JPH07326600A - Method and device for chemical treatment - Google Patents
Method and device for chemical treatmentInfo
- Publication number
- JPH07326600A JPH07326600A JP14263894A JP14263894A JPH07326600A JP H07326600 A JPH07326600 A JP H07326600A JP 14263894 A JP14263894 A JP 14263894A JP 14263894 A JP14263894 A JP 14263894A JP H07326600 A JPH07326600 A JP H07326600A
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- liquid
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- mixing tank
- amount
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は薬液処理装置及び薬液処
理方法に関し、特には半導体装置の製造工程で試料を薬
液処理する際に用いる薬液処理装置及び薬液処理方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical treatment apparatus and a chemical treatment method, and more particularly to a chemical treatment apparatus and a chemical treatment method used when a sample is treated with a chemical in a semiconductor device manufacturing process.
【0002】[0002]
【従来の技術】半導体装置の製造工程において、例えば
ウエハを洗浄する際に用いる薬液処理装置は図5に示す
ように構成されている。内部に溜めた薬液L中で試料S
の薬液処理を行う処理槽51には、当該処理槽51の内
部に仕切り51aを設けた状態で形成される調合槽52
が設けられている。上記仕切り51aは、処理槽51で
オーバーフローした薬液Lが調合槽52内に流れ込むよ
うに、処理槽51及び調合槽52の外周壁よりも低く形
成されている。そして、処理槽51と調合槽52とに
は、配管53が接続されている。この配管53には、温
度調節手段54と調合槽52から処理槽51に薬液Lを
送り込むポンプ55とフィルタ56と、が設けられてい
る。また、調合槽52には、所定時間毎に当該調合槽に
所定量の濃度調節液L1を供給する濃度調節系57が備
えられている。2. Description of the Related Art In a semiconductor device manufacturing process, for example, a chemical treatment apparatus used for cleaning a wafer is constructed as shown in FIG. Sample S in the chemical solution L stored inside
In the processing tank 51 for performing the chemical solution treatment, the mixing tank 52 formed with the partition 51 a provided inside the processing tank 51.
Is provided. The partition 51a is formed lower than the outer peripheral walls of the processing tank 51 and the mixing tank 52 so that the chemical liquid L overflowing in the processing tank 51 flows into the mixing tank 52. A pipe 53 is connected to the processing tank 51 and the mixing tank 52. The pipe 53 is provided with a temperature adjusting means 54, a pump 55 for feeding the chemical liquid L from the preparation tank 52 to the processing tank 51, and a filter 56. Further, the mixing tank 52 is provided with a concentration adjusting system 57 that supplies a predetermined amount of the concentration adjusting liquid L1 to the mixing tank at predetermined time intervals.
【0003】上記の薬液処理装置5を用いた試料Sの薬
液処理は、以下のようにする。先ず、調合槽52の内部
で初期調合した薬液Lを配管53から処理槽51に注ぎ
込み、薬液Lを処理槽51内と調合槽52内に溜める。
そして、調合槽52と処理槽51との間で薬液Lを循環
させながら、処理槽51内の薬液L中に試料Sを浸漬し
て当該試料Sの薬液処理を行う。この際、薬液Lの経時
的な濃度低下を防止するために、調合槽52内に所定時
間毎に所定量の濃度調節液L1を供給する。濃度調節液
L1としては、例えば薬液Lの原液を用いる。The chemical liquid treatment of the sample S using the chemical liquid treatment device 5 is performed as follows. First, the chemical liquid L initially prepared in the mixing tank 52 is poured into the processing tank 51 from the pipe 53, and the chemical liquid L is stored in the processing tank 51 and the mixing tank 52.
Then, while circulating the chemical liquid L between the preparation tank 52 and the treatment tank 51, the sample S is immersed in the chemical liquid L in the treatment tank 51 to perform the chemical treatment of the sample S. At this time, in order to prevent the concentration of the chemical liquid L from decreasing with time, a predetermined amount of the concentration adjusting liquid L1 is supplied into the mixing tank 52 at predetermined time intervals. As the concentration adjusting liquid L1, for example, a stock solution of the chemical liquid L is used.
【0004】[0004]
【発明が解決しようとする課題】上記の薬液処理装置で
は、濃度調節系から供給される濃度調節液によって、調
合槽内の薬液量が増加する。しかし、上記濃度調節系で
は、調合槽内の薬液量に関わらず所定量の濃度調節液を
供給するため、調合槽内の薬液濃度は目的とする濃度範
囲にならない場合がある。また、調合槽内に濃度調節液
が供給されることよって、調合槽内の薬液温度は変化す
る。例えば、アンモニア−過酸化水素水系の薬液では、
薬液中に濃度調節液として水酸化アンモニウムや過酸化
水素を供給すると、反応熱の発生によって薬液温度が上
昇する。ここで、薬液の経時的の濃度低下量は、薬液温
度に依存する値である。しかし、上記濃度調節系では、
調合槽内の薬液温度の変化に関わらず所定量の濃度調節
液を供給するため、調合槽内の薬液濃度は目的とする濃
度範囲にならない場合がある。In the above-mentioned chemical liquid processing apparatus, the amount of the chemical liquid in the mixing tank is increased by the concentration adjusting liquid supplied from the concentration adjusting system. However, in the above-mentioned concentration adjusting system, since a predetermined amount of concentration adjusting liquid is supplied irrespective of the amount of the chemical liquid in the mixing tank, the concentration of the chemical liquid in the mixing tank may not fall within the target concentration range. Moreover, the temperature of the chemical liquid in the mixing tank changes because the concentration adjusting liquid is supplied into the mixing tank. For example, with ammonia-hydrogen peroxide water-based chemicals,
When ammonium hydroxide or hydrogen peroxide is supplied as a concentration adjusting liquid into the chemical liquid, the temperature of the chemical liquid rises due to the generation of reaction heat. Here, the amount of concentration decrease over time of the chemical liquid is a value that depends on the chemical liquid temperature. However, in the above concentration adjustment system,
Since a predetermined amount of the concentration adjusting liquid is supplied regardless of the change in the temperature of the chemical liquid in the mixing tank, the concentration of the chemical liquid in the mixing tank may not fall within the target concentration range.
【0005】そして、上記薬液処理方法では、複数の試
料の薬液処理が、上記のように濃度が不安定な薬液中で
繰り返し行われる。したがって、試料の処理状態にばら
つきが生じる。Further, in the above-mentioned chemical solution treatment method, chemical solution treatment of a plurality of samples is repeatedly performed in the chemical solution whose concentration is unstable as described above. Therefore, the processing state of the sample varies.
【0006】そこで、本発明は、上記の課題を解決する
薬液処理装置及び薬液処理方法を提供することを目的と
する。Therefore, it is an object of the present invention to provide a chemical liquid processing apparatus and a chemical liquid processing method which solve the above problems.
【0007】[0007]
【課題を解決するための手段】上記目的を達成する本発
明の薬液処理装置は、試料の薬液処理を行う処理槽と、
薬液の調合を行う調合槽と、調合槽と処理槽とで薬液を
循環させる循環系と、調合槽に濃度調節液を供給する濃
度調節系とを備えたものである。第1の薬液処理装置の
調合槽には、当該調合槽内の薬液量を測定する液量測定
手段と、開閉バルブを有する排水管とが設けられてい
る。また、上記液量測定手段と上記開閉バルブとには、
当該液量測定手段で測定した上記調合槽内の薬液量に基
づいて当該開閉バルブを操作する液量制御手段が接続さ
れている。[Means for Solving the Problems] A chemical treatment apparatus according to the present invention which achieves the above object, comprises a treatment tank for treating a sample with a chemical,
It is provided with a mixing tank for preparing a chemical solution, a circulation system for circulating the chemical solution between the mixing tank and the processing tank, and a concentration adjusting system for supplying a concentration adjusting liquid to the mixing tank. The mixing tank of the first chemical liquid processing device is provided with liquid amount measuring means for measuring the amount of chemical liquid in the mixing tank and a drain pipe having an opening / closing valve. Further, the liquid amount measuring means and the on-off valve,
Liquid amount control means for operating the on-off valve based on the amount of the liquid medicine in the mixing tank measured by the liquid amount measuring means is connected.
【0008】次に、第2の薬液処理装置の調合槽には、
当該調合槽内の薬液温度を測定する液温測定手段が設け
られている。また、上記液温測定手段と上記濃度調節系
とには、当該液温測定手段で測定した上記調合槽内の薬
温に基づいて上記濃度調節液の供給量と供給時間間隔と
を設定する濃度制御手段が接続されている。尚、上記調
合槽には、上記第1の薬液処理装置と同様の薬液測定手
段と、排水管と、液量制御手段とを設けても良い。Next, in the mixing tank of the second chemical liquid processing apparatus,
Liquid temperature measuring means for measuring the temperature of the chemical liquid in the preparation tank is provided. Further, in the liquid temperature measuring means and the concentration adjusting system, the concentration for setting the supply amount and the supply time interval of the concentration adjusting liquid based on the drug temperature in the mixing tank measured by the liquid temperature measuring means. Control means are connected. In addition, you may provide the said chemical | medical solution measuring means similar to the said 1st chemical | medical solution processing apparatus, a drain pipe, and a liquid amount control means in the said mixing tank.
【0009】そして、本発明の薬液処理方法は、初期調
合した薬液を調合槽と処理槽との間で循環させると共に
上記調合槽に所定時間毎に所定量の濃度調節液を供給し
ながら、当該処理槽内で試料を薬液処理する方法であ
る。第1の薬液処理方法は、上記濃度調節液を供給する
際に上記調合槽内の薬液量を測定し、その薬液量に基づ
いて上記調合槽内の薬液を排水して当該調合槽内の薬液
量を所定量に保つ。The chemical solution treating method of the present invention is such that the initially prepared chemical solution is circulated between the preparation tank and the processing tank, and a predetermined amount of the concentration adjusting solution is supplied to the preparation tank at predetermined intervals. This is a method of treating a sample with a chemical solution in a treatment tank. The first chemical liquid treatment method measures the amount of the chemical liquid in the mixing tank when supplying the concentration adjusting liquid, drains the chemical liquid in the mixing tank based on the amount of the chemical liquid, and drains the chemical liquid in the mixing tank. Keep the amount at a given amount.
【0010】第2の薬液処理方法は、上記濃度調節液を
供給する際に上記調合槽内の薬液温度を測定し、その薬
液温度に基づいて上記調合槽内に供給する上記濃度調節
液の供給量と供給時間間隔とを設定する。尚、上記濃度
調節液を供給する際には、上記第1の薬液処理方法と同
様にしても良い。In the second chemical liquid treatment method, the temperature of the chemical liquid in the mixing tank is measured when the concentration adjusting liquid is supplied, and the concentration adjusting liquid is supplied into the mixing tank based on the temperature of the chemical liquid. Set quantity and feed time interval. In addition, when supplying the concentration adjusting liquid, it may be performed in the same manner as the first chemical liquid processing method.
【0011】[0011]
【作用】上記第1の薬液処理装置では、液量測定手段に
よって調合槽内の薬液量が測定される。そして、測定し
た薬液量に基づいて薬液量制御手段によって排水管の開
閉バルブが操作される。このため、調合槽内の薬液は所
定量に保たれる。In the first chemical liquid processing apparatus described above, the amount of chemical liquid in the mixing tank is measured by the liquid amount measuring means. Then, the opening / closing valve of the drain pipe is operated by the chemical liquid amount control means based on the measured chemical liquid amount. Therefore, the chemical liquid in the mixing tank is kept at a predetermined amount.
