JPH0744017Y2 - プラズマアッシング装置 - Google Patents
プラズマアッシング装置Info
- Publication number
- JPH0744017Y2 JPH0744017Y2 JP1989037087U JP3708789U JPH0744017Y2 JP H0744017 Y2 JPH0744017 Y2 JP H0744017Y2 JP 1989037087 U JP1989037087 U JP 1989037087U JP 3708789 U JP3708789 U JP 3708789U JP H0744017 Y2 JPH0744017 Y2 JP H0744017Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- plasma generation
- generation chamber
- chamber
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989037087U JPH0744017Y2 (ja) | 1989-03-28 | 1989-03-28 | プラズマアッシング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989037087U JPH0744017Y2 (ja) | 1989-03-28 | 1989-03-28 | プラズマアッシング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02127031U JPH02127031U (enrdf_load_stackoverflow) | 1990-10-19 |
| JPH0744017Y2 true JPH0744017Y2 (ja) | 1995-10-09 |
Family
ID=31543883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989037087U Expired - Lifetime JPH0744017Y2 (ja) | 1989-03-28 | 1989-03-28 | プラズマアッシング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0744017Y2 (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62213126A (ja) * | 1986-03-13 | 1987-09-19 | Fujitsu Ltd | マイクロ波プラズマ処理装置 |
| JPS64326U (enrdf_load_stackoverflow) * | 1987-06-19 | 1989-01-05 |
-
1989
- 1989-03-28 JP JP1989037087U patent/JPH0744017Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02127031U (enrdf_load_stackoverflow) | 1990-10-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR900003613B1 (ko) | 초단파와 플라즈마간의 개선된 커플링 구조를 가진 하류초단파 플라즈마 처리장치 | |
| KR20010041677A (ko) | 처리 장치 | |
| KR100279656B1 (ko) | 플라즈마 처리장치 및 플라즈마 처리방법 | |
| JPH0358171B2 (enrdf_load_stackoverflow) | ||
| JP3276514B2 (ja) | プラズマ処理装置 | |
| JP2000173988A (ja) | 基板保持台、及びプラズマ処理装置 | |
| KR100218836B1 (ko) | 플라스마 처리장치 | |
| KR100258161B1 (ko) | 플라즈마 처리 시스템 | |
| JPH0744017Y2 (ja) | プラズマアッシング装置 | |
| JPH0737314Y2 (ja) | プラズマアッシング装置 | |
| JP2005012217A (ja) | 半導体製造装置 | |
| JPH02141576A (ja) | プラズマプロセス装置 | |
| JP2669168B2 (ja) | マイクロ波プラズマ処理装置 | |
| JP2967681B2 (ja) | マイクロ波プラズマ処理装置 | |
| JP3164188B2 (ja) | プラズマ処理装置 | |
| JP2932942B2 (ja) | プラズマ処理装置 | |
| JPH0494524A (ja) | 電子線装置の洗浄方法 | |
| JP3042347B2 (ja) | プラズマ装置 | |
| JPH0570956A (ja) | 有磁場マイクロ波吸収プラズマ処理装置 | |
| JPH06275566A (ja) | マイクロ波プラズマ処理装置 | |
| JP4076645B2 (ja) | マイクロ波プラズマ処理装置及びその処理方法 | |
| JPS635526A (ja) | ドライエツチング装置 | |
| JP2921302B2 (ja) | マイクロ波プラズマ処理装置 | |
| JPS61281881A (ja) | ドライエツチング装置 | |
| JPH0511435U (ja) | アツシング装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |