JPH07326635A - Adhesive agent and semiconductor device - Google Patents

Adhesive agent and semiconductor device

Info

Publication number
JPH07326635A
JPH07326635A JP6118179A JP11817994A JPH07326635A JP H07326635 A JPH07326635 A JP H07326635A JP 6118179 A JP6118179 A JP 6118179A JP 11817994 A JP11817994 A JP 11817994A JP H07326635 A JPH07326635 A JP H07326635A
Authority
JP
Japan
Prior art keywords
semiconductor device
adhesive
radical
group
adhesive agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6118179A
Other languages
Japanese (ja)
Inventor
Jun Taketazu
潤 竹田津
Nobuo Ichimura
信雄 市村
Moritoshi Yoshida
守利 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6118179A priority Critical patent/JPH07326635A/en
Publication of JPH07326635A publication Critical patent/JPH07326635A/en
Pending legal-status Critical Current

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  • Adhesives Or Adhesive Processes (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To provide adhesive agent which reduces generation of reflow crack at the time of solder reflow, and can improve the reliability as a semiconductor device, when it is used as the die bonding material of a semiconductor device. CONSTITUTION:The adhesive agent contains the following; (1) reaction product of acrylonitrile-butadiene copolymer having carboxylic radical on the end, and organic compound having acrylic radical or methacrylic radical and epoxy radical, (2) organic compound having acrylic radical or methacrylic radical, and (3) free-radical polymerization initiator. A semiconductor element is bonded to a retaining part member by using the adhesive agent.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は接着剤および半導体装置
に関し、さらに詳しくはリフローソルダリング時にリフ
ロークラックの無い高信頼性の半導体装置を得ることが
できる接着剤およびこれを用いた半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive and a semiconductor device, and more particularly to an adhesive and a semiconductor device using the same which can provide a highly reliable semiconductor device free from reflow cracks during reflow soldering.

【0002】[0002]

【従来の技術】従来、半導体装置を製造する際の半導体
素子のリードフレーム(支持部材)の接合方法として、
(1)金−シリコン共晶体等の無機材料を接着剤として
用いる方法、(2)エポキシ樹脂系、ポリイミド樹脂系
等の有機材料等に銀粉等を分散させてペースト状態と
し、これを接着剤として用いる方法などがある。しかし
ながら、前者の方法ではコストが高く、350℃〜40
0℃程度の高い熱処理が必要であり、また接着剤が硬
く、熱応力によってチップの破壊が起こるため、最近で
は銀粉を含んだ銀ペーストを用いる後者の方法が主流と
なっている。この方法は、一般に銀ペーストをディスペ
ンサーやスタンピングマシンを用いてリードフレームの
ダイパッドに塗布した後、半導体素子をダイボンディン
グし、加熱硬化させて接着するものである。加熱硬化の
方法としては、オーブン中で硬化させるバッチ方式と、
加熱されたプレート上で硬化させるインライン方式とが
ある。さらにこの半導体装置は、外部を封止材により封
止後、基板上に半田付けされ実装される。現在、高密
度、高効率の実装のため、半田実装は半導体装置のリー
ドフレームを基板に直接半田付けする面付け実装法が主
流となっている。半田実装には、基板全体を赤外線など
で加熱するリフローソルダリングが用いられ、パッケー
ジは200℃以上の高温に加熱される。このため、パッ
ケージ内部、特に接着層中または封止材中に含まれる水
分が気化してダイパッドと封止材の間に回り込み、パッ
ケージにクラック(リフロークラック)が生じ、半導体
装置の信頼性が低下する欠点があった。
2. Description of the Related Art Conventionally, as a method of joining a lead frame (support member) of a semiconductor element when manufacturing a semiconductor device,
(1) A method of using an inorganic material such as a gold-silicon eutectic as an adhesive, (2) Dispersing silver powder or the like in an organic material such as an epoxy resin-based or a polyimide resin-based to form a paste, and using this as an adhesive There is a method to use. However, the former method has a high cost and is 350 ° C to 40 ° C.
Since a high heat treatment of about 0 ° C. is required, the adhesive is hard, and the chip is broken by thermal stress, the latter method using a silver paste containing silver powder has recently become the mainstream. In this method, generally, a silver paste is applied to a die pad of a lead frame by using a dispenser or a stamping machine, and then a semiconductor element is die-bonded and heat-cured to be bonded. As a method of heat curing, a batch method of curing in an oven,
There is an in-line method of curing on a heated plate. Further, this semiconductor device is mounted by soldering on the substrate after sealing the outside with a sealing material. Currently, for high-density and high-efficiency mounting, the most common solder mounting method is a surface mounting method in which a lead frame of a semiconductor device is directly soldered to a substrate. For solder mounting, reflow soldering that heats the entire substrate with infrared rays or the like is used, and the package is heated to a high temperature of 200 ° C. or higher. As a result, moisture contained in the package, especially in the adhesive layer or the encapsulant, evaporates and wraps around between the die pad and the encapsulant, causing cracks (reflow cracks) in the package and reducing the reliability of the semiconductor device. There was a drawback to

【0003】[0003]

【発明が解決しようとする課題】本発明は、前記の従来
技術の欠点を除去し、リフロークラックの無い接着剤お
よびこれを用いた半導体装置を提供するものである。
SUMMARY OF THE INVENTION The present invention eliminates the above-mentioned drawbacks of the prior art, and provides an adhesive free from reflow cracks and a semiconductor device using the same.

【0004】[0004]

【課題を解決するための手段】本発明は、(1)末端に
カルボキシル基を有するアクリロニトリルブタジエン共
重合体及びアクリル基又はメタクリル基とエポキシ基と
を有する有機化合物の反応生成物、(2)アクリル基又
はメタクリル基を有する有機化合物および(3)遊離ラ
ジカル重合開始剤を含有してなる接着剤ならびにこの接
着剤を用いて半導体素子を支持部材に接合してなる半導
体装置に関する。
The present invention comprises (1) a reaction product of an acrylonitrile-butadiene copolymer having a carboxyl group at the terminal and an organic compound having an acryl group or a methacryl group and an epoxy group, and (2) an acryl. The present invention relates to an adhesive containing an organic compound having a radical or a methacrylic group and (3) a free radical polymerization initiator, and a semiconductor device obtained by joining a semiconductor element to a supporting member using the adhesive.

【0005】本発明に用いられる末端にカルボキシル基
を有するアクリロニトリルブタジエン共重合体は、既に
公知の化合物であり、例えば液状ポリブタジエンCTB
N−1300×31、CTBN−1300×8(いずれ
も宇部興産社製)などが挙げられる。
The acrylonitrile butadiene copolymer having a terminal carboxyl group used in the present invention is a known compound, for example, liquid polybutadiene CTB.
N-1300 × 31, CTBN-1300 × 8 (both manufactured by Ube Industries, Ltd.) and the like can be mentioned.

【0006】本発明に用いられるアクリル基又はメタク
リル基とエポキシ基とを有する有機化合物としては、グ
リシジルアクリレート、グリシジルメタクリレートなど
が挙げられる。
Examples of the organic compound having an acrylic group or a methacrylic group and an epoxy group used in the present invention include glycidyl acrylate and glycidyl methacrylate.

【0007】本発明における反応生成物は、前記の末端
にカルボキシル基を有するアクリロニトリルブタジエン
共重合体と、前記のアクリル基又はメタクリル基とエポ
キシ基を有する有機化合物とを10/90〜90/10
(重量部)の比率で、80℃〜120℃で30分〜6時
間程度反応させて得られる。反応時に必要に応じて溶媒
を使用してもよい。溶媒としては、ブチルセロソルブ、
カルビトール、酢酸ブチルセロソルブ、酢酸カルビトー
ル、エチレングリコールジエチルエーテル、α−テルピ
ネオールなどの比較的沸点の高い有機溶剤を用いること
ができる。
The reaction product in the present invention comprises the acrylonitrile butadiene copolymer having a carboxyl group at the terminal and the organic compound having an acryl or methacryl group and an epoxy group at 10/90 to 90/10.
It can be obtained by reacting at 80 to 120 ° C. for about 30 minutes to 6 hours at a ratio of (parts by weight). A solvent may be used during the reaction, if necessary. As the solvent, butyl cellosolve,
An organic solvent having a relatively high boiling point such as carbitol, butyl cellosolve acetate, carbitol acetate, ethylene glycol diethyl ether, and α-terpineol can be used.

