上状態は、ワークaの
保持の有無により変化し、図示のような長手の移動子4
の先端でワークaを保持する場合にはピッチング状態の
変化に大きく現れ、とりわけPID 制御したときのP値の
変化に大きく現れるので、ピッチング検出回路13のP
値を比較回路17に於いて設定値と比較し、その値が一
定範囲以上になったときワークaの有無の信号が出力さ
れるようにした。この有無の信号により、警報器を作動
させ或いは作動制御子9の駆動回路9aの作動停止させ
ることが出来、ワークaが搬送されなければ無意味に装
置が作動するときや、ワークaが搬出されていないとワ
ークaが破損させる装置の作動を未然に防止できる。
The magnetically levitated state of the moving element 4 changes depending on whether or not the work a is held, and has a long moving element 4 as shown in the figure.
When the work a is held at the tip of the pitching state, it greatly appears in the change of the pitching state, and especially in the change of the P value when PID control is performed.
The value is compared with the set value in the comparison circuit 17, and when the value exceeds a certain range, a signal indicating the presence or absence of the work a is output. The alarm signal can be activated or the drive circuit 9a of the activation controller 9 can be deactivated by the presence / absence signal, and when the work a is not conveyed, the apparatus is meaningless or the work a is unloaded. If this is not done, the operation of the device that damages the work a can be prevented.

【0014】該比較回路17の設定値は電圧により設定
され、この設定値はワークaのサイズで変るワークaの
重量に応じて切換回路18により変更される。また、該
PID演算回路16からの出力はノイズ等の影響による誤
動作を防ぐために低域3波回路(LPF )19を介して該
比較回路17に導入される。
The set value of the comparison circuit 17 is set by the voltage, and this set value is changed by the switching circuit 18 according to the weight of the work a which changes with the size of the work a. Also, the
The output from the PID calculation circuit 16 is introduced into the comparison circuit 17 via a low-pass three-wave circuit (LPF) 19 in order to prevent malfunction due to the influence of noise or the like.

【0015】該移動子4を磁気浮上させてこれの姿勢、
位置を制御するためには、6つの自由度を制御する必要
があるが、本発明のワーク検出の目的に関係ある自由度
は、重力方向・ピッチング方向・ローリング方向の自由
度であり、それ以外の自由度は割愛して説明されてい
る。図示の実施例に於いては、作動制御子9の各電磁石
6を励磁すると搬送室2内で移動子4の磁性体5が吸引
され、該移動子4が該電磁石6に支持された片持梁状に
浮上し、該移動子4を該搬送室2内に設けた昇降自在の
テーブル状の受渡し機構20にまで前進させるように該
作動制御子9が案内杆8に沿って前進する。該移動子4
のワーク保持部4aには該受渡し機構20が下降するこ
とによりシリコンウエハ等のワークaが載せられる。そ
して更に該作動制御子9が案内杆8に沿って前進させる
と、磁気により拘束された移動子4も前進し、ワークa
が真空処理室1内へ搬入されたところで該真空処理室1
内の受渡し機構21が上昇し、ワークaが該受渡し機構
21に渡される。続いて作動制御子9が案内杆8に沿っ
て後退し、搬送の行程が終了する。こうした作動に於い
て、図4に示すように、移動子4の重心が4個の浮上制
御用センサ7と4個の電磁石6の中心にあるとすれば、
4個の各浮上制御用センサ7の出力の和(A+B+C+
D)が重心位置での移動子4の浮上距離に比例した出力
となり、該移動子4のピッチング角度は、{(A+B)
−(C+D)}/Lとなり、同じくローリング角度は、
{(B+D)−(A+C)}/Wで求められる。ここ
で、Lは浮上制御用センサ7a(又は7b)と7c(又
は7d)の間隔、Wは7a(又は7c)と7b(又は7
d)の間隔である。これら3つの自由度の信号を、各検
出回路11、12、13に於いて浮上距離、ピッチング
角度、ローリング角度の夫々の設定値と比較し、その誤
差の出力を各PID 演算回路16に於いてPID 制御し、そ
の制御電圧が分配回路14を介して各電磁石6のコイル
に分配され、移動子4が所定の浮上距離、ピッチング角
度、ローリング角度に維持される。
The moving element 4 is magnetically levitated and its posture,
In order to control the position, it is necessary to control six degrees of freedom, but the degrees of freedom related to the purpose of the work detection of the present invention are the degrees of freedom in the gravity direction, the pitching direction, and the rolling direction, and other degrees. The degrees of freedom are omitted and explained. In the illustrated embodiment, when the electromagnets 6 of the operation controller 9 are excited, the magnetic body 5 of the mover 4 is attracted in the transfer chamber 2, and the mover 4 is cantilevered by the electromagnet 6. The operation controller 9 moves forward along the guide rod 8 so as to float in the shape of a beam and move the mover 4 up to a table-like delivery mechanism 20 that can be moved up and down provided in the transfer chamber 2. The mover 4
A work a such as a silicon wafer is placed on the work holder 4a by lowering the delivery mechanism 20. When the operation control element 9 is further advanced along the guide rod 8, the magnetically restrained movement element 4 is also advanced, and the work a
When the wafer is loaded into the vacuum processing chamber 1, the vacuum processing chamber 1
The delivery mechanism 21 inside rises, and the work a is delivered to the delivery mechanism 21. Then, the operation controller 9 moves backward along the guide rod 8 and the conveying process ends. In such an operation, if the center of gravity of the mover 4 is at the center of the four levitation control sensors 7 and the four electromagnets 6 as shown in FIG. 4,
Sum (A + B + C +) of the outputs of the four levitation control sensors 7
D) is an output proportional to the flying distance of the moving element 4 at the center of gravity, and the pitching angle of the moving element 4 is {(A + B).
-(C + D)} / L, and the rolling angle is
It is calculated by {(B + D)-(A + C)} / W. Here, L is the distance between the levitation control sensors 7a (or 7b) and 7c (or 7d), and W is 7a (or 7c) and 7b (or 7).
It is the interval of d). The signals of these three degrees of freedom are compared with the respective set values of the levitation distance, pitching angle and rolling angle in each of the detection circuits 11, 12 and 13, and the output of the error is compared in each PID arithmetic circuit 16. PID control is performed, and the control voltage is distributed to the coils of the electromagnets 6 via the distribution circuit 14, and the moving element 4 is maintained at a predetermined levitation distance, pitching angle, and rolling angle.

【0016】該移動子4にワークaが載ると、ピッチン
グ方向のモーメント変化が生じるが、その変化を4個の
センサ7で検出し、PID 制御でそのモーメント変化を打
消すような制御電圧が4個の電磁石6に分配され出力さ
れる。この時のモーメントの変化はピッチング検出回路
13の出力をPID 演算回路16のP値(比例)の制御電
圧に最も顕著に現れるので、このP値を比較回路17に
於いて或る設定値と比較することにより、ワークaの有
無の検出を出来る。この設定値は、移動子4にワークa
が載ることによるP値の変化の限界値に相当する電圧値
とすることが好ましく、比較回路17に於ける比較の結
果、P値が小さいときはワークaが移動子4に載ってい
ないか或いは正規の位置から位置ずれしていることが分
かり、P値が設定値よりも大きいときもワークaが位置
ずれしていることが分かる。このワーク検出方法は、搬
送室2に特別な機器や構成を設ける必要がなく、移動子
4の浮上制御の回路を利用して行なえ、複雑な構造の搬
送室であっても確実にワークaの有無を検出できる。
When the workpiece a is placed on the mover 4, a moment change in the pitching direction occurs. The change is detected by the four sensors 7 and a control voltage that cancels the moment change by PID control is 4%. It is distributed to the individual electromagnets 6 and output. The change in the moment at this time causes the output of the pitching detection circuit 13 to be most prominent in the control voltage of the P value (proportional) of the PID calculation circuit 16, so this P value is compared with a certain set value in the comparison circuit 17. By doing so, the presence or absence of the work a can be detected. This set value is set to the work a on the mover 4.
It is preferable to set the voltage value corresponding to the limit value of the change of the P value due to the fact that the work a is not placed on the mover 4 when the P value is small as a result of the comparison in the comparison circuit 17. It can be seen that the work is displaced from the normal position, and the work a is also displaced when the P value is larger than the set value. This work detection method does not require any special equipment or structure to be provided in the transfer chamber 2 and can be performed by using the levitation control circuit of the mover 4, and the work a can be reliably transferred even in a transfer chamber having a complicated structure. Presence can be detected.

【0017】また、ワークaの位置ずれのみを検出する
には、ローリング検出回路13に接続したPID 演算回路
16のP値(比例)を上記比較回路15と同様の比較回
路に於いて設定値と比較することにより行なえ、この場
合、位置ずれが大きいことにより搬送中にワークaが他
の機器等と干渉して落下・破損することの不都合を解消
できる。
Further, in order to detect only the positional deviation of the work a, the P value (proportional) of the PID calculation circuit 16 connected to the rolling detection circuit 13 is set as a set value in a comparison circuit similar to the comparison circuit 15. This can be done by comparison, and in this case, it is possible to eliminate the inconvenience that the workpiece a interferes with other equipment or the like and is dropped or damaged during transportation due to a large positional deviation.

