JPH07326473A - Heating device - Google Patents

Heating device

Info

Publication number
JPH07326473A
JPH07326473A JP6117286A JP11728694A JPH07326473A JP H07326473 A JPH07326473 A JP H07326473A JP 6117286 A JP6117286 A JP 6117286A JP 11728694 A JP11728694 A JP 11728694A JP H07326473 A JPH07326473 A JP H07326473A
Authority
JP
Japan
Prior art keywords
pedestal
heating chamber
support
stand
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6117286A
Other languages
Japanese (ja)
Inventor
Hisamichi Sasaki
寿道 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6117286A priority Critical patent/JPH07326473A/en
Publication of JPH07326473A publication Critical patent/JPH07326473A/en
Pending legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)
  • Baking, Grill, Roasting (AREA)

Abstract

PURPOSE:To evenly heat a subject to be heated using a heating device such as a microwave oven or an electric oven provided with a stand which is driven and rotated with the subject to be heated thereon by enabling the stand to be easily centered and placed on a support, and enabling the eccentricity of the stand to be automatically corrected even when the stand kept placed in an eccentric position is being driven. CONSTITUTION:A ring-shaped tapered portion 9a lowered toward an outer peripheral end is provided on the bottom surface of a stand 9 so that the stand 9 can easily be placed on the roller 3 of a support 4. Even if the stand 9 left in an eccentric position on the roller 3 is actuated with a subject 6 to be heated placed thereon, the tapered portion 9a exerts the stand 9 with a force along the direction of movement from the eccentric position to the center position, thereby correcting this eccentricity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子レンジや電気オーブ
ン等の被加熱物を載置して回転駆動する受け台を設けた
加熱装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heating apparatus provided with a pedestal for placing and rotating a heated object such as a microwave oven or an electric oven.

【0002】[0002]

【従来の技術】電子レンジや電気オーブン等の加熱装置
において、調理中に被加熱物を載置する受け台を回転さ
せる構成として、電波分布や電熱分布の不均一による被
加熱物の部分的加熱を防止し、また、受け台を加熱室の
一定かつ最適な位置に配置して、被加熱物の加熱を良化
した工夫がなされている(例えば特開平4−40917
号公報参照)。
2. Description of the Related Art In a heating device such as a microwave oven or an electric oven, a pedestal for placing an object to be heated is rotated during cooking to partially heat the object to be heated due to uneven radio wave distribution or electric heat distribution. In addition, the pedestal is arranged at a constant and optimum position in the heating chamber to improve the heating of the object to be heated (for example, JP-A-4-40917).
(See the official gazette).

【0003】以下に従来の加熱装置について説明する。
図4に示すように、加熱室1の底面の近傍にモータ(図
示せず)によって駆動される回転軸2によって回転駆動
されるローラ3を有する支持台4を配設し、支持台4に
支持された受け台5に被加熱物6を載置する構成であ
る。
A conventional heating device will be described below.
As shown in FIG. 4, a support base 4 having a roller 3 driven to rotate by a rotation shaft 2 driven by a motor (not shown) is arranged near the bottom surface of the heating chamber 1 and supported by the support base 4. The object 6 to be heated is placed on the received pedestal 5.

【0004】受け台5の外周部の外周端に向けて上昇さ
せたテーパ5aは、支持台の外周軌道に沿って形づくら
れていて、支持台4のローラ3上にテーパ5aが載置さ
れた状態、すなわち、受け台5が回転軸2の中心から偏
心して載置された状態で回転軸2が起動されたとき、受
け台5は、その位置のままで回転し、自動的に回転軸2
の中心に修正されることはない。
The taper 5a raised toward the outer peripheral edge of the outer peripheral portion of the receiving table 5 is formed along the outer peripheral track of the support table, and the taper 5a is placed on the roller 3 of the support table 4. When the rotary shaft 2 is activated in a state, that is, in a state where the pedestal 5 is placed eccentrically from the center of the rotary shaft 2, the pedestal 5 rotates in that position and automatically rotates.
Will not be modified to the center of.