【0008】本発明に用いられるアクリル基またはメタ
クリル基を有する有機化合物も既に公知の化合物であ
り、例えば脂環式アクリレートFA−513A、脂環式
メタクリレートFA−513M(日立化成工業社製)、
脂環式ジアクリレートR−684(日本化薬社製)、脂
肪族ジアクリレートHDDA(日本化薬社製)、脂肪族
ジメタクリレートSR−2000A(SARTOMER
社製)、NPG、1.3BG、4G、10G(新中村化
学社製)、芳香族ジメタクリレートBPE−100、B
PE−200、BPE−500、BPE−1300(新
中村化学社製)などが挙げられる。
Organic compounds having an acrylic group or a methacrylic group used in the present invention are already known compounds, for example, alicyclic acrylate FA-513A, alicyclic methacrylate FA-513M (manufactured by Hitachi Chemical Co., Ltd.),
Alicyclic diacrylate R-684 (manufactured by Nippon Kayaku Co., Ltd.), aliphatic diacrylate HDDA (manufactured by Nippon Kayaku Co., Ltd.), aliphatic dimethacrylate SR-2000A (SARTOMER).
Company), NPG, 1.3BG, 4G, 10G (manufactured by Shin-Nakamura Chemical Co., Ltd.), aromatic dimethacrylate BPE-100, B
Examples include PE-200, BPE-500, BPE-1300 (manufactured by Shin-Nakamura Chemical Co., Ltd.).

【0009】本発明の遊離ラジカル重合開始剤には、特
に制限はないが、例えばパークミルD、ナイパーD(い
ずれも日本油脂社製)などが挙げられる。
The free radical polymerization initiator of the present invention is not particularly limited, and examples thereof include Perkmill D and Niper D (both manufactured by NOF Corporation).

【0010】上記の末端にカルボキシル基を有するアク
リロニトリルブタジエン共重合体、アクリル基又はメタ
クリル基とエポキシ基とを有する有機化合物、アクリル
基又はメタクリル基を有する有機化合物および遊離ラジ
カル重合開始剤は二種以上を組み合わせて用いてもよ
い。
Two or more kinds of the above-mentioned acrylonitrile-butadiene copolymer having a carboxyl group, an organic compound having an acrylic group or a methacrylic group and an epoxy group, an organic compound having an acrylic group or a methacrylic group and a free radical polymerization initiator are used. You may use in combination.

【0011】本発明においては、耐リフロークラックの
点から上記の反応生成物100重量部に対してアクリル
基またはメタクリル基を有する有機化合物を50〜40
0重量部および遊離ラジカル重合開始剤を0.1〜10
重量部の範囲で用いることが好ましい。
In the present invention, from the viewpoint of reflow crack resistance, 50 to 40 organic compounds having an acryl group or a methacryl group are added to 100 parts by weight of the above reaction product.
0 parts by weight and a free radical polymerization initiator of 0.1-10
It is preferably used in the range of parts by weight.

【0012】本発明になる接着剤には必要に応じて、シ
リカ粉、アルミナ粉、銀粉等の充填剤が用いられ、銀粉
が好ましく、粒径、形状等に制限はなく、フレーク状、
樹枝状、球形、不定形等が使用可能である。例えば、シ
ルベストTCG−1(徳力化学研究所製)、シルフレー
クAgc−A(福田金属箔粉工業社製)などが挙げられ
る。充填剤は、通常接着剤に対して50〜85重量%の
範囲で用いられる。
A filler such as silica powder, alumina powder, or silver powder is used in the adhesive according to the present invention, if necessary, and silver powder is preferred, and there is no limitation in particle size, shape, etc., and flakes,
Dendritic, spherical, and irregular shapes can be used. For example, Silvest TCG-1 (manufactured by Tokuriki Kagaku Kenkyusho), Silflakes Agc-A (manufactured by Fukuda Metal Foil & Powder Industry Co., Ltd.), etc. The filler is usually used in the range of 50 to 85% by weight with respect to the adhesive.

【0013】本発明になる接着剤は、さらに必要に応じ
てKBM−573(信越化学社製)などのシランカップ
リング剤、チタンカップリング剤などの接着力向上剤、
アニオン系界面活性剤、フッ素系界面活性剤などの濡れ
性向上剤、シリコーン油などの消泡剤等を適宜添加する
ことができる。
The adhesive according to the present invention further comprises a silane coupling agent such as KBM-573 (manufactured by Shin-Etsu Chemical Co., Ltd.) and an adhesive strength improving agent such as a titanium coupling agent, if necessary.
An anionic surfactant, a wetting improver such as a fluorine-containing surfactant, a defoaming agent such as silicone oil, and the like can be appropriately added.

【0014】本発明になる接着剤は、例えば前記の末端
にカルボキシル基を有するアクリロニトリルブタジエン
共重合体、前記のアクリル基又はメタクリル基とエポキ
シ基を有する有機化合物および必要に応じて前記の有機
溶媒とをフラスコ内で80℃〜120℃の温度で反応さ
せてワニスとし、このワニスにアクリル基又はメタクリ
ル基を有する有機化合物および遊離ラジカル重合開始剤
および必要に応じて充填剤を混合して得られる。混合装
置としては、例えば三本ロール、プラネタリミキサ、ら
いかい機、ボールミルなどが挙げられる。本発明になる
接着剤は、半導体素子をリードフレームなどの支持部材
に接着させる際に用いられる半導体素子用接着剤として
用いることが好ましい。
The adhesive according to the present invention comprises, for example, an acrylonitrile-butadiene copolymer having a carboxyl group at the terminal, an organic compound having an acryl group or a methacryl group and an epoxy group, and optionally an organic solvent as described above. Is reacted at a temperature of 80 ° C. to 120 ° C. in a flask to give a varnish, and the varnish is obtained by mixing an organic compound having an acrylic group or a methacrylic group, a free radical polymerization initiator and, if necessary, a filler. Examples of the mixing device include a triple roll, a planetary mixer, a smelting machine, and a ball mill. The adhesive according to the present invention is preferably used as a semiconductor element adhesive used when bonding a semiconductor element to a supporting member such as a lead frame.

【0015】本発明になる接着剤を用いた半導体装置
は、以下の製造工程を経て製造される。すなわち、リー
ドフレームなどの支持部材に本発明の接着剤を注射筒を
用いたディスペンス法、スタンピング法、スクリーン印
刷などにより塗布した後、半導体装置を圧着し、その後
熱風循環式乾燥機、ヒートブロックなどの加熱装置を用
いて加熱硬化して半導体素子を支持部材に接合し、その
後通常のワイヤボンディング工程、封止工程を経て半導
体装置とされる。
A semiconductor device using the adhesive according to the present invention is manufactured through the following manufacturing steps. That is, after applying the adhesive of the present invention to a supporting member such as a lead frame by a dispensing method using an injection cylinder, a stamping method, screen printing, etc., the semiconductor device is pressure-bonded, and then a hot air circulation dryer, a heat block, etc. The semiconductor device is bonded to the support member by heating and curing using the above heating device, and then the semiconductor device is manufactured through the usual wire bonding process and sealing process.

【0016】[0016]

【実施例】以下、本発明を実施例により説明する。 実施例1 CTBN−1300×8(液状ポリブタジエン、宇部興
産社製商品名)20重量部にグリシジルアクリレート1
0重量部および酢酸ブチルセロソルブ10重量部を加
え、100℃に加熱して1時間撹拌してワニスを得た。
その後25℃まで冷却し、R−684(脂環式ジアクリ
レート、日本化薬社製商品名)、パークミルD(ラジカ
ル重合開始剤、日本油脂社製商品名)銀粉TCG−1
(徳力化学研究所製商品名)を表1に示す配合比(重量
部、以下同じ)でらいかい機により混合し、接着剤を得
た。この接着剤を用い、下記の半田リフロークラック試
験を行った。試験結果を表1に示す。
EXAMPLES The present invention will be described below with reference to examples. Example 1 20 parts by weight of CTBN-1300 × 8 (liquid polybutadiene, trade name of Ube Industries Ltd.) was added to 1 part of glycidyl acrylate.
0 parts by weight and 10 parts by weight of butyl cellosolve acetate were added, and the mixture was heated to 100 ° C. and stirred for 1 hour to obtain a varnish.
Then, the mixture was cooled to 25 ° C., and R-684 (alicyclic diacrylate, trade name by Nippon Kayaku Co., Ltd.), Perkmill D (radical polymerization initiator, trade name by NOF CORPORATION) silver powder TCG-1
(Tokuriki Chemical Laboratory product name) was mixed with a compounding ratio (parts by weight, the same applies hereinafter) shown in Table 1 using a raisher machine to obtain an adhesive. The following solder reflow crack test was conducted using this adhesive. The test results are shown in Table 1.

【0017】実施例2 CTBN−1300×8(液状ポリブタジエン、宇部興
産社製商品名)20重量部にグリシジルメタクリレート
5重量部および酢酸ブチルセロソルブ10重量部を加
え、100℃に加熱して1時間撹拌してワニスを得た。
その後25℃まで冷却し、SR−2000A(脂肪族ジ
メタクリレート、SARTMER社製商品名)、パーク
ミルD(ラジカル重合開始剤、日本油脂社製商品名)お
よび銀粉TCG−1(徳力化学研究所製商品名)を表1
に示す配合比でらいかい機により混合し、接着剤を得
た。この接着剤を用い、下記の半田リフロークラック試
験を行った。試験結果を表1に示す。
Example 2 5 parts by weight of glycidyl methacrylate and 10 parts by weight of butyl cellosolve acetate were added to 20 parts by weight of CTBN-1300 × 8 (liquid polybutadiene, trade name of Ube Industries Ltd.), and the mixture was heated to 100 ° C. and stirred for 1 hour. Got a varnish.
Then, the mixture was cooled to 25 ° C., SR-2000A (aliphatic dimethacrylate, product name manufactured by SARTMER Co., Ltd.), Park Mill D (radical polymerization initiator, product name manufactured by NOF CORPORATION), and silver powder TCG-1 (product manufactured by Tokuriki Chemical Laboratory Co., Ltd.). Name)
An adhesive was obtained by mixing the compounding ratios shown in (1) with a raider. The following solder reflow crack test was conducted using this adhesive. The test results are shown in Table 1.

【0018】実施例3 CTBN−1300×31(液状ポリブタジエン、宇部
興産社製商品名)20重量部にグリシジルメタクリレー
ト10重量部および酢酸ブチルセロソルブ10重量部を
加え、100℃に加熱して1時間撹拌してワニスを得
た。その後25℃まで冷却し、FA−513A(脂環式
アクリレート、日立化成工業社製商品名)、パークミル
D(ラジカル重合開始剤、日本油脂社製商品名)および
銀粉TCG−1(徳力化学研究所製商品名)を表1に示
す配合比でらいかい機により混合し、接着剤を得た。こ
の接着剤を用い、下記の半田リフロークラック試験を行
った。試験結果を表1に示す。
Example 3 To 20 parts by weight of CTBN-1300 × 31 (liquid polybutadiene, trade name of Ube Industries, Ltd.) was added 10 parts by weight of glycidyl methacrylate and 10 parts by weight of butyl cellosolve acetate, and the mixture was heated to 100 ° C. and stirred for 1 hour. Got a varnish. Then, the mixture was cooled to 25 ° C., FA-513A (alicyclic acrylate, trade name manufactured by Hitachi Chemical Co., Ltd.), Park Mill D (radical polymerization initiator, trade name manufactured by NOF CORPORATION), and silver powder TCG-1 (Tokuriki Chemical Laboratory). (Product name) was mixed with a compounding ratio shown in Table 1 using a smelting machine to obtain an adhesive. The following solder reflow crack test was conducted using this adhesive. The test results are shown in Table 1.

【0019】比較例1 YDCN−702S(クレゾールノボラック樹脂、東都
化成工業社製商品名)30重量部にH−1(フェノール
ノボラック樹脂、明和化成工業社製商品名)10重量部
および酢酸ブチルセロソルブ10重量部を加え、80℃
に加熱して1時間撹拌してワニスを得た。その後25℃
まで冷却し、キュアゾール2P4MHZ(イミダゾール
四国化成工業社製商品名)、銀粉TCG−1(徳力化学
研究所製商品名)を表1に示す配合比でらいかい機によ
り混合し、接着剤を得た。この接着剤を用い、下記の半
田リフロークラック試験を行った。試験結果を表1に示
す。
Comparative Example 1 30 parts by weight of YDCN-702S (cresol novolac resin, trade name manufactured by Toto Kasei Co., Ltd.), 10 parts by weight of H-1 (phenol novolac resin, trade name by Meiwa Kasei Kogyo Co., Ltd.) and 10 parts by weight of butyl cellosolve acetate. 80 ℃
The mixture was heated to 1, and stirred for 1 hour to obtain a varnish. Then 25 ° C
The mixture was cooled to room temperature, and Curesol 2P4MHZ (trade name, manufactured by Imidazole Shikoku Kasei Kogyo Co., Ltd.) and silver powder TCG-1 (trade name, manufactured by Tokuriki Kagaku Kenkyusho) were mixed at a compounding ratio shown in Table 1 to obtain an adhesive. . The following solder reflow crack test was conducted using this adhesive. The test results are shown in Table 1.