【0018】以上の実施例では、移動子4の先端でワー
クaを搬送する場合を説明したが、移動子4を取付板4
aの位置に載せて搬送する場合、ワークaの有無による
移動子4のモーメントの変化がなく、この場合にはワー
クaの有無で移動子4の磁気浮上距離が変化するので、
浮上誤差検出回路11のPID 演算回路16のP値を比較
回路17に導入するように接続し、該P値を該比較回路
15に於いてワークaが載ったときの制御電圧に相当す
る設定値と比較することによりワークaの有無を検出で
きる。また、ワークaの有無で移動子4のローリング方
向の変化が顕著な場合には、前記の場合と同様に、比較
回路15にはローリング検出回路13のPID 演算回路1
6のP値を導入するように接続し、P値をワークaの有
無による制御電圧の変化に相当する設定値と比較するこ
とにより移動子4上のワークaの有無を検出できる。
In the above embodiments, the case where the work a is conveyed by the tip of the moving element 4 has been described, but the moving element 4 is attached to the mounting plate 4.
When the carriage 4 is carried on the position a, there is no change in the moment of the mover 4 depending on the presence or absence of the work a. In this case, the magnetic levitation distance of the mover 4 changes depending on the presence or absence of the work a.
The PID value of the PID calculation circuit 16 of the levitation error detection circuit 11 is connected so as to be introduced into the comparison circuit 17, and the P value is a set value corresponding to the control voltage when the work a is placed in the comparison circuit 15. The presence or absence of the work a can be detected by comparing with. Further, when the change in the rolling direction of the mover 4 is remarkable depending on the presence or absence of the work a, the PID calculation circuit 1 of the rolling detection circuit 13 is included in the comparison circuit 15 as in the case described above.
The presence or absence of the work a on the mover 4 can be detected by connecting so as to introduce the P value of 6 and comparing the P value with a set value corresponding to the change of the control voltage depending on the presence or absence of the work a.

【0019】[0019]

【発明の効果】以上のように本発明によるときは、磁気
浮上装置の浮上制御用センサの検出値に基づき磁気浮上
装置の電磁石へ分配される制御電圧の変化により移動子
のワークの保持の有無を検出するようにしたので、移動
子の搬送経路に特別なセンサや覗き窓を設ける必要がな
くワークの有無の検出を簡単に行なえ、複雑な構造の搬
送室内でも他の機器や構造部と干渉することなくワーク
の有無を確実に検出でき、搬送開始から終了までその検
出を継続して行なえ、必要な場合はワークのずれも検出
できて有利である等の効果がある。
As described above, according to the present invention, whether or not the work piece is held by the moving element is held by the change of the control voltage distributed to the electromagnet of the magnetic levitation device based on the detection value of the levitation control sensor of the magnetic levitation device. It is possible to detect the presence or absence of work without the need to install a special sensor or viewing window in the transfer path of the moving element, and it is possible to interfere with other devices and structures even in a transfer room with a complicated structure. The presence / absence of a work can be reliably detected without doing so, the detection can be continuously performed from the start to the end of conveyance, and the shift of the work can be detected if necessary, which is advantageous.

【図面の簡単な説明】[Brief description of drawings]

【図1】 従来例の截断側面図FIG. 1 is a cutaway side view of a conventional example.

【図2】 本発明の実施例の截断側面図FIG. 2 is a cutaway side view of an embodiment of the present invention.

【図3】 図2の移動子の平面図FIG. 3 is a plan view of the mover shown in FIG.

【図4】 図2の作動制御子の要部の斜視図FIG. 4 is a perspective view of a main part of the operation controller of FIG.

【図5】 浮上状態制御回路の線図FIG. 5 is a diagram of a floating state control circuit.

【符号の説明】[Explanation of symbols]

a ワーク 2 搬送室 3 磁気浮上装置 4 移動子 5、5a、5b、5c、5d 磁性体 6、6a、6b、6c、6d、 電磁石 7、7a、7b、7c、7d 浮上制御用センサ 9 作動制御子 9a 駆動回路 10 変換回路 11 浮上誤差検出
回路 12 ピッチング検出回路 13 ローリング検
出回路 14 分配回路 15 浮上状態制御
回路 16、16a、16b、16c、16d PID 演算回路 17 比較回路 18 切換回路 19 低域3波回路
a Work 2 Transport chamber 3 Magnetic levitation device 4 Moving element 5, 5a, 5b, 5c, 5d Magnetic body 6, 6a, 6b, 6c, 6d, Electromagnet 7, 7a, 7b, 7c, 7d Levitation control sensor 9 Operation control Child 9a Drive circuit 10 Conversion circuit 11 Levitation error detection circuit 12 Pitching detection circuit 13 Rolling detection circuit 14 Distribution circuit 15 Levitation state control circuit 16, 16a, 16b, 16c, 16d PID arithmetic circuit 17 Comparison circuit 18 Switching circuit 19 Low range 3 Wave circuit

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // H01L 21/203 S 9545−4M 21/3065 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location // H01L 21/203 S 9545-4M 21/3065

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 ワークを保持する移動子とこれに対向し
て設けた作動制御子とに、複数個の電磁石により該移動
子を磁気浮上させ且つ浮上制御用センサにより該移動子
の磁気浮上姿勢の制御可能な磁気浮上装置を設け、該磁
気浮上装置により磁気浮上させた該移動子が該作動制御
子の移動に追従して移動する磁気浮上搬送装置に於い
て、該磁気浮上装置の該センサの検出値に基づき該電磁
石へ分配する制御電圧の変化により該移動子のワークの
保持の有無を検出することを特徴とする磁気浮上搬送装
置に於けるワーク検出方法。
1. A magnetic levitation posture of a moving element holding a work piece and an operation control element provided opposite to the moving element by magnetically levitating the moving element with a plurality of electromagnets and a levitation control sensor. A controllable magnetic levitation device, wherein the magnetic levitation device magnetically levitates the moving element so as to follow the movement of the operation control element. The method of detecting a work in a magnetic levitation transfer apparatus, wherein the presence or absence of holding of the work by the mover is detected based on a change in a control voltage distributed to the electromagnet based on the detection value of.
【請求項2】 ワークを保持する移動子とこれに対向し
て設けた作動制御子とに、複数個の電磁石により該移動
子を磁気浮上させ且つ浮上制御用センサにより検出した
該移動子の浮上状態の信号と設定値との差の信号をPID
制御して複数個の電磁石に制御電圧を分配することによ
って該移動子の磁気浮上姿勢を制御する磁気浮上装置を
設け、該磁気浮上装置により磁気浮上した該移動子を該
作動制御子の移動に追従して移動させる磁気浮上搬送装
置に於いて、ピッチング方向の制御を行なう比例制御回
路の出力(P出力)とワークの重量に応じた設定値と比
較することにより該移動子のワークの保持の有無を検出
することを特徴とする磁気浮上搬送装置に於けるワーク
検出方法。
2. A moving element holding a work and an operation control element provided opposite to the moving element are magnetically levitated by a plurality of electromagnets, and the moving element is levitated by a levitation control sensor. PID the signal of the difference between the status signal and the set value
A magnetic levitation device for controlling the magnetic levitation posture of the moving element by controlling and distributing a control voltage to a plurality of electromagnets is provided, and the moving element magnetically levitated by the magnetic levitation apparatus is used to move the operation control element. In a magnetic levitation transport device that follows and moves, by comparing the output (P output) of a proportional control circuit for controlling the pitching direction with a set value according to the weight of the work, A method for detecting a work in a magnetic levitation transfer device, characterized by detecting the presence or absence of the work.
【請求項3】 ワークを保持する移動子に磁気浮上装置
を構成する永久磁石等の磁性体を複数個設け、該移動子
と対向して設けた作動制御子に各磁性体と協同して該移
動子を磁気浮上させる磁気浮上装置の電磁石を設け、該
作動制御子に該移動子の浮上状態を検出する磁気浮上装
置の浮上制御用センサを複数個設け、該センサで検出し
た信号と設定値との差の信号をPID制御して各電磁石の
電圧の分配値を制御することにより該作動制御子の移動
に追従して移動する該移動子の磁気浮上姿勢を制御する
ようにした磁気浮上搬送装置に於いて、該センサ信号と
設定値との差の信号のPID制御値のP値の変化をワーク
保持の有無検出用設定値と比較して該移動子のワーク保
持の有無を検出することを特徴とする磁気浮上搬送装置
に於けるワーク検出方法。
3. A mover holding a work is provided with a plurality of magnetic bodies such as permanent magnets constituting a magnetic levitation device, and an operation controller provided facing the mover cooperates with each magnetic body. An electromagnet of a magnetic levitation device that magnetically levitates the mover is provided, and a plurality of levitation control sensors of the magnetic levitation device that detect the levitation state of the mover are provided on the operation controller, and the signal detected by the sensor and the set value The magnetic levitation transfer is designed to control the magnetic levitation posture of the moving element that follows the movement of the operation controller by controlling the voltage distribution value of each electromagnet by PID controlling the signal of the difference between In the device, detecting the presence / absence of work holding of the mover by comparing the change in the P value of the PID control value of the signal of the difference between the sensor signal and the set value with the preset value for detecting the presence / absence of work holding Detection method in magnetic levitation transfer device characterized by .
【請求項4】 上記P値と設定値を比較する比較回路は
ワークのサイズに応じてその設定値が変更自在であり、
該P値の信号を低域3波回路を介して該比較回路へ入力
させたことを特徴とする請求項3に記載の磁気浮上搬送
装置に於けるワーク検出方法。
4. The comparison circuit for comparing the P value and the set value can change the set value according to the size of the work,
4. The method for detecting a work in a magnetic levitation transfer apparatus according to claim 3, wherein the P value signal is input to the comparison circuit via a low-frequency three-wave circuit.
【請求項5】 ワークを保持する移動子に磁気浮上装置
を構成する永久磁石等の磁性体を複数個設け、該移動子
と対向して設けた作動制御子に各磁性体と協同して該移
動子を磁気浮上させる磁気浮上装置の電磁石を設け、該
作動制御子に該移動子の浮上状態を検出する磁気浮上装
置の浮上制御用センサを複数個設け、該センサで検出し
た信号と設定値との差の信号をPID制御して各電磁石の
電圧の分配値を制御することにより該作動制御子の移動
に追従して移動する該移動子の磁気浮上姿勢を制御する
ようにした磁気浮上搬送装置に於いて、該センサ信号と
設定値との差の信号のPID制御値のP値の変化をワーク
保持の有無検出用設定値と比較する比較回路を設け、該
比較回路を該作動制御子の駆動回路に接続したことを特
徴とする磁気浮上搬送装置に於けるワーク検出装置。
5. A moving body for holding a work is provided with a plurality of magnetic bodies such as permanent magnets constituting a magnetic levitation device, and an operation controller provided facing the moving body cooperates with each magnetic body. An electromagnet of a magnetic levitation device that magnetically levitates the mover is provided, and a plurality of levitation control sensors of the magnetic levitation device that detect the levitation state of the mover are provided on the operation controller, and the signal detected by the sensor and the set value The magnetic levitation transfer is designed to control the magnetic levitation posture of the moving element that follows the movement of the operation controller by controlling the voltage distribution value of each electromagnet by PID controlling the signal of the difference between The apparatus is provided with a comparison circuit for comparing a change in the P value of the PID control value of the signal of the difference between the sensor signal and the set value with the set value for detecting the presence / absence of work holding, and the comparison circuit is provided with the operation controller. Magnetic levitation transport device characterized by being connected to the drive circuit of Work detection device in storage.
JP15363494A 1994-07-05 1994-07-05 Work detection method and device in magnetic levitation transfer device Expired - Fee Related JP3599782B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15363494A JP3599782B2 (en) 1994-07-05 1994-07-05 Work detection method and device in magnetic levitation transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15363494A JP3599782B2 (en) 1994-07-05 1994-07-05 Work detection method and device in magnetic levitation transfer device

Publications (2)

Publication Number Publication Date
JPH0812076A true JPH0812076A (en) 1996-01-16
JP3599782B2 JP3599782B2 (en) 2004-12-08

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US20220246458A1 (en) * 2021-01-29 2022-08-04 Korea University Research And Business Foundation Magnetic transfer apparatus and fabrication method of the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006303249A (en) * 2005-04-21 2006-11-02 Ebara Corp Wafer delivery device, polishing unit, and wafer receiving method
US8118640B2 (en) 2005-04-21 2012-02-21 Ebara Corporation Wafer transferring apparatus, polishing apparatus, and wafer receiving method
KR101374693B1 (en) * 2005-04-21 2014-03-17 가부시키가이샤 에바라 세이사꾸쇼 Wafer transfer apparatus, polishing apparatus and wafer receiving method
CN112129829A (en) * 2020-09-21 2020-12-25 上海交通大学 Flow type defect detection method based on diamagnetic suspension principle
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US20220246458A1 (en) * 2021-01-29 2022-08-04 Korea University Research And Business Foundation Magnetic transfer apparatus and fabrication method of the same
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