JPH0740356B2 - Magnetic disk protective film manufacturing equipment - Google Patents

Magnetic disk protective film manufacturing equipment

Info

Publication number
JPH0740356B2
JPH0740356B2 JP13032786A JP13032786A JPH0740356B2 JP H0740356 B2 JPH0740356 B2 JP H0740356B2 JP 13032786 A JP13032786 A JP 13032786A JP 13032786 A JP13032786 A JP 13032786A JP H0740356 B2 JPH0740356 B2 JP H0740356B2
Authority
JP
Japan
Prior art keywords
magnetic disk
protective film
compound
organic compound
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP13032786A
Other languages
Japanese (ja)
Other versions
JPS62287421A (en
Inventor
光 四井
卓矢 西本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
THE FURUKAW ELECTRIC CO., LTD.
Original Assignee
THE FURUKAW ELECTRIC CO., LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by THE FURUKAW ELECTRIC CO., LTD. filed Critical THE FURUKAW ELECTRIC CO., LTD.
Priority to JP13032786A priority Critical patent/JPH0740356B2/en
Publication of JPS62287421A publication Critical patent/JPS62287421A/en
Publication of JPH0740356B2 publication Critical patent/JPH0740356B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Polymerisation Methods In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は強磁性金属薄膜を磁気層とする磁気記録媒体の
製造装置に係り、特に磁気ディスクなどの磁気記録層上
に保護膜を設ける装置に関するものである。
The present invention relates to an apparatus for manufacturing a magnetic recording medium having a ferromagnetic metal thin film as a magnetic layer, and more particularly, an apparatus for providing a protective film on a magnetic recording layer such as a magnetic disk. It is about.

〔従来の技術〕[Conventional technology]

一般に強磁性金属薄膜を磁気記録層とする磁気記録体は
金属ディスク基体或はテープ基体上に強磁性金属材料を
スパッタリングするとか或は樹脂マトリックスに強磁性
金属材料を分散させたエマルジョンをスピンコートする
ことにより製造しているものである。これらの強磁性金
属薄膜は高密度記録にすぐれた特性を有するが、ヘッド
の接触によって摩耗や損傷を受け易くヘッドの接触圧に
よって磁気特性の変化が見られるという欠点がある。
In general, a magnetic recording medium using a ferromagnetic metal thin film as a magnetic recording layer is formed by sputtering a ferromagnetic metal material on a metal disk substrate or tape substrate, or spin-coating an emulsion in which a ferromagnetic metal material is dispersed in a resin matrix. It is manufactured by this. Although these ferromagnetic metal thin films have excellent characteristics for high-density recording, they have a drawback that they are susceptible to wear and damage due to contact with the head, and their magnetic characteristics change depending on the contact pressure of the head.

このため強磁性金属薄膜の表面に有機化合物をプラズマ
重合法によりえた重合体による保護膜を形成することに
より耐久性を改善することが提案されているが、通常の
プラズマ重合に用いられるモノマー例えばフッ素,シリ
コーン系モノマーは気体又は液体であるため表面の潤滑
性、表面の耐摩耗性、基板との接着性に優れた保護膜を
容易にうることが出来なかった。
For this reason, it has been proposed to improve durability by forming a protective film of a polymer obtained by plasma polymerization of an organic compound on the surface of a ferromagnetic metal thin film. Since the silicone-based monomer is a gas or a liquid, it was not possible to easily obtain a protective film having excellent surface lubricity, surface abrasion resistance, and adhesion to a substrate.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明者等はかかる現状に鑑み鋭意研究を行った結果、
先に磁気ディスクの保護膜を形成させるにあたり、昇華
性固体有機化合物の共存下でキャリアーガスのプラズマ
を発生させることにより上記有機化合物が優れた性能を
有する重合体保護膜として磁気ディスク本体の表面に析
出する方法を提案した。
As a result of earnest research conducted by the present inventors in view of the current situation,
In forming the protective film of the magnetic disk in advance, by generating plasma of the carrier gas in the presence of a sublimable solid organic compound, the organic compound is a polymer protective film having excellent performance on the surface of the magnetic disk main body. A method of precipitation was proposed.

本発明はこの保護膜を具体的にうるための装置を開発し
たものである。
The present invention has developed a device for specifically obtaining this protective film.

〔問題点を解決するための手段〕[Means for solving problems]

本発明装置は磁気ディスク本体の表面に常温常圧下で固
体状態の有機化合物をプラズマ重合法により得た重合体
の保護膜を被着する装置において真空容器内に上記有機
化合物が高周波プラズマ領域にて被着する位置に磁気デ
ィスク本体を設け、その上部に所望間隔をおいて該有機
化合物を投入した加熱体及びキャリアーガス流出口を順
次配設し且つ真空容器の底部に真空排気口を取付け該有
機化合物を加熱体にて加熱蒸発せしめて磁気ディスク本
体の表面に保護膜を被着せしめることを特徴とするもの
である。
The apparatus of the present invention is an apparatus for depositing a protective film of a polymer obtained by plasma polymerization of an organic compound in a solid state at room temperature and atmospheric pressure on the surface of a magnetic disk body. A magnetic disk main body is provided at a deposition position, a heating body charged with the organic compound and a carrier gas outlet are sequentially disposed on the upper portion of the magnetic disk main body, and a vacuum exhaust port is attached to the bottom of a vacuum container. The compound is characterized in that the compound is heated and evaporated by a heating body to deposit a protective film on the surface of the magnetic disk body.

〔作用〕[Action]

本発明装置において磁気ディスクとしては基体となるア
ルミニウム基板上にNi-Pなどの科学メッキ層を被着せし
めて研磨仕上げなどの後処理を施した後、その表面に物
理的又は化学的方法により強磁性金属薄膜を形成するも
のである。
In the apparatus of the present invention, a magnetic disk as a magnetic disk in the apparatus of the present invention is coated with a chemical plating layer such as Ni-P and subjected to post-treatment such as polishing, and then the surface thereof is subjected to a physical or chemical method. It forms a magnetic metal thin film.

又本発明装置において固体の有機化合物とは、常温、常
圧下で固体を呈し昇華性を有する低融点化合物であり、
その融点は示差熱測定偏光顕微鏡観察により知ることが
出来る。その値は通常20℃〜250℃を有し望ましくは40
℃〜150℃に分布するものである。具体的な化合物とし
てはナフタレン,アントラセン,ジフェニルメタン,ジ
フェニルエタン,ジベンジル,ビフェニールなどの芳香
族化合物、ジフェニル化合物である。又これらの化合物
から誘導される昇華性化合物の誘導体も含まれる。
Further, the solid organic compound in the device of the present invention is a low-melting compound having a sublimation property that is solid at room temperature and pressure.
The melting point can be known by observing a differential thermal measurement using a polarization microscope. Its value is usually 20 ℃ ~ 250 ℃ and preferably 40
It is distributed between ℃ and 150 ℃. Specific compounds include aromatic compounds such as naphthalene, anthracene, diphenylmethane, diphenylethane, dibenzyl and biphenyl, and diphenyl compounds. Also included are derivatives of sublimable compounds derived from these compounds.

これらの有機化合物を真空容器内で加熱したり或は常温
に保持したまま気化させるための加熱体としては例えば
蒸着用金属ボートを使用するものであり、この金属ボー
トは気化した有機化合物が均一に真空容器内に分布する
ように中ぶたを取付けたタイプのものが望ましい。
As a heating body for heating these organic compounds in a vacuum vessel or vaporizing them while keeping them at room temperature, for example, a metal boat for vapor deposition is used. It is desirable to use a type in which inner lids are attached so as to be distributed in the vacuum container.

なお蒸着用金属ボート内に投入する有機化合物は被着面
積1cm2あたり通常0.03mg〜0.17mgの量である。
The amount of the organic compound charged in the metal boat for vapor deposition is usually 0.03 mg to 0.17 mg per cm 2 of the adhered area.

又本発明装置におけるキャリアーガスとはアルゴン,窒
素などの不活性ガスあるいは水素であり、必要に応じて
CF4,CH4,C2H4などの炭化水素系ガスを混合してもよ
い。これらのガスを真空容器内に導入し10-3〜1.5Torr
の範囲に保持する。
Further, the carrier gas in the device of the present invention is an inert gas such as argon or nitrogen or hydrogen, and if necessary,
Hydrocarbon-based gas such as CF 4 , CH 4 , C 2 H 4 may be mixed. These gases were introduced into the vacuum vessel and 10 -3 to 1.5 Torr
Keep in the range of.

このキャリアーガスの流出口は磁気ディスクの表面に直
接該ガスが接触せしめることなく、均一な保護膜をうる
ため該ガスを均一拡散後に磁気ディスク表面に到達する
ことが必要である。従ってキャリアーガス流出口と真空
排気口との配置は相互に隔離しておくことが必要であ
り、この両者の間に有機化合物を気化するための加熱体
とプラズマ領域並に磁気ディスクを順次配設するもので
ある。このような配置によりたとえ、昇華性物質が一時
的に上方に拡散しても、プラズマ領域に引き寄せられる
結果、高圧側電極表面に載置した磁気ディスク表面に
は、均一な重合膜が得られる。
This carrier gas outlet is required to reach the surface of the magnetic disk after the gas is uniformly diffused in order to obtain a uniform protective film without directly contacting the gas with the surface of the magnetic disk. Therefore, the carrier gas outflow port and the vacuum exhaust port must be separated from each other, and a heating body for vaporizing an organic compound and a magnetic disk as well as a plasma region are sequentially disposed between them. To do. With such an arrangement, even if the sublimable substance temporarily diffuses upward, as a result of being attracted to the plasma region, a uniform polymerized film can be obtained on the surface of the magnetic disk placed on the surface of the high-voltage side electrode.

プラズマ領域においた磁気ディスクの配置は、モノマー
蒸発源から拡散してくるモノマー蒸気が、直接、ディス
ク面に照射されるようにすることが重要であり、電極下
部、電極間等に、これを配置することは好ましくない。
When arranging the magnetic disk in the plasma region, it is important that the monomer vapor diffusing from the monomer evaporation source is directly irradiated to the disk surface. Doing so is not preferable.

プラズマ重合膜と、モノマー蒸発源は通常、40
200の間隔を保つことが望ましい。
Plasma polymerized membrane and monomer evaporation source are usually 40 m / m ~
It is desirable to keep the distance of 200 m / m .

本発明装置において高周波によりプラズマ重合を行う場
合、高周波出力と電極面積との大きさからエネルギー密
度を0.3〜4W/cm2の範囲に入るよう設定する。又この電
源は通常13.56MHzの短波長域の発振周波数をもち可変容
量タイプのマッチングボックスを備えている。
When plasma polymerization is performed by high frequency in the apparatus of the present invention, the energy density is set to fall within the range of 0.3 to 4 W / cm 2 from the size of the high frequency output and the electrode area. Also, this power supply usually has an oscillation frequency in the short wavelength range of 13.56 MHz and is equipped with a variable capacitance type matching box.

又プラズマ重合の反応時についてもモノマーの種類、該
モノマーのガス分圧、電極配置、温度によって左右され
るものであり、これを規定することが出来ないが、通常
5〜10sec望ましくは10〜70secにて所望の膜厚の保護膜
がえられるように反応条件及びモノマー量を選定する。
Also, during the plasma polymerization reaction, it depends on the kind of the monomer, the gas partial pressure of the monomer, the electrode arrangement, and the temperature, which cannot be specified, but usually 5 to 10 seconds, preferably 10 to 70 seconds. The reaction conditions and the amount of monomer are selected so that a protective film having a desired film thickness can be obtained.

而して本発明装置により得られる保護膜の厚さは通常10
0Å〜1000Å程度のものであり、膜厚が薄すぎると耐久
性のものが得られず、又膜厚が厚すぎるとスペーシング
ロスが大きくなり記録と読み出し特性に悪影響をもたら
すものであると共に場合によっては強固な膜がえられな
いことも考えられる。
Thus, the thickness of the protective film obtained by the device of the present invention is usually 10
In the case of 0 Å to 1000 Å, if the film thickness is too thin, durability cannot be obtained, and if the film thickness is too thick, the spacing loss becomes large and the recording and reading characteristics are adversely affected. Depending on the situation, a strong film may not be obtained.

又プラズマ重合時には電極周辺と磁気ディスクとの温度
上昇ならびに、スパッタ現象がおこるが、磁気ディスク
の保護膜を得ようとする場合、高温であることが望まし
く付加的に、前処理としてスパッタ処理を施こすと共に
予備的及び積極的に加熱することが有効である。
Further, during plasma polymerization, a temperature rise between the electrode and the magnetic disk and a sputtering phenomenon occur, but when obtaining a protective film for the magnetic disk, it is preferable that the temperature is high, and additionally, a sputtering process is performed as a pretreatment. Preliminarily and positively heating with rubbing is effective.

なお本発明装置は主に磁気ディスクの製造に適用するも
のであるが、その他磁気記録体例えば磁気テープ,フロ
ッピーディスク,磁気カードなどの製造にも有効に適用
する。
The device of the present invention is mainly applied to the manufacture of magnetic disks, but is also effectively applied to the manufacture of other magnetic recording materials such as magnetic tapes, floppy disks, and magnetic cards.

〔実施例〕〔Example〕

(1)第1図に示す如くベルジャ3の内部に直径130
の2枚のステンレス円板電極2A,2Bを約30
隔に対向せしめて固定し、高圧側電極2Bの上面にNi-P板
の基板に強磁性金属薄膜を形成した5インチの磁気ディ
スク10を載置し、磁気ディスク10の上部約50の位
置に小型タングステンボートの内部に20mgのジフェニー
ルを投入した加熱源1を固定した。又加熱源1の上方約
50の位置にベルジャ3の壁と対向させてアルゴン
ガスが吹き出す導入口8を固定した。更にベルジャ3の
底部の基板4に真空排気口5Bを設け真空ポンプ5Aに接続
した。
(1) As shown in Fig. 1, inside the bell jar 3, the diameter is 130 m.
/ M 2 stainless disk electrodes 2A, 2B are fixed facing each other at an interval of about 30 m / m , and a ferromagnetic metal thin film is formed on the Ni-P plate substrate on the upper surface of the high voltage side electrode 2B. The magnetic disk 10 was placed, and the heating source 1 in which 20 mg of diphenyl was charged was fixed inside the small tungsten boat at a position of about 50 m 2 / m above the magnetic disk 10. Also, above the heating source 1
An inlet 8 from which argon gas was blown was fixed at a position of 50 m / m so as to face the wall of the bell jar 3. Further, a vacuum exhaust port 5B was provided on the substrate 4 at the bottom of the bell jar 3 and connected to the vacuum pump 5A.

而して加熱源8を電源11により80℃に加熱せしめてジフ
ェニールを蒸発し、ガス導入口8よりアルゴンガスを吹
き込み、高周波プラズマ(約400W)を40sec間発生させ
て磁気ディスク10面に470Åの保護膜を被着せしめた。
Then, the heating source 8 is heated to 80 ° C. by the power source 11 to evaporate the diphenyl, and argon gas is blown from the gas introduction port 8 to generate high frequency plasma (about 400 W) for 40 seconds to generate 470 Å on the magnetic disk 10 surface. A protective film was applied.

(2)実施例(1)における平板電極に替えて第2図に
示す如くスパイラル型電極2A′,2B′を使用し、被着対
象となる磁気ディスク10は2A′電極板上に配置して実施
例(1)と同様に本発明装置による保護膜を被着せしめ
た。
(2) Instead of the flat plate electrode in the embodiment (1), spiral type electrodes 2A 'and 2B' are used as shown in FIG. 2, and the magnetic disk 10 to be adhered is placed on the 2A 'electrode plate. A protective film formed by the device of the present invention was applied in the same manner as in Example (1).

(3)実施例(1)における平板電極及び磁気ディスク
を替えて第3図に示す如く磁気ディスク10を縦型に配置
し、その周囲にスパイラル型電極2B′にてとり囲み、そ
の他は実施例(1)と同様にして磁気ディスクの両面に
保護膜を被着した。
(3) Instead of the flat plate electrode and the magnetic disk in the embodiment (1), the magnetic disk 10 is vertically arranged as shown in FIG. 3, and surrounded by the spiral type electrode 2B ', and the other embodiments In the same manner as in (1), protective films were deposited on both sides of the magnetic disk.

(4)実施例(1)における平型電極に替えて第4図に
示す如く縦型に配置した電極2B″,2A″との間に磁気デ
ィスク10を設け、その他は実施例(1)と同様にして磁
気ディスクの両面に保護膜を被着した。
(4) The magnetic disk 10 is provided between the electrodes 2B ″ and 2A ″ vertically arranged as shown in FIG. 4 in place of the flat electrode in the embodiment (1), and the others are the same as those in the embodiment (1). Similarly, protective films were deposited on both sides of the magnetic disk.

