JPH0792186A - Semiconductor acceleration sensor - Google Patents

Semiconductor acceleration sensor

Info

Publication number
JPH0792186A
JPH0792186A JP23994293A JP23994293A JPH0792186A JP H0792186 A JPH0792186 A JP H0792186A JP 23994293 A JP23994293 A JP 23994293A JP 23994293 A JP23994293 A JP 23994293A JP H0792186 A JPH0792186 A JP H0792186A
Authority
JP
Japan
Prior art keywords
sensor
strain
weight portion
viscoelastic body
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP23994293A
Other languages
Japanese (ja)
Inventor
Naohiro Taniguchi
直博 谷口
Kazuya Nohara
一也 野原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP23994293A priority Critical patent/JPH0792186A/en
Publication of JPH0792186A publication Critical patent/JPH0792186A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide a semiconductor acceleration sensor for detecting the acceleration accurately over a wide frequency range while resisting against excessive impact or an acceleration close to oscillation frequency. CONSTITUTION:An overlapped part 3 is formed in the center of a semiconductor substrate 2 using a semiconductor fabrication technology. The overlapped part 3 is supported freely rockably with respect to the peripheral outer frame part 5 by a thin strain imparting part 4 to which a viscoelastic body 6 is attached on the surface or rear thereof. Consequently, even if the sensor part 1 is subjected to excessive impact, the viscoelastic body 6 buffers the impact applied to the strain imparting part 4 which is thereby protected against being damaged. The viscoelastic body 6 also prevents the amplitude of vibration at the overlapped part 3 from being maximized in the vicinity of resonance frequency thus improving the frequency characteristics of semiconductor acceleration sensor.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体基板を加工して
形成される半導体加速度センサに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor acceleration sensor formed by processing a semiconductor substrate.

【0002】[0002]

【従来の技術】半導体加速度センサは従来より半導体プ
レーナプロセスを利用して製造されており、小型、高感
度、高信頼性という特徴を持つものである。
2. Description of the Related Art A semiconductor acceleration sensor has been conventionally manufactured by using a semiconductor planar process, and is characterized by its small size, high sensitivity and high reliability.

【0003】[0003]

【発明が解決しようとする課題】しかし、半導体加速度
センサの重り部と支持部とをつなぐ起歪部は数μm〜十
数μmの薄さに形成する必要があり、落下等の外部から
の過度の衝撃によって、耐衝撃性に劣る起歪部が比較的
容易に破損してしまうという問題がある。また、重り部
と支持部と起歪部とから成るセンサ部には共振周波数が
存在し、この共振周波数に近い周波数を持つ加速度がセ
ンサ部に加わると、重り部の振幅が極大化して起歪部の
破損に至るという問題がある。
However, the strain-generating portion connecting the weight portion and the support portion of the semiconductor acceleration sensor needs to be formed to a thin thickness of several μm to several tens of μm, and an excessive strain from the outside such as a fall may occur. There is a problem that the strained portion having poor impact resistance is relatively easily damaged by the impact of (1). In addition, a resonance frequency exists in the sensor section consisting of the weight section, the support section, and the strain generating section.When acceleration having a frequency close to this resonance frequency is applied to the sensor section, the amplitude of the weight section is maximized and There is a problem that the parts are damaged.

【0004】さらに、理想的には可能な限り広い周波数
範囲で加速度が検出できることが望ましいが、センサ部
には上記共振周波数が存在するために共振周波数近傍の
周波数帯では加速度の検出精度が悪化し、半導体加速度
センサとしての使用可能な周波数範囲が限定されてしま
うという問題がある。本発明は上記問題に鑑みてなされ
たものであり、過度の衝撃や共振周波数に近い加速度が
加わっても破損せず、広い周波数範囲に渡って精度よく
加速度が検出できる半導体加速度センサを提供すること
を目的とするものである。
Further, ideally, it is desirable that the acceleration can be detected in the widest possible frequency range. However, since the resonance frequency exists in the sensor section, the accuracy of acceleration detection deteriorates in the frequency band near the resonance frequency. However, there is a problem that the usable frequency range of the semiconductor acceleration sensor is limited. The present invention has been made in view of the above problems, and provides a semiconductor acceleration sensor that can be accurately detected over a wide frequency range without being damaged even if an excessive impact or an acceleration close to the resonance frequency is applied. The purpose is.

【0005】[0005]

【課題を解決するための手段】請求項1の発明は、上記
目的を達成するために、重り部と、薄肉の起歪部と、起
歪部によって重り部を揺動自在に支持する支持部とを半
導体基板を加工して一体に形成したセンサ部を備え、起
歪部の表裏面の少なくとも一方に粘弾性体を付設したこ
とを特徴とする。
In order to achieve the above-mentioned object, the invention of claim 1 is such that a weight portion, a thin straining portion, and a supporting portion for swingably supporting the weight portion by the straining portion. And a sensor portion integrally formed by processing a semiconductor substrate, and a viscoelastic body is attached to at least one of the front and back surfaces of the strain generating portion.

【0006】請求項2の発明は、重り部と薄肉の起歪部
と起歪部によって重り部を揺動自在に支持する支持部と
を半導体基板を加工して一体に形成したセンサ部と、重
り部と対向させてセンサ部に配設され重り部が所定以上
に変位するのを規制するストッパ部と、ストッパ部と起
歪部との間に設けられた狭小な隙間に毛細管現象を利用
して流入され起歪部の表面に付設される粘弾性体とを備
えて成ることを特徴とする。
According to a second aspect of the present invention, there is provided a sensor section in which a weight portion, a thin strain element and a support portion which swingably supports the weight element by the strain element are integrally formed by processing a semiconductor substrate. Capillary phenomenon is used in the narrow gap provided between the stopper portion and the stopper portion, which is provided in the sensor portion so as to face the weight portion and restricts the displacement of the weight portion beyond a predetermined value, and the strain portion. And a viscoelastic body attached to the surface of the strain-flexing portion.

【0007】請求項3の発明は、重り部と薄肉の起歪部
と起歪部によって重り部を揺動自在に支持する支持部と
を半導体基板を加工して一体に形成したセンサ部と、重
り部と対向させてセンサ部の表裏両面に配設され重り部
が所定以上に変位するのを規制するストッパ部と、スト
ッパ部が表裏両面に配設されたセンサ部が表面にボンデ
ィングされる基板と、基板表面にボンディングされたセ
ンサ部及びストッパ部を封止するとともにストッパ部と
起歪部との間に設けられた狭小な隙間に毛細管現象を利
用して流入され起歪部の表面に付設される粘弾性体とを
備えて成ることを特徴とする。
According to a third aspect of the present invention, there is provided a sensor section in which a weight portion, a thin strain-generating portion, and a supporting portion which swingably supports the weight portion by the strain-generating portion are integrally formed by processing a semiconductor substrate. A substrate on which the stopper portion is provided on both the front and back surfaces of the sensor portion so as to face the weight portion and restricts the weight portion from being displaced more than a predetermined amount, and the sensor portion with the stopper portion provided on the front and back surfaces is bonded to the surface. And seals the sensor part and the stopper part bonded to the surface of the substrate and attaches to the surface of the strain generating part by using the capillary phenomenon to flow into a narrow gap provided between the stopper part and the strain generating part. And a viscoelastic body.

【0008】[0008]

【作用】請求項1の発明の構成では、重り部と、薄肉の
起歪部と、起歪部によって重り部を揺動自在に支持する
支持部とを半導体基板を加工して一体に形成したセンサ
部を備え、起歪部の表裏面の少なくとも一方に粘弾性体
を付設したので、半導体加速度センサに過度の衝撃が加
わった場合やセンサ部の共振周波数近傍の周波数を持つ
加速度が加わった場合に、起歪部にかかる衝撃を粘弾性
体で緩和して起歪部の破損を防ぐことができ、さらに共
振周波数近傍の周波数の加速度に対して重り部の揺動に
よる変位が極大化するのを抑止することによって検出で
きる加速度の周波数範囲を拡大することができるのであ
る。
According to the structure of the invention of claim 1, the weight portion, the thin strain generating portion, and the supporting portion for swingably supporting the weight portion by the strain generating portion are integrally formed by processing the semiconductor substrate. Since a viscoelastic body is attached to at least one of the front and back surfaces of the strain-flexing part, it is possible to apply excessive impact to the semiconductor acceleration sensor or to apply acceleration with a frequency near the resonance frequency of the sensor part. In addition, the impact on the strain-flexing part can be mitigated by the viscoelastic body to prevent the strain-defining part from being damaged, and the displacement due to the swing of the weight part is maximized with respect to the acceleration of the frequency near the resonance frequency. The frequency range of acceleration that can be detected can be expanded by suppressing the above.

【0009】請求項2の発明の構成では、重り部と薄肉
の起歪部と起歪部によって重り部を揺動自在に支持する
支持部とを半導体基板を加工して一体に形成したセンサ
部と、重り部と対向させてセンサ部に配設され重り部が
所定以上に変位するのを規制するストッパ部と、ストッ
パ部と起歪部との間に設けられた狭小な隙間に毛細管現
象を利用して流入され起歪部の表面に付設される粘弾性
体とを備えたので、ストッパ部及び粘弾性体によって起
歪部の破損を防止し、検出できる加速度の周波数範囲を
拡大できるとともに、粘弾性体はストッパ部と起歪部と
の間の隙間の寸法に合わせて付設されるために粘弾性体
の寸法ばらつきを減少させることができる。
According to the second aspect of the present invention, the sensor portion is formed by integrally processing the weight portion, the thin strain element and the support portion that swingably supports the weight element by processing the semiconductor substrate. And a capillary phenomenon in the narrow gap provided between the stopper portion and the strain-flexing portion, and the stopper portion that is disposed in the sensor portion so as to face the weight portion and restricts the displacement of the weight portion beyond a predetermined value. Since it is provided with a viscoelastic body that is introduced and attached to the surface of the strain-flexing portion, damage to the strain-generating portion is prevented by the stopper portion and the viscoelastic body, and the frequency range of acceleration that can be detected can be expanded. Since the viscoelastic body is attached according to the size of the gap between the stopper portion and the strain-flexing portion, it is possible to reduce the dimensional variation of the viscoelastic body.

【0010】請求項3の発明の構成では、重り部と薄肉
の起歪部と起歪部によって重り部を揺動自在に支持する
支持部とを半導体基板を加工して一体に形成したセンサ
部と、重り部と対向させてセンサ部の表裏両面に配設さ
れ重り部が所定以上に変位するのを規制するストッパ部
と、ストッパ部が表裏両面に配設されたセンサ部が表面
にボンディングされる基板と、基板表面にボンディング
されたセンサ部及びストッパ部を封止するとともにスト
ッパ部と起歪部との間に設けられた狭小な隙間に毛細管
現象を利用して流入され起歪部の表面に付設される粘弾
性体とを備えたので、起歪部の破損を防止し、検出でき
る加速度の周波数範囲を拡大できるだけでなく、センサ
部及びストッパ部を封止する封止材を粘弾性体として起
歪部の表面に付設することができ、封止工程と同時に粘
弾性体を付設することができて製造工程を減少させるこ
とができるのである。
According to the third aspect of the present invention, the sensor portion is formed by integrally processing the weight portion, the thin strain element and the support portion that swingably supports the weight element by processing the semiconductor substrate. A stopper portion that is provided on both the front and back surfaces of the sensor portion so as to face the weight portion and restricts the weight portion from displacing more than a predetermined amount, and a sensor portion where the stopper portion is disposed on both the front and back surfaces is bonded to the surface. Substrate and the sensor part and the stopper part bonded to the surface of the substrate are sealed, and the surface of the strain generating part is introduced into the narrow gap provided between the stopper part and the strain generating part by utilizing the capillary phenomenon. Since a viscoelastic body attached to the viscoelastic body is provided, not only can the strain-prone part be prevented from being damaged and the frequency range of acceleration that can be detected can be expanded, but also a sealing material that seals the sensor part and the stopper part can be used. Attached to the surface of the strain Rukoto can, it is possible to reduce the manufacturing process is able to attached simultaneously viscoelastic body and sealing step.

【0011】[0011]

【実施例】【Example】

(実施例1)図2に本実施例の半導体加速度センサのセ
ンサ部1の斜視図を示す。図2に示すように、半導体基
板2の中心部に、半導体加工技術を用いて、重り部3が
形成されている。この重り部3は薄肉の起歪部4によっ
て周囲の外枠部5に揺動自在に支持されており、外枠部
5が支持部となっている。起歪部4の表面には、歪みを
検出するためのピエゾ抵抗4aが形成されている。
(Embodiment 1) FIG. 2 shows a perspective view of a sensor portion 1 of a semiconductor acceleration sensor of this embodiment. As shown in FIG. 2, a weight portion 3 is formed at the center of the semiconductor substrate 2 by using a semiconductor processing technique. The weight portion 3 is swingably supported by a surrounding outer frame portion 5 by a thin strain element 4, and the outer frame portion 5 serves as a support portion. A piezoresistor 4a for detecting strain is formed on the surface of the strain generating section 4.

【0012】図1は図2のA−A線についての断面図で
ある。図1の矢印で示す方向に加速度Gが加わると、そ
の加速度によって重り部3がたわむ。重り部3がたわむ
ことにより、薄肉の起歪部4には加速度Gに比例した応
力及び歪みが生じる。この起歪部4に発生した歪みに比
例してピエゾ抵抗4aの抵抗値が変化する。その抵抗値
の変化を、例えばブリッジを組んで電圧出力として取り
出すことにより、加速度Gに応じた電圧が得られ、加速
度Gの大きさを電圧値として検出することができるので
ある。
FIG. 1 is a sectional view taken along the line AA of FIG. When acceleration G is applied in the direction shown by the arrow in FIG. 1, the weight portion 3 is bent by the acceleration. Due to the bending of the weight portion 3, stress and strain in proportion to the acceleration G are generated in the thin strain element 4. The resistance value of the piezoresistor 4a changes in proportion to the strain generated in the strain generating section 4. By extracting the change in the resistance value as a voltage output by forming a bridge, for example, a voltage corresponding to the acceleration G can be obtained, and the magnitude of the acceleration G can be detected as a voltage value.

【0013】そして、図1に示すように、本実施例では
起歪部4の表面(同図(b)参照)あるいは裏面(同図
(a)参照)に粘弾性体6を付設してある。この粘弾性
体6はシリコンゲルやシリコンゴムを付着させたり、あ
るいはポリイミド等の樹脂系材料をコーティングするな
どの方法で付設できる。上記構成では、過度の衝撃(加
速度)がセンサ部1に加わった場合にも、粘弾性体6に
よって起歪部4に加わる衝撃を緩和することができ、過
度の衝撃から起歪部4を保護して起歪部4の破損を防止
することができるのである。
As shown in FIG. 1, in this embodiment, a viscoelastic body 6 is attached to the front surface (see FIG. 2B) or the back surface (see FIG. 1A) of the strain generating portion 4. . The viscoelastic body 6 can be attached by a method such as attaching silicon gel or silicone rubber, or coating a resin material such as polyimide. In the above configuration, even when an excessive shock (acceleration) is applied to the sensor unit 1, the viscoelastic body 6 can mitigate the shock applied to the strain generating unit 4 and protect the strain generating unit 4 from the excessive shock. As a result, it is possible to prevent the strain portion 4 from being damaged.

【0014】さらに、粘弾性体6を付設しない従来の構
成では、センサ部1の持つ固有振動数と外部から加わる
加速度Gの周波数とが近い場合に重り部3が共振して振
幅が極大化し、図4に示すように加速度が正確に検出で
きる周波数範囲f0 (同図のフラットな部分)が狭くな
ってしまうが、粘弾性体6を起歪部4の表裏面の少なく
とも一方に付設した本実施例の構成では、粘弾性体6に
よって共振周波数近傍で重り部3の振幅が極大化するの
を抑止することができるため、図3に示すように加速度
が正確に検出できる周波数範囲f1 (同図のフラットな
部分)が広くなり、半導体加速度センサとしても周波数
特性を改善することができるのである。また、粘弾性体
6に使用する材料の粘性を適当に選ぶことによって、起
歪部4の耐衝撃性を制御したり、あるいは、種々の周波
数特性を持たせることがことができる。
Further, in the conventional structure in which the viscoelastic body 6 is not provided, when the natural frequency of the sensor section 1 and the frequency of the acceleration G applied from the outside are close to each other, the weight section 3 resonates to maximize the amplitude, As shown in FIG. 4, although the frequency range f 0 (flat portion in the figure) where acceleration can be accurately detected becomes narrow, a book in which the viscoelastic body 6 is attached to at least one of the front and back surfaces of the strain-flexing portion 4 is used. in the configuration examples, it is possible to suppress to maximize the amplitude of the weight part 3 in the vicinity of the resonance frequency by the viscoelastic member 6, the frequency range f 1 that the acceleration can be accurately detected as shown in FIG. 3 ( The flat portion in the figure) becomes wider, and the frequency characteristic can be improved even as a semiconductor acceleration sensor. Further, by appropriately selecting the viscosity of the material used for the viscoelastic body 6, it is possible to control the impact resistance of the strain-flexing portion 4 or to provide various frequency characteristics.

【0015】なお、本実施例においては、重り部3を片
側だけで支持する片持ち梁構造の半導体加速度センサで
説明したが、両端固定梁構造のものや、起歪部4が膜構
造のものであってもよい。 (実施例2)本実施例の半導体加速度センサの平面断面
図を図5に示す。本実施例の半導体加速度センサは、重
り部3が所定以上に変位するのを規制するストッパ部7
a,7bを重り部3と対向させてセンサ部1の表裏両面
に接合等により配設されている。さらに、表面側のスト
ッパ部7aと起歪部4の表面との間には狭小な隙間8が
設けてあり、起歪部4と重り部3との結合部分近傍の表
面側ストッパ部7aには封止材流入防止用の溝9が設け
てある。
In this embodiment, the semiconductor acceleration sensor having a cantilever structure in which the weight part 3 is supported only on one side has been described, but the structure is one in which both ends are fixed and the strain generating part 4 is in a film structure. May be (Embodiment 2) A plan sectional view of a semiconductor acceleration sensor of this embodiment is shown in FIG. In the semiconductor acceleration sensor of this embodiment, the stopper portion 7 that restricts the weight portion 3 from being displaced more than a predetermined amount.
The a and 7b are opposed to the weight portion 3 and arranged on both front and back surfaces of the sensor portion 1 by bonding or the like. Further, a narrow gap 8 is provided between the stopper portion 7a on the front surface side and the surface of the strain-flexing portion 4, and the surface-side stopper portion 7a near the joint portion between the strain-generating portion 4 and the weight portion 3 is provided. A groove 9 for preventing the inflow of the sealing material is provided.

【0016】センサ部1の表裏両面にストッパ部7a,
7bが接合されて形成されたセンサチップは、例えばア
ルミナ基板10上にダイボンディングされ、さらにアル
ミナ基板10上に形成された配線とセンサ部1とがワイ
ヤボンディングによってワイヤ11で接続されている。
そして、上記センサチップ及びワイヤ11を保護するた
めに全体を封止材Aで封止している。ここで、封止材A
としてシリコンゲルやシリコンゴムあるいはエポキシ系
樹脂等の粘弾性を持つ材料を使用し、センサチップを封
止する封止材Aをストッパ部7aと起歪部4との間の隙
間8に流入させて起歪部4の表面に粘弾性体6を付設し
ている。封止材Aとして使用する上記シリコンゲル等は
全て熱硬化性を持っており、加熱して硬化させる際には
一端流動性を持つ状態となる。したがって、毛細管現象
によって上記隙間8に封止材Aが流入し、流入した封止
材Aは表面側のストッパ部7aに設けた溝9に溜まり、
その溝9よりも内部側には侵入せずに硬化し、上記粘弾
性体6を形成することができるのである。
Stoppers 7a are provided on both front and back surfaces of the sensor unit 1,
The sensor chip formed by joining 7b is die-bonded on, for example, an alumina substrate 10, and the wiring formed on the alumina substrate 10 and the sensor unit 1 are connected by a wire 11 by wire bonding.
Then, in order to protect the sensor chip and the wire 11, the whole is sealed with a sealing material A. Here, the sealing material A
A material having viscoelasticity such as silicon gel, silicon rubber, or epoxy resin is used as the material, and the sealing material A for sealing the sensor chip is flowed into the gap 8 between the stopper portion 7a and the strain generating portion 4. A viscoelastic body 6 is attached to the surface of the strain generating section 4. The above-mentioned silicon gel and the like used as the encapsulating material A are all thermosetting, and when heated and cured, they are in a state of having fluidity. Therefore, the sealing material A flows into the gap 8 due to the capillary phenomenon, and the inflowing sealing material A collects in the groove 9 provided in the stopper portion 7a on the front surface side.
The viscoelastic body 6 can be formed by hardening without penetrating into the inside of the groove 9.

【0017】ところで、センサ部1の表裏両面にストッ
パ部7a,7bを接合する際には、従来は図6に示すよ
うに、センサ部1とストッパ部7a,7bとの接合部分
を金とゲルマニウムとの合金(Au−Ge合金)あるい
は金と錫との合金(Au−Sn合金)によって共晶接合
する方法が採られている。すなわち、図7に示すよう
に、ストッパ部7aの表面の外枠部5と接する部分に予
め上記の合金を2μm程度の厚みに蒸着した合金層12
を形成し、ストッパ部7aをセンサ部1と当接させた状
態で合金層12を溶融することによって共晶接合してい
るのである。しかし、このような方法では溶融時に合金
層12がストッパ部7aの表面上に拡がってしまうため
に、共晶接合後の接合部分の合金の厚みがばらついてし
まい管理できないという問題がある。
By the way, when joining the stopper portions 7a and 7b to both front and back surfaces of the sensor portion 1, conventionally, as shown in FIG. 6, the joint portion between the sensor portion 1 and the stopper portions 7a and 7b is made of gold and germanium. A method of eutectic bonding is used with an alloy (Au-Ge alloy) or an alloy of gold and tin (Au-Sn alloy). That is, as shown in FIG. 7, an alloy layer 12 in which the above alloy is vapor-deposited in advance to a thickness of about 2 μm on a portion of the surface of the stopper portion 7a that contacts the outer frame portion 5
Is formed, and the alloy layer 12 is melted in a state where the stopper portion 7a is in contact with the sensor portion 1 to perform eutectic bonding. However, in such a method, the alloy layer 12 spreads on the surface of the stopper portion 7a at the time of melting, so that there is a problem that the thickness of the alloy at the joint portion after the eutectic joining varies and cannot be controlled.

