JPH0745690B2 - Manufacturing method of good electromagnetic thick plate - Google Patents

Manufacturing method of good electromagnetic thick plate

Info

Publication number
JPH0745690B2
JPH0745690B2 JP15671988A JP15671988A JPH0745690B2 JP H0745690 B2 JPH0745690 B2 JP H0745690B2 JP 15671988 A JP15671988 A JP 15671988A JP 15671988 A JP15671988 A JP 15671988A JP H0745690 B2 JPH0745690 B2 JP H0745690B2
Authority
JP
Japan
Prior art keywords
less
rolling
flux density
magnetic
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP15671988A
Other languages
Japanese (ja)
Other versions
JPH028324A (en
Inventor
幸男 冨田
良太 山場
幸夫 津田
達也 熊谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP15671988A priority Critical patent/JPH0745690B2/en
Priority to US07/368,031 priority patent/US4950336A/en
Priority to EP89111463A priority patent/EP0349853B1/en
Priority to DE68921377T priority patent/DE68921377T2/en
Publication of JPH028324A publication Critical patent/JPH028324A/en
Publication of JPH0745690B2 publication Critical patent/JPH0745690B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/12Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
    • C21D8/1216Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties the working step(s) being of interest
    • C21D8/1222Hot rolling
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D3/00Diffusion processes for extraction of non-metals; Furnaces therefor
    • C21D3/02Extraction of non-metals
    • C21D3/06Extraction of hydrogen

Description

【発明の詳細な説明】 [産業上の利用分野] 近年最先端科学技術である素粒子研究や医療機器の進歩
に伴って、大型構造物に磁気を用いる装置が使われ、そ
の性能向上が求められている。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] In recent years, along with the progress of elementary particle research and medical equipment, which are the most advanced science and technology, devices that use magnetism for large structures are used, and it is necessary to improve their performance. Has been.

本発明はここにおいて直流磁化条件で使用される磁石の
鉄心用、あるいは磁場を遮蔽するのに必要な磁気シール
ド用の磁束密度の高い電磁厚鋼板の製造法に関するもの
である。
The present invention relates to a method for manufacturing an electromagnetic thick steel plate having a high magnetic flux density for an iron core of a magnet used under a DC magnetization condition or for a magnetic shield necessary for shielding a magnetic field.

[従来の技術] 磁束密度に優れた電磁鋼板としては、従来から薄板分野
で珪素鋼板、電磁軟鉄板をはじめとする数多くの材料が
提供されているのは公知である。しかし、構造部材とし
て使用するには組み立て加工及び強度上の問題があり、
厚鋼板を利用する必要が生じてくる。これまで電磁厚板
としては鈍鉄系成分で製造されている。たとえば、特開
昭60−96749号公報が公知である。
[Prior Art] As magnetic steel sheets having excellent magnetic flux density, it is well known that a number of materials such as silicon steel sheets and electromagnetic soft iron sheets have been provided in the field of thin sheets. However, there are problems in assembly processing and strength when used as a structural member,
It becomes necessary to use thick steel plates. Up to now, electromagnetic thick plates have been manufactured with blunt iron-based components. For example, JP-A-60-96749 is known.

しかしながら、近年の装置の大型化、能力の向上等に伴
いさらに磁気特性の優れた、とくに低磁場、たとえば80
A/mでの磁束密度の高く、かつ、保磁力の低い、たとえ
ば、65A/m以下、鋼材開発の要望が強い。前掲の特許等
で開発された鋼材では、80A/mでの低磁場での高い磁束
密度が安定して得られない。
However, with the recent increase in size of equipment and improvement in performance, magnetic properties are even better, especially in low magnetic fields, such as 80
The magnetic flux density at A / m is high and the coercive force is low, for example, 65 A / m or less, and there is a strong demand for steel material development. The steel materials developed by the above patents cannot stably obtain a high magnetic flux density at a low magnetic field of 80 A / m.

[発明が解決しようとする課題] 本発明の目的は以上の点を鑑みなされたもので、低磁場
での磁束密度の高く、保磁力の低い、その板厚方向での
磁気特性差の少ない良電磁厚板の製造法を提供すること
にある。
[Problems to be Solved by the Invention] The object of the present invention is made in view of the above points, and is good in that the magnetic flux density is high in a low magnetic field, the coercive force is low, and the magnetic characteristic difference in the plate thickness direction is small. It is to provide a manufacturing method of an electromagnetic thick plate.

[課題を解決するための手段] 本発明の要旨は以下の通りである。[Means for Solving the Problems] The gist of the present invention is as follows.

(1)重量%で、C:0.01%以下、Si:0.02%以下、Mn:0.
20%以下、P:0.015%以下、S:0.010%以下、Cr:0.05%
以下、Mo:0.01%以下、Cu:0.01%以下、Ni:0.1〜2.0
%、Al:0.005〜0.040%、N:0.004%以下、O:0.005%以
下、H:0.0002%以下、残部実質的に鉄からなる鋼組成の
鋼片または、鋳片を1150〜1300℃に加熱し、仕上げ温度
を900℃以上となる条件下で圧延形状比Aが0.7以上の圧
延パスが1回以上はとる圧延を行い、板厚50mm以上の厚
板として、600〜750℃の脱水素熱処理を行うことを特徴
とする磁場80A/mでの磁束密度が0.8テスラ以上の磁気特
性と低い保磁力を有する良電磁厚板の製造法。
(1) In% by weight, C: 0.01% or less, Si: 0.02% or less, Mn: 0.
20% or less, P: 0.015% or less, S: 0.010% or less, Cr: 0.05%
Below, Mo: 0.01% or less, Cu: 0.01% or less, Ni: 0.1 to 2.0
%, Al: 0.005 to 0.040%, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, the balance is a steel composition of steel or a slab heated to 1150 to 1300 ° C. Then, under the condition that the finishing temperature is 900 ° C or higher, rolling with a rolling shape ratio A of 0.7 or more and one or more rolling passes is performed, and a dehydrogenation heat treatment at 600 to 750 ° C is performed as a plate with a thickness of 50 mm or more. A method of manufacturing a good electromagnetic thick plate having magnetic properties with a magnetic flux density of 0.8 Tesla or more at a magnetic field of 80 A / m and a low coercive force.

ただし、 A:圧延形状比 hi:入側板厚(mm) ho:出側板厚(mm) R:圧延ロール半径(mm) (2)板厚50mm以上の厚板を脱水素熱処理後、750〜950
℃で焼鈍するか、あるいは910〜1000℃で焼準すること
を特徴とする(1)記載の磁場80A/mでの磁束密度が0.8
テスラ以上の磁気特性と低い保磁力を有する良電磁厚板
の製造法。
However, A: Rolling shape ratio h i : Inlet side plate thickness (mm) h o : Outlet side plate thickness (mm) R: Rolling roll radius (mm) (2) After dehydrogenation heat treatment of plates with a thickness of 50 mm or more, 750 to 950
The magnetic flux density at a magnetic field of 80 A / m described in (1) is 0.8, which is characterized by annealing at ℃ or normalizing at 910 to 1000 ℃.
A method of manufacturing a good electromagnetic thick plate with magnetic characteristics superior to Tesla and low coercive force.

(3)重量%で、C:0.01%以下、Si:0.02%以下、Mn:0.
20%以下、P:0.015%以下、S:0.010%以下、Cr:0.05%
以下、Mo:0.01%以下、Cu:0.01%以下、Ni:0.1〜2.0
%、Al:0.005〜0.040%、N:0.004%以下、O:0.005%以
下、H:0.0002%以下、残部実質的に鉄からなる鋼組成の
鋼片または、鋳片を1150〜1300℃に加熱し、仕上げ温度
を900℃以上となる条件下で圧延形状比Aが0.7以上の圧
延パスが1回以上はとる圧延を行い、板厚20mm以上50mm
未満の厚板として、750〜950℃で焼鈍するかあるいは91
0〜1000℃で焼準することを特徴とする磁場80A/mでの磁
束密度が0.8テスラ以上の磁気特性と低い保磁力を有す
る良電磁厚板の製造法。
(3) C: 0.01% or less, Si: 0.02% or less, Mn: 0.
20% or less, P: 0.015% or less, S: 0.010% or less, Cr: 0.05%
Below, Mo: 0.01% or less, Cu: 0.01% or less, Ni: 0.1 to 2.0
%, Al: 0.005 to 0.040%, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, the balance is a steel composition of steel or a slab heated to 1150 to 1300 ° C. Then, under the condition that the finishing temperature is 900 ℃ or more, the rolling shape ratio A is 0.7 or more, and the rolling pass takes at least one rolling pass, and the plate thickness is 20mm or more and 50mm or more.
For thick plates of less than 750-950 ℃, or 91
A method for manufacturing a good electromagnetic thick plate having magnetic properties with a magnetic flux density of 0.8 Tesla or more at a magnetic field of 80 A / m and low coercive force, characterized by normalizing at 0 to 1000 ° C.

ただし、 A:圧延形状比 hi:入側板厚(mm) ho:出側板厚(mm) R:圧延ロール半径(mm) [作用] まず、低磁場での磁束密度を高くするために磁化のプロ
セスについて述べると、消磁状態の鋼を磁界の中に入
れ、磁界を強めていくと次第に磁区の向きに変化が生
じ、磁界の方向に近い磁区が優勢になり他の磁区を蚕食
併合していく。つまり、磁壁の移動が起こる。
However, A: Rolling shape ratio h i : Inlet plate thickness (mm) h o : Outlet plate thickness (mm) R: Rolling roll radius (mm) [Operation] First, the magnetization process to increase the magnetic flux density in a low magnetic field. For example, when demagnetized steel is put in a magnetic field and the magnetic field is strengthened, the direction of the magnetic domain gradually changes, and the magnetic domain close to the direction of the magnetic field becomes dominant and the other magnetic domains are annealed. That is, the domain wall moves.

さらに磁界が強くなり磁壁の移動が完了すると、次に磁
区全体の磁力方向が向きを変えていく。この磁化プロセ
スの中で低磁場での磁束密度を決めるのは、磁壁の移動
しやすさである。つまり低磁場で高磁場密度を得るため
には磁壁の移動を障害するものを極力減らすことである
と定性的に言うことができる。
When the magnetic field becomes stronger and the movement of the domain wall is completed, the direction of the magnetic force of the entire magnetic domain changes direction. It is the ease of movement of the domain wall that determines the magnetic flux density in the low magnetic field in this magnetization process. In other words, it can be qualitatively said that in order to obtain a high magnetic field density in a low magnetic field, it is necessary to reduce as much as possible what hinders the movement of the domain wall.

発明者らはここにおいて低磁場で高磁束密度を有し、か
つ、低保磁力を有する厚鋼板を得るための手段として、
内部応力の原因となる元素、空隙性欠陥及び合金元素の
利用につき、詳細な検討を行い、所期の目的を達するこ
とに成功したものである。
The inventors here have a high magnetic flux density in a low magnetic field, and as a means for obtaining a thick steel sheet having a low coercive force,
We have made detailed studies on the utilization of elements that cause internal stress, void defects, and alloying elements, and have succeeded in achieving the intended purpose.

即ち、粗粒化のためには、結晶粒微細化作用を有するAl
Nを減少するため、Al,Nを低下すること、及び製造方法
としては、加熱温度を極力上げ加熱オーステナイト粒の
粗大化、圧延仕上げ温度を極力高めにし、圧延による結
晶粒の微細化を防止すること並びに圧延後の焼鈍をする
ことである。
That is, for coarsening, Al having a grain refining effect is used.
To reduce N, reduce Al, N, and as a manufacturing method, raise the heating temperature as much as possible, coarsen the heating austenite grains, raise the rolling finishing temperature as much as possible, and prevent the grain refinement due to rolling. And annealing after rolling.

次に内部応力減少のためには、Cの低下が必要である。
第1図に示す0.01Si−0.1Mn−0.01Al鋼にあってC含有
量の増加につれ低磁場(80A/m)での磁束密度が低下す
ることがわかる。
Next, in order to reduce the internal stress, it is necessary to reduce C.
It can be seen that in the 0.01Si-0.1Mn-0.01Al steel shown in Fig. 1, the magnetic flux density in a low magnetic field (80A / m) decreases as the C content increases.

さらに鋼中の水素の存在も有害で、第2図に示すよう
に、脱水素熱処理を行うことによって磁気特性が大幅に
向上することを知見した。
Furthermore, it was found that the presence of hydrogen in the steel is also harmful, and as shown in FIG. 2, the magnetic properties are significantly improved by performing the dehydrogenation heat treatment.

第2図で示すように0.007C−0.01Si−0.1Mn鋼にあっ
て、高形状比圧延により空隙性欠陥のサイズを100μ以
下にし、かつ、脱水素熱処理により鋼中水素を減少する
ことで内部応力も減少し低磁場での磁束密度が大幅に上
昇することがわかる。
As shown in Fig. 2, in 0.007C-0.01Si-0.1Mn steel, the size of void defects is reduced to 100μ or less by high shape ratio rolling, and the hydrogen content in the steel is reduced by dehydrogenation heat treatment. It can be seen that the stress also decreases and the magnetic flux density in a low magnetic field increases significantly.

空隙性欠陥の影響についても種々検討した結果、そのサ
イズが100μ以上のものが磁気特性を大幅に低下するこ
とを知見した。そしてこの100μ以上の有害な空隙性欠
陥をなくすためには、圧延形状比Aが0.7以上必要であ
ることを見出した。
As a result of various studies on the effect of void defects, it was found that the magnetic properties were significantly reduced when the size was 100 μ or more. It was found that the rolled shape ratio A needs to be 0.7 or more in order to eliminate the harmful void defects of 100 μ or more.

さらに、磁気特性の均質性を確保することも重要である
が、本発明による方法によれば、これに対しても極めて
有効な手段である。
Furthermore, it is important to ensure the homogeneity of the magnetic properties, but the method according to the present invention is an extremely effective means for this.

さらに、保磁力を低くし、かつ低磁場での磁束密度を低
下させない元素として種々検討した結果、第3図に示す
ようにNiが最適であることを知見した。
Furthermore, as a result of various studies as an element that reduces the coercive force and does not reduce the magnetic flux density in a low magnetic field, it was found that Ni is optimal as shown in FIG.

次に本発明の成分限定理由をのべる。Next, the reasons for limiting the components of the present invention will be given.

Cは鋼中の内部応力を高め、磁気特性とくに低磁場での
磁束密度を最も下げる元素であり、極力下げることが低
磁場での磁束密度を低下させないことに寄与する。ま
た、磁気時効の点からも低いほど経時劣化が少なく、磁
気特性の良い状態で恒久的に使用できるものであり、こ
のようなことから0.010%以下に限定する。第1図に示
すようにさらに0.005%以下にすることにより一層高磁
束密度が得られる。
C is an element that increases the internal stress in steel and lowers the magnetic characteristics, particularly the magnetic flux density in a low magnetic field, and the lowest reduction contributes to not lowering the magnetic flux density in a low magnetic field. In addition, the lower the magnetic aging is, the less the deterioration with time is, and the permanent magnet can be used with good magnetic properties. Therefore, the content is limited to 0.010% or less. As shown in FIG. 1, a higher magnetic flux density can be obtained by further reducing the content to 0.005% or less.

Si,Mnは低磁場での磁束密度の点から少ない方が好まし
く、MnはMnS系介在物を生成する点からも低い方がよ
い。この意味からSiは0.02%以下、Mnは0.20%以下に限
定する。Mnに関してはMnS系介在物を生成する点よりさ
らに望ましくは0.10%以下がよい。
Si and Mn are preferably as small as possible from the viewpoint of magnetic flux density in a low magnetic field, and Mn is preferably as low as MnS-based inclusions are generated. From this meaning, Si is limited to 0.02% or less and Mn is limited to 0.20% or less. Mn is more preferably 0.10% or less from the viewpoint of forming MnS inclusions.

P,S,Oは鋼中において非金属介在物を形成し、かつ偏析
することにより磁壁の移動を妨げる害を及ぼし含有量が
多くなるに従って磁束密度の低下が見られ、磁気特性を
低下させるので少ないほどよい。このためPは0.015%
以下、Sは0.010%以下、Oは0.005%以下とした。
P, S and O form non-metallic inclusions in steel and segregate to hinder the movement of the domain wall, and as the content increases, the magnetic flux density decreases and the magnetic properties decrease. The less the better. Therefore, P is 0.015%
Hereinafter, S is 0.010% or less and O is 0.005% or less.

Cr,Mo,Cuは低磁場での磁束密度を低下させるので少ない
程好ましく、また偏析度合を少なくすることから極力低
くすることが必要であり、この意味からCrは0.05%以
下、Moは0.01%以下、Cuは0.01%以下とする。
Cr, Mo, Cu decrease the magnetic flux density in a low magnetic field, so the smaller the better, and it is necessary to make it as low as possible in order to reduce the degree of segregation. From this meaning, Cr is 0.05% or less, Mo is 0.01%. Hereinafter, Cu is 0.01% or less.

Niは保磁力を低下させ、かつ、低磁場での磁束密度を低
下させない元素として不可欠なもので、保磁力を低下さ
せるためには0.1%以上添加させる必要がある。2.0%以
上添加すると保磁力の上昇と低磁場での磁束密度を低下
させるので、0.1〜2.0%に限定する。また、これによっ
て磁気特性を低下させずに強度をあげることが可能であ
り、望ましくは1.0〜2.0%である。
Ni is indispensable as an element that lowers the coercive force and does not lower the magnetic flux density in a low magnetic field, and it is necessary to add 0.1% or more in order to lower the coercive force. Addition of 2.0% or more lowers the coercive force and the magnetic flux density in a low magnetic field, so the content is limited to 0.1 to 2.0%. Further, this makes it possible to increase the strength without deteriorating the magnetic characteristics, and is preferably 1.0 to 2.0%.

Alは脱酸剤として用いるもので本発明の如く板厚の厚い
場合には、内質の均質化に不可欠の元素であり、0.005
%以上添加されるが、多くなりすぎると介在物を生成し
鋼の性質を損なうので上限は0.040%以下とする。さら
に結晶粒微細化作用を有するAlNを減少させるためには
望ましくは0.020%以下がよい。
Al is used as a deoxidizing agent and is an element indispensable for homogenizing the internal quality when the plate thickness is large as in the present invention.
% Is added, but if it is too much, inclusions are formed and the properties of the steel are impaired, so the upper limit is made 0.040% or less. Further, in order to reduce AlN having a grain refining effect, 0.020% or less is desirable.

Nは内部応力を高めかつAlNにより結晶粒微細化作用に
より、低磁場での磁束密度を低下させるので上限は0.00
4%以下とする。
N increases the internal stress and reduces the magnetic flux density in a low magnetic field by the grain refining action of AlN, so the upper limit is 0.00.
4% or less.

Hは電磁特性を低下させ、かつ、空隙性欠陥の減少を妨
げるので0.0002%以下とする。
H reduces the electromagnetic characteristics and prevents the reduction of void defects, so H content is set to 0.0002% or less.

次に製造法について述べる。Next, the manufacturing method will be described.

圧延条件については、まず圧延前加熱温度を1150℃以上
にするのは加熱オーステナイト粒を粗大化し磁気特性を
よくするためである。1300℃を超す加熱はスケールロス
の防止、省エネルギーの観点から不必要であるため上限
を1300℃とした。
Regarding the rolling conditions, first, the heating temperature before rolling is set to 1150 ° C. or higher in order to coarsen the heated austenite grains and improve the magnetic properties. Heating above 1300 ° C is unnecessary from the viewpoints of preventing scale loss and saving energy, so the upper limit was made 1300 ° C.

圧延仕上げ温度については、900℃以下の仕上げでは低
温圧延により結晶粒が微細化し、磁気特性が低下するた
め結晶粒の粗大化による磁束密度の上昇を狙い900℃と
した。
The rolling finishing temperature was set to 900 ° C in order to increase the magnetic flux density due to the coarsening of the crystal grains because the crystal grains become finer and the magnetic properties deteriorate due to the low temperature rolling in the finish of 900 ° C or less.

さらに熱間圧延にあたり前述の空隙性欠陥は鋼の凝固過
程で大小はあるが、必ず発生するものであり、これをな
くす手段は圧延によらなければならないので熱間圧延の
役目は重要である。すなわち、熱間圧延1回当たりの変
形量を大きくし板厚中心部にまで変形が及ぶ熱間圧延が
有効である。
Further, in the hot rolling, the above-mentioned void defects are always generated in the solidification process of steel, but they always occur, and the role of hot rolling is important because the means for eliminating them must be done by rolling. That is, it is effective to increase the amount of deformation per hot rolling so that the deformation reaches the center of the plate thickness.

具体的には圧延形状比Aが0.7以上の圧延パスが1回以
上を含む高形状比圧延を行い、空隙性欠陥のサイズを10
0μ以下にすることが電磁特性によい。圧延中にこの高
形状比圧延により空隙性欠陥をなくすことで、後で行う
脱水素熱処理における脱水素効率が飛躍的に上昇するの
である。
Specifically, high shape ratio rolling including one or more rolling passes with a rolling shape ratio A of 0.7 or more is performed to reduce the size of void defects to 10
Setting it to 0 μ or less is good for electromagnetic characteristics. By eliminating the void defects by the high shape ratio rolling during rolling, the dehydrogenation efficiency in the dehydrogenation heat treatment to be performed later is dramatically increased.

次に熱間圧延に引き続き結晶粒粗大化、内部歪除去及び
板厚50mm以上の厚手材については脱水素熱処理を施す。
板厚50mm以上では水素の拡散がしにくく、これが空隙性
欠陥の原因となり、かつ、水素自身の作用と合わさって
低磁場での磁束密度を低下させる。
Then, following hot rolling, grain coarsening, internal strain removal, and dehydrogenation heat treatment are applied to thick materials with a plate thickness of 50 mm or more.
When the plate thickness is 50 mm or more, it is difficult for hydrogen to diffuse, which causes void defects and, together with the action of hydrogen itself, reduces the magnetic flux density in a low magnetic field.

このため、脱水素熱処理を行うがこの脱水素熱処理温度
としては、600℃未満では脱水素効率が悪く、750℃超で
は変態が一部開始するので600〜750℃の温度範囲で行
う。脱水素時間としては種々検討の結果〔0.6(t−5
0)+6〕時間(t:板厚)が適当である。
For this reason, dehydrogenation heat treatment is performed, but if the dehydrogenation heat treatment temperature is less than 600 ° C, the dehydrogenation efficiency is poor, and if it exceeds 750 ° C, the transformation partially starts, so the temperature is in the range of 600 to 750 ° C. As the dehydrogenation time, various examination results [0.6 (t-5
0) +6] Time (t: plate thickness) is appropriate.

焼鈍は結晶粒粗大化及び内部歪除去のために行うが、75
0℃未満では結晶粒粗大化が起こらず、また、950℃以上
では結晶粒の板厚方向の均質性が保てないため、焼鈍温
度としては750〜950℃に限定する。
Annealing is performed for grain coarsening and internal strain removal.
If the temperature is lower than 0 ° C., the crystal grains do not coarsen, and if the temperature is 950 ° C. or higher, the uniformity of the crystal grains in the plate thickness direction cannot be maintained. Therefore, the annealing temperature is limited to 750 to 950 ° C.

焼準は板厚方向の結晶粒調整及び内部歪除去のために行
うが、Ac3点の910℃以上でかつ1000℃以下でないと結晶
粒の板厚方向の均質性が保てないので、焼準温度は910
〜1000℃に限定する。910℃未満ではオーステナイト域
とフェライト域の混在により結晶粒が混粒となり、1000
℃超では結晶粒の板厚方向の均質性が保てない。なお、
磁気特性向上のためには、結晶粒粗大化と内部歪み除去
とが考えられるが、特に内部歪み除去は必須条件であ
る。内部歪み除去は、板厚50mm以上厚手材では脱水素熱
処理を行うことができる。したがって、本発明の厚手材
では脱水素熱処理で、上記焼鈍あるいは焼準を兼ねるこ
とができる。
Normalization is performed to adjust the crystal grains in the plate thickness direction and remove internal strain, but if the temperature is not less than 910 ° C and not more than 1000 ° C of the Ac 3 point, the uniformity of the crystal grains in the plate thickness direction cannot be maintained. Sub-temperature is 910
Limited to ~ 1000 ° C. Below 910 ° C, the austenite and ferrite regions are mixed and the crystal grains become mixed.
If the temperature exceeds ℃, the homogeneity of the crystal grains in the plate thickness direction cannot be maintained. In addition,
In order to improve the magnetic properties, coarsening of crystal grains and removal of internal strain can be considered, but removal of internal strain is an essential condition. For removing internal strain, dehydrogenation heat treatment can be performed on a thick material having a plate thickness of 50 mm or more. Therefore, in the thick material of the present invention, the dehydrogenation heat treatment can also serve as the above-mentioned annealing or normalization.