【0005】また、図5に示すように、支持台4にロー
ラを有しないで、回転軸2に受け台7と支持台4の全重
量がかかる構成や、図6に示すように、受け台8が回転
軸2に直結されて駆動する構成としたときは、受け台
7,8のセンター合わせが容易にはできず、支持台4や
回転軸2の中心から偏心して載置された状態で回転軸2
が起動されたとき、受け台7,8はその位置の状態で回
転される。
Further, as shown in FIG. 5, the support base 4 does not have rollers, and the total weight of the support base 7 and the support base 4 is applied to the rotary shaft 2, and as shown in FIG. When the structure in which 8 is directly connected to the rotary shaft 2 is configured to be driven, the centers of the pedestals 7 and 8 cannot be easily aligned, and the pedestals 4 and 8 are eccentrically mounted from the center of the rotary shaft 2. Rotating shaft 2
When is activated, the pedestals 7 and 8 are rotated in that position.

【0006】[0006]

【発明が解決しようとする課題】上記のように従来の構
成では、受け台5,7,8を支持台4や回転軸2上に載
置させても容易にセンター合わせをすることができず、
かつ、偏心したまま調理をスタートさせたときは、受け
台5,7,8の回転が停止することがあり、このとき
は、電波分布や電熱分布の不均一による部分的加熱が防
止できず、被加熱物6の調理の出来具合が悪くなるとい
う問題点を有していた。
As described above, in the conventional structure, the center cannot be easily centered even if the receiving stands 5, 7, 8 are placed on the supporting stand 4 or the rotary shaft 2. ,
Moreover, when cooking is started while being eccentric, the rotation of the pedestals 5, 7, and 8 may stop, and at this time, partial heating due to uneven radio wave distribution or electric heat distribution cannot be prevented, There has been a problem that the cooked state of the article to be heated 6 becomes poor.

【0007】本発明は上記従来の問題点を解決するもの
で、受け台を容易にセンター合わせして支持台や回転軸
の上に載置でき、かつ、受け台を偏心して載置したまま
で調理をスタートさせても、速やかに偏心が修正されて
受け台の回転が停止せず被加熱物を良好に調理できる加
熱装置を提供することを目的とする。
The present invention solves the above-mentioned conventional problems. The pedestal can be easily centered and placed on a support or a rotary shaft, and the pedestal can be placed eccentrically. An object of the present invention is to provide a heating device capable of satisfactorily cooking an object to be heated without eccentricity being corrected and rotation of a cradle not being stopped even if cooking is started.

【0008】[0008]

【課題を解決するための手段】この目的を達成するため
に本発明の加熱装置は、加熱室の底面の近傍に配設した
回転駆動する支持台に支持された被加熱物を載置する受
け台の下面に、加熱室における受け台の中心位置から加
熱室の壁面までの支持台上に載置可能な最大移動距離以
上の寸法を有し、かつ、外周端に向けて下降させたリン
グ状のテーパ部を形設した構成としたものである。
In order to achieve this object, a heating device of the present invention is a receiver for placing an object to be heated, which is supported on a rotation-driving support table arranged near the bottom surface of a heating chamber. The bottom of the table has a ring shape that has a dimension that is equal to or greater than the maximum movement distance that can be placed on the support table from the center position of the receiving table in the heating chamber to the wall surface of the heating chamber, and that is lowered toward the outer peripheral edge. The taper part is formed.

【0009】[0009]

【作用】この構成において、受け台が支持台の上に偏心
して載置されたとき、受け台に形設したテーパ部によ
り、受け台の重力又は被加熱物と受け台の重力が加わ
り、受け台が偏心位置から中心位置まで移動する方向の
力を受けてセンター合わせされることとなる。
In this structure, when the pedestal is eccentrically placed on the support pedestal, the tapered portion formed on the pedestal adds gravity to the pedestal or to the object to be heated and the pedestal. The table is centered by receiving a force in the direction of movement from the eccentric position to the central position.

【0010】[0010]

【実施例】【Example】

(実施例1)以下本発明の一実施例について、図面を参
照しながら説明する。
(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings.

