JPH07303001A - High frequency switch - Google Patents
High frequency switchInfo
- Publication number
- JPH07303001A JPH07303001A JP9605794A JP9605794A JPH07303001A JP H07303001 A JPH07303001 A JP H07303001A JP 9605794 A JP9605794 A JP 9605794A JP 9605794 A JP9605794 A JP 9605794A JP H07303001 A JPH07303001 A JP H07303001A
- Authority
- JP
- Japan
- Prior art keywords
- inductor
- switch circuit
- fet
- input
- switch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は移動体通信器向けの送信
受信切り換えスイッチに関するものであり、低通過損失
で高アイソレーション特性を持つ高周波スイッチを実現
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transmission / reception changeover switch for a mobile communication device, and to realize a high frequency switch having a low passage loss and a high isolation characteristic.
【0002】[0002]
【従来の技術】移動体通信向けの送信受信切り換えスイ
ッチとしてSPDT(Single-Pole Double-Throw)スイッ
チを用いる事例が多く発表されている。例として、吉川
等による”小型樹脂パッケージ高周波FETスイッ
チ”、1993年電子情報通信学会春季大会、講演番号
C−90がある。図2にこの従来のSPDTスイッチを
示す。DFETで構成した場合はVC1を0V、VC2
を−Vcon Vとした場合に受信状態、VC1を−Vcon
V、VC2を0Vとした場合に送信状態になる。今、受
信状態の通過特性を考える。受信、送信の信号が通過す
るFET2,3は通過損失を小さくするため、FET
1,4に比べてゲ−ト幅を広くする場合が多い。このと
き、受信状態においては送信側のFET3の寄生容量の
影響で通過損失が増加する。また、送信側からの信号漏
れが上記寄生容量を介して伝わり、アイソレーション特
性が劣化する。送信状態においてはFET2の寄生容量
の影響で通過損失が増大する。2. Description of the Related Art Many cases have been announced in which an SPDT (Single-Pole Double-Throw) switch is used as a transmission / reception changeover switch for mobile communication. Examples include "Small Resin Package High Frequency FET Switch" by Yoshikawa et al., 1993 IEICE Spring Conference, Lecture No. C-90. FIG. 2 shows this conventional SPDT switch. In case of DFET, VC1 is 0V, VC2
Is -Vcon V, the reception state, VC1 is -Vcon
The transmission state is set when V and VC2 are set to 0V. Now, let us consider the pass characteristics of the reception state. FETs 2 and 3 that receive and transmit signals pass through to reduce the passage loss.
In many cases, the gate width is made wider than that of Nos. 1 and 4. At this time, in the reception state, the passage loss increases due to the influence of the parasitic capacitance of the FET 3 on the transmission side. Further, signal leakage from the transmission side is transmitted through the parasitic capacitance, degrading the isolation characteristic. In the transmitting state, the passage loss increases due to the influence of the parasitic capacitance of FET2.
【0003】[0003]
【発明が解決しようとする課題】本発明ではこの寄生容
量による通過損失の増加とアイソレーション特性の劣化
を防ぎ、低通過損失、高アイソーレションのスイッチを
実現することを課題とする。SUMMARY OF THE INVENTION An object of the present invention is to realize a switch with low passage loss and high isolation by preventing an increase in passage loss and deterioration of isolation characteristics due to the parasitic capacitance.
【0004】[0004]
【課題を解決するための手段】上記課題はゲート幅の広
いFETと並列にインダクタを接続し、寄生容量を打ち
消すことにより実現される。The above object is realized by connecting an inductor in parallel with an FET having a wide gate width and canceling out parasitic capacitance.
【0005】[0005]
【作用】図3に受信モードにおける本発明を適用したS
PDTスイッチの等価回路を示す。このモード状ではF
ET1はOFF,FET2はON,FET3はOFF,
FET4はONの状態にある。FIG. 3 shows the S to which the present invention is applied in the reception mode.
The equivalent circuit of a PDT switch is shown. F in this mode
ET1 is OFF, FET2 is ON, FET3 is OFF,
FET4 is in the ON state.
【0006】FETのON,OFF両状態の簡易な等価
回路は夫々抵抗と容量で表せる。FET3の寄生容量C
3とインダクタL2が並列共振することで寄生容量C3
による通過損失の増加を防止すると共にアイソレーショ
ンの劣化を防止し、受信時における送信回路側からの雑
音を遮断することが出来る。送信モードにおいてはFE
T2のOFF時における寄生容量が送信側の通過損失の
増加をもたらすので、インダクタL1をFET2と並列
に接続し、送信モードにおける通過損失の増加を防止す
る。受信時においては、FET2がオン状態にあるので
ソース、ドレイン間は極めて低いインピーダンスR1で
接続され、インダクタL1は通過特性に影響を与えな
い。A simple equivalent circuit for both ON and OFF states of the FET can be represented by resistance and capacitance, respectively. FET3 parasitic capacitance C
3 and the inductor L2 resonate in parallel so that the parasitic capacitance C3
It is possible to prevent an increase in passage loss due to the above, prevent degradation of isolation, and block noise from the transmitting circuit side during reception. FE in transmission mode
Since the parasitic capacitance when T2 is OFF causes an increase in the transmission loss on the transmission side, the inductor L1 is connected in parallel with the FET2 to prevent an increase in the transmission loss in the transmission mode. At the time of reception, since the FET2 is in the ON state, the source and the drain are connected with an extremely low impedance R1, and the inductor L1 does not affect the pass characteristic.
【0007】FET1の寄生容量C1も受信時の通過損
失の増加を招くが、FET1の最適ゲート幅はFET3
のゲート幅に比べて狭い場合が多い。小さな容量と並列
共振をとるためには大きなインダクタが必要となり、F
ET1に並列共振用のインダクタを接続することは集積
化した場合のチップ面積の増大を招く。ここでは積極的
にFET1用のインダクタを省略している。Although the parasitic capacitance C1 of the FET1 also causes an increase in passage loss during reception, the optimum gate width of the FET1 is FET3.
Often narrower than the gate width. A large inductor is required to take parallel resonance with a small capacitance.
Connecting an inductor for parallel resonance to ET1 causes an increase in chip area when integrated. Here, the inductor for FET1 is positively omitted.
【0008】[0008]
【実施例】図1を用いて本発明の第1の実施例を示す。
送信受信対称型のSPDTスイッチの信号が通過する2
つのFETに並列にインダクタを接続することで寄生容
量による通過損失の増加を防止すると共にアイソレーシ
ョンの劣化を防止することが出来る。接地用のFET
1,4の寄生容量もそれぞれ受信時、送信時の通過損失
の増加を招くが、FET1,4の最適ゲート幅はFET
2,3のゲート幅に比べて狭い場合が多い。小さな容量
と並列共振をとるためには大きなインダクタが必要とな
り、FET1,4に並列共振用のインダクタを接続する
ことは集積化した場合のチップ面積の増大を招く。ここ
では積極的にFET1,4用のインダクタを省略してい
る。EXAMPLE A first example of the present invention will be described with reference to FIG.
Transmit and receive symmetrical SPDT switch signals pass through 2
By connecting an inductor in parallel with one FET, it is possible to prevent an increase in passage loss due to parasitic capacitance and prevent deterioration of isolation. FET for ground
Although the parasitic capacitances of 1 and 4 also increase the passage loss during reception and transmission, the optimum gate widths of FETs 1 and 4 are
It is often narrower than the gate width of a few. A large inductor is required to obtain a small capacitance and parallel resonance, and connecting an inductor for parallel resonance to the FETs 1 and 4 causes an increase in chip area when integrated. Here, the inductors for the FETs 1 and 4 are positively omitted.
【0009】図4を用いて本発明の第2の実施例を示
す。多段型のSPDTスイッチに本発明を適用した例で
ある。アンテナ端子に接続されたFETのみにインダク
タを並列接続させることで使用しないパスの接続による
通過損失の増大を防止できる。本実施例では特に通過損
失の増加要因に着目し必要最小限のインダクタで効果を
上げている。ここでは対称型のSPDTスイッチを例に
挙げているが段数の異なる非対称型のスイッチに適用す
ることも可能である。A second embodiment of the present invention will be described with reference to FIG. It is an example in which the present invention is applied to a multi-stage SPDT switch. By connecting the inductor in parallel only to the FET connected to the antenna terminal, it is possible to prevent an increase in passage loss due to connection of an unused path. In the present embodiment, the effect is increased with the minimum required inductor, paying particular attention to the factors that increase the passage loss. Here, a symmetrical SPDT switch is taken as an example, but it is also possible to apply it to an asymmetrical switch having a different number of stages.
【0010】図5を用いて本発明の第3の実施例を示
す。全てのFETにインダクタを並列接続したことによ
り第1の実施例では対策していなかったFET1,4の
寄生容量の効果を抑圧し、第1の実施例よりも通過損失
の少ないスイッチを実現したものである。A third embodiment of the present invention will be described with reference to FIG. By connecting the inductors in parallel to all the FETs, the effect of the parasitic capacitance of the FETs 1 and 4 which has not been dealt with in the first embodiment is suppressed, and a switch with less passage loss than in the first embodiment is realized. Is.
【0011】図6を用いて本発明の第4の実施例を示
す。図5に示す第3の実施例では低通過損失を実現でき
るものの、より多くの且つより大きなインダクタを必要
とする。第1の実施例でも述べたように接地用のFET
1,4は、FET2,3に比べてゲート幅が小さい場合
が多い。このためFET1,4の寄生容量と共振させる
インダクタの大きさは、FET2,3に用いるインダク
タに比べて大きくなり、MMIC上で本実施例を実現し
た場合、チップ面積の大幅な増大を生む。本実施例では
接地用のFETに並列に容量を接続することで共振に必
要なインダクタの値を小さくしている。ここでは対称型
の1段SPDTスイッチを例に説明を行っているが、非
対称型、多段型のスイッチについても適用可能である。A fourth embodiment of the present invention will be described with reference to FIG. Although the third embodiment shown in FIG. 5 can realize a low passage loss, it requires more and larger inductors. As described in the first embodiment, the FET for grounding
Gate widths of 1 and 4 are often smaller than those of FETs 2 and 3. Therefore, the size of the inductor that resonates with the parasitic capacitances of the FETs 1 and 4 is larger than that of the inductors used in the FETs 2 and 3, and when this embodiment is realized on the MMIC, the chip area is significantly increased. In this embodiment, the value of the inductor necessary for resonance is reduced by connecting the capacitance in parallel with the grounding FET. Here, the symmetrical one-stage SPDT switch is described as an example, but it is also applicable to asymmetrical and multi-stage switches.
【0012】図7を用いて本発明の第5の実施例を示
す。多段型のSPDTスイッチの信号の通る全てのFE
Tに並列にインダクタを付けたものである。信号の通る
全てのFETの寄生容量をインダクタで打ち消している
ので本実施例ではオフ時のアイソレーション特性を高く
することが出来る。A fifth embodiment of the present invention will be described with reference to FIG. All FEs through which the signal of the multi-stage SPDT switch passes
An inductor is attached in parallel with T. Since the parasitic capacitances of all the FETs through which the signal passes are canceled by the inductor, in the present embodiment, it is possible to improve the isolation characteristic at the off time.
【0013】図8を用いて本発明の第6の実施例を示
す。アイソレーション特性は受信モード動作時における
送信側からの信号について特に強く要求されるので、S
PDTスイッチを構成する4つのFETの内、送信信号
を通過させるFET3にのみインダクタを並列接続し、
アイソレーション特性を強化している。インダクタの数
を1つにすることでMMIC化したときのチップ面積を
削減できる。A sixth embodiment of the present invention will be described with reference to FIG. Since the isolation characteristic is particularly strongly required for the signal from the transmission side in the reception mode operation, S
Of the four FETs that make up the PDT switch, the inductor is connected in parallel only to the FET3 that passes the transmission signal,
The isolation characteristics are strengthened. By reducing the number of inductors to one, it is possible to reduce the chip area of the MMIC.
