JPH0798443A - Method for cleaning substrate for liquid crystal display panel - Google Patents

Method for cleaning substrate for liquid crystal display panel

Info

Publication number
JPH0798443A
JPH0798443A JP24266893A JP24266893A JPH0798443A JP H0798443 A JPH0798443 A JP H0798443A JP 24266893 A JP24266893 A JP 24266893A JP 24266893 A JP24266893 A JP 24266893A JP H0798443 A JPH0798443 A JP H0798443A
Authority
JP
Japan
Prior art keywords
cleaning
substrate
liquid crystal
crystal display
display panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24266893A
Other languages
Japanese (ja)
Inventor
Makoto Miyashita
真 宮下
Akio Kumagai
明夫 熊谷
Hiroshi Ogawa
洋 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP24266893A priority Critical patent/JPH0798443A/en
Publication of JPH0798443A publication Critical patent/JPH0798443A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce the contamination with org. matter in chemical cleaning, to more efficiently clean off the inorg. matter contained in the org. matter, to improve the wettability of a substrate, to improve the physical cleaning effect and further to obtain the uniform substrate without any spot after drying. CONSTITUTION:UV is radaited to break the chemical bond of the org. matter on a substrate, the molecule with the bond broken is oxidized with the ozone generated by the radiation of UV or excited oxygen atom to decompose, vaporize and remove the org. matter by optical cleaning, and then the substrate is chemically and/or physically cleaned.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は液晶表示パネルの製造に
おける工程に関し、さらに詳しくは、液晶表示パネルの
製造において用いられる液晶表示パネル用基板の洗浄方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process in manufacturing a liquid crystal display panel, and more particularly to a method for cleaning a liquid crystal display panel substrate used in manufacturing a liquid crystal display panel.

【0002】[0002]

【従来の技術】一般に、液晶表示パネル用の基板は、そ
の表面の汚染を取り去るために、洗浄が行われる。表面
の汚染としては、例えば、有機物(紙、繊維、ふけ、油
脂、唾液など)、無機物(浮遊塵挨、ガラスくずな
ど)、残留微粒子などが挙げられる。これらの汚染を洗
浄するために、化学洗浄、物理洗浄、または化学洗浄と
物理洗浄を組み合わせて行っている。
2. Description of the Related Art Generally, a substrate for a liquid crystal display panel is washed to remove the contamination on its surface. Examples of the surface contamination include organic substances (paper, fibers, dandruff, oil and fat, saliva, etc.), inorganic substances (floating dust, glass scraps, etc.), and residual fine particles. In order to clean these contaminants, chemical cleaning, physical cleaning, or a combination of chemical cleaning and physical cleaning is performed.

【0003】しかしながら、化学洗浄は、国際的に使用
廃止が決まっているフロンや有害な有機溶剤を用いるの
で、その適用に制約を受けるという問題があった。ま
た、物理洗浄には、乾燥後、シミやムラが発生してしま
うという問題点があった。
However, chemical cleaning uses CFCs and harmful organic solvents whose use has been decided to be abolished internationally, so that there is a problem in that their application is restricted. Further, the physical cleaning has a problem that spots and unevenness are generated after drying.

【0004】このような問題点を解決するために、特開
平5−34652号公報には、STN型などの液晶表示
素子の製造方法において、ブラシ洗浄、超音波洗浄およ
びシャワー洗浄からなる物理洗浄を行った後、紫外線/
オゾン洗浄を行う方法が開示されている。しかしなが
ら、これらの洗浄方法はTN型、STN型など配向膜を
必要とする表示素子において主に用いられており、高分
子分散型または相転移型などの配向膜を必要としない液
晶表示素子用基板については、効率的な洗浄方法がなか
った。
In order to solve such a problem, Japanese Unexamined Patent Publication (Kokai) No. 5-34652 discloses a method of manufacturing a liquid crystal display element such as an STN type, in which physical cleaning including brush cleaning, ultrasonic cleaning and shower cleaning is performed. After going, UV /
A method of performing ozone cleaning is disclosed. However, these cleaning methods are mainly used in a display device that requires an alignment film such as a TN type or an STN type, and a substrate for a liquid crystal display device that does not require a polymer dispersion type or phase transition type alignment film. For, there was no efficient cleaning method.

【0005】[0005]

【発明が解決しようとする課題】上述したように、化学
洗浄、物理洗浄とも問題点がある。紫外線/オゾン洗浄
は、化学洗浄、物理洗浄の問題点を解決する有効な方法
であるが、洗浄工程の最後に行う仕上げ工程に用いられ
ており、化学洗浄および物理洗浄の効果を向上させるも
のではない。さらに、乾燥時のシミ、ムラの改善には影
響しない。
As described above, there are problems with both chemical cleaning and physical cleaning. UV / ozone cleaning is an effective method to solve the problems of chemical cleaning and physical cleaning, but it is used in the finishing process performed at the end of the cleaning process and does not improve the effects of chemical cleaning and physical cleaning. Absent. Furthermore, it does not affect the improvement of spots and unevenness during drying.

【0006】本発明が解決しようとする課題は、液晶表
示パネル用基板の洗浄、特に、配向膜を必要としない高
分子分散型または相転移型などの液晶表示パネル用基板
の洗浄をより効率的に確実に行い、その乾燥後のシミ、
ムラの発生を除去する洗浄方法を提供することにある。
The problem to be solved by the present invention is to more efficiently wash a substrate for a liquid crystal display panel, in particular, a polymer dispersion type or phase transition type substrate which does not require an alignment film. Surely done, the stains after drying,
It is to provide a cleaning method for removing the occurrence of unevenness.

【0007】[0007]

【課題を解決するための手段】本発明者らは上記課題を
解決するために、鋭意検討した結果、本発明に至った。
Means for Solving the Problems The inventors of the present invention have made extensive studies in order to solve the above problems, and as a result, achieved the present invention.

【0008】すなわち、本発明は上記課題を解決するた
めに、紫外線を放射することによって基板上の有機物の
化学結合を切断すると共に、結合が解離された前記有機
物の分子を、前記紫外線を放射することによって発生し
たオゾンまたは励起酸素原子によって酸化することによ
り、前記有機物を分解、気化して除去する光洗浄を行っ
た後、前記基板を化学洗浄または/および物理洗浄する
ことを特徴とする液晶表示パネル用基板の洗浄方法を提
供する。
That is, in order to solve the above problems, the present invention breaks the chemical bonds of organic substances on a substrate by radiating ultraviolet rays and radiates the ultraviolet rays to the molecules of the organic substances whose bonds are dissociated. A liquid crystal display characterized by chemically cleaning and / or physically cleaning the substrate after performing optical cleaning by decomposing, vaporizing and removing the organic matter by oxidizing with ozone or excited oxygen atoms generated by A method for cleaning a panel substrate is provided.

【0009】本発明の洗浄方法で用いられる紫外線は、
波長185nmと254nmにピークをもつ紫外線であり、
紫外線の放射源としては、例えば、出力30〜500W
の低圧水銀灯が挙げられる。
The ultraviolet rays used in the cleaning method of the present invention are
It is an ultraviolet ray having peaks at wavelengths of 185 nm and 254 nm,
As a radiation source of ultraviolet rays, for example, an output of 30 to 500 W
Low pressure mercury lamp.

【0010】本発明の洗浄方法で用いられる化学洗浄と
しては、例えば、純水、アルカリ液、酸液、フロン、有
機溶剤などを洗浄液として使用する湿式洗浄が挙げられ
る。
The chemical cleaning used in the cleaning method of the present invention includes, for example, wet cleaning using pure water, an alkaline solution, an acid solution, CFC, an organic solvent or the like as a cleaning solution.

【0011】本発明の洗浄方法で用いられる物理洗浄と
しては、例えば、スクラブ洗浄、シャワー洗浄、超音波
洗浄などが挙げられる。
Examples of the physical cleaning used in the cleaning method of the present invention include scrub cleaning, shower cleaning and ultrasonic cleaning.

【0012】また、洗浄後の乾燥としては、例えば、ス
ピン乾燥、エアナイフ乾燥、IPA蒸気乾燥、フロン蒸
気乾燥などが挙げられる。
Examples of the drying after washing include spin drying, air knife drying, IPA vapor drying, freon vapor drying and the like.

【0013】[0013]

【作用】本発明においては、紫外線/オゾン洗浄を行う
ことによって基板上の有機物を分解した後に化学洗浄を
行うので、化学洗浄時の有機物汚染の減少、有機物によ
って捕捉されていた無機物の洗浄性の向上が図れる。ま
た、有機物の分解によって、基板表面の濡れ性が向上
し、より効果的な物理洗浄を行うことができる。さら
に、乾燥後において、シミやムラのない基板を得ること
ができる。これらの洗浄効果の向上によって、液晶材
料、または液晶材料および重合性組成物からなる調光層
形成材料をパネルに注入するとき、均一かつムラなく注
入ができ、注入速度の向上が図れる。したがって、本発
明の洗浄方法は、高性能かつ高信頼性の液晶表示パネル
を効率よく製造することに寄与する。
In the present invention, since the organic substances on the substrate are decomposed by the ultraviolet / ozone cleaning to perform the chemical cleaning, the contamination of the organic substances during the chemical cleaning is reduced, and the cleaning property of the inorganic substances trapped by the organic substances is improved. Can be improved. Further, the decomposition of the organic matter improves the wettability of the substrate surface, and more effective physical cleaning can be performed. Further, it is possible to obtain a substrate without stains or unevenness after drying. By improving these cleaning effects, when the liquid crystal material or the light control layer forming material composed of the liquid crystal material and the polymerizable composition is injected into the panel, uniform and even injection can be performed, and the injection speed can be improved. Therefore, the cleaning method of the present invention contributes to efficiently manufacture a high-performance and highly reliable liquid crystal display panel.

【0014】[0014]

【実施例】以下、本発明の実施例を示し、本発明をさら
に具体的に説明する。しかしながら、本発明はこれらの
実施例に限定されるものではない。
EXAMPLES The present invention will now be described more specifically by showing examples of the present invention. However, the invention is not limited to these examples.

【0015】(実施例1)ITO電極付ガラス基板(3
00mm角、1.1mm厚)上に、低圧水銀灯を用いて、波
長185nmと254nmにピークをもつ紫外線を2分間照
射した。そのときの低圧水銀灯の出力は380W、低圧
水銀灯とガラス基板の距離は80mmであった。この基板
を純水を用いて2分間超音波洗浄(周波数27kHz、出
力1200W)した。洗浄後、純水中から、この基板を
ゆっくりと引き上げたところ、水滴はなく、そのまま自
然乾燥した後、高輝度ランプで表面を照明して目視観察
したところ、水滴の跡もなかった。また、洗浄前に付着
していた紙焼けが減少していた。
Example 1 A glass substrate with an ITO electrode (3
Ultraviolet light having peaks at wavelengths of 185 nm and 254 nm was irradiated for 2 minutes on a (00 mm square, 1.1 mm thickness) using a low pressure mercury lamp. At that time, the output of the low-pressure mercury lamp was 380 W, and the distance between the low-pressure mercury lamp and the glass substrate was 80 mm. This substrate was ultrasonically cleaned with pure water for 2 minutes (frequency 27 kHz, output 1200 W). After washing, when the substrate was slowly pulled up from pure water, there were no water droplets, and after naturally drying as it was, the surface was illuminated with a high-intensity lamp and visually observed, and there were no traces of water droplets. In addition, the paper burn that had adhered before cleaning was reduced.

【0016】(比較例1)実施例1と同じガラス基板
を、純水を用いて2分間超音波洗浄(周波数27kHz、
出力1200W)した。洗浄後、純水中から、この基板
をゆっくりと引き上げたところ、表面に水滴が多く付着
していた。そのまま自然乾燥した後、高輝度ランプで表
面を照明して目視観察したところ、水滴の跡が付着して
おり、紙焼けはほとんど変化がなかった。
Comparative Example 1 The same glass substrate as in Example 1 was ultrasonically cleaned with pure water for 2 minutes (frequency: 27 kHz,
The output was 1200 W). After washing, the substrate was slowly pulled up from pure water, and many water droplets were attached to the surface. After air-drying as it was, the surface was illuminated with a high-intensity lamp and visually observed. As a result, traces of water droplets were attached, and there was almost no change in paper burning.

【0017】(実施例2)実施例1と同様な紫外線洗浄
を行った基板を、洗浄液(メルク社製「エキストランM
A−02」3%水溶液)を用いて2分間超音波洗浄(周
波数27kHz、出力1200W)した後、純水シャワー
でリンスした。リンス後の基板は、水滴が付着しておら
ず、自然乾燥した後、高輝度ランプで表面を照明して目
視観察したところ、水滴の跡がなく、紙焼けもなくなっ
ていた。
(Example 2) A substrate subjected to the same UV cleaning as in Example 1 was washed with a cleaning solution ("Extran M" manufactured by Merck & Co., Inc.).
After ultrasonic cleaning (frequency 27 kHz, output 1200 W) for 2 minutes using "A-02" 3% aqueous solution), rinse with a pure water shower. The substrate after rinsing had no water droplets attached, and after natural drying, the surface was illuminated with a high-intensity lamp and visually observed, and it was found that there were no traces of water droplets and no paper burn.

【0018】(比較例2)実施例1と同じガラス基板
を、紫外線洗浄を行わず、実施例2と同様な洗浄を行っ
た。リンス後の基板には水滴が付着しており、自然乾燥
した後、高輝度ランプで表面を照明して目視観察したと
ころ、水滴の跡があり、紙焼けもまだ残っていた。
Comparative Example 2 The same glass substrate as in Example 1 was washed in the same manner as in Example 2 without UV washing. Water droplets adhered to the substrate after rinsing, and after natural drying, when the surface was illuminated with a high-intensity lamp and visually observed, there were traces of water droplets and paper burns still remained.

【0019】(実施例3)実施例2と同様な洗浄を行っ
たITO電極付ガラス基板(300mm角、1.1mm厚)
に1液型エポキシ接着剤ロディック社製「DSA−00
1」を1カ所の注入孔部分を除いた周縁部分に塗布した
ものと、12.0μmのガラスファイバー製スペーサー
を散布した他方の基板とを張り合わせ、塗布した接着剤
を加熱硬化させて液晶表示パネル用セルを作製した。
(Embodiment 3) A glass substrate with ITO electrodes (300 mm square, 1.1 mm thickness) washed in the same manner as in Embodiment 2
One-component epoxy adhesive manufactured by Rodic "DSA-00
1 "is applied to the peripheral portion excluding the injection hole portion at one place and the other substrate on which the 12.0 μm glass fiber spacers are scattered, and the applied adhesive is heat-cured to cure the liquid crystal display panel. A cell was prepared.

【0020】液晶材料として下記に示す物性を有するロ
ディック社製「PN−001」(ネマチック液晶組成
物)80重量%、重合性組成物として日本化薬社製「H
X−220」(カプロラクトン変性ヒドロキシピバリン
酸ネオペンチルグリコールジアクリレート)19.6重
量%、重合開始剤としてチバガイギー社製「イルガキュ
ア651」(ベンジルジメチルケタール)0.4重量%
からなる調光層形成材料を調製した。
80% by weight of "PN-001" (nematic liquid crystal composition) manufactured by Roddick having the following physical properties as a liquid crystal material, and "H" manufactured by Nippon Kayaku Co., Ltd. as a polymerizable composition.
X-220 "(caprolactone-modified hydroxypivalic acid neopentyl glycol diacrylate) 19.6% by weight, Ciba Geigy's" Irgacure 651 "(benzyl dimethyl ketal) 0.4% by weight as a polymerization initiator.
A light control layer forming material was prepared.

【0021】液晶「PN−001」の物性 転移温度 68.5 ℃(N−I) <−25 ℃(C−N) 屈折率 ne= 1.787 no= 1.583 屈折率異方性 Δn=0.254 しきい値電圧 Vth=1.15 V 20℃の粘度 59 c.p. 誘電率異方性 Δε=26.9The physical properties transition temperature 68.5 ° C. of the liquid crystal "PN-001" (N-I) <-25 ℃ (C-N) refractive index n e = 1.787 n o = 1.583 refractive index anisotropy Δn = 0.254 Threshold voltage Vth = 1.15 V Viscosity at 20 ° C. 59 c. p. Dielectric anisotropy Δε = 26.9

【0022】調光層形成材料とセルを真空注入装置内に
設置し、調光層形成材料の脱泡とセル内の減圧を行っ
た。その後、調光層形成材料をセルの注入口部分に接触
させ、真空注入装置内の圧力を1.5時間で大気圧とな
るように、窒素を導入して装置内圧力を徐々に上げ、調
光層形成材料をセル内に注入した。1.5時間後、注入
装置内より取り出して、注入口を封口し、高圧水銀ラン
プを用いて、紫外線を照射して、調光パネルを得た。
The light control layer forming material and the cell were placed in a vacuum injecting device, and the light control layer forming material was defoamed and the pressure in the cell was reduced. Then, the light control layer forming material was brought into contact with the injection port of the cell, and nitrogen was introduced to gradually raise the pressure in the device so that the pressure in the vacuum injection device became atmospheric pressure in 1.5 hours. The light layer forming material was injected into the cell. After 1.5 hours, it was taken out of the injection device, the injection port was sealed, and ultraviolet rays were irradiated using a high pressure mercury lamp to obtain a light control panel.

【0023】そのパネルを観察したところ、全体に調光
層形成材料が注入されており、白濁のムラもなかった。
Observation of the panel revealed that the material for forming the light control layer had been injected into the entire panel and that there was no white turbidity.

【0024】得られた液晶デバイスの調光層を電子顕微
鏡で観察したところ、三次元網目状の透明性高分子物質
が確認できた。
When the light control layer of the obtained liquid crystal device was observed with an electron microscope, a three-dimensional mesh-like transparent polymer substance was confirmed.

【0025】(比較例3)比較例2と同様な洗浄を行っ
たITO電極付ガラス基板(300mm角、1.1mm厚)
を使用して、実施例3と同様な方法で調光パネルを得
た。
(Comparative Example 3) A glass substrate with ITO electrodes (300 mm square, 1.1 mm thick) washed in the same manner as in Comparative Example 2
Was used to obtain a light control panel in the same manner as in Example 3.

【0026】得られた調光パネルを観察したところ、全
体の70%のみ調光層形成材料が注入されており、とこ
ろによって白濁のムラが観察された。
Observation of the obtained light control panel revealed that only 70% of the entire light control layer was injected with the light control layer-forming material, and white turbidity was observed.

【0027】[0027]

【発明の効果】本発明の液晶表示パネル用基板の洗浄方
法によれば、紫外線を照射することにより基板上の有機
物を分解した後に化学洗浄を行うことができるので、化
学洗浄時の有機物汚染の減少、有機物により捕捉されて
いた無機物の洗浄性を向上できる。また、有機物の分解
によって、基板表面の濡れ性が向上し、より効果的な物
理洗浄を行うことができる。さらに、乾燥後において、
シミやムラのない基板を得ることができる。これらの洗
浄効果の向上によって、高分子分散型または相転移型な
どの液晶表示パネルの製造工程において調光層形成材料
をセルに注入するとき、均一かつムラなく注入ができ、
注入速度の向上が図れる。したがって、本発明の洗浄方
法は、高性能かつ高信頼性の液晶表示パネルの効率的な
製造に寄与する。
According to the method of cleaning a substrate for a liquid crystal display panel of the present invention, chemical cleaning can be performed after the organic substances on the substrate are decomposed by irradiating with ultraviolet rays, so that the contamination of organic substances during the chemical cleaning can be prevented. It is possible to reduce the cleaning property of the inorganic substances captured by the organic substances. Further, the decomposition of the organic matter improves the wettability of the substrate surface, and more effective physical cleaning can be performed. Furthermore, after drying,
It is possible to obtain a substrate without spots or unevenness. By improving these cleaning effects, when injecting the light control layer forming material into the cell in the manufacturing process of a polymer dispersion type or phase transition type liquid crystal display panel, the injection can be performed uniformly and evenly,
The injection speed can be improved. Therefore, the cleaning method of the present invention contributes to efficient production of a high-performance and highly reliable liquid crystal display panel.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 紫外線を放射することによって基板上の
有機物の化学結合を切断すると共に、結合が解離された
前記有機物の分子を、前記紫外線を放射することによっ
て発生したオゾンまたは励起酸素原子によって酸化する
ことにより、前記有機物を分解、気化して除去する光洗
浄を行った後、前記基板を化学洗浄または/および物理
洗浄することを特徴とする液晶表示パネル用基板の洗浄
方法。
1. A chemical bond of an organic substance on a substrate is cut by radiating an ultraviolet ray, and a molecule of the organic substance whose bond is dissociated is oxidized by ozone or an excited oxygen atom generated by radiating the ultraviolet ray. By performing the optical cleaning by decomposing, vaporizing and removing the organic matter, the method for cleaning the substrate for a liquid crystal display panel is characterized by chemically cleaning and / or physically cleaning the substrate.
JP24266893A 1993-09-29 1993-09-29 Method for cleaning substrate for liquid crystal display panel Pending JPH0798443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24266893A JPH0798443A (en) 1993-09-29 1993-09-29 Method for cleaning substrate for liquid crystal display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24266893A JPH0798443A (en) 1993-09-29 1993-09-29 Method for cleaning substrate for liquid crystal display panel

Publications (1)

Publication Number Publication Date
JPH0798443A true JPH0798443A (en) 1995-04-11

Family

ID=17092469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24266893A Pending JPH0798443A (en) 1993-09-29 1993-09-29 Method for cleaning substrate for liquid crystal display panel

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014527202A (en) * 2011-08-31 2014-10-09 エルジー・ケム・リミテッド Liquid crystal cell

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014527202A (en) * 2011-08-31 2014-10-09 エルジー・ケム・リミテッド Liquid crystal cell
US9411189B2 (en) 2011-08-31 2016-08-09 Lg Chem, Ltd. Liquid crystal cell

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