JPH07326555A - Rotating type substrate treatment device - Google Patents

Abstract

PURPOSE:To provide a rotating type substrate treatment device which prevents odor from leaking without deteriorating the operability in maintenance. CONSTITUTION:A cylindrical odor scatter preventing pipe 30a is arranged so as to cover the circumference of an opening 5a from the top of the top cup 5 of a scatter preventing cup 4. On the side plane of the odor scatter preventing pipe 30, an opening 30a is formed, a nozzle 40, which mixes developer with air and sprays them, is arranged and protruding from the opening 30a, and the leading edge of the nozzle 40 is arranged almost at the rotation center of a substrate W, viewing from the top. At the four points on the top side plane of the odor scatter preventing pipe 30, exhaust ports 31 which have a square cross-section are formed, permitting a pair of the openings to face having the substrate W in between, when it is viewed from the top. The exhaust ports 31 are all connected with an exhaust pump 20 to communicate.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate processing apparatus for supplying a processing solution while rotating a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, and the like, In particular, the present invention relates to a rotary substrate processing apparatus that supplies a sprayed processing liquid.

[0002]

2. Description of the Related Art As a conventional rotary substrate processing apparatus of this type, for example, a surface of a semiconductor wafer on which a photoresist film is formed is exposed to a predetermined pattern, and then a developing solution is supplied to the surface of the semiconductor wafer to form a predetermined pattern. There is a rotary substrate developing apparatus that obtains a patterned photoresist film.

This will be described with reference to FIG. Figure 4
FIG. 3 is a vertical sectional view showing a main part of a rotary substrate developing device. A substrate W, which is a semiconductor wafer, has a rotatable spin chuck 2
It is supported almost horizontally by. Spin chuck 2
Is surrounded by a shatterproof cup 4 having an upper cup and a lower cup each having an opening at the top. At the bottom of the scattering prevention cup 4, a drain port 14 for collecting used developer and the like, and a processing solution mist which is sucked in the atmosphere in the cup and scattered in the cup to be discharged, are also combined. A cup exhaust port 17 is provided for exhausting the odor that is volatilized from the air and drifts in the scattering prevention cup 4. Drainage port 1
4 is connected to the drainage tank 21, and the cup exhaust port 17 is connected to the exhaust pump 20.

Further, a cylindrical odor diffusion preventing tubular member 30 is provided so as to surround the periphery of the opening from the upper portion of the scattering prevention cup 4 upward. The tip of a nozzle 40 for spraying the developer onto the substrate W is provided so as to project from the opening on the side surface of the odor diffusion preventing cylinder 30 so that the tip of the nozzle 40 is located substantially at the center of rotation of the substrate W. Has been done.

In the rotary substrate developing apparatus having such a structure, the developing solution E in the form of spray is supplied from the nozzle 40 to the rotating substrate W, and is shaken off from the excess developing solution and the rotating substrate W. The developing solution is collected through the drainage port 14. Further, odors volatilized from the sprayed developer E and the developer supplied to the surface of the substrate W are exhausted by the exhaust pump 20 via the cup exhaust port 17.

[0006]

By the way, the odor volatilized from the processing liquid such as the developing liquid is very sensitive to human beings. Since this odor may cause discomfort for some people and nausea in severe cases, it is necessary to efficiently exhaust the odor so as not to leak the odor. For example, when the developing solution is for a negative resist, the developing solution contains a xylene-based organic solvent, so that the influence of odor is particularly remarkable. Further, when a so-called two-fluid nozzle that mixes the treatment liquid and gas and supplies the mixture in the form of a spray is used, the influence of the odor becomes more remarkable.

Therefore, the exhaust pressure of the exhaust pump 20 is controlled so that the exhaust pressure does not fall below the minimum pressure, and the downflow D of the clean room is efficiently taken in from the upper part of the odor diffusion preventing cylinder 30. The odor in the odor diffusion preventing cylinder 30 is efficiently exhausted through the cup exhaust port 17 so that the odor does not leak. Further, the odor (reference numeral E'in the figure) accumulated in the internal space of the odor diffusion preventing cylinder 30 is gradually pushed up to the inner surface of the odor diffusion preventing cylinder 30 by being pushed up by the odor generated by volatilization one after another. Therefore, the height of the odor diffusion preventing tubular member 30 is increased in order to prevent the odor diffusion preventing tubular member 30 from rising upward and leaking to the surroundings from the opening in the upper portion.

However, when the height of the odor diffusion preventing cylinder 30 is increased, the tip of the nozzle 40 is aligned with the rotation center of the substrate W while looking through the upper opening of the odor diffusion preventing cylinder 30. It is difficult to perform maintenance such as adjustment work, confirmation of the discharge state of the developing solution, and work to confirm that development is normally performed, so there is a limit to its height, and as a result, odor leakage is prevented. Was difficult.

The present invention has been made in view of the above circumstances, and provides a rotary substrate processing apparatus capable of preventing odor leakage without deteriorating workability of work such as maintenance. With the goal.

[0010]

The present invention has the following constitution in order to achieve such an object. That is, in the rotary substrate processing apparatus according to the present invention, the substrate is supported by a rotatable spin chuck surrounded by a scattering prevention cup having an opening on the upper surface, and a sprayed processing liquid is discharged from a nozzle above the substrate. In a rotary substrate processing apparatus for processing a substrate by supplying, an odor diffusion preventing tubular member that surrounds the periphery of the opening is provided from above the scattering prevention cup upward, and the odor diffusion preventing tubular member is provided. An exhaust port is provided on the upper side surface of the.

[0011]

The operation of the present invention is as follows. That is,
Odor is generated from the sprayed processing liquid supplied to the substrate supported by the rotatable spin chuck. The generated odor stays in the space of the odor diffusion preventing tubular member arranged so as to surround the opening of the scattering prevention cup from the upper part toward the upper side. However, even if some of the accumulated odor rises along the inner surface of the odor diffusion prevention cylinder, the exhaust is formed from the exhaust port formed on the upper side surface of the odor diffusion prevention cylinder, and the increased odor is generated. Is exhausted from its exhaust port. Therefore, the odor accumulated in the space of the odor diffusion preventing cylinder does not leak from the upper part of the odor diffusion preventing cylinder to its surroundings.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. 1 and 2 are views showing a rotary substrate developing apparatus which is an example of the rotary substrate processing apparatus, and in particular, FIG.
2 is a plan view of the rotary substrate developing apparatus, and FIG.
It is an AA arrow sectional view inside.

In the figure, reference numeral 2 is a spin chuck that sucks and holds the substrate W substantially horizontally. This spin chuck 2
Is rotationally driven by the motor 3 via the rotary shaft. Further, around the spin chuck 2, a scattering prevention cup 4 for preventing the recovery of the developing solution and the scattering of the developing solution is arranged.

The shatterproof cup 4 comprises an upper cup 5, a circular rectifying member 7, and a lower cup 10. The upper cup 5 has an opening 5a in the upper portion and an inclined surface 6 for guiding downward the droplets of the developing solution caused by the rotation of the substrate W. The upper cup 5 is fitted into the upper end paragraph surface of the outer peripheral wall 11 of the lower cup 10.

The circular rectifying member 7 is fitted on the upper end of the lower cup inner peripheral wall 12 so as to be positioned below the spin chuck 2. Then, the substrate W flows in through the opening 5a.
The airflow flowing along the peripheral edge of the upper cup 5 is rectified and guided to the lower cup 10, and the droplets of the developer guided downward by the inclined surface 6 of the upper cup 5 are carried on the airflow and guided to the lower cup 10. It has a rectifying surface 8.

The lower cup 10 has a ring-shaped drainage zone 13 inscribed in the lower portion of the outer peripheral wall 11, and this drainage zone 13
And a ring-shaped exhaust zone 15 formed inside. At the bottom of the drainage zone 13, a drainage port 14 is provided at a position facing the substrate W in plan view. This drain 1
4 is connected to the drainage tank 21 and collects the used developing solution. A cup exhaust port 17 is provided at the bottom of the exhaust zone 15 at a position facing the substrate W in plan view. The cup exhaust port 17 is connected to the exhaust pump 20.

A cylindrical odor diffusion preventing tubular member 30 is provided so as to surround the opening 5a from the upper portion of the upper cup 5 upward. An opening 30a is formed on the side surface of the odor diffusion preventing cylinder 30, and a nozzle 40 that mixes the developer and gas in the form of a spray and supplies the mixture is sprayed from the opening 30a into the odor diffusion preventing cylinder 30. The tip end portion 41 of the nozzle 40 is arranged so as to be located substantially at the center of rotation of the substrate W in a plan view. The nozzle 40 is a so-called two-fluid nozzle, and N ₂ gas is usually used as the gas mixed with the developing solution, but other gas such as dry air may be used depending on the conditions. In addition, the odor diffusion prevention cylinder 30 is provided with 4
An exhaust port 31 having a rectangular cross section is formed at each of the positions so that the openings are opposed to each other with the substrate W interposed therebetween in plan view. All of these exhaust ports 31 are connected to the exhaust pump 20 described above.

Next, the operation of the rotary type substrate developing device thus constructed will be described with reference to FIG. Figure 3
FIG. 6 is a diagram showing a state in which a spray-shaped developing solution is being supplied to the substrate W.

The substrate W having a photoresist film formed on its upper surface is held by the spin chuck 2 with its lower surface adsorbed. Then, by rotating the motor 3, the substrate W is rotated together with the spin chuck 2.
When the rotation speed of the substrate W reaches a predetermined speed, the developing solution E in the form of a mixture of gas and developing solution is supplied from the tip portion 41 of the nozzle 40 to the photoresist film surface of the substrate W. At this time, the excess developer or the developer shaken off from the surface of the substrate W stays in the drainage zone 13, and the drainage port 14
It is collected in the drainage tank 21 via the. Further, the odor volatilized from the sprayed developer E or the odor volatilized when the developer collides with the photoresist film surface is exhausted from the cup exhaust port 17 by the exhaust pump 20 through the exhaust zone 15.

Further, the odor E ', which is not exhausted from the cup exhaust port 17 and remains in the internal space of the odor diffusion preventing cylinder 30, is pushed up by the odors generated by volatilization one after another, and the downflow of the clean room is performed. It is pushed upward by the inner surface of the odor diffusion preventing cylinder 30 by D. Then, when it rises to a certain extent, it is sucked into the four exhaust ports 31 formed on the upper side surface of the odor diffusion preventing cylinder 30 and sucked by the exhaust pump 20.

Since the odor E'retained in the space of the odor diffusion preventing cylinder 30 is exhausted from the exhaust port, the odor is diffused to the surroundings while keeping the height of the odor diffusion preventing cylinder 30 low. Can be prevented. Further, since the height of the odor diffusion preventing cylinder 30 can be suppressed to a low level, the tip portion 41 of the nozzle 40 is aligned near the rotation center of the substrate W while looking through the upper opening of the odor diffusion preventing cylinder 30. It is possible to easily perform the maintenance work such as the adjustment work for performing the operation, the work for checking the discharge state of the developing solution, and the work for checking whether the development is normally performed.

Further, in the present embodiment, the odor diffusion preventing tubular member is formed in a cylindrical shape and arranged, but the present invention is not limited to this shape and can be implemented in various shapes. For example, the shape of the upper opening in plan view may be a rectangular tube shape having a rectangular shape. Further, in order to increase the internal space of the odor diffusion preventing tubular member in which the odor is accumulated, the side wall portion of the odor diffusion preventing tubular member may be formed to project laterally. As a result, the space formed by projection functions as a buffer, so that odor does not leak to the surroundings even if the exhaust pressure decreases. That is, the influence on the fluctuation of the exhaust pressure is reduced.

Further, in the present embodiment, the rotary type substrate developing apparatus for carrying out the developing treatment has been described as an example, but the present invention is not limited to this, and the spraying treatment liquid is applied to the rotating substrate. It can be applied to various devices as long as it is a device for supplying. For example, in order to pattern the polyimide film that is the surface protection film, etching is performed through a photoresist film having a required pattern formed on the upper surface thereof, and only the photoresist film that is no longer needed after the patterning of the polyimide film is removed. It can also be applied to an apparatus that performs a stripping process (using a stripping solution containing an organic solvent).

[0024]

As is apparent from the above description, according to the present invention, the odor accumulated in the internal space is exhausted from the exhaust port formed on the upper side surface of the odor diffusion preventing tubular member.
The odor does not leak to its surroundings. Therefore, the height of the odor diffusion preventing tubular member can be suppressed. as a result,
While looking through the upper opening of the odor diffusion prevention cylinder,
Prevent odor leakage without lowering the workability of maintenance work such as adjustment work to match the tip of the nozzle with the vicinity of the center of rotation of the substrate and work to confirm that development is normally performed. You can

[Brief description of drawings]

FIG. 1 is a vertical cross-sectional view of a rotary substrate developing device according to an embodiment.

FIG. 2 is a plan view of a rotary substrate developing device according to an embodiment.

FIG. 3 is a diagram for explaining the operation.

FIG. 4 is a vertical cross-sectional view of a rotary substrate developing device according to a conventional example.

[Explanation of symbols]

 W ... Substrate 2 ... Spin chuck 4 ... Scatter prevention cup 20 ... Exhaust pump 30 ... Odor diffusion preventing cylinder 31 ... Exhaust port 40 ... Nozzle

Claims (1)

[Claims] 1. A substrate is processed by supporting a substrate on a rotatable spin chuck surrounded by a shatterproof cup having an opening on its upper surface, and supplying a sprayed processing liquid from a nozzle above the substrate. In the rotary substrate processing apparatus, while disposing an odor diffusion preventing tubular member that surrounds the periphery of the opening portion from above the scattering prevention cup upward,
A rotary substrate processing apparatus, wherein an exhaust port is provided on an upper side surface of the odor diffusion preventing tubular member.