【0020】比較例2 エピコート1001(ビスA型エポキシ樹脂、油化シェ
ルエポキシ社製商品名)35重量部にH−1(フェノー
ルノボラック樹脂、明和化成工業社製商品名)10重量
部および酢酸ブチルセロソルブ10重量部を加え、80
℃に加熱して1時間撹拌してワニスを得た。その後25
℃まで冷却し、キュアゾール2P4MHZ(イミダゾー
ル四国化成工業社製商品名)、銀粉TCG−1(徳力化
学研究所製商品名)を表1に示す配合比でらいかい機に
より混合し、接着剤を得た。この接着剤を用い、下記の
半田リフロークラック試験を行った。試験結果を表1に
示す。
Comparative Example 2 35 parts by weight of Epicoat 1001 (bis A type epoxy resin, trade name manufactured by Yuka Shell Epoxy Co.), 10 parts by weight of H-1 (phenol novolac resin, trade name manufactured by Meiwa Kasei Kogyo Co., Ltd.) and butyl cellosolve acetate. Add 10 parts by weight, 80
The mixture was heated to ℃ and stirred for 1 hour to obtain a varnish. Then 25
After cooling to ℃, Curesol 2P4MHZ (trade name of Imidazole Shikoku Kasei Kogyo Co., Ltd.) and silver powder TCG-1 (trade name of Tokoriki Chemical Laboratory Co., Ltd.) were mixed with a compounding ratio shown in Table 1 to obtain an adhesive. It was The following solder reflow crack test was conducted using this adhesive. The test results are shown in Table 1.

【0021】半田リフロークラック試験方法 実施例および比較例により得た接着剤を用い、下記リー
ドフレームとシリコンチップを、下記の硬化条件により
硬化し接着した。その後日立化成工業社製エポキシ封止
材(商品名CEL−4620)により封止し、半田リフ
ロー試験用パッケージを得た。そのパッケージを温度お
よび湿度がそれぞれ85℃、85%の条件に設定された
恒温恒湿槽中で48時間吸湿させた。その後215℃/
90秒のリフロー条件で半田リフローを行い、パッケー
ジの外部クラックの発生数を顕微鏡(倍率:15倍)で
観察した。5個のサンプルについてクラックの発生した
サンプル数を示す。 チップサイズ:8mm×10mm パッケージ:QFP、14mm×20mm×2mm フレーム:42アロイ 硬化条件:180℃まで30分で昇温、180℃で1時
間硬化
Solder Reflow Crack Test Method Using the adhesives obtained in Examples and Comparative Examples, the following lead frames and silicon chips were cured and adhered under the following curing conditions. Then, it was sealed with an epoxy sealing material (trade name CEL-4620) manufactured by Hitachi Chemical Co., Ltd. to obtain a solder reflow test package. The package was allowed to absorb moisture for 48 hours in a constant temperature and humidity chamber in which the temperature and humidity were set to 85 ° C. and 85%, respectively. 215 ℃ /
Solder reflow was performed under a reflow condition of 90 seconds, and the number of external cracks generated in the package was observed with a microscope (magnification: 15 times). The number of cracked samples is shown for five samples. Chip size: 8mm x 10mm Package: QFP, 14mm x 20mm x 2mm Frame: 42 alloy Curing conditions: Raise to 180 ° C in 30 minutes, cure at 180 ° C for 1 hour

【0022】[0022]

【表1】 [Table 1]

【0023】表1により、比較例ではすべてのパッケー
ジに外部クラックが発生し、半導体装置の信頼性低下に
つながるが、本発明の接着剤によれば、パッケージの外
部クラックの発生が抑制され、信頼性の高いパッケージ
が得られることが示される。
According to Table 1, in the comparative example, external cracks are generated in all the packages, leading to a decrease in reliability of the semiconductor device. However, the adhesive of the present invention suppresses the generation of external cracks in the package and improves reliability. It is shown that a highly versatile package can be obtained.

【0024】[0024]

【発明の効果】本発明になる接着剤は、半導体装置のダ
イボンディング剤として使用した場合に、半田リフロー
時のペースト層の剥離を抑えることができ、リフローク
ラックの発生を低減し、半導体装置としての信頼性を向
上させることができる。
The adhesive according to the present invention, when used as a die-bonding agent for a semiconductor device, can suppress the peeling of the paste layer during solder reflow, reduce the occurrence of reflow cracks, and provide a semiconductor device. The reliability of can be improved.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 (1)末端にカルボキシル基を有するア
クリロニトリルブタジエン共重合体及びアクリル基又は
メタクリル基とエポキシ基とを有する有機化合物の反応
生成物、(2)アクリル基又はメタクリル基を有する有
機化合物ならびに(3)遊離ラジカル重合開始剤を含有
してなる接着剤。
1. A reaction product of (1) an acrylonitrile-butadiene copolymer having a carboxyl group at an end and an organic compound having an acryl group or a methacryl group and an epoxy group, and (2) an organic compound having an acryl group or a methacryl group. And (3) an adhesive containing a free radical polymerization initiator.
【請求項2】 さらに充填剤を含有してなる請求項1記
載の接着剤。
2. The adhesive according to claim 1, further comprising a filler.
【請求項3】 充填剤が銀粉である請求項2記載の接着
剤。
3. The adhesive according to claim 2, wherein the filler is silver powder.
【請求項4】 請求項1〜3のいずれかに記載の接着剤
を用いて半導体素子を支持部材に接着してなる半導体装
置。
4. A semiconductor device obtained by adhering a semiconductor element to a support member using the adhesive according to claim 1.
JP6118179A 1994-05-31 1994-05-31 Adhesive agent and semiconductor device Pending JPH07326635A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6118179A JPH07326635A (en) 1994-05-31 1994-05-31 Adhesive agent and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6118179A JPH07326635A (en) 1994-05-31 1994-05-31 Adhesive agent and semiconductor device

Publications (1)

Publication Number Publication Date
JPH07326635A true JPH07326635A (en) 1995-12-12

Family

ID=14730103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6118179A Pending JPH07326635A (en) 1994-05-31 1994-05-31 Adhesive agent and semiconductor device

Country Status (1)

Country Link
JP (1) JPH07326635A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0979854A4 (en) * 1997-03-31 2000-07-12 Hitachi Chemical Co Ltd Circuit connecting material, and structure and method of connecting circuit terminal
JP2002164360A (en) * 2000-11-27 2002-06-07 Sumitomo Bakelite Co Ltd Die-attach paste and semiconductor device
JP2002184793A (en) * 2000-04-10 2002-06-28 Sumitomo Bakelite Co Ltd Die attachment paste and semiconductor device
JP2006086383A (en) * 2004-09-16 2006-03-30 Sumitomo Bakelite Co Ltd Resin composition and semiconductor apparatus manufactured by using it
JP2006299261A (en) * 2005-04-18 2006-11-02 Natl Starch & Chem Investment Holding Corp Die attach adhesive with improved stress performance capability
US7553890B2 (en) 1997-03-31 2009-06-30 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
CN103871544A (en) * 2012-12-11 2014-06-18 第一毛织株式会社 Composition for use of an anisotropic conductive film and an anisotropic conductive film thereof
WO2018008332A1 (en) * 2016-07-04 2018-01-11 昭和電工株式会社 Radical-curable adhesive composition and adhesive
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* Cited by examiner, † Cited by third party
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JPH02178374A (en) * 1988-12-29 1990-07-11 Kanebo N S C Kk Two-part liquid type acrylic adhesion composition
JPH03275785A (en) * 1990-03-26 1991-12-06 Hitachi Chem Co Ltd Adhesive composition and production of semiconductor device
JPH03294329A (en) * 1990-04-13 1991-12-25 Cemedine Co Ltd Resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02178374A (en) * 1988-12-29 1990-07-11 Kanebo N S C Kk Two-part liquid type acrylic adhesion composition
JPH03275785A (en) * 1990-03-26 1991-12-06 Hitachi Chem Co Ltd Adhesive composition and production of semiconductor device
JPH03294329A (en) * 1990-04-13 1991-12-25 Cemedine Co Ltd Resin composition

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US7968196B2 (en) 1997-03-31 2011-06-28 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
US7879956B2 (en) 1997-03-31 2011-02-01 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
EP0979854A4 (en) * 1997-03-31 2000-07-12 Hitachi Chemical Co Ltd Circuit connecting material, and structure and method of connecting circuit terminal
US6777464B1 (en) 1997-03-31 2004-08-17 Hitachi Chemical Company, Ltd. Circuit connecting material, and structure and method of connecting circuit terminal
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