JPH0791152B6 - - Google Patents
Info
- Publication number
- JPH0791152B6 JPH0791152B6 JP1987216815A JP21681587A JPH0791152B6 JP H0791152 B6 JPH0791152 B6 JP H0791152B6 JP 1987216815 A JP1987216815 A JP 1987216815A JP 21681587 A JP21681587 A JP 21681587A JP H0791152 B6 JPH0791152 B6 JP H0791152B6
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62216815A JPH0791152B2 (ja) | 1987-08-31 | 1987-08-31 | 超伝導体薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62216815A JPH0791152B2 (ja) | 1987-08-31 | 1987-08-31 | 超伝導体薄膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPS6459729A JPS6459729A (en) | 1989-03-07 |
| JPH0791152B2 JPH0791152B2 (ja) | 1995-10-04 |
| JPH0791152B6 true JPH0791152B6 (enExample) | 2004-10-13 |
Family
ID=16694323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62216815A Expired - Fee Related JPH0791152B2 (ja) | 1987-08-31 | 1987-08-31 | 超伝導体薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0791152B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6677001B1 (en) * | 1986-11-10 | 2004-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Microwave enhanced CVD method and apparatus |
| JPH0672306B2 (ja) | 1987-04-27 | 1994-09-14 | 株式会社半導体エネルギー研究所 | プラズマ処理装置およびプラズマ処理方法 |
| EP0431160B1 (en) * | 1988-03-16 | 1995-05-17 | Kabushiki Kaisha Toshiba | Process for producing thin-film oxide superconductor |
| JP2527789B2 (ja) * | 1988-05-31 | 1996-08-28 | 株式会社フジクラ | 酸化物系超電導線材の製造方法 |
| KR930011413B1 (ko) * | 1990-09-25 | 1993-12-06 | 가부시키가이샤 한도오따이 에네루기 겐큐쇼 | 펄스형 전자파를 사용한 플라즈마 cvd 법 |
| CA2114028C (en) * | 1991-07-23 | 1998-04-28 | Mark Andrew Shackleton | Method and device for frame interpolation of a moving image |
| JP4637556B2 (ja) * | 2004-12-01 | 2011-02-23 | 株式会社アルバック | 成膜装置とこの成膜装置を含む複合型配線膜形成装置および薄膜製造方法 |
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1987
- 1987-08-31 JP JP62216815A patent/JPH0791152B2/ja not_active Expired - Fee Related