JPH0793810A - Optical disk - Google Patents

Optical disk

Info

Publication number
JPH0793810A
JPH0793810A JP5237067A JP23706793A JPH0793810A JP H0793810 A JPH0793810 A JP H0793810A JP 5237067 A JP5237067 A JP 5237067A JP 23706793 A JP23706793 A JP 23706793A JP H0793810 A JPH0793810 A JP H0793810A
Authority
JP
Japan
Prior art keywords
film
light
reflectance
temperature
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5237067A
Other languages
Japanese (ja)
Inventor
Yoshio Kinoshita
良夫 木下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP5237067A priority Critical patent/JPH0793810A/en
Publication of JPH0793810A publication Critical patent/JPH0793810A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prohibit erasing and alteration of once recorded data by changing the reflectivity of both of pit forming parts and non-pit forming parts at the time of writing so that the temp. of s recording film do not rise up to a pit forming temp. at the time of the next irradiation with a writing laser beam. CONSTITUTION:This optical disk is composed of a substrate 101 consisting of glass, plastic, etc., an amorphous thin film 102 consisting of As-S-Te, Ge-Sb- Te, etc., a metallic thin film 103 consisting of Ag, Al, etc., a buffer film 104 consisting of SiO2, ZnS, etc., a reflection film 105 consisting of Ag and a protective film 106 consisting of plastic. The temp. of the film 102 rises up to about 1200 deg.C and the films 102, 103, 104, 105 melt and are bored with holes when the films are irradiated with an irradiation light quantity P3 from the substrate 101 side at the time of an initial state. The reflectivity decreases as low as 5% viewed from the substrate side and writing is executed. The temp. in the irradiated parts does not rise up to the pit forming temp. even if these parts are irradiated again with the irradiation light quantity P3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,例えばレ−ザ光を照射
して情報を記録再生するガラスあるいは合成樹脂よりな
る基板上に記録膜が積層された光ディスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disc having a recording film laminated on a substrate made of glass or synthetic resin for irradiating laser light to record and reproduce information.

【0002】[0002]

【従来の技術】従来から各種の記録再生光ディスクが知
られている。一般に、光ディスクは平板もしくは案内溝
を有するガラスあるいは合成樹脂等よりなる透明基板上
にテルル,セレン,ビスマス等の低融点金属またはこれ
ら金属と有機物質の複合材を記録層として蒸着またはス
パッタリング処理により設けたものである。この記録層
に変調されたレ−ザ光が照射され、その照射スポット上
でこの層が変質し、反射率が変化する。これによりピッ
トが記録層中に形成される。このような光ディスクに記
録する場合は、読み出し用のレ−ザ光が照射され記録層
中のピット、及びピットの形成されていない部分の信号
を読み出しながら未記録部分を探し、そこに記録してい
く。また、再生する場合は、書き込み用のレ−ザ光より
出力を弱くした読み出し用のレ−ザ光を用いて記録層中
に形成されたピットを読み出す。
2. Description of the Related Art Various recording / reproducing optical discs have been conventionally known. In general, an optical disk is provided on a transparent substrate made of glass or synthetic resin having a flat plate or a guide groove, or a low melting point metal such as tellurium, selenium or bismuth, or a composite material of these metals and an organic substance as a recording layer by vapor deposition or sputtering. It is a thing. This recording layer is irradiated with modulated laser light, the layer is altered on the irradiation spot, and the reflectance is changed. As a result, pits are formed in the recording layer. When recording on such an optical disc, the laser light for reading is irradiated to search for an unrecorded portion while reading out the signals of the pits in the recording layer and the portions where the pits are not formed, and record there. Go. When reproducing, the pits formed in the recording layer are read by using the reading laser light whose output is weaker than that of the writing laser light.

【0003】[0003]

【発明が解決しようとする課題】従来の、この種の記録
再生光ディスクでは、読み出し用のレ−ザ光は、書き込
み用のレ−ザ光より充分出力を弱くして記録層中のピッ
トの形成されていない部分を記録しないようにしてい
る。さらに、読み出し,書き込み用のレ−ザ光が所定の
場所で、所定の光量より大きくならないように回路で保
護している。しかし、意図的にデ−タの記録されている
部分で書き込み用のレ−ザ光を照射するとデ−タの消去
が可能である。WORM(1回書き込み可能光ディス
ク)は1回しか書き込みができずデ−タの改ざんできな
いことが特徴であるが、書き換え可能な光ディスクで
は、記録部分に書き込み時と同じレ−ザ光を当てればデ
−タを壊したり、改ざんすることができてしまう。すな
わち、1,0のデ−タを記録する場合、記録時はデ−タ
1を書き込み用のレ−ザ光,デ−タ0を読み出し用レ−
ザ光をあてて行う(サーボをかけるため)ため、すでに
記録した部分のうち、デ−タ1部分は書き込み用のレ−
ザ光があたってピットが記録層中に形成されているが、
デ−タ0部分は読み出し用レ−ザ光をあてているため、
再度書き込み用のレ−ザ光があたればピットが記録層中
に形成されてしまう。そのため、すでに記録した部分で
もデ−タを壊したり、改ざんすることができてしまう。
したがって、公文書等の保存には問題があった。
In the conventional recording / reproducing optical disk of this kind, the output of the reading laser light is sufficiently weaker than that of the writing laser light to form pits in the recording layer. I try not to record the parts that have not been recorded. Further, a circuit protects the laser light for reading and writing at a predetermined place so as not to exceed a predetermined light amount. However, the data can be erased by intentionally irradiating the portion where the data is recorded with the laser light for writing. WORM (write once optical disk) is characterized in that it can be written only once and data cannot be tampered with. However, in a rewritable optical disk, if the same laser light as that at the time of writing is applied to the recording portion, the data can be tampered with. -The data can be broken or tampered with. That is, when recording data of 1 and 0, at the time of recording, data 1 is laser light for writing and data 0 is reading laser light.
In order to apply the light (to apply the servo), the data 1 part of the already recorded part is the writing
The light hits and pits are formed in the recording layer,
Since the data 0 part is exposed to the reading laser light,
If laser light for writing is applied again, pits will be formed in the recording layer. Therefore, it is possible to destroy or falsify the data even in the already recorded part.
Therefore, there is a problem in storing official documents.

【0004】本発明は、読み出し,書き込み用のレ−ザ
光が既記録部分で、所定の光量より大きくなってもデ−
タの消去や改ざんができない記録再生可能な光ディスク
を提供することを目的とする。
According to the present invention, the laser light for reading and writing is a recorded portion, and even if the laser light exceeds a predetermined light amount
It is an object of the present invention to provide a recordable / reproducible optical disc that cannot be erased or tampered with.

【0005】[0005]

【課題を解決するための手段】本発明は、光ディスクの
書き込み時に、ピット形成部(第2の照射光量で記
録),非ピット形成部(第1の照射光量で記録)両方の
反射率を変化させることにより、次に書き込みレ−ザ光
が照射されても、照射部分の記録膜の到達温度がピット
を形成する温度まで上昇しないようにすることを特徴と
するものである。なお、光ディスクからの情報の再生
は、第1の照射光量より少ない光ビームで行う。
According to the present invention, the reflectance of both the pit formation portion (recording with the second irradiation light amount) and the non-pit formation portion (recording with the first irradiation light amount) is changed during writing on the optical disk. By so doing, the temperature reached by the recording film at the irradiated portion does not rise to the temperature at which the pits are formed even when the writing laser light is irradiated next. The reproduction of information from the optical disc is performed with a light beam that is smaller than the first irradiation light amount.

【0006】[0006]

【作用】本発明によれば、光ディスクに一度書き込みを
行えばそのデ−タをレ−ザ光照射では消去または改ざん
ができず、改ざんされてはならない公文書等の保存に利
用できる。
According to the present invention, once data is written on an optical disk, the data cannot be erased or tampered with by laser light irradiation, and can be used for storing an official document which must not be tampered with.

【0007】[0007]

【実施例】以下に本発明の実施例を説明する。光ディス
クの膜構成を図1に示す。ガラス,プラスチック等より
なる基板101、As−S−Te,Ge−Sb−Te等
よりなる非晶質薄膜102、Ag,Al等よりなる金属
薄膜103、SiO,ZnS等よりなる緩衝膜104、
Agよりなる反射膜105、プラスチックよりなる保護
膜106とからなる。基板101側から見た非晶質薄膜
102の反射率が初期状態r1 約10%で、基板101
側より光を照射した時の、照射光量と非晶質薄膜102
の到達温度との関係を図2に示す。非晶質薄膜102へ
の照射光量と反射率との関係を図3に示す。非晶質薄膜
102への照射光量と、非晶質薄膜102と反射膜10
5を合計した膜厚との関係を図4に示す。一度、非晶質
薄膜102の温度T2 を約600[℃]まで上げ、基板
101側から見た非晶質薄膜102の反射率r2 を約9
0%に変化させた後、温度を下げた状態で基板101側
より光を照射した時の、照射光量と非晶質薄膜102の
到達温度との関係を図5に示す。
EXAMPLES Examples of the present invention will be described below. The film structure of the optical disk is shown in FIG. A substrate 101 made of glass, plastic, etc., an amorphous thin film 102 made of As-S-Te, Ge-Sb-Te, etc., a metal thin film 103 made of Ag, Al, etc., a buffer film 104 made of SiO, ZnS, etc.,
The reflective film 105 is made of Ag and the protective film 106 is made of plastic. When the reflectance of the amorphous thin film 102 viewed from the substrate 101 side is in the initial state r1 of about 10%, the substrate 101
Amount of irradiation light when irradiated with light from the side and the amorphous thin film 102
The relationship with the ultimate temperature of is shown in FIG. FIG. 3 shows the relationship between the amount of light applied to the amorphous thin film 102 and the reflectance. Amount of irradiation light to the amorphous thin film 102, the amorphous thin film 102 and the reflective film 10
FIG. 4 shows the relationship with the total film thickness of No. 5. Once, the temperature T2 of the amorphous thin film 102 is raised to about 600 [° C.], and the reflectance r2 of the amorphous thin film 102 viewed from the substrate 101 side is about 9
FIG. 5 shows the relationship between the amount of irradiation light and the ultimate temperature of the amorphous thin film 102 when light is irradiated from the substrate 101 side in a state where the temperature is lowered after changing to 0%.

【0008】初期状態では、基板101側から見た時の
反射率はr1 ,非晶質薄膜102と金属薄膜103と緩
衝膜104と反射膜105と保護層106を合計した膜
厚L1 は約0.1[μm]である。初期状態の時、基板
101側より照射光量P1 で照射した場合は、非晶質薄
膜102の温度は図2に示す通りT1 約100[℃]ま
で上昇するが、金属が非晶質薄膜102中に急速に拡散
することは起きず、基板101側から見たときの反射率
も変化しない。初期状態の時、基板101側より照射光
量P2 で照射した場合は、非晶質薄膜102の温度は図
2に示す通りT2 まで上昇し、金属が非晶質薄膜102
中に急速に拡散する。金属が拡散した部分では元の積層
膜よりも反射率が低くて透過率は約90%と高くなる。
この状態で、照射をやめると金属薄膜103上の反射膜
105の反射率が基板101側から見たときの反射率と
なり、その時の反射率は図3に示す通りr2 となる。
In the initial state, the reflectance when viewed from the substrate 101 side is r1, and the total film thickness L1 of the amorphous thin film 102, the metal thin film 103, the buffer film 104, the reflective film 105, and the protective layer 106 is about 0. .1 [μm]. In the initial state, when the irradiation light amount P1 is applied from the substrate 101 side, the temperature of the amorphous thin film 102 rises to about 100 [° C.] T1 as shown in FIG. Does not diffuse rapidly, and the reflectance when viewed from the substrate 101 side does not change. In the initial state, when the irradiation amount of light P2 is applied from the substrate 101 side, the temperature of the amorphous thin film 102 rises to T2 as shown in FIG.
Spreads rapidly inside. In the portion where the metal is diffused, the reflectance is lower than the original laminated film and the transmittance is as high as about 90%.
When the irradiation is stopped in this state, the reflectance of the reflection film 105 on the metal thin film 103 becomes the reflectance as viewed from the substrate 101 side, and the reflectance at that time is r2 as shown in FIG.

