JPH0791049B2 - Polymer trichlorosilane conversion method in the production of polycrystalline silicon. - Google Patents

Polymer trichlorosilane conversion method in the production of polycrystalline silicon.

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Publication number
JPH0791049B2
JPH0791049B2 JP1134988A JP1134988A JPH0791049B2 JP H0791049 B2 JPH0791049 B2 JP H0791049B2 JP 1134988 A JP1134988 A JP 1134988A JP 1134988 A JP1134988 A JP 1134988A JP H0791049 B2 JPH0791049 B2 JP H0791049B2
Authority
JP
Japan
Prior art keywords
polymer
sihcl
polycrystalline silicon
production
sicl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1134988A
Other languages
Japanese (ja)
Other versions
JPH01188414A (en
Inventor
幸市 吉富
昭夫 大牟礼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUMITOMO SHICHITSUKUSU KK
Original Assignee
SUMITOMO SHICHITSUKUSU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUMITOMO SHICHITSUKUSU KK filed Critical SUMITOMO SHICHITSUKUSU KK
Priority to JP1134988A priority Critical patent/JPH0791049B2/en
Publication of JPH01188414A publication Critical patent/JPH01188414A/en
Publication of JPH0791049B2 publication Critical patent/JPH0791049B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、SiHC3(トリクロロシラン)を原料として多
結晶シリコンを製造する際に副生するボリマーをSiHCl3
の製造に活用するポリマーのトリクロロシランへの転化
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention [relates] is, SiHC 3 Borima the SiHCl 3 by-produced during the production of polycrystalline silicon (trichlorosilane) as a raw material
The present invention relates to a method of converting a polymer used in the production of trichlorosilane into trichlorosilane.

〔従来の技術〕[Conventional technology]

従来より、半導体製造用の多結晶シリコンは、ベルジャ
ー炉内で約1000〜1100℃に加熱保持されたシリコン芯棒
にSiHCl3とH2の混合ガスを接触させ、SiHCl3を第1式に
示す水素還元反応と通常は更に第2式に示す熱分解反応
とでSiに分解し、シリコン芯棒にSiを析出させることに
より製造される。
Conventionally, polycrystalline silicon for semiconductor manufacturing comprises contacting a mixed gas of SiHCl 3 and H 2 on the silicon seed rods which are heated and maintained at about 1000 to 1100 ° C. in a bell jar furnace showing the SiHCl 3 on the first equation It is produced by decomposing it into Si by a hydrogen reduction reaction and usually a thermal decomposition reaction shown in the second formula, and depositing Si on a silicon core rod.

SiHCl3+H2→Si+3HCl …(1) 4SiHCl3→Si+3SiCl4+2H …(2) このときの物質収支は、反応条件にもよるが、工業的に
は大概次のとおりである。
SiHCl 3 + H 2 → Si + 3HCl (1) 4SiHCl 3 → Si + 3SiCl 4 + 2H (2) The mass balance at this time is industrially roughly as follows, although it depends on the reaction conditions.

すなわち、ベルジャー炉内に送入したガス状のSiHCl3
らSiが生成される他、残余のSiHCl3が排出され、更にSi
H2Cl2、SiCl4、ポリマー等の副生物を生じ排出される。
That is, Si is generated from the gaseous SiHCl 3 fed into the bell jar furnace, the remaining SiHCl 3 is discharged, and Si
By-products such as H 2 Cl 2 , SiCl 4 and polymers are produced and discharged.

ベルジャー炉から排出される物質のうち、残余のSiHCl3
および副生物は液化して回収した後、蒸留してSiHCl3
SiH2Cl2を分離する。分離されたSiHCl3、SiH2Cl2は再度
Si析出反応にリサイクル使用される。残ったSiCl4とポ
リマーとからなる留分は、更に蒸留してSiCl4とポリマ
ーとに分離される。
Of the substances discharged from the bell jar furnace, the remaining SiHCl 3
And by-products are liquefied and recovered, then distilled to obtain SiHCl 3 ,
SiH 2 Cl 2 is separated. Separated SiHCl 3 and SiH 2 Cl 2
Recycled for Si deposition reaction. The remaining fraction consisting of SiCl 4 and the polymer is further distilled to be separated into SiCl 4 and the polymer.