【0011】本発明の一実施例において、前述の従来例
について説明した構成部分と同じ部分については同一符
号を付し、その説明を省略する。
In one embodiment of the present invention, the same components as those described in the above-mentioned conventional example are designated by the same reference numerals and the description thereof will be omitted.

【0012】図1に示すように、本実施例の特徴とする
ところは、前述従来の構成に、回転軸2によって回転駆
動されるローラ3を有する支持台4の上に載置される受
け台9の下面に加熱室1における受け台9の中心位置か
ら加熱室1の壁面までの支持台4の上に載置可能な最大
移動距離A以上の巾寸法を有し、かつ、壁面に向けて下
降させたリング状のテーパ部9aを形設したことにあ
る。すなわち、Aの寸法は(数1)によって近似的に求
められる。
As shown in FIG. 1, the present embodiment is characterized in that, in the above-mentioned conventional structure, a pedestal placed on a support pedestal 4 having a roller 3 rotatably driven by a rotary shaft 2. The bottom surface of the heating chamber 9 has a width dimension equal to or larger than the maximum moving distance A that can be placed on the supporting table 4 from the center position of the receiving table 9 in the heating chamber 1 to the wall surface of the heating chamber 1, and faces the wall surface. This is because the lowered ring-shaped taper portion 9a was formed. That is, the dimension of A is approximately calculated by (Equation 1).

【0013】[0013]

【数1】 [Equation 1]

【0014】(数1)のB,Cは受け台9の端部から加
熱室1の壁面までの距離を示し、同じく受け台9の端部
から加熱室1の壁面までの距離D,Eとの間には(数
2)に示す関係があり、B,C,D,Eは、
B and C in (Equation 1) indicate the distance from the end of the pedestal 9 to the wall surface of the heating chamber 1, and the distances D and E from the end of the pedestal 9 to the wall surface of the heating chamber 1 as well. There is a relationship shown in (Equation 2), and B, C, D and E are

【0015】[0015]

【数2】 [Equation 2]

【0016】一般的に高周波を用いた加熱装置において
は、約3〜10mmである。したがって、(数1)から
A(テーパ部の巾寸法)は約5mm〜15mmとなる。
Generally, in a heating device using high frequency, it is about 3 to 10 mm. Therefore, from (Equation 1), A (width dimension of the tapered portion) is about 5 mm to 15 mm.

【0017】また、受け台9のテーパ部9aの受け台9
の下面に対する角度(仰角)θは、加熱室1においてA
の寸法分偏心させても、テーパ部9aにローラ3の外周
部が接触する値の範囲で5°〜20°である。なお、受
け台9の下面と、ローラ3との摩擦係数は小さいことが
望ましい。
The pedestal 9 of the tapered portion 9a of the pedestal 9
The angle (elevation angle) θ with respect to the lower surface of the heating chamber 1 is A
Even if it is eccentric by the dimension of, the range of the value in which the outer peripheral portion of the roller 3 contacts the tapered portion 9a is 5 ° to 20 °. It is desirable that the friction coefficient between the lower surface of the pedestal 9 and the roller 3 is small.

【0018】以上のように構成された加熱装置につい
て、以下その動作を説明する。受け台9が支持台4のロ
ーラ3の上に偏心して載置されたとき、受け台9のテー
パ部9aにより、受け台9の重力又は被加熱物6と受け
台9の重力が加わり、偏心位置から中心位置まで受け台
9を移動させる方向に力が働き、受け台9が中心位置へ
修正される。また、受け台9を偏心させた状態で加熱装
置を起動させても、受け台9が数回転する間に中心位置
まで自動的に修正される。
The operation of the heating device configured as described above will be described below. When the pedestal 9 is eccentrically placed on the roller 3 of the support 4, the tapered portion 9a of the pedestal 9 applies the gravity of the pedestal 9 or the gravity of the object 6 to be heated and the pedestal 9 to eccentricity. A force acts in the direction of moving the pedestal 9 from the position to the central position, and the pedestal 9 is corrected to the central position. Further, even if the heating device is started in a state where the pedestal 9 is eccentric, the center position is automatically corrected during several rotations of the pedestal 9.

【0019】以上のように本実施例によれば、受け台9
の下面にリング状のテーパ部9aを形設することによ
り、支持台4のローラ3上に受け台9が偏心して載置さ
れても容易に中心位置へ修正され、また、ローラ3上に
受け台9が偏心した状態で載置され回転駆動されたとき
は、数回の回転の間に受け台9は偏心位置から中心位置
に自動的に修正される。
As described above, according to this embodiment, the pedestal 9
By forming the ring-shaped taper portion 9a on the lower surface of the support base 4, even if the receiving base 9 is eccentrically placed on the roller 3 of the support base 4, it can be easily corrected to the center position and can be received on the roller 3. When the pedestal 9 is placed in an eccentric state and is rotationally driven, the pedestal 9 is automatically corrected from the eccentric position to the central position during several rotations.

【0020】また、テーパ部9aの巾寸法Aを中心位置
から水平方向の一辺以上の壁面に接触する最大移動距離
以上の寸法としたことにより、加熱室1の任意の場所に
受け台9を載置したときも、受け台9のテーパ部9aが
支持台4のローラ3上に載置されて、上述のように回転
駆動により、受け台9は中心位置に設置される。
Further, by setting the width A of the tapered portion 9a to be equal to or larger than the maximum movement distance for contacting the wall surface on one or more sides in the horizontal direction from the center position, the pedestal 9 is placed at any place in the heating chamber 1. Even when it is placed, the taper portion 9a of the pedestal 9 is placed on the roller 3 of the support 4, and the pedestal 9 is placed at the center position by the rotational drive as described above.

【0021】したがって、受け台9の上に載置された被
加熱物6は停止することなく適正な回転が与えられるの
で、被加熱物6を均一に加熱することができ、良好に調
理できる。
Therefore, since the object 6 to be heated placed on the pedestal 9 is appropriately rotated without stopping, the object 6 to be heated can be uniformly heated and can be cooked well.

【0022】(実施例2)以下本発明の第2の実施例に
ついて説明する。
(Embodiment 2) A second embodiment of the present invention will be described below.

【0023】図2に示すように、本実施例は図6で説明
した従来の構成に、回転軸2によって直接駆動される受
け台の下面に回転軸2の外周部に位置した寸法Aおよび
角度θが、前述実施例1の寸法Aおよび角度θと同等の
約5mm〜15mmおよび5°〜20°のリング状のテ
ーパ部10aを形設した構成である。
As shown in FIG. 2, the present embodiment has the conventional structure described in FIG. 6 in which the dimension A and the angle positioned on the outer peripheral portion of the rotary shaft 2 are located on the lower surface of the pedestal directly driven by the rotary shaft 2. θ is a configuration in which a ring-shaped taper portion 10 a having a size of about 5 mm to 15 mm and 5 ° to 20 °, which is the same as the dimension A and the angle θ of the first embodiment, is formed.

【0024】なお、ローラ11を有する支持台12は受
け台10の回転駆動によって回転しながら、受け台10
を支持しつづけるが、回転中にローラ11が回転中心位
置から大きくずれないように加熱室1の底面に形設した
凹部1aに嵌合させた構成としている。
The supporting table 12 having the rollers 11 is rotated by the rotational driving of the receiving table 10, and the receiving table 10 is rotated.
However, the roller 11 is fitted in the concave portion 1a formed on the bottom surface of the heating chamber 1 so that the roller 11 does not largely deviate from the rotation center position during rotation.

【0025】この構成により、前述実施例1と同様に、
受け台10が容易に回転軸2に載置でき、かつ、受け台
10が中心位置に自動的に修正されて、実施例1と同等
の効果が得られる。
With this configuration, as in the first embodiment,
The pedestal 10 can be easily placed on the rotary shaft 2, and the pedestal 10 is automatically corrected to the center position, and the same effect as that of the first embodiment can be obtained.

【0026】(実施例3)以下本発明の第3の実施例に
ついて説明する。
(Third Embodiment) A third embodiment of the present invention will be described below.

【0027】図3に示すように、本実施例は図5で説明
した従来の構成に、回転軸2に嵌合させた支持台4上に
載置される受け台13の下面に前述実施例1の寸法Aお
よび角度θと同等の約5mm〜15mmおよび5°〜2
0°のリング状のテーパ部13aを形設した構成であ
る。
As shown in FIG. 3, the present embodiment has the conventional structure described in FIG. 5, in which the above-mentioned embodiment is provided on the lower surface of the receiving base 13 placed on the supporting base 4 fitted to the rotary shaft 2. Approximately 5 mm to 15 mm and 5 ° to 2 equivalent to the dimension A of 1 and the angle θ
This is a configuration in which a 0 ° ring-shaped taper portion 13a is formed.

【0028】この構成により、前述実施例1と同等の効
果が得られる。
With this configuration, the same effect as that of the first embodiment can be obtained.

【0029】[0029]

【発明の効果】以上の説明からも明らかなように本発明
は、加熱室の底面の近傍に配設した回転駆動する支持台
に支持された被加熱物を載置する受け台の下面に、加熱
室における受け台の中心位置から加熱室の壁面までの支
持台上に載置可能な最大移動距離以上の寸法を有し、か
つ、外周端に向けて下降させたリング状のテーパ部を形
設した構成により、受け台を容易にセンター合わせして
支持台の上に載置でき、かつ、受け台を支持台の上に偏
心して載置したままで調理をスタートさせても速やかに
偏心が修正されて、受け台の回転が停止せず被加熱物を
良好に調理できる優れた加熱装置を実現できるものであ
る。
As is apparent from the above description, according to the present invention, the lower surface of the pedestal on which the object to be heated, which is supported by the rotationally driven support table disposed near the bottom surface of the heating chamber, is placed, A ring-shaped taper that has a dimension that is equal to or greater than the maximum movement distance that can be placed on the support table from the center position of the pedestal in the heating chamber to the wall surface of the heating chamber and that descends toward the outer peripheral edge is formed. Due to the configuration, the pedestal can be easily centered and placed on the support table, and even if cooking is started with the pedestal eccentrically placed on the support table, the eccentricity can be quickly achieved. It is possible to realize an excellent heating device which is modified so that the object to be heated can be properly cooked without stopping the rotation of the pedestal.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明の実施例1の加熱装置の正面断
面略図 (b)は同加熱装置の平面断面図 (c)は同加熱装置の受け台が偏心して載置された状態
を示す要部断面図
1A is a schematic front sectional view of a heating device according to a first embodiment of the present invention, FIG. 1B is a plan sectional view of the heating device, and FIG. 1C is a state in which a pedestal of the heating device is eccentrically placed. Sectional view showing

【図2】本発明の実施例2の加熱装置の要部断面図FIG. 2 is a sectional view of a main part of a heating device according to a second embodiment of the present invention.

【図3】本発明の実施例3の加熱装置の要部断面図FIG. 3 is a sectional view of a main part of a heating device according to a third embodiment of the present invention.

【図4】従来の加熱装置の正面断面略図FIG. 4 is a schematic front sectional view of a conventional heating device.

【図5】従来の他の加熱装置の要部断面図FIG. 5 is a sectional view of a main part of another conventional heating device.

【図6】従来の他の加熱装置の要部断面図FIG. 6 is a sectional view of a main part of another conventional heating device.

【符号の説明】[Explanation of symbols]

1 加熱室 2 回転軸 3 ローラ 9 受け台 9a テーパ部 1 heating chamber 2 rotary shaft 3 roller 9 cradle 9a taper part

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 加熱室と、前記加熱室の底面の近傍に配
設した被加熱物を載置する受け台と、前記受け台を支持
するローラを有する支持台と、前記支持台を回転駆動す
る回転軸を備え、前記受け台の下面に、前記加熱室にお
ける前記受け台の中心位置から前記加熱室の壁面までの
前記支持台上に載置可能な最大移動距離以上の寸法を有
し、かつ、外周端に向けて下降させたリング状のテーパ
部を形設したことを特徴とする加熱装置。
1. A heating chamber, a pedestal for placing an object to be heated arranged near a bottom surface of the heating chamber, a support pedestal having a roller for supporting the pedestal, and a rotational drive of the support pedestal. A rotation axis to be provided, on the lower surface of the pedestal, having a dimension equal to or greater than the maximum movement distance that can be placed on the support table from the center position of the pedestal in the heating chamber to the wall surface of the heating chamber, Further, the heating device is characterized in that a ring-shaped taper portion which is lowered toward the outer peripheral end is formed.
【請求項2】 加熱室と、前記加熱室の底面の近傍に配
設した被加熱物を載置する受け台と、前記受け台を支持
するローラを有する支持台と、前記受け台を回転駆動す
る回転軸を備え、前記受け台の下面に、前記回転軸の外
周部に位置した、前記加熱室における前記受け台の中心
位置から前記加熱室の壁面までの前記支持台上に載置可
能な最大移動距離以上の寸法を有し、かつ、外周端に向
けて下降させたリング状のテーパ部を形設したことを特
徴とする加熱装置。
2. A heating chamber, a pedestal placed near the bottom surface of the heating chamber for placing an object to be heated, a support pedestal having a roller for supporting the pedestal, and the pedestal rotationally driven. Is provided on the lower surface of the pedestal, and can be placed on the support table located on the outer peripheral portion of the rotary shaft from the central position of the pedestal in the heating chamber to the wall surface of the heating chamber. A heating device having a dimension equal to or greater than a maximum movement distance and having a ring-shaped taper portion formed downward toward an outer peripheral end.
【請求項3】 加熱室と、前記加熱室の底面の近傍に配
設した被加熱物を載置する受け台と、前記受け台を支持
する支持台と、前記支持台を回転駆動する回転軸を備
え、前記受け台の下面に、前記加熱室における前記受け
台の中心位置から前記加熱室の壁面までの前記支持台上
に載置可能な最大移動距離以上の寸法を有し、かつ、外
周端に向けて下降させたリング状のテーパ部を形設した
ことを特徴とする加熱装置。
3. A heating chamber, a pedestal for placing an object to be heated arranged near a bottom surface of the heating chamber, a support for supporting the pedestal, and a rotary shaft for rotationally driving the support. The lower surface of the pedestal has a dimension equal to or greater than the maximum movement distance that can be placed on the support table from the center position of the pedestal in the heating chamber to the wall surface of the heating chamber, and has an outer circumference. A heating device characterized in that a ring-shaped taper portion which is lowered toward the end is formed.
JP6117286A 1994-05-31 1994-05-31 Heating device Pending JPH07326473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6117286A JPH07326473A (en) 1994-05-31 1994-05-31 Heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6117286A JPH07326473A (en) 1994-05-31 1994-05-31 Heating device

Publications (1)

Publication Number Publication Date
JPH07326473A true JPH07326473A (en) 1995-12-12

Family

ID=14707990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6117286A Pending JPH07326473A (en) 1994-05-31 1994-05-31 Heating device

Country Status (1)

Country Link
JP (1) JPH07326473A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102422086A (en) * 2009-03-27 2012-04-18 克利夫兰炉灶有限责任公司 Method and system for controlling smoker device integral to an oven
CN107874634A (en) * 2017-10-17 2018-04-06 无锡艾科瑞思产品设计与研究有限公司 A kind of pre- hot spiral-flow electric oven of eccentric rotary

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102422086A (en) * 2009-03-27 2012-04-18 克利夫兰炉灶有限责任公司 Method and system for controlling smoker device integral to an oven
CN102422086B (en) * 2009-03-27 2014-07-09 克利夫兰炉灶有限责任公司 Method and system for controlling smoker device integral to an oven
CN107874634A (en) * 2017-10-17 2018-04-06 无锡艾科瑞思产品设计与研究有限公司 A kind of pre- hot spiral-flow electric oven of eccentric rotary
CN107874634B (en) * 2017-10-17 2020-04-07 福建麦香园食品有限公司 Eccentric rotation preheating rotational flow electric oven

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