【0009】初期状態の時、基板101側より照射光量
P3 で照射した場合は、非晶質薄膜102の温度は図2
に示す通りT3 約1200[℃]まで上昇し、非晶質薄
膜102と金属薄膜103と緩衝膜104と反射膜10
5は溶解し、表面張力によって周辺に引っ張られること
によって穴があき、基板101側から見たときの反射率
は図3に示す通りr0 が約5%と低くなる。一方、照射
光量P2 で照射した部分は、基板101側より照射光量
P3 で再び光を照射しても照射部分の反射率がr2 と高
いため、照射部分の温度は図2に示す通りT2 までは上
昇しない。したがって、非晶質薄膜102と金属薄膜1
03と緩衝膜104と反射膜105は溶解せず穴はあか
ない。また、照射光量P3 で照射した部分は、基板10
1側より照射光量P2 あるいはP3 で再び光を照射して
も照射部分の非晶質薄膜102と金属薄膜103と緩衝
膜104と反射膜105にはすでに穴があいているた
め、基板101側から見たときの反射率はr0 から変化
しない。
In the initial state, when the irradiation amount of light P3 is applied from the substrate 101 side, the temperature of the amorphous thin film 102 is as shown in FIG.
As shown in FIG. 3, T3 rises to about 1200 [° C.], and the amorphous thin film 102, the metal thin film 103, the buffer film 104, and the reflective film 10
No. 5 melts, and a hole is formed by being pulled to the periphery by the surface tension, and the reflectance when viewed from the substrate 101 side has a low r0 of about 5% as shown in FIG. On the other hand, in the portion irradiated with the irradiation light amount P2, the reflectance of the irradiation portion is as high as r2 even if the light is irradiated again with the irradiation light amount P3 from the substrate 101 side. Therefore, as shown in FIG. Does not rise. Therefore, the amorphous thin film 102 and the metal thin film 1
03, the buffer film 104, and the reflective film 105 do not melt and have no holes. The portion irradiated with the irradiation light amount P3 is the substrate 10
Even if the light is irradiated again with the irradiation light amount P2 or P3 from the 1 side, holes are already formed in the amorphous thin film 102, the metal thin film 103, the buffer film 104, and the reflection film 105 in the irradiated portion, so that from the substrate 101 side. The reflectance when viewed is unchanged from r0.

【0010】以下には、記録再生時の光源に半導体レー
ザ(以下、LD612と記す)を用いた場合の光源制御
回路の構成を図6に示す。記録データ601は、記録信
号処理回路602に入る。記録信号処理回路602で記
録データ601は変調がかけられ、実際に記録するデー
タに変換されるとともに、記録期間を示す記録ゲート発
生回路603により記録ゲート信号を作り出力する。記
録信号処理回路602で変換された信号と記録ゲート信
号はLD光量切り替え回路604に入る。LD光量切り
替え回路604は、スイッチ1 608,スイッチ2
609,スイッチ3 610を制御して、LD駆動回路
611に入る光量設定値を切り替える。図7に光源制御
回路の各部の波形を示す。再生時は、スイッチ1 60
8のみがオンとなり、LD駆動回路611にはLD光量
P1 設定回路605からの出力が入り、LD612の照
射光量はP1 となる。記録信号処理回路602で変換さ
れた信号と記録ゲート信号が入ると、記録信号処理回路
602で変換された信号が低いレベルの時スイッチ2
609のみがオンとなり、LD駆動回路611にはLD
光量P2 設定回路606からの出力が入り、LD612
の照射光量はP2 ,高いレベルの時スイッチ3 610
のみがオンとなり、LD駆動回路611にはLD光量P
3 設定回路607からの出力が入り、LD612の照射
光量はP3 となる。以上のように、光源の照射光量を制
御することにより、例えば、記録信号処理回路602で
変換された1,0のデ−タを記録する。デ−タ0を照射
光量P3 ,デ−タ1を照射光量P2 でそれぞれ照射する
と、デ−タ1の部分は反射率r2 ,デ−タ0の部分は反
射率r0 となる。通常このデ−タは、照射光量P1 で照
射して光量変化を検出して再生する。
FIG. 6 shows the configuration of a light source control circuit when a semiconductor laser (hereinafter referred to as LD 612) is used as a light source for recording / reproducing. The recording data 601 enters the recording signal processing circuit 602. The recording data 601 is modulated by the recording signal processing circuit 602 and converted into data to be actually recorded, and at the same time, a recording gate signal is generated by a recording gate generation circuit 603 which indicates a recording period and is output. The signal converted by the recording signal processing circuit 602 and the recording gate signal enter the LD light amount switching circuit 604. The LD light amount switching circuit 604 includes a switch 1 608 and a switch 2
609 and the switch 3 610 are controlled to switch the light amount setting value entering the LD drive circuit 611. FIG. 7 shows the waveform of each part of the light source control circuit. Switch 160 during playback
Only 8 is turned on, the output from the LD light amount P1 setting circuit 605 enters the LD drive circuit 611, and the irradiation light amount of the LD 612 becomes P1. When the signal converted by the recording signal processing circuit 602 and the recording gate signal are input, the switch 2 is activated when the signal converted by the recording signal processing circuit 602 is at a low level.
Only 609 is turned on, and the LD drive circuit 611 has an LD
The output from the light amount P2 setting circuit 606 is input to the LD 612.
The irradiation light amount of P2 is P2, and at the time of high level, switch 3 610
Only the light is turned on, and the LD drive circuit 611 outputs the LD light amount P
3 The output from the setting circuit 607 is input, and the irradiation light amount of the LD 612 becomes P3. As described above, by controlling the irradiation light amount of the light source, for example, the data of 1 and 0 converted by the recording signal processing circuit 602 is recorded. When the data 0 is irradiated with the irradiation light amount P3 and the data 1 is irradiated with the irradiation light amount P2, the portion of the data 1 has the reflectance r2 and the portion of the data 0 has the reflectance r0. Normally, this data is irradiated with the irradiation light amount P1 to detect the change in the light amount and reproduce it.

【0011】[0011]

【発明の効果】以上説明したように本発明によれば、こ
のように記録したデ−タは、読み出し書き込み用のレ−
ザ光が照射光量P2 ,P3 のように大きくなっても反射
率の変化はほとんどない。したがって、意図的にデ−タ
の記録されている部分で大きな光量のレ−ザ光が照射さ
れても、デ−タの消去,改ざんは不可能であり、改ざん
されてはならない公文書等の保存に利用できる。
As described above, according to the present invention, the data recorded in this way is used for reading and writing.
There is almost no change in reflectance even when the light is increased as the irradiation light amounts P2 and P3. Therefore, even if a large amount of laser light is intentionally applied to the portion where the data is recorded, the data cannot be erased or tampered with. Can be used for storage.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明ディスクの膜構成を示す図。FIG. 1 is a diagram showing a film structure of a disc of the present invention.

【図2】 初期状態での照射光量と,非晶質薄膜の温度
との関係を示す図。
FIG. 2 is a diagram showing a relationship between an irradiation light amount in an initial state and a temperature of an amorphous thin film.

【図3】 非晶質薄膜の温度と反射率との関係を示す
図。
FIG. 3 is a diagram showing the relationship between the temperature and the reflectance of an amorphous thin film.

【図4】 非晶質薄膜の温度と、非晶質薄膜,金属薄
膜,緩衝膜,反射膜を合計した膜厚との関係を示す図。
FIG. 4 is a diagram showing the relationship between the temperature of the amorphous thin film and the total film thickness of the amorphous thin film, the metal thin film, the buffer film, and the reflective film.

【図5】 反射率r2 にした状態での照射光量と、非晶
質薄膜の温度との関係を示す図。
FIG. 5 is a graph showing the relationship between the amount of irradiation light and the temperature of the amorphous thin film in the state of reflectance r2.

【図6】 本発明への光ディスクへの記録,再生を行う
光源制御回路構成を示す図。
FIG. 6 is a diagram showing the configuration of a light source control circuit for performing recording and reproduction on an optical disc according to the present invention.

【図7】 図6の光源制御回路の各部の波形を示す図。7 is a diagram showing the waveform of each part of the light source control circuit of FIG.

【符号の説明】[Explanation of symbols]

101…基板 102…非晶質薄膜 103…金属薄膜 104…緩衝膜 105…反射膜 106…保護膜 101 ... Substrate 102 ... Amorphous thin film 103 ... Metal thin film 104 ... Buffer film 105 ... Reflective film 106 ... Protective film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】基板と、 この基板上に積層され、前記基板側からの情報に応じた
第1の照射光量より少ない照射光量の光ビームでは反射
率が変化せず、前記第1の照射光量までの光ビームでは
反射率が変化し、該第1の照射光量より多い第2の照射
光量の光ビームが照射されると溶解する記録膜と、 この記録膜上に積層され、前記第1の照射光量までの光
ビームでは、該光ビームを前記基板方向に反射し、前記
第2の照射光量の光ビームが照射されると溶解する反射
膜と、 この反射膜上に積層され、少なくとも前記記録膜,反射
膜を保護し、かつ前記光ビームを透過する保護膜とから
なる光ディスク。
1. A substrate and a first irradiation light amount which is laminated on the substrate and whose reflectance does not change with a light beam having an irradiation light amount smaller than a first irradiation light amount according to information from the substrate side. Up to the light beam, the reflectance changes, and a recording film is dissolved when irradiated with a light beam having a second irradiation light amount larger than the first irradiation light amount; With a light beam up to the irradiation light amount, a reflection film that reflects the light beam toward the substrate and dissolves when irradiated with the second irradiation light beam is laminated on the reflection film, and at least the recording film is formed. An optical disk comprising a protective film that protects a film and a reflective film and that transmits the light beam.
【請求項2】光ディスク基板と、前記基板上に記録膜が
積層され、前記記録膜に光を照射し加熱することで、前
記記録膜の反射率と膜厚が変化し、前記加熱した時の温
度と、反射率変化,膜厚変化の関係が初期反射率をr1
とした時の再生時の光照射による到達温度をT1 ,反射
率がr2 (ただし、r2 >r1 )となる温度をT2 ,前
記記録膜の初期の膜厚をL1 とした時の膜厚がL2 (た
だし、L2 <L1 )となる温度をT3 とすると、 前記温度T1 ,T2 ,T3 がT1 <T2 <T3 の条件を
満たし、かつ前記記録膜が反射率r1 の時、光を照射し
加熱した時の光量と到達温度の関係が光量P1 の時の到
達温度T1 ,光量P2 の時の到達温度T2 ,光量P3 の
時の到達温度T3(ただし,P1 <P2 <P3 ,T1 <
T2 <T3 )であり、光照射により前記記録膜の温度が
T2 に達し、前記記録膜が反射率r2に変化した後一度
冷却した状態で、光量と温度の関係が、 光量P3 の時の到達温度<T3であることを特徴とす
る光ディスクであって、前記記録膜に光を照射し加熱す
ることで、前記記録膜の反射率が、初期反射率r1 から
反射率r2 ,r0 (ただし、r0 <r1 <r2 )に変化
した状態で情報を記録することを特徴とする光ディス
ク。
2. An optical disk substrate and a recording film laminated on the substrate, and by irradiating the recording film with light to heat it, the reflectance and the film thickness of the recording film change, and The relationship between temperature, reflectance change, and film thickness change is the initial reflectance r1
, The temperature reached by the light irradiation during reproduction is T1, the temperature at which the reflectance is r2 (where r2> r1) is T2, and the initial film thickness of the recording film is L1. When the temperature at which (L2 <L1) is T3, the temperatures T1, T2 and T3 satisfy the condition of T1 <T2 <T3 and the recording film is irradiated with light and heated when the reflectance is r1. When the relationship between the quantity of light and the ultimate temperature is the quantity of light P1, the ultimate temperature T1, the temperature T2 when the quantity of light P2, the ultimate temperature T3 when the quantity of light P3 (where P1 <P2 <P3, T1 <
T2 <T3), the temperature of the recording film reaches T2 by light irradiation, the recording film changes to the reflectance r2, and once cooled, the relation between the light amount and the temperature reaches the light amount P3. An optical disk having a temperature <T3, wherein the reflectance of the recording film is changed from the initial reflectance r1 to the reflectances r2 and r0 (however, r0 by irradiating and heating the recording film. An optical disc on which information is recorded in a state of <r1 <r2).
JP5237067A 1993-09-24 1993-09-24 Optical disk Pending JPH0793810A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5237067A JPH0793810A (en) 1993-09-24 1993-09-24 Optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5237067A JPH0793810A (en) 1993-09-24 1993-09-24 Optical disk

Publications (1)

Publication Number Publication Date
JPH0793810A true JPH0793810A (en) 1995-04-07

Family

ID=17009933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5237067A Pending JPH0793810A (en) 1993-09-24 1993-09-24 Optical disk

Country Status (1)

Country Link
JP (1) JPH0793810A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6950386B2 (en) 2002-02-22 2005-09-27 Victor Company Of Japan, Limited Optical recording medium and recording method onto the optical recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6950386B2 (en) 2002-02-22 2005-09-27 Victor Company Of Japan, Limited Optical recording medium and recording method onto the optical recording medium

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