SiCl4から分離されたポリマーはSi,H,Clからなるが定ま
った組成ではない。
The polymer separated from SiCl 4 consists of Si, H, and Cl, but the composition is not fixed.

そして、このポリマーは空気中で発火しやすく、その取
扱いに苦慮する物質であるので、従来はN2ガス等の不活
性ガス中で加水分解し、このとき生成するHClやH2を含
むゲル状物質を更にアルカリで中和して無害化するのが
通例となっている。
Since this polymer is a substance that easily ignites in the air and is difficult to handle, it is conventionally hydrolyzed in an inert gas such as N 2 gas, and at this time it is formed into a gel containing HCl and H 2. It is customary to further neutralize the substance with alkali to render it harmless.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

ところが、このポリマーの無害化処理に要する設備およ
び処理コストは相当に大きく、多結晶シリコンの製造コ
ストを上昇させる原因になっている。
However, the equipment and the treatment cost required for the detoxification treatment of the polymer are considerably large, which causes an increase in the production cost of polycrystalline silicon.

本発明は、SiHCl3より多結晶シリコンを製造する際に、
副生するポリマーをSiHCl3の製造原料として活用し、多
結晶シリコンの原料コストを低減させるとともに、ポリ
マーの無害化処理設備および処理コストを不要ならし
め、多結晶シリコンの製造コスト大巾低減を図るポリマ
ーのクロロシランへの転化方法を提供するものである。
The present invention, when producing polycrystalline silicon from SiHCl 3 ,
By utilizing the polymer produced as a by-product as a raw material for producing SiHCl 3 , the raw material cost of polycrystalline silicon is reduced, and at the same time, the detoxification processing equipment and processing cost of the polymer are unnecessary, and the production cost of polycrystalline silicon is greatly reduced. It is intended to provide a method of converting a polymer to chlorosilane.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者らは、SiHCl3をH2で還元して多結晶シリコンを
製造する際に副生ポリマーの取り扱いについて調査検討
した結果、次の知見を得た。
The present inventors have obtained the following findings as a result of investigating and handling the handling of a by-produced polymer when producing Si by reducing SiHCl 3 with H 2 .

ポリマーを不活性ガス中において約200℃で加熱すると
殆どがSiHCl3、SiCl4に分離し、残りは油状の物質とな
る。残った油状物質を更に300℃以上に加熱すると、SiC
l4、Si2Cl6等に分解し、最後にSiの微粉末を主成分とす
る赤茶色の固体が残ることが判明した。
When the polymer is heated at about 200 ° C. in an inert gas, most of it is separated into SiHCl 3 and SiCl 4 , and the rest becomes an oily substance. When the remaining oily substance is further heated to 300 ° C or higher, SiC
It was found that the substance decomposed into l 4 , Si 2 Cl 6, etc., and finally a reddish brown solid mainly composed of fine Si powder remained.

すなわち、ポリマーは熱分解によりSiHCl3、SiCl4、Si
等に分解されるのである。
That is, the polymer is thermally decomposed into SiHCl 3 , SiCl 4 , and Si.
And so on.

一方、SiHCl3をH2で還元して多結晶シリコンを製造する
際には、前述したようにポリマーの他にSiH2Cl2、SiCl4
等を副生する。このうちSiCl4はポリマーと分離された
後、主として微粉末シリカの製造原料として活用される
が、水素、金属シリコンとの反応によってトリクロロシ
ランに変成し、多結晶シリコンの製造原料として再使用
することも可能である。
On the other hand, when SiHCl 3 is reduced with H 2 to produce polycrystalline silicon, SiH 2 Cl 2 and SiCl 4 are used in addition to the polymer as described above.
And so on. Of these, SiCl 4 is mainly used as a raw material for the production of finely divided silica after being separated from the polymer, but it should be converted to trichlorosilane by the reaction with hydrogen and metallic silicon and reused as a raw material for the production of polycrystalline silicon. Is also possible.

すなわち、トリクロロシランの製造は粉末Siの充填層に
HClガスを吹き込み、粉末Siがガスによって浮遊流動す
る状態で行われる。そして、この流動層反応は通常300
℃前後で行われる関係からポリマーの熱分解が期待で
き、また流動層に酸素は存在しないことから、ポリマー
が発火する危険性もない。
In other words, the production of trichlorosilane can be achieved by using a packed bed of powder Si
HCl gas is blown in, and it is carried out in a state where powdered Si floats and flows by the gas. And this fluidized bed reaction is usually 300
The thermal decomposition of the polymer can be expected due to the fact that it is performed at around ℃, and since there is no oxygen in the fluidized bed, there is no risk of ignition of the polymer.

以上のことから、本発明者らは副生したポリマーを、Si
HCl3製造のための流動層に直接投入したところ、ポリマ
ーは発火せず、ポリマーがSiHCl3の製造原料として安全
に活用できることを知見した。
Based on the above, the present inventors
It was found that when injected directly into a fluidized bed for producing HCl 3 , the polymer did not ignite, and the polymer can be safely used as a raw material for producing SiHCl 3 .

本発明は斯かる知見に基づきなされたもので、SiHCl3
H2で還元して多結晶シリコンを製造する際に、副生する
Si、Cl、HからなるボリマーをSiHCl3製造のための反応
炉に送入し、SiHCl3の製造原料として使用することを特
徴とする多結晶シリコンの製造におけるポリマーのトリ
クロロシラン転化方法を要旨とする。
The present invention has been made based on such findings, the SiHCl 3
By-produced when producing polycrystalline silicon by reduction with H 2
Si, Cl, and fed a Borima consisting of H into the reactor for the SiHCl 3 production, and the gist of trichlorosilane conversion method of a polymer in the production of polycrystalline silicon, characterized by using as a raw material for producing SiHCl 3 To do.

〔作用〕[Action]

SiHCl3製造のための流動層に送入されたポリマーは、こ
こで熱分解してSiHCl3、SiCl4、Si等に分かれ、SiHCl3
を生成する。更にSiCl4、Si等も他の送入原料とともにS
iHCl3の生成に寄与する。
SiHCl 3 fed polymer in the fluidized bed for the manufacture is now pyrolyzed divided into SiHCl 3, SiCl 4, Si or the like, SiHCl 3
To generate. In addition, SiCl 4 , Si, etc., together with other feed materials,
Contributes to the production of iHCl 3 .

〔実施例〕〔Example〕

第1図により本発明の実施の態様を代表例について説明
する。
A typical example of the embodiment of the present invention will be described with reference to FIG.

トリクロロシランの製造は、上記の金属シリコンと塩化
水素の反応以外に金属シリコンとSiCl4とH2の混合ガス
による変成反応によって製造することができる。
Trichlorosilane can be produced by a transformation reaction using a mixed gas of metallic silicon, SiCl 4 and H 2 in addition to the above reaction of metallic silicon and hydrogen chloride.

SiCl4は液体の状態で蒸発器1にH2ガスとともに送入さ
れ、150℃に加熱され気化して流動反応容器2に送られ
る。
SiCl 4 is sent in a liquid state to the evaporator 1 together with H 2 gas, heated to 150 ° C., vaporized, and sent to the fluidized reactor 2.

流動反応容器2は分散板3とヒータ4とを備え、分散板
3の上部に粒径が50〜500μm程度の工業用シリコン5
が充填されている。
The fluidized reaction vessel 2 includes a dispersion plate 3 and a heater 4, and an industrial silicon 5 having a particle size of about 50 to 500 μm is provided on the dispersion plate 3.
Is filled.

流動反応容器2に送られたSiCl4とH2の混合ガスは、分
散板3を通してSi充填層に下部より流入し、ヒータ4に
より500〜600℃に加熱される、Si充填層に下部より流入
した上記混合ガスは、泡となってSi充填層5を上昇し、
Si粉を浮遊流動させ、この間に第3式に示される反応に
よりSiHCl3を生成する。
The mixed gas of SiCl 4 and H 2 sent to the fluidized reaction vessel 2 flows into the Si packed bed from the bottom through the dispersion plate 3 and is heated to 500 to 600 ° C. by the heater 4 and flows into the Si packed bed from the bottom. The mixed gas thus formed becomes bubbles and rises in the Si filling layer 5,
The Si powder is allowed to flow in a floating manner, and SiHCl 3 is produced by the reaction shown in the third formula during this period.

3SiCl4+Si+2H2→4SiHCl3 …(3) 流動層には、多結晶シリコン製造の際にSiCl4とともに
生じたポリマーがポンプ6により加圧されて層下部より
装入される。流動層に送入されたポリマーは、層内の雰
囲気温度である500〜600℃に加熱され、SiHCl3、SiC
l4、Siに分解する。
3SiCl 4 + Si + 2H 2 → 4SiHCl 3 (3) The polymer generated together with SiCl 4 during the production of polycrystalline silicon is pressurized by the pump 6 and charged into the fluidized bed from the bottom of the bed. The polymer fed into the fluidized bed is heated to 500 to 600 ° C., which is the ambient temperature in the bed, and is heated to SiHCl 3 , SiC.
Decomposes into l 4 , Si.

このうちSiHCl3はそのまま流動層を上昇し、SiCl4およ
びSiは流動層を上昇する間に、第3式に示される反応に
よりSiHCl3を生成する。
Of these, SiHCl 3 rises in the fluidized bed as it is, and SiCl 4 and Si produce SiHCl 3 by the reaction shown in the third formula while rising in the fluidized bed.

生成したSiHCl3は、流動反応容器2上部より外部に排出
され、凝縮、蒸溜後、多結晶シリコン製造に製造原料と
して供される。
The produced SiHCl 3 is discharged to the outside from the upper part of the fluid reaction vessel 2, condensed and distilled, and then used as a raw material for producing polycrystalline silicon.

半導体製造用の多結晶シリコンを1トン製造するのに70
〜100kgのポリマーを生じ、従来はこれを無害化処理し
て廃棄していたが、本発明ではこのポリマー中のSi分が
SiHCl3に転化し、更に多結晶シリコンに転化することに
なり、無害化処理も不必要となる。
70 to produce 1 ton of polycrystalline silicon for semiconductor manufacturing
~ 100 kg of polymer was produced, which was conventionally detoxified and discarded, but in the present invention, the Si content in this polymer is
It is converted to SiHCl 3 and further to polycrystalline silicon, so that detoxification treatment is unnecessary.

〔発明の効果〕〔The invention's effect〕

以上の説明から明らかなように、本発明は多結晶シリコ
ンを製造する際に副生するポリマーをSiHCl3に転化し、
更にこのSiHCl3を経て多結晶シリコンに転化させ得るの
で、多結晶シリコン製造原料の有効利用が図られ、更に
従来必要とされていたポリマーの無害化処理も不用とな
り、これらの両面から多結晶シリコンの製造コストを著
しく低下させるものである。
As is clear from the above description, the present invention converts the polymer by-produced during the production of polycrystalline silicon into SiHCl 3 ,
Furthermore, since it can be converted into polycrystalline silicon through SiHCl 3 , the polycrystalline silicon manufacturing raw material can be effectively used, and the detoxification treatment of the polymer, which has been conventionally required, becomes unnecessary. It significantly reduces the manufacturing cost.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の実施の態様を例示する模式図である。 図中、1:蒸発器、2:流動反応容器、3:分散板、4:ヒー
タ、5:シリコン(流動層)。
FIG. 1 is a schematic view illustrating an embodiment of the present invention. In the figure, 1: evaporator, 2: fluid reaction vessel, 3: dispersion plate, 4: heater, 5: silicon (fluidized bed).

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】SiHCl3をH2で還元して多結晶シリコンを製
造する際に、副生するSi、Cl、HからなるボリマーをSi
HCl3製造のための反応炉に送入し、SiHCl3の製造原料と
て使用することを特徴とする多結晶シリコンの製造にお
けるポリマーのトリクロロシラン転化方法。
Claim: What is claimed is: 1. When a SiCl 3 is reduced with H 2 to produce polycrystalline silicon, a by-product of a polymer of Si, Cl and H is converted into Si.
A method for converting a polymer into trichlorosilane in the production of polycrystalline silicon, which comprises feeding into a reaction furnace for producing HCl 3 and using it as a raw material for producing SiHCl 3 .
JP1134988A 1988-01-21 1988-01-21 Polymer trichlorosilane conversion method in the production of polycrystalline silicon. Expired - Lifetime JPH0791049B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1134988A JPH0791049B2 (en) 1988-01-21 1988-01-21 Polymer trichlorosilane conversion method in the production of polycrystalline silicon.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1134988A JPH0791049B2 (en) 1988-01-21 1988-01-21 Polymer trichlorosilane conversion method in the production of polycrystalline silicon.

Publications (2)

Publication Number Publication Date
JPH01188414A JPH01188414A (en) 1989-07-27
JPH0791049B2 true JPH0791049B2 (en) 1995-10-04

Family

ID=11775563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1134988A Expired - Lifetime JPH0791049B2 (en) 1988-01-21 1988-01-21 Polymer trichlorosilane conversion method in the production of polycrystalline silicon.

Country Status (1)

Country Link
JP (1) JPH0791049B2 (en)

Cited By (1)

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JP2009280457A (en) * 2008-05-23 2009-12-03 Mitsubishi Materials Corp Method and apparatus for manufacturing polycrystalline silicon

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Publication number Priority date Publication date Assignee Title
US7033561B2 (en) 2001-06-08 2006-04-25 Dow Corning Corporation Process for preparation of polycrystalline silicon
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
DE102006009953A1 (en) 2006-03-03 2007-09-06 Wacker Chemie Ag Process for the recycling of high-boiling compounds within a chlorosilane composite
DE102006009954A1 (en) 2006-03-03 2007-09-06 Wacker Chemie Ag Recycling of high-boiling compounds within a chlorosilane composite
DE102008000052A1 (en) 2008-01-14 2009-07-16 Wacker Chemie Ag Method of depositing polycrystalline silicon
KR101573933B1 (en) 2008-02-29 2015-12-02 미쓰비시 마테리알 가부시키가이샤 Method and apparatus for manufacturing trichlorosilane
JP5316290B2 (en) * 2008-08-05 2013-10-16 三菱マテリアル株式会社 Trichlorosilane production apparatus and production method
JP5316291B2 (en) 2008-08-05 2013-10-16 三菱マテリアル株式会社 Trichlorosilane production apparatus and production method
JP5321314B2 (en) * 2009-07-23 2013-10-23 三菱マテリアル株式会社 Method and apparatus for decomposing chlorosilane polymer
JP5630412B2 (en) * 2010-09-28 2014-11-26 三菱マテリアル株式会社 Trichlorosilane production apparatus and production method
DE102010043648A1 (en) * 2010-11-09 2012-05-10 Evonik Degussa Gmbh Process for the selective cleavage of higher silanes
CN110078080B (en) * 2019-04-26 2022-09-02 天津科技大学 Chlorosilane high-boiling-point substance recovery process combining slag slurry treatment and cracking reaction

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009280457A (en) * 2008-05-23 2009-12-03 Mitsubishi Materials Corp Method and apparatus for manufacturing polycrystalline silicon

Also Published As

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JPH01188414A (en) 1989-07-27

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