JPH0770362A - Conductive paste composition, boron-coated silver powder used in said composition and production of said powder - Google Patents

Conductive paste composition, boron-coated silver powder used in said composition and production of said powder

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Publication number
JPH0770362A
JPH0770362A JP24626593A JP24626593A JPH0770362A JP H0770362 A JPH0770362 A JP H0770362A JP 24626593 A JP24626593 A JP 24626593A JP 24626593 A JP24626593 A JP 24626593A JP H0770362 A JPH0770362 A JP H0770362A
Authority
JP
Japan
Prior art keywords
boron
silver powder
weight
powder
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24626593A
Other languages
Japanese (ja)
Other versions
JP2636698B2 (en
Inventor
Isao Takada
功 高田
Akito Ishikawa
明人 石川
Noboru Konishi
昇 小西
Fujio Makuta
富士雄 幕田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP24626593A priority Critical patent/JP2636698B2/en
Publication of JPH0770362A publication Critical patent/JPH0770362A/en
Application granted granted Critical
Publication of JP2636698B2 publication Critical patent/JP2636698B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To provide a conductive paste composition capable of forming an electrode having firm adhesion to the substrate and to provide a conductive paste composition which forms an electrode, does not cause the resistance ele ment to crack on the part near to the joint between the resistance element and the primary electrode, and does net suffer from the exudation of the glass from the resistance element to the electrode during firing. CONSTITUTION:The composition is one containing a silver powder coated with 0.01-0.1wt.% (in terms of the boron atoms) at least one member selected from among diboron trioxide, alkali metal and ammonium salts of boric acid, an alkali metal salt of boron hydride and a carborane as the conductive component. A conductive paste composition comprising 73-79 pts.wt. silver powder, 0.5-2 pts.wt. palladium powder, 0.1-1.1 pts.wt. glass frit and 0.3-1.1 pts.wt. copper powder and/or copper oxide powder, the silver powder comprising 22-51 pts.wt. the coated silver powder and the balance of flaky silver powder, and the yield temperature of said glass frit being 450-600 deg.C, and fired together with a paste composition for forming a resistance element.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は主として厚膜チップ抵抗
器の電極を形成するための導電ペースト組成物、及び導
電ペースト組成物に導電成分として用いる銀粉、並びに
銀粉の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention mainly relates to a conductive paste composition for forming an electrode of a thick film chip resistor, silver powder used as a conductive component in the conductive paste composition, and a method for producing silver powder.

【0002】[0002]

【従来の技術】電子工業で用いられている厚膜チップ抵
抗器を製造するには、まず、アルミナ基板上に、銀−パ
ラジウムを導電成分とする電極形成用の導電ペースト組
成物を印刷し、その上に酸化ルテニウムとガラスフリッ
トを含む抵抗体用ペースト組成物を印刷し、空気中で約
850℃で同時に焼成して一次電極と抵抗体を形成す
る。次にガラスペーストを抵抗体上面に印刷し乾燥して
空気中で約600℃で焼成し、次いでレーザートリミン
グ装置等により抵抗値を調整した後、再び抵抗体上にガ
ラスペーストを印刷、乾燥して空気中で約500〜60
0℃で焼成する。
2. Description of the Related Art In order to manufacture a thick film chip resistor used in the electronics industry, first, a conductive paste composition for forming an electrode containing silver-palladium as a conductive component is printed on an alumina substrate, A resistor paste composition containing ruthenium oxide and glass frit is printed thereon and simultaneously fired in air at about 850 ° C. to form a primary electrode and a resistor. Next, the glass paste is printed on the upper surface of the resistor, dried, and fired at about 600 ° C. in the air. Then, after adjusting the resistance value with a laser trimming device or the like, the glass paste is printed again on the resistor and dried. About 500-60 in air
Bake at 0 ° C.

【0003】焼成後のアルミナ基板を小さなチップに切
断し、ディッピング法によって側面に銀−パラジウムペ
ーストを塗布し乾燥して空気中で約500〜600℃で
焼成して二次電極を形成する。最後にチップ抵抗体をプ
リント基板に半田付けする時に一次電極及び二次電極が
半田に侵食されないように露出部にニッケルめっきを施
してチップ抵抗器が作られる。
After firing, the alumina substrate is cut into small chips, a side surface is coated with a silver-palladium paste by a dipping method, dried, and fired in air at about 500 to 600 ° C. to form a secondary electrode. Finally, when the chip resistor is soldered to the printed circuit board, nickel plating is applied to the exposed portion so that the primary electrode and the secondary electrode are not corroded by the solder, and the chip resistor is manufactured.

【0004】しかし、前記の製造方法において次のよう
な問題があった。抵抗体と一次電極の接合部付近の抵抗
体に、焼成時の熱収縮の差により、クラックが発生し抵
抗体の抵抗値にバラツキが生じたり電流ノイズ特性が悪
化する。また、抵抗体ペーストと導電ペーストが焼成中
に反応を起こし、抵抗体と電極との接触部に発泡を生じ
て経時安定性が悪化したり、焼成中に抵抗体中のガラス
が電極中に滲出して抵抗値のバラツキが生じたりめっき
付き性が悪化したりする。その外、一般の厚膜導電ペー
スト組成物において基板と電極との密着強さの更なる向
上が要望されている。
However, the above manufacturing method has the following problems. A crack occurs in the resistor near the junction between the resistor and the primary electrode due to the difference in heat shrinkage during firing, and the resistance value of the resistor varies and the current noise characteristic deteriorates. In addition, the resistor paste and the conductive paste react during firing, resulting in foaming at the contact area between the resistor and the electrode, which deteriorates stability over time, and the glass in the resistor seeps into the electrode during firing. As a result, variations in resistance value may occur or the plating property may deteriorate. In addition, there is a demand for further improvement of the adhesion strength between the substrate and the electrode in a general thick film conductive paste composition.

【0005】[0005]

【発明が解決しようとする課題】本発明は基板と電極と
の密着強さに優れ、抵抗体と一次電極の接合部付近の抵
抗体にクラックが発生せず、焼成中に抵抗体中のガラス
が電極中に滲出しない電極形成用の導電ペースト組成
物、並びにこの導電ペースト組成物の導電成分として用
いるホウ素被覆銀粉及びその製造方法を提供することを
課題とする。
DISCLOSURE OF THE INVENTION The present invention is excellent in the adhesion strength between a substrate and an electrode, does not cause cracks in the resistor near the junction between the resistor and the primary electrode, and the glass in the resistor during firing. It is an object of the present invention to provide a conductive paste composition for forming an electrode, which does not leach into an electrode, a boron-coated silver powder used as a conductive component of this conductive paste composition, and a method for producing the same.

【0006】[0006]

【課題を解決するための手段】本発明による課題を解決
するための手段は、(1)三酸化二ホウ素、ホウ酸のアル
カリ金属及びアンモニウム塩、水素化ホウ素のアルカリ
金属塩、カルボランの内の一種が、ホウ素として0.0
1〜0.1重量%被覆されているホウ素被覆銀粉を導電
成分として含有する導電ペースト組成物にある。
Means for solving the problems of the present invention include (1) diboron trioxide, alkali metal and ammonium salts of boric acid, alkali metal salts of borohydride, and carborane. One is 0.0 as boron
A conductive paste composition containing a boron-coated silver powder coated as 1 to 0.1% by weight as a conductive component.

