JP3188554B2 - Electroless plating tank - Google Patents

Electroless plating tank

Info

Publication number
JP3188554B2
JP3188554B2 JP14735493A JP14735493A JP3188554B2 JP 3188554 B2 JP3188554 B2 JP 3188554B2 JP 14735493 A JP14735493 A JP 14735493A JP 14735493 A JP14735493 A JP 14735493A JP 3188554 B2 JP3188554 B2 JP 3188554B2
Authority
JP
Japan
Prior art keywords
electroless plating
water wheel
tank
mandrel
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP14735493A
Other languages
Japanese (ja)
Other versions
JPH073468A (en
Inventor
敦彦 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C.UYEMURA&CO.,LTD.
Original Assignee
C.UYEMURA&CO.,LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C.UYEMURA&CO.,LTD. filed Critical C.UYEMURA&CO.,LTD.
Priority to JP14735493A priority Critical patent/JP3188554B2/en
Publication of JPH073468A publication Critical patent/JPH073468A/en
Application granted granted Critical
Publication of JP3188554B2 publication Critical patent/JP3188554B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、中心に円形孔を有する
円形のハードディスクに無電解ニッケルめっき等を施す
無電解めっき槽に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroless plating tank for applying electroless nickel plating or the like to a circular hard disk having a circular hole at the center.

【0002】[0002]

【従来の技術】従来は、マンドレルの一端軸部を支持す
る昇降板の上端部に駆動モータを取り付け、モータ軸に
固定したギヤを中間ギヤを介してマンドレル上のギヤに
噛み合わせ、中間ギヤ以下をめっき液中に浸漬してマン
ドレルを駆動ギヤにより回転させながら無電解ニッケル
めっきを施している。ところがその場合は、ギヤの噛合
い部分から生ずる微粉がめっき液中へ入り込み、マンド
レルに吊されたハードディスクに付着するため、ハード
ディスクの性能が大幅に低下する。
2. Description of the Related Art Conventionally, a drive motor is mounted on an upper end of a lifting plate supporting one end shaft of a mandrel, and a gear fixed to the motor shaft is meshed with a gear on the mandrel via an intermediate gear. Is immersed in a plating solution to perform electroless nickel plating while rotating a mandrel by a drive gear. However, in this case, fine powder generated from the meshing portion of the gears enters the plating solution and adheres to the hard disk suspended on the mandrel, so that the performance of the hard disk is significantly reduced.

【0003】[0003]

【発明の目的】本発明は、めっき液の充満した処理槽内
に於ける微粉(ごみ)の発生を防止することを目的とし
ている。
An object of the present invention is to prevent the generation of fine powder (dust) in a treatment tank filled with a plating solution.

【0004】[0004]

【発明の構成】本発明は、無電解めっき用の処理槽内で
水平かつ回転自在に支持され長さの中間部に水車を有し
円形孔を有する円形ディスクを吊す多数の環状溝付きマ
ンドレルと、処理槽底部で上記水車に処理液を噴射する
処理液供給ノズルと、処理槽内の所定レベルの堰を越え
た処理液の排出口を有する無電解めっき槽である。
SUMMARY OF THE INVENTION The present invention relates to a mandrel having a plurality of annular grooves, which is supported horizontally and rotatably in a treatment tank for electroless plating, has a water wheel at an intermediate length thereof, and suspends a circular disk having a circular hole. An electroless plating tank having a processing liquid supply nozzle for injecting the processing liquid into the water wheel at the bottom of the processing tank, and a discharge port for the processing liquid beyond a predetermined level weir in the processing tank.

【0005】[0005]

【実施例】図1の円形のハードディスク1は同芯の円形
孔2を備え、例えば外径45mm(最少34mm)のア
ルミ板である。ハードディスク1は垂直な姿勢で、中心
孔2は、テフロン(登録商標名)製の水平なマンドレル
3の外周に設けた多数の半円形断面の環状溝4に嵌ま
り、マンドレル3が回転するとハードディスク1も従動
回転する。無電解めっき作業中には、ハードディスク1
は液面Lのめっき液5の内部に浸漬する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A circular hard disk 1 shown in FIG. 1 has a concentric circular hole 2 and is, for example, an aluminum plate having an outer diameter of 45 mm (minimum 34 mm). The hard disk 1 is in a vertical posture, and the center hole 2 is fitted into a number of annular grooves 4 having a semicircular cross section provided on the outer periphery of a horizontal mandrel 3 made of Teflon (registered trademark). Also rotates. During the electroless plating operation, the hard disk 1
Is immersed in the plating solution 5 on the liquid level L.

【0006】図2において、無電解めっき用の処理槽8
(例えば略称PVCのポリ塩化ビニール又はステンレス
製)の底板9の左右両端部と中間部には、マンドレル3
の左右両端部と中間部の軸部3a、3bを支持する上開
きスリット状の軸受10を有する夫々1対のサポート1
1、12が設けてある。図2の処理槽8は図3のように
3本のマンドレル3をセットできる構成であるが、量産
時には、10本、又はそれ以上のマンドレルをセットで
きるようにすることが好ましい。サポート12は省略す
ることもできる。処理槽8の後端部の堰13はめっき液
5のレベルLを規制する高さを有し、その背後の漏液受
室14(図3、図4)の底部の排出口15はパイプ16
を介して貯槽17に連通している。
In FIG. 2, a treatment tank 8 for electroless plating is used.
At the left and right ends and at the middle of the bottom plate 9 (for example, made of PVC or stainless steel, abbreviated as PVC), the mandrel 3 is provided.
A pair of supports 1 each having an upper opening slit-shaped bearing 10 for supporting both left and right end portions and an intermediate shaft portion 3a, 3b.
1, 12 are provided. Although the processing tank 8 in FIG. 2 has a configuration in which three mandrels 3 can be set as shown in FIG. 3, it is preferable that ten or more mandrels can be set in mass production. The support 12 can be omitted. The weir 13 at the rear end of the processing tank 8 has a height that regulates the level L of the plating solution 5, and the outlet 15 at the bottom of the liquid leakage receiving chamber 14 (FIG. 3, FIG.
Through the storage tank 17.

【0007】図2に於いて、マンドレル3の左右方向中
間部の隣接した軸部3b、3b間には、放射状の羽根2
0を有する水車21(例えばPVC製)が固着され、軸
部3bの水車21と反対側近傍には、水車21より大径
の円板状の邪魔板22(例えばPVC製)がセットボル
ト23により固着されている。邪魔板22は水車21に
よるめっき液5の乱れが近傍のハードディスク1に悪影
響を与えることを防止している。水車21が左右端部に
邪魔板を一体に有する場合は、図示の邪魔板22を省略
してもよい。
In FIG. 2, a radial blade 2 is provided between adjacent shaft portions 3b, 3b at an intermediate portion of the mandrel 3 in the left-right direction.
A water wheel 21 (e.g., made of PVC) having 0 is fixed, and a disc-shaped baffle plate 22 (e.g., made of PVC) having a diameter larger than that of the water wheel 21 is provided by a set bolt 23 near the shaft portion 3b near the side opposite to the water wheel 21. It is fixed. The baffle plate 22 prevents the disturbance of the plating solution 5 by the water wheel 21 from adversely affecting the nearby hard disk 1. When the water wheel 21 has a baffle plate integrally at the left and right ends, the baffle plate 22 shown may be omitted.

【0008】水車21下方の底板9には、処理液(この
場合は無電解めっき液)供給ノズル25がセットボルト
26により固着されている。ノズル25はパイプ27を
介してポンプ28の吐出口に接続しており、底板9から
一旦垂直に起立した後、その上端部から先端部25a
(図3)が後方へ突出し、後端開口面25bは側方(図
3)から見て水車21の羽根20の先端軌跡に沿うよう
に円弧状に湾曲し、後端開口面25bの下端部は最下端
の羽根20の下端と同一高さにある。マンドレル3の左
右両端部の29は吊上げ用のフック(図示せず)を掛け
る掴み部である。
A processing liquid (in this case, an electroless plating liquid) supply nozzle 25 is fixed to the bottom plate 9 below the water wheel 21 by a set bolt 26. The nozzle 25 is connected to a discharge port of a pump 28 through a pipe 27, and once stands upright from the bottom plate 9 and then from its upper end to a tip 25a.
(FIG. 3) protrudes rearward, and the rear end opening surface 25b is curved in an arc shape so as to follow the tip trajectory of the blade 20 of the water wheel 21 when viewed from the side (FIG. 3), and the lower end portion of the rear end opening surface 25b. Is at the same height as the lower end of the lowermost blade 20. Reference numerals 29 at both left and right end portions of the mandrel 3 are grip portions for hanging hooks (not shown) for lifting.

【0009】貯槽17内のめっき液5はポンプ28で加
圧され、加圧めっき液はノズル25から勢い良く後方へ
噴出し、羽根20に衝突するため、水車21は図3の矢
印A方向に所定回転数で駆動される。水車21と共にマ
ンドレル3も等速で回転し、マンドレル3に吊り下げた
ハードディスク1も従動回転し、ハードディスク1上に
無電解ニッケルめっきが施される。所定時間経過後、ポ
ンプ28を止め、マンドレル3を引き上げ、次工程の処
理槽へ供給する。
The plating solution 5 in the storage tank 17 is pressurized by a pump 28, and the pressurized plating solution gushes vigorously rearward from a nozzle 25 and collides with a blade 20, so that the water wheel 21 is moved in the direction of arrow A in FIG. It is driven at a predetermined rotation speed. The mandrel 3 rotates at a constant speed together with the water wheel 21, and the hard disk 1 suspended on the mandrel 3 also rotates, and electroless nickel plating is performed on the hard disk 1. After a lapse of a predetermined time, the pump 28 is stopped, the mandrel 3 is pulled up, and the mandrel 3 is supplied to the processing tank in the next step.

【0010】[0010]

【発明の効果】本発明によると、ノズル25からの処理
液の噴流により水車21が駆動されるので、摩耗による
粉塵がめっき液5に混入する恐れは皆無となり、高品質
のハードディスク1を得ることができる。構造簡単なた
め、安価に製造することができる。
According to the present invention, since the water wheel 21 is driven by the jet of the processing liquid from the nozzle 25, there is no possibility that dust due to abrasion will be mixed into the plating solution 5, and the high quality hard disk 1 will be obtained. Can be. Since the structure is simple, it can be manufactured at low cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 図2のIーI線に沿う縦断側面図である。FIG. 1 is a vertical sectional side view taken along line II of FIG. 2;

【図2】 縦断正面図である。FIG. 2 is a vertical sectional front view.

【図3】 図2のIII ーIII 断面図である。FIG. 3 is a sectional view taken along the line III-III of FIG. 2;

【図4】 平面図である。FIG. 4 is a plan view.

【符号の説明】[Explanation of symbols]

1 ハードディスク 2 円形孔 3 マンドレル 4 環状溝 13 堰 15 排出口 21 水車 25 処理液供給ノズル DESCRIPTION OF SYMBOLS 1 Hard disk 2 Circular hole 3 Mandrel 4 Annular groove 13 Weir 15 Outlet 21 Waterwheel 25 Treatment liquid supply nozzle

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 無電解めっき用の処理槽内で水平かつ回
転自在に支持され長さの中間部に水車を有し円形孔を有
する円形ディスクを吊す多数の環状溝付きマンドレル
と、処理槽底部で上記水車に処理液を噴射する処理液供
給ノズルと、処理槽内の所定レベルの堰を越えた処理液
の排出口を有する無電解めっき槽。
1. A plurality of mandrels having a plurality of annular grooves for supporting a circular disk having a water wheel at an intermediate length and having a circular hole, rotatably supported in a processing tank for electroless plating in a horizontal and rotatable manner, and a bottom of the processing tank. And an electroless plating tank having a processing liquid supply nozzle for injecting the processing liquid into the water wheel and an outlet for the processing liquid beyond a predetermined level weir in the processing tank.
JP14735493A 1993-06-18 1993-06-18 Electroless plating tank Expired - Fee Related JP3188554B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14735493A JP3188554B2 (en) 1993-06-18 1993-06-18 Electroless plating tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14735493A JP3188554B2 (en) 1993-06-18 1993-06-18 Electroless plating tank

Publications (2)

Publication Number Publication Date
JPH073468A JPH073468A (en) 1995-01-06
JP3188554B2 true JP3188554B2 (en) 2001-07-16

Family

ID=15428299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14735493A Expired - Fee Related JP3188554B2 (en) 1993-06-18 1993-06-18 Electroless plating tank

Country Status (1)

Country Link
JP (1) JP3188554B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6001235A (en) * 1997-06-23 1999-12-14 International Business Machines Corporation Rotary plater with radially distributed plating solution
JP2013168202A (en) * 2012-02-16 2013-08-29 Hitachi High-Technologies Corp Disk cleaning device
CN107252756A (en) * 2017-05-23 2017-10-17 安徽柳峰包装材料有限责任公司 A kind of glue uniformly smears scraper plate

Also Published As

Publication number Publication date
JPH073468A (en) 1995-01-06

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