JPH08112863A - Optical formation device - Google Patents

Optical formation device

Info

Publication number
JPH08112863A
JPH08112863A JP6251072A JP25107294A JPH08112863A JP H08112863 A JPH08112863 A JP H08112863A JP 6251072 A JP6251072 A JP 6251072A JP 25107294 A JP25107294 A JP 25107294A JP H08112863 A JPH08112863 A JP H08112863A
Authority
JP
Japan
Prior art keywords
light source
liquid crystal
crystal shutter
source unit
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6251072A
Other languages
Japanese (ja)
Other versions
JP3555627B2 (en
Inventor
Terukazu Kokubo
輝一 小久保
Fusazumi Masaka
房澄 真坂
Naoki Ryutsu
直樹 柳通
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP25107294A priority Critical patent/JP3555627B2/en
Publication of JPH08112863A publication Critical patent/JPH08112863A/en
Application granted granted Critical
Publication of JP3555627B2 publication Critical patent/JP3555627B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Liquid Crystal (AREA)

Abstract

PURPOSE: To reduce the size of a device, form an aimed large-sized, three- dimensional model with high accuracy in a short time, and eliminate the process of smoothing the liquid surface by the use of a smoothing plate. CONSTITUTION: Provided in a freely traveling relation in the traveling direction of a liquid shutter 5 is a light source unit 10 that can stop at each passage in the divided sections having a plurality of divided traveling ranges of the liquid shutter 5 capable of traveling in parallel with respect to the liquid surface of an optically curable resin 2. A linear light source 11 is housed in the inner part of the light source unit so that its longitudinal direction intersects the traveling direction of the liquid shutter substantially at right angtes, and a smoothing plate 18 is secured to be movable vertically at the front surface and rear surface in the traveling direction of the light source unit 10, and further a controller 19 is provided which serves to indicate the cross-sectional pattern of three-dimensional patterns corresponding to the divided sections, and during the period of stoppage of the liquid shutter 5 that can stop at each passage of the divided sections, the linear light source 11 passes through on the liquid shutter 5 and performs a dividing exposure operation, thus hardening the curable resin 2 optically.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液状の光硬化性樹脂に
光を照射し、所望の形状を持つ立体モデルを形成する光
造形装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photolithography apparatus for irradiating a liquid photocurable resin with light to form a three-dimensional model having a desired shape.

【0002】[0002]

【従来の技術】従来、光造形装置としては、液状の光硬
化性樹脂の表面にスポット状のレーザ光を平面的に走査
させて目的造形物の断面パターンを描く露光を行って、
レーザ光が当たった部分に位置する光硬化性樹脂のみを
硬化させて薄膜の硬化樹脂層を形成し、この硬化樹脂層
を連続的に幾層にも積層することで、立体モデルを形成
するようにしたものが一般に知られている。
2. Description of the Related Art Conventionally, as a stereolithography apparatus, a surface of a liquid photo-curable resin is exposed to a laser beam in the form of a spot so that a cross-sectional pattern of a target sculpture is drawn.
By curing only the photo-curable resin located in the part exposed to the laser beam to form a thin cured resin layer, and stacking this cured resin layer continuously, it is possible to form a three-dimensional model. Those that have been made known are generally known.

【0003】しかしながら、このようなレーザ光による
露光方式を採用した光造形装置の場合、レーザ光での走
査は、一筆書きによる長い線を描くのと同様の工程とな
るため、造形に長時間が必要であった。
However, in the case of an optical molding apparatus that employs such an exposure method using laser light, scanning with laser light is the same process as drawing a long line by one stroke, and therefore it takes a long time to form. Was needed.

【0004】このため、レーザ光の代わりに、平行光を
用いた光造形装置、即ち、平行光の光源と光硬化性樹脂
との間に液晶シャッタを配置し、この液晶シャッタ上に
表示した立体モデル(目的造形物)の断面パターンをマ
スクパターン(露光マスクパターン)として使用して、
このマスクパターンを介した平行光による一括露光で高
速に光硬化性樹脂を硬化させるようにしたものが広く知
られている(例えば、特開昭62−288844号公
報、特開平3−227222号公報、実開平2−317
26号公報等参照)。
Therefore, instead of the laser light, a stereolithography apparatus using parallel light, that is, a liquid crystal shutter is arranged between a light source of parallel light and a photocurable resin, and a stereoscopic image displayed on the liquid crystal shutter is displayed. Using the cross-sectional pattern of the model (objective object) as a mask pattern (exposure mask pattern),
It is widely known that the photocurable resin is cured at a high speed by collective exposure with parallel light through the mask pattern (for example, JP-A-62-288844 and JP-A-3-227222). , Actual Kaihei 2-317
26).

【0005】また、特開平4−305438号公報に、
微小ドットエリアの光シャッタを連続的に一列に配置し
て露光マスクを構成し、この露光マスクを光源と一体に
前記光シャッタの配列方向と直交する方向に走査させな
がら、露光領域を前記走査方向に沿って順次変化させつ
つ一層の硬化樹脂膜を形成するようにしたものが提案さ
れている。
Further, in Japanese Patent Laid-Open No. 4-305438,
An exposure mask is formed by continuously arranging optical shutters for minute dot areas in a line, and the exposure region is scanned in the scanning direction while scanning the exposure mask integrally with a light source in a direction orthogonal to the arrangement direction of the optical shutters. It has been proposed that one layer of cured resin film be formed while being sequentially changed along with.

