JPH073468A - Electroless plating cell - Google Patents
Electroless plating cellInfo
- Publication number
- JPH073468A JPH073468A JP14735493A JP14735493A JPH073468A JP H073468 A JPH073468 A JP H073468A JP 14735493 A JP14735493 A JP 14735493A JP 14735493 A JP14735493 A JP 14735493A JP H073468 A JPH073468 A JP H073468A
- Authority
- JP
- Japan
- Prior art keywords
- mandrel
- plating
- liquid
- wheel
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、中心に円形孔を有する
円形のハードディスクに無電解ニッケルめっき等を施す
無電解めっき槽に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroless plating bath for electroless nickel plating a circular hard disk having a circular hole at the center.
【0002】[0002]
【従来の技術】従来は、マンドレルの一端軸部を支持す
る昇降板の上端部に駆動モータを取り付け、モータ軸に
固定したギヤを中間ギヤを介してマンドレル上のギヤに
噛み合わせ、中間ギヤ以下をめっき液中に浸漬してマン
ドレルを駆動ギヤにより回転させながら無電解ニッケル
めっきを施している。ところがその場合は、ギヤの噛合
い部分から生ずる微粉がめっき液中へ入り込み、マンド
レルに吊されたハードディスクに付着するため、ハード
ディスクの性能が大幅に低下する。2. Description of the Related Art Conventionally, a drive motor is attached to the upper end of an elevating plate that supports one end shaft of a mandrel, and a gear fixed to the motor shaft is meshed with a gear on the mandrel via an intermediate gear. Is immersed in a plating solution and the mandrel is rotated by a drive gear to perform electroless nickel plating. However, in that case, the fine powder generated from the meshing portion of the gear enters the plating solution and adheres to the hard disk suspended on the mandrel, which significantly reduces the performance of the hard disk.
【0003】[0003]
【発明の目的】本発明は、めっき液の充満した処理槽内
に於ける微粉(ごみ)の発生を防止することを目的とし
ている。An object of the present invention is to prevent generation of fine powder (dust) in a processing tank filled with a plating solution.
【0004】[0004]
【発明の構成】本発明は、処理槽内で水平かつ回転自在
に支持され長さの中間部に水車を有し円形孔を有する円
形ディスクを吊す多数の環状溝付きマンドレルと、処理
槽底部で上記水車に処理液を噴射する処理液供給ノズル
と、処理槽内の所定レベルの堰を越えた処理液の排出口
を有する無電解めっき槽である。The present invention comprises a large number of annular grooved mandrels which are rotatably supported horizontally and rotatably in a processing tank and which have a water wheel in the middle portion of their length and which hang a circular disk having circular holes, and a bottom of the processing tank. It is an electroless plating tank having a processing liquid supply nozzle for injecting the processing liquid onto the water wheel and a discharge port for the processing liquid that has passed over a weir of a predetermined level in the processing tank.
【0005】[0005]
【実施例】図1の円形のハードディスク1は同芯の円形
孔2を備え、例えば外径45mm(最少34mm)のア
ルミ板である。ハードディスク1は垂直な姿勢で、中心
孔2は、テフロン(商品名)製の水平なマンドレル3の
外周に設けた多数の半円形断面の環状溝4に嵌まり、マ
ンドレル3が回転するとハードディスク1も従動回転す
る。無電解めっき作業中には、ハードディスク1は液面
Lのめっき液5の内部に浸漬する。EXAMPLE A circular hard disk 1 shown in FIG. 1 is provided with a concentric circular hole 2 and is, for example, an aluminum plate having an outer diameter of 45 mm (minimum 34 mm). The hard disk 1 is in a vertical posture, and the central hole 2 is fitted in a large number of annular grooves 4 having a semicircular cross section provided on the outer periphery of a horizontal mandrel 3 made of Teflon (trade name), and when the mandrel 3 rotates, the hard disk 1 also Followed rotation. During the electroless plating operation, the hard disk 1 is immersed in the plating solution 5 on the liquid surface L.
【0006】図2において、めっき槽その他の処理槽8
(例えばPVC又はステンレス製)の底板9の左右両端
部と中間部には、マンドレル3の左右両端部と中間部の
軸部3a、3bを支持する上開きスリット状の軸受10
を有する夫々1対のサポート11、12が設けてある。
図2の処理槽8は図3のように3本のマンドレル3をセ
ットできる構成であるが、量産時には、10本、又はそ
れ以上のマンドレルをセットできるようにすることが好
ましい。サポート12は省略することもできる。処理槽
8の後端部の堰13はめっき液5のレベルLを規制する
高さを有し、その背後の漏液受室14(図3、図4)の
底部の排出口15はパイプ16を介して貯槽17に連通
している。In FIG. 2, a plating tank and other processing tanks 8 are provided.
Upper and lower slit-shaped bearings 10 that support the left and right end portions of the mandrel 3 and the shaft portions 3a and 3b of the middle portion at the left and right end portions and the middle portion of the bottom plate 9 (for example, made of PVC or stainless steel).
A pair of supports 11 and 12 are provided for each.
The processing tank 8 in FIG. 2 has a configuration in which three mandrels 3 can be set as in FIG. 3, but it is preferable that ten or more mandrels can be set in mass production. The support 12 can be omitted. The weir 13 at the rear end of the processing tank 8 has a height that regulates the level L of the plating solution 5, and the discharge port 15 at the bottom of the liquid leakage receiving chamber 14 (FIGS. 3 and 4) behind it is a pipe 16 It communicates with the storage tank 17 via.
【0007】図2に於いて、マンドレル3の左右方向中
間部の隣接した軸部3b、3b間には、放射状の羽根2
0を有する水車21(例えばPVC製)が固着され、軸
部3bの水車21と反対側近傍には、水車21より大径
の円板状の邪魔板22(例えばPVC製)がセットボル
ト23により固着されている。邪魔板22は水車21に
よるめっき液5の乱れが近傍のハードディスク1に悪影
響を与えることを防止している。水車21が左右端部に
邪魔板を一体に有する場合は、図示の邪魔板22を省略
してもよい。In FIG. 2, the radial blades 2 are provided between the adjacent shaft portions 3b, 3b of the mandrel 3 at the intermediate portion in the left-right direction.
A water wheel 21 (for example, made of PVC) having 0 is fixed, and a disc-shaped baffle plate 22 (for example, made of PVC) having a diameter larger than that of the water wheel 21 is set by a set bolt 23 near the opposite side of the shaft portion 3b from the water wheel 21. It is fixed. The baffle plate 22 prevents the disturbance of the plating solution 5 caused by the water wheel 21 from adversely affecting the hard disk 1 in the vicinity. When the water wheel 21 has baffle plates integrally on the left and right ends, the baffle plate 22 shown may be omitted.
【0008】水車21下方の底板9には、処理液(この
場合はめっき液)供給ノズル25がセットボルト26に
より固着されている。ノズル25はパイプ27を介して
ポンプ28の吐出口に接続しており、底板9から一旦垂
直に起立した後、その上端部から先端部25a(図3)
が後方へ突出し、後端開口面25bは側方(図3)から
見て水車21の羽根20の先端軌跡に沿うように円弧状
に湾曲し、後端開口面25bの下端部は最下端の羽根2
0の下端と同一高さにある。マンドレル3の左右両端部
の29は吊上げ用のフック(図示せず)を掛ける掴み部
である。A processing liquid (plating liquid in this case) supply nozzle 25 is fixed to the bottom plate 9 below the water turbine 21 by a set bolt 26. The nozzle 25 is connected to the discharge port of the pump 28 via the pipe 27, and once stands upright from the bottom plate 9, the nozzle 25 extends from the upper end to the tip 25a (FIG. 3).
Is projected rearward, the rear end opening surface 25b is curved in an arc shape along the tip locus of the blades 20 of the water wheel 21 when viewed from the side (FIG. 3), and the lower end portion of the rear end opening surface 25b is at the lowest end. Feather 2
It is flush with the bottom edge of 0. Reference numerals 29 at the left and right ends of the mandrel 3 are gripping parts for hanging hooks (not shown) for lifting.