【0007】本発明は、また、(2)固形分として、銀粉
73〜79重量部と、パラジウム粉が0.5〜2重量部
と、ガラスフリットが0.1〜1.1重量部と、無機結合
剤としての銅粉及び又は酸化銅粉0.3〜1.1重量部の
割合で含み、銀粉の内三酸化二ホウ素、ホウ酸のアルカ
リ金属及びアンモニウム塩、水素化ホウ素のアルカリ金
属塩、カルボランの内の一種が、ホウ素として0.01
〜0.1重量%被覆されているホウ素被覆銀粉22〜5
1重量部、残りフレーク状銀粉からなり、ガラスフリッ
トの屈服温度が450〜600℃で抵抗体用ペースト組
成物と同時に焼成する導電ペースト組成物にある。
The present invention also provides (2) as solids, 73 to 79 parts by weight of silver powder, 0.5 to 2 parts by weight of palladium powder, and 0.1 to 1.1 parts by weight of glass frit. Copper powder and / or copper oxide powder as an inorganic binder is contained in a proportion of 0.3 to 1.1 parts by weight, and among the silver powder, diboron trioxide, alkali metal and ammonium salts of boric acid, alkali metal salts of borohydride. , One of the carboranes is 0.01 as boron
~ 0.1 wt% boron-coated silver powder 22-5
The conductive paste composition comprises 1 part by weight and the remaining flaky silver powder and has a glass frit yielding temperature of 450 to 600 ° C. and is fired simultaneously with the resistor paste composition.

【0008】本発明は、(3)三酸化二ホウ素、ホウ酸の
アルカリ金属塩、水素化ホウ素のアルカリ金属及びアン
モニウム塩、カルボランの内の一種が、ホウ素として
0.01〜0.1重量%被覆されているホウ素被覆銀粉に
ある。
In the present invention, one of (3) diboron trioxide, boric acid alkali metal salt, borohydride alkali metal and ammonium salt, and carborane is 0.01 to 0.1% by weight as boron. It is in boron-coated silver powder that is coated.

【0009】本発明は、(4)銀粉と、三酸化二ホウ素、
ホウ酸のアルカリ金属塩、水素化ホウ素のアルカリ金属
及びアンモニウム塩、カルボランの内の一種の水溶液と
を混合し乾燥する(3)に記載のホウ素被覆銀粉の製造方
法にある。
The present invention provides (4) silver powder, diboron trioxide,
The method for producing a boron-coated silver powder according to (3), which comprises mixing an alkali metal salt of boric acid, an alkali metal and ammonium salt of borohydride, and one kind of aqueous solution of carborane and drying the mixture.

【0010】本発明は、(5)銀イオンを含む溶液をホウ
素を含む還元剤で還元して出来たスラリーを洗浄程度を
調節して洗浄し、次いで乾燥する(3)に記載の銀粉の製
造方法にある。
According to the present invention, (5) a method of producing a silver powder according to (3), in which a slurry prepared by reducing a solution containing silver ions with a reducing agent containing boron is washed by adjusting the washing degree and then dried. On the way.

【0011】[0011]

【作用】本発明の導電ペースト組成物において、ホウ素
被覆銀粉のホウ素としての被覆量を0.01〜0.1重量
%とするのは、0.01重量%未満では基板と電極との
密着強度が極めて小さくなり、0.1重量%を超えると
抵抗体焼成膜の抵抗値が上昇する他、抵抗体と電極との
接触部付近の発泡、抵抗体中のガラスが電極中に滲出す
るだけでなく、焼結密度も低下するからである。
In the conductive paste composition of the present invention, the coating amount of boron of the silver powder coated with boron as 0.01 to 0.1% by weight means that the adhesion strength between the substrate and the electrode is less than 0.01% by weight. Becomes extremely small, and when the content exceeds 0.1% by weight, the resistance value of the resistor fired film rises, and the foam around the contact portion between the resistor and the electrode, the glass in the resistor only exudes into the electrode. This is because the sintered density also decreases.

【0012】本発明請求項1に記載の主として銀粉を導
電成分とする導電ペースト組成物において、ホウ素被覆
銀粉の平均粒径には特に制限はない。平均粒径2μm以
下のもの、特に平均粒径0.3μm以下のものがよい。
平均粒径が2μmを超えると、基板との密着強度が低下
し、焼結速度が遅くなり、抵抗体との収縮速度との差が
大きくなる傾向がある。
In the conductive paste composition according to claim 1 of the present invention, which mainly contains silver powder as a conductive component, the average particle size of the boron-coated silver powder is not particularly limited. An average particle size of 2 μm or less, particularly an average particle size of 0.3 μm or less is preferable.
If the average particle size exceeds 2 μm, the adhesion strength with the substrate will decrease, the sintering rate will slow down, and the difference from the contraction rate with the resistor will tend to increase.

【0013】銀粉にホウ素を被覆することにより、銀粉
同士、銀粉とガラスフリットとの焼結性及び基板との密
着性が改善されるものと想像される。従って、ホウ素被
覆銀粉はどんな組成の導電ペースト組成物に用いても基
板と電極との密着強度を向上できる。
It is believed that by coating the silver powder with boron, the sinterability between the silver powders, between the silver powder and the glass frit, and the adhesion with the substrate are improved. Therefore, the boron-coated silver powder can improve the adhesion strength between the substrate and the electrode regardless of the composition of the conductive paste composition.

【0014】本発明のフレーク状銀粉を含有し、抵抗体
用ペースト組成物と同時に焼成する導電ペースト組成物
において、全銀粉の配合割合を73〜79重量部とする
のは、導電性を考慮して従来と同様にしたものである
が、73重量部未満では上記のクラックが発生し易くな
り、79重量部を超えると、焼成の際の収縮が大きくな
り基板との密着強度が低下するようになるからである。
In the conductive paste composition containing the flake-shaped silver powder of the present invention and simultaneously fired with the resistor paste composition, the mixing ratio of the total silver powder is set to 73 to 79 parts by weight in consideration of conductivity. However, if the amount is less than 73 parts by weight, the above cracks are likely to occur, and if the amount exceeds 79 parts by weight, shrinkage during firing becomes large and the adhesion strength with the substrate decreases. Because it will be.

【0015】全銀粉の内、ホウ素被覆銀粉の配合割合を
22〜51重量部とするのは、22重量部未満では基板
との密着強度が劣り、51重量部を超えると収縮が大き
くなり過ぎ抵抗体にクラックが入り易くなる。又、この
導電ペースト組成物においてはホウ素被覆銀粉として平
均粒径は0.2μm以下のものを用いるのがよく、特に
平均粒径0.1μm以下のものが好適である。平均粒径
0.2μmを超えると基板と電極との密着強度が低下
し、更に焼結速度が遅くなり、抵抗体との収縮速度との
差が大きくなる傾向を生ずる。
The proportion of boron-coated silver powder in the total silver powder is set to 22 to 51 parts by weight. When the amount is less than 22 parts by weight, the adhesion strength to the substrate is poor, and when it exceeds 51 parts by weight, the shrinkage is too large and the resistance is high. The body is easily cracked. In this conductive paste composition, it is preferable to use boron-coated silver powder having an average particle size of 0.2 μm or less, and particularly preferably an average particle size of 0.1 μm or less. When the average particle size exceeds 0.2 μm, the adhesion strength between the substrate and the electrode is lowered, the sintering rate is further slowed down, and the difference from the contraction rate with the resistor tends to be large.

【0016】フレーク状銀粉は、充填率を向上させるた
めに添加されるが、長径の平均粒径が2μm未満では均
一な混合が困難となる等銀粉の取り扱いが困難となり、
一方長径の平均粒径が5μmを超えると充填率向上の効
果が無くなり、又スクリーン印刷時にスクリーンの目詰
まりを生じ易くなるので、長径の平均粒径が2〜5μm
のものを用いる。
Flake-like silver powder is added to improve the filling rate, but if the average particle diameter of the major axis is less than 2 μm, it becomes difficult to uniformly mix the silver powder, and the silver powder becomes difficult to handle.
On the other hand, if the average particle diameter of the major axis exceeds 5 μm, the effect of improving the filling rate is lost, and the screen is likely to be clogged, so that the average particle diameter of the major axis is 2 to 5 μm.
Use the one.

【0017】パラジウム粉を、0.5〜2重量部とする
のは、0.5重量部未満では銀が空気中のイオウ性ガス
と硫化反応し易く、電極が断線する虞れがある。又添加
量が多いと価格が高くなり過ぎるため2重量部以下とし
た。
When the amount of palladium powder is 0.5 to 2 parts by weight, if it is less than 0.5 parts by weight, the silver is likely to undergo a sulfurization reaction with the sulfur gas in the air, and the electrode may be broken. If the amount of addition is too large, the price becomes too high, so the amount was limited to 2 parts by weight or less.

【0018】ガラスフリットは、特殊な成分のものであ
る必要は無いが、屈服温度が450〜600℃であれ
ば、鉛ホウケイ酸ガラス以外にもPbO−ZnO−B2
3、ZnO−SiO2−B23、TiO2−SiO2−B
23、PbO−SiO2−Al23等種々の系のガラス
を使用できる。ガラスの屈服温度が450℃未満では電
極中に気泡が発生し易くなり、一方600℃を超えると
密着強度が低下する。
The glass frit does not have to be a special component, but if the yielding temperature is 450 to 600 ° C., PbO-ZnO-B 2 other than lead borosilicate glass can be used.
O 3, ZnO-SiO 2 -B 2 O 3, TiO 2 -SiO 2 -B
Various types of glass such as 2 O 3 and PbO-SiO 2 -Al 2 O 3 can be used. If the glass yielding temperature is lower than 450 ° C, bubbles tend to be generated in the electrode, while if it exceeds 600 ° C, the adhesion strength is lowered.

【0019】ガラスフリットの配合割合を0.1〜1.1
重量部とするのは、0.1重量部未満では基板と電極と
の密着強度が劣化し、1.1重量部を超えるとガラスの
滲出が生じ易くなる。ガラスフリットの粒度は平均粒径
が2〜5μm程度であることが望ましい。
The blending ratio of the glass frit is 0.1 to 1.1.
If the amount is less than 0.1 part by weight, the adhesion strength between the substrate and the electrode deteriorates, and if the amount exceeds 1.1 parts by weight, the glass is likely to seep out. The average particle size of the glass frit is preferably about 2 to 5 μm.

【0020】無機結合剤として用いる銅粉及び又は酸化
銅粉の配合割合を0.3〜1.1重量部とするのは、0.
3重量部未満では、基板と電極との密着強度が劣ってし
まい、1.1重量部を超えるとガラスが滲出し易くな
り、めっき付き性や半田濡れ性が劣るようになるからで
ある。
The mixing ratio of the copper powder and / or the copper oxide powder used as the inorganic binder is 0.3 to 1.1 parts by weight.
If it is less than 3 parts by weight, the adhesion strength between the substrate and the electrode will be inferior, and if it exceeds 1.1 parts by weight, the glass will easily exude and the plating property and solder wettability will be inferior.

【0021】ホウ素被覆銀粉と、フレーク状銀粉と、パ
ラジウム粉と、ガラスフリットと、無機結合剤とからな
るペースト形成用固形分を従来と同様のビヒクルと共に
三本ロールミル等により混練して導電ペースト組成物と
する。
A paste-forming solid content consisting of boron-coated silver powder, flake-shaped silver powder, palladium powder, glass frit, and an inorganic binder is kneaded together with a conventional vehicle in a three-roll mill or the like to form a conductive paste composition. It is a thing.

【0022】ビヒクルは樹脂を溶剤に溶解したもので、
一般に使用できるものは総て使用できる。例えば、樹脂
としてはエチルセルロース等のセルロース系樹脂、メチ
ルメタアクリレート、エチルエタアクリレート等のアク
リル系樹脂が用いられる。溶剤としては、例えばターピ
ネオール、デカノール、等のアルコール系溶剤、メチル
エチルケトン等のケトン系溶剤等が使用される。
The vehicle is a resin dissolved in a solvent,
All of the commonly available ones can be used. For example, as the resin, a cellulosic resin such as ethyl cellulose and an acrylic resin such as methyl methacrylate and ethyl ethacrylate are used. As the solvent, for example, alcoholic solvents such as terpineol, decanol, etc., ketone solvents such as methyl ethyl ketone, etc. are used.

【0023】ホウ素被覆銀粉を得る方法としては、通常
の銀粉とホウ素を含む物質の溶液とを混合して乾燥する
方法と、銀イオンを含む溶液をホウ素を含む還元剤で還
元してホウ素被覆銀粉を製造する際に、洗浄程度を調整
してホウ素を含む溶液を含んだスラリーを乾燥する方法
がある。ホウ素化合物をこのように溶液にして被覆する
のは粉末を被覆したのでは良い結果が得られないからで
ある。
As the method for obtaining the boron-coated silver powder, a method of mixing ordinary silver powder and a solution of a substance containing boron and drying the mixture, and a method of reducing the solution containing silver ions with a reducing agent containing boron to produce the silver powder coated with boron. There is a method of drying the slurry containing the solution containing boron by adjusting the degree of cleaning when manufacturing the. The reason why the boron compound is coated as a solution in this way is that good results cannot be obtained by coating the powder.

【0024】ホウ素被覆銀粉を得るための銀粉として
は、沈澱銀粉、電解銀粉等の通常の銀粉を使用出来る
が、特に球形のものが良い。ホウ素を含む物質の溶液を
用いてホウ素被覆銀粉を得るには、三酸化二ホウ素、ホ
ウ酸のアルカリ金属塩、水素化ホウ素のアルカリ金属及
びアンモニウム塩、ジメチルアミンボラン、ジカルバデ
カボラン等のカルボランの内の一種の水溶液に銀粉を混
合撹拌し、溶媒量が多いときは濾過してスラリーケーキ
とし、乾燥すればよい。
As the silver powder for obtaining the boron-coated silver powder, usual silver powder such as precipitated silver powder and electrolytic silver powder can be used, but spherical one is particularly preferable. Boron trioxide, boric acid alkali metal salts, borohydride alkali metal and ammonium salts, dimethylamine borane, dicarbadecaborane, and other carboranes can be obtained using a solution of a substance containing boron. The silver powder may be mixed and stirred in one of the aqueous solutions, and when the amount of solvent is large, it may be filtered to form a slurry cake and dried.

【0025】前記の混合撹拌は羽根形かきまぜ機、混和
機等の通常の方法で行えばよく、又前記の濾過は真空濾
過機、フイルタープレス、遠心分離機を用いればよく、
乾燥は真空乾燥機、回転乾燥機等を用いればよい。ホウ
素被覆銀粉のホウ素被覆量は溶液中のホウ素としての濃
度を変えることによって行ってもよいし、乾燥するスラ
リーケーキ中の溶液の含有量を調節することにより行っ
てもよい。
The above-mentioned mixing and stirring may be carried out by an ordinary method such as a blade-type stirrer, a kneader, etc., and the above-mentioned filtration may be carried out by using a vacuum filter, a filter press or a centrifugal separator.
For drying, a vacuum dryer, a rotary dryer or the like may be used. The boron coating amount of the boron-coated silver powder may be changed by changing the concentration of boron in the solution, or may be adjusted by adjusting the content of the solution in the slurry cake to be dried.

【0026】銀イオンを含む溶液をホウ素を含む還元剤
で還元してホウ素被覆銀粉を製造するには、硝酸銀等の
水溶液やAg2OやAgOを硝酸に溶解した水溶液にア
ンモニアを添加し生成した銀錯体アンモニア溶液等の銀
イオンを含む溶液に、還元剤として水素化ホウ素ナトリ
ウムやジメチルアミンボラン等のホウ素を含む還元剤を
使用すればよい。銀粉を濾過分離したスラリーケーキに
はホウ素化合物を含む溶液が含まれているため、このス
ラリーケーキの洗浄程度を調整して乾燥すれば、任意の
ホウ素被覆量を有するホウ素被覆銀粉が得られる。
In order to produce a boron-coated silver powder by reducing a solution containing silver ions with a reducing agent containing boron, ammonia was added to an aqueous solution of silver nitrate or the like or an aqueous solution of Ag 2 O or AgO dissolved in nitric acid. A reducing agent containing boron such as sodium borohydride or dimethylamineborane may be used as a reducing agent in a solution containing silver ions such as a silver complex ammonia solution. Since the slurry cake obtained by separating the silver powder by filtration contains a solution containing a boron compound, a boron-coated silver powder having an arbitrary boron coating amount can be obtained by adjusting the degree of washing of the slurry cake and drying.

【0027】[0027]

【実施例】【Example】

[ホウ素被覆銀粉のみを導電成分とした導電ペースト組
成物] 実施例1〜11、比較例1〜8 平均粒径がそれぞれ0.1、0.3、0.6、0.8、1、
1.5、2μmの球状銀粉40gに、水300ccと、
種々の量の試薬1級のメタホウ酸ナトリウム(NaBO
2・4H2O)を内容積1リットルの回転式ブレンダー
(ロボクープ社製)に投入して、15000rpmで1
分間撹拌し、吸引濾過した後、80℃で20時間乾燥し
てホウ素被覆銀粉を得た。ホウ素としての被覆量はそれ
ぞれ約0.01、約0.05、約0.1、約0.15重量%
であった。
[Conductive paste composition containing only boron-coated silver powder as a conductive component] Examples 1 to 11 and Comparative Examples 1 to 8 having average particle sizes of 0.1, 0.3, 0.6, 0.8 and 1, respectively.
1.5g, 2μm spherical silver powder 40g, water 300cc,
Various amounts of reagent grade sodium metaborate (NaBO
Was charged 2 · 4H 2 O) to 1-liter rotary blender (Robokupu Co.), 1 15000rpm
After stirring for 1 minute, suction filtration, and drying at 80 ° C. for 20 hours, a boron-coated silver powder was obtained. The coating amount as boron is about 0.01, about 0.05, about 0.1, and about 0.15% by weight, respectively.
Met.

【0028】この銀粉79重量部に、屈服温度400℃
で熱膨張係数8.2×10-6/℃の66重量%PbO−
14重量%ZnO−10重量%B23系ガラスフリット
(F1)を0.6重量部と、試薬1級の平均粒径5〜6
μmの酸化銅(CuO)粉0.4重量部と、15重量%
のエチルセルロースを溶解したテルピネオール20重量
部を加え3本ロールミルで混練して種々の導電ペースト
組成物を作った。
79 parts by weight of this silver powder are subjected to a yielding temperature of 400 ° C.
66% by weight PbO- with a thermal expansion coefficient of 8.2 × 10 -6 / ° C.
14 wt% ZnO-10 wt% B 2 O 3 based glass frit (F1) 0.6 part by weight, and an average particle size of reagent 1-5-6
0.4 parts by weight of copper oxide (CuO) powder of 15 μm
20 parts by weight of terpineol having ethyl cellulose dissolved therein was added and kneaded with a three-roll mill to prepare various conductive paste compositions.

【0029】前記のペーストを純度96重量%のアルミ
ナ基板上にスクリーン印刷し、乾燥後、連続焼成炉で8
50℃で焼成し、2mm角の厚さ8μmのパッドを各々
10個形成した。このパッド上に直径0.65mmの錫
めっき銅線を半田付けして引っ張り試験片を作成した。
The above paste was screen-printed on an alumina substrate having a purity of 96% by weight, dried and then placed in a continuous firing furnace for 8 hours.
Firing was performed at 50 ° C. to form 10 2 mm square pads each having a thickness of 8 μm. A tin-plated copper wire having a diameter of 0.65 mm was soldered on this pad to prepare a tensile test piece.

【0030】前記の引っ張り試験片と、前記の引っ張り
試験片を更に150℃で24時間エージングした試験片
との2種類の引っ張り試験片を用いて、引っ張り試験機
によりピーリング試験を行い、半田付け部の密着強度を
測定した。密着強度は約5kgf/(4mm2)以上あ
れば実用に供することができる。又、光学顕微鏡により
表面状況を観察し、肌荒れの無いものを、そうでないも
のを×とした。結果を表1に示す。
A peeling test was carried out by a tensile tester using two types of tensile test pieces, that is, the tensile test piece and the test piece obtained by aging the tensile test piece for 24 hours at 150 ° C. Was measured. If the adhesion strength is about 5 kgf / (4 mm 2 ) or more, it can be put to practical use. In addition, the surface condition was observed with an optical microscope, and those with no rough skin were rated as x. The results are shown in Table 1.

【0031】[0031]

【表1】 実施例 ホウ素 銀粉平均 密着強度 表面状況 含有量 粒径 kgf/(4mm2) 重量% μm 初期 エージング後 1 0.01 0.1 6.4 6.4 2 0.01 0.3 6.0 6.2 3 0.01 0.6 5.1 5.3 4 0.01 1 5.2 4.9 5 0.05 0.3 6.6 6.5 6 0.05 0.8 6.3 6.4 7 0.05 1.5 5.2 4.9 8 0.1 0.1 7 7 9 0.1 0.6 6.3 6.4 10 0.1 1 6.2 5.8 11 0.1 2 5 5 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 比較例 1 0 0.1 3.9 3.6 2 0 0.6 4.7 4.3 3 0 1 5.1 4.9 4 0 2 3 2.8 5 0.15 0.1 7 7 × 6 0.15 0.6 6.5 6.4 × 7 0.15 1 6.2 5.9 × 8 0.15 2 5 4.9 ×[Table 1] Example Boron Silver powder average adhesion strength Surface condition Content Particle size kgf / (4 mm 2 ) wt% μm Initial aging After 0.01 0 0.1 6.4 6.4 6.4 2 0.01 0.3 6 0.0 6.2 3 0.01 0.01 5.1 5.3 4 0.01 0.01 1 5.2 4.9 5 0.05 0.05 6.6 6.5 6.5 6 0.05 0.8 6 .3 6.4 7 0.05 0.05 1.5 4.9 8 0.1 0.1 7 7 9 9 0.1 0.6 6.3 6.3 6.4 10 0.1 5.1 1 6.2 5. 8 11 0.1 25 5 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Comparative example 1 0 0.1 3.9 3.6 2 0 0.6 4.7 4.7 4.3 3 0 1 5.1 5.1 4.9 4 0 2 3 2.8 5 0.15 0.1 7 7 × 6 0.15 0.6 6.5 6.4 x 7 0.15 1 6.2 5.9 x 8 0.15 2 5 4.9 x

【0032】表1に示す結果からホウ素が被覆されてい
ない銀粉を使用した電極では、表面状況は良好である
が、密着強度が低く、ホウ素被覆量が0.1重量%を超
える銀粉を使用した電極では、密着強度は大きいが、表
面に膚荒れを生じた。
From the results shown in Table 1, in the electrode using the silver powder not coated with boron, the surface condition was good, but the adhesion strength was low, and the silver powder having a boron coating amount of more than 0.1% by weight was used. The electrode had a high adhesion strength, but the surface was roughened.

【0033】実施例12〜17 メタホウ酸ナトリウムの代わりに、試薬1級の三酸化二
ホウ素(B23)、ホウ酸カリウム(K247・4H2
O)、ホウ酸アンモニウム((NH4247・4H2
O)、を使用し、その他は実施例1〜11と同様にして
種々のホウ素被覆銀粉を得た。この銀粉を使用して実施
例1〜11と同様に密着強度を求め、表面状況を観察し
た結果を表2に示す。使用した銀粉の平均粒径は0.3
mであった。この結果、銀粉表面に溶液を介して被覆さ
れたホウ素含有量が本発明範囲であれば、密着強度もあ
り表面状況も良好な電極が得られることが分かる。
Examples 12 to 17 In place of sodium metaborate, reagent grade diboron trioxide (B 2 O 3 ) and potassium borate (K 2 B 4 O 7 .4H 2) were used.
O), ammonium borate ((NH 4) 2 B 4 O 7 · 4H 2
O) was used, and various other boron-coated silver powders were obtained in the same manner as in Examples 1 to 11. Using this silver powder, the adhesion strength was determined in the same manner as in Examples 1 to 11, and the results of observing the surface condition are shown in Table 2. The average particle size of the silver powder used is 0.3
It was m. As a result, it can be seen that when the content of boron coated on the surface of the silver powder through the solution is within the range of the present invention, an electrode having good adhesion strength and a good surface condition can be obtained.

【0034】[0034]

【表2】 実施例 ホウ素 被覆物質 密着強度 表面状況 含有量 gf/(4mm2) 重量% 初期 エージング後 12 0.05 三酸化二ホウ素 6.1 6.2 13 0.05 ホウ酸アンモニウム 6.2 6.2 14 0.05 ホウ酸カリウム 6 6.1 15 0.1 三酸化二ホウ素 6.4 6.3 16 0.1 ホウ酸アンモニウム 6.4 5 17 0.1 ホウ酸カリウム 6.3 6.2 Example 2 Boron coating substance Adhesion strength Surface condition Content gf / (4mm 2 ) wt% Initial after aging 12 0.05 Diboron trioxide 6.1 6.2 13 0.05 0.05 Ammonium borate 6.2 6.2 14 0.05 Potassium borate 6 6.1 15 15 0.1 Diboron trioxide 6.4 6.3 16 16 0.1 Ammonium borate 6.4 5 17 0.1 Potassium borate 6.3 6 .2

【0035】実施例18、19、比較例9 純度99.9重量%の硝酸銀170gを水3リットルに
溶解し、これに水素化ホウ素ナトリウム(NaBH4
5gを添加して硝酸銀を還元し、該溶液を吸引濾過して
銀粉の第一スラリーケーキを得た。このスラリーケーキ
を60℃の水5リットル中に添加し、撹拌羽根の回転数
300rpmで10分間撹拌洗浄を行い、吸引濾過して
第二スラリーケーキを得た。
Examples 18 and 19, Comparative Example 9 170 g of silver nitrate having a purity of 99.9% by weight was dissolved in 3 liters of water, and sodium borohydride (NaBH 4 ) was added thereto.
5 g was added to reduce silver nitrate, and the solution was suction filtered to obtain a first slurry cake of silver powder. This slurry cake was added to 5 liters of water at 60 ° C., stirring and washing were performed at a rotating speed of a stirring blade of 300 rpm for 10 minutes, and suction filtration was performed to obtain a second slurry cake.

【0036】この第二スラリーケーキと60℃の水50
0ccとを実施例1〜11で用いたブレンダーに投入
し、更に60℃の水4500ccを加えて撹拌洗浄した
後、吸引濾過することを7回、12回、20回繰り返
し、乾燥してホウ素被覆量が0.1、0.01、0重量%
のホウ素被覆銀粉を得た。ホウ素被覆量の測定はICP
発光分光分析により行った。この銀粉の平均粒径は約
0.3μmであった。この銀粉を使用して実施例1〜1
1と同様に密着強度を求め、表面状況を観察した結果を
表3に示す。
This second slurry cake and water at 60 ° C. 50
0 cc was added to the blender used in Examples 1 to 11, 4500 cc of water at 60 ° C. was further added, and the mixture was washed with stirring, and suction filtration was repeated 7 times, 12 times, 20 times, dried and coated with boron. Amount 0.1, 0.01, 0% by weight
To obtain a boron-coated silver powder. Boron coverage is measured by ICP
It was performed by optical emission spectroscopy. The average particle size of this silver powder was about 0.3 μm. Examples 1 to 1 using this silver powder
The adhesion strength was determined in the same manner as in No. 1 and the results of observing the surface condition are shown in Table 3.

【0037】実施例20、21、比較例10 試薬1級のジメチルアミンボラン((CH32NHBH
3)3gを水素化ホウ素ナトリウム5gの代わりに使用
した以外は実施例18、19と同様にしてホウ素被覆銀
粉を得た。但し繰り返し洗浄回数は12、20回でホウ
素被覆量は0.1重量%、0.01重量%であった。ホウ
素被覆量の測定はICP発光分光分析により行った。こ
の銀粉の平均粒径は約0.3μmであった。この銀粉を
使用して実施例1〜11と同様に密着強度を求め、表面
状況を観察した結果を表3に示す。
Examples 20, 21 and Comparative Example 10 Reagent Primary dimethylamine borane ((CH 3 ) 2 NHBH
3 ) A boron-coated silver powder was obtained in the same manner as in Examples 18 and 19 except that 3 g was used instead of 5 g of sodium borohydride. However, the number of repeated washings was 12, 20 times, and the boron coating amounts were 0.1% by weight and 0.01% by weight. The boron coating amount was measured by ICP emission spectroscopy. The average particle size of this silver powder was about 0.3 μm. Using this silver powder, the adhesion strength was obtained in the same manner as in Examples 1 to 11, and the results of observing the surface condition are shown in Table 3.

【0038】[0038]

【表3】 実施例 ホウ素 還元剤 密着強度 表面状況 含有量 kgf/(4mm2) 重量% 初期 エージング後 18 0.01 水素化ホウ素ナトリウム 5.8 5.6 19 0.1 〃 6.6 6.6 20 0.01 ジメチルアミンボラン 5.4 5.2 21 0.1 〃 6 6.1 比較例 9 0 水素化ホウ素ナトリウム 4 3.5 10 0 ジメチルアミンボラン 2.9 2 [Table 3] Example Boron reducing agent Adhesive strength Surface condition Content kgf / (4mm 2 ) wt% After initial aging 18 0.01 Sodium borohydride 5.8 5.6 19 0.1 〃 6.6 6. 6 20 0.01 Dimethylamine borane 5.4 5.2 21 0.1 0.1 6 6.1 Comparative example 9 0 Sodium borohydride 4 3.5 10 0 Dimethylamine borane 2.9 2

【0039】[銀粉、パラジウム粉を導電成分とする導
電ペースト組成物] 実施例22〜27、比較例11〜18 表4に示す、実施例18〜21と同様の方法で作ったホ
ウ素被覆銀粉と、ホウ素を被覆していないフレーク状銀
粉と、ホウ素被覆していない凝集球状銀粉と、平均粒径
0.3μmの出願人製造のパラジウム粉(商品名SFP
−030)を使用した。
[Conductive paste compositions containing silver powder and palladium powder as conductive components] Examples 22 to 27 and Comparative Examples 11 to 18 Boron-coated silver powders prepared in the same manner as in Examples 18 to 21 shown in Table 4. , Flake-shaped silver powder not coated with boron, agglomerated spherical silver powder not coated with boron, and palladium powder manufactured by the applicant with an average particle size of 0.3 μm (trade name SFP
-030) was used.

【0040】[0040]

【表4】 銀粉種類 形態 平均粒径 ホウ素含有量 μm 重量% S1 凝集球状 0.1 0.014 S2 単分散球状 0.2 0.048 S3 〃 0.15 0.09 S4 フレーク状 3 0 S5 〃 6 0 S6 凝集球状 0.5 0 S7 〃 0.19 0 S8 〃 3 0[Table 4] Types of silver powder Morphology Average particle size Boron content μm Weight% S1 Aggregated spheres 0.1 0.014 S2 Monodispersed spheres 0.2 0.048 S3 〃 0.15 0.09 S4 Flakes 3 0 S5 〃 6 0 S6 Agglomerated sphere 0.5 0 S7 〃 0.19 0 S8 〃 3 0

【0041】使用したガラスフリットを表5に示す。ガ
ラスフリットの平均粒径は2〜5μmであった。
Table 5 shows the glass frit used. The average particle size of the glass frit was 2 to 5 μm.

【表5】 種類 主成分組成 屈服温度 熱膨張係数 重量% ℃ ×10-6/℃ F1 66PbO−14ZnO−10B23 400 8.2 F2 59PbO−26SiO2−7B23 518 6.1 F3 〃 530 6 F4 〃 538 6.2 F5 13B23−49SiO2−16TiO2 −12Na2O−3Al23 570 9 F6 22PbO−29SiO2−15Al23 710 7[Table 5] Type Main component composition Substitution temperature Thermal expansion coefficient Weight% ℃ × 10 -6 / ℃ F1 66PbO-14ZnO-10B 2 O 3 400 8.2 F2 59PbO-26SiO 2 -7B 2 O 3 518 6.1 F3 〃 530 6 F4 〃 538 6.2 F5 13B 2 O 3 -49SiO 2 -16TiO 2 -12Na 2 O-3Al 2 O 3 570 9 F6 22PbO-29SiO 2 -15Al 2 O 3 710 7 7

【0042】無機結合剤として、純度99.5重量%の
銅(Cu)粉、純度99重量%の酸化亜鉛(ZnO)
粉、試薬1級の酸化第一銅(Cu2O)粉、酸化第二銅
(CuO)粉、二酸化マンガン(MnO2)粉、酸化コ
バルト(CoO)粉、及び酸化鉛(PbO)粉を使用し
た。何れも平均粒径5〜6μmで3本ロールミルで混合
したとき更に細かくなる。
As the inorganic binder, copper (Cu) powder having a purity of 99.5% by weight and zinc oxide (ZnO) having a purity of 99% by weight.
Powder, first-grade cuprous oxide (Cu 2 O) powder, cupric oxide (CuO) powder, manganese dioxide (MnO 2 ) powder, cobalt oxide (CoO) powder, and lead oxide (PbO) powder did. In both cases, the average particle size becomes 5 to 6 μm, and the particles become finer when mixed by a three-roll mill.

【0043】表6に記載の原料配合で実施例18〜21
と同様にして導電ペーストを作った。表6に記載された
原料以外に、上記のパラジウム粉1重量部と、ガラスフ
リットF2を0.6重量部と、CuO粉を0.4重量部を
配合した。前記のペーストを用いて実施例1〜11と同
様に密着強度を求め、結果を表6に示す。
The raw material formulations shown in Table 6 were used in Examples 18 to 21.
A conductive paste was prepared in the same manner as in. In addition to the raw materials listed in Table 6, 1 part by weight of the above-mentioned palladium powder, 0.6 part by weight of glass frit F2, and 0.4 part by weight of CuO powder were blended. Adhesion strength was obtained using the above-mentioned paste as in Examples 1 to 11, and the results are shown in Table 6.

【0044】前記のペーストを96重量%アルミナ基板
上にスクリーン印刷し、ベルト式乾燥炉で120℃、1
5分間乾燥し1.5mm角のパッドを形成した。2個の
試験パッドにまたがり出願人製造の抵抗体用ペースト
(商品名 12SX)を印刷しベルト式乾燥炉で120
℃、15分間乾燥し、連続焼成炉を用いて850℃で電
極と抵抗体を同時に焼成した。
The above-mentioned paste was screen-printed on a 96 wt% alumina substrate, and the belt-type drying oven was operated at 120 ° C. for 1 hour.
It was dried for 5 minutes to form a 1.5 mm square pad. The resistor paste (product name 12SX) manufactured by the applicant is printed over the two test pads, and 120 is applied in a belt-type drying oven.
After drying at ℃ for 15 minutes, the electrode and the resistor were simultaneously baked at 850 ° C using a continuous baking furnace.

【0045】パッド上に直径0.65mmの錫めっき銅
線を半田付けする前に、電解ニッケルめっきを施した。
電解めっきはめっき浴pH3.5、めっき温度45℃、
めっき電流値0.1A/パッド、めっき時間2分の条件
で行った。めっき被膜の厚さは5μmであった。走査型
電子顕微鏡により抵抗体と電極との境界部を観察し、ガ
ラス滲出、クラックの状況について検査した。その結果
をガラス滲出やクラックの認められないものを、認めら
れたものを×として表6に併せて示す。
Before soldering a tin-plated copper wire having a diameter of 0.65 mm on the pad, electrolytic nickel plating was applied.
Electrolytic plating uses a plating bath pH of 3.5, a plating temperature of 45 ° C,
The plating current value was 0.1 A / pad and the plating time was 2 minutes. The thickness of the plating film was 5 μm. The boundary between the resistor and the electrode was observed with a scanning electron microscope to inspect the condition of glass exudation and cracks. The results are shown in Table 6 together with those in which no glass exudation or cracks were observed and those in which they were observed.

【0046】[0046]

【表6】 銀粉 フレーク状銀粉 ヒ゛ヒクル 密着強度 カ゛ラス クラック 種類 重量部 種類 重量部 重量部 kgf/4mm2 滲出 実施例 初期 エーシ゛ンク゛後 22 S1 53 S5 23 22 8.2 7.6 23 S3 48 S5 30 20 7.1 6.9 24 S3 38 S5 36 24 7.4 6.9 25 S2 40 S4 37 21 7.7 7.3 26 S1 30 S4 48 20 8 7.8 27 S3 25 S4 50 23 7.7 6.7 比較例 11 S1 80 − − 18 6.5 6.5 × 12 S2 80 − − 18 6.5 6.5 × 13 S3 70 − − 28 6.6 6.5 × 14 − − S4 79 19 4.8 4 × 15 − − S5 80 18 3.5 3.2 × 16 S6 38 S8 38 − − 22 4.9 4.7 × 17 S7 70 − − 28 3.5 3.2 × 18 S6 38 S4 38 22 5.2 2.9 × (Pd 1重量部、F2 0.6重量部、CuO 0.4重量部)[Table 6] Silver powder Flake silver powder Vehicle Adhesive strength Glass crack type Weight part Type Weight part Weight part kgf / 4mm 2 Exudation Example After initial aging 22 S1 53 S5 23 22 8.2 7.6 23 S3 48 S5 30 20 7.1 6.9 24 S3 38 S5 36 24 7.4 6.9 25 S2 40 S4 37 21 7.7 7.3 26 S1 30 S4 48 20 8 7.8 27 S3 25 S4 50 23 7.7 6.7 Comparative Example 11 S1 80 − − 18 6.5 6.5 × 12 S2 80 − − 18 6.5 6.5 × 13 S3 70 − − 28 6.6 6.5 × 14 − − S4 79 19 4.8 4 × 15 − − S5 80 18 3.5 3.2 × 16 S6 38 S8 38 − − 22 4.9 4.7 × 17 S7 70 − − 28 3.5 3.2 × 18 S6 38 S4 38 22 5.2 2.9 × (Pd 1 part by weight, F2 0.6 part by weight, CuO 0.4 part by weight)

【0047】表6に示すように、電極と抵抗体とを同時
に焼成するに用いる導電ペースト組成物では、ホウ素被
覆銀粉のみを用いた場合、電極及び抵抗体にクラックが
発生した。フレーク状銀粉のみ、ホウ素が被覆されてい
ない凝集銀粉のみ、フレーク状銀粉とホウ素が被覆され
ていない凝集銀粉とを併用した場合はクラックが発生し
ただけでなく密着強度も低かった。
As shown in Table 6, in the conductive paste composition used for simultaneously firing the electrode and the resistor, cracks occurred in the electrode and the resistor when only the boron-coated silver powder was used. When only the flake-shaped silver powder, only the agglomerated silver powder not coated with boron, or the flake-shaped silver powder and the agglomerated silver powder not coated with boron were used together, not only cracks but also low adhesion strength was observed.

【0048】実施例28〜33、比較例19、20 表7に示す組成の導電ペースト組成物を作り、実施例2
2〜27と同様に試験した。その結果を表7に併せて示
す。表7に記載の原料以外に、ホウ素被覆銀粉S1を3
8重量部と、フレーク状銀粉S4を38重量部と、Cu
O粉を0.4重量部用いた。
Examples 28 to 33, Comparative Examples 19 and 20 A conductive paste composition having the composition shown in Table 7 was prepared, and Example 2 was prepared.
Tested as in 2-27. The results are also shown in Table 7. In addition to the raw materials listed in Table 7, 3 of boron-coated silver powder S1 was used.
8 parts by weight, 38 parts by weight of flake silver powder S4, Cu
0.4 part by weight of O powder was used.

【0049】[0049]

【表7】 Pd粉 ガラスフリット ヒ゛ヒクル 密着強度 カ゛ラス クラック 重量部 種類 重量部 重量部 kgf/4mm2 滲出 実施例 初期 エーシ゛ンク゛後 28 0.5 F2 0.6 22.5 7.6 7 29 0.5 F3 0.6 22.5 7.6 6.9 30 0.5 F4 0.6 22.5 7.5 7.4 31 0.5 F5 0.6 22.5 7.1 6.6 32 0.5 F2 0.6 F4 0.4 23.5 7.5 7.3 33 1 F2 0.6 F5 0.4 22 7.5 6.8 比較例 19 0.5 F1 0.6 22.5 3.9 2.5 × 20 0.5 F6 0.6 22.5 6.1 4.7 (S1 38重量部、S4 38重量部、CuO 0.4重量部)[Table 7] Pd powder Glass frit Vehicle adhesion strength Glass crack Weight part Type Weight part Weight part kgf / 4mm 2 Exudation Example After initial aging 28 0.5 F2 0.6 22.5 7.6 7 29 0.5 F3 0.6 22.5 7.6 6.9 30 0.5 F4 0.6 22.5 7.5 7.4 31 0.5 F5 0.6 22.5 7.1 6.6 32 0.5 F2 0.6 F4 0.4 23.5 7.5 7.3 33 1 F2 0.6 F5 0.4 22 7.5 6.8 Comparative example 19 0.5 F1 0.6 22.5 3.9 2.5 × 20 0.5 F6 0.6 22.5 6.1 4.7 (S1 38 parts by weight, S4 38 parts by weight, CuO 0.4 parts by weight)

【0050】電極と抵抗体とを同時に焼成するのに用い
る導電ペースト組成物では、表7の比較例19、20に
示すようにガラスフリットの屈服温度が450℃未満だ
と、ガラス滲出が発生することが分かる。又600℃を
超えると密着強度が低下することが分かる。
In the conductive paste composition used for simultaneously firing the electrode and the resistor, glass exudation occurs when the glass frit yield temperature is less than 450 ° C., as shown in Comparative Examples 19 and 20 of Table 7. I understand. Further, it can be seen that when the temperature exceeds 600 ° C., the adhesion strength decreases.

【0051】実施例34〜38、比較例21〜23 表8に示す組成の導電ペースト組成物を作り、実施例2
8〜33と同様に試験した。その結果を表8に併せて示
す。表8に記載の原料以外に、ホウ素被覆銀粉S1を3
8重量部と、フレーク状銀粉S4を38重量部と、Cu
O粉を0.4重量部用いた。
Examples 34 to 38, Comparative Examples 21 to 23 Conductive paste compositions having the compositions shown in Table 8 were prepared and Example 2 was prepared.
Tested as in 8-33. The results are also shown in Table 8. In addition to the raw materials shown in Table 8, 3 boron-coated silver powder S1
8 parts by weight, 38 parts by weight of flake silver powder S4, Cu
0.4 part by weight of O powder was used.

【0052】[0052]

【表8】 Pd粉 ガラスフリット ヒ゛ヒクル 密着強度 カ゛ラス クラック 重量部 種類 重量部 重量部 kgf/4mm2 滲出 実施例 初期 エーシ゛ンク゛後 34 1 F2 0.1 22.5 6.9 6.1 35 1 F2 0.2 22.4 7 6.9 36 1 F2 0.5 22.1 7.6 7 37 1 F2 0.9 21.7 7.6 7.1 38 1 F2 1.1 21.5 7.3 7 比較例 21 0.5 − − 23.1 2.1 1.1 × × 22 0.5 F2 1.2 21.9 7.2 7 × 23 0.5 F2 2 21.1 7.5 7.4 × (S1 38重量部、S4 38重量部、CuO 0.4重量部) 表8に示す結果から、電極と抵抗体とを同時に焼成する
のに用いる導電ペースト組成物では、屈服温度450〜
600℃のガラスフリットは0.1〜1.1重量部でなけ
ればならないことが分かる。
[Table 8] Pd powder Glass frit Vehicle adhesion strength Glass crack Weight part Type Weight part Weight part kgf / 4mm 2 Exudation Example After initial aging 34 1 F2 0.1 22.5 6.9 6.1 35 1 F2 0.2 22.4 7 6.9 36 1 F2 0.5 22.1 7.6 7 37 1 F2 0.9 21.7 7.6 7.1 38 1 F2 1.1 21.5 7.3 7 Comparative example 21 0.5 − − 23.1 2.1 1.1 × × 22 0.5 F2 1.2 21.9 7.2 7 × 23 0.5 F2 2 21.1 7.5 7.4 × (S1 38 parts by weight, S4 38 (Parts by weight, CuO 0.4 parts by weight) From the results shown in Table 8, in the conductive paste composition used for simultaneously firing the electrode and the resistor, the yielding temperature of 450 to
It can be seen that the glass frit at 600 ° C must be 0.1-1.1 parts by weight.

【0053】実施例39〜42、比較例24〜28 表9に示す組成の導電ペースト組成物を作り、実施例3
4〜38と同様に試験した。その結果を表9に併せて示
す。表9に記載の原料以外に、ホウ素被覆銀粉S1を3
8重量部と、フレーク状銀粉S4を38重量部と、ガラ
スフリットF2を0.5重量部用いた。
Examples 39 to 42, Comparative Examples 24 to 28 A conductive paste composition having the composition shown in Table 9 was prepared and Example 3 was prepared.
It tested like 4-38. The results are also shown in Table 9. In addition to the raw materials shown in Table 9, boron-coated silver powder S1
8 parts by weight, 38 parts by weight of flake silver powder S4, and 0.5 parts by weight of glass frit F2 were used.

【0054】[0054]

【表9】 Pd粉 無機結合剤 ヒ゛ヒクル 密着強度 カ゛ラス クラック 重量部 種類 重量部 重量部 kgf/4mm2 滲出 実施例 初期 エーシ゛ンク゛後 39 1 Cu2O 0.4 22.1 7.3 7 40 1 Cu2O 1 21.5 7.4 7.2 41 1 Cu 0.4 22.1 7.1 7 42 1 CuO 0.2 Cu 0.2 22.1 7.3 7.2 比較例 24 0.5 − − 23 2.5 1.1 25 1 MnO2 0.5 22 3.5 2 26 0.5 ZnO 0.4 22.6 2.5 1.5 27 0.5 CoO 0.4 22.6 2.1 1.7 28 0.5 PbO 0.4 22.6 2.7 1.5 × (S1 38重量部、S4 38重量部、F2 0.5重量部)[Table 9] Pd powder Inorganic binder Vehicle Adhesion strength Glass Crack Weight part Type Weight part Weight part kgf / 4mm 2 Exudation Example Initial aging After 39 1 Cu 2 O 0.4 22.1 7.3 7 40 1 Cu 2 O 1 21.5 7.4 7.2 41 1 Cu 0.4 22.1 7.1 7 42 1 CuO 0.2 Cu 0.2 22.1 7.3 7.2 Comparative example 24 0.5 − − 23 2.5 1.1 25 1 MnO 2 0.5 22 3.5 2 26 0.5 ZnO 0.4 22.6 2.5 1.5 27 27 0.5 CoO 0.4 22.6 2.1 1.7 2.8 0.5 PbO 0.4 22.6 2.7 1.5 x (S1 38 parts by weight, S4 38 parts by weight, F2 0.5 parts by weight)

【0055】表9に示す結果から、電極と抵抗体とを同
時に焼成するに用いる導電ペースト組成物では、無機結
合剤は0.3〜1.1重量部でなければならず、その種類
もCu粉、Cu2O粉、CuO粉でなければならないこ
とが分かる。
From the results shown in Table 9, in the conductive paste composition used for simultaneously firing the electrode and the resistor, the inorganic binder must be 0.3 to 1.1 parts by weight, and the kind thereof is Cu. It can be seen that it must be powder, Cu 2 O powder, CuO powder.

【0056】[0056]

【発明の効果】本発明によれば、基板と電極との密着強
さに優れた導電ペースト組成物、並びに、その上、抵抗
体と一次電極の接合部付近の抵抗体にクラックが発生せ
ず、焼成中に抵抗体中のガラスが電極中に滲出しない電
極形成用の導電ペースト組成物を提供できる。
EFFECTS OF THE INVENTION According to the present invention, a conductive paste composition having excellent adhesion strength between a substrate and an electrode, and moreover, no crack is generated in a resistor near the junction between the resistor and the primary electrode. It is possible to provide a conductive paste composition for electrode formation in which the glass in the resistor does not exude into the electrode during firing.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 三酸化二ホウ素、ホウ酸のアルカリ金属
及びアンモニウム塩、水素化ホウ素のアルカリ金属塩、
カルボランの内の一種が、ホウ素として0.01〜0.1
重量%被覆されているホウ素被覆銀粉を導電成分として
含有する導電ペースト組成物。
1. Boron trioxide, an alkali metal and ammonium salt of boric acid, an alkali metal salt of borohydride,
One of the carboranes is 0.01-0.1 as boron
A conductive paste composition containing, as a conductive component, boron-coated silver powder coated in a weight percentage.
【請求項2】 固形分として、銀粉73〜79重量部
と、パラジウム粉が0.5〜2重量部と、ガラスフリッ
トが0.1〜1.1重量部と、無機結合剤としての銅粉及
び又は酸化銅粉0.3〜1.1重量部の割合で含み、銀粉
の内三酸化二ホウ素、ホウ酸のアルカリ金属及びアンモ
ニウム塩、水素化ホウ素のアルカリ金属塩、カルボラン
の内の一種が、ホウ素として0.01〜0.1重量%被覆
されているホウ素被覆銀粉22〜51重量部、残りフレ
ーク状銀粉からなり、ガラスフリットの屈服温度が45
0〜600℃で抵抗体用ペースト組成物と同時に焼成す
る導電ペースト組成物。
2. Solid content 73 to 79 parts by weight of silver powder, 0.5 to 2 parts by weight of palladium powder, 0.1 to 1.1 parts by weight of glass frit, and copper powder as an inorganic binder. And / or copper oxide powder in an amount of 0.3 to 1.1 parts by weight, and one of diboron trioxide in silver powder, alkali metal and ammonium salt of boric acid, alkali metal salt of borohydride, and carborane. , 22 to 51 parts by weight of boron-coated silver powder coated with 0.01 to 0.1% by weight of boron, and the remaining flaky silver powder, and the glass frit has a yield temperature of 45.
A conductive paste composition that is fired at 0 to 600 ° C. at the same time as the resistor paste composition.
【請求項3】 三酸化二ホウ素、ホウ酸のアルカリ金属
及びアンモニウム塩、水素化ホウ素のアルカリ金属塩、
カルボランの内の一種が、ホウ素として0.01〜0.1
重量%被覆されているホウ素被覆銀粉。
3. Boron trioxide, alkali metal and ammonium salts of boric acid, alkali metal salts of borohydride,
One of the carboranes is 0.01-0.1 as boron
Boron coated silver powder coated by weight%.
【請求項4】 銀粉と、三酸化二ホウ素、ホウ酸のアル
カリ金属及びアンモニウム塩、水素化ホウ素のアルカリ
金属塩、カルボランの内の一種の水溶液とを混合し乾燥
する請求項3に記載のホウ素被覆銀粉の製造方法。
4. The boron according to claim 3, wherein the silver powder is mixed with diboron trioxide, an alkali metal or ammonium salt of boric acid, an alkali metal salt of borohydride, or an aqueous solution of carborane and dried. Method for producing coated silver powder.
【請求項5】 銀イオンを含む溶液をホウ素を含む還元
剤で還元して出来たスラリーを洗浄程度を調節して洗浄
し、次いで乾燥する請求項3に記載のホウ素被覆銀粉の
製造方法。
5. The method for producing a boron-coated silver powder according to claim 3, wherein a slurry produced by reducing a solution containing silver ions with a reducing agent containing boron is washed by adjusting the washing degree and then dried.
【請求項6】 ホウ素を含む還元剤が水素化ホウ素ナト
リウム、ジメチルアミンボランである請求項5に記載の
ホウ素被覆銀粉の製造方法。
6. The method for producing a boron-coated silver powder according to claim 5, wherein the reducing agent containing boron is sodium borohydride or dimethylamine borane.
JP24626593A 1993-09-07 1993-09-07 Conductive paste composition, boron-coated silver powder used for the composition, and method for producing the silver powder Expired - Lifetime JP2636698B2 (en)

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JP2000030586A (en) * 1998-07-15 2000-01-28 Uchihashi Estec Co Ltd Manufacture of substrate type thermal fuse
JP2007250266A (en) * 2006-03-14 2007-09-27 Tokyo Gas Co Ltd Solid oxide fuel cell stack and its manufacturing method
CN104078095A (en) * 2014-06-30 2014-10-01 合肥中南光电有限公司 Conductive oxygen-free ceramic powder/nano-graphite composite conductive silver paste and preparing method thereof
CN104157324A (en) * 2014-07-30 2014-11-19 安徽状元郎电子科技有限公司 Chlorite powder conductive silver paste and manufacturing method thereof
CN104167238A (en) * 2014-06-30 2014-11-26 合肥中南光电有限公司 High-temperature-resistance low-square-resistance conductive silver slurry and preparation method for the same
JP2017120809A (en) * 2015-12-28 2017-07-06 株式会社村田製作所 Surface-mounted inductor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000030586A (en) * 1998-07-15 2000-01-28 Uchihashi Estec Co Ltd Manufacture of substrate type thermal fuse
JP2007250266A (en) * 2006-03-14 2007-09-27 Tokyo Gas Co Ltd Solid oxide fuel cell stack and its manufacturing method
CN104078095A (en) * 2014-06-30 2014-10-01 合肥中南光电有限公司 Conductive oxygen-free ceramic powder/nano-graphite composite conductive silver paste and preparing method thereof
CN104167238A (en) * 2014-06-30 2014-11-26 合肥中南光电有限公司 High-temperature-resistance low-square-resistance conductive silver slurry and preparation method for the same
CN104157324A (en) * 2014-07-30 2014-11-19 安徽状元郎电子科技有限公司 Chlorite powder conductive silver paste and manufacturing method thereof
CN104157324B (en) * 2014-07-30 2016-06-15 安徽状元郎电子科技有限公司 A kind of green mud stone powder conductive silver paste and preparation method thereof
JP2017120809A (en) * 2015-12-28 2017-07-06 株式会社村田製作所 Surface-mounted inductor

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