一方、板厚20mm以上50mm未満のものは脱水素が容易なた
め、脱水素熱処理は不要で前述の焼鈍または焼準を施せ
ば良い。
On the other hand, a sheet having a plate thickness of 20 mm or more and less than 50 mm can be easily dehydrogenated, so dehydrogenation heat treatment is not necessary and the above annealing or normalization may be performed.

[実 施 例] 第1表に電磁厚板の製造条件とフェライト粒径、低磁場
での磁束密度を示す。
[Examples] Table 1 shows the manufacturing conditions of the electromagnetic thick plate, the ferrite grain size, and the magnetic flux density in a low magnetic field.

例1〜10は本発明の実施例を示し、例11〜31は比較例を
示す。例1〜5は板厚100mmに仕上げたもので、均一か
つ粗粒で低磁場での磁束密度が高く保磁力は低い。例1
に比べ、さらに例2は低C、例3,4は低Mn、例5は低Al
であり、より低磁場での磁束密度が高い。例6〜8は50
0mm、例9は40mm、例10は20mmに仕上げたもので、均一
かつ粗粒で低磁場での磁束密度が高く保磁力は低い。
Examples 1 to 10 show examples of the present invention, and Examples 11 to 31 show comparative examples. Examples 1 to 5 are finished to a plate thickness of 100 mm and have uniform and coarse grains, high magnetic flux density in a low magnetic field, and low coercive force. Example 1
Compared to the above, Example 2 has low C, Examples 3 and 4 have low Mn, and Example 5 has low Al.
And the magnetic flux density in a lower magnetic field is high. Example 6-8 is 50
0 mm, Example 9 is 40 mm, and Example 10 is 20 mm, and it is uniform and coarse and has a high magnetic flux density in a low magnetic field and a low coercive force.

の磁束密度及び固有抵抗値が高い。Has high magnetic flux density and specific resistance.

例11はCが高く、例12はSiが高く、例13はMnが高く、例
14はPが高く、例15はSが高く、例16はCrが高く、例17
はMoが高く、例18はCuが高く、それぞれ上限を超えるの
で低磁場での磁束密度が低く保磁力が高い。例19はNiが
低く下限をきるので低磁場での磁束密度は高いが保磁力
が高い。
Example 11 has high C, Example 12 has high Si, and Example 13 has high Mn.
14 has a high P, Example 15 has a high S, Example 16 has a high Cr, and Example 17
Has a high Mo content, and Example 18 has a high Cu content, and each exceeds the upper limit, so that the magnetic flux density in a low magnetic field is low and the coercive force is high. In Example 19, since Ni is low and exceeds the lower limit, the magnetic flux density is high in a low magnetic field but the coercive force is high.

例20はNiが高く上限を超えるので低磁場での磁束密度が
低く、かつ、保磁力が高い。例21はAlが高く、例22はN
が高く、例23はOが高く、例24はHが高く、それぞれ上
限を超えるため低磁場での磁束密度が低くなっている。
例25は加熱温度が下限をはずれ、例26は圧延仕上げ温度
が下限をはずれ、例27は最大形状比が下限をはずれ、例
28は脱水素熱処理温度が下限をはずれ、例29は焼準温度
が下限をはずれ、例30は焼準温度が上限を超え、例31は
脱水素熱処理がないため低磁場での磁束密度が低くなっ
ている。
In Example 20, since Ni is high and exceeds the upper limit, the magnetic flux density in a low magnetic field is low and the coercive force is high. Example 21 is high in Al, and Example 22 is N
Is high, Example 23 has a high O, and Example 24 has a high H, and since the respective upper limits are exceeded, the magnetic flux density in a low magnetic field is low.
In Example 25, the heating temperature is below the lower limit, in Example 26, the rolling finish temperature is below the lower limit, and in Example 27, the maximum shape ratio is below the lower limit.
In 28, the dehydrogenation heat treatment temperature is out of the lower limit, in Example 29, the normalization temperature is out of the lower limit, in Example 30, the normalization temperature exceeds the upper limit, and in Example 31, there is no dehydrogenation heat treatment, so the magnetic flux density is low in a low magnetic field. Has become.

[発明の効果] 以上詳細に述べた如く、本発明によれば適切な成分限定
により、板厚の厚い厚鋼板に均質な高電磁特性を具備せ
しめることに成功し、直流磁化による磁気性質を利用す
る構造物に適用可能としたものであり、かつその製造法
も前述の成分限定と、熱間圧延後結晶粒調整及び脱水素
熱処理を同時に行う方式であり、極めて経済的な製造法
を提供するもので産業上多大な効果を奏するものであ
る。
[Effects of the Invention] As described in detail above, according to the present invention, it has been possible to provide a thick steel plate having a large thickness with uniform high electromagnetic characteristics by appropriately limiting the components, and to utilize the magnetic properties of direct current magnetization. It is applicable to a structure that has the above-mentioned structure, and its manufacturing method is a method of simultaneously limiting the above-mentioned components and simultaneously performing crystal grain adjustment and dehydrogenation heat treatment after hot rolling, which provides an extremely economical manufacturing method. It has a great industrial effect.

