JPH0787898B2 - UV treatment device - Google Patents

UV treatment device

Info

Publication number
JPH0787898B2
JPH0787898B2 JP16340590A JP16340590A JPH0787898B2 JP H0787898 B2 JPH0787898 B2 JP H0787898B2 JP 16340590 A JP16340590 A JP 16340590A JP 16340590 A JP16340590 A JP 16340590A JP H0787898 B2 JPH0787898 B2 JP H0787898B2
Authority
JP
Japan
Prior art keywords
exhaust
irradiation chamber
lamp
ozone
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16340590A
Other languages
Japanese (ja)
Other versions
JPH0459040A (en
Inventor
弘実 坂元
弘 川田
博昭 壬生
Original Assignee
日本電池株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電池株式会社 filed Critical 日本電池株式会社
Priority to JP16340590A priority Critical patent/JPH0787898B2/en
Publication of JPH0459040A publication Critical patent/JPH0459040A/en
Publication of JPH0787898B2 publication Critical patent/JPH0787898B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Coating Apparatus (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は紫外線と紫外線により発生するオゾンとによ
り、ガラス,金属,プラスチック等の固体表面を処理す
る紫外線処理装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet treatment apparatus for treating a solid surface such as glass, metal or plastic with ultraviolet rays and ozone generated by the ultraviolet rays.

従来の技術とその課題 近年、紫外線ランプを用いて有機汚染物を分解・除去す
る光洗浄や、ガラス・樹脂表面に紫外線を照射して、そ
の表面を改質してコーティングの際のぬれ性改善や、蒸
着膜の密着改善ができる技術が実用化されてきた。この
紫外線を利用した表面処理は洗浄効果が高いことから、
半導体や液晶表示装置の製造分野で有効な利用が期待さ
れている。
Conventional technology and its problems In recent years, optical cleaning that decomposes and removes organic contaminants using an ultraviolet lamp, and irradiation of ultraviolet rays on the glass / resin surface to modify the surface to improve wettability during coating In addition, a technique that can improve the adhesion of the deposited film has been put into practical use. Since this surface treatment using ultraviolet rays has a high cleaning effect,
It is expected to be effectively used in the field of manufacturing semiconductors and liquid crystal display devices.

これらに用いられるランプは185nmと254nmを主とした波
長の紫外線を放射し、この185nm紫外線は空気中の酸素
をオゾンに変化させるため、多量のオゾンが発生する。
この185nm,254nmの紫外線とオゾンが被照射体表面に作
用して光洗浄や表面改質の効果をもたらすものである。
The lamps used for these emit ultraviolet rays having wavelengths mainly at 185 nm and 254 nm, and the 185 nm ultraviolet rays change oxygen in the air into ozone, so a large amount of ozone is generated.
The 185 nm and 254 nm ultraviolet rays and ozone act on the surface of the irradiated object to bring about the effects of photocleaning and surface modification.

すなわち、185nmの紫外線が有機物の化学結合を切断
し、254nmの紫外線はオゾンに作用して活性化の酸素原
子を作り、切断された有機物と化学反応し、ガス状物質
に変化させたり、新規な表面層を形成したりするといわ
れている。
That is, the 185 nm ultraviolet ray cuts the chemical bond of the organic substance, the 254 nm ultraviolet ray acts on ozone to make an activating oxygen atom, chemically reacts with the cut organic substance, and changes into a gaseous substance, It is said to form a surface layer.

紫外線を利用した表面処理は、紫外線照射により発生す
るオゾンを利用するので、オゾン濃度が高い方が処理効
率が上がる傾向にある。しかしオゾンは人体に対して有
害であり、労働安全衛生基準では作業環境雰囲気として
のオゾン濃度を一定値以下にするように規定されてい
る。
Since the surface treatment using ultraviolet rays uses ozone generated by the irradiation of ultraviolet rays, the treatment efficiency tends to increase as the ozone concentration increases. However, ozone is harmful to the human body, and the occupational safety and health standards stipulate that the ozone concentration as a working environment atmosphere be kept below a certain value.

遠紫外線処理装置では排気量を一定とした場合、照射室
のオゾン濃度をできるだけ高くし、外部へ漏れないよう
にするには若干負圧状態にするのが好ましいが、処理後
被処理物を取り出すための照射室内のオゾンの排出時間
がかかりすぎて生産性が悪い。逆に排気量を大幅に増加
しておくと、排気時間は短いがオゾン濃度が低くなりす
ぎたり照射室の圧力が低くなりすぎて照射室が内外の圧
力差によって変形する場合がある。
In the far-ultraviolet treatment device, when the exhaust volume is constant, it is preferable to make the ozone concentration in the irradiation chamber as high as possible and to make it slightly negative pressure so that it does not leak to the outside. Therefore, it takes too much time to discharge ozone from the irradiation chamber, resulting in poor productivity. On the contrary, if the exhaust amount is increased significantly, the exhaust time may be short, but the ozone concentration may be too low or the pressure in the irradiation chamber may be too low, and the irradiation chamber may be deformed due to the pressure difference between the inside and outside.

課題を解決するための手段 本発明はこれら相反する課題を解決すべく工夫したもの
である。すなわち本発明は、照射室と排気室を備えた紫
外線処理装置において、該照射室に排気口と一定圧力以
下で動作するリリースバルブを設け、該排気口は排気ダ
クトを介してオゾンガス分解フィルタ,強制排気用ブロ
ワ,排気量調整用ダンパより構成された排気装置に接続
されており、該排気量調整用ダンパは被処理物をランプ
で照射中は閉状態となり、照射完了または装置の異常で
ランプ消灯後は開状態として排気量を増加させるように
構成され、該排気量調整用ダンパが開・閉いずれの状態
の場合でも照射室内のガス圧が大気圧より低く、かつリ
リースバルブの設定動作圧より高くなるように調整され
ていることを特徴とするものである。
Means for Solving the Problems The present invention has been devised to solve these conflicting problems. That is, the present invention provides an ultraviolet ray treatment apparatus including an irradiation chamber and an exhaust chamber, the irradiation chamber being provided with an exhaust port and a release valve which operates at a constant pressure or less, and the exhaust port is provided with an ozone gas decomposition filter, a forced gas through an exhaust duct. It is connected to an exhaust device consisting of an exhaust blower and an exhaust amount adjustment damper. The exhaust amount adjustment damper is in a closed state while the workpiece is being irradiated with the lamp, and the lamp is turned off when the irradiation is completed or the device is abnormal. After that, it is configured to increase the exhaust amount by opening it, and the gas pressure in the irradiation chamber is lower than the atmospheric pressure and more than the set operating pressure of the release valve regardless of whether the damper for adjusting the exhaust amount is open or closed. It is characterized by being adjusted to be higher.

作用 照射室はガス給気口と排気口とリリースバルブが設けら
れ、それ以外はオゾンが外部に漏れないように密閉構造
となっていて、排気装置はオゾン分解フィルタとダンパ
とブロワから構成されている。ランプ点灯中は照射室内
が若干負圧状態になるように給気・排気を調整され、ラ
ンプ消灯後はダンパが閉から開状態に動作し照射室の排
気量を点灯中より増加させ、ランプで発生したオゾンガ
スを分解フィルタを通して短時間に排出させるとともに
一定圧力で動作するリリースバルブにより圧力差で照射
室が変形しないようになっている。
The irradiation chamber has a gas supply port, an exhaust port, and a release valve.Other than that, it has a closed structure to prevent ozone from leaking to the outside, and the exhaust system consists of an ozone decomposition filter, a damper, and a blower. There is. When the lamp is on, the air supply and exhaust are adjusted so that the irradiation chamber is in a slightly negative pressure state.After the lamp is turned off, the damper operates from the closed state to the open state, increasing the exhaust volume of the irradiation chamber from that during the lamp is turned on. The generated ozone gas is discharged through the decomposition filter in a short time, and a release valve that operates at a constant pressure prevents the irradiation chamber from being deformed due to the pressure difference.

実施例 以下、本発明を好適な実施例を用いて説明する。Examples Hereinafter, the present invention will be described using preferred examples.

第1図は本発明の一実施例を示す断面図である。処理装
置は照射室Aと電源・排気室Bとから構成されている。
照射室内では約400Wのランプ電力で主として波長が185n
m及び254nmの紫外線を放射する合成石英製の低圧水銀ラ
ンプ1が配設され、被処理物2を片面から照射して処理
する。照射室Aには、清浄なエア等のガスを供給する給
気口3と、処理したガスを排出する排気口4及び照射室
内が一定圧力以下になると自動的に開放状態となり外部
の空気を導入するリリースバルブ9が設けられている。
FIG. 1 is a sectional view showing an embodiment of the present invention. The processing apparatus is composed of an irradiation chamber A and a power supply / exhaust chamber B.
In the irradiation room, the wavelength is 185n mainly with a lamp power of about 400W.
A low-pressure mercury lamp 1 made of synthetic quartz, which radiates ultraviolet rays of m and 254 nm, is disposed, and an object 2 to be processed is irradiated from one side for processing. In the irradiation chamber A, an air supply port 3 for supplying a gas such as clean air, an exhaust port 4 for discharging the processed gas and an irradiation chamber are automatically opened when the pressure in the irradiation chamber becomes a certain pressure or less, and external air is introduced. A release valve 9 is provided.

排気口4は排気ダクロ5を介してオゾンガス分解フィル
タ6,強制排気用ブロワ7,排気量調整用ダンパ8よりなる
排気装置に接続されている。
The exhaust port 4 is connected via an exhaust duct 5 to an exhaust device including an ozone gas decomposition filter 6, a forced exhaust blower 7, and an exhaust amount adjusting damper 8.

ランプ1は、ランプを点灯するための安定器と各種の制
御部から構成された電源装置10に接続されている。
The lamp 1 is connected to a power supply device 10 including a ballast for lighting the lamp and various control units.

処理装置が正常運転でランプ点灯中は、給気口3からは
一定量のガスを供給しつつ照射室内のガス圧が、大気圧
より若干負状態に成るように排気用ダンパ8を調節す
る。これにより照射室のオゾンは約500ppmと高濃度に維
持され、外部へオゾンが漏れないようになる。被処理物
の照射が完了したりランプ不点、扉開放,漏水等の装置
上の異常でランプ消灯した後は、排気用ダンパ8が全開
状態となり、排気量は正常時の時よりも大幅に増大す
る。このとき照射室内のガス圧力が一定地以下に減少す
るとリリースバルブも動作し、外部空気が導入され、減
圧で照射室が変形しないようにすると同時に照射室内で
発生した約500ppmのオゾン濃度を2〜3分で0ppmになる
まで排出でき、照射室の扉を短時間に開くことができ
た。これにより、排気量を一定とした従来の装置では5
〜10分かかっていた場合に比較して大幅に時間短縮され
生産性を高めることができる。
While the processing device is operating normally and the lamp is lit, the exhaust damper 8 is adjusted so that the gas pressure in the irradiation chamber becomes slightly negative than the atmospheric pressure while supplying a constant amount of gas from the air supply port 3. As a result, ozone in the irradiation chamber is maintained at a high concentration of about 500 ppm, and ozone will not leak outside. After the irradiation of the object to be processed is completed or the lamp is turned off due to an abnormality on the device such as a lamp defect, door opening, or water leakage, the exhaust damper 8 is in a fully opened state, and the exhaust volume is significantly larger than in the normal state. Increase. At this time, when the gas pressure in the irradiation chamber decreases below a certain level, the release valve also operates and external air is introduced to prevent the irradiation chamber from being deformed by depressurization, and at the same time, the ozone concentration of about 500 ppm generated in the irradiation chamber is 2 to It was possible to discharge to 0ppm in 3 minutes, and the irradiation chamber door could be opened in a short time. As a result, the conventional device with a constant displacement has a 5
Compared to the case where it took ~ 10 minutes, the time can be greatly shortened and productivity can be improved.

発明の効果 以上述べたように、本発明の紫外線処理装置はランプ点
灯中に装置内の高い濃度のオゾンを保持して同時にオゾ
ン漏れを防止し、ランプ消灯後装置の変形なしに装置内
のオゾンガスを迅速に排出することができ、人体に対す
る安全性と生産性を高めることができる。
EFFECTS OF THE INVENTION As described above, the ultraviolet treatment apparatus of the present invention holds high concentration ozone in the device while the lamp is lit and at the same time prevents ozone leakage, and after the lamp is turned off, the ozone gas in the device is not deformed without deformation of the device. Can be quickly discharged, and safety and productivity for the human body can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例を示す断面図である。 A……照射室,B……電源・排気室 1……ランプ,2……被処理物,3……給気口 4……排気口,5……排気ダクト, 6……オゾン分解フィルタ 7……強制排気用ブロワ 8……排気量調整用ダンパ,9……リリースバルブ FIG. 1 is a sectional view showing an embodiment of the present invention. A ... Irradiation chamber, B ... Power supply / exhaust chamber 1 ... Lamp, 2 ... Object to be treated, 3 ... Air inlet 4 ... Exhaust port, 5 ... Exhaust duct, 6 ... Ozone decomposition filter 7 ...... Forced exhaust blower 8 …… Displacement adjustment damper, 9 …… Release valve

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C23G 5/00 9352−4K ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location C23G 5/00 9352-4K

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】照射室と排気室を備えた紫外線処理装置に
おいて、 該照射室に排気口と一定圧力以下で動作するリリースバ
ルブを設け、 該排気口は排気ダクトを介してオゾンガス分解フィル
タ,強制排気用ブロワ,排気量調整用ダンパより構成さ
れた排気装置に接続されており、 該排気量調整用ダンパは被処理物をランプで照射中は閉
状態となり、照射完了または装置の異常でランプ消灯後
は開状態として排気量を増加させるように構成され、 該排気量調整用ダンパが開・閉いずれの状態の場合でも
照射室内のガス圧が大気圧より低く、かつリリースバル
ブの設定動作圧より高くなるように調整されていること
を特徴とする紫外線処理装置。
1. An ultraviolet treatment apparatus comprising an irradiation chamber and an exhaust chamber, wherein the irradiation chamber is provided with an exhaust port and a release valve which operates at a constant pressure or less, and the exhaust port is provided with an ozone gas decomposing filter and a forced gas through an exhaust duct. It is connected to an exhaust device consisting of an exhaust blower and an exhaust amount adjusting damper. The exhaust amount adjusting damper is in a closed state while the workpiece is being irradiated with the lamp, and the lamp is turned off when the irradiation is completed or the device is abnormal. After that, it is configured to increase the exhaust amount by opening it, and the gas pressure in the irradiation chamber is lower than the atmospheric pressure and is lower than the set operating pressure of the release valve regardless of whether the damper for adjusting the exhaust amount is open or closed. An ultraviolet treatment device characterized by being adjusted to be higher.
JP16340590A 1990-06-21 1990-06-21 UV treatment device Expired - Lifetime JPH0787898B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16340590A JPH0787898B2 (en) 1990-06-21 1990-06-21 UV treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16340590A JPH0787898B2 (en) 1990-06-21 1990-06-21 UV treatment device

Publications (2)

Publication Number Publication Date
JPH0459040A JPH0459040A (en) 1992-02-25
JPH0787898B2 true JPH0787898B2 (en) 1995-09-27

Family

ID=15773271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16340590A Expired - Lifetime JPH0787898B2 (en) 1990-06-21 1990-06-21 UV treatment device

Country Status (1)

Country Link
JP (1) JPH0787898B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7399007B2 (en) * 2020-03-26 2023-12-15 株式会社オーク製作所 Ozone generator and discharge lamp equipment

Also Published As

Publication number Publication date
JPH0459040A (en) 1992-02-25

Similar Documents

Publication Publication Date Title
JP6453572B2 (en) UV irradiation equipment
JP2020185103A (en) Method of maintaining sterile environment of operation room, sterile environment maintenance device
JPH0787898B2 (en) UV treatment device
JP4640421B2 (en) UV irradiation equipment
JPS60129136A (en) Irradiating apparatus of ultraviolet rays
US10834846B2 (en) Ultraviolet ray treatment apparatus
TW200306461A (en) Method and device for decontaminating optical surfaces
TWI603775B (en) Chlorine dioxide gas processing structure, chlorine dioxide gas processing device, sterilization device, and environmental purification device
JP4258355B2 (en) Decomposition treatment equipment for ethylene oxide
JP2005138075A (en) Ethylene oxide decomposition processing method and decomposition processing apparatus
TW202100913A (en) Air purifier and purifying method
JP2000066003A (en) Method for cleaning optical parts
JPH0787900B2 (en) UV treatment device
WO2024024287A1 (en) Gas treatment method and gas treatment system
JP2632796B2 (en) Resist treatment method
JP2004163055A (en) Sterilizing gas decomposing/removing device
JP2805818B2 (en) Exhaust structure in cleaning equipment
CN208032322U (en) A kind of ultraviolet catalytic organics removal equipment
JPH0447957Y2 (en)
CN220665103U (en) Deodorization device of integrated sewage treatment equipment
KR102437543B1 (en) Ethylene removal device with no ozone remaining and Ethylene removal Method using the same
JP2004267951A (en) Cleaning device and cleaning method
JPH07308567A (en) Washing method and washing device for vessel
JP2000233129A (en) Treater for ultraviolet radiation
CN111920985A (en) Deep-sterilization biological safety cabinet and sterilization method thereof