【0018】そこで、図8(a)及び(b)に示すよう
に、ストッパ部7a表面の四隅に合金層12の厚みより
も低い高さ寸法を有する台状の突起部13を設け、隣合
う突起部13の間に合金を蒸着して合金層12を形成す
る(例えば、合金層12の厚みを2μmとして突起部1
3の高さ寸法を1.5μmとする)。したがって、溶融
された合金層12がストッパ部7aの表面上に拡がって
も、図8(c)に示すように突起部13がセンサ部1の
表面に当接してストッパ部7aとセンサ部1との隙間を
突起部13の高さ寸法に規制し、共晶接合後の接合部分
の合金の厚みを突起部13の高さ寸法で管理することが
できるのである。
Therefore, as shown in FIGS. 8 (a) and 8 (b), trapezoidal protrusions 13 having a height dimension lower than the thickness of the alloy layer 12 are provided at the four corners of the surface of the stopper portion 7a so as to be adjacent to each other. An alloy is vapor-deposited between the protrusions 13 to form the alloy layer 12 (for example, when the thickness of the alloy layer 12 is 2 μm, the protrusions 1
The height dimension of 3 is 1.5 μm). Therefore, even if the melted alloy layer 12 spreads over the surface of the stopper portion 7a, the protrusion 13 comes into contact with the surface of the sensor portion 1 as shown in FIG. The height of the protrusion 13 can be controlled by limiting the gap of the height of the protrusion 13 to the height of the protrusion 13.

【0019】[0019]

【発明の効果】請求項1の発明は、重り部と、薄肉の起
歪部と、起歪部によって重り部を揺動自在に支持する支
持部とを半導体基板を加工して一体に形成したセンサ部
を備え、起歪部の表裏面の少なくとも一方に粘弾性体を
付設したので、半導体加速度センサに過度の衝撃が加わ
った場合やセンサ部の共振周波数近傍の周波数を持つ加
速度が加わった場合に、起歪部にかかる衝撃を粘弾性体
で緩和して起歪部の破損を防ぐことができるという効果
がある。さらに、共振周波数近傍の周波数の加速度に対
して重り部の揺動による変位が極大化するのを抑止する
ことによって検出できる加速度の周波数範囲を拡大する
ことができるという効果がある。
According to the invention of claim 1, the weight portion, the thin strain generating portion, and the supporting portion for swingably supporting the weight portion by the strain generating portion are integrally formed by processing the semiconductor substrate. Since a viscoelastic body is attached to at least one of the front and back surfaces of the strain-flexing part, it is possible to apply excessive impact to the semiconductor acceleration sensor or to apply acceleration with a frequency near the resonance frequency of the sensor part. In addition, there is an effect that the impact applied to the strain-flexing portion can be alleviated by the viscoelastic body and damage to the strain-flexing portion can be prevented. Further, there is an effect that it is possible to expand the frequency range of the detectable acceleration by suppressing the displacement caused by the swing of the weight portion from being maximized with respect to the acceleration having a frequency near the resonance frequency.

【0020】請求項2の発明は、重り部と薄肉の起歪部
と起歪部によって重り部を揺動自在に支持する支持部と
を半導体基板を加工して一体に形成したセンサ部と、重
り部と対向させてセンサ部に配設され重り部が所定以上
に変位するのを規制するストッパ部と、ストッパ部と起
歪部との間に設けられた狭小な隙間に毛細管現象を利用
して流入され起歪部の表面に付設される粘弾性体とを備
えたので、ストッパ部及び粘弾性体によって起歪部の破
損を防止という効果と、検出できる加速度の周波数範囲
を拡大できるとともに、粘弾性体はストッパ部と起歪部
との間の隙間の寸法に合わせて付設されるために粘弾性
体の寸法ばらつきを減少させることができるという効果
がある。
According to a second aspect of the present invention, there is provided a sensor section in which a weight portion, a thin strain-generating portion, and a supporting portion for swingably supporting the weight portion by the strain-generating portion are integrally formed by processing a semiconductor substrate. Capillary phenomenon is used in the narrow gap provided between the stopper portion and the stopper portion, which is provided in the sensor portion so as to face the weight portion and restricts the displacement of the weight portion beyond a predetermined value, and the strain portion. Since it is provided with a viscoelastic body that is introduced and attached to the surface of the strain generating section, the effect of preventing damage to the strain generating section by the stopper section and the viscoelastic body and expanding the frequency range of detectable acceleration, Since the viscoelastic body is attached according to the size of the gap between the stopper portion and the strain generating portion, there is an effect that the dimensional variation of the viscoelastic body can be reduced.

【0021】請求項3の発明は、重り部と薄肉の起歪部
と起歪部によって重り部を揺動自在に支持する支持部と
を半導体基板を加工して一体に形成したセンサ部と、重
り部と対向させてセンサ部の表裏両面に配設され重り部
が所定以上に変位するのを規制するストッパ部と、スト
ッパ部が表裏両面に配設されたセンサ部が表面にボンデ
ィングされる基板と、基板表面にボンディングされたセ
ンサ部及びストッパ部を封止するとともにストッパ部と
起歪部との間に設けられた狭小な隙間に毛細管現象を利
用して流入され起歪部の表面に付設される粘弾性体とを
備えたので、起歪部の破損を防止し、検出できる加速度
の周波数範囲を拡大できるという効果だけでなく、セン
サ部及びストッパ部を封止する封止材を粘弾性体として
起歪部の表面に付設し、封止工程と同時に粘弾性体を付
設することが可能で製造工程を減少させることができる
という効果がある。
According to a third aspect of the present invention, there is provided a sensor section in which a weight portion, a thin strain-generating portion, and a support portion which swingably supports the weight portion by the strain-generating portion are integrally formed by processing a semiconductor substrate. A substrate on which the stopper portion is provided on both the front and back surfaces of the sensor portion so as to face the weight portion and restricts the weight portion from being displaced more than a predetermined amount, and the sensor portion with the stopper portion provided on the front and back surfaces is bonded to the surface. And seals the sensor part and the stopper part bonded to the surface of the substrate and attaches to the surface of the strain generating part by using the capillary phenomenon to flow into a narrow gap provided between the stopper part and the strain generating part. Since it has a viscoelastic body, it is possible to prevent damage to the strain-causing part and expand the frequency range of detectable acceleration. Attached to the surface of the strained part as a body And, there is an effect that it is possible that the reducing can manufacturing step of attaching a simultaneous viscoelastic body and sealing step.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1を示すセンサ部の平面断面図である。FIG. 1 is a cross-sectional plan view of a sensor unit according to a first embodiment.

【図2】同上を示すセンサ部の斜視図である。FIG. 2 is a perspective view of the sensor unit showing the same as above.

【図3】同上の検出加速度の周波数特性を示す図であ
る。
FIG. 3 is a diagram showing a frequency characteristic of detected acceleration in the above.

【図4】従来の半導体加速度センサの検出加速度の周波
数特性を示す図である。
FIG. 4 is a diagram showing frequency characteristics of acceleration detected by a conventional semiconductor acceleration sensor.

【図5】実施例2を示す平面断面図である。FIG. 5 is a plan sectional view showing a second embodiment.

【図6】同上のセンサ部とストッパ部との平面断面図で
ある。
FIG. 6 is a plan cross-sectional view of the sensor section and the stopper section of the above.

【図7】同上のストッパ部を示す平面図である。FIG. 7 is a plan view showing a stopper portion of the above.

【図8】別のストッパ部を示すものであり、(a)は全
体の平面図、(b)は接合前の要部を拡大した断面図、
(c)は接合後の要部を拡大した断面図である。
8A and 8B show another stopper portion, FIG. 8A is an overall plan view, and FIG. 8B is an enlarged cross-sectional view of a main portion before joining.
(C) is an enlarged cross-sectional view of a main part after joining.

【符号の説明】[Explanation of symbols]

1 センサ部 2 半導体基板 3 重り部 4 起歪部 5 外枠部 6 粘弾性体 1 sensor part 2 semiconductor substrate 3 weight part 4 strain generating part 5 outer frame part 6 viscoelastic body

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 重り部と、薄肉の起歪部と、起歪部によ
って重り部を揺動自在に支持する支持部とを半導体基板
を加工して一体に形成したセンサ部を備え、起歪部の表
裏面の少なくとも一方に粘弾性体を付設したことを特徴
とする半導体加速度センサ。
1. A strain sensor comprising a weight portion, a thin strain element, and a support portion integrally supporting a weight portion by the strain element to swingably support the weight portion. A semiconductor acceleration sensor having a viscoelastic body attached to at least one of the front and back surfaces of the section.
【請求項2】 重り部と薄肉の起歪部と起歪部によって
重り部を揺動自在に支持する支持部とを半導体基板を加
工して一体に形成したセンサ部と、重り部と対向させて
センサ部に配設され重り部が所定以上に変位するのを規
制するストッパ部と、ストッパ部と起歪部との間に設け
られた狭小な隙間に毛細管現象を利用して流入され起歪
部の表面に付設される粘弾性体とを備えて成ることを特
徴とする半導体加速度センサ。
2. A sensor portion integrally formed by processing a semiconductor substrate with a weight portion, a thin strain element and a support portion that swingably supports the weight portion by the strain element, and a sensor portion opposed to the weight portion. Strain sensor is installed in the sensor section to restrict the weight section from displacing more than a predetermined amount, and a narrow gap provided between the stopper section and the strain-flexing section flows into the narrow gap using the capillary phenomenon. A semiconductor acceleration sensor, comprising: a viscoelastic body attached to a surface of the portion.
【請求項3】 重り部と薄肉の起歪部と起歪部によって
重り部を揺動自在に支持する支持部とを半導体基板を加
工して一体に形成したセンサ部と、重り部と対向させて
センサ部の表裏両面に配設され重り部が所定以上に変位
するのを規制するストッパ部と、ストッパ部が表裏両面
に配設されたセンサ部が表面にボンディングされる基板
と、基板表面にボンディングされたセンサ部及びストッ
パ部を封止するとともにストッパ部と起歪部との間に設
けられた狭小な隙間に毛細管現象を利用して流入され起
歪部の表面に付設される粘弾性体とを備えて成ることを
特徴とする半導体加速度センサ。
3. A sensor portion integrally formed by processing a semiconductor substrate with a weight portion, a thin strain generating portion, and a supporting portion that swingably supports the weight portion by the strain generating portion, and a weight portion. On the front and back sides of the sensor unit to prevent the weight unit from displacing more than a predetermined amount, the substrate on which the sensor units with the stopper units disposed on the front and back sides are bonded to the surface, and the substrate surface. A viscoelastic body that seals the bonded sensor part and stopper part and flows into the narrow gap provided between the stopper part and the strain-flexing part by utilizing the capillary phenomenon and is attached to the surface of the strain-defining part. A semiconductor acceleration sensor, comprising:
JP23994293A 1993-09-27 1993-09-27 Semiconductor acceleration sensor Withdrawn JPH0792186A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23994293A JPH0792186A (en) 1993-09-27 1993-09-27 Semiconductor acceleration sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23994293A JPH0792186A (en) 1993-09-27 1993-09-27 Semiconductor acceleration sensor

Publications (1)

Publication Number Publication Date
JPH0792186A true JPH0792186A (en) 1995-04-07

Family

ID=17052117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23994293A Withdrawn JPH0792186A (en) 1993-09-27 1993-09-27 Semiconductor acceleration sensor

Country Status (1)

Country Link
JP (1) JPH0792186A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003001217A1 (en) * 2001-06-21 2003-01-03 Mitsubishi Denki Kabushiki Kaisha Acceleration sensor and method of manufacture thereof
JP2006177768A (en) * 2004-12-22 2006-07-06 Oki Electric Ind Co Ltd Acceleration sensor and its manufacturing method
JP2008049466A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device
JP2008049467A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device
JP2008049465A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003001217A1 (en) * 2001-06-21 2003-01-03 Mitsubishi Denki Kabushiki Kaisha Acceleration sensor and method of manufacture thereof
US6958529B2 (en) 2001-06-21 2005-10-25 Mitsubishi Denki Kabushiki Kaisha Acceleration sensor and method of manufacture thereof
JP2006177768A (en) * 2004-12-22 2006-07-06 Oki Electric Ind Co Ltd Acceleration sensor and its manufacturing method
JP4542885B2 (en) * 2004-12-22 2010-09-15 Okiセミコンダクタ株式会社 Acceleration sensor and manufacturing method thereof
JP2008049466A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device
JP2008049467A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device
JP2008049465A (en) * 2006-08-28 2008-03-06 Matsushita Electric Works Ltd Semiconductor device

Similar Documents

Publication Publication Date Title
JP3123477B2 (en) Mounting structure and mounting method of surface acoustic wave device
CN101765776B (en) Acceleration sensor
US20060055062A1 (en) Sensor device having stopper for limitting displacement
EP0504821A2 (en) Packaged semiconductor device having stress absorbing film
JPS6171649A (en) Ic package
JP2000058593A (en) Mounting structure of surface elastic wave element and mounting thereof
JP2004333133A (en) Inertial force sensor
JPH09199549A (en) Wire bonding method
JPH0792186A (en) Semiconductor acceleration sensor
JP2002098709A (en) Semiconductor acceleration sensor
JPH0623780B2 (en) Method of manufacturing semiconductor acceleration sensor
CN112448690B (en) Vibration device
JPH06291334A (en) Acceleration sensor
JP2002267684A (en) Semiconductor-type dynamic quantity sensor
JPH08160071A (en) Silicon accelerometer
JP3218302B2 (en) Capacitive acceleration sensor
JP5541208B2 (en) Mechanical quantity sensor
JPH06242141A (en) Semiconductor acceleration sensor
JP2615786B2 (en) Method of manufacturing acceleration sensor
JPH07280832A (en) Acceleration detector
JP5757174B2 (en) Sensor device and manufacturing method thereof
JP2010272548A (en) Device mounting module, and method for manufacturing the same
JP3265488B2 (en) Manufacturing method of force / moment detecting device
JP3170667B2 (en) Semiconductor acceleration sensor
JP2001153881A (en) Semiconductor acceleration sensor

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20001128