【図面の簡単な説明】[Brief description of drawings]

第1図は80A/mにおける磁束密度に及ぼすC含有量の影
響を示すグラフ、第2図は80A/mにおける磁束密度に及
ぼす空隙性欠陥のサイズ及び脱水素熱処理の影響を示す
グラフ、第3図は保磁力に及ぼすNi含有量の影響を示す
グラフである。
FIG. 1 is a graph showing the effect of C content on the magnetic flux density at 80 A / m, and FIG. 2 is a graph showing the effect of void defect size and dehydrogenation heat treatment on the magnetic flux density at 80 A / m. The figure is a graph showing the effect of Ni content on coercive force.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】重量%で、 C:0.01%以下、 Si:0.02%以下、 Mn:0.20%以下、 P:0.015%以下、 S:0.010%以下、 Cr:0.05%以下、 Mo:0.01%以下、 Cu:0.01%以下、 Ni:0.1〜2.0%、 Al:0.005〜0.040%、 N:0.004%以下、 O:0.005%以下、 H:0.0002%以下、 残部実質的に鉄からなる鋼組成の鋼片または、鋳片を11
50〜1300℃に加熱し、仕上げ温度を900℃以上となる条
件下で圧延形状比Aが0.7以上の圧延パスが1回以上は
とる圧延を行い、板厚50mm以上の厚板として、600〜750
℃の脱水素熱処理を行うことを特徴とする磁場80A/mで
の磁束密度が0.8テスラ以上の磁気特性と低い保磁力を
有する良電磁厚板の製造法。 ただし、 A:圧延形状比 hi:入側板厚(mm) ho:出側板厚(mm) R:圧延ロール半径(mm)
1. By weight%, C: 0.01% or less, Si: 0.02% or less, Mn: 0.20% or less, P: 0.015% or less, S: 0.010% or less, Cr: 0.05% or less, Mo: 0.01% or less. , Cu: 0.01% or less, Ni: 0.1 to 2.0%, Al: 0.005 to 0.040%, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, the balance is steel having a steel composition consisting essentially of iron. 11 pieces or pieces
Rolling is performed by heating to 50 to 1300 ° C, and with a finishing temperature of 900 ° C or more, with a rolling shape ratio A of 0.7 or more and at least one rolling pass, and as a thick plate of 50 mm or more, 600 to 750
A method for manufacturing a good electromagnetic thick plate having magnetic properties with a magnetic flux density of 0.8 Tesla or more at a magnetic field of 80 A / m and low coercive force, which is characterized by performing dehydrogenation heat treatment at ℃. However, A: Rolling shape ratio h i : Strip thickness (mm) h o : Strip thickness (mm) R: Rolling roll radius (mm)
【請求項2】板厚50mm以上の厚板を脱水素熱処理後、75
0〜950℃で焼鈍するか、あるいは910〜1000℃で焼準す
ることを特徴とする請求項1記載の磁場80A/mでの磁束
密度が0.8テスラ以上の磁気特性と低い保磁力を有する
良電磁厚板の製造法。
2. After dehydrogenation heat treatment of a thick plate having a thickness of 50 mm or more, 75
The magnetic material having a magnetic flux density of 0.8 Tesla or more at a magnetic field of 80 A / m according to claim 1, which is annealed at 0 to 950 ° C or normalized at 910 to 1000 ° C, and has a low coercive force. Manufacturing method of electromagnetic plate.
【請求項3】重量%で、 C:0.01%以下、 Si:0.02%以下、 Mn:0.20%以下、 P:0.015%以下、 S:0.010%以下、 Cr:0.05%以下、 Mo:0.01%以下、 Cu:0.01%以下、 Ni:0.1〜2.0%、 Al:0.005〜0.040%、 N:0.004%以下、 O:0.005%以下、 H:0.0002%以下、 残部実質的に鉄からなる鋼組成の鋼片または、鋳片を11
50〜1300℃に加熱し、仕上げ温度を900℃以上となる条
件下で圧延形状比Aが0.7以上の圧延パスが1回以上は
とる圧延を行い、板厚20mm以上50mm未満の厚板として、
750〜950℃で焼鈍するかあるいは910〜1000℃で焼準す
ることを特徴とする磁場80A/mでの磁束密度が0.8テスラ
以上の磁気特性と低い保磁力を有する良電磁厚板の製造
法。 ただし、 A:圧延形状比 hi:入側板厚(mm) ho:出側板厚(mm) R:圧延ロール半径(mm)
3. By weight%, C: 0.01% or less, Si: 0.02% or less, Mn: 0.20% or less, P: 0.015% or less, S: 0.010% or less, Cr: 0.05% or less, Mo: 0.01% or less. , Cu: 0.01% or less, Ni: 0.1 to 2.0%, Al: 0.005 to 0.040%, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, the balance is steel having a steel composition consisting essentially of iron. 11 pieces or pieces
Rolling is performed by heating to 50 to 1300 ° C and rolling at a finishing shape temperature of 900 ° C or more with at least one rolling pass with a rolling shape ratio A of 0.7 or more, and as a thick plate of 20 mm or more and less than 50 mm,
A method for manufacturing a good electromagnetic thick plate having magnetic properties with a magnetic flux density of 0.8 Tesla or more at a magnetic field of 80 A / m and low coercive force, characterized by being annealed at 750 to 950 ℃ or normalized at 910 to 1000 ℃ . However, A: Rolling shape ratio h i : Strip thickness (mm) h o : Strip thickness (mm) R: Rolling roll radius (mm)
JP15671988A 1988-06-24 1988-06-27 Manufacturing method of good electromagnetic thick plate Expired - Lifetime JPH0745690B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP15671988A JPH0745690B2 (en) 1988-06-27 1988-06-27 Manufacturing method of good electromagnetic thick plate
US07/368,031 US4950336A (en) 1988-06-24 1989-06-19 Method of producing non-oriented magnetic steel heavy plate having high magnetic flux density
EP89111463A EP0349853B1 (en) 1988-06-24 1989-06-23 Method of producing non-oriented magnetic steel heavy plate having high magnetic flux density
DE68921377T DE68921377T2 (en) 1988-06-24 1989-06-23 Process for the production of non-oriented heavy steel plates with high magnetic flux density.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15671988A JPH0745690B2 (en) 1988-06-27 1988-06-27 Manufacturing method of good electromagnetic thick plate