【0009】貯槽17内のめっき液5はポンプ28で加
圧され、加圧めっき液はノズル25から勢い良く後方へ
噴出し、羽根20に衝突するため、水車21は図3の矢
印A方向に所定回転数で駆動される。水車21と共にマ
ンドレル3も等速で回転し、マンドレル3に吊り下げた
ハードディスク1も従動回転し、ハードディスク1上に
無電解ニッケルめっきが施される。所定時間経過後、ポ
ンプ28を止め、マンドレル3を引き上げ、次工程の処
理槽へ供給する。The plating solution 5 in the storage tank 17 is pressurized by the pump 28, and the pressurized plating solution is vigorously ejected rearward from the nozzle 25 and collides with the blades 20, so that the water turbine 21 moves in the direction of arrow A in FIG. It is driven at a predetermined rotation speed. The mandrel 3 rotates together with the water wheel 21 at a constant speed, and the hard disk 1 suspended on the mandrel 3 also rotates, so that the hard disk 1 is electrolessly nickel plated. After a lapse of a predetermined time, the pump 28 is stopped, the mandrel 3 is pulled up, and the mandrel 3 is supplied to the treatment tank of the next step.
【0010】[0010]
【発明の効果】本発明によると、ノズル25からの処理
液の噴流により水車21が駆動されるので、摩耗による
粉塵がめっき液5に混入する恐れは皆無となり、高品質
のハードディスク1を得ることができる。構造簡単なた
め、安価に製造することができる。According to the present invention, since the water wheel 21 is driven by the jet of the processing liquid from the nozzle 25, there is no possibility that dust due to abrasion will be mixed into the plating liquid 5, and a high quality hard disk 1 can be obtained. You can Since the structure is simple, it can be manufactured at low cost.
【図1】 図2のIーI線に沿う縦断側面図である。FIG. 1 is a vertical sectional side view taken along the line II of FIG.
【図2】 縦断正面図である。FIG. 2 is a vertical sectional front view.
【図3】 図2のIII ーIII 断面図である。3 is a sectional view taken along line III-III in FIG.
【図4】 平面図である。FIG. 4 is a plan view.
1 ハードディスク 2 円形孔 3 マンドレル 4 環状溝 13 堰 15 排出口 21 水車 25 処理液供給ノズル 1 Hard Disk 2 Circular Hole 3 Mandrel 4 Annular Groove 13 Weir 15 Discharge Port 21 Hydro Turbine 25 Treatment Liquid Supply Nozzle
Claims (1)
長さの中間部に水車を有し円形孔を有する円形ディスク
を吊す多数の環状溝付きマンドレルと、処理槽底部で上
記水車に処理液を噴射する処理液供給ノズルと、処理槽
内の所定レベルの堰を越えた処理液の排出口を有する無
電解めっき槽。1. A large number of annular grooved mandrels for suspending a circular disc having a circular hole having a water wheel at a middle portion of a length horizontally and rotatably supported in a processing tank, and treating the water wheel at the bottom of the processing tank. An electroless plating bath having a treatment liquid supply nozzle for injecting a liquid and a treatment liquid discharge port that exceeds a weir of a predetermined level in the treatment bath.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14735493A JP3188554B2 (en) | 1993-06-18 | 1993-06-18 | Electroless plating tank |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14735493A JP3188554B2 (en) | 1993-06-18 | 1993-06-18 | Electroless plating tank |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH073468A true JPH073468A (en) | 1995-01-06 |
JP3188554B2 JP3188554B2 (en) | 2001-07-16 |
Family
ID=15428299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14735493A Expired - Fee Related JP3188554B2 (en) | 1993-06-18 | 1993-06-18 | Electroless plating tank |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3188554B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6001235A (en) * | 1997-06-23 | 1999-12-14 | International Business Machines Corporation | Rotary plater with radially distributed plating solution |
JP2013168202A (en) * | 2012-02-16 | 2013-08-29 | Hitachi High-Technologies Corp | Disk cleaning device |
CN107252756A (en) * | 2017-05-23 | 2017-10-17 | 安徽柳峰包装材料有限责任公司 | A kind of glue uniformly smears scraper plate |
-
1993
- 1993-06-18 JP JP14735493A patent/JP3188554B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6001235A (en) * | 1997-06-23 | 1999-12-14 | International Business Machines Corporation | Rotary plater with radially distributed plating solution |
JP2013168202A (en) * | 2012-02-16 | 2013-08-29 | Hitachi High-Technologies Corp | Disk cleaning device |
CN107252756A (en) * | 2017-05-23 | 2017-10-17 | 安徽柳峰包装材料有限责任公司 | A kind of glue uniformly smears scraper plate |
Also Published As
Publication number | Publication date |
---|---|
JP3188554B2 (en) | 2001-07-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |