JPH0740614B2 - Gas laser device - Google Patents
Gas laser deviceInfo
- Publication number
- JPH0740614B2 JPH0740614B2 JP60029928A JP2992885A JPH0740614B2 JP H0740614 B2 JPH0740614 B2 JP H0740614B2 JP 60029928 A JP60029928 A JP 60029928A JP 2992885 A JP2992885 A JP 2992885A JP H0740614 B2 JPH0740614 B2 JP H0740614B2
- Authority
- JP
- Japan
- Prior art keywords
- cooling medium
- laser device
- gas laser
- pipe
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0401—Arrangements for thermal management of optical elements being part of laser resonator, e.g. windows, mirrors, lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0407—Liquid cooling, e.g. by water
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は加工用及び医療用に用いられるガスレーザ装置
に関するものである。Description: TECHNICAL FIELD The present invention relates to a gas laser device used for processing and medical purposes.
従来の技術 ガスレーザ装置の発振器を構成する際、レーザ管及びミ
ラー調整機構部の取付けの基盤となるものは、レーザ発
振時の放電による周囲温度上昇及び環境温度変化等によ
る構成物の温度変化による寸法変化を極力小さくする必
要性から、インバー（熱膨張率が小さい金属）及び無機
物（大理石等）が用いられたりしていたが、構成時の機
械的強度、加工性、組立作業性等に不都合が多いととも
に、温度変化に対する寸法変化が充分満足できるもので
はなく、温度変化によりレーザ出力が一定となり得ない
問題を有していた。上記従来の発振器構成部の基盤とな
る部分の欠点を少なくするものとして、真空引き等によ
る機械的強度を充分もたせたレーザ管及びミラー調整機
構部の保持構造基盤として、内部を二重構造としたり、
一重構造のままで内部に水、オイル等の冷却媒体を流し
て温度安定性をも考慮したパイプ構造のものがあるが、
このパイプ構造（以下「メインパイプ」と称す）内に通
る冷却媒体の量、冷却媒体の他の被冷却構成物との冷却
能力差等のちがいによって、単にメインパイプを用いて
冷却媒体を各部に通すだけでは発振器の温度変化を一様
に吸収することができず、温度変化による出力の不安定
を防止することができなかった。この従来のガスレーザ
装置の冷却系統図を第３図に示す。2. Description of the Related Art When constructing an oscillator of a gas laser device, the basis for mounting the laser tube and the mirror adjustment mechanism is the size of the temperature change of the constituents due to ambient temperature rise due to discharge during laser oscillation and environmental temperature change. Invar (metal with a small coefficient of thermal expansion) and inorganic materials (marble etc.) were used because it was necessary to minimize the change, but there was a problem in mechanical strength, workability, and assembly workability during construction. In addition to the large number, the dimensional change with respect to the temperature change is not sufficiently satisfied, and there is a problem that the laser output cannot be constant due to the temperature change. In order to reduce the drawbacks of the base portion of the above-mentioned conventional oscillator constituent portion, the laser tube and the mirror adjusting mechanism portion having a sufficient mechanical strength by evacuation or the like has a double structure inside as a holding structure base. ,
There is a pipe structure with a single structure that allows a cooling medium such as water or oil to flow inside to take temperature stability into consideration.
Due to differences in the amount of cooling medium passing through this pipe structure (hereinafter referred to as the "main pipe") and the difference in cooling capacity between the cooling medium and other components to be cooled, the cooling medium is simply used for each part using the main pipe. The temperature change of the oscillator could not be absorbed uniformly only by passing it through, and the instability of the output due to the temperature change could not be prevented. A cooling system diagram of this conventional gas laser device is shown in FIG.
発明が解決しようとする問題点 このように従来のガスレーザ装置では、外部環境変化又
は内部放電等に起因する発熱に基づく温度変化による出
力の不安定を防止できないという問題があった。Problems to be Solved by the Invention As described above, the conventional gas laser device has a problem in that it is not possible to prevent the output from becoming unstable due to the temperature change due to the heat generation due to the external environment change or the internal discharge.
問題点を解決するための手段 上記問題点を解決するため、本発明のガスレーザ装置
は、発振器構成物の取付け基盤としてのパイプと、冷却
媒体溜めと、この冷却媒体溜めから前記パイプを通った
後にこのパイプ以外の前記発振器構成物である被冷却構
造物を通って前記冷却媒体溜めに戻る冷却媒体流路とを
備えた構成としたものである。Means for Solving the Problems In order to solve the above problems, the gas laser device of the present invention has a pipe as a mounting base of an oscillator component, a cooling medium reservoir, and after passing through the pipe from the cooling medium reservoir. A cooling medium flow path that returns to the cooling medium reservoir through the cooled structure that is the oscillator structure other than this pipe is provided.
作用 上記構成によれば、発振器構成物の全体の温度分布を均
一にするとともに、急激な外的温度変化に対しても発振
器構成物の急激な温度変化を防止でき、温度変化による
出力の不安定を防止することができる。Action According to the above configuration, the temperature distribution of the entire oscillator component can be made uniform, and the rapid temperature change of the oscillator component can be prevented even with a sudden external temperature change, and the output is unstable due to the temperature change. Can be prevented.
実施例 以下、本発明の一実施例を第１図〜第２図に基づいて説
明する。第１図は本発明の一実施例におけるガスレーザ
装置の発振器部の構成図で、（１）はメインパイプ、
（２）はメインパイプ（１）を保持するフランジ、
（３）はアノードブロック、（４）はカソードブロッ
ク、（５）はレーザ管で、このレーザ管（５）はオイル
冷却のため二重管構造になっている。（６）は折り返し
鏡調整機構部、（７）は全反射鏡調整機構部、（８）は
部分透過鏡調整機構部である。Embodiment An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. 1 is a configuration diagram of an oscillator section of a gas laser device in one embodiment of the present invention, in which (1) is a main pipe,
(2) is a flange that holds the main pipe (1),
(3) is an anode block, (4) is a cathode block, and (5) is a laser tube. This laser tube (5) has a double tube structure for oil cooling. (6) is a folding mirror adjusting mechanism, (7) is a total reflecting mirror adjusting mechanism, and (8) is a partial transmitting mirror adjusting mechanism.
第２図は上記ガスレーザ装置の冷却系統図で、（９）は
オイルタンク、（10）はガスクーラー、（11）はその他
の被冷却構成物である。オイルタンク（９）を出たオイ
ル冷却媒体は、必ずメインパイプ（１）を通り、メイン
パイプ（１）と同一温度化された冷却媒体を他の被冷却
構成物に流す様にしている。特にメインパイプ（１）及
び各部ミラー調整機構部（６）〜（８）の温度の均一化
を図った。FIG. 2 is a cooling system diagram of the gas laser device, in which (9) is an oil tank, (10) is a gas cooler, and (11) is other components to be cooled. The oil cooling medium exiting the oil tank (9) always passes through the main pipe (1), and the cooling medium whose temperature is the same as that of the main pipe (1) is made to flow to other cooled components. In particular, the temperatures of the main pipe (1) and the mirror adjusting mechanism parts (6) to (8) are made uniform.
なお、上記実施例では、メインパイプ（１）以外の被冷
却構成物は同時に並列にオイルを流すようにしたが、ミ
ラー等の調整機構部（６）〜（８）以外のレーザ管
（５）やガスクーラー（10）等、他の被冷却構成物は、
ミラー等の調整機構部（６）〜（８）等を通した後にオ
イル冷却しても、発振器全体の温度均一化ひいては出力
安定性には大きな影響がない。また冷却媒体としては、
オイルに限らず、例えば水を用いてもよい。In the above embodiment, the components to be cooled other than the main pipe (1) were made to flow oil in parallel at the same time, but the laser tubes (5) other than the adjusting mechanism parts (6) to (8) such as the mirrors. And other cooled components such as the gas cooler (10)
Even if the oil is cooled after passing through the adjusting mechanism parts (6) to (8) such as mirrors, the temperature uniformity of the entire oscillator and the output stability are not significantly affected. As a cooling medium,
Not limited to oil, water may be used, for example.
発明の効果 以上述べたごとく本発明によれば、先ず取付け基盤とし
てのパイプ内に冷却媒体を通した後、この冷却媒体を、
各部のミラー調整機構等の被冷却構造物に通すようにし
たので、発振器構成物の温度分布を均一化させ、外的温
度変化に対しても温度変化の影響を少なくし、温度変化
によるミラー等の角度変化を少なくすることができ、出
力変化及び出力低下のほとんどがない、安定したガスレ
ーザ装置を得ることができる。As described above, according to the present invention, after the cooling medium is first passed through the pipe as the mounting base, the cooling medium is
Since it is made to pass through the structure to be cooled such as the mirror adjustment mechanism of each part, the temperature distribution of the oscillator components is made uniform, the influence of temperature change is minimized even when the external temperature changes, and the mirror etc. It is possible to obtain a stable gas laser device in which the change in the angle can be reduced, and there is almost no change in output or decrease in output.
第１図は本発明の一実施例におけるガスレーザ装置の発
振器部の構成図、第２図は同ガスレーザ装置の冷却系統
図、第３図は従来のガスレーザ装置の冷却系統図であ
る。 （１）…メインパイプ、（３）…アノードブロック、
（５）…レーザ管、（６）…折り返し鏡調整機構部、
（７）…全反射鏡調整機構部、（８）…部分透過鏡調整
機構部、（９）…オイルタンク、（10）…ガスクーラーFIG. 1 is a configuration diagram of an oscillator section of a gas laser device in one embodiment of the present invention, FIG. 2 is a cooling system diagram of the gas laser device, and FIG. 3 is a cooling system diagram of a conventional gas laser device. (1) ... Main pipe, (3) ... Anode block,
(5) ... laser tube, (6) ... folding mirror adjusting mechanism section,
(7) ... total reflection mirror adjustment mechanism section, (8) ... partial transmission mirror adjustment mechanism section, (9) ... oil tank, (10) ... gas cooler
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭58−166785（ＪＰ，Ａ) 実開 昭58−37166（ＪＰ，Ｕ) 実開 昭59−6857（ＪＰ，Ｕ) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-58-166785 (JP, A) Actually opened 58-37166 (JP, U) Actually opened 59-6857 (JP, U)
Claims (1)
と、冷却媒体溜めと、この冷却媒体溜めから前記パイプ
を通った後にこのパイプ以外の前記発振器構成物である
被冷却構造物を通って前記冷却媒体溜めに戻る冷却媒体
流路とを備えたガスレーザ装置。1. A pipe as a mounting base of an oscillator component, a cooling medium reservoir, and a pipe to be cooled from the cooling medium reservoir and then a structure to be cooled which is the oscillator component other than the pipe. A gas laser device having a cooling medium flow path returning to a cooling medium reservoir.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029928A JPH0740614B2 (en) | 1985-02-18 | 1985-02-18 | Gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029928A JPH0740614B2 (en) | 1985-02-18 | 1985-02-18 | Gas laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61189684A JPS61189684A (en) | 1986-08-23 |
| JPH0740614B2 true JPH0740614B2 (en) | 1995-05-01 |
Family
ID=12289650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60029928A Expired - Lifetime JPH0740614B2 (en) | 1985-02-18 | 1985-02-18 | Gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0740614B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5837166U (en) * | 1981-09-05 | 1983-03-10 | 株式会社ダイヘン | Gas laser processing equipment |
| JPS58166785A (en) * | 1982-03-29 | 1983-10-01 | Hitachi Ltd | Laser device |
| JPS596857U (en) * | 1982-07-07 | 1984-01-17 | 東北リコ−株式会社 | Cooling device for gas laser discharge tube |
-
1985
- 1985-02-18 JP JP60029928A patent/JPH0740614B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61189684A (en) | 1986-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |