JPH0740064U - Electrolytic compound polishing tool - Google Patents

Abstract

(57) [Abstract] [Purpose] To provide an electrolytic composite polishing tool capable of surely supplying an abrasive mixed electrolyte to improve polishing performance and not causing tool failure even when used for a long time. [Structure] A recess 2 is formed in the center of the polishing surface 19 side of the electrode plate 21.
4. Viscoelastic polishing body 11 on the surface and cover 2 on the opposite side
2 and the rotary shaft 12 are installed, an electrode plate through hole 15 that penetrates into the concave portion 24 in the cover 22 of the electrode plate 21, and a polishing body through hole 16 that continuously penetrates the polishing body 11 into this and penetrates to the polishing surface 19 side. Forming the electrolyte and supplying the electrolyte solution 18 into the cover 22.
Are directly supplied to the polishing surface 19.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to an electrolytic composite polishing tool for performing electrolytic polishing on a flat surface using a rotary polishing disk.

[0002]

[Background technology]

 2. Description of the Related Art Conventionally, electrolytic polishing, which removes a material from the surface to be polished by the action opposite to that of electrolytic plating, has been used for polishing the surface of a metal material or the like. Among electropolishing, the dynamic processing method using NaCl as the electrolytic solution has high processing efficiency, but it is difficult to set the processing accuracy appropriately. On the other hand, the passivation processing method that uses NaNO3 or the like as the electrolytic solution is easy to improve accuracy because the electrolytic current is suppressed by the passivation film (oxide film or inactive film).

Therefore, the passivation method is preferable for precision polishing, and it is preferable to combine it with physical (mechanical) polishing in order to further improve the polishing efficiency. Electrolytic composite polishing combining electrolysis and polishing. Is used. As the electrolytic composite polishing, in addition to the solid method in which an electrolytic solution is supplied to a solid abrasive, a loose abrasive method in which abrasive particles are mixed with an electrolytic solution is often used.

As the loose abrasive grain method, for example, an electrolytic solution in which abrasive grains are mixed in advance by attaching a viscoelastic polishing body such as urethane sponge to an electrode in the form of a rotating disk supported by a rotating shaft and rotating the electrode. A configuration is known in which is supplied from above the viscoelastic polishing body. In such a configuration, the electrolytic solution supplied to the polishing body permeates to the lower polishing surface, whereby the abrasive grains in the electrolytic solution are rubbed against the surface to be polished by the polishing surface, and Polishing is performed. Then, by passing an electric current through the electrolyte that has penetrated into the polishing body from the electrode to the object to be polished, the surface of the object to be polished is electrolyzed to perform precision polishing finish (see Japanese Patent Laid-Open No. 61-219525).

[0006] For supplying the electrolytic solution in the solid method, an "electrolytic buffing method" (see Japanese Patent Laid-Open No. 53-132 893, etc.) is supplied from the vicinity of the root of the rotating shaft on the upper surface of the electrode and is supplied through a through hole that passes through to the polishing body. ) Is adopted, and the “spindle through method” is adopted in which the rotating shaft is made tubular and is fed through the inside to the lower surface side of the rotating disk-shaped electrode. In this spindle through method, since it is necessary to open the spindle, it is necessary to supply the electrolytic solution through a rotary joint, and in the case of a composite electrolytic solution in which abrasive particles are mixed in the electrolytic solution, the abrasive particles seal The problem is that the life of parts is shortened.

In FIG. 5, a loose abrasive grain type polishing tool 90 has an electrode plate 92 attached to the tip of a rotary shaft 91, and a viscoelastic polishing body 93 such as urethane sponge is attached to the surface thereof. The electrode plate 92 has a hollow disk shape, and the electrolytic solution 95 is supplied from a supply pipe 94 inserted in a gap between the electrode plate 92 and the rotating shaft 91. The supplied electrolytic solution 95 permeates the polishing body 93 through the through holes 96 of the electrode plate 92 and is supplied to the surface (polishing surface 97) of the polishing body 93.

[0007]

[Problems to be solved by the device]

 By the way, in the above-mentioned free abrasive grain method, it is necessary to press the viscoelastic polishing body 93 made of urethane sponge against the surface to be polished for polishing. Due to the pressure-bonding load, the polishing body 93 gradually falls, and the passage of the electrolytic solution 95 that should pass through the polishing body 93 becomes narrow, and the amount of the electrolytic solution 95 reaching the polishing surface 97 becomes insufficient.