【0006】ここに、光造形装置においては、前記レー
ザ光や平行光による液状の光硬化性樹脂への露光を行う
前に、光硬化性樹脂の液面を平滑化させたり、該樹脂の
積層厚を一定に保つ目的で、例えばスキージ等の平板を
光硬化性樹脂の液面に接触させつつ該樹脂の液面上を移
動させる工程を行うことが一般化している。
Here, in the stereolithography apparatus, before the liquid photocurable resin is exposed to the laser light or parallel light, the liquid surface of the photocurable resin is smoothed or the resin is laminated. For the purpose of keeping the thickness constant, for example, a step of moving a flat plate such as a squeegee on the liquid surface of the photocurable resin while contacting the liquid surface of the photocurable resin has been generalized.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、前記液
晶シャッタと平行光を用いた従来例の場合、平行光によ
る一括露光を行うためには、平板状の液晶シャッタの面
積と少なくとも同じだけの面積を照射する照射強度の均
一な平行光が必要となり、液晶シャッタの寸法が大きい
ほど、例えば高圧水銀ランプ等の光源から均一な平行光
を得るために、大型のレンズや反射板等を使用し、しか
も長い光路長が必要となって、光源、ひいては装置全体
が大型化してしまうばかりでなく、照射エネルギの損失
も増大してしまうといった問題があった。
However, in the case of the conventional example using the liquid crystal shutter and parallel light, in order to perform collective exposure by parallel light, an area at least equal to the area of the flat plate-shaped liquid crystal shutter is required. It is necessary to use parallel light with uniform irradiation intensity, and as the size of the liquid crystal shutter increases, a large lens or reflector is used to obtain uniform parallel light from a light source such as a high-pressure mercury lamp. There is a problem that a long optical path length is required, and not only the light source, and hence the entire apparatus, becomes large in size, but also the loss of irradiation energy increases.

【0008】また、光シャッタを一列に配置して露光マ
スクを構成し、露光領域を露光マスクの走行方向に沿っ
て順次変化されるようにした場合、光シャッタの構成が
かなり複雑で動作の信頼性が欠けるばかりでなく、ドッ
トエリアの微細化にも一定の制限があり、しかも光シャ
ッタを2列以上に配置して露光マスクを構成することが
できずに、露光時間の増大につながると考えられる。
Further, when the optical shutters are arranged in a row to form an exposure mask and the exposure area is sequentially changed along the traveling direction of the exposure mask, the structure of the optical shutter is considerably complicated and the operation reliability is high. In addition to the lack of performance, there is a certain limit to the miniaturization of the dot area, and it is considered that the exposure mask cannot be configured by arranging the optical shutters in two or more rows, leading to an increase in the exposure time. To be

【0009】さらに、液状の光硬化性樹脂の液面の平滑
化を行う工程は、光硬化性樹脂の粘度が高いときなどに
液面を平滑化させる時間を短縮するために必要である
が、露光時間に関わらず常に一定の時間を要するため、
造形時間の短縮化の妨げとなっていた。
Further, the step of smoothing the liquid surface of the liquid photocurable resin is necessary in order to shorten the time for smoothing the liquid surface when the viscosity of the photocurable resin is high. Since it always takes a certain amount of time regardless of the exposure time,
This has been an obstacle to shortening the molding time.

【0010】本発明は、上記問題点に鑑みてなされたも
ので、構成が簡単で、しかも大型化することがなく、大
型の目的立体モデルを精度よく、かつより短時間で造形
することができる光造形装置を提供することを目的とす
る。
The present invention has been made in view of the above problems, and has a simple structure and does not increase in size, and a large target three-dimensional model can be shaped accurately and in a shorter time. An object is to provide a stereolithography apparatus.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、光硬化性樹脂を収容した容器の上方に、
光を選択的に透過または遮光する液晶シャッタを光硬化
性樹脂の液面に対して平行状に走行し得るように配置
し、該液晶シャッタの走行範囲を複数に分割した分割区
間の各通過点で停止自在な光源ユニットを液晶シャッタ
の走行方向に走行自在に配置し、該光源ユニットの内部
に、前記液晶シャッタの上方であってかつ長手方向が前
記液晶シャッタの走行方向とほぼ直交するように線状光
源を収容し、前記光源ユニットの走行方向の前面および
後面に、該光源ユニットの走行方向に対して直交状に延
びて前記光硬化性樹脂の表面を平滑化させる平滑板を上
下動自在に取付け、前記分割区間に対応する立体モデル
の断面パターンを前記液晶シャッタに表示する制御部を
設け、前記液晶シャッタは前記分割区間の各通過点で停
止自在であって、該液晶シャッタの停止中に前記線状光
源が該液晶シャッタ上を通過して分割露光を行う一連の
動作を該液晶シャッタの一方向における走行範囲におい
て繰り返すことにより前記光硬化性樹脂の一層の硬化を
行うことを特徴とするものである。
In order to achieve the above object, the present invention provides, above a container containing a photocurable resin,
Liquid crystal shutters that selectively transmit or block light are arranged so that they can travel in parallel to the liquid surface of the photocurable resin, and the travel points of the liquid crystal shutters are divided into a plurality of divided points. A light source unit that can be stopped in the direction of travel of the liquid crystal shutter is arranged so that it can travel freely inside the light source unit so that the longitudinal direction above the liquid crystal shutter is substantially orthogonal to the direction of travel of the liquid crystal shutter. A smooth plate that accommodates a linear light source and is vertically movable on the front surface and the rear surface in the traveling direction of the light source unit and extends orthogonally to the traveling direction of the light source unit to smooth the surface of the photocurable resin. And a control unit for displaying a sectional pattern of a three-dimensional model corresponding to the divided section on the liquid crystal shutter, the liquid crystal shutter being stoppable at each passage point of the divided section, By further repeating a series of operations in which the linear light source passes over the liquid crystal shutter and performs divided exposure while the crystal shutter is stopped in the traveling range in one direction of the liquid crystal shutter, further curing of the photocurable resin is performed. It is characterized by performing.

【0012】[0012]

【作用】分割区間に対応する立体モデルの断面パターン
が表示された液晶シャッタの停止中に、線状光源がこの
液晶シャッタ上を通過して分割露光を行う一連の動作の
繰り返しにより、大きな目的立体モデルを比較的短時間
で造形することができる。また、光源ユニットに取り付
けられた平滑板が、光源ユニットの走行時に、分割露光
に先立って光硬化性樹脂の表面を平滑化するので、別途
平滑化工程を設ける必要がなく、したがって当該工程の
省略化に伴って時間の短縮化が図れる。
When the liquid crystal shutter in which the sectional pattern of the stereo model corresponding to the divided section is displayed is stopped, the linear light source passes over the liquid crystal shutter to perform a divided exposure. The model can be molded in a relatively short time. Further, since the smoothing plate attached to the light source unit smoothes the surface of the photocurable resin prior to the divided exposure when the light source unit is running, it is not necessary to provide a separate smoothing step, and thus the step can be omitted. As time goes by, the time can be shortened.

【0013】[0013]

【実施例】以下、本発明の実施例を図面を参照して説明
する。図1において、付番1は、上方に開口した断面矩
形状の容器(樹脂槽)で、この容器1の内部には、光が
当たると液体から固体に硬化する液状の光硬化性樹脂2
が満たされている。この光硬化性樹脂2は、光エネルギ
ーによって重合反応を起こして、液体が固体に変化する
という特性を持った樹脂で、例えば光重合性ポリマー、
光開始剤、特性改善のための添加剤等を含むことができ
る。
Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, reference numeral 1 is a container (resin tank) having a rectangular cross-section that opens upward, and inside the container 1, a liquid photocurable resin 2 that cures from a liquid to a solid when exposed to light.
Is satisfied. The photocurable resin 2 is a resin having a characteristic that a liquid undergoes a polymerization reaction by light energy to change into a solid, and for example, a photopolymerizable polymer,
It may contain a photoinitiator, an additive for improving characteristics, and the like.

【0014】前記容器1の一側方には、前記容器1内に
位置して昇降自在な平板状のエレベータ3を備えた位置
制御可能なエレベータ昇降機構4が配置され、このエレ
ベータ3の上に光硬化樹脂2が硬化することによって得
られる硬化樹脂層2aが順次積層されるようになってい
る。
On one side of the container 1, there is arranged a position-controllable elevator elevating mechanism 4 provided with a flat plate-shaped elevator 3 which is located in the container 1 and can be raised and lowered. A cured resin layer 2a obtained by curing the photocurable resin 2 is sequentially laminated.

【0015】また、前記容器1の相対向する両側には、
図2に示すように、内側レール6が互いに平行に配置さ
れ、この内側レール6にはエアー圧やステッピングモー
タ等の駆動装置によって走行する位置制御可能な直線移
動機構7が配置されている。この移動機構7は、容器1
を跨架する水平枠材7aと、水平枠材7aの両端から下
方に延びてレール6上を走行する垂直枠材7bとからな
り、液晶シャッタ5の一側端が光硬化性樹脂の液面に対
し平行状になるように保持されている。
On both sides of the container 1 facing each other,
As shown in FIG. 2, inner rails 6 are arranged in parallel with each other, and a linear movement mechanism 7 that is positionally controllable to travel by a driving device such as air pressure or a stepping motor is arranged on the inner rails 6. This moving mechanism 7 includes a container 1
A horizontal frame member 7a and a vertical frame member 7b extending downward from both ends of the horizontal frame member 7a and traveling on the rail 6. One side end of the liquid crystal shutter 5 is a liquid surface of the photocurable resin. It is held so as to be parallel to.

【0016】前記液晶シャッタ5は、目的立体モデルの
断面パターンを直線移動機構7の移動方向と直交する方
向に任意に分割して透過部と遮光部で表示できるもので
あれば良く、例えば、STN型液晶パネル、TN型液晶
パネル、ポリマー分散型液晶パネル等を使用することが
できる。
The liquid crystal shutter 5 may be any one as long as it can divide the cross-sectional pattern of the target stereo model into a direction orthogonal to the moving direction of the linear moving mechanism 7 and display it with a transmitting portion and a light shielding portion, for example, STN. Type liquid crystal panel, TN type liquid crystal panel, polymer dispersion type liquid crystal panel and the like can be used.

【0017】更に、内側レール6の両側には、内側レー
ルに対して平行な外側レール8が配置され、エアー圧や
ステッピングモータ等の駆動装置によって走行する位置
制御可能な直線移動機構9が外側レール8に走行自在に
設置されている。この移動機構9は容器1を跨架する水
平部9aと、水平部9aの両端から下方に延びてレール
を走行する支柱9bとからなり、水平部9aは光源ユニ
ット10を形成する。この光源ユニット10の内部に
は、液晶シャッタ5が挿通する矩形状の窓部10aが形
成されている。
Further, outer rails 8 which are parallel to the inner rails are arranged on both sides of the inner rails 6, and a linear movement mechanism 9 which can be moved by a driving device such as air pressure or a stepping motor is positionally controllable. It is installed so that it can run freely. The moving mechanism 9 is composed of a horizontal portion 9a that straddles the container 1 and a support column 9b that extends downward from both ends of the horizontal portion 9a and travels on a rail. The horizontal portion 9a forms a light source unit 10. Inside the light source unit 10, a rectangular window portion 10 a through which the liquid crystal shutter 5 is inserted is formed.

【0018】このように光源ユニット10は、容器1の
上方に位置し、いわば液晶シャッタ5を挟むような状態
で、直線移動機構9の駆動によって光源ユニット10
が、その幅方向に水平に走行し、しかもこの走行が液晶
シャッタ5によって阻害されないようになっている。
As described above, the light source unit 10 is located above the container 1 and, so to speak, sandwiches the liquid crystal shutter 5 and is driven by the linear movement mechanism 9 to drive the light source unit 10.
However, the liquid crystal shutter 5 travels horizontally in the width direction, and the travel is not obstructed by the liquid crystal shutter 5.

【0019】なお、この実施例では、直線移動機構とし
て、位置及び速度の制御が比較的容易なエアー圧やステ
ッピングモータ等を使用した例を示しているが、油圧シ
リンダ等、任意のものを使用しても良いことは勿論であ
るあるが、直線移動機構7は少なくとも液晶シャッタの
画素サイズより高精度の位置合わせ精度を必要とする。
In this embodiment, as the linear movement mechanism, an example of using air pressure or a stepping motor whose position and speed are relatively easy to control is shown, but an arbitrary one such as a hydraulic cylinder is used. Needless to say, the linear movement mechanism 7 needs a positioning accuracy higher than at least the pixel size of the liquid crystal shutter.

【0020】前記光源ユニット10の内部の前記液晶シ
ャッタ5の上方位置には、光源ユニットの走行方向と直
交する方向、すなわち、ユニットの長さ方向に沿いその
ほぼ全長に亘って直線状に延びる線状光源11が前記光
硬化性樹脂2の液面と平行に配置されて収容されてい
る。
At a position above the liquid crystal shutter 5 inside the light source unit 10, a line extending in a direction orthogonal to the traveling direction of the light source unit, that is, along the length direction of the unit and extending substantially along the entire length thereof is linear. The light source 11 is arranged and housed in parallel with the liquid surface of the photocurable resin 2.

【0021】この線状光源11は、液晶シャッタ5をこ
の線状光源11の長さ方向に対して、少なくとも80%
以上の照度分布で光を照射できるのであれば良く、例え
ば、クリプトンロングアークランプ、キセノンロングア
ークランプ、メタルハライドロングアークランプ、水銀
ロングアークランプ等を使用することができる。
The linear light source 11 has at least 80% of the liquid crystal shutter 5 in the length direction of the linear light source 11.
It suffices that light can be emitted with the above illuminance distribution, and for example, a krypton long arc lamp, a xenon long arc lamp, a metal halide long arc lamp, a mercury long arc lamp, or the like can be used.

【0022】前記線状光源11の上方には、図3に示す
ように、この線状光源11から出た光を反射して、この
反射光を前記液晶シャッタ5上に集光させる円弧状の反
射ミラー12が配置され、この反射ミラー12の下方で
前記液晶シャッタ5の上方位置には、前記線状光源11
からの熱エネルギーや光エネルギーによる液晶へのダメ
ージを防止するための熱線吸収フィルタ13と光の透過
と遮光を切り替えるためのメカニカルシャッタ14とが
上下に平行にこの順序で配置され、これらは前記光源ユ
ニット10内に収容されている。
Above the linear light source 11, as shown in FIG. 3, the light emitted from the linear light source 11 is reflected, and the reflected light is focused on the liquid crystal shutter 5. A reflection mirror 12 is arranged, and the linear light source 11 is provided below the reflection mirror 12 and above the liquid crystal shutter 5.
A heat ray absorption filter 13 for preventing damage to the liquid crystal due to heat energy or light energy from the above, and a mechanical shutter 14 for switching between transmission and blocking of light are arranged in this order in parallel in the vertical direction. It is housed in the unit 10.

【0023】なお、図4に示すように、前記線状光源1
1からの光のうち、後述する等倍結像素子16を通過で
きない入射角を有する光成分を遮断し、光量を調節する
遮光板組立体17を線状光源11と熱線吸収フィルタ1
3との間に配置してもよい。
As shown in FIG. 4, the linear light source 1
The light source 1 and the heat ray absorption filter 1 are provided with a light blocking plate assembly 17 that blocks a light component having an incident angle that cannot pass through a unity-magnification imaging element 16 to be described later and adjusts the amount of light.
It may be arranged between 3 and 3.

【0024】この遮光板組立体17は、複数の長方形の
薄板17aから構成され、等倍結像素子の開口角より大
きな角度成分光を遮光するもので、図5(a)、(b)
に示すように、高さlの長方形の薄板を垂直に立て、該
薄板のそれぞれの面が平行になるように間隔dを置い
て、線状光源の長さ方向にスリット状に、或いは線状光
源の長さ方向と幅方向に格子状に配列され、前記薄板の
高さlと間隔dを調節して、入射角tan-1(d/l)
以上の光線成分を遮光する。
The light-shielding plate assembly 17 is composed of a plurality of rectangular thin plates 17a, and shields angle component light larger than the aperture angle of the equal-magnification image-forming element, as shown in FIGS.
, A rectangular thin plate having a height of 1 is set upright and spaced at intervals d so that the respective surfaces of the thin plate are parallel to each other, and a slit or linear shape is formed in the length direction of the linear light source. The light sources are arranged in a lattice shape in the length direction and the width direction, and the height l and the interval d of the thin plates are adjusted to adjust the incident angle tan −1 (d / l).
The above light ray components are shielded.

【0025】また、遮光体組立体17は、線状光源の長
さ方向の光量を均一化する機能をも果たし、高さlの長
方形の薄板を垂直に立て、該薄板のそれぞれの面が平行
になるように間隔dを置いて、線状光源の長さ方向にス
リット状に、或いは線状光源の長さ方向と幅方向に格子
状に配列され、線状光源の長さ方向に並んだ前記薄板の
間隔dを部分的に変えることにより、遮光板を透過する
光量を部分的に調節することができる。
The light shield assembly 17 also has a function of equalizing the amount of light in the lengthwise direction of the linear light source. A rectangular thin plate having a height of 1 is erected vertically, and the respective faces of the thin plates are parallel to each other. Are arranged in a slit shape in the lengthwise direction of the linear light source or in a grid shape in the lengthwise and widthwise directions of the linear light source, and are arranged in the lengthwise direction of the linear light source. By partially changing the distance d between the thin plates, the amount of light transmitted through the light shield plate can be partially adjusted.

【0026】通常、光量の調節は間隔dを変えることに
より行うが、高さlを単独で変えることにより行うこと
も可能であり、あるいは間隔dと高さlとの双方を変え
ることにより行うことも可能である。
Normally, the amount of light is adjusted by changing the distance d, but it is also possible to change the height 1 independently, or by changing both the distance d and the height 1. Is also possible.

【0027】また、遮光板組立体17の配列は、スリッ
ト状又は格子状に限らず、ハニカム状であってもよい。
なお、ここに遮光板とは光の反射の少ない、即ち光を吸
収し易く且つ透過光のロスを少なくするためできるだけ
薄板であればよく、例えば、黒アルマイト処理したアル
ミ板や黒染めした薄い鉄板等が使用できる。
The arrangement of the light shielding plate assembly 17 is not limited to the slit shape or the grid shape, but may be a honeycomb shape.
Here, the light-shielding plate means that it is as thin as possible in order to reduce the reflection of light, that is, to easily absorb the light and reduce the loss of the transmitted light, for example, a black anodized aluminum plate or a black ironed thin iron plate. Etc. can be used.

【0028】更に、図3および4に示すように、光源ユ
ニット10の前記液晶シャッタ5の下方位置には、光硬
化性樹脂2の上方に位置して前記液晶シャッタ5の透過
光を光硬化性樹脂2の液面に結像する等倍結像素子16
が配置されている。
Further, as shown in FIGS. 3 and 4, the light source unit 10 is located below the liquid crystal shutter 5 and above the photocurable resin 2 so as to photocur the transmitted light of the liquid crystal shutter 5. An equal-magnification image forming element 16 for forming an image on the liquid surface of the resin 2.
Is arranged.

【0029】この等倍結像素子16は、液晶シャッタ5
を透過した透過パターン光のうち、垂直に近い角度成分
を有する光のみを効率良く光硬化性樹脂2の液面に結像
できる幅と長さを有するものであれば良く、例えば、セ
ルホックレンズを列状に並べたセルホックレンズアレー
等を使用することができる。
The same-magnification image forming element 16 is provided in the liquid crystal shutter 5.
Of the transmission pattern light that has passed through, the light having a width and a length that can efficiently form only the light having an angle component close to vertical on the liquid surface of the photocurable resin 2 may be used. It is possible to use a self-hook lens array in which the cells are arranged in rows.

【0030】図1ないし図4に示すように、光源ユニッ
ト10の走行方向の前後面、即ち幅方向の両側には、光
源ユニット10の長さ方向に沿ってそのほぼ全長に亘っ
て直線状に延びて光硬化性樹脂2の液面を平滑化する一
対の平滑板18が取り付けられている。
As shown in FIGS. 1 to 4, on the front and rear surfaces of the light source unit 10 in the traveling direction, that is, on both sides in the width direction, along the length direction of the light source unit 10 substantially linearly. A pair of smooth plates 18 that extend to smooth the liquid surface of the photocurable resin 2 is attached.

【0031】この平滑板18は、それぞれ独立に駆動で
きる昇降機構を介して上下動自在に構成され、前記光源
ユニット10の進行方向の前方側に位置する一方の平滑
板18をこの下端が光硬化性樹脂2の液面に接触するま
で下降させることにより、光源ユニット10の走行に伴
って、光硬化性樹脂2の液面の平滑化を行うようになっ
ている。
The smooth plate 18 is configured to be movable up and down via an elevating mechanism that can be independently driven, and the lower end of one of the smooth plates 18 located on the front side in the traveling direction of the light source unit 10 is photocured. The liquid surface of the photocurable resin 2 is smoothed as the light source unit 10 travels by lowering the liquid surface of the photocurable resin 2 until it comes into contact with the liquid surface.

【0032】図1に示すように、エレベータ昇降機構
4、直線移動機構7、9の位置と速度、液晶シャッタ5
の表示、メカニカルシャッタ14のオン・オフ、平滑板
18の昇降等をそれぞれ独立に制御する制御装置として
のコンピュータ19が備えられ、このコンピュータ(制
御装置)19は、目的立体モデルの断面パターン(造形
データ)を格納したデータファイル20に接続されてい
る。
As shown in FIG. 1, the positions and speeds of the elevator lifting mechanism 4, the linear moving mechanisms 7 and 9, and the liquid crystal shutter 5 are used.
Is displayed, the mechanical shutter 14 is turned on and off, the smoothing plate 18 is moved up and down, and the like. A computer 19 is provided as a control device. (Data) is connected to the data file 20 storing the data.

