JPH0734244B2 - How to clean the core block - Google Patents

How to clean the core block

Info

Publication number
JPH0734244B2
JPH0734244B2 JP20380889A JP20380889A JPH0734244B2 JP H0734244 B2 JPH0734244 B2 JP H0734244B2 JP 20380889 A JP20380889 A JP 20380889A JP 20380889 A JP20380889 A JP 20380889A JP H0734244 B2 JPH0734244 B2 JP H0734244B2
Authority
JP
Japan
Prior art keywords
core block
cleaning
glass
core
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP20380889A
Other languages
Japanese (ja)
Other versions
JPH0368700A (en
Inventor
道章 山内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP20380889A priority Critical patent/JPH0734244B2/en
Publication of JPH0368700A publication Critical patent/JPH0368700A/en
Publication of JPH0734244B2 publication Critical patent/JPH0734244B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、コアブロックの良好な洗浄が可能で、磁気ヘ
ッドコアを製造した際の歩留りが良好なコアブロックの
洗浄方法に関するものである。
Description: TECHNICAL FIELD The present invention relates to a method of cleaning a core block, which enables good cleaning of the core block and has a good yield when a magnetic head core is manufactured.

(従来の技術) 従来、磁気ヘッドコアを製造するにあたって、例えばフ
ェライト等に巻線用の溝加工とギャップ形成したコアブ
ロックにトラック溝加工および巻線用の溝加工を実施
し、所定の洗浄を実施して切削くず等を除去した後、必
要に応じてコアブロックをガラス等で接合することによ
りコアブロック接合体を得ていた。
(Prior Art) Conventionally, in manufacturing a magnetic head core, for example, a groove processing for winding is formed on ferrite or the like and a track groove processing and groove processing for winding are performed on a core block having a gap, and predetermined cleaning is performed. After removing the cutting debris and the like, the core block joined body was obtained by joining the core blocks with glass or the like as needed.

従来、その洗浄方法として、コアブロックに所定のトラ
ック溝加工を施した後、リグロイン、アルコール、純
水、薄い硝酸等を使用して超音波洗浄を実施することが
公知であり、この洗浄によりトラック溝や巻線溝に残っ
た切削くず等を除去していた。
Conventionally, as a cleaning method, it is known that after performing predetermined track groove processing on a core block, ultrasonic cleaning is performed using ligroin, alcohol, pure water, dilute nitric acid, etc. Cutting debris left in the grooves and winding grooves was removed.

(発明が解決しようとする課題) しかしながら、従来の洗浄では、いずれの洗浄方法を使
用しても、トラック溝や巻線溝の中から研削くず、接着
剤の残渣、研磨剤のくず等の付着物を完全に除去するこ
とができない問題があった。その結果、この状態でコア
ブロックの接合のためガラス流り込みを実施すると、除
去しきれないで溝部に残った付着物に起因して、ガラス
部に気泡が多発して磁気ヘッドコアとして使用できず、
歩留りが低下する問題があった。
(Problems to be Solved by the Invention) However, in the conventional cleaning method, no matter which cleaning method is used, grinding debris, adhesive residue, abrasive debris, etc. are removed from the track groove and winding groove. There was a problem that the kimono could not be completely removed. As a result, if glass pouring is performed in this state for joining the core blocks, many bubbles will be generated in the glass part due to the deposits that could not be removed and remained in the groove part, and it could not be used as a magnetic head core. ,
There was a problem that the yield was reduced.

本発明の目的は上述した課題を解消して、コアブロック
の溝部から付着物を良好に除去可能でガラス中の気泡発
生がほとんどなく、磁気ヘッドコアを製造する際の歩留
りを向上させることができるコアブロックの洗浄方法を
提供しようとするものである。(課題を解決するための
手段) 本発明のコアブロックの洗浄方法は、コアブロックにト
ラック溝加工を実施した後、アルカリ金属イオンと塩素
イオンとの存在下で洗浄を行ない、その後純水で洗浄す
ることを特徴とするものである。
The object of the present invention is to solve the above-mentioned problems, and to improve the yield when manufacturing magnetic head cores, capable of satisfactorily removing the deposits from the groove of the core block, hardly generating bubbles in the glass. It is intended to provide a method of cleaning a block. (Means for Solving the Problem) A method for cleaning a core block according to the present invention is performed by performing track groove processing on a core block, then cleaning in the presence of alkali metal ions and chlorine ions, and then cleaning with pure water. It is characterized by doing.

(作 用) 上述した構成において、溝部の洗浄をアルカリ金属イオ
ンと塩素イオンとの存在下、好ましくは5〜20%のNaCl
溶液または5〜20%のKCl溶液を使用して超音波洗浄を
実施すると、溝部からほぼ完全に付着物を除去できると
ともうに、ギャップガラスの侵食がなく接合に使用する
ガラスに悪影響を与えないことを見出したことによる。
(Operation) In the above-mentioned configuration, the groove is washed in the presence of alkali metal ions and chlorine ions, preferably 5 to 20% NaCl.
If ultrasonic cleaning is performed using a solution or a 5-20% KCl solution, it is possible to almost completely remove deposits from the groove, and it does not erode the gap glass and adversely affects the glass used for bonding. It is due to the fact that there is nothing.

(実施例) 第1図は本発明の洗浄方法を使用した磁気ヘッドコアの
製造方法の一連の工程を示すフローチャートである。第
1図において、まずフェライト等に巻線用の溝加工とギ
ャップ形成したコアブロックを準備し、準備したコアブ
ロックに所定のトラック溝加工を実施する。次に、溝加
工時に発生した切削くず、接着剤の残渣、研磨剤のくず
等の付着物を洗浄により除去する。
(Embodiment) FIG. 1 is a flowchart showing a series of steps in a method of manufacturing a magnetic head core using the cleaning method of the present invention. In FIG. 1, first, a core block in which a groove for winding is formed and a gap is formed in ferrite or the like is prepared, and a predetermined track groove is formed in the prepared core block. Next, cutting debris, adhesive residue, abrasive debris, and other deposits generated during grooving are removed by washing.

この際、本発明の洗浄方法、すなわちアルカリ金属イオ
ンと塩素イオンの存在下で超音波洗浄を実施すると、従
来法と比較して例えば100μm程度の微細な溝中から付
着物を良好に除去することができる。なお、洗浄液とし
て使用するアルカリ金属イオンと塩素イオンの両者が存
在する溶液としては、5〜20%のNaCl溶液または5〜20
%のKCl溶液の使用が、付着物の除去により完全に実施
できるとともに、ギャップガラスの侵食がなく後の工程
で使用するガラスに悪影響を与えないため好ましい。そ
の後、さらに純水で洗浄して清浄にした後乾燥して、所
定のコアブロックを得る。最後に、コアブロックをガラ
ス流し込みにより接合して、コアブロック接合体を作製
している。
At this time, when the cleaning method of the present invention, that is, ultrasonic cleaning in the presence of alkali metal ions and chlorine ions, is performed, it is possible to satisfactorily remove deposits from fine grooves of, for example, about 100 μm as compared with the conventional method. You can The solution containing both alkali metal ions and chloride ions used as a cleaning solution is a 5-20% NaCl solution or 5-20%.
% KCl solution is preferable because it can be completely carried out by removing deposits and does not corrode the gap glass and does not adversely affect the glass used in the subsequent step. Then, it is further washed with pure water to be cleaned and then dried to obtain a predetermined core block. Finally, the core blocks are joined by pouring glass to produce a core block joined body.

以下、実際の例について説明する。Hereinafter, an actual example will be described.

実施例 洗浄液として、3%〜25%まで濃度を変化させたNaCl溶
液およびKCl溶液を使用するとともに、比較例としてCuC
l2溶液を使用し、実際に溝加工後のコアブロックをリグ
ロイン洗浄液で超音波洗浄して、付着物を除去後、ギャ
ップガラスの侵食およびトラック溝のガラス部における
気泡の発生を調べるとともに、それらを総合的に判別し
た。結果を第1表に示す。なお、第1表中、付着物の除
去度および総合判定において、○は良好、△は普通、×
は不良を示している。
Example As a cleaning solution, a NaCl solution and a KCl solution whose concentrations were changed from 3% to 25% were used, and CuC was used as a comparative example.
l 2 solution is used to ultrasonically clean the core block after grooving with a ligroin cleaning solution to remove deposits, and then to investigate the erosion of the gap glass and the generation of bubbles in the glass portion of the track groove. Was comprehensively determined. The results are shown in Table 1. In Table 1, ◯ is good, Δ is normal, and × in the degree of removal of adhered substances and overall judgment.
Indicates a defect.

第1表の結果から、本発明の洗浄液としてアルカリ金属
イオンと塩素イオンの存在する溶液、ここではNaClおよ
びKClを使用した溶液は静電気をやわらげコアブロック
に静電気で付着している研磨くず等が除去でき良好な洗
浄を達成できるとともに、ガラスへの侵食もなく、ガラ
スの濡れ性がよく、コアブロックの洗浄方法として最適
であることがわかった。また、比較例として使用したCu
Cl2の溶液は、洗浄能力は良好なもののギャップガラス
を侵食するため、コアブロックの洗浄には適さないこと
がわった。なお、溶液の濃度については、NaClおよびKC
lの両者とも5%〜25%であると良好なことがわかっ
た。
From the results shown in Table 1, a solution containing alkali metal ions and chlorine ions as the cleaning solution of the present invention, in which a solution using NaCl and KCl is used, softens the static electricity and removes the polishing debris and the like adhering electrostatically to the core block. It was found that good cleaning can be achieved, glass is not eroded, and the glass has good wettability, which is the most suitable method for cleaning the core block. In addition, Cu used as a comparative example
It was found that the Cl 2 solution was not suitable for cleaning the core block because it eroded the gap glass although it had good cleaning ability. The concentrations of the solutions are NaCl and KC.
It was found that both of the values of l were 5% to 25%.

さらに、リグロインを洗浄液として使用した従来法と10
%NaCl溶液を使用した本発明の方法とにより、それぞれ
上述した実施例と同様にコアブロック接合体を作製し、
トラックガラス部における31μm以上の気泡の発生数を
100倍の顕微鏡の視野内で測定して、1コアブロック接
合体についてのそれぞれ70試料の平均を求めた。結果を
第2表に示す。
In addition to the conventional method using ligroin as a cleaning solution,
By the method of the present invention using a% NaCl solution, a core block joined body is produced in the same manner as in the above-mentioned Examples,
The number of bubbles of 31 μm or more generated in the track glass
An average of 70 samples for each core block conjugate was determined by measuring in the field of view of a microscope of 100 times. The results are shown in Table 2.

第2表の結果からも、本発明の洗浄方法によると、良好
な洗浄結果が得られ、この洗浄を経たコアブロックを使
用してコアブロック接合体を得ると、歩留りよく磁気ヘ
ッドコアを作製できることがわかった。
From the results in Table 2 as well, according to the cleaning method of the present invention, good cleaning results are obtained, and when a core block joined body is obtained using the core block that has undergone this cleaning, a magnetic head core can be manufactured with good yield. all right.

(発明の効果) 以上の説明から明らかように、本発明のコアブロックの
洗浄方法によれば、溝加工後のコアブロックをアルカリ
金属イオンと塩素イオンの存在下で超音波洗浄すること
により、微細な溝部からほば完全に付着物を除去できる
とともにギャップガラスの侵食がなく、後工程で使用す
るガラスに悪影響を与えないため、洗浄後のコアブロッ
クを使用してコアブロック接合体を作製すると、歩留り
良く磁気ヘッドコアを得ることができる。
(Effects of the Invention) As is clear from the above description, according to the core block cleaning method of the present invention, by performing ultrasonic cleaning on the core block after the groove processing in the presence of alkali metal ions and chlorine ions, Since it is possible to almost completely remove the deposits from the groove portion and there is no erosion of the gap glass and it does not adversely affect the glass used in the subsequent step, if a core block joined body is produced using the washed core block, A magnetic head core can be obtained with good yield.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の洗浄方法を使用したコアブロック接合
体の製造方法の一例を示すフローチャートである。
FIG. 1 is a flowchart showing an example of a method for manufacturing a core block assembly using the cleaning method of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】コアブロックに溝加工を実施した後、アル
カリ金属イオンと塩素イオンとの存在下で洗浄を行な
い、その後純水で洗浄することを特徴とするコアブロッ
クの洗浄方法。
1. A method for cleaning a core block, which comprises grooving the core block, cleaning the core block in the presence of alkali metal ions and chlorine ions, and then cleaning with pure water.
JP20380889A 1989-08-08 1989-08-08 How to clean the core block Expired - Lifetime JPH0734244B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20380889A JPH0734244B2 (en) 1989-08-08 1989-08-08 How to clean the core block

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20380889A JPH0734244B2 (en) 1989-08-08 1989-08-08 How to clean the core block

Publications (2)

Publication Number Publication Date
JPH0368700A JPH0368700A (en) 1991-03-25
JPH0734244B2 true JPH0734244B2 (en) 1995-04-12

Family

ID=16480071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20380889A Expired - Lifetime JPH0734244B2 (en) 1989-08-08 1989-08-08 How to clean the core block

Country Status (1)

Country Link
JP (1) JPH0734244B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106076958A (en) * 2016-06-24 2016-11-09 无锡新大力电机有限公司 A kind of method for cleaning unshakable in one's determination of magneto

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111799079B (en) * 2020-05-29 2022-03-04 天长市烁源磁电有限公司 Magnetic ferrite core surface coating cleaning process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106076958A (en) * 2016-06-24 2016-11-09 无锡新大力电机有限公司 A kind of method for cleaning unshakable in one's determination of magneto

Also Published As

Publication number Publication date
JPH0368700A (en) 1991-03-25

Similar Documents

Publication Publication Date Title
EP1286928B1 (en) Lanthanide oxide dissolution from glass surface
KR100303676B1 (en) Method for cleaning a surface
US5894852A (en) Method for post chemical-mechanical planarization cleaning of semiconductor wafers
TW419399B (en) Post-lapping cleaning process for silicon wafers
JP2003510840A (en) Cleaning solution for semiconductor surfaces after chemical mechanical polishing
JP3881517B2 (en) Method for producing a sputter target with improved finish
JP3305610B2 (en) Cleaning method of semiconductor wafer after lapping
JP2005093869A (en) Method of regenerating silicon wafer, and regenerated wafer
JP2001276759A (en) Cleaning-fluid for glass substrate and method for cleaning glass substrate
JPH0734244B2 (en) How to clean the core block
US4339281A (en) Shank diamond cleaning
US20040089326A1 (en) Method for post chemical-mechanical planarization cleaning of semiconductor wafers
JP2001098298A (en) Cleaning liquid for aluminosilicate glass base or ceramic glass base and method for cleaning thereof
JP2002273358A (en) Method for cleaning optical element
CN108346560A (en) A kind of pre-cleaning method before wafer bonding
JPH1121483A (en) Releasing agent for color filter layer and regeneration of glass substrate for color filter
JPH05313394A (en) Production of cylindrical substrate for electrophotographic sensitive body
JP2005158132A (en) Method for washing magnetic head and magnetic head using same
JP2004002163A (en) Production method for chemically strengthened glass and method of producing glass substrate for information recording medium
JPH0710999B2 (en) How to clean painted surfaces
JP3671172B2 (en) Part joining method
JP2689007B2 (en) Silicon wafer and method of manufacturing the same
JPH1149533A (en) Method for regenerating glass substrate for color filter
JP3411999B2 (en) Method for removing metal film on silicon wafer surface, acidic aqueous solution used therefor, and method for regenerating silicon wafer
JPH06236867A (en) Pre-treatment method for wafer etching