When the electrolytic solution 95 becomes insufficient on the polishing surface 97 as described above, the abrasive particles mixed in the electrolytic solution 95 become insufficient and the basic polishing performance is deteriorated. Along with this, the energization also becomes insufficient, and the polishing performance due to electrolysis also becomes insufficient, resulting in poor polishing. On the other hand, even when the polishing body 93 is not settled, if the concentration of the electrolytic solution 95 or the concentration of the mixed abrasive grains is high, the polishing body 93 is clogged, and the polishing surface 97 is similarly energized and passed. A shortage of liquid will occur, resulting in poor polishing.

Further, the free abrasive grain method has a problem that liquid flow into the rotation center region 98 is likely to occur as a unique problem. That is, the electrolytic solution 95 supplied to the viscoelastic polishing body 93 moves in the circumferential direction due to the centrifugal force as the polishing body 93 rotates, and becomes infiltrated in a biased manner to the periphery, and the center of rotation of the polishing body 93. The electrolyte solution 95 does not reach the region 98. Even if the rotary polishing is performed in this state, defective polishing is caused in the rotation center region 98 due to the lack of the electrolytic solution 95 and the abrasive grains contained therein. Further, when the polishing body 93 is rubbed against the object to be polished in the absence of the sufficient electrolytic solution 95, burn due to friction heat generation and the urethane material of the polishing body 93 are melted due to electric resistance heat generation and the surface to be polished is melted. This will lead to problems such as adhesion.

An object of the present invention is to provide an electrolytic composite polishing tool that can reliably supply abrasive grain mixed electrolytic solution to improve polishing performance and does not cause tool failure even when used for a long time. is there.

[0011]

[Means for Solving the Problems]

 The present invention is directed to a disk-shaped electrode plate having a recess at the center on the polishing surface side, a rotating shaft connected to the center of the side of the electrode plate opposite to the recess, and rotating the electrode plate. The viscoelastic polishing body adhered to the recess side surface of the plate, the electrode plate through hole penetrating the recess of the electrode plate, and the viscoelastic polishing body penetrating the viscoelastic polishing body at a position continuous with the electrode plate through hole. And a cover formed around the rotation axis of the electrode plate so as to surround the electrode plate through hole coaxially with the electrode plate.

Further, the concave portion is formed in a truncated cone shape, a peripheral surface of which is inclined with respect to the rotation axis, the electrode plate through hole is formed through the peripheral surface, and the viscoelastic polishing body is formed. Is attached in a curved shape along the concave portion, and the opening of the polishing body through-hole opposite to the electrode plate is formed in the curved portion of the viscoelastic polishing body along the concave portion. Is characterized by. Further, the cover is formed into a cup shape covering a side surface of the electrode plate opposite to the concave portion, and an introduction hole is formed in the center of the cover through which the rotation shaft is inserted, and an inner diameter of the introduction hole is equal to the rotation shaft. Is larger than the outer shape of the electrode plate and smaller than the distance from the center of the rotating shaft of the electrode plate through hole.

[0013]

[Action]

 In the present invention, the electrode plate is rotated by the rotating shaft to supply the electrolytic solution containing the abrasive grains into the cover, and the viscoelastic polishing body attached to the electrode plate is pressed against the object to be polished. The supplied electrolytic solution accumulates in the space inside the cover and can be drawn into the recess through the electrode plate through hole. Next, the electrolytic solution passes through the through hole of the viscoelastic polishing body into the center recess corresponding to the recess on the polishing surface side of this polishing body, and then gradually spreads to the outer peripheral portion by centrifugal force and reaches the entire polishing surface. It will be. It is desirable that the station cannot pass through the inner surface of the polishing body through hole.

Therefore, when the polishing surface of the viscoelastic polishing body is pressed against the object to be polished, the composite polishing is performed by the electrolytic solution and the abrasive grains that have spread over the entire polishing surface. At this time, the electrolytic solution containing abrasive grains is surely introduced into the polishing surface through the electrode plate through hole and the polishing body through hole, and it is possible to eliminate problems such as liquid shortage on the polishing surface. is there. Furthermore, since the position of introduction into the polishing surface is in the recess near the center of the electrode plate, it is possible to reliably deal with liquid runoff in the center, and the center of the polishing target is polished by the recess in the electrode plate. Since it is not crimped, it is possible to reliably eliminate obstacles and the like due to liquid depletion in the central portion.

As a result, defective polishing due to liquid depletion on the polished surface, burning of the object to be polished, etc. can be avoided, and good polishing performance can be obtained. In addition, it is possible to avoid running out of liquid due to the settling of the polishing body, and it is possible to avoid shortening the life of the seal portion as in the spindle through method, so that good performance can be maintained for a long period of time.

In particular, by forming the concave portion into a truncated cone shape, the through hole that goes out to this concave portion can be directed downward, and it is easy and reliable to guide the electrolytic solution accumulated in the cover to each through hole by gravity. You will be able to. Furthermore, by placing the polishing body along the inside of the recess, the central portion does not come into contact with the object to be polished, and it is possible to further ensure the avoidance of obstacles due to liquid depletion of the central portion. Also, by making the cover cup-shaped, it is possible to reliably prevent leakage to the surroundings during rotation, and by disposing the supply opening closer to the center than the electrode plate through hole, centrifugal force is generated. Even in this case, it becomes possible to ensure the supply of the electrolytic solution to the through hole of the electrode plate.

[0017]

【Example】

 Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a first embodiment of the present invention. The polishing tool 10 of the present embodiment has a hollow disk-shaped main body 20, and the main body 20 integrally includes a lower electrode plate 21 in the figure and a cover 22 covering the upper surface thereof.

A frustoconical protrusion 23 is formed in the central portion of the electrode plate 21 in an upward direction in the figure, and a recess 24 is formed on the lower side thereof. The entire cover 22 is formed into a truncated cone cup shape, and the periphery thereof is joined to the entire circumference of the electrode plate 21. The peripheral inclined surface of the cover 22 and the peripheral inclined surface of the raised portion 23 are arranged at a predetermined interval, and the upper surface of the cover 22 and the upper surface of the raised portion 23 are arranged in parallel at a predetermined distance. Due to the space, a closed space 26 having a predetermined size is formed inside the main body 20.

On the lower surface side of the main body 20 in the figure, a porous viscoelastic polishing body 11 such as urethane sponge is attached. The viscoelastic polishing body 11 is attached along the surface of the electrode plate 21, the central portion is curved along the concave portion 24, and the central concave portion 27 that is concave than the other portions is formed. Further, the peripheral portion protruding from the electrode plate 21 to the outside is rolled up and attached to the peripheral inclined surface of the cover 22. A portion of the surface of the polishing body 11 on the lower surface side along the electrode plate 21 is the polishing surface 19.

An insertion hole 28 is formed in the center of the upper surface of the cover 22, and the lower end of the rotary shaft 12 extending from the upper side in the drawing is joined to the center of the upper surface of the raised portion 23 through the insertion hole 28. More specifically, the rotary shaft 12 has a screw shaft portion 13 at its tip, and the screw shaft portion 13 penetrates the upper surface of the raised portion 23 and the central portion of the viscoelastic polishing body 11. A nut 14 is screwed into the screw shaft portion 13, and the nut 14 fixes the electrode plate 21 and the polishing body 11 together to fix the rotary shaft 12, the main body 20 and the polishing body 11. There is. When the main body 20 and the polishing body 11 are slipped around each other, it is desirable to further fix them with screws 30.

The rotating shaft 12 is rotationally driven by a motor or the like (not shown) installed above, so that the main body 20 and the polishing body 11 are rotationally driven. When the outer shape of the rotary shaft 12 is r0, the inner diameter r1 of the insertion hole 28 is r1> r0. An electrolytic solution supply pipe 17 is inserted into the insertion hole 28 along the rotary shaft 12. The supply pipe 17 is supplied with an electrolytic solution 18 mixed with abrasive grains from a supply device (not shown), and supplies the electrolytic solution 18 into the closed space 26 in the main body 20 from the tip inserted through the insertion hole 28. .

A plurality of electrode plate through holes 15 are formed at predetermined intervals in the circumferential direction on the peripheral inclined surface of the raised portion 23 of the electrode plate 21. The viscoelastic polishing body 11 has the same number of polishing body through holes 16 formed at positions corresponding to the extension of the electrode plate through holes 15. The electrode plate through hole 15 and the polishing body through hole 16 allow the closed space 26 inside the main body 20 to communicate with the recess 24 of the electrode plate 21 and the central recess 27 of the viscoelastic polishing body 11. The electrode plate through hole 15 and the polishing body through hole 16 are set such that the lower opening of the polishing body through hole 16 is located at the outer peripheral edge portion of the central recess 27. Also, the distance r2 of the outer edge of the polishing body through hole 16 from the center of the rotary shaft 12 is r2> r1.

In the present embodiment having such a configuration, the polishing surface 19 is brought into contact with the surface of the object to be polished, and a voltage is applied between the main body 20 and the object to be polished. In this state, the main body 20 is rotated and the electrolytic solution 18 mixed with abrasive grains is supplied from the supply pipe 17. The supplied electrolytic solution 18 collects in the closed space 26 and is sent out into the central recess 27 inside the polishing surface 19 through the electrode plate through hole 15 and the polishing body through hole 16. It should be noted that a part thereof is infiltrated into the polishing body 11 from outside the polishing body through hole 16.

The electrolytic solution 18 sent out into the central recess 27 and the electrolytic solution 18 infiltrated into the polishing body 11 move to the peripheral polishing surface 19 and a further outside portion of the polishing body 11 by a centrifugal force, and sequentially. It spreads to the outer peripheral portion and fully covers the entire polishing surface 19. When the electrolytic solution 18 is sufficiently supplied to the polishing surface 19, the abrasive grains mixed in the electrolytic solution 18 polish the surface to be polished by the rotation of the polishing body 11, and the polishing between the main body 20 and the polishing object is performed. A current flows through the electrolytic solution 18, and the surface of the polishing target is chemically polished by electrolysis.

According to this embodiment as described above, the electrolytic solution 18 supplied into the main body 20 is introduced into the central recess 27 inside the polishing surface 19 through the electrode plate through hole 15 and the polishing body through hole 16. Further, it can be spread by the centrifugal force and spread over the entire polishing surface 19, and the composite polishing can be reliably performed by the electrolytic solution 18 and the abrasive grains contained in the electrolytic solution 18 that spread over the entire polishing surface 19.

In particular, since the electrolytic solution 18 containing abrasive grains is directly introduced to the polishing surface 19 through the electrode plate through hole 15 and the polishing body through hole 16, it is caused by poor passage due to the fatigue of the polishing body. It is possible to prevent the liquid from running out, and it is possible to reliably eliminate the inconvenience such as running out of liquid on the polishing surface 19 and to improve the polishing performance. Further, since the introduction position to the polishing surface 19 is the center recess 27 of the polishing body 11 formed in the recess 24 of the electrode plate 21, it is possible to surely eliminate the obstacles caused by the liquid running out near the center of the polishing surface 19. it can.

Further, since the supply of the electrolytic solution 18 is carried out by the supply pipe 17 along the rotary shaft 12, it is possible to avoid the shortening of the life of the seal portion as in the spin-through method, and maintain good performance for a long period of time. be able to. Since the electrode plate through hole 15 and the polishing body through hole 16 are arranged outside the through hole 28, the electrolytic solution 18 from the supply pipe 17 is moved outward by centrifugal force, so that the through holes 15 and 16 are naturally formed. Introduced into the chamber, the electrolyte solution 18 can be reliably supplied.

Since the cover 22 forms the closed space 26 inside the main body 20, it is possible to prevent the supplied electrolytic solution 18 from spilling or leaking.

FIG. 2 shows a second embodiment of the present invention. The polishing tool 10 of this embodiment is basically configured in the same manner as the first embodiment, but the arrangement of the electrode plate through hole 15 and the polishing body through hole 16 is different. Therefore, the description of the similar portions is omitted for simplification, and only the different portions will be described below. That is, in this embodiment, the electrode plate through holes 15 are formed in the peripheral portion of the upper surface of the raised portion 23, and The through hole 16 is arranged directly below the electrode plate through hole 15. However, also in this embodiment, the central axis positions of the through holes 15 and 16 are r3> r1 from the center of the rotary shaft 12.

In this embodiment, polishing is performed by the same procedure as in the first embodiment, the same effect as in the first embodiment can be obtained, and the through holes 15 and 16 are more Since it is at the center, the electrolytic solution 18 can be more uniformly and reliably supplied to the polishing body 11.

FIG. 3 shows a third embodiment of the present invention. The polishing tool 10 of this embodiment is basically configured in the same manner as the first embodiment, but the shape of the main body 20, more specifically, the shapes of the cover 22 and the viscoelastic polishing body 11 are different. Therefore, the description of the similar parts will be omitted for simplification, and only the different parts will be described below. That is, in this embodiment, the cover 22 does not cover the entire upper surface of the electrode plate 21, but the upper part of the raised portion 23. It is formed in a cylindrical shape with a cylinder so as to cover only that.

Further, the peripheral edge portion of the polishing body 11 is not folded back upward, and the vicinity of the end portion of the polishing body 11 is locked by penetrating with the screw 29 from the polishing surface 19 side. However, the closed space 26 is formed in the cover 22 and the electrode plate through hole 15 is opened in the closed space 26 as in the first embodiment. In this embodiment as described above, the polishing is performed by the same procedure as in the first embodiment, and the same effect as in the first embodiment can be obtained, and the closed space 26 is located immediately above the electrode plate through hole 15. Since it extends to the outer side, the supplied electrolytic solution 18 does not excessively accumulate on the outer side of the through hole 15, and waste can be eliminated.

FIG. 4 shows a fourth embodiment of the present invention. The polishing tool 10 of this embodiment is basically configured in the same manner as the third embodiment, but the arrangement of the electrode plate through holes 15 and the polishing body through holes 16 is different, and the size of the cover 22 is different. . Therefore, the description of the similar portions is omitted for simplification, and only the different portions will be described below. That is, in this embodiment, the electrode plate through holes 15 are formed in the peripheral portion of the upper surface of the raised portion 23, and The through hole 16 is arranged directly below the electrode plate through hole 15. However, also in this embodiment, the hole outside position r3 of each through hole 15, 16 is r3> r1 from the center of the rotary shaft 12.

Further, in this embodiment, the bottomed cylindrical cover 22 has a smaller diameter than that of the third embodiment, and is configured to cover only the upper surface of the raised portion 23 of the electrode plate 21. In this embodiment, polishing is performed by the same procedure as in the first embodiment, the same effect as that in the first embodiment can be obtained, and the electrode plate is the same as in the third embodiment. It is possible to eliminate waste such as excess electrolytic solution 18 accumulating on the outside of the through hole 15. In addition to this, since the through holes 15 and 16 are located at the center, the electrolytic solution 18 can be more evenly and surely applied to the polishing body 11. Can be supplied.

The present invention is not limited to the above-mentioned embodiments, and the following modifications and the like are also included in the present invention. In each of the above-described embodiments, the number of electrode plate through holes 15 and abrasive material through holes 16, the circumferential spacing, and the arrangement may be appropriately selected for implementation. For example, the through holes 15 and 16 may normally be arranged in an appropriate number in the circumferential direction (four holes at intervals of 90 degrees, six holes at intervals of 60 degrees, etc.). You may arrange a total of 6 holes by arranging two holes at 120-degree intervals at three positions in the same direction.

The electrode plate through-hole 15 may be formed in any direction as long as it is orthogonal to the face material of the electrode plate 21, but may be tilted if necessary, as in the first and third embodiments. When it is provided on the inclined surface portion of the raised portion 23, it may be inclined with respect to the electrode plate 21 so as to be parallel to the rotation axis 12. Further, the direction in which the abrasive material through-hole 16 is drilled is not limited to the substantially vertical direction as in each of the above-described embodiments, but it may be inclined so that the lower side is outward in the radial direction. The electrolytic solution 18 flowing down through 16 can be positively guided to the polishing surface 19 by centrifugal force.

Then, the raised portion 23 is formed on the upper surface side of the electrode plate 21 and the recessed portion 24 is formed on the lower surface side, but as a processing means thereof, an appropriate means such as press working of a plate material may be used. The raised portion 23 is provided to prevent the screw 13 from colliding with the polishing surface, and is not essential to the present invention, and the recess 24 is formed on the lower surface side of the thick plate material by cutting or the like. The electrode plate 21 may be formed by using the same, and the shape of the concave portion 24 is not limited to the truncated cone shape but may be a cylindrical shape or the like. In short, a predetermined distance is provided between the polishing surface side and the polishing surface 19 (surface to be polished). That is, the electrode plate 21 having the recess 24 in which the central recess 27 can be formed is used.

On the other hand, as a means for driving the rotary shaft 12 to rotate, a means such as a motor used for an existing rotary polishing tool may be appropriately adopted. Further, the viscoelastic polishing body 11 may be made of an existing material as appropriate, and the composition and concentration of the electrolytic solution 18, the material of abrasive grains to be mixed, the particle size and quantity, the energization state, etc. may be the existing ones. Appropriate adjustment may be made to obtain the optimum result when the structure is diverted and based on the present invention.

[0039]

[Effect of device]

 As described above, according to the present invention, the polishing performance can be improved by reliably supplying the abrasive mixed electrolyte to the polishing surface through the holes penetrating the electrode plate and the polishing body. Since there is no need for a rotary seal or the like, tool defects can be prevented even after long-term use, and good polishing performance can be maintained for a long time.

[Submission date] April 1, 1994

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be corrected] 0002

[Correction method] Change

[Correction content]

[0002]

[Background technology]

2. Description of the Related Art Conventionally, electrolytic polishing, which removes a material from the surface to be polished by the action opposite to that of electrolytic plating, has been used for polishing the surface of a metal material or the like. Among electropolishing, the dynamic processing method using NaCl as the electrolytic solution has high processing efficiency, but it is difficult to set the processing accuracy appropriately. On the other hand, the passivation processing method that uses NaNO3 or the like as the electrolytic solution is easy to improve the accuracy because elution due to the electrolytic current is suppressed by the passivation film (oxide film or inert film).

[Procedure Amendment 2]

[Document name to be amended] Statement

[Name of item to be corrected] 0005

[Correction method] Change

[Correction content]

[0006] For supplying the electrolytic solution in the solid method, an "electrolytic buffing method" (see Japanese Patent Laid-Open No. 53-132 893, etc.) is supplied from the vicinity of the root of the rotating shaft on the upper surface of the electrode and is supplied through a through hole that passes through to the polishing body. ) Is adopted, and the “spindle through method” is adopted in which the rotating shaft is made tubular and is fed through the inside to the lower surface side of the rotating disk-shaped electrode. In this spindle through method, since it is necessary to rotate the spindle, the electrolytic solution must be supplied via a rotary joint.In the case of a composite electrolytic solution in which abrasive particles are mixed with the electrolytic solution, the abrasive particles seal The problem is that the life of parts is shortened.

[Procedure 3]

[Document name to be amended] Statement

[Correction target item name] 0009

[Correction method] Change

[Correction content]

Further, the free-abrasive-grain type tool of FIG. 5 has a peculiar problem that defective liquid passage to the rotation center region 98 is likely to occur. That is, the electrolytic solution 95 supplied to the viscoelastic polishing body 93 moves in the circumferential direction due to the centrifugal force as the polishing body 93 rotates, and becomes infiltrated in a biased manner to the periphery, and the center of rotation of the polishing body 93. The electrolyte solution 95 does not reach the region 98. Even if the rotary polishing is performed in this state, defective polishing is caused in the rotation center region 98 due to the lack of the electrolytic solution 95 and the abrasive grains contained therein. Further, when the polishing body 93 is rubbed against the object to be polished in the absence of the sufficient electrolytic solution 95, burn due to friction heat generation and the urethane material of the polishing body 93 are melted due to electric resistance heat generation and are melted on the surface to be polished. This will lead to problems such as adhesion.

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0013

[Correction method] Change

[Correction content]

[0013]

[Action]

In the present invention, the electrode plate is rotated by the rotating shaft to supply the electrolytic solution containing the abrasive grains into the cover, and the viscoelastic polishing body attached to the electrode plate is pressed against the object to be polished. The supplied electrolytic solution accumulates in the space inside the cover and can be drawn into the recess through the electrode plate through hole. Next, the electrolytic solution passes through the through hole of the viscoelastic polishing body into the center recess corresponding to the recess on the polishing surface side of this polishing body, and then gradually spreads to the outer peripheral portion by centrifugal force and reaches the entire polishing surface. It will be. It is desirable that the liquid cannot pass through the inner surface of the polishing body through hole.

[Procedure Amendment 5]

[Document name to be amended] Statement

[Name of item to be corrected] 0024

[Correction method] Change

[Correction content]

The electrolytic solution 18 sent out into the central recess 27 and the electrolytic solution 18 infiltrated into the polishing body 11 move to the peripheral polishing surface 19 and a further outside portion of the polishing body 11 by a centrifugal force, and sequentially. It spreads to the outer peripheral portion and fully covers the entire polishing surface 19. When the electrolytic solution 18 is sufficiently supplied to the polishing surface 19, the abrasive grains mixed in the electrolytic solution 18 polish the surface to be polished by the rotation of the polishing body 11, and the polishing between the main body 20 and the polishing object is performed. A current flows from another power source through the electrolytic solution 18, and the surface to be polished is electropolished by electrolysis .

[Procedure correction 6]

[Document name to be amended] Statement

[Correction target item name] 0028

[Correction method] Change

[Correction content]

If the opening of the through hole 16 of the polishing body is performed by melting, for example, with a heating body, the inner wall of the hole becomes denser, more reliable supply of the electrolytic solution can be achieved, and the dissolved solution is removed from the hole. energization is also possible because it fills the out is if polishing the body. Further, since the closed space 26 is formed inside the main body 20 by the cover 22, it is possible to prevent the supplied electrolytic solution 18 from spilling or leaking.

[Procedure Amendment 7]

[Document name to be amended] Statement

[Name of item to be corrected] 0032

[Correction method] Change

[Correction content]

Further, the peripheral edge portion of the polishing body 11 is not folded back upward, and the vicinity of the end portion of the polishing body 11 is locked by penetrating with the screw 29 from the polishing surface 19 side. However, the closed space 26 is formed in the cover 22, and the electrode plate through hole 15 and the polishing body through hole 16 are opened in the closed space 26 as in the first embodiment. In this embodiment as described above, the polishing is performed by the same procedure as in the first embodiment, and the same effect as in the first embodiment can be obtained, and the closed space 26 is located immediately above the electrode plate through hole 15. Since it extends to the outer side, the supplied electrolytic solution 18 does not excessively accumulate on the outer side of the through hole 15, and waste can be eliminated.

[Brief description of drawings]

FIG. 1 is a sectional view showing a first embodiment of the present invention.

FIG. 2 is a sectional view showing a second embodiment of the present invention.

FIG. 3 is a sectional view showing a third embodiment of the present invention.

FIG. 4 is a sectional view showing a fourth embodiment of the present invention.

FIG. 5 is a sectional view showing a conventional example.

[Explanation of symbols]

 10 Electrolytic Compound Polishing Tool 11 Viscoelastic Polishing Body 12 Rotating Shaft 15 Electrode Plate Through Hole 16 Polishing Body Through Hole 18 Electrolyte 19 Polishing Surface 20 Main Body 21 Electrode Plate 22 Cover 23 Ridge 24 Cavity 27 Center Cavity

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[Procedure amendment]

[Submission date] April 1, 1994

[Procedure Amendment 8]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 5

[Correction method] Change

[Correction content]

[Figure 5]

Claims (3)

[Scope of utility model registration request] 1. A disk-shaped electrode plate having a recess in the center of the polishing surface, a rotating shaft connected to the center of the side of the electrode plate opposite to the recess and rotating the electrode plate, and the electrode. A viscoelastic polishing body adhered to the recess side surface of the plate, an electrode plate through hole penetrating the recess of the electrode plate, and a viscoelastic polishing body which is arranged at a position continuous with the electrode plate through hole and penetrates the viscoelastic polishing body. And a cover formed to surround the electrode plate through hole coaxially with the electrode plate around the rotary shaft of the electrode plate. Polishing tool. 2. The electrolytic composite polishing tool according to claim 1, wherein the concave portion is formed in a truncated cone shape, a peripheral surface of which is inclined with respect to the rotation axis, and the electrode plate through hole has a peripheral surface. The viscoelastic polishing body is formed so as to penetrate through the surface, and the viscoelastic polishing body is attached in a curved shape along the concave portion, and the opening of the polishing body through hole opposite to the electrode plate is the concave portion of the viscoelastic polishing body. An electrolytic composite polishing tool, characterized in that it is formed in a curved portion along the. 3. The electrolytic composite polishing tool according to claim 1 or 2, wherein the cover is formed in a cup shape covering a side surface of the electrode plate opposite to the concave portion, and the rotary shaft is provided at the center thereof. Is formed, and the inner diameter of the introduction hole is set to be larger than the outer shape of the rotating shaft and smaller than the distance from the center of the rotating shaft of the electrode plate through hole. Electrolytic compound polishing tool.