Publications (2)

Publication Number Publication Date
JPH028324A JPH028324A (en) 1990-01-11
JPH0745690B2 true JPH0745690B2 (en) 1995-05-17

Family

ID=15633842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15671988A Expired - Lifetime JPH0745690B2 (en) 1988-06-24 1988-06-27 Manufacturing method of good electromagnetic thick plate

Country Status (1)

Country Link
JP (1) JPH0745690B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5411605A (en) * 1991-10-14 1995-05-02 Nkk Corporation Soft magnetic steel material having excellent DC magnetization properties and corrosion resistance and a method of manufacturing the same

Also Published As

Publication number Publication date
JPH028324A (en) 1990-01-11

Similar Documents

Publication Publication Date Title
JPH0711026B2 (en) Manufacturing method of non-directional electromagnetic thick plate with high magnetic flux density
JPH06104866B2 (en) Method for manufacturing electromagnetic thick plate for direct current magnetization
JP2503110B2 (en) Method for manufacturing non-oriented electromagnetic thick plate with excellent magnetic properties
JPH0713264B2 (en) Manufacturing method of non-oriented electromagnetic thick plate with uniform magnetic properties in the thickness direction
JPH079040B2 (en) Manufacturing method of good electromagnetic thick plate with good machinability and uniform magnetic properties in the plate thickness direction
JPH0745688B2 (en) Method for manufacturing high magnetic flux density electromagnetic thick plate
JPH0745690B2 (en) Manufacturing method of good electromagnetic thick plate
JP2503111B2 (en) Manufacturing method of non-oriented electromagnetic thick plate with excellent magnetic properties
JP2503113B2 (en) Manufacturing method of non-oriented electromagnetic thick plate
JPH0689401B2 (en) Manufacturing method of electromagnetic thick plate for non-directional DC magnetization
JPH0745691B2 (en) Non-directional good electromagnetic thick plate manufacturing method
JPH0745689B2 (en) Manufacturing method of good electromagnetic thick plate
JPH0689400B2 (en) Method of manufacturing electromagnetic thick plate for non-directional DC magnetization
JPH0762174B2 (en) Method for manufacturing non-oriented electromagnetic thick plate with high magnetic flux density
JPH0689399B2 (en) Manufacturing method of electromagnetic thick plate for DC magnetization
JPH0745692B2 (en) Method for manufacturing non-oriented electromagnetic thick plate with high magnetic flux density
JP2503112B2 (en) Manufacturing method of good electromagnetic plate
JPH0762175B2 (en) Method for manufacturing non-oriented electromagnetic thick plate having uniform magnetic properties in the thickness direction
JPH079039B2 (en) Method for manufacturing good electromagnetic thick plate with uniform magnetic properties in the thickness direction
JPH0713263B2 (en) Method for manufacturing non-oriented electromagnetic thick plate having uniform magnetic properties in the thickness direction
JP2773951B2 (en) Manufacturing method of electromagnetic thick plate with excellent low-field magnetic properties
JP2503122B2 (en) Method for manufacturing non-oriented electromagnetic thick plate with excellent magnetic properties
JPH0713265B2 (en) Manufacturing method of good electromagnetic thick plate with uniform magnetic properties in the thickness direction
JPH0726326A (en) Production of nonoriented silicon steel plate
JPH0726327A (en) Production of nonoriented silicon steel plate