JPH0746853Y2 - Differential exhaust system - Google Patents

Differential exhaust system

Info

Publication number
JPH0746853Y2
JPH0746853Y2 JP1990124960U JP12496090U JPH0746853Y2 JP H0746853 Y2 JPH0746853 Y2 JP H0746853Y2 JP 1990124960 U JP1990124960 U JP 1990124960U JP 12496090 U JP12496090 U JP 12496090U JP H0746853 Y2 JPH0746853 Y2 JP H0746853Y2
Authority
JP
Japan
Prior art keywords
space
gate valve
vacuum region
vacuum
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990124960U
Other languages
Japanese (ja)
Other versions
JPH0480983U (en
Inventor
利治 畠中
雄一 藏谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1990124960U priority Critical patent/JPH0746853Y2/en
Publication of JPH0480983U publication Critical patent/JPH0480983U/ja
Application granted granted Critical
Publication of JPH0746853Y2 publication Critical patent/JPH0746853Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Sliding Valves (AREA)
  • Details Of Valves (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 この考案は、イオン源が大気圧下にある質量分析装置、
具体的には高周波誘導結合プラズマ質量分析装置(ICP-
MS)、液体クロマトグラフ質量分析装置(LC-MS)或い
は走査型電子顕微鏡、等の高真空状態の二つの空間と空
間を開閉する場合の差動排気系に関する。
[Detailed Description of the Invention] [Industrial field of application] The present invention relates to a mass spectrometer in which an ion source is under atmospheric pressure,
Specifically, a high frequency inductively coupled plasma mass spectrometer (ICP-
MS), a liquid chromatograph mass spectrometer (LC-MS), a scanning electron microscope, and the like, and two differential vacuum systems for opening and closing the two spaces in a high vacuum state.

〔従来の技術〕[Conventional technology]

高周波誘導結合プラズマ質量分析装置や液体クロマトグ
ラフ質量分析装置等では高真空下で試料分析を行う。即
ち、従来は第1図に示すように、ゲートバルブ5を矢印
方向に移動させてイオン源のある大気圧空間1と試料分
析室等の空間4とを遮断し、試料分析室等の空間4を油
拡散ポンプやターボ分子ポンプ等のポンプで真空引して
おいて、更に大気圧下にあった空間1及び初段真空領域
空間2をロータリーポンプで真空引きして真空状態と
し、前記ゲートバルブ5を更に移動させ該ゲートバルブ
5に穿設した穴51(後述)により両空間を連通させて両
空間を「開」状態としていた。そしてイオン化した試料
を空間1から初段真空領域2を通して試料分析室等の空
間4へと導く操作を行っていた。
A high-frequency inductively coupled plasma mass spectrometer, a liquid chromatograph mass spectrometer, and the like perform sample analysis under high vacuum. That is, conventionally, as shown in FIG. 1, the gate valve 5 is moved in the direction of the arrow to shut off the atmospheric pressure space 1 where the ion source is located and the space 4 such as the sample analysis chamber, and the space 4 such as the sample analysis chamber. Is evacuated by a pump such as an oil diffusion pump or a turbo molecular pump, and the space 1 and the first-stage vacuum region space 2 that were under atmospheric pressure are evacuated by a rotary pump to a vacuum state. Was further moved, and both spaces were communicated with each other by a hole 51 (described later) formed in the gate valve 5 to keep both spaces in an “open” state. Then, an operation of guiding the ionized sample from the space 1 to the space 4 such as the sample analysis chamber through the first stage vacuum region 2 was performed.

〔考案が解決しようとする課題〕[Problems to be solved by the device]

上記するように、試料分析室等の空間4とイオン源のあ
る大気圧空間1及び初段真空領域空間2を高真空状態と
してからゲートバルブ5を移動させる場合、ゲートバル
ブ5と初段真空領域空間2との間にデッドスペース3が
存在するため、該デッドスペース3の残存ガスが高真空
状態の試料分析室等の空間4に急激に流入する。そのた
めポンプ負荷が急変したり、真空度を低下させる等のト
ラブルが発生しやすいという問題があった。この考案は
かかる課題を解決するためになされたものであって、高
真空状態とした試料分析室等の空間4とデッドスペース
3を伴う初段真空領域空間2との両空間を連通させる場
合、このような真空度の低下や急激な圧力変動によるポ
ンプ負荷の急変を回避しスムーズに分析状態に移行する
ことのできる差動排気系を提供することを目的とする。
As described above, when the gate valve 5 is moved after the space 4 such as the sample analysis chamber, the atmospheric pressure space 1 with the ion source, and the first stage vacuum region space 2 are set to a high vacuum state, the gate valve 5 and the first stage vacuum region space 2 are moved. Since there is a dead space 3 between and, the residual gas in the dead space 3 suddenly flows into the space 4 such as the sample analysis chamber in a high vacuum state. Therefore, there are problems that the pump load is suddenly changed, and troubles such as lowering the degree of vacuum are likely to occur. The present invention has been made to solve such a problem, and in the case of connecting both the space 4 such as the sample analysis chamber in a high vacuum state and the first stage vacuum region space 2 with the dead space 3, An object of the present invention is to provide a differential evacuation system capable of avoiding a sudden change in pump load due to such a decrease in vacuum degree or abrupt pressure change and smoothly shifting to an analysis state.

〔課題を解決するための手段〕[Means for Solving the Problems]

即ち、この考案は上記課題を解決するために、差動排気
系が、大気圧下の空間と初段真空領域空間と高真空領域
空間が順に連設されている差動排気系であって、移動さ
せることにより「開」状態とする穴を穿設したゲートバ
ルブを前記初段真空領域空間と前記高真空領域空間の間
に有し、前記初段真空領域空間と前記ゲートバルブの間
に存在するデッドスペースと前記高真空領域空間との間
を、前記穴より先に連通させる小孔を前記ゲートバルブ
に穿設したことを特徴とする。
That is, in order to solve the above problems, the present invention is directed to a differential exhaust system in which a space under atmospheric pressure, a first stage vacuum region space, and a high vacuum region space are sequentially connected, A dead space existing between the first-stage vacuum region space and the high-vacuum region space, the gate valve having a hole formed by opening the first-stage vacuum region space and the high-vacuum region space. The gate valve is provided with a small hole for communicating between the high vacuum region space and the space before the hole.

〔作用〕[Action]

差動排気系を上記手段とすると、初段真空領域空間と高
真空領域空間の間を遮断状態として両空間を真空とする
際、少しゲートバルブを移動させ、先ず小さな孔を介し
て二つの真空室を連通させてデッドスペース領域の排気
を行う。そうすると、両真空領域空間を充分真空度の高
い状態でゲートバルブを開くことが可能となり瞬間的な
真空度の低下が起きたり、真空ポンプの負荷の急変がな
くなる。
When the differential evacuation system is used as the above means, when the space between the first-stage vacuum region space and the high-vacuum region space is shut off to make both spaces vacuum, the gate valve is moved a little and first the two vacuum chambers are passed through a small hole. Exhausts the dead space area. Then, the gate valve can be opened in a state in which both vacuum region spaces have a sufficiently high degree of vacuum, and a momentary drop in the degree of vacuum or a sudden change in the load on the vacuum pump is eliminated.

〔実施例〕〔Example〕

以下、この考案の具体的実施例について図面を参照して
説明する。
Hereinafter, a specific embodiment of the present invention will be described with reference to the drawings.

第1図はこの考案の差動排気系のイオン源のある大気圧
空間1と初段真空領域空間2と試料分析室等の高真空領
域空間4との間に設置されるゲートバルブ付近の断面略
図であり、第2図は第1図のゲートバルブ5の正面図で
ある。
FIG. 1 is a schematic cross-sectional view of the vicinity of a gate valve installed between an atmospheric pressure space 1 having an ion source of a differential exhaust system of the present invention, a first stage vacuum region space 2 and a high vacuum region space 4 such as a sample analysis chamber. FIG. 2 is a front view of the gate valve 5 of FIG.

このゲートバルブ5には、通常の試料分析室の高真空領
域空間4と初段真空領域空間2とを「開」とする穴51の
上部に小さな孔52(オリフィス)を穿設してある。即
ち、大気圧下の空間1のイオン源からイオンをサンプリ
ングし、質量分析計へ導入するシステムでは、イオン源
のある空間1と初段真空領域空間2とをロータリーポン
プ等で排気し、この初段領域領域2を数Torr程度の真空
に保ちゲートバルブ5を開くことで質量分析計の動作す
る真空度を維持している。この系で、ゲートバルブ5を
開く時に、該初段真空領域空間2と試料分析室等の高真
空領域空間4を隔てるゲートバルブ5との間のデッドス
ペース3が前記空間4よりも圧力が高い領域となりゲー
トバルブ5を開けるときに空間4の真空度に影響を及ぼ
す。
In this gate valve 5, a small hole 52 (orifice) is formed above a hole 51 that “opens” the high vacuum region space 4 and the first stage vacuum region space 2 of a normal sample analysis chamber. That is, in a system in which ions are sampled from the ion source in the space 1 under atmospheric pressure and introduced into the mass spectrometer, the space 1 with the ion source and the first stage vacuum region space 2 are evacuated by a rotary pump or the like, and the first stage region is exhausted. The region 2 is kept at a vacuum of about several Torr and the gate valve 5 is opened to maintain the degree of vacuum at which the mass spectrometer operates. In this system, when the gate valve 5 is opened, the dead space 3 between the first stage vacuum region space 2 and the gate valve 5 separating the high vacuum region space 4 such as the sample analysis chamber has a higher pressure than the space 4. Next, when the gate valve 5 is opened, the degree of vacuum in the space 4 is affected.

このデッドスペース3の真空度を上げるため、試料分析
室等の高真空領域空間4を真空排気する時にゲートバル
ブ2を第3図の遮断状態から第4図の状態まで移動させ
た状態で該ゲートバルブ5に穿設したオリフィス52で予
め排気する。そして第5図に示すように、デッドスペー
ス3を初段真空領域空間2と同等又はそれ以上の真空度
にした後、ゲートバルブ5を完全に開ける。
In order to increase the degree of vacuum in the dead space 3, the gate valve 2 is moved from the shut-off state shown in FIG. 3 to the state shown in FIG. 4 when the high vacuum region space 4 such as a sample analysis chamber is evacuated. The gas is exhausted in advance through the orifice 52 formed in the valve 5. Then, as shown in FIG. 5, after the dead space 3 is made to have a vacuum degree equal to or higher than that of the first stage vacuum region space 2, the gate valve 5 is completely opened.

その差動排気系では要するに、ゲートバルブ5に、初段
真空領域空間2と試料分析空間4とを開通させる穴51の
他に予備的に小さな孔52を穿設するものである。こうす
るとゲートバルブ5が移動するときに、先ず該オリフィ
ス52を介してデードスペース3領域の排気が行われ、こ
の結果、両空間を充分真空度の高い状態でゲートバルブ
5を開くことが可能となり瞬間的な真空度の低下が起き
なくなるのである。
In the differential evacuation system, in short, the gate valve 5 is preliminarily provided with a small hole 52 in addition to the hole 51 for opening the first stage vacuum region space 2 and the sample analysis space 4. By doing so, when the gate valve 5 moves, first, the exhaust of the dead space 3 region is performed through the orifice 52, and as a result, it becomes possible to open the gate valve 5 in a state where both spaces have a sufficiently high degree of vacuum. The instantaneous decrease in vacuum will not occur.

第6図と第7図はこの考案の差動排気バルブの変形実施
例図である。即ち、これらの図に示すように孔52(オリ
フィス)は大きな穴51につながるような縦方向(勿論、
横方向でも可)の長孔52′であっても或いは第2図の孔
52の代わりに長孔52″としても良く、その形状は問わな
い。
6 and 7 are views of a modified embodiment of the differential exhaust valve of the present invention. That is, as shown in these drawings, the hole 52 (orifice) is connected to the large hole 51 in the vertical direction (of course,
2) Even if it is a long hole 52 '(may be in the lateral direction)
A long hole 52 ″ may be used instead of 52, and the shape thereof does not matter.

〔考案の効果〕[Effect of device]

この考案の差動排気バルブは以上詳述したような構成と
したので、ゲートバルブ近くにデッドスペースが存在す
るために生じる真空度の低下、真空ポンプの負荷の急変
等がなくなる。また、最初の真空排気を始めてからゲー
トバルブを開きシステムが作動する状態に移行するのに
ようする時間を短縮することが出来る。
Since the differential exhaust valve of the present invention has the structure described in detail above, there is no reduction in the degree of vacuum or sudden change in the load of the vacuum pump, which is caused by the presence of dead space near the gate valve. Also, it is possible to shorten the time required to open the gate valve and shift to a state in which the system operates after the first evacuation.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの考案の差動排気系のイオン源のある空間と
試料分析室等の空間との間に設置されるゲートバルブ付
近の断面略図、第2図はゲートバルブの正面図、第3図
はゲートバルブを完全に閉鎖し二つの空間を遮断状態態
とした断面図、第4図はこの考案のゲートバルブに穿設
した孔(オリフィス)でデッドスペースの排気を行う時
の断面図、第5図は試料分析室等の空間とイオン源のあ
る空間との間を開通させた状態の断面図、第6図と第7
図はゲートバルブの変形実施例を示す図である。 1……イオン源のある空間、2……初段真空領域 3……デッドスペース、4……試料分析室等の空間 5……ゲートバルブ、51……ゲートバルブ穴 52……孔(オリフィス)
FIG. 1 is a schematic cross-sectional view of the vicinity of a gate valve installed between the space where the ion source of the differential exhaust system of the present invention is located and the space such as a sample analysis chamber, and FIG. 2 is a front view of the gate valve, and FIG. The figure is a cross-sectional view of the gate valve completely closed and the two spaces are in a shut-off state. Fig. 4 is a cross-sectional view of the gate valve of the present invention when the dead space is exhausted by an orifice (orifice). FIG. 5 is a sectional view showing a state in which a space such as a sample analysis room and a space where an ion source is provided are opened, FIGS. 6 and 7
The figure is a diagram showing a modification of the gate valve. 1 ... Space with ion source, 2 ... First-stage vacuum area 3 ... Dead space, 4 ... Space for sample analysis chamber, etc. 5 ... Gate valve, 51 ... Gate valve hole 52 ... Hole (orifice)

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】大気圧下の空間と初段真空領域空間と高真
空領域空間が順に連設されている差動排気系であって、
移動させることにより、「開」状態とする穴を穿設した
ゲートバルブを前記初段真空領域空間と前記高真空領域
空間の間に有し、前記初段真空領域空間と前記ゲートバ
ルブの間に存在するデッドスペースと前記高真空領域空
間との間を、前記穴より先に連通させる小孔を前記ゲー
トバルブに穿設したことを特徴とする差動排気系。
1. A differential evacuation system in which a space under atmospheric pressure, a first-stage vacuum region space, and a high-vacuum region space are connected in sequence,
A gate valve having a hole to be opened by moving is provided between the first-stage vacuum region space and the high-vacuum region space, and is present between the first-stage vacuum region space and the gate valve. A differential exhaust system characterized in that a small hole for communicating between the dead space and the high vacuum region space prior to the hole is formed in the gate valve.
JP1990124960U 1990-11-26 1990-11-26 Differential exhaust system Expired - Lifetime JPH0746853Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990124960U JPH0746853Y2 (en) 1990-11-26 1990-11-26 Differential exhaust system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990124960U JPH0746853Y2 (en) 1990-11-26 1990-11-26 Differential exhaust system

Publications (2)

Publication Number Publication Date
JPH0480983U JPH0480983U (en) 1992-07-14
JPH0746853Y2 true JPH0746853Y2 (en) 1995-10-25

Family

ID=31872586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990124960U Expired - Lifetime JPH0746853Y2 (en) 1990-11-26 1990-11-26 Differential exhaust system

Country Status (1)

Country Link
JP (1) JPH0746853Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7278444B2 (en) * 2005-02-22 2007-10-09 Mks Instruments, Inc. Valve assembly having improved pump-down performance

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5839885A (en) * 1981-08-31 1983-03-08 Shimadzu Corp Gate valve for pipeline
JPS58165584A (en) * 1982-03-26 1983-09-30 Tokuda Seisakusho Ltd Vacuum exhaust apparatus

Also Published As

Publication number Publication date
JPH0480983U (en) 1992-07-14

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