〔効果〕〔effect〕

本発明装置によれば強磁性金属薄膜上にプラズマ重合法
による保護膜を形成するにおいて、有用であり且つ耐久
性に優れた磁気記録体を製造しうる等極めて有用であ
る。
The apparatus of the present invention is extremely useful in forming a protective film by a plasma polymerization method on a ferromagnetic metal thin film, and is extremely useful in that a magnetic recording body having excellent durability can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明磁気ディスク用保護膜の製造装置の1例
を示す概略説明図、第2図乃至第4図は本発明磁気ディ
スク用保護膜の製造装置における磁気ディスクと電極と
の配置状態を示す概略説明図である。 1…加熱源、2A,2B,2A′,2B′,2A″,2B″…電極、3…
真空容器、4…底板、5A…真空ポンプ、5B…排気口、8
…ガス流出口、10…磁気ディスク、6…真空計、9…キ
ャリアーガス源。
FIG. 1 is a schematic explanatory view showing an example of an apparatus for producing a protective film for a magnetic disk of the present invention, and FIGS. 2 to 4 are arrangement states of magnetic disks and electrodes in an apparatus for producing a protective film for a magnetic disk of the present invention. It is a schematic explanatory drawing which shows. 1 ... Heating source, 2A, 2B, 2A ', 2B', 2A ", 2B" ... Electrode, 3 ...
Vacuum container, 4 ... Bottom plate, 5A ... Vacuum pump, 5B ... Exhaust port, 8
… Gas outlet, 10… magnetic disk, 6… vacuum gauge, 9… carrier gas source.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】磁気ディスクの表面に、常温常圧下で固体
状態の有機化合物をプラズマ重合法により得た重合体の
保護膜を被着する装置において、真空容器内に上記有機
化合物が高周波プラズマ領域にて被着する位置に磁気デ
ィスクを設置し、その上部に所望間隔毎に該有機化合物
を投入した加熱体及びキャリアーガス流出口を順次設け
且つ真空容器の底部に真空排気口を取付け、該有機化合
物を加熱体にて加熱蒸発せしめて磁気ディスクの表面に
保護膜を被着せしめることを特徴とする磁気ディスク用
保護膜の製造装置。
1. An apparatus for depositing a polymer protective film obtained by plasma polymerization of an organic compound in a solid state at room temperature and atmospheric pressure on the surface of a magnetic disk, wherein the organic compound is in a high frequency plasma region. A magnetic disk is installed at a position where the organic compound is deposited at a desired position, a heating element and a carrier gas outlet are sequentially provided on the top of the magnetic disk at desired intervals, and a vacuum exhaust port is installed at the bottom of a vacuum container. An apparatus for producing a protective film for a magnetic disk, comprising heating and evaporating a compound with a heating body to deposit a protective film on the surface of the magnetic disk.
【請求項2】常温常圧下で固体状態の有機化合物とは、
昇華性を有し、20℃〜250℃の低融点化合物であり、ナ
フタリン、アントラセン、ジフェニルメタン、ジフェニ
ルエタン、ジベンジル、ビフェニールなどの芳香族化合
物、ジフェニル化合物からなることを特徴とする特許請
求の範囲第1項記載の磁気ディスク用保護膜の製造装
置。
2. An organic compound in a solid state at normal temperature and pressure is
A sublimable compound having a low melting point of 20 ° C to 250 ° C, which is composed of an aromatic compound such as naphthalene, anthracene, diphenylmethane, diphenylethane, dibenzyl and biphenyl, and a diphenyl compound. Item 1. An apparatus for producing a protective film for a magnetic disk according to item 1.
JP13032786A 1986-06-06 1986-06-06 Magnetic disk protective film manufacturing equipment Expired - Lifetime JPH0740356B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13032786A JPH0740356B2 (en) 1986-06-06 1986-06-06 Magnetic disk protective film manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13032786A JPH0740356B2 (en) 1986-06-06 1986-06-06 Magnetic disk protective film manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS62287421A JPS62287421A (en) 1987-12-14
JPH0740356B2 true JPH0740356B2 (en) 1995-05-01

Family

ID=15031700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13032786A Expired - Lifetime JPH0740356B2 (en) 1986-06-06 1986-06-06 Magnetic disk protective film manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH0740356B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2886872B2 (en) * 1989-01-13 1999-04-26 株式会社日立製作所 Magnetic disk substrate and magnetic disk

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