【0033】そして、このコンピュータ19は、データ
ファイル20から目的立体モデルの断面パターンを呼出
し、この断面パターンを液晶シャッタ5の移動方向と直
交する方向に複数の分割パターンに分割し、この分割パ
ターンのうちの液晶シャッタ5の容器1上における位置
に対応する分割パターンを液晶シャッタ5上に白黒の2
階調のマスクパターンで表示させるようになっている。
Then, the computer 19 calls the cross-sectional pattern of the target stereo model from the data file 20, divides this cross-sectional pattern into a plurality of divided patterns in the direction orthogonal to the moving direction of the liquid crystal shutter 5, and divides this divided pattern. A division pattern corresponding to the position of the liquid crystal shutter 5 on the container 1 is displayed on the liquid crystal shutter 5 in black and white.
It is designed to be displayed with a gradation mask pattern.

【0034】このように、コンピュータ19による制御
により、前記エレベータ3の表面に液状の光硬化性樹脂
2が硬化することによって得られる硬化樹脂層2aを順
次積層して、この硬化樹脂層2aからなる立体モデルを
形成するものであるが、これを以下のようにして行う。
As described above, under the control of the computer 19, the cured resin layer 2a obtained by curing the liquid photocurable resin 2 on the surface of the elevator 3 is sequentially laminated, and the cured resin layer 2a is formed. A three-dimensional model is formed, which is performed as follows.

【0035】先ず、エレベータ昇降機構4を駆動させ
て、最上段に位置する硬化樹脂層2a(またはエレベー
タ4の表面)の上に位置する光硬化性樹脂2が所定の深
さΔhになるようにする。
First, the elevator elevating mechanism 4 is driven so that the photocurable resin 2 located on the uppermost cured resin layer 2a (or the surface of the elevator 4) has a predetermined depth Δh. To do.

【0036】次に、データファイル20に格納されてい
る目的立体モデルの断面パターン(断面形状データ)を
呼び出して、この断面パターンを液晶シャッタ5の移動
方向と直交する方向に複数の分割パターンに分割し、こ
の分割パターンのうちの液晶シャッタ5の容器1上にお
ける位置に対応する分割パターンを液晶シャッタ5の容
器1上における位置に対応する分割パターンを液晶シャ
ッタ5上に白黒の2階調のマスクパターンで前記液晶シ
ャッタ5に表示させる。
Next, the cross-sectional pattern (cross-sectional shape data) of the target stereo model stored in the data file 20 is called, and this cross-sectional pattern is divided into a plurality of division patterns in the direction orthogonal to the moving direction of the liquid crystal shutter 5. The division pattern corresponding to the position of the liquid crystal shutter 5 on the container 1 among the division patterns is a division pattern corresponding to the position of the liquid crystal shutter 5 on the container 1 on the liquid crystal shutter 5 with a black and white two-tone mask. A pattern is displayed on the liquid crystal shutter 5.

【0037】この状態で、光源ユニット10を液晶シャ
ッタ5の一方の端辺から他方の端辺まで、メカニカルシ
ャッタ14を開き、直線移動機構9の駆動によって一定
の速度で平行移動させることにより、△hの光硬化性樹
脂2を硬化させ、一層の硬化樹脂層2aのうちの液晶シ
ャッタ5の位置に対応した一部を形成する。
In this state, the light source unit 10 is opened from one end side of the liquid crystal shutter 5 to the other end side of the mechanical shutter 14, and the linear movement mechanism 9 is driven to move the light source unit 10 in parallel at a constant speed. The photocurable resin 2 of h is cured to form a part of the cured resin layer 2a of one layer corresponding to the position of the liquid crystal shutter 5.

【0038】更に、直線移動機構7の駆動によって液晶
シャッタ5を次の分割パターン表示位置まで移動させ、
液晶シャッタ5の一方の端辺まで光源ユニット10をメ
カニリカルシャッタ14を閉じた状態で直線移動機構9
の駆動によって戻した後に、メカニカルシャッタ14を
開き液晶シャッタ5の他方の端辺まで光源ユニット10
を移動させつつこの動作、すなわち、分割露光を繰り返
し、光硬化性樹脂2の硬化させる位置に対応する液晶シ
ャッタ5の位置を制御しながら順次部分的に硬化させる
ことによって、一層の硬化樹脂層2aを形成する。
Further, by driving the linear movement mechanism 7, the liquid crystal shutter 5 is moved to the next divided pattern display position,
The light source unit 10 is moved to one end of the liquid crystal shutter 5 while the mechanical shutter 14 is closed.
After returning by driving the mechanical shutter 14, the mechanical shutter 14 is opened to the other end of the liquid crystal shutter 5 to the light source unit 10.
This operation, that is, divided exposure is repeated while moving the liquid crystal, and the liquid crystal shutter 5 is sequentially partially cured while controlling the position of the liquid crystal shutter 5 corresponding to the position where the photocurable resin 2 is cured. To form.

【0039】この光源ユニット10が液晶シャッタの一
方の端辺から他方の端辺まで移動する時のみ、光源ユニ
ット10の進行方向の前面側に取り付けられた一方の平
滑板17をこの下端が光硬化性樹脂2の液面に接触する
よう下降させ、これによって、光源ユニット10の平行
移動に伴って光硬化性樹脂2の液面の平滑化を行い、こ
の平滑化と同時に硬化樹脂層2aを形成することができ
る。
Only when the light source unit 10 moves from one end side to the other end side of the liquid crystal shutter, one lower end of the one smooth plate 17 attached to the front side in the traveling direction of the light source unit 10 is photo-cured. The liquid level of the photocurable resin 2 is lowered so as to come into contact with the liquid level of the photocurable resin 2, whereby the liquid level of the photocurable resin 2 is smoothed as the light source unit 10 moves in parallel, and at the same time, the cured resin layer 2a is formed. can do.

【0040】この時、分割露光によって硬化させる順番
は、目的立体モデルの断面パターンに対応する全ての箇
所が硬化されればよい。そして、所定の形状の硬化樹脂
層2aを順次積層し、所望の立体像が得られた時に、こ
れを容器1から取り出し、洗浄し未硬化の光硬化性樹脂
を取り除き、しかる後にポストキュアを施して立体像を
完成させる。
At this time, the order of curing by the divided exposure may be that all the portions corresponding to the sectional pattern of the target stereo model are cured. Then, the cured resin layers 2a having a predetermined shape are sequentially laminated, and when a desired three-dimensional image is obtained, this is taken out of the container 1, washed to remove the uncured photocurable resin, and then post-cured. To complete the three-dimensional image.

【0041】ここで、前記遮光板による線状光の角度成
分を制御し光量を調節する方法について図5を参照して
説明する。線状光源下に、高さがlの薄板を間隔dをお
いてスリット状に配列すれば、線状光源の長さ方向に発
散する光に対して、このスリットを通過できる光の角度
θはおよそtan-1(d/l)以下に制限でき、また、
線光源の長さ方向の照度分布に合わせて、薄板の間隔d
を部分的に変え光量を調節すれば遮光板通過後の光量を
均一化できる。更に、遮光板を光源の長さ及び幅方向に
格子状に配置し、薄板の高さl及び間隔dを光源の長さ
と幅方向でそれぞれ調節すれば、光のロスは大きくなる
ものの、スリットを透過する光全般に亘って、つまり、
液晶シャッタへ入射する光の角度成分と光量をより精密
に制御できる。
Here, a method of controlling the angular component of the linear light by the light shielding plate and adjusting the light quantity will be described with reference to FIG. If thin plates having a height of 1 are arranged in a slit shape at intervals d under the linear light source, the angle θ of the light that can pass through the slit with respect to the light diverging in the length direction of the linear light source is It can be limited to about tan -1 (d / l) or less, and
According to the illuminance distribution in the length direction of the linear light source, the distance d between the thin plates
Can be partially changed to adjust the light amount, so that the light amount after passing through the light shielding plate can be made uniform. Further, if the light shielding plates are arranged in a grid pattern in the length and width directions of the light source and the height l and the interval d of the thin plates are adjusted in the length and width directions of the light source, respectively, the loss of light becomes large, but the slit Throughout the transmitted light, that is,
The angle component and the amount of light incident on the liquid crystal shutter can be controlled more precisely.

【0042】[0042]

【発明の効果】以上説明したように、本発明では、液晶
シャッタを露光マスクとして、該シャッタと線状光源と
を交互に移動させながら分割露光を行うことにより、大
きな目的立体モデルを造形することができ、しかも目的
立体モデルと同等の大きな光源やレンズ等が不要となる
ばかりでなく、光源から光硬化性樹脂の照射面までの光
路長が短くなって光のロスを少なくすることができ、こ
れによって、装置としての小型化を図り、大型の目的立
体モデルを精度よく、かつより短時間で造形することが
できる。
As described above, according to the present invention, a liquid crystal shutter is used as an exposure mask and divided exposure is performed while alternately moving the shutter and the linear light source, thereby forming a large target stereo model. Moreover, not only does a large light source, a lens, etc. equivalent to the target three-dimensional model become unnecessary, but the optical path length from the light source to the irradiation surface of the photocurable resin can be shortened to reduce light loss, As a result, the size of the device can be reduced, and a large target three-dimensional model can be shaped accurately and in a shorter time.

【0043】しかも、光源ユニットの走行方向の前後面
に平滑板を設け、この光源ユニットの走行方向の前方に
位置する一方の平滑板をこの下端が光硬化性樹脂の液面
に接触する位置まで下降させることにより、光源ユニッ
トの走行に伴って、光硬化性樹脂の液面の平滑化を行う
ことができ、これによって、液面の平滑化のための工程
を省略することができる。
Moreover, smooth plates are provided on the front and rear surfaces of the light source unit in the traveling direction, and one of the smooth plates located in front of the light source unit in the traveling direction is brought to a position where the lower end thereof contacts the liquid surface of the photocurable resin. By lowering, the liquid level of the photocurable resin can be smoothed as the light source unit travels, whereby the process for smoothing the liquid level can be omitted.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の一実施例を示す概要図。FIG. 1 is a schematic diagram showing an embodiment of the present invention.

【図2】 同じく、光源ユニットの移動機構を示す斜視
図。
FIG. 2 is a perspective view showing a moving mechanism of the light source unit.

【図3】 同じく、光源ユニットの拡大断面図。FIG. 3 is an enlarged sectional view of the light source unit.

【図4】 本発明の他の実施例に係る光源ユニットの拡
大断面図。
FIG. 4 is an enlarged cross-sectional view of a light source unit according to another embodiment of the present invention.

【図5】(a)は、遮光板組立体による光量調整方法を
示すもので、図4の側面からみた説明図。(b)は、図
4の正面からみた説明図。
5A is a diagram illustrating a light amount adjustment method using a light-shielding plate assembly, which is an explanatory view seen from the side of FIG. 4. FIG. (B) is the explanatory view seen from the front of FIG.

【符号の説明】[Explanation of symbols]

1…容器 2…光硬化性樹脂 2a…硬化樹脂層 5…液晶シャッタ 10…光源ユニット 11…線状光源 16…等倍結像素子 18…平滑板 19…コンピュータ(制御部) DESCRIPTION OF SYMBOLS 1 ... Container 2 ... Photocurable resin 2a ... Cured resin layer 5 ... Liquid crystal shutter 10 ... Light source unit 11 ... Linear light source 16 ... 1x imaging element 18 ... Smoothing plate 19 ... Computer (control part)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】液状の光硬化性樹脂に目的立体モデルの断
面パターンに対応する光を選択的に照射して薄膜の硬化
樹脂層を形成し、この硬化樹脂層を順次積層して立体モ
デルを形成するようにした光造形装置において、前記光
硬化性樹脂を収容した容器の上方に、光を選択的に透過
または遮光する液晶シャッタを光硬化性樹脂の液面に対
して平行状に走行し得るように配置し、該液晶シャッタ
の走行範囲を複数に分割した分割区間の各通過点で停止
自在な光源ユニットを液晶シャッタの走行方向に走行自
在に配置し、該光源ユニットの内部に、前記液晶シャッ
タの上方であってかつ長手方向が前記液晶シャッタの走
行方向とほぼ直交するように線状光源を収容し、前記光
源ユニットの走行方向の前面および後面に、該光源ユニ
ットの走行方向に対して直交状に延びて前記光硬化性樹
脂の表面を平滑化させる平滑板を上下動自在に取付け、
前記分割区間に対応する立体モデルの断面パターンを前
記液晶シャッタに表示する制御部を設け、前記液晶シャ
ッタは前記分割区間の各通過点で停止自在であって、該
液晶シャッタの停止中に前記線状光源が該液晶シャッタ
上を通過して分割露光を行う一連の動作を該液晶シャッ
タの一方向における走行範囲において繰り返すことによ
り前記光硬化性樹脂の一層の硬化を行うことを特徴とす
る光造形装置。
1. A three-dimensional model is formed by selectively irradiating a liquid photocurable resin with light corresponding to a cross-sectional pattern of an intended three-dimensional model to form a thin cured resin layer, and successively laminating the cured resin layers. In the stereolithography apparatus configured to form, a liquid crystal shutter that selectively transmits or blocks light is run in parallel with the liquid surface of the photocurable resin above the container containing the photocurable resin. A light source unit which is arranged so as to obtain and which can be stopped at each passage point of a divided section obtained by dividing the traveling range of the liquid crystal shutter in a traveling direction of the liquid crystal shutter is arranged inside the light source unit. A linear light source is housed above the liquid crystal shutter so that the longitudinal direction thereof is substantially orthogonal to the traveling direction of the liquid crystal shutter, and the front and rear surfaces of the light source unit in the traveling direction are arranged in the traveling direction of the light source unit. Mounting a smooth plate to smooth the surface of the photocurable resin extends perpendicularly to the vertically movable,
A control unit that displays a cross-sectional pattern of a stereo model corresponding to the divided section on the liquid crystal shutter is provided, and the liquid crystal shutter can be stopped at each passage point of the divided section, and the line is displayed while the liquid crystal shutter is stopped. Shaping by further repeating a series of operations in which a linear light source passes over the liquid crystal shutter and performs divided exposure in a traveling range in one direction of the liquid crystal shutter to further cure the photocurable resin. apparatus.
JP25107294A 1994-10-17 1994-10-17 Stereolithography Expired - Lifetime JP3555627B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25107294A JP3555627B2 (en) 1994-10-17 1994-10-17 Stereolithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25107294A JP3555627B2 (en) 1994-10-17 1994-10-17 Stereolithography

Publications (2)

Publication Number Publication Date
JPH08112863A true JPH08112863A (en) 1996-05-07
JP3555627B2 JP3555627B2 (en) 2004-08-18

Family

ID=17217217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25107294A Expired - Lifetime JP3555627B2 (en) 1994-10-17 1994-10-17 Stereolithography

Country Status (1)

Country Link
JP (1) JP3555627B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006035739A1 (en) * 2004-09-29 2006-04-06 Nabtesco Corporation Optical molding device and optical molding method
US7137801B2 (en) 2002-03-12 2006-11-21 Teijin Seiki Co., Ltd. Three-dimensional stereolithographic apparatus
WO2016106615A1 (en) * 2014-12-30 2016-07-07 深圳市圆梦精密技术研究院 Multi-electron-beam melting and milling composite 3d printing apparatus
CN105984148A (en) * 2015-02-17 2016-10-05 优克材料科技股份有限公司 Three-dimensional printing device with jet printing unit and light source for sintering and three-dimensional printing method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7137801B2 (en) 2002-03-12 2006-11-21 Teijin Seiki Co., Ltd. Three-dimensional stereolithographic apparatus
WO2006035739A1 (en) * 2004-09-29 2006-04-06 Nabtesco Corporation Optical molding device and optical molding method
JPWO2006035739A1 (en) * 2004-09-29 2008-05-15 ナブテスコ株式会社 Stereolithography apparatus and stereolithography method
JP4669843B2 (en) * 2004-09-29 2011-04-13 ナブテスコ株式会社 Stereolithography apparatus and stereolithography method
WO2016106615A1 (en) * 2014-12-30 2016-07-07 深圳市圆梦精密技术研究院 Multi-electron-beam melting and milling composite 3d printing apparatus
CN105984148A (en) * 2015-02-17 2016-10-05 优克材料科技股份有限公司 Three-dimensional printing device with jet printing unit and light source for sintering and three-dimensional printing method

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