【0012】また、上記第2の薬液処理装置では、液温
測定手段によって調合槽内の薬液温度が測定される。そ
して、測定した薬液温度に基づいて濃度制御手段によっ
て濃度調節系から供給される濃度調節液の供給量と供給
時間間隔とが設定される。このため、薬液の温度変化に
応じた供給時間間隔と供給量とで、調合槽内に濃度調節
液が供給される。Further, in the above-mentioned second chemical liquid processing apparatus, the chemical temperature in the mixing tank is measured by the liquid temperature measuring means. Then, based on the measured chemical liquid temperature, the concentration control means sets the supply amount and the supply time interval of the concentration adjusting liquid supplied from the concentration adjusting system. Therefore, the concentration adjusting liquid is supplied into the mixing tank at the supply time interval and the supply amount according to the temperature change of the chemical liquid.
【0013】また、上記第1の薬液処理方法では、薬液
量が所定量に保たれた調合槽内に濃度調節液が供給され
ることによって、薬液が所定の濃度範囲に調合される。
このため、処理槽内には所定濃度の薬液が供給され、こ
の薬液中で試料の処理が行われる。Further, in the above-mentioned first chemical liquid processing method, the chemical liquid is mixed within a predetermined concentration range by supplying the concentration adjusting liquid into the mixing tank in which the amount of the chemical liquid is kept at a predetermined amount.
Therefore, a chemical solution having a predetermined concentration is supplied into the processing tank, and the sample is processed in this chemical solution.
【0014】そして、上記第2の薬液処理方法では、薬
液温度に基づいて濃度調節液の供給時間間隔と供給量と
が設定される。このため、薬液の温度変化によらず、当
該薬液の経時的な濃度変化量を正確に把握して濃度調節
液が供給される。In the second chemical liquid processing method, the supply time interval and the supply amount of the concentration adjusting liquid are set based on the chemical liquid temperature. Therefore, the concentration adjustment liquid is supplied by accurately grasping the amount of concentration change over time of the chemical liquid regardless of the temperature change of the chemical liquid.
【0015】[0015]
【実施例】以下、本発明の薬液処理装置の第1実施例を
図1の構成図に基づいて説明する。薬液処理装置1は、
処理槽11と、この処理槽11に隣接する調合槽12と
を有している。そして、処理槽11と調合槽12との間
には、循環系13が設けられている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the chemical liquid processing apparatus of the present invention will be described below with reference to the block diagram of FIG. The chemical treatment device 1 is
It has a processing tank 11 and a mixing tank 12 adjacent to the processing tank 11. A circulation system 13 is provided between the processing tank 11 and the mixing tank 12.
【0016】また、調合槽12には、液量測定手段14
と排水管15とが設けられている。これらの液量測定手
段14と排水管15とには、液量制御手段16が接続さ
れている。さらに、調合槽12には、濃度調節系17が
設けられている。Further, the mixing tank 12 has a liquid amount measuring means 14
And a drain pipe 15 are provided. A liquid amount control unit 16 is connected to the liquid amount measuring unit 14 and the drain pipe 15. Further, the mixing tank 12 is provided with a concentration adjusting system 17.
【0017】上記処理槽11は、薬液Lが溜められ、そ
の薬液L中で試料Sの薬液処理を行う槽である。そし
て、処理槽11と調合槽12との間の仕切り11aは、
処理槽11及び調合槽12の外周壁よりも低く形成さ
れ、これによって処理槽11をオーバーフローした薬液
Lが全て調合槽12に流れ込むようなっている。The processing tank 11 is a tank in which the chemical solution L is stored and the sample S is processed in the chemical solution L. And the partition 11a between the processing tank 11 and the mixing tank 12 is
It is formed to be lower than the outer peripheral walls of the processing tank 11 and the mixing tank 12, so that the chemical liquid L overflowing the processing tank 11 entirely flows into the mixing tank 12.
【0018】上記調合槽12は、内部で薬液Lの調合を
行う槽である。この調合槽12は、例えば、内部に溜め
た薬液Lの液面が全ての高さ位置で所定の面積になるよ
うに形成されている。The mixing tank 12 is a tank for internally mixing the chemical liquid L. The mixing tank 12 is formed, for example, so that the liquid surface of the chemical liquid L stored therein has a predetermined area at all height positions.
【0019】上記循環系13は、処理槽11と調合槽1
2とを接続する配管131を有している。この配管13
1には、内部を通過する薬液Lを所定温度に加熱または
冷却する温度調節手段132が配設されている。また、
配管131には、調合槽12から処理槽11に向かって
薬液Lを流し込むポンプ133と、薬液Lをろ過するフ
ィルタ134とが直列に設けられている。The circulation system 13 includes a processing tank 11 and a mixing tank 1.
It has a pipe 131 for connecting with 2. This piping 13
1 is provided with temperature adjusting means 132 for heating or cooling the chemical liquid L passing through the inside thereof to a predetermined temperature. Also,
The pipe 131 is provided with a pump 133 for pouring the chemical liquid L from the preparation tank 12 toward the treatment tank 11 and a filter 134 for filtering the chemical liquid L in series.
【0020】上記液量測定手段14は、調合槽12内の
液量を測定するものであり、例えば、液面の高さを測定
する液面計からなる。The liquid amount measuring means 14 measures the amount of liquid in the mixing tank 12, and is composed of, for example, a liquid level gauge for measuring the height of the liquid surface.
【0021】上記排水管15は、例えば調合槽12の底
面に接続され、排水する薬液量を調節する開閉バルブ1
5aが配設されている。The drain pipe 15 is connected to, for example, the bottom surface of the mixing tank 12 to open / close the valve 1 for adjusting the amount of chemical liquid to be drained.
5a is provided.
【0022】上記液量制御手段16は、上記液量測定手
段14で測定した調合槽12内の薬液量の信号を受信
し、受信した信号値に基づいて排水管15の開閉バルブ
15aを操作するものである。この液量制御手段16に
よる開閉バルブ15aの操作は、調合槽12内が所定の
薬液量に保たれるように行われる。The liquid amount control means 16 receives the signal of the amount of the chemical liquid in the mixing tank 12 measured by the liquid amount measuring means 14, and operates the opening / closing valve 15a of the drain pipe 15 based on the received signal value. It is a thing. The operation of the opening / closing valve 15a by the liquid amount control means 16 is performed so that the inside of the mixing tank 12 is maintained at a predetermined liquid amount.
【0023】尚、上記の液量測定手段14,排水管15
の開閉バルブ15a及び液量制御手段16としては、特
願平4−82706に開示されている流量制御装置を用
いても良い。The above liquid amount measuring means 14 and drain pipe 15
As the opening / closing valve 15a and the liquid amount control means 16, the flow rate control device disclosed in Japanese Patent Application No. 4-82706 may be used.
【0024】上記濃度調節系17は、調合槽12に濃度
調節液L1を供給するものであり、供給管17aと開閉
バルブ17bと制御部17cとで構成されている。制御
部17cは、開閉バルブ17bに接続されて当該開閉バ
ルブ17bを操作するものである。この制御部17cで
は、所定時間が経過する毎に所定量の濃度調節液L1が
調合槽12に供給されるように開閉バルブ17bを操作
する。上記濃度調節液L1の供給時間間隔と供給量と
は、薬液Lの経時的な濃度変化のデータに基づいて設定
される。ここで、例えばシリコンウエハからなる試料S
をアンモニア−過酸化水素水溶液からなる薬液中に浸漬
して洗浄する、いわゆるSC−1洗浄を行う場合には、
上記濃度調節液L1として水酸化アンモニウムと過酸化
水素とを用いる。そしてそれぞれの濃度調節液L1に対
して別々に濃度調節系17を用意する。また、上記以外
の処理で、例えば、2〜4成分系の薬液を用いる場合に
は、各成分毎に濃度調節系17を個別に用意する。The concentration adjusting system 17 supplies the concentration adjusting liquid L1 to the blending tank 12, and is composed of a supply pipe 17a, an opening / closing valve 17b and a controller 17c. The control unit 17c is connected to the opening / closing valve 17b and operates the opening / closing valve 17b. In the control unit 17c, the opening / closing valve 17b is operated so that a predetermined amount of the concentration adjusting liquid L1 is supplied to the mixing tank 12 each time a predetermined time has elapsed. The supply time interval and the supply amount of the concentration adjusting liquid L1 are set based on the data of the concentration change of the chemical liquid L over time. Here, for example, a sample S made of a silicon wafer
When the so-called SC-1 cleaning is performed by immersing the product in a chemical solution composed of an ammonia-hydrogen peroxide aqueous solution for cleaning,
Ammonium hydroxide and hydrogen peroxide are used as the concentration adjusting liquid L1. Then, the concentration adjusting system 17 is separately prepared for each concentration adjusting liquid L1. Further, in the case of a treatment other than the above, for example, when a chemical solution of 2 to 4 components is used, the concentration adjusting system 17 is individually prepared for each component.
【0025】上記構成の薬液処理装置1では、調合槽1
2内に薬液Lを入れて循環系13のポンプ133を作動
させると、所定温度の薬液Lが処理槽11内に送り込ま
れる。そして、処理槽11内に薬液Lが溜められ、この
薬液L中で試料Sの薬液処理が行われる。また、処理槽
11をオーバーフローした薬液Lは調合槽12内に流れ
込むため、処理槽11内と供給槽12内では薬液Lが循
環する。そして、調合槽12内には、濃度調節系17か
ら濃度調節液L1が供給される。一方、調合槽12内
は、液量制御手段16によって所定の薬液量に保たれて
いる。このため、濃度調節液L1は、所定の薬液量に保
たれた調合槽12に供給される。そして、濃度調節液L
1が供給されると、液量測定手段14によって調合槽1
2内の薬液量の増加が検知され、液量制御手段16によ
って排水管15の開閉バルブ15aが操作されて、調合
槽12内の薬液量が所定量に保たれる。以上から、常に
所定の薬液量に保たれた調合槽12内に濃度調節液L1
が供給され、調合槽12内では所定の濃度範囲で薬液が
調合される。In the chemical liquid processing apparatus 1 having the above structure, the mixing tank 1
When the chemical liquid L is put into 2 and the pump 133 of the circulation system 13 is operated, the chemical liquid L at a predetermined temperature is fed into the processing tank 11. Then, the chemical liquid L is stored in the processing tank 11, and the chemical liquid treatment of the sample S is performed in the chemical liquid L. Further, since the chemical liquid L overflowing the processing tank 11 flows into the blending tank 12, the chemical liquid L circulates in the processing tank 11 and the supply tank 12. Then, the concentration adjusting liquid L1 is supplied from the concentration adjusting system 17 into the mixing tank 12. On the other hand, the inside of the mixing tank 12 is maintained at a predetermined amount of chemical liquid by the liquid amount control means 16. Therefore, the concentration adjusting liquid L1 is supplied to the mixing tank 12 kept at a predetermined amount of chemical liquid. And the concentration adjusting liquid L
When 1 is supplied, the mixing tank 1
When the increase in the amount of the liquid chemical in 2 is detected, the liquid amount control means 16 operates the opening / closing valve 15a of the drain pipe 15 to keep the amount of the liquid chemical in the mixing tank 12 at a predetermined amount. From the above, the concentration adjusting liquid L1 is always stored in the mixing tank 12 kept at a predetermined chemical amount.
Is supplied, and the chemical liquid is prepared in the preparation tank 12 within a predetermined concentration range.
【0026】次に、第2実施例の薬液処理装置を図2の
構成図に基づいて説明する。尚、上記第1実施例と同様
の構成部品は、上記図1と同様の符号を用いる。薬液処
理装置2は、上記第1実施例と同様の処理槽11と調合
槽12と循環系13と濃度調節系17とを有している。
また、調合槽12には、液温測定手段21が設けられて
いる。この液温測定手段21には濃度制御手段22が接
続されている。Next, the chemical liquid treating apparatus of the second embodiment will be explained based on the block diagram of FIG. The same reference numerals as those in FIG. 1 are used for the same components as those in the first embodiment. The chemical liquid processing apparatus 2 has a processing tank 11, a mixing tank 12, a circulation system 13 and a concentration adjusting system 17 similar to those in the first embodiment.
Further, the mixing tank 12 is provided with a liquid temperature measuring means 21. A concentration control means 22 is connected to the liquid temperature measuring means 21.
【0027】上記液温測定手段21は、調合槽12内の
薬液温度を測定する手段である。The liquid temperature measuring means 21 is a means for measuring the temperature of the chemical liquid in the mixing tank 12.
【0028】上記濃度制御手段22は、濃度調節系17
の制御部17cと一体に形成されている。この濃度制御
手段22には、使用する薬液Lに関する薬液濃度の経時
変化量が、各薬液温度毎にデータとして記憶されてい
る。また、ここでは液温測定手段21によって測定した
調合槽12内の薬液温度の信号が受信される。そして、
受信した信号値と記憶されている上記データとから、調
合槽12内の薬液濃度の経時変化量を予測し、調合槽1
2内の薬液濃度が所定の範囲に保たれるように濃度調節
液L1の供給時間間隔と供給量とを設定する。そして、
この設定値に基づいて開閉バルブ17bを操作する。The concentration control means 22 is a concentration control system 17
Is integrally formed with the control unit 17c. The concentration control means 22 stores the amount of change over time in the concentration of the chemical liquid regarding the chemical liquid L to be used, as data for each temperature of the chemical liquid. Further, here, the signal of the chemical liquid temperature in the mixing tank 12 measured by the liquid temperature measuring means 21 is received. And
From the received signal value and the stored data, the amount of change over time in the concentration of the chemical liquid in the mixing tank 12 is predicted, and the mixing tank 1
The supply time interval and the supply amount of the concentration adjusting liquid L1 are set so that the concentration of the chemical liquid in 2 is maintained within a predetermined range. And
The on-off valve 17b is operated based on this set value.
【0029】上記薬液処理装置2では、液温測定手段2
1と濃度制御手段22とを設けたことによって、薬液L
の温度変化に応じた供給時間間隔と供給量で調合槽12
内に濃度調節液L1が供給される。このため、薬液Lの
温度変化によらず、当該薬液の経時的な濃度変化量を正
確に把握した濃度調節液L1の供給がなされる。In the chemical liquid processing device 2, the liquid temperature measuring means 2 is used.
1 and the concentration control means 22 provide the chemical liquid L.
Mixing tank 12 with supply time interval and supply amount according to temperature change of
The concentration adjusting liquid L1 is supplied therein. Therefore, regardless of the temperature change of the chemical liquid L, the concentration adjusting liquid L1 is accurately supplied, which accurately grasps the amount of concentration change over time of the chemical liquid L.
【0030】また、図3には、第3実施例の薬液処理装
置3の構成図を示した。ここで示す薬液処理装置3は、
上記第1実施例の薬液処理装置に上記第2実施例の液温
測定手段21と濃度制御手段22とを設けたものであ
る。Further, FIG. 3 shows a configuration diagram of the chemical liquid processing apparatus 3 of the third embodiment. The chemical treatment device 3 shown here is
The chemical liquid treatment apparatus of the first embodiment is provided with the liquid temperature measuring means 21 and the concentration control means 22 of the second embodiment.
【0031】この薬液処理装置3では、薬液Lが所定の
薬液量に保たれた調合槽12内に薬液Lの経時的な濃度
変化を正確に予測して濃度調節液L1が供給されるた
め、調合槽12内の薬液濃度の制御性が上記第1及び第
2実施例よりもさらに向上する。In this chemical liquid processing apparatus 3, the concentration adjusting liquid L1 is supplied by accurately predicting the change over time of the concentration of the chemical liquid L in the mixing tank 12 in which the chemical liquid L is kept at a predetermined chemical amount. The controllability of the chemical concentration in the mixing tank 12 is further improved as compared with the first and second embodiments.
【0032】尚、調合槽内12内の薬液量が増加する可
能性がある場合には、調合槽12にここでは図示しない
液量調節液供給系を設け、この系の開閉バルブに上記液
量制御手段16を接続させても良い。このような構造の
薬液処理装置では、調合槽12内の薬液薬液の排水また
は調合槽12内への液量調節液の供給によって、調合槽
1内が所定の薬液量に保たれる。If there is a possibility that the amount of chemical liquid in the mixing tank 12 will increase, the mixing tank 12 is provided with a liquid amount adjusting liquid supply system (not shown here), and the opening / closing valve of this system is provided with the above liquid amount. The control means 16 may be connected. In the chemical liquid processing device having such a structure, the inside of the mixing tank 1 is maintained at a predetermined amount by the drainage of the chemical liquid in the mixing tank 12 or the supply of the liquid amount adjusting liquid into the mixing tank 12.
【0033】次に、薬液処理方法の実施例を説明する。
ここでは、一例として上記図3で示した第3実施例の薬
液量装置3を用いて、シリコンウエハからなる試料Sを
上記SC−1からなる薬液Lで洗浄する場合を上記図3
と図4のフローチャートに基づいて説明する。先ず、ス
テップS11では、水酸化アンモミウムと過酸化水素水
と純水とを例えば1:1:5程度の割合で調合槽12内
に供給して薬液Lを初期調合する。そして、薬液Lを循
環系13から処理槽11中に注ぎ込み、処理槽11内と
調合槽12内に所定量の薬液Lを溜める。Next, an example of the chemical treatment method will be described.
Here, as an example, the case where the sample S made of a silicon wafer is cleaned with the chemical liquid L made of the SC-1 using the chemical liquid amount device 3 of the third embodiment shown in FIG. 3 is used.
Will be described with reference to the flowchart of FIG. First, in step S11, ammonium hydroxide, hydrogen peroxide solution, and pure water are supplied into the mixing tank 12 at a ratio of, for example, about 1: 1: 5 to initially prepare the chemical liquid L. Then, the chemical liquid L is poured into the processing tank 11 from the circulation system 13 to store a predetermined amount of the chemical liquid L in the processing tank 11 and the preparation tank 12.
【0034】次にステップS12では、処理槽11中で
の試料Sの薬液処理を開始する。また、処理槽11と調
合槽12との間での薬液Lの循環を開始する。Next, in step S12, the chemical treatment of the sample S in the treatment tank 11 is started. Further, circulation of the chemical liquid L between the processing tank 11 and the mixing tank 12 is started.
【0035】その後、ステップS13では、液温測定手
段21によって、調合槽12内の薬液温度を測定する。
そして、ステップS14では、濃度制御手段22によっ
て、上記で測定した薬液温度に基づいて薬液濃度の経時
変化量を予測し、薬液濃度が所定の範囲内に保たれるよ
うに濃度調節液L1の供給時間間隔と供給量とを設定す
る。ここでは、薬液濃度を狭い範囲で制御するために、
上記供給時間間隔を出来るだけ短く設定する。この際、
濃度調節液L1としては、水酸化アンモニウムと過酸化
水素水とを用い、それぞれの濃度調節液L1に関して個
別に供給時間間隔と供給量とを設定する。Then, in step S13, the liquid temperature measuring means 21 measures the temperature of the chemical liquid in the mixing tank 12.
Then, in step S14, the concentration control means 22 predicts the amount of change over time in the chemical liquid concentration based on the chemical liquid temperature measured above, and supplies the concentration adjusting liquid L1 so that the chemical liquid concentration is maintained within a predetermined range. Set the time interval and the supply amount. Here, in order to control the chemical concentration within a narrow range,
Set the supply time interval as short as possible. On this occasion,
Ammonium hydroxide and hydrogen peroxide solution are used as the concentration adjusting liquid L1, and the supply time interval and the supply amount are individually set for each concentration adjusting liquid L1.
【0036】次に、ステップS15では、上記ステップ
S14で設定した供給時間間隔の経過を判断する。この
時、供給時間間隔の経過は、薬液Lを調合した時点また
は調合した薬液Lが時間経過に伴って所定の濃度範囲に
達したと予測される時点からの時間経過とする。そし
て、上記設定時間が経過した場合には、次のステップS
16で、上記で設定した供給量の濃度調節液L1を調合
槽12に供給する。その後、上記ステップ13に戻り、
濃度調節液L1が供給された調合槽12内の薬液温度を
測定する。次に、ステップS14では、測定された薬液
温度に基づいて、上記濃度調節液L1の供給時間間隔と
供給量とを上記のように再設定する。そして、ステップ
S15では、濃度調節液L1を供給した時点から設定時
間の経過を判断し、上記と同様にステップS16で濃度
調節液L1を調合槽12に供給する。以降、上記各ステ
ップS13〜S16を繰り返す。Next, in step S15, it is determined whether the supply time interval set in step S14 has elapsed. At this time, the supply time interval elapses from the time when the chemical liquid L is prepared or the time when the prepared chemical liquid L is expected to reach a predetermined concentration range with the elapse of time. When the set time has elapsed, the next step S
At 16, the concentration adjusting liquid L1 having the supply amount set above is supplied to the mixing tank 12. Then return to step 13 above,
The temperature of the chemical liquid in the mixing tank 12 to which the concentration adjusting liquid L1 is supplied is measured. Next, in step S14, the supply time interval and supply amount of the concentration adjusting liquid L1 are reset as described above based on the measured chemical liquid temperature. Then, in step S15, it is determined whether or not the set time has elapsed from the time when the concentration adjusting liquid L1 was supplied, and the concentration adjusting liquid L1 is supplied to the mixing tank 12 in step S16 as described above. Thereafter, the above steps S13 to S16 are repeated.
【0037】一方、上記ステップS13〜16と平行し
て、以下のステップS23〜25を行う。先ず、ステッ
プS12で試料Sの薬液処理と薬液Lの循環とを開始し
た後、ステップS23では、液量測定手段14によって
調合槽12内の薬液量を測定する。On the other hand, in parallel with the above steps S13 to 16, the following steps S23 to 25 are performed. First, in step S12, the chemical liquid treatment of the sample S and the circulation of the chemical liquid L are started, and then, in step S23, the liquid amount measuring means 14 measures the amount of the chemical liquid in the mixing tank 12.
【0038】次に、ステップS24では、上記ステップ
S23で測定した薬液量が増加したか否かの判断を行
う。ここで、増加したと判断した場合には、ステップS
25に進んで調合槽12内の薬液Lを排水する。そし
て、調合槽12内を所定の薬液量に保つ。一方、増加し
ないと判断した場合には、ステップS23に戻って、以
下の工程を繰り返す。Next, in step S24, it is determined whether or not the amount of chemical liquid measured in step S23 has increased. If it is determined that the number has increased, step S
Proceeding to 25, the chemical liquid L in the mixing tank 12 is drained. Then, the inside of the mixing tank 12 is kept at a predetermined amount of liquid medicine. On the other hand, when it is determined that the number does not increase, the process returns to step S23 and the following steps are repeated.
【0039】上記の薬液処理方法では、処理槽11内の
薬液温度は、温度調節手段132によって所定温度に保
持される。一方、調合槽12内では、濃度調節液L1の
供給によって反応熱が発生して薬液温度が上昇する。そ
して、上昇した薬液温度に基づいて、濃度調節液L1の
供給時間間隔と供給量とが設定される。このため、薬液
の温度変化によらず、当該薬液の経時的な濃度変化量を
正確に把握して濃度調節液が供給される。この際、調合
槽12内の薬液量は、ステップ23〜25によって、常
に所定量に保たれている。このため、濃度調節液L1を
供給する際には、調合槽12内の薬液量は常に所定量に
保たれている。したがって、調合槽12内では、薬液L
が所定の濃度範囲に調合される。そして、この薬液Lが
処理槽11内に供給され、所定濃度の薬液L中で試料S
の薬液処理が行われる。In the above-mentioned chemical treatment method, the temperature of the chemical in the treatment tank 11 is maintained at a predetermined temperature by the temperature adjusting means 132. On the other hand, in the mixing tank 12, the reaction heat is generated by the supply of the concentration adjusting liquid L1 and the chemical liquid temperature rises. Then, the supply time interval and the supply amount of the concentration adjusting liquid L1 are set based on the increased chemical liquid temperature. Therefore, the concentration adjustment liquid is supplied by accurately grasping the amount of concentration change over time of the chemical liquid regardless of the temperature change of the chemical liquid. At this time, the amount of the chemical liquid in the mixing tank 12 is always kept at a predetermined amount in steps 23 to 25. Therefore, when the concentration adjusting liquid L1 is supplied, the amount of the chemical liquid in the mixing tank 12 is always kept at a predetermined amount. Therefore, in the mixing tank 12, the chemical liquid L
Are mixed in a predetermined concentration range. Then, the chemical liquid L is supplied into the processing tank 11, and the sample S in the chemical liquid L having a predetermined concentration is
Chemical treatment is performed.
【0040】尚、上記実施例では、液量の調節と濃度の
調節とを独立したフローチャートにしたがって行うよう
にした。しかし、ステップS16で濃度調節液を供給す
る前に、ステップS23,S24の工程を行うようにし
て、上記の各調節工程を一連のフローチャートにしたが
って行うようにしても良い。In the above embodiment, the adjustment of the liquid amount and the adjustment of the concentration are performed according to independent flowcharts. However, the steps S23 and S24 may be performed before the concentration adjusting liquid is supplied in step S16, and the above adjusting steps may be performed according to a series of flowcharts.
【0041】[0041]
【発明の効果】以上、説明したように本発明の薬液処理
装置によれば、調合槽に液量測定手段と液量測定手段と
排水管と液量制御手段とを設けることによって、調合槽
内の薬液量を所定量に保つことができる。また、調合槽
の濃度調節系に、液温測定手段を接続した濃度制御手段
を設けることによって、薬液温度の変化に応じた供給時
間間隔と供給量とで調合槽内に濃度調節液を供給するこ
とができる。このため、調合槽内で所定の濃度範囲の薬
液を調合し、処理槽内に安定した濃度範囲の薬液を供給
することが可能になる。そして、本発明の薬液処理方法
では、薬液量を所定量に保った調合槽内に濃度調節液を
供給することによって、薬液を安定した濃度範囲で調合
するとが可能になる。また、薬液温度に基づいて濃度調
節液の供給時間間隔と供給量とを設定することによっ
て、薬液の温度変化によらず所定の濃度範囲で薬液を調
合することが可能にる。このため、調合槽内で安定した
濃度範囲の薬液を調合してこの薬液中で試料を処理する
ことが可能なる。したがって、試料の薬液処理効果を安
定化することができる。As described above, according to the chemical liquid processing apparatus of the present invention, the mixing tank is provided with the liquid amount measuring means, the liquid amount measuring means, the drain pipe, and the liquid amount controlling means. It is possible to keep the amount of the liquid medicine of a predetermined amount. Further, the concentration adjusting system of the mixing tank is provided with the concentration controlling means connected to the liquid temperature measuring means, so that the concentration adjusting liquid is supplied into the mixing tank at the supply time interval and the supply amount according to the change of the chemical liquid temperature. be able to. Therefore, it becomes possible to prepare a chemical solution having a predetermined concentration range in the preparation tank and supply the chemical solution in a stable concentration range to the processing tank. Further, in the chemical liquid processing method of the present invention, the chemical liquid can be mixed in a stable concentration range by supplying the concentration adjusting liquid into the mixing tank in which the chemical liquid amount is kept at a predetermined amount. Further, by setting the supply time interval and the supply amount of the concentration adjusting liquid based on the temperature of the liquid medicine, it is possible to prepare the liquid medicine within a predetermined concentration range regardless of the temperature change of the liquid medicine. Therefore, it is possible to prepare a chemical solution in a stable concentration range in the preparation tank and process the sample in the chemical solution. Therefore, the chemical treatment effect of the sample can be stabilized.
【図1】第1実施例の薬液処理装置の構成図である。FIG. 1 is a configuration diagram of a chemical liquid processing apparatus of a first embodiment.
【図2】第2実施例の薬液処理装置の構成図である。FIG. 2 is a configuration diagram of a chemical liquid processing apparatus of a second embodiment.
【図3】第3実施例の薬液処理装置の構成図である。FIG. 3 is a configuration diagram of a chemical liquid processing apparatus of a third embodiment.
【図4】実施例の薬液処理方法のフローチャートであ
る。FIG. 4 is a flowchart of a chemical treatment method according to an embodiment.
【図5】従来の薬液処理装置の構成図である。FIG. 5 is a configuration diagram of a conventional chemical liquid processing apparatus.
1,2,3 薬液処理装置 11 処理層 12 調合層 13 循環系 14 液量測定手段 15 排水管 15a 開閉バルブ 16 液量制御手段 17 濃度調節系 21 液温測定手段 22 濃度制御手段 S 試料 L 薬液 L1濃度調節液 1, 2 and 3 Chemical liquid treatment device 11 Treatment layer 12 Preparation layer 13 Circulation system 14 Liquid amount measuring means 15 Drain pipe 15a Open / close valve 16 Liquid amount controlling means 17 Concentration adjusting system 21 Liquid temperature measuring means 22 Concentration controlling means S Sample L Chemical liquid L1 concentration adjusting solution
Claims (6)
処理を行う処理槽と、前記薬液の調合が行なわれる調合
槽と、当該調合槽と前記処理槽とに接続され当該調合槽
内と当該処理槽内との間で前記薬液を循環させる循環系
と、前記調合槽に設けられ当該調合槽に濃度調節液を供
給する濃度調節系とを備えた薬液処理装置において、 前記調合槽には、当該調合槽内の薬液量を測定する液量
測定手段と、開閉バルブを有する排水管とが設けられ、 前記液量測定手段と前記開閉バルブとには、前記液量測
定手段で測定した前記調合槽内の薬液量に基づいて前記
開閉バルブの操作を行う液量制御手段が接続されている
ことを特徴とする薬液処理装置。1. A treatment tank for storing a chemical solution and processing a sample in the chemical solution, a preparation tank for preparing the chemical solution, a preparation tank connected to the preparation tank and the processing tank, and In a chemical solution treatment device comprising a circulation system for circulating the chemical liquid between the inside of the treatment tank and a concentration adjusting system provided in the mixing tank for supplying a concentration adjusting liquid to the mixing tank, the mixing tank includes: A liquid amount measuring unit for measuring the amount of the chemical liquid in the mixing tank and a drain pipe having an opening / closing valve are provided, and the liquid amount measuring unit and the opening / closing valve have the mixing amount measured by the liquid amount measuring unit. A chemical liquid treatment apparatus, to which a liquid volume control means for operating the on-off valve based on the amount of chemical liquid in the tank is connected.
処理を行う処理槽と、前記薬液の調合が行なわれる調合
槽と、当該調合槽と前記処理槽とに接続され当該調合槽
内と当該処理槽内との間で前記薬液を循環させる循環系
と、前記調合槽に設けられ当該調合槽に濃度調節液を供
給する濃度調節系とを備えた薬液処理装置において、 前記調合槽には、当該調合槽内の薬液温度を測定する液
温測定手段が設けられ、 前記液温測定手段と前記濃度調節系とには、当該液温測
定手段で測定した前記調合槽内の薬液温度に基づいて当
該濃度調節系による前記濃度調節液の供給量と供給時間
間隔とを設定する濃度制御手段が接続されていることを
特徴とする薬液処理装置。2. A treatment tank for storing a chemical solution and processing a sample in the chemical solution, a preparation tank for preparing the chemical solution, a preparation tank connected to the preparation tank and the processing tank, and In a chemical solution treatment device comprising a circulation system for circulating the chemical liquid between the inside of the treatment tank and a concentration adjusting system provided in the mixing tank for supplying a concentration adjusting liquid to the mixing tank, the mixing tank includes: Liquid temperature measuring means for measuring the temperature of the chemical liquid in the mixing tank is provided, and the liquid temperature measuring means and the concentration adjusting system are based on the chemical temperature in the mixing tank measured by the liquid temperature measuring means. A chemical liquid treatment apparatus, to which a concentration control means for setting a supply amount and a supply time interval of the concentration adjusting liquid by the concentration adjusting system is connected.
測定手段と、開閉バルブを有する排水管とが設けられ、 前記液量測定手段と前記開閉バルブとには、前記液量測
定手段で測定した前記調合槽内の薬液量に基づいて前記
開閉バルブの操作を行う液量制御手段が接続されている
ことを特徴とする薬液処理装置。3. The chemical liquid processing apparatus according to claim 2, wherein the mixing tank is provided with a liquid amount measuring means for measuring the amount of the chemical liquid in the mixing tank, and a drain pipe having an opening / closing valve. A liquid quantity control means for operating the opening / closing valve based on the amount of the chemical liquid in the mixing tank measured by the liquid quantity measuring means is connected to the quantity measuring means and the opening / closing valve. Chemical processing equipment.
溜め、当該調合槽と当該処理槽との間で前記薬液を循環
させると共に前記調合槽に所定時間毎に所定量の濃度調
節液を供給しながら、前記処理槽内で試料を薬液処理す
る方法において、 前記濃度調節液を供給する際には、前記調合槽内の薬液
量を測定し、その薬液量に基づいて当該調合槽内の薬液
を排水して当該調合槽内の薬液量を所定量に保つことを
特徴とする薬液処理方法。4. The initially prepared chemical liquid is stored in a mixing tank and a processing tank, the chemical liquid is circulated between the mixing tank and the processing tank, and a predetermined amount of a concentration adjusting liquid is supplied to the mixing tank every predetermined time. In the method of treating a sample with a chemical solution in the treatment tank while supplying the solution, when supplying the concentration adjusting liquid, the amount of the chemical solution in the preparation tank is measured, and the inside of the preparation tank based on the amount of the chemical solution is measured. The chemical treatment method, characterized in that the chemical of (4) is drained to maintain the amount of the chemical in the mixing tank at a predetermined amount.
溜め、当該調合槽と当該処理槽との間で前記薬液を循環
させると共に前記調合槽に所定時間毎に所定量の濃度調
節液を供給しながら、当該処理槽内で試料を薬液処理す
る方法において、 前記濃度調節液を供給する際には、前記調合槽内の薬液
温度を測定し、その薬液温度に基づいて当該濃度調節液
の供給量と供給時間間隔とを設定することを特徴とする
薬液処理方法。5. The initially prepared chemical liquid is stored in a mixing tank and a processing tank, the chemical liquid is circulated between the mixing tank and the processing tank, and a predetermined amount of a concentration adjusting liquid is supplied to the mixing tank every predetermined time. In the method of treating a sample with a chemical solution in the treatment tank while supplying the solution, when supplying the concentration adjusting solution, the temperature of the chemical solution in the compounding tank is measured, and the concentration adjusting solution is based on the temperature of the solution. And a supply time interval are set.
量を測定し、その薬液量に基づいて当該調合槽内の薬液
を排水して当該調合槽内の薬液量を所定量に保つことを
特徴とする薬液処理方法。6. The chemical liquid treatment method according to claim 5, wherein when the concentration adjusting liquid is supplied, the chemical liquid amount in the mixing tank is measured, and the chemical liquid in the mixing tank is determined based on the measured chemical liquid amount. A method for treating a chemical liquid, characterized by draining and maintaining a predetermined amount of the chemical liquid in the mixing tank.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14263894A JP3203958B2 (en) | 1994-05-31 | 1994-05-31 | Chemical liquid processing apparatus, chemical liquid processing method, and semiconductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14263894A JP3203958B2 (en) | 1994-05-31 | 1994-05-31 | Chemical liquid processing apparatus, chemical liquid processing method, and semiconductor device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07326600A true JPH07326600A (en) | 1995-12-12 |
JP3203958B2 JP3203958B2 (en) | 2001-09-04 |
Family
ID=15320010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14263894A Expired - Fee Related JP3203958B2 (en) | 1994-05-31 | 1994-05-31 | Chemical liquid processing apparatus, chemical liquid processing method, and semiconductor device manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3203958B2 (en) |
-
1994
- 1994-05-31 JP JP14263894A patent/JP3203958B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3203958B2 (en) | 2001-09-04 |
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