JPH079523B2 - Method for manufacturing substrate with EC film - Google Patents

Method for manufacturing substrate with EC film

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Publication number
JPH079523B2
JPH079523B2 JP61085449A JP8544986A JPH079523B2 JP H079523 B2 JPH079523 B2 JP H079523B2 JP 61085449 A JP61085449 A JP 61085449A JP 8544986 A JP8544986 A JP 8544986A JP H079523 B2 JPH079523 B2 JP H079523B2
Authority
JP
Japan
Prior art keywords
film
substrate
hexacyanoferrate
iron
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61085449A
Other languages
Japanese (ja)
Other versions
JPS62240937A (en
Inventor
裕一 矢野
耕三 藤野
秀夫 河原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
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Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP61085449A priority Critical patent/JPH079523B2/en
Publication of JPS62240937A publication Critical patent/JPS62240937A/en
Publication of JPH079523B2 publication Critical patent/JPH079523B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、EC膜(エレクトロクロミック膜)つき基板の
製造方法に関し、特に透過型EC素子製造に使用するのに
適した非晶質のヘキサシアノ鉄酸鉄塩膜が電極基板上に
被覆されたEC膜つき基板の製造方法に関する。
TECHNICAL FIELD The present invention relates to a method for producing a substrate with an EC film (electrochromic film), and particularly to amorphous hexacyano which is suitable for use in the production of a transmissive EC device. The present invention relates to a method for producing a substrate with an EC film in which an iron salt of ferric acid film is coated on an electrode substrate.

〔従来の技術〕[Conventional technology]

ヘキサシアノ鉄酸鉄塩はEC特性を有する物質として知ら
れており、該ヘキサシアノ鉄酸鉄塩の薄膜を用いた透過
型EC素子が知られている。
Hexacyanoferric acid iron salt is known as a substance having EC characteristics, and a transmissive EC element using a thin film of the hexacyanoferric acid iron salt is known.

該透過型EC素子に用いるヘキサシアノ鉄酸鉄塩膜の製造
には、膜0.6V v.s.SCE{Fe(III),〔Fe(III)(CN)
3-イオン種あるいは錯体が還元される電位}よりも
低い還元電位を有する金属(例えばNi,Fe,Cu等)の基板
のみに対して行なうことのできる無電解めっき法は基板
の透光性の面で使用できず、専ら電解めっき法が用いら
れてきた。
For the production of the hexacyanoferrate iron salt film used for the transmission type EC element, the film 0.6 V vs SCE {Fe (III), [Fe (III) (CN)
6 ] The electroless plating method that can be performed only on a substrate of a metal (for example, Ni, Fe, Cu, etc.) having a reduction potential lower than the potential at which a 3- ionic species or complex is reduced} In terms of properties, it cannot be used, and the electrolytic plating method has been exclusively used.

該電解析出法は、塩化第2鉄、硫酸第2鉄等の3価の鉄
塩とフェリシァン化カリウム等のフェリシアン塩との混
合水溶液に電極基板と対向電極とを浸漬し、電極基板を
カソードとして電界還元する方法である。
In the electrolytic deposition method, the electrode substrate and the counter electrode are immersed in a mixed aqueous solution of a trivalent iron salt such as ferric chloride or ferric sulfate and a ferricyanide salt such as potassium ferricyanide to form the electrode substrate. This is a method of performing electric field reduction as a cathode.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

上記電界析出法は、透過型EC素子に使用できる例えば透
明導電膜つきガラス基板上にEC特性を有するヘキサシア
ノ鉄酸鉄塩を析出させることができる利点を有するもの
の上記電解析出法による作成したヘキサシアノ鉄酸鉄塩
膜は基板との密着性が悪く、はく離等をひきおこす問題
点があった。
The electric field deposition method has a merit of being able to deposit hexacyanoferric acid iron salt having EC characteristics on a glass substrate with a transparent conductive film which can be used for a transmission type EC device, but hexacyano prepared by the electrolytic deposition method. The iron ferrate salt film has a problem in that it has poor adhesion to the substrate and causes peeling and the like.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記問題点を解決するためになされたもので
あり、非晶質のヘキサシアノ鉄酸鉄塩膜が電極基板上に
被覆されたEC膜つき基板の製造方法を提供する。
The present invention has been made to solve the above problems, and provides a method for producing a substrate with an EC film in which an amorphous iron hexacyanoferrate salt film is coated on an electrode substrate.

上記EC膜つき基板はFe(III)イオンと〔Fe(III)(C
N)3-イオンとを含む水溶液と電極基板とを接触さ
せて、該電極基板表面にヘキサシアノ鉄酸鉄塩よりなる
EC膜を析出させるEC膜つき基板の製造方法において、予
め該水溶液に次亜リン酸塩を添加しておき、その後該次
亜リン酸塩を添加した水溶液と該電極基板とを接触さ
せ、無電解法により該電極基板表面に非晶質のEC膜を析
出させるようにしている。
The substrate with the EC film is Fe (III) ions and [Fe (III) (C
N) 6 ] 3- Ions are contacted with an aqueous solution containing an ion substrate to form an iron hexacyanoferrate salt on the surface of the electrode substrate.
In a method for producing a substrate with an EC film for depositing an EC film, hypophosphite is added to the aqueous solution in advance, and then the aqueous solution containing the hypophosphite is brought into contact with the electrode substrate, An amorphous EC film is deposited on the surface of the electrode substrate by an electrolytic method.

上記電極基板としては透過型EC素子を製造するのに適し
た透明電極基板が好んで使用され内でも透明電極膜が被
覆されたガラス板が生産性が高いので望ましい。
As the above-mentioned electrode substrate, a transparent electrode substrate suitable for manufacturing a transmissive EC device is preferably used, and a glass plate coated with a transparent electrode film is preferable because of high productivity.

該非晶質ヘキサシアノ鉄酸鉄塩膜はEC素子としての発色
性を持ち、生産性の高い10nm〜1μmの厚さで設けられ
ることが好ましく、特に、コントラストがよく、クラッ
ク等の膜ひずみの生じない100nm〜500nmの膜厚が望まし
い。
It is preferable that the amorphous iron hexacyanoferrate film is provided with a thickness of 10 nm to 1 μm, which has a color developability as an EC device and is highly productive, and particularly has good contrast and does not cause film distortion such as cracks. A film thickness of 100 nm to 500 nm is desirable.

又本発明において添加される次亜リン酸塩は、上記混合
水溶液中の鉄イオンよりも卑な還元電位を有しており、
それにより化学的還元反応(すなわち無電解法)でEC膜
を析出させることは可能としている。該次亜リン酸塩と
しては、塩を構成するカチオンがヘキサシアノ鉄酸鉄塩
膜中に取りこまれても害をおよぼさないものが好まし
く、例えばH3PO2,NaH2PO2,KH2PO2などが望ましい。
Further, the hypophosphite added in the present invention has a lower reduction potential than the iron ion in the mixed aqueous solution,
As a result, it is possible to deposit an EC film by a chemical reduction reaction (that is, an electroless method). The hypophosphite is preferably one that does not cause harm even if the cations constituting the salt are taken into the hexacyanoferrate iron salt film, for example, H 3 PO 2 , NaH 2 PO 2 , KH 2 PO 2 etc. is preferable.

該次亜リン酸塩の添加量はFe(III)イオンおよび〔Fe
(III)(CN)3-イオンの濃度等により調整するこ
とが好ましく、通常用いられるFe(III)および〔Fe(I
II)(CN)3-イオンの濃度0.01モル/の場合、0.
001モル/〜0.1モル/の濃度望ましくは0.01モル/
〜0.04モル/の濃度で添加することが好ましい。次
亜リン酸塩の濃度が0.001モル/よりもひくいと次亜
リン酸塩添加による効果が得られにくく、非晶質のヘキ
サシアノ鉄酸鉄膜が得られにくい。又該次亜リン酸塩の
濃度が0.1モル/より高くなると、Fe(III)イオンと
〔Fe(III)(CN)3-イオンの混合液に沈殿等が生
じやすくなる。
The amount of the hypophosphite added is Fe (III) ions and [Fe
It is preferable to adjust the concentration of (III) (CN) 6 ] 3− ions, etc.
II) (CN) 6 ] 3-When the ion concentration is 0.01 mol / min.
Concentration of 001 mol / -0.1 mol / Desirably 0.01 mol /
It is preferable to add it at a concentration of about 0.04 mol /. If the concentration of hypophosphite is less than 0.001 mol /, it is difficult to obtain the effect of adding hypophosphite, and it is difficult to obtain an amorphous iron hexacyanoferrate film. Further, when the concentration of the hypophosphite is higher than 0.1 mol / l, precipitation or the like is likely to occur in the mixed solution of Fe (III) ions and [Fe (III) (CN) 6 ] 3- ions.

〔作 用〕 前記従来の製造方法により作成されたヘキサシアノ鉄酸
鉄塩膜は、結晶質であるために基板との密着性が悪く剥
離等が生じ易い。
[Operation] Since the iron hexacyanoferrate film produced by the conventional manufacturing method is crystalline, the adhesion to the substrate is poor and peeling is likely to occur.

これに対して、本発明により製造されたEC膜つき基板
は、基板表面のヘキサシアノ鉄酸鉄塩膜を非晶質とした
ものであるから、ヘキサシアノ鉄酸鉄塩膜の基板に対す
る付着強度が向上し、従来のような問題が生じるおそれ
がない。
On the other hand, the substrate with an EC film manufactured according to the present invention is an amorphous hexacyanoferrate iron salt film on the substrate surface, and therefore the adhesion strength of the hexacyanoferrate iron salt film to the substrate is improved. However, there is no risk of problems such as the conventional one.

また、本発明においては、Fe(III)イオンと〔Fe(II
I)(CN)3-イオンとの混合液に次亜リン酸塩を添
加することにより、非晶質のヘキサシアノ鉄酸鉄塩膜が
得られるものである。この理由は明らかではないが、次
亜リン酸塩の添加による化学的な還元作用により、Fe
(III)イオンが還元されてリン酸が配位し、〔Fe(II
I)(CN)3-と結合するためと考えられる。
Further, in the present invention, Fe (III) ions and [Fe (II
By adding hypophosphite to a mixed solution of I) (CN) 6 ] 3- ion, an amorphous iron hexacyanoferrate salt film can be obtained. The reason for this is not clear, but due to the chemical reduction effect of the addition of hypophosphite, Fe
The (III) ion is reduced to coordinate phosphoric acid, and [Fe (II
I) (CN) 6 ] 3- It is thought that this is because of the binding.

〔実 施 例〕〔Example〕

実施例−1(無電解法) 0.02mol/のフェリシアン化カリウム水溶液と0.02mol/
の塩化第二鉄水溶液をそれぞれ100ml作成した。これ
ら両液を混合後、0.02mol/の次亜リン酸を0.2ml添加
し、直ちにインジウムスズ酸化物膜(約120nm厚)付ガ
ラス基板を浸漬し、10時間後に引き上げ、該インジウム
スズ酸化物膜上に約200nm厚のヘキサシアノ鉄酸鉄膜を
形成させた。
Example 1 (electroless method) 0.02 mol / potassium ferricyanide aqueous solution and 0.02 mol /
100 ml of each ferric chloride aqueous solution was prepared. After mixing these two solutions, 0.02 mol / hypophosphorous acid (0.2 ml) was added, the glass substrate with the indium tin oxide film (about 120 nm thickness) was immediately immersed, and 10 hours later, the indium tin oxide film was pulled up. An iron hexacyanoferrate film with a thickness of about 200 nm was formed on top.

得られた膜のX線回折特性を測定した結果第1図のよう
な結果を得た。(CuKα:0.154nm)第1図に見られる3
つの回折ピークはインジウムスズ酸化物の回折線であ
り、ヘキサシアノ鉄酸鉄の回折ピークがみられない。そ
こで上記操作により得られたヘキサシアノ鉄酸鉄膜につ
いて、X線回折法により結晶状態を調べた。その結果、
ヘキサシアノ鉄酸鉄膜は非晶質であることが確認され
た。
As a result of measuring the X-ray diffraction characteristics of the obtained film, the result as shown in FIG. 1 was obtained. (CuKα: 0.154nm) 3 seen in Fig. 1
Two diffraction peaks are diffraction lines of indium tin oxide, and no diffraction peak of iron hexacyanoferrate is observed. Therefore, the crystal state of the iron hexacyanoferrate film obtained by the above operation was examined by the X-ray diffraction method. as a result,
It was confirmed that the iron hexacyanoferrate film was amorphous.

又得られたガラス基板の両端を固定しガラス基板の中央
位置のヘキサシアノ鉄酸鉄膜上に約0.3cm2の底面を持つ
固定ジグをエポキシ樹脂接着剤を用いて固定し固定ジグ
を垂直方向(重力と反対の方向へ引っ張り、被覆がはく
離してジグが分離する荷重を測定した。その結果、該引
張り強度は40Kg/cm2以上であった。
Further, both ends of the obtained glass substrate were fixed, and a fixing jig having a bottom surface of about 0.3 cm 2 was fixed on the iron hexacyanoferrate film at the center position of the glass substrate by using an epoxy resin adhesive to fix the fixing jig in the vertical direction ( The tensile strength was 40 Kg / cm 2 or more as a result of pulling in the direction opposite to gravity and peeling the coating and separating the jig.

又該非晶質ヘキサシアノ鉄酸鉄膜の0.5モル/の濃度
の塩化カリウム水溶液(pH=4.0)中でのサイクリック
ボルタモグラムを測定した。掃引速度10mV/secとしたサ
イクリックボルタモグラムの結果を第4図に示す。該非
晶質ヘキサシアノ鉄酸鉄塩膜は±0.5Vで透明青色の着
消色を示した。
Further, the cyclic voltammogram of the amorphous iron hexacyanoferrate film in a 0.5 mol / concentration aqueous potassium chloride solution (pH = 4.0) was measured. Figure 4 shows the results of cyclic voltammograms with a sweep rate of 10 mV / sec. The amorphous iron hexacyanoferrate salt film showed a transparent blue coloration / decoloration at ± 0.5V.

比較例−1 0.02mol/のフェロシアン化カリウムと0.02mol/の塩
化第2鉄水溶液とをそれぞれ100ml作成し、両液を混合
した後、実施例1,2同様のインジウムスズ酸化物膜つき
ガラス板および対電極を浸漬して電流密度10μA/cm2
定電流で電解還元を行なってインジウムスズ酸化物膜上
に約200nm厚のヘキサシアノ鉄酸鉄塩膜を作成した。
Comparative Example-1 100 ml each of 0.02 mol / potassium ferrocyanide and 0.02 mol / ferric chloride aqueous solution were prepared, and after mixing both solutions, a glass plate with an indium tin oxide film similar to Examples 1 and 2 and The counter electrode was immersed, and electrolytic reduction was performed at a constant current with a current density of 10 μA / cm 2 to form a hexacyanoferrate iron salt film with a thickness of about 200 nm on the indium tin oxide film.

こうして作成したヘキサシアノ鉄酸鉄塩膜の引張り強度
を実施例同様測定した結果引張り強度は17.0Kg/cm2であ
り、実施例1により得られた被膜の引張り強度が高かっ
たことを示した。又実施例同様X線回折特性およびサイ
クリックボルタモグラムを測定した。その結果を第2図
および第3図に示す。第2図から、従来の方法により得
られるヘキサシアノ鉄酸鉄塩膜は、3本のインジウムス
ズ酸化物の回折ピーク(↓印)以外にヘキサシアノ鉄酸
鉄塩の結晶による回折ピーク(印)を有する結晶質膜
であることがわかった。又サイクリックボルタモグラム
は実施例により得られた被膜が従来の結晶質膜と同様の
着消色を示していたことを表わしている。
The tensile strength of the thus-prepared iron hexacyanoferrate salt film was measured in the same manner as in the example. As a result, the tensile strength was 17.0 Kg / cm 2 , which indicates that the film obtained in Example 1 had a high tensile strength. Also, the X-ray diffraction characteristics and cyclic voltammogram were measured as in the examples. The results are shown in FIGS. 2 and 3. From FIG. 2, the hexacyanoferrate iron salt film obtained by the conventional method has diffraction peaks (marks) due to crystals of hexacyanoferrate iron salt in addition to the diffraction peaks of three indium tin oxides (marked by ↓). It was found to be a crystalline film. Further, the cyclic voltammograms show that the coating films obtained in the examples showed the same coloration / decoloration as the conventional crystalline film.

〔発明の効果〕〔The invention's effect〕

以上詳述したように、本発明の製造方法により、従来の
方法で得られる結晶質のヘキサシアノ鉄酸鉄塩膜に比較
して、基板に対する付着強度の向上したEC膜つき基板を
得ることができるものである。また本発明により得られ
る非晶質のヘキサシアノ鉄酸鉄塩膜は、従来の方法で得
られる結晶質のヘキサシアノ鉄酸鉄塩膜と同様のエレク
トロクロミズム特性を有するため、良質な透過型EC素子
を製造するのに用いることができる。
As described above in detail, according to the production method of the present invention, a substrate with an EC film having improved adhesion strength to the substrate can be obtained as compared with a crystalline iron hexacyanoferrate film obtained by a conventional method. It is a thing. Further, the amorphous hexacyanoferrate iron salt film obtained by the present invention has the same electrochromic property as the crystalline hexacyanoferrate iron salt film obtained by the conventional method, so that a high-quality transmissive EC element is obtained. It can be used for manufacturing.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明実施例1により得られたインジウムスズ
酸化物膜上のヘキサシアノ鉄酸鉄塩膜のX線回折特性を
示す図であり、第2図は比較例1により得られた従来の
インジウムスズ酸化物膜上のヘキサシアノ鉄酸鉄塩膜の
X線回折特性を示す図であり、図3は実施例1および比
較例1により得られたヘキサシアノ鉄酸鉄塩膜のサイク
リックボルタモグラムを示す図である。
FIG. 1 is a diagram showing an X-ray diffraction characteristic of a hexacyanoferrate iron salt film on an indium tin oxide film obtained in Example 1 of the present invention, and FIG. 2 is a graph showing a conventional X-ray diffraction property obtained in Comparative Example 1. FIG. 4 is a diagram showing an X-ray diffraction characteristic of a hexacyanoferrate iron salt film on an indium tin oxide film, and FIG. 3 shows a cyclic voltammogram of the hexacyanoferrate iron salt film obtained in Example 1 and Comparative Example 1. It is a figure.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 河原 秀夫 大阪府大阪市東区道修町4丁目8番地 日 本板硝子株式会社内 (56)参考文献 特開 昭57−195182(JP,A) ─────────────────────────────────────────────────── --- Continuation of the front page (72) Hideo Kawahara, Inventor Hideo Kawahara, 4-8 Doshomachi, Higashi-ku, Osaka-shi, Osaka, Japan Nihon Sheet Glass Co., Ltd. (56) Reference JP-A-57-195182 (JP, A)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】Fe(III)イオンと〔Fe(III)(CN)
3-イオンとを含む水溶液と電極基板とを接触させて、該
電極基板表面にヘキサシアノ鉄酸鉄塩よりなるEC膜を析
出させるEC膜つき基板の製造方法において、予め該水溶
液に次亜リン酸塩を添加しておき、その後該次亜リン酸
塩を添加した水溶液と該電極基板とを接触させ、無電解
法により該電極基板表面に非晶質のEC膜を析出させるこ
とを特徴とするEC膜つき基板の製造方法。
1. Fe (III) ions and [Fe (III) (CN) 6 ]
In a method for producing a substrate with an EC film, which comprises contacting an aqueous solution containing 3- ions with an electrode substrate, and depositing an EC film made of iron hexacyanoferrate on the surface of the electrode substrate, the hypophosphorous acid is previously added to the aqueous solution. A salt is added in advance, and thereafter, the aqueous solution containing the hypophosphite is brought into contact with the electrode substrate to deposit an amorphous EC film on the surface of the electrode substrate by an electroless method. Manufacturing method of substrate with EC film.
【請求項2】該次亜リン酸塩を0.001モル/1〜0.1モル/1
の濃度の水溶液として添加する特許請求の範囲第1項記
載のEC膜つき基板の製造方法。
2. The hypophosphite is added in an amount of 0.001 mol / 1 to 0.1 mol / 1.
The method for producing a substrate with an EC film according to claim 1, which is added as an aqueous solution having a concentration of.
JP61085449A 1986-04-14 1986-04-14 Method for manufacturing substrate with EC film Expired - Lifetime JPH079523B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61085449A JPH079523B2 (en) 1986-04-14 1986-04-14 Method for manufacturing substrate with EC film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61085449A JPH079523B2 (en) 1986-04-14 1986-04-14 Method for manufacturing substrate with EC film

Publications (2)

Publication Number Publication Date
JPS62240937A JPS62240937A (en) 1987-10-21
JPH079523B2 true JPH079523B2 (en) 1995-02-01

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Family Applications (1)

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KR100740324B1 (en) 2006-03-06 2007-07-18 에스케이씨 주식회사 Preparation of prussian blue coating film for electrochromic device
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