JPH07307270A - Projection magnification adjusting device and projection exposure device - Google Patents
Projection magnification adjusting device and projection exposure deviceInfo
- Publication number
- JPH07307270A JPH07307270A JP6099827A JP9982794A JPH07307270A JP H07307270 A JPH07307270 A JP H07307270A JP 6099827 A JP6099827 A JP 6099827A JP 9982794 A JP9982794 A JP 9982794A JP H07307270 A JPH07307270 A JP H07307270A
- Authority
- JP
- Japan
- Prior art keywords
- movement
- lens
- projection
- moving member
- moving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Projection-Type Copiers In General (AREA)
- Variable Magnification In Projection-Type Copying Machines (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は投影倍率調整装置及びそ
れを有する投影露光装置、特には半導体製造用の投影露
光装置の投影倍率調整装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection magnification adjusting apparatus and a projection exposure apparatus having the same, and more particularly to a projection magnification adjusting apparatus for a projection exposure apparatus for semiconductor manufacturing.
【0002】[0002]
【従来の技術】例えば特開昭62−32613号公報に
示されるように、半導体製造用の投影露光装置におい
て、投影光学系と露光されるウエハの間隔を変化させて
焦点位置の調整を行い、投影光学系のレンズ群のうち予
め定められた特定のレンズを光軸方向に必要な移動量だ
け駆動させて投影倍率を調整することは周知である。2. Description of the Related Art As disclosed in, for example, Japanese Patent Laid-Open No. 62-32613, in a projection exposure apparatus for semiconductor manufacturing, the focus position is adjusted by changing the distance between the projection optical system and the exposed wafer. It is well known that a predetermined specific lens of the lens group of the projection optical system is driven in the optical axis direction by a necessary movement amount to adjust the projection magnification.
【0003】ところで、該公報に示されているように、
投影光学系(レンズ)の焦点位置及び投影倍率は温度、
湿度、気圧のそれぞれの環境条件によって変化する。そ
の理由は、各環境条件の変化によって空気の屈折率が変
化し、投影レンズの構成部材であるガラスの相対屈折率
が変化すること、温度によってガラスの光学特性が変化
すること、更に温度によってレンズ鏡筒が熱膨張あるい
は熱収縮し空気間隔が変動するためである。By the way, as shown in the publication,
The focus position and projection magnification of the projection optical system (lens) are temperature,
It changes depending on the environmental conditions such as humidity and atmospheric pressure. The reason is that the refractive index of air changes due to changes in each environmental condition, the relative refractive index of glass that is a constituent member of the projection lens changes, the optical characteristics of glass change with temperature, and the lens changes with temperature. This is because the lens barrel thermally expands or contracts and the air gap changes.
【0004】標準状態の温度をT0[℃]、湿度をR
0[%]、及び気圧をP0[hpa]とし、それらの標準
状態からの変化量をそれぞれ、ΔT[℃]、ΔR
[%]、ΔP[hpa]とすると、投影レンズ光学系の
標準状態からの焦点位置変化量ΔZ(ピント位置補正
量)と倍率変化量ΔM(倍率補正量)はk11〜k23を定
数として次のように求められる。The standard temperature is T 0 [° C.] and the humidity is R
0 [%] and atmospheric pressure are P 0 [hpa], and the amounts of change from the standard state are ΔT [° C.] and ΔR, respectively.
Assuming [%] and ΔP [hpa], the amount of focus position change ΔZ (focus position correction amount) and the amount of magnification change ΔM (magnification correction amount) from the standard state of the projection lens optical system are as follows with k11 to k23 as constants. Is asked.
【0005】 ΔZ=k11ΔT+k12ΔR+k13ΔP ・・・・(1) ΔM=k21ΔT+k22ΔR+k23ΔP ・・・・(2)ΔZ = k11ΔT + k12ΔR + k13ΔP (1) ΔM = k21ΔT + k22ΔR + k23ΔP (2)
【0006】また、投影レンズ内の少なくとも1つの補
正用レンズの位置を光軸方向に変化させると空気間隔が
変化するので、投影露光装置における投影レンズの焦点
位置や投影倍率を調整することができる。例えば補正用
レンズの標準位置からの変位量をΔXとしたとき、焦点
位置の変化量ΔZ、投影倍率の変化量ΔMはk14,k24
を定数として次のように求められる。Further, when the position of at least one correction lens in the projection lens is changed in the optical axis direction, the air gap changes, so that the focus position and projection magnification of the projection lens in the projection exposure apparatus can be adjusted. . For example, when the amount of displacement of the correcting lens from the standard position is ΔX, the amount of change in focal position ΔZ and the amount of change in projection magnification ΔM are k14 and k24.
Is calculated as a constant as follows.
【0007】ΔZ=k14ΔX ・・・(3) ΔM=k24ΔX ・・・(4)ΔZ = k14ΔX (3) ΔM = k24ΔX (4)
【0008】(1)〜(4)式から、標準状態に対する
温度、湿度、気圧の変化量がそれぞれΔT[℃]、ΔR
[%]、ΔP[hpa]のとき、投影レンズの標準状態
からの変位量をΔXとしてやると、焦点位置ズレ量ΔZ
は(1)および(3)式の右辺の和、倍率変化量ΔMは
(2)および(4)式の右辺の和となる。即ち、 ΔZ=k11ΔT+k12ΔR+k13ΔP+k14ΔX ・・・(5) ΔM=k21ΔT+k22ΔR+k23ΔP+k24ΔX ・・・(6) である。倍率変化量ΔMをゼロにするには(6)式にお
いてΔM=0とし、下式(7)によりΔXを求めて、そ
の量だけ補正用レンズを標準位置から変位させればよ
い。From the equations (1) to (4), the change amounts of temperature, humidity and atmospheric pressure with respect to the standard state are ΔT [° C.] and ΔR, respectively.
In the case of [%] and ΔP [hpa], if the displacement amount of the projection lens from the standard state is ΔX, the focal position shift amount ΔZ
Is the sum of the right sides of equations (1) and (3), and the magnification change amount ΔM is the sum of the right sides of equations (2) and (4). That is, ΔZ = k11ΔT + k12ΔR + k13ΔP + k14ΔX (5) ΔM = k21ΔT + k22ΔR + k23ΔP + k24ΔX (6) In order to make the magnification change amount ΔM zero, ΔM = 0 in the equation (6), ΔX is obtained by the following equation (7), and the correction lens is displaced from the standard position by that amount.
【0009】 ΔX=−(k21/k24)ΔT −(k22/k24)ΔR −(k23/k24)ΔP ・・・(7) このとき焦点位置ズレ量ΔZは、(7)式を(6)式に
代入して、 ΔZ= (k11−(k14k21/k24))ΔT +(k12−(k14k22/k24))ΔR +(k13−(k14k23/k24))ΔP ・・・(8) となるから、この量ΔZだけ焦点位置を補正する。ΔX = − (k21 / k24) ΔT− (k22 / k24) ΔR− (k23 / k24) ΔP (7) At this time, the focal position shift amount ΔZ is expressed by the formula (7) and the formula (6). Substituting into ΔZ = (k11− (k14k21 / k24)) ΔT + (k12− (k14k22 / k24)) ΔR + (k13− (k14k23 / k24)) ΔP ・ ・ ・ (8) The focus position is corrected by the amount ΔZ.
【0010】投影露光装置では、投影レンズの周辺の温
度T[℃]、湿度R[%]、気圧P[hpa]を検出
し、それぞれの標準値からの変化量をΔT=T−T0、
ΔR=R−R0、ΔP=P−P0により算出する。更に、
(7)式に従ってΔXを算出し、補正用レンズの変位量
がΔXとなるようにレンズ位置を調整する。これによ
り、投影レンズの倍率変化はゼロに維持される。また、
(8)式に従ってΔZを算出し、焦点系に駆動指令を与
えて投影レンズのベストピントの位置を維持する事によ
り、補正を行っていた。In the projection exposure apparatus, the temperature T [° C.], the humidity R [%] and the atmospheric pressure P [hpa] around the projection lens are detected, and the change amount from each standard value is ΔT = T−T 0 ,
It is calculated by ΔR = R−R 0 and ΔP = P−P 0 . Furthermore,
ΔX is calculated according to the equation (7), and the lens position is adjusted so that the displacement amount of the correction lens becomes ΔX. As a result, the change in magnification of the projection lens is maintained at zero. Also,
The correction is performed by calculating ΔZ according to the equation (8) and giving a drive command to the focus system to maintain the position of the best focus of the projection lens.
【0011】[0011]
【発明が解決しようとしている課題】この様な補正機能
を持つ投影レンズを投影露光装置に組み込んで投影倍率
及び焦点位置の補正を行う場合、補正時の温度、湿度、
気圧の少なくとも1つの標準状態時からの変化量を計測
し、倍率および焦点の補正のために必要なレンズと焦点
系の標準位置からの移動量を算出し、レンズおよび焦点
合わせ系の補正駆動を行う必要がある。When a projection lens having such a correction function is incorporated in a projection exposure apparatus to correct the projection magnification and the focus position, the temperature, humidity, and
Measure the amount of change in atmospheric pressure from at least one standard state, calculate the amount of movement from the standard position of the lens and focus system required for magnification and focus correction, and drive the lens and focusing system for correction. There is a need to do.
【0012】このとき、補正用のレンズの標準位置を高
精度に検出し、レンズを高精度に移動する手段がない
と、上記において算出した補正位置へレンズを正しく駆
動することができないし、また上記標準位置の検出精度
が悪いと、また検出位置が経時的に変化すると倍率およ
び焦点の補正誤差の要因となる。At this time, if there is no means for detecting the standard position of the correction lens with high accuracy and moving the lens with high accuracy, the lens cannot be correctly driven to the correction position calculated above, and If the detection accuracy of the standard position is poor, or if the detection position changes over time, it causes a magnification and focus correction error.
【0013】従来、レンズの標準位置への移動は、レン
ズと一体的に移動する鏡筒を基準面に密着させる機械的
な方法を用いていた。しかしながら、この方法は鏡筒の
端面と基準面のそれぞれの面精度及び平行度が極めて高
くなければ、標準位置への移動を行った際にレンズ及び
鏡筒が光軸に対して傾き、露光精度に悪影響を及ぼして
いた。Conventionally, a lens is moved to a standard position by a mechanical method in which a lens barrel that moves integrally with the lens is brought into close contact with a reference surface. However, in this method, if the surface accuracy and parallelism of the end surface of the lens barrel and the reference surface are not very high, the lens and lens barrel will tilt with respect to the optical axis when the lens is moved to the standard position, and the exposure accuracy will increase. Had a negative effect on.
【0014】更に、鏡筒を密着させる基準面の高さに基
準面取り付け精度などの影響で本来あるべき理想の高さ
と差があると補正の誤差要因となっていた。あるいは、
レンズまたは鏡筒の標準位置を検出するセンサを設け、
センサの検出位置にて標準位置とする方法もあるが、長
期間の使用の間にセンサの検出位置が経時変化し、それ
にともない上記標準位置も変化してしまい、補正誤差を
生じさせてしまう問題があった。Further, if there is a difference between the height of the reference surface with which the lens barrel is in close contact with the ideal height that should be due to the accuracy of the reference surface mounting, etc., it has been a factor of correction error. Alternatively,
Provide a sensor that detects the standard position of the lens or lens barrel,
There is also a method of setting the standard position at the detection position of the sensor, but the detection position of the sensor changes over time during long-term use, and the standard position also changes accordingly, causing a correction error. was there.
【0015】本発明は上記従来技術の問題点に鑑みなさ
れたものであり、その目的は投影倍率調整用レンズを補
正すべき位置に高精度に移動制御可能とし、且つ長期間
にわたり安定した補正を可能とした投影倍率調整装置及
びそれを有する投影露光装置を提供することにある。The present invention has been made in view of the above-mentioned problems of the prior art, and an object thereof is to enable highly accurate movement control of a projection magnification adjusting lens to a position to be corrected and to perform stable correction for a long period of time. It is an object of the present invention to provide a projection magnification adjusting device and a projection exposure apparatus having the same.
【0016】[0016]
【課題を解決するための手段】上記の目的を達成するた
め本発明は、投影光学系の一部をその光軸方向に沿って
移動することにより前記投影光学系の投影倍率を調整す
る投影倍率調整装置において、前記投影光学系の一部と
共に移動する移動部材(レンズ移動体またはレンズ駆動
体)と、前記移動部材が移動始点位置にあることを非接
触検出する始点検出器(下側センサ)と、前記移動部材
が移動終点位置にあることを非接触検出する終点検出器
(上側センサ)と、前記移動始点位置と前記移動終点位
置間の基準距離を記憶する記憶手段(記憶装置)と、前
記投影光学系の投影倍率を調整する際に前記移動始点位
置からの前記移動部材の移動量が指令値に等しくなるよ
うに前記移動部材の移動を制御する制御手段(演算器)
と、前記移動始点位置と前記移動終点位置の一方から他
方まで前記移動部材を移動させた際の移動量と前記基準
距離を比較することにより前記投影光学系の倍率調整量
と前記移動部材の移動始点位置からの移動量との関係が
所定範囲内か否かを判定する判定手段(演算器)を有す
ることを特徴としている。To achieve the above object, the present invention provides a projection magnification for adjusting the projection magnification of the projection optical system by moving a part of the projection optical system along the optical axis direction thereof. In the adjustment device, a moving member (lens moving body or lens driving body) that moves together with a part of the projection optical system, and a start point detector (lower sensor) that non-contact detects that the moving member is at the movement start point position. An end point detector (upper sensor) for non-contact detecting that the moving member is at the movement end point position, and a storage unit (storage device) for storing a reference distance between the movement start point position and the movement end point position. Control means (arithmetic unit) for controlling the movement of the moving member so that the movement amount of the moving member from the movement starting point position becomes equal to a command value when adjusting the projection magnification of the projection optical system.
And a movement amount when the movement member is moved from one of the movement start point position and the movement end point position to the other and the reference distance, thereby comparing the magnification adjustment amount of the projection optical system and the movement of the movement member. It is characterized in that it has a judging means (calculator) for judging whether or not the relationship with the movement amount from the starting point position is within a predetermined range.
【0017】また、上記の目的を達成するため本発明
は、原板上に予め形成されたパターンを投影光学系を介
して基板に投影露光する投影露光装置において、前記投
影光学系の投影倍率を調整する際に前記投影光学系の一
部と共に移動する移動部材(レンズ移動体またはレンズ
駆動体)と、前記移動部材が移動始点位置にあることを
非接触検出する始点検出器(下側センサ)と、前記移動
部材が移動終点位置にあることを非接触検出する終点検
出器(上側センサ)と、前記移動始点位置と前記移動終
点位置間の基準距離を記憶する記憶手段(記憶装置)
と、前記移動始点位置からの前記移動部材の移動量が指
令値に等しくなるように前記移動部材の移動を制御する
制御手段(演算器)と、前記移動始点位置と前記移動終
点位置の一方から他方まで前記移動部材を移動させた際
の移動量と前記基準距離を比較することにより前記投影
光学系の倍率調整量と前記移動部材の移動始点位置から
の移動量との関係が所定範囲内か否かを判定する判定手
段(演算器)を有することを特徴としている。In order to achieve the above-mentioned object, the present invention is a projection exposure apparatus for projecting a pattern previously formed on an original plate onto a substrate through a projection optical system, and adjusting the projection magnification of the projection optical system. A moving member (a lens moving body or a lens driving body) that moves together with a part of the projection optical system when moving, and a start-point detector (lower sensor) that non-contact detects that the moving member is at the movement start-point position. An end point detector (upper sensor) that non-contact detects that the moving member is at the movement end point position, and a storage unit (storage device) that stores a reference distance between the movement start point position and the movement end point position.
A control means (calculator) for controlling the movement of the moving member so that the movement amount of the moving member from the movement starting point position becomes equal to a command value; and one of the movement starting point position and the movement ending point position. Whether the relationship between the amount of magnification adjustment of the projection optical system and the amount of movement of the moving member from the movement start point position is within a predetermined range by comparing the amount of movement when the moving member is moved to the other side with the reference distance. It is characterized by having a judging means (arithmetic unit) for judging whether or not it is.
【0018】なお、上記の各発明において、前記制御手
段と前記判定手段は演算器によって兼用されていること
が望ましい。また、前記演算器はパルスモータを制御
し、前記移動部材の移動量を前記パルスモータに加えた
パルス数に基づいて算出するものであったり、前記演算
器はエンコーダ付きDCモータを制御し、前記移動部材
の移動量を前記エンコーダの出力に基づいて算出するも
のであったり、前記演算器は前記移動部材の移動量を前
記移動部材に対して設けられた移動計測センサの出力に
基づいて算出するものであっても良い。前記移動部材は
前記投影光学系の一部と一体的に移動するレンズ移動体
と前記レンズ移動体を移動させるためのレンズ駆動体の
一方であると好ましい。In each of the above inventions, it is desirable that the control means and the determination means be used by an arithmetic unit. Further, the arithmetic unit controls a pulse motor and calculates the movement amount of the moving member based on the number of pulses added to the pulse motor, or the arithmetic unit controls a DC motor with an encoder. The moving amount of the moving member is calculated based on the output of the encoder, or the computing unit calculates the moving amount of the moving member based on the output of a movement measurement sensor provided for the moving member. It may be one. The moving member is preferably one of a lens moving body that moves integrally with a part of the projection optical system and a lens driving body that moves the lens moving body.
【0019】また、上記の各発明において、前記投影光
学系の周囲の気圧、温度、湿度の内少なくとも1つを測
定する環境測定器を更に有し、前記指令値を前記環境測
定器の出力に基づいて求めるようにしても良い。Further, in each of the above inventions, an environment measuring device for measuring at least one of atmospheric pressure, temperature and humidity around the projection optical system is further provided, and the command value is output to the environment measuring device. You may make it based on this.
【0020】[0020]
【実施例】以下に図示の実施例に従って、本発明を詳細
に説明する。図1は本発明の投影倍率調整装置の一実施
例を示すもので、この図においてAは平面図であり、B
はAのC−C線に沿った断面図である。なお、この実施
例の主たる構造は、本件出願人が先に特願平5−374
21号で提案したものと同様なものである。The present invention will be described in detail below with reference to the embodiments shown in the drawings. FIG. 1 shows an embodiment of a projection magnification adjusting apparatus of the present invention, in which A is a plan view and B is a plan view.
FIG. 4 is a sectional view taken along the line CC of FIG. The main structure of this embodiment is described in Japanese Patent Application No. 5-374 filed by the applicant.
It is similar to the one proposed in No. 21.
【0021】この実施例において、レンズ移動装置はレ
ンズ1を保持する2重リング状のレンズ移動体2とこれ
を支持する環状のレンズ固定体3を有し、レンズ固定体
3はその外周部分に立設された筒状固定ガイド4と、レ
ンズ固定体3の外周縁に一体的に設けられたアクチュエ
ータ支持板5を有する。In this embodiment, the lens moving device has a double ring-shaped lens moving body 2 for holding the lens 1 and an annular lens fixing body 3 for supporting the lens moving body. It has an upright cylindrical fixed guide 4 and an actuator support plate 5 integrally provided on the outer peripheral edge of the lens fixing body 3.
【0022】図1Bに示すように、レンズ移動体2とレ
ンズ固定体3の間には、図1AのC−C線で示す方向
(以下、X方向という)に楔形の断面(一部点線で示
す)を有し、これと直角な方向(以下、Y方向という)
には厚さの変化しないリング状のレンズ駆動体6が配置
されている。レンズ駆動体6のX方向の一端には径方向
外方へ突出する連結部材7が一体的に設けられ、連結部
材7はアクチュエータ支持板5に支持されたアクチュエ
ータ8の連結棒9に一体的に固着されている。駆動手段
となるアクチュエータ8は、例えばパルスモータ、エン
コーダ付きDCモータやリニアモータ等である。また、
レンズ駆動体6のX方向の他端には径方向外方へ突出す
る案内部材10が一体的に設けられ、同様にレンズ移動
体2はレンズ駆動体6の案内部材10に重なり合う位置
に回止めガイド11を有する。As shown in FIG. 1B, between the lens moving body 2 and the lens fixed body 3, a wedge-shaped cross section (partially dotted line) is formed in the direction indicated by the line CC in FIG. 1A (hereinafter referred to as the X direction). Shown), and a direction perpendicular to this (hereinafter referred to as Y direction)
A lens drive body 6 having a ring shape whose thickness does not change is arranged at. A connecting member 7 projecting outward in the radial direction is integrally provided at one end in the X direction of the lens driving body 6, and the connecting member 7 is integrally formed with a connecting rod 9 of an actuator 8 supported by an actuator support plate 5. It is fixed. The actuator 8 serving as a driving unit is, for example, a pulse motor, a DC motor with an encoder, a linear motor, or the like. Also,
A guide member 10 projecting outward in the radial direction is integrally provided at the other end of the lens driving body 6 in the X direction, and similarly, the lens moving body 2 is stopped at a position overlapping the guide member 10 of the lens driving body 6. It has a guide 11.
【0023】レンズ駆動体6のX方向の両端部には図示
下端をレンズ固定体3に固着された一対の案内ブロック
12a、12b、12c、12dがそれぞれ配置され、
一方の側に設けられた案内ブロック12c、12dはレ
ンズ駆動体6の連結部材7の両側面に対向し、他方の側
に設けられた案内ブロック12a、12bはレンズ駆動
体6の案内部材10とレンズ移動体2の回り止めガイド
11のそれぞれの両側面に対向して配置されている。A pair of guide blocks 12a, 12b, 12c, 12d, whose lower ends in the figure are fixed to the lens fixing body 3, are arranged at both ends of the lens driving body 6 in the X direction,
The guide blocks 12c and 12d provided on one side face both side surfaces of the connecting member 7 of the lens driving body 6, and the guide blocks 12a and 12b provided on the other side are the guide member 10 of the lens driving body 6 and The anti-rotation guides 11 of the lens moving body 2 are arranged so as to face each side surface.
【0024】レンズ固定体3の図示上面およびレンズ移
動体2の図示下面には、それぞれ環状の第1及び第2の
静圧軸受手段である静圧軸受パッド13a、13bが設
けられ、静圧軸受パッド13a、13bは両者の間にレ
ンズ駆動体6を非接触で往復自在に支持する。レンズ駆
動体6の上面は X方向へ傾斜しており、レンズ移動体
2の下面もこれに沿って同じ傾斜角度で傾斜している。
従って、レンズ駆動体6がアクチュエータ8によって
X方向へ移動されると、レンズ移動体2はレンズ固定体
3と平行状態を保ちつつ、X方向とY方向に垂直な方向
(以下、Z方向という)へ移動する。ここで、レンズ駆
動体6のX方向の移動量ΔXと、レンズ駆動体6とレン
ズ移動体2のそれぞれの傾斜角度Qと、レンズ移動体2
のZ方向の移動量ΔZの間には、 ΔZ=ΔX・tan(Q) ・・・(9) の関係が成立する。Hydrostatic bearing pads 13a and 13b, which are annular first and second hydrostatic bearing means, are provided on the upper surface of the lens fixing body 3 and the lower surface of the lens moving body 2, respectively, as shown in FIG. The pads 13a and 13b support the lens driving body 6 between them in a reciprocating manner without contact. The upper surface of the lens driving body 6 is inclined in the X direction, and the lower surface of the lens moving body 2 is also inclined at the same inclination angle.
Therefore, the lens driver 6 is driven by the actuator 8.
When moved in the X direction, the lens moving body 2 moves in a direction perpendicular to the X direction and the Y direction (hereinafter referred to as the Z direction) while maintaining the parallel state with the lens fixed body 3. Here, the amount of movement ΔX of the lens driving body 6 in the X direction, the respective tilt angles Q of the lens driving body 6 and the lens moving body 2, and the lens moving body 2
Between the movement amounts ΔZ in the Z direction, ΔZ = ΔX · tan (Q) (9).
【0025】なお、筒状固定ガイド4はその内周面にレ
ンズ移動体2の内側の外周面に対向する筒状の第3の静
圧軸受面である静圧軸受パッド13cを有し、これによ
ってレンズ移動体2を非接触でレンズ1の光軸方向に往
復自在に支持し、また案内ブロック12a〜12dはそ
れぞれレンズ駆動体6の連結部材7に対向する表面及び
レンズ駆動体6の案内部材10とレンズ移動体2の回止
ガイド11に対向する表面に静圧軸受パッド13d〜1
3gを有し、これらによって連結部材7、案内部材1
0、及び回止ガイド11をそれぞれ非接触で支持する。The cylindrical fixed guide 4 has on its inner peripheral surface a static pressure bearing pad 13c which is a cylindrical third static pressure bearing surface facing the inner peripheral surface of the lens moving body 2. Supports the lens moving body 2 in a reciprocating manner in the optical axis direction of the lens 1 in a non-contact manner, and the guide blocks 12a to 12d respectively face the connecting member 7 of the lens driving body 6 and the guiding member of the lens driving body 6. 10 and hydrostatic bearing pads 13d-1 on the surface of the lens moving body 2 facing the rotation-stop guide 11.
3g, by means of which the connecting member 7, the guide member 1
0 and the rotation stop guide 11 are supported in a non-contact manner.
【0026】各静圧軸受パッド13a〜13gは公知の
多孔質静圧軸受パッドであり、それぞれ、その背面に空
所14a〜14cを有し、図示しない加圧空気供給源か
ら内部配管15a〜15cを経て供給される加圧空気を
細孔によって分散させて対向面に噴出し、その静圧によ
って形成される流体潤滑膜の作用により対向面を非接触
で支持する。多孔質静圧軸受パッドに替えて公知の自成
絞り型あるいは表面絞り型の静圧軸受を用いてもよい。Each of the hydrostatic bearing pads 13a to 13g is a known porous hydrostatic bearing pad, and has a cavity 14a to 14c on the back surface thereof, and an internal pipe 15a to 15c from a pressurized air supply source (not shown). The pressurized air supplied through the air is dispersed by the pores and jetted to the opposing surface, and the fluid lubricating film formed by the static pressure supports the opposing surface in a non-contact manner. Instead of the porous static pressure bearing pad, a known self-made throttle type or surface throttle type static pressure bearing may be used.
【0027】また、レンズ固定体3には上側センサ16
及び下側センサ17が固着されており、アクチュエータ
8によりレンズ駆動体6が図示X方向正方向(図1右方
向)に駆動され、レンズ駆動体6の連結部材7の先端が
下側センサ17にさしかかる位置まで移動したことと、
同様にレンズ駆動体6が図示X方向負方向(図1左方
向)に駆動されレンズ駆動体6の案内部材10の先端が
上側センサ16にさしかかる位置まで移動したことを検
知することができる。なお、レンズ駆動体6がアクチュ
エータ8によりX方向正方向に駆動され、レンズ駆動体
6の連結部材7が下側センサ17にさしかかって検知さ
れた時のレンズ1の位置(高さ)を、レンズ1の基準位
置(高さ)としてと定める事とする。The upper sensor 16 is attached to the lens fixing body 3.
Further, the lower sensor 17 is fixed, the lens driving body 6 is driven by the actuator 8 in the positive direction of the X direction in the drawing (right direction in FIG. 1), and the tip of the connecting member 7 of the lens driving body 6 becomes the lower sensor 17. Having moved to the position where it will start,
Similarly, it is possible to detect that the lens driving body 6 is driven in the negative direction in the X direction in the drawing (left direction in FIG. 1) and the tip of the guide member 10 of the lens driving body 6 moves to a position where it reaches the upper sensor 16. The position (height) of the lens 1 when the lens driving body 6 is driven in the positive X direction by the actuator 8 and the connecting member 7 of the lens driving body 6 approaches the lower sensor 17 and is detected It shall be determined as the reference position (height) of 1.
【0028】上記基準位置から図示Z方向正方向(図1
Bの上方向)にレンズ1を更にΔZだけ移動しようとす
ると、上記(1)式よりΔX=ΔZ/tan(Q)だけ
アクチュエータ8にてレンズ駆動体6を図示X方向負方
向に駆動すればよい。From the above reference position, the positive direction in the Z direction in the drawing (see FIG. 1).
If the lens 1 is to be further moved by ΔZ in the upward direction of B, if the actuator 8 drives the lens driving body 6 in the negative direction in the X direction by ΔX = ΔZ / tan (Q) according to the equation (1). Good.
【0029】上記駆動量の制御はアクチュエータ8の駆
動量がΔXになるように制御してもよいし、レンズ駆動
体6の移動量がΔXになるように制御しても、あるいは
レンズ1またはレンズ移動体2の移動量がΔZになるよ
う制御してもよい。ここで、アクチュエータ8がパルス
モータの場合には、パルスモータに加えられるパルスの
数によって上記移動量を検出して制御したり、エンコー
ダ付きモータの場合には、エンコーダからの出力に応じ
て上記移動量を検出して制御することが可能である。ま
た、別途変位センサを設ける場合には、レンズ1または
レンズ移動体2の光軸方向の移動量を変位センサで直接
的に計測(検出)し、その計測(検出)出力に基づいて
アクチュエータ8を制御することも可能である。The control of the drive amount may be controlled so that the drive amount of the actuator 8 becomes ΔX, the movement amount of the lens driving body 6 becomes ΔX, or the lens 1 or the lens. The moving amount of the moving body 2 may be controlled to be ΔZ. Here, when the actuator 8 is a pulse motor, the amount of movement is detected and controlled by the number of pulses applied to the pulse motor, and when the actuator 8 is a motor with an encoder, the movement is performed according to the output from the encoder. It is possible to detect and control the quantity. When a separate displacement sensor is provided, the displacement sensor directly measures (detects) the amount of movement of the lens 1 or the lens moving body 2 in the optical axis direction, and the actuator 8 is operated based on the measurement (detection) output. It is also possible to control.
【0030】また、レンズ1の基準位置としては、レン
ズ駆動体6がアクチュエータ8にX方向負方向に駆動さ
れ、レンズ駆動体6の案内部材10が上側センサ16に
検知された時のレンズ1の位置(高さ)を用いてもよ
い。As the reference position of the lens 1, the lens driving body 6 is driven by the actuator 8 in the negative direction of the X direction, and the guide member 10 of the lens driving body 6 is detected by the upper sensor 16. The position (height) may be used.
【0031】ここで、ΔZを10μm、Qを2度とすれ
ば、ΔXは略286.36μmとなり、約1/28.6
4に駆動量が縮小される。このため、レンズ1のZ方向
の移動精度を±0.1μmに制御したい場合、レンズ駆
動体6の駆動精度は±2.836μmでよい為、レンズ
1あるいはレンズ移動体2を直接Z方向に駆動するより
制御が容易である。また、下側センサ17または上側セ
ンサ16でレンズ駆動体6の位置が±1.0μmの精度
で検出できれば、レンズ1の基準位置が±1/28.3
6μmの精度で検出できることに相当する。If ΔZ is 10 μm and Q is 2 degrees, ΔX is about 286.36 μm, which is about 1 / 28.6.
The driving amount is reduced to 4. For this reason, when it is desired to control the movement accuracy of the lens 1 in the Z direction to ± 0.1 μm, the drive accuracy of the lens driving body 6 may be ± 2.836 μm, and thus the lens 1 or the lens moving body 2 is directly driven in the Z direction. It is easier to control than If the lower sensor 17 or the upper sensor 16 can detect the position of the lens driver 6 with an accuracy of ± 1.0 μm, the reference position of the lens 1 is ± 1 / 28.3.
This is equivalent to being able to detect with an accuracy of 6 μm.
【0032】このようにレンズ移動手段は上側センサ1
6または下側センサ17にて検出したレンズ1の位置を
移動基準として、レンズ1の位置を高精度に移動制御す
ることが可能である。In this way, the lens moving means is the upper sensor 1
6 or the position of the lens 1 detected by the lower sensor 17 can be used as a movement reference to control the movement of the position of the lens 1 with high accuracy.
【0033】図2は上記レンズ移動手段を投影露光装置
に組み込んで倍率および焦点の補正を行う例を示すもの
である。同図において、18は転写すべきパターンが描
かれているマスク、19はマスク1を保持するマスクス
テージ、20a〜20dはマスク18のパターンを投影
する投影光学系(以下投影レンズという)を構成する各
レンズである。本実施例においては、レンズ20bが上
記したレンズ移動手段を持つ補正用のレンズである。ま
た、21は図1における静圧軸受けパッド13a〜13
gに静圧を与える静圧配管路、22は静圧エア供給源で
ある。23は投影レンズ20(a〜d)を支持するレン
ズ用定盤で、装置全体の基礎となる定盤24に支持され
ている。FIG. 2 shows an example in which the lens moving means is incorporated in a projection exposure apparatus to correct magnification and focus. In the figure, 18 is a mask on which a pattern to be transferred is drawn, 19 is a mask stage that holds the mask 1, and 20a to 20d are projection optical systems (hereinafter referred to as projection lenses) that project the pattern of the mask 18. Each lens. In this embodiment, the lens 20b is a correction lens having the above-mentioned lens moving means. Further, 21 is the hydrostatic bearing pads 13a to 13 in FIG.
Numeral 22 is a static pressure air supply source for applying a static pressure to g. Reference numeral 23 is a lens surface plate that supports the projection lenses 20 (a to d), and is supported by a surface plate 24 that is the basis of the entire apparatus.
【0034】25は投影レンズ20(a〜d)を通して
マスク18のパターンが投影転写されるウエハであり、
26a,bからなる焦点位置検出系により焦点合わせが
成される。このうち、26aは投影レンズ20の下端に
固定され、投影レンズ20のピント位置とウエハ25と
の間隔を測定するための計測部であり、26bはウエハ
25の高さを調節する駆動部でる。焦点系駆動部26b
は、さらに水平面内で平行移動や回転等の移動が可能な
ウエハステージ27に支えられており、ウエハステージ
27は定盤24に支えられている。Reference numeral 25 denotes a wafer onto which the pattern of the mask 18 is projected and transferred through the projection lens 20 (a to d).
Focusing is performed by a focus position detection system including 26a and 26b. Of these, 26a is a measuring unit fixed to the lower end of the projection lens 20 and for measuring the distance between the focus position of the projection lens 20 and the wafer 25, and 26b is a driving unit for adjusting the height of the wafer 25. Focus system drive unit 26b
Are further supported by a wafer stage 27 that can be moved in parallel and rotated in a horizontal plane, and the wafer stage 27 is supported by a surface plate 24.
【0035】28は投影レンズ20の周辺の温度、湿度
及び気圧の少なくとも1つを検出する環境状態検出器、
29は本実施例の装置を全体的にコントロールするため
の演算器(コントローラ)で、その内部には記憶装置3
0を有する。31はマスク18のパターンをウエハ25
に焼き付けるための露光光を発する照明系、32はマス
ク18とウエハ25のX,Y方向の相対ズレ量を検出す
るアライメントスコープである。33は演算器29に外
部からの情報を入力する記憶装置である。Reference numeral 28 denotes an environmental condition detector for detecting at least one of temperature, humidity and atmospheric pressure around the projection lens 20,
Reference numeral 29 is an arithmetic unit (controller) for controlling the apparatus of this embodiment as a whole, and the storage unit 3 is provided therein.
Has 0. 31 is the pattern of the mask 18 on the wafer 25
An illumination system that emits exposure light for printing on, and an alignment scope 32 that detects the amount of relative deviation between the mask 18 and the wafer 25 in the X and Y directions. Reference numeral 33 is a storage device for inputting information from the outside to the computing unit 29.
【0036】上記の構成において、一般的なアライメン
ト露光動作について説明する。始めに、ウエハ25を図
示しないウエハ搬送系によってウエハステージ27上に
載置し、さらにこのウエハステージ27を移動して投影
レンズ20(a〜d)直下に位置させる。ここで、焦点
系計測部26aにて投影レンズ20とウエハ25とのZ
方向における間隔を検出する。この間隔値を所定の目標
値と比較し、ウエハ25との間隔が目標値と一致するよ
うに焦点系駆動部26bを駆動して焦点合わせ動作を完
了する。A general alignment exposure operation in the above configuration will be described. First, the wafer 25 is placed on the wafer stage 27 by a wafer transfer system (not shown), and the wafer stage 27 is moved to be positioned immediately below the projection lens 20 (a to d). Here, in the focus system measurement unit 26a, the Z between the projection lens 20 and the wafer 25 is
Detect the spacing in the direction. This interval value is compared with a predetermined target value, and the focus system drive unit 26b is driven so that the interval with the wafer 25 matches the target value, and the focusing operation is completed.
【0037】次に、アライメントスコープ32を通して
マスク18上の位置合わせマークとウエハ25上の位置
合わせマークとの相対ズレ量を検出する。この相対ズレ
量がゼロとなるようにウエハステージ27とマスクステ
ージ19の少なくとも一方を微動し、ウエハ25のX,
Y方向の位置合わせ動作を完了する。その後、照明系3
1内のシャッタを開き露光動作を実行する。Next, the amount of relative deviation between the alignment mark on the mask 18 and the alignment mark on the wafer 25 is detected through the alignment scope 32. At least one of the wafer stage 27 and the mask stage 19 is finely moved so that the relative displacement amount becomes zero, and the X,
The alignment operation in the Y direction is completed. After that, lighting system 3
The shutter in 1 is opened and the exposure operation is executed.
【0038】次に、ピント位置補正および倍率補正につ
いて説明する。上記従来技術に記したように、温度、湿
度、および気圧のそれぞれの環境変化による投影レンズ
20a〜dのピント位置および投影倍率の変化は、投影
レンズ20の各レンズ群のうちの少なくとも1つのレン
ズ(またはガラス部材)の位置を光軸方向に変化させる
事によって補正することができる。Next, the focus position correction and the magnification correction will be described. As described in the above-mentioned prior art, changes in the focus positions and projection magnifications of the projection lenses 20a to 20d due to environmental changes of temperature, humidity, and atmospheric pressure are caused by at least one lens in each lens group of the projection lens 20. This can be corrected by changing the position of (or the glass member) in the optical axis direction.
【0039】図2の実施例では、レンズ20b(図1の
レンズ1)が図1に示すレンズ移動体2に保持されてお
り、レンズ駆動体6のX方向の駆動により、光軸方向の
位置調整が可能である。この位置調整機構により、レン
ズ1の位置を光軸方向に変化させると、各レンズ間の空
気間隔が変化するので、図2の投影露光装置における投
影レンズ20(a〜d)のピント位置や倍率を調整する
ことができる。In the embodiment shown in FIG. 2, the lens 20b (lens 1 in FIG. 1) is held by the lens moving body 2 shown in FIG. 1, and the lens driving body 6 is driven in the X direction so as to be positioned in the optical axis direction. It can be adjusted. When the position of the lens 1 is changed in the optical axis direction by this position adjusting mechanism, the air gap between the lenses changes, so that the focus position and the magnification of the projection lens 20 (a to d) in the projection exposure apparatus of FIG. Can be adjusted.
【0040】図2の投影露光装置において、環境状態検
出器28は投影レンズ20の周辺の温度T[℃]、湿度
R[%]、気圧P[hpa]の少なくとも1つ、例えば
気圧を検出し、そのデータを演算器29に転送する。演
算器29はこの転送データよりそれぞれ標準値からの変
化量を、 ΔT=T−T0 , ΔR=R−R0 , ΔP=P−P
0 (T0 ,R0 ,P0はそれぞれ温度、湿度、気圧の標
準値)により算出する。さらに、演算器29は上記した
(8)式に従って倍率変化量を補正するために必要なレ
ンズ1の標準状態からの変位量ΔXを算出し、投影レン
ズ20を構成するレンズ20bを光軸方向に移動すべく
アクチュエータ8に駆動指令を与える。すると、アクチ
ュエータ8の作用によりレンズ20bはその変位量がΔ
Xとなるように駆動されその位置を調整する。これによ
って、投影レンズ20(a〜d)の倍率変化はゼロに維
持される。なお、この時の変位量の検出はアクチュエー
タ8がパルスモータの時は演算器29からパルスモータ
に加えられるパルスの数に基づいて算出され、アクチュ
エータ8がエンコーダ付きモータの時はエンコーダの出
力に基づいて演算器29が算出する。また、レンズ1ま
たはレンズ移動体2の光軸方向の移動量を計測(検出)
する変位センサが別途設けられている時は、変位センサ
でレンズ1またはレンズ移動体2の光軸方向の移動量を
直接的に計測(検出)し、その計測(検出)出力に基づ
いてアクチュエータ8を制御する。In the projection exposure apparatus of FIG. 2, the environmental condition detector 28 detects at least one of the temperature T [° C.], the humidity R [%] and the atmospheric pressure P [hpa] around the projection lens 20, for example, the atmospheric pressure. , And transfers the data to the arithmetic unit 29. Based on this transfer data, the computing unit 29 calculates the amount of change from the standard value as ΔT = T−T 0 , ΔR = R−R 0 , ΔP = P−P.
0 (T 0 , R 0 , and P 0 are standard values of temperature, humidity, and atmospheric pressure, respectively). Further, the computing unit 29 calculates the amount of displacement ΔX from the standard state of the lens 1 necessary for correcting the amount of change in magnification according to the above equation (8), and moves the lens 20b constituting the projection lens 20 in the optical axis direction. A drive command is given to the actuator 8 to move. Then, due to the action of the actuator 8, the displacement amount of the lens 20b is Δ.
It is driven so as to be X and its position is adjusted. As a result, the change in magnification of the projection lens 20 (a to d) is maintained at zero. The displacement amount at this time is detected based on the number of pulses applied from the calculator 29 to the pulse motor when the actuator 8 is a pulse motor, and based on the output of the encoder when the actuator 8 is a motor with an encoder. It is calculated by the computing unit 29. In addition, the amount of movement of the lens 1 or the lens moving body 2 in the optical axis direction is measured (detected).
When a separate displacement sensor is provided, the displacement sensor directly measures (detects) the amount of movement of the lens 1 or the lens moving body 2 in the optical axis direction, and the actuator 8 is based on the measured (detected) output. To control.
【0041】また、演算器29は上記の(9)式に従っ
てピント位置ズレ量ΔZを算出し、焦点系26a,bに
駆動指令を与える。すると、焦点系26a,bはウエハ
25の位置をΔZだけ補正駆動し、投影レンズ20(a
〜d)のベストピントの位置にウエハ25を維持する。Further, the calculator 29 calculates the focus position shift amount ΔZ according to the above equation (9) and gives a drive command to the focus systems 26a, 26b. Then, the focus systems 26a and 26b correctively drive the position of the wafer 25 by ΔZ, and the projection lens 20 (a
The wafer 25 is maintained at the best focus position in steps (d) to (d).
【0042】ところで、この実施例では、上記倍率補正
のためのレンズ20a(図1のレンズ1)の標準位置
を、図1におけるレンズ駆動体6がアクチュエータ8に
よりX方向正方向に駆動され、レンズ駆動体6の連結部
材7が下側センサ17にさしかかったことが検知された
時のレンズ1の位置と定め、この標準位置からのレンズ
1の移動量がΔXとなるように駆動制御を行う。さら
に、上記標準位置からレンズ駆動体6がアクチュエータ
8によりX方向負方向に駆動され、レンズ駆動体6の案
内部材10が上側センサ16にさしかかったことが検知
された時までのレンズ1の移動量ΔXS0、またはアクチ
ュエータ8の駆動量ΔXS0' を演算器29の記憶装置3
0に記憶しておく。By the way, in this embodiment, the lens driver 6 in FIG. 1 is driven in the positive direction of the X direction by the actuator 8 at the standard position of the lens 20a (lens 1 in FIG. 1) for correcting the magnification. The position of the lens 1 when it is detected that the connecting member 7 of the driving body 6 approaches the lower sensor 17 is determined, and drive control is performed so that the movement amount of the lens 1 from this standard position is ΔX. Further, the amount of movement of the lens 1 up to the time when it is detected that the lens driving body 6 is driven in the negative direction of the X direction by the actuator 8 from the standard position and the guide member 10 of the lens driving body 6 is approaching the upper sensor 16. ΔX S0 or the drive amount ΔX S0 'of the actuator 8 is stored in the storage device 3 of the computing unit 29.
Store it in 0.
【0043】レンズ1の高さが標準位置から移動量ΔX
の状態で上記ピント位置補正を行った後に上記アライメ
ント露光動作を行い、マスク18のパターンをウエハ2
5に転写する。このウエハを現像し、転写されたパター
ン像を検査し、転写倍率を測定する。ここで測定した転
写倍率値が、投影倍率の理想値と一致しない場合、上記
標準位置の高さが本来あるべき標準位置の理想値と一致
していないと予想される。The height of the lens 1 is moved from the standard position by ΔX.
In this state, after performing the focus position correction, the alignment exposure operation is performed to change the pattern of the mask 18 to the wafer 2
Transfer to 5. This wafer is developed, the transferred pattern image is inspected, and the transfer magnification is measured. If the transfer magnification value measured here does not match the ideal value of the projection magnification, it is expected that the height of the standard position does not match the ideal value of the standard position.
【0044】ここで、アライメント露光動作時の温度、
湿度および気圧の少なくとも1つを環境状態検出器28
で計測し、標準状態からの変化量をΔT1 、ΔR1 、Δ
P1とし、パターン像検査により得られた転写倍率値の
理想値との差をΔM1 とすれば、上記標準位置の理想値
とのズレ量ΔX1 は上記した(6)式のΔM,ΔT,Δ
R,ΔPにそれぞれΔM1 、ΔT1 、ΔR1 、ΔP1 を
代入し、ΔXを解くことによって得ることができる。従
って、 ΔX1 =(ΔM1 −k21ΔT1 −k22ΔR1 −k23ΔP
1 )/k24 と求められる。このズレ量を入力装置33より演算器2
9に入力すると共に記憶装置30にて記憶し、以後、倍
率補正動作を行う際には上記ズレ量ΔX1 分を上乗せし
て、レンズ1の補正駆動を行う事により、より高精度な
倍率補正を行うことが可能となる。Here, the temperature during the alignment exposure operation,
At least one of humidity and atmospheric pressure is used for the environmental condition detector 28.
Measured by, and the amount of change from the standard state is ΔT1, ΔR1, Δ
If P1 and the difference between the transfer magnification value obtained by the pattern image inspection and the ideal value is ΔM1, then the deviation amount ΔX1 from the ideal value at the standard position is ΔM, ΔT, Δ in the equation (6).
It can be obtained by substituting ΔM1, ΔT1, ΔR1, and ΔP1 into R and ΔP and solving ΔX. Therefore, ΔX1 = (ΔM1 −k21 ΔT1 −k22 ΔR1 −k23 ΔP
1) / k24 is required. This deviation amount is input from the input device 33 to the calculator 2
9 and stores it in the storage device 30. When performing a magnification correction operation thereafter, the amount of deviation ΔX1 is added and the lens 1 is driven for correction, so that more accurate magnification correction can be performed. It becomes possible to do.
【0045】ところで、標準位置検出用の下側センサ1
7としてフォトインタラプタ等の検出器を用いると、内
部の発光ダイオードの劣化により長期の使用期間中に検
出特性が徐々に変化し、連結部材7の検出位置即ちレン
ズ1の標準位置が変化してしまうことがある。そして、
この変化量が許容される量を超えると、倍率補正精度に
悪影響を与えてしまう。By the way, the lower sensor 1 for detecting the standard position
If a detector such as a photo interrupter is used as 7, a detection characteristic gradually changes during a long period of use due to deterioration of an internal light emitting diode, and a detection position of the connecting member 7, that is, a standard position of the lens 1 changes. Sometimes. And
If this amount of change exceeds the allowable amount, the accuracy of magnification correction is adversely affected.
【0046】図1の実施例においても、下側センサ17
にフォトインタラプタを用い、レンズ駆動体6の連結部
材7が図1のX方向正方向(右側)に移動し、下側セン
サ17を遮ることにより標準位置を検出する場合、長期
の経時変化によりフォトインタラプタ内部の発光ダイオ
ードの輝度が低下すると、連結部材7の検出位置は図1
のX方向負方向(左側)にずれる。また、同様に上側セ
ンサ16がレンズ駆動体6の案内部材10を検出する位
置は図1のX方向正方向(右側)にずれる。このため、
本実施例では、レンズ1を下側センサ17で連結部材7
を検出した状態から上側センサ16で案内部材10を検
出するまでのレンズ1の移動量ΔXS1またはアクチュエ
ータ8の駆動量ΔXS1' を計測し、予め計測し記憶装置
30内に記憶しておいた上記のΔXS0またはΔXS0' と
比較し、その関係または差が許容される量を超えるか否
かを判定する。Also in the embodiment of FIG. 1, the lower sensor 17
When a photo interrupter is used for the connection, and the connecting member 7 of the lens driving body 6 moves in the positive direction (right side) in the X direction of FIG. When the brightness of the light emitting diode inside the interrupter decreases, the detection position of the connecting member 7 will be as shown in FIG.
It shifts in the negative X direction (left side). Similarly, the position at which the upper sensor 16 detects the guide member 10 of the lens driving body 6 is displaced in the positive direction (right side) in the X direction of FIG. For this reason,
In this embodiment, the lens 1 is connected to the connecting member 7 by the lower sensor 17.
The amount of movement ΔX S1 of the lens 1 or the amount of drive ΔX S1 ′ of the actuator 8 from the state in which the upper sensor 16 detects the guide member 10 is measured, is measured in advance, and is stored in the storage device 30. ΔX S0 or ΔX S0 'of the above to determine if the relationship or difference exceeds an acceptable amount.
【0047】この判定は演算器29の制御の下に行わ
れ、演算器29が許容量を超えると判定した場合は、セ
ンサの検出特性の経時変化が倍率補正精度に影響すると
判断でき、倍率補正精度を維持するためには、再びアラ
イメント露光を行い、ウエハ25に転写されたパターン
の転写倍率値検査によるレンズ標準位置の補正更新が必
要となるので、本実施例はこれを演算器29の出力に基
づいてオペレータに表示または報知して警告する。This determination is performed under the control of the computing unit 29. If the computing unit 29 determines that the allowable amount is exceeded, it can be determined that the change over time in the detection characteristics of the sensor affects the magnification correction accuracy. In order to maintain the accuracy, it is necessary to perform alignment exposure again and to correct and update the lens standard position by inspection of the transfer magnification value of the pattern transferred onto the wafer 25. Therefore, this embodiment outputs this to the output of the calculator 29. Based on the above, a warning is given by displaying or notifying the operator.
【0048】転写パターンの検査によるレンズ標準位置
の補正更新作業は、検査用マスクやウエハの準備、アラ
イメント露光作業、露光されたウエハの現像作業、ウエ
ハ上の転写パターンの検査作業等に時間がかかるため、
露光装置自身の生産性を考えると、必要最小限の回数に
とどめたい。ところが、上記した移動量ΔXS1またはΔ
XS1' のストローク計測は10秒程度の短時間で行える
ので、定期的に例えば1日1回行ったとしても、露光装
置の生産性に影響を及ぼす事はない。The correction and update work of the lens standard position by the inspection of the transfer pattern takes time for the preparation of the inspection mask and the wafer, the alignment exposure work, the development work of the exposed wafer, the inspection work of the transfer pattern on the wafer, and the like. For,
Considering the productivity of the exposure apparatus itself, we want to keep it to the minimum necessary number. However, the above-mentioned movement amount ΔX S1 or Δ
Since the stroke measurement of X S1 'can be performed in a short time of about 10 seconds, it does not affect the productivity of the exposure apparatus even if it is regularly performed once a day.
【0049】このため、上記ストローク計測結果をレン
ズ標準位置の更新の必要の判断基準とし、倍率補正精度
の維持のために必要なときだけ、パターンの実際の転写
動作を必要とするレンズ標準位置の補正更新作業を行え
ばよい。Therefore, the above-mentioned stroke measurement result is used as a judgment criterion for updating the lens standard position, and only when necessary for maintaining magnification correction accuracy, the actual pattern transfer operation of the lens standard position is required. Correction update work may be performed.
【0050】図3は本発明の他の実施例を示す断面図で
ある。図において、34はレンズのガラス部材、35は
レンズ34を保持する鏡筒、36は鏡筒35を案内する
エアベアリングガイド、37はエアベアリングに静圧を
与える静圧管路、38は鏡筒35を光軸に沿って駆動す
るための圧力を供給する駆動圧配管、39は鏡筒35を
支えるバネである。FIG. 3 is a sectional view showing another embodiment of the present invention. In the figure, 34 is a glass member of the lens, 35 is a lens barrel that holds the lens 34, 36 is an air bearing guide that guides the lens barrel 35, 37 is a static pressure conduit that applies static pressure to the air bearing, and 38 is a lens barrel 35. Is a driving pressure pipe for supplying a pressure for driving the lens barrel along the optical axis, and 39 is a spring that supports the lens barrel 35.
【0051】この実施例において、レンズ34を保持す
る鏡筒35は図示しない静圧供給源から静圧管路37を
通った静圧を与えられたエアベアリングガイド36で光
軸方向に往復自在に案内されており、図示しない駆動圧
供給源より駆動圧配管38を通った駆動圧によって光軸
方向に位置調整が可能である。駆動圧の圧力を上げると
レンズ34は鏡筒35と一体的に図示下方に移動し、駆
動圧を下げると図示上方に移動する。In this embodiment, the lens barrel 35 holding the lens 34 is reciprocally guided in the optical axis direction by an air bearing guide 36 to which static pressure is applied from a static pressure supply source (not shown) through a static pressure conduit 37. The position can be adjusted in the optical axis direction by the driving pressure that has passed through the driving pressure pipe 38 from a driving pressure supply source (not shown). When the driving pressure is increased, the lens 34 moves downward in the figure together with the lens barrel 35, and when the driving pressure is decreased, it moves upward in the figure.
【0052】また、エアベアリング35の内周面には上
側センサ40と下側センサ41が固着されており、駆動
圧の圧力を上げて鏡筒35が図示下方に移動し、下側セ
ンサ41にさしかかる位置に到達したことと、駆動圧の
圧力を下げて鏡筒35が図示上方に移動し、上側センサ
40にさしかかる位置に到達したことを検出することが
可能である。レンズ34および鏡筒35の光軸方向の移
動量は上記した駆動圧の圧力に対応するので、駆動圧の
圧力を検出して移動量を算出することが可能であるが、
レンズ34ないし鏡筒35の移動量を直接検出する変位
センサを設けて検出するようにしてもよい。Further, the upper sensor 40 and the lower sensor 41 are fixed to the inner peripheral surface of the air bearing 35, and the pressure of the driving pressure is increased to move the lens barrel 35 downward in the drawing to cause the lower sensor 41 to move. It is possible to detect the arrival at the approaching position and the fact that the lens barrel 35 is moved upward in the figure by lowering the driving pressure to reach the position approaching the upper sensor 40. Since the amount of movement of the lens 34 and the lens barrel 35 in the optical axis direction corresponds to the pressure of the drive pressure described above, it is possible to detect the pressure of the drive pressure and calculate the amount of movement.
A displacement sensor that directly detects the amount of movement of the lens 34 or the lens barrel 35 may be provided and detected.
【0053】このレンズ移動手段を、図2に示す投影露
光装置の投影レンズ20(a〜d)のレンズ20bに対
して組み込み、レンズ駆動圧の圧力を上げて鏡筒35が
図示下方に移動し、下側センサ41にさしかかったこと
が検出された時のレンズ34の位置をレンズの標準位置
とし、上述した実施例と同様に倍率補正を行う。This lens moving means is incorporated into the lens 20b of the projection lens 20 (a to d) of the projection exposure apparatus shown in FIG. 2, the pressure of the lens driving pressure is increased, and the lens barrel 35 moves downward in the figure. Then, the position of the lens 34 when it is detected that the lower sensor 41 is approaching is set as the standard position of the lens, and the magnification correction is performed in the same manner as in the above-described embodiment.
【0054】なお、レンズの光軸方向の駆動手段には、
上記実施例で示した例の他にエアベアリングガイドに保
持された鏡筒を、ピエゾ素子に電圧を加えることによっ
て駆動する等の手段を用いてもよい。The driving means in the optical axis direction of the lens includes
In addition to the example shown in the above embodiment, a means for driving the lens barrel held by the air bearing guide by applying a voltage to the piezo element may be used.
【0055】[0055]
【発明の効果】以上説明したように、本発明によれば、
投影倍率調整用レンズを補正すべき位置に高精度に移動
制御可能とし、且つ長期間にわたり安定した補正を可能
にできる。また、そのためにレンズ部材の基準面の面精
度を高精度に仕上げる必要がなく、コストダウンが可能
であると共に、レンズ部材を基準位置に移動した際に接
触により傾く心配もない。As described above, according to the present invention,
The projection magnification adjusting lens can be moved to a position to be corrected with high precision, and stable correction can be performed for a long period of time. Further, for that reason, it is not necessary to finish the reference surface of the lens member with high accuracy, which can reduce the cost, and there is no fear of tilting due to contact when the lens member is moved to the reference position.
【0056】更に、本発明によれば、2つの検出器間の
レンズ駆動部材の移動量の経時変化を記憶している基準
値と比較することによって検知し、この検知結果に基づ
いて移動基準の絶対位置補正の必要時期を容易に判定で
きるようにしたので、投影露光装置の生産性を低下させ
ることなく、長期にわたって投影倍率および/または焦
点位置の補正精度を維持することが可能である。Further, according to the present invention, the change over time of the movement amount of the lens driving member between the two detectors is detected by comparing it with the stored reference value, and the movement reference value is detected based on this detection result. Since the time required for the absolute position correction can be easily determined, it is possible to maintain the correction accuracy of the projection magnification and / or the focus position for a long period of time without lowering the productivity of the projection exposure apparatus.
【図1】本発明の投影倍率調整装置の一実施例を示す図
で、Aはその平面図、Bはその断面図。FIG. 1 is a diagram showing an embodiment of a projection magnification adjusting device of the present invention, in which A is a plan view thereof and B is a sectional view thereof.
【図2】本発明の投影露光装置の一実施例を示す平面
図。FIG. 2 is a plan view showing an embodiment of the projection exposure apparatus of the present invention.
【図3】本発明の他の実施例を示す断面図。FIG. 3 is a sectional view showing another embodiment of the present invention.
1 レンズ 2 レンズ移動体 3 レンズ固定体 4 筒状固定ガイド 5 アクチュエータ支持板 6 レンズ駆動体 7 連結部材 8 アクチュエータ 9 連結棒 10 案内部材 16 上側センサ 17 下側センサ 18 マスク 20 投影レンズ 25 ウエハ 29 演算器 30 記憶装置 1 Lens 2 Lens Moving Body 3 Lens Fixed Body 4 Cylindrical Fixed Guide 5 Actuator Support Plate 6 Lens Driver 7 Connecting Member 8 Actuator 9 Connecting Rod 10 Guide Member 16 Upper Sensor 17 Lower Sensor 18 Mask 20 Projection Lens 25 Wafer 29 Calculation Container 30 storage device
Claims (14)
て移動することにより前記投影光学系の投影倍率を調整
する投影倍率調整装置において、前記投影光学系の一部
と共に移動する移動部材と、前記移動部材が移動始点位
置にあることを非接触検出する始点検出器と、前記移動
部材が移動終点位置にあることを非接触検出する終点検
出器と、前記移動始点位置と前記移動終点位置間の基準
距離を記憶する記憶手段と、前記投影光学系の投影倍率
を調整する際に前記移動始点位置からの前記移動部材の
移動量が指令値に等しくなるように前記移動部材の移動
を制御する制御手段と、前記移動始点位置と前記移動終
点位置の一方から他方まで前記移動部材を移動させた際
の移動量と前記基準距離を比較することにより前記投影
光学系の倍率調整量と前記移動部材の移動始点位置から
の移動量との関係が所定範囲内か否かを判定する判定手
段を有することを特徴とする投影倍率調整装置。1. A projection magnification adjusting device for adjusting a projection magnification of the projection optical system by moving a part of the projection optical system along an optical axis direction thereof, the movement moving together with the part of the projection optical system. A member, a start point detector for non-contact detection that the moving member is at the movement start point position, an end point detector for non-contact detection that the moving member is at the movement end point position, the movement start point position and the movement Storage means for storing a reference distance between end point positions, and movement of the moving member so that the amount of movement of the moving member from the movement start point position becomes equal to a command value when adjusting the projection magnification of the projection optical system. And a control unit for controlling the movement start point position and the movement end point position from one to the other of the movement amount when moving the moving member and the reference distance by comparing the magnification adjustment amount of the projection optical system. A projection magnification adjusting device, comprising: a determining unit that determines whether or not the relationship between the moving amount of the moving member and the moving amount from the starting position is within a predetermined range.
よって兼用されていることを特徴とする請求項1に記載
の投影倍率調整装置。2. The projection magnification adjusting apparatus according to claim 1, wherein the control unit and the determination unit are also used by an arithmetic unit.
記移動部材の移動量を前記パルスモータに加えたパルス
数に基づいて算出することを特徴とする請求項2に記載
の投影倍率調整装置。3. The projection magnification adjusting apparatus according to claim 2, wherein the arithmetic unit controls a pulse motor and calculates the movement amount of the moving member based on the number of pulses applied to the pulse motor. .
を制御し、前記移動部材の移動量を前記エンコーダの出
力に基づいて算出することを特徴とする請求項2に記載
の投影倍率調整装置。4. The projection magnification adjusting apparatus according to claim 2, wherein the arithmetic unit controls a DC motor with an encoder and calculates the movement amount of the moving member based on the output of the encoder.
記移動部材に対して設けられた移動計測センサの出力に
基づいて算出することを特徴とする請求項2に記載の投
影倍率調整装置。5. The projection magnification adjusting apparatus according to claim 2, wherein the arithmetic unit calculates a movement amount of the moving member based on an output of a movement measuring sensor provided for the moving member. .
一体的に移動するレンズ移動体と前記レンズ移動体を移
動させるためのレンズ駆動体の一方であることを特徴と
する請求項1に記載の投影倍率調整装置。6. The moving member is one of a lens moving body that moves integrally with a part of the projection optical system and a lens driving body for moving the lens moving body. The projection magnification adjusting device described in.
度の内少なくとも1つを測定する環境測定器を更に有
し、前記指令値を前記環境測定器の出力に基づいて求め
ることを特徴とする請求項1に記載の投影倍率調整装
置。7. An environment measuring device for measuring at least one of atmospheric pressure, temperature and humidity around the projection optical system, and the command value is obtained based on an output of the environment measuring device. The projection magnification adjusting device according to claim 1.
光学系を介して基板に投影露光する投影露光装置におい
て、前記投影光学系の投影倍率を調整する際に前記投影
光学系の一部と共に移動する移動部材と、前記移動部材
が移動始点位置にあることを非接触検出する始点検出器
と、前記移動部材が移動終点位置にあることを非接触検
出する終点検出器と、前記移動始点位置と前記移動終点
位置間の基準距離を記憶する記憶手段と、前記移動始点
位置からの前記移動部材の移動量が指令値に等しくなる
ように前記移動部材の移動を制御する制御手段と、前記
移動始点位置と前記移動終点位置の一方から他方まで前
記移動部材を移動させた際の移動量と前記基準距離を比
較することにより前記投影光学系の倍率調整量と前記移
動部材の移動始点位置からの移動量との関係が所定範囲
内か否かを判定する判定手段を有することを特徴とする
投影露光装置。8. A projection exposure apparatus which projects and exposes a pattern previously formed on an original plate onto a substrate via a projection optical system, together with a part of the projection optical system when adjusting a projection magnification of the projection optical system. A moving member that moves, a start point detector that detects non-contact that the moving member is at the movement start point position, an end point detector that non-contact detects that the moving member is at the movement end point position, and the movement start point position And storage means for storing a reference distance between the movement end point position, control means for controlling the movement of the movement member so that the movement amount of the movement member from the movement start point position becomes equal to a command value, and the movement The amount of magnification adjustment of the projection optical system and the starting position of the moving member by comparing the moving amount when the moving member is moved from one of the starting point position and the moving end point position to the other with the reference distance. A projection exposure apparatus having a determination means for determining whether or not the relationship with the movement amount from the position is within a predetermined range.
よって兼用されていることを特徴とする請求項8に記載
の投影露光装置。9. The projection exposure apparatus according to claim 8, wherein the control means and the determination means are shared by a computing unit.
前記移動部材の移動量を前記パルスモータに加えたパル
ス数に基づいて算出することを特徴とする請求項9に記
載の投影露光装置。10. The arithmetic unit controls a pulse motor,
The projection exposure apparatus according to claim 9, wherein the movement amount of the moving member is calculated based on the number of pulses applied to the pulse motor.
タを制御し、前記移動部材の移動量を前記エンコーダの
出力に基づいて算出することを特徴とする請求項9に記
載の投影露光装置。11. The projection exposure apparatus according to claim 9, wherein the arithmetic unit controls a DC motor with an encoder and calculates the movement amount of the moving member based on the output of the encoder.
前記移動部材に対して設けられた移動計測センサの出力
に基づいて算出することを特徴とする請求項9に記載の
投影露光装置。12. The projection exposure apparatus according to claim 9, wherein the arithmetic unit calculates a movement amount of the moving member based on an output of a movement measuring sensor provided for the moving member.
と一体的に移動するレンズ移動体と前記レンズ移動体を
移動させるためのレンズ駆動体の一方であることを特徴
とする請求項8に記載の投影露光装置。13. The moving member is one of a lens moving body that moves integrally with a part of the projection optical system and a lens driving body that moves the lens moving body. The projection exposure apparatus according to.
湿度の内少なくとも1つを測定する環境測定器を更に有
し、前記指令値を前記環境測定器の出力に基づいて求め
ることを特徴とする請求項8に記載の投影露光装置。14. The atmospheric pressure and temperature around the projection optical system,
9. The projection exposure apparatus according to claim 8, further comprising an environment measuring device that measures at least one of humidity, and the command value is obtained based on an output of the environment measuring device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6099827A JPH07307270A (en) | 1994-05-13 | 1994-05-13 | Projection magnification adjusting device and projection exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6099827A JPH07307270A (en) | 1994-05-13 | 1994-05-13 | Projection magnification adjusting device and projection exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07307270A true JPH07307270A (en) | 1995-11-21 |
Family
ID=14257660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6099827A Withdrawn JPH07307270A (en) | 1994-05-13 | 1994-05-13 | Projection magnification adjusting device and projection exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07307270A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001168027A (en) * | 1999-11-05 | 2001-06-22 | Asm Lithography Bv | Lithography device |
JP2004031491A (en) * | 2002-06-24 | 2004-01-29 | Nikon Corp | Optical element retaining mechanism, optical system lens-barrel and aligner |
CN102141741A (en) * | 2011-04-15 | 2011-08-03 | 中国科学院长春光学精密机械与物理研究所 | Micro leveling mechanism of projection objective of lithography machine |
JP2020016708A (en) * | 2018-07-23 | 2020-01-30 | キヤノン株式会社 | Optical device, projection optical system, exposure apparatus, and method of manufacturing article |
CN116819915A (en) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | Projection objective capable of adjusting axial parameters and exposure equipment |
-
1994
- 1994-05-13 JP JP6099827A patent/JPH07307270A/en not_active Withdrawn
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001168027A (en) * | 1999-11-05 | 2001-06-22 | Asm Lithography Bv | Lithography device |
JP2004031491A (en) * | 2002-06-24 | 2004-01-29 | Nikon Corp | Optical element retaining mechanism, optical system lens-barrel and aligner |
JP4565261B2 (en) * | 2002-06-24 | 2010-10-20 | 株式会社ニコン | Optical element holding mechanism, optical system barrel, and exposure apparatus |
CN102141741A (en) * | 2011-04-15 | 2011-08-03 | 中国科学院长春光学精密机械与物理研究所 | Micro leveling mechanism of projection objective of lithography machine |
JP2020016708A (en) * | 2018-07-23 | 2020-01-30 | キヤノン株式会社 | Optical device, projection optical system, exposure apparatus, and method of manufacturing article |
KR20200011018A (en) * | 2018-07-23 | 2020-01-31 | 캐논 가부시끼가이샤 | Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article |
CN110750034A (en) * | 2018-07-23 | 2020-02-04 | 佳能株式会社 | Optical device, projection optical system, exposure device, and method for manufacturing article |
CN116819915A (en) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | Projection objective capable of adjusting axial parameters and exposure equipment |
CN116819915B (en) * | 2023-08-31 | 2023-11-14 | 光科芯图(北京)科技有限公司 | Projection objective capable of adjusting axial parameters and exposure equipment |
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Legal Events
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A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20010731 |