【0014】[0014]
【発明の効果】本発明はFETで構成されるスイッチ回
路の寄生容量をインダクタで打ち消すもので低通過損
失、高アイソーレションのスイッチを実現するものであ
る。またインダクタの数に制限を加えることで集積化時
のチップ面積の削減を図っている。The present invention realizes a switch with low passage loss and high isolation by canceling the parasitic capacitance of a switch circuit composed of an FET with an inductor. In addition, by limiting the number of inductors, we are trying to reduce the chip area during integration.
【図1】本発明の第1の実施例。FIG. 1 is a first embodiment of the present invention.
【図2】従来のSPDTスイッチ。FIG. 2 is a conventional SPDT switch.
【図3】本発明の作用を示す等価回路。FIG. 3 is an equivalent circuit showing the operation of the present invention.
【図4】本発明の第2の実施例。FIG. 4 is a second embodiment of the present invention.
【図5】本発明の第3の実施例。FIG. 5 is a third embodiment of the present invention.
【図6】本発明の第4の実施例。FIG. 6 is a fourth embodiment of the present invention.
【図7】本発明の第5の実施例。FIG. 7 is a fifth embodiment of the present invention.
【図8】本発明の第6の実施例。FIG. 8 is a sixth embodiment of the present invention.
FET1,2,3,4,1n,2n,3m,4m…電界
効果トランジスタ、VC1,VC2…コントロールバイ
アス端子、L1,L2…インダクタ、R1…FET1の
ON抵抗、C3…FET3のOFF時寄生容量。FETs 1, 2, 3, 4, 1n, 2n, 3m, 4m ... Field effect transistors, VC1, VC2 ... Control bias terminals, L1, L2 ... Inductor, R1 ... ON resistance of FET1, C3 ... Parasitic capacitance when FET3 is OFF.
Claims (10)
子をもつスイッチ回路において第1の入出力端子から他
の入出力端子への経路となるFETトランジスタの少な
くとも1つのFETに対して並列にインダクタ素子を接
続したことを特徴とする高周波スイッチ。1. In a switch circuit having a plurality of input / output terminals composed of a plurality of FETs, parallel to at least one FET of FET transistors which is a path from a first input / output terminal to another input / output terminal. A high-frequency switch characterized in that an inductor element is connected to the.
許請求の範囲第1項記載のスイッチ回路において、イン
ダクタを半導体結晶上のスパイラルインダクタで構成
し、スイッチを構成する全ての素子を同一結晶基板上に
集積したこと特徴とする高周波スイッチ回路。2. The switch circuit according to claim 1, which is composed of a plurality of FETs and an inductor, wherein the inductor is composed of a spiral inductor on a semiconductor crystal, and all elements composing the switch are the same crystal substrate. A high-frequency switch circuit characterized by being integrated on top.
許請求の範囲第1項記載のスイッチ回路において、すべ
てのFET素子に対してインダクタを並列にインダクタ
素子を接続したことを特徴とする高周波スイッチ回路。3. A high frequency switch comprising a plurality of FETs and an inductor, wherein the inductors are connected in parallel with all the FET elements in the switch circuit according to claim 1. circuit.
許請求の範囲第1項記載のスイッチ回路において、少な
くとも1つのFETと並列にインダクタと容量で構成さ
れる並列共振回路を接続したことを特徴とする高周波ス
イッチ回路。4. The switch circuit according to claim 1, which is composed of a plurality of FETs and an inductor, wherein a parallel resonant circuit composed of an inductor and a capacitor is connected in parallel with at least one FET. High frequency switch circuit.
ドレイン)を接地し、同FETの第2の電極(ドレインま
たはソース)を第1の入出力端子に接続し、第2のFE
Tの第1の電極(ソースまたはドレイン)を第1の入出力
端子に接続し、第2のFETの第2の電極(ドレインま
たはソース)を第2の入出力端子に接続し、第2のFE
Tのソースとドレインの間にインダクタを接続したこと
を特徴とする特許請求の範囲第1項記載の高周波スイッ
チ回路。5. A first electrode (source or drain) of the first FET is grounded, a second electrode (drain or source) of the same FET is connected to a first input / output terminal, and a second FE is connected.
The first electrode (source or drain) of T is connected to the first input / output terminal, and the second electrode (drain or source) of the second FET is connected to the second input / output terminal. FE
The high frequency switch circuit according to claim 1, further comprising an inductor connected between the source and the drain of T.
を2つ用い、第1のスイッチ回路の第1の入出力端子を
第1の入出力端子とし、第2のスイッチ回路の第1の入
出力端子を第2の入出力端子とし、第1第2のスイッチ
回路の第2の入出力端子を接続し、第3の入出力端子と
したことを特徴とする特許請求の範囲第1項記載の高周
波スイッチ回路。6. A switch circuit according to claim 5, wherein two switch circuits are used, a first input / output terminal of the first switch circuit is a first input / output terminal, and a first switch circuit of the second switch circuit. And a second input / output terminal of each of the first and second switch circuits is connected to form a third input / output terminal. The high frequency switch circuit according to the item.
において第1の端子と第3の端子の間に特許請求の範囲
第5項記載のスイッチ回路を1個以上カスケード接続
し、第2の端子と第3の端子の間に特許請求の範囲第5
項記載のスイッチ回路を1個以上カスケード接続したこ
とを特徴とする特許請求の範囲第1項記載の高周波スイ
ッチ回路。7. A switch circuit according to claim 6, wherein one or more switch circuits according to claim 5 are cascade-connected between the first terminal and the third terminal, and a second circuit is provided. Claim 5 between the terminal and the third terminal
The high frequency switch circuit according to claim 1, wherein one or more switch circuits according to claim 1 are cascade-connected.
において第1の端子と第3の端子の間に特許請求の範囲
第5項記載のスイッチ回路を1個以上カスケード接続
し、第2の端子と第3の端子の間に特許請求の範囲第5
項記載のスイッチ回路を1個以上カスケード接続し、第
3の端子に直接接続される2つの特許請求の範囲第5項
記載のスイッチ回路以外の回路に含まれるインダクタを
取り除いたことを特徴とする特許請求の範囲第1項記載
の高周波スイッチ回路。8. A switch circuit according to claim 6, wherein one or more switch circuits according to claim 5 are cascade-connected between the first terminal and the third terminal, and a second circuit is provided. Claim 5 between the terminal and the third terminal
One or more switch circuits described in claim 1 are cascade-connected, and the inductors included in the circuits other than the two switch circuits described in claim 5 that are directly connected to the third terminal are removed. The high frequency switch circuit according to claim 1.
ドレイン)を接地し、同FETの第2の電極(ドレインま
たはソース)を第1の入出力端子に接続し、第2のFE
Tの第1の電極(ソースまたはドレイン)を第1の入出力
端子に接続し、第2のFETの第2の電極(ドレインま
たはソース)を第2の入出力端子に接続し、第2のFE
Tのソースとドレインの間にインダクタを接続し、第1
のFETのソースとドレインの間に並列共振回路を接続
したことを特徴とする特許請求の範囲第1項記載の高周
波スイッチ回路。9. A first electrode (source or drain) of the first FET is grounded, a second electrode (drain or source) of the same FET is connected to a first input / output terminal, and a second FE is connected.
The first electrode (source or drain) of T is connected to the first input / output terminal, and the second electrode (drain or source) of the second FET is connected to the second input / output terminal. FE
Connect an inductor between the source and drain of T
The high-frequency switch circuit according to claim 1, wherein a parallel resonant circuit is connected between the source and the drain of the FET.
路において第1のスイッチ回路のインダクタを取り除い
たことを特徴とする特許請求の範囲第1項記載の高周波
スイッチ回路。10. The high frequency switch circuit according to claim 1, wherein the inductor of the first switch circuit is removed from the switch circuit according to claim 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9605794A JPH07303001A (en) | 1994-05-10 | 1994-05-10 | High frequency switch |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9605794A JPH07303001A (en) | 1994-05-10 | 1994-05-10 | High frequency switch |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07303001A true JPH07303001A (en) | 1995-11-14 |
Family
ID=14154819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9605794A Pending JPH07303001A (en) | 1994-05-10 | 1994-05-10 | High frequency switch |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07303001A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0723338A2 (en) * | 1995-01-23 | 1996-07-24 | Sony Corporation | Switching circuit |
EP0993120A2 (en) * | 1998-10-07 | 2000-04-12 | Murata Manufacturing Co., Ltd. | SPST switch, SPDT switch, and communication apparatus using the SPDT switch |
KR100372534B1 (en) * | 2000-04-26 | 2003-02-15 | 가부시끼가이샤 도시바 | Semiconductor integrated circuit |
US6580107B2 (en) | 2000-10-10 | 2003-06-17 | Sanyo Electric Co., Ltd. | Compound semiconductor device with depletion layer stop region |
US6873828B2 (en) | 2000-05-15 | 2005-03-29 | Sanyo Electric Co., Ltd. | Compound semiconductor switching device for high frequency switching |
US6882210B2 (en) | 2001-04-19 | 2005-04-19 | Sanyo Electric Co. Ltd. | Semiconductor switching device |
JP2005159157A (en) * | 2003-11-27 | 2005-06-16 | Renesas Technology Corp | Semiconductor device |
US7206552B2 (en) | 2001-03-27 | 2007-04-17 | Sanyo Electric Co., Ltd. | Semiconductor switching device |
US7468543B2 (en) | 2003-09-19 | 2008-12-23 | Kabushiki Kaisha Toshiba | Semiconductor device, communication device, and semiconductor device inspecting method |
DE102004048686B4 (en) * | 2003-10-09 | 2009-12-17 | Mitsubishi Denki K.K. | High-frequency switching device |
JP4672652B2 (en) * | 2004-03-24 | 2011-04-20 | 三菱電機株式会社 | Single pole single throw switch, single pole double throw switch and multipole multi throw switch |
US20110140764A1 (en) * | 2009-12-16 | 2011-06-16 | Electronics & Telecommunications Research | Cmos switch for use in radio frequency switching and isolation enhancement method |
US8653880B2 (en) | 2011-12-28 | 2014-02-18 | Mitsubishi Electric Corporation | Switch circuit having improved RF power characteristics |
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-
1994
- 1994-05-10 JP JP9605794A patent/JPH07303001A/en active Pending
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US6873828B2 (en) | 2000-05-15 | 2005-03-29 | Sanyo Electric Co., Ltd. | Compound semiconductor switching device for high frequency switching |
US6580107B2 (en) | 2000-10-10 | 2003-06-17 | Sanyo Electric Co., Ltd. | Compound semiconductor device with depletion layer stop region |
US6867115B2 (en) | 2000-10-10 | 2005-03-15 | Sanyo Electric Co., Ltd. | Compound semiconductor device |
US7206552B2 (en) | 2001-03-27 | 2007-04-17 | Sanyo Electric Co., Ltd. | Semiconductor switching device |
US6882210B2 (en) | 2001-04-19 | 2005-04-19 | Sanyo Electric Co. Ltd. | Semiconductor switching device |
US7468543B2 (en) | 2003-09-19 | 2008-12-23 | Kabushiki Kaisha Toshiba | Semiconductor device, communication device, and semiconductor device inspecting method |
DE102004048686B4 (en) * | 2003-10-09 | 2009-12-17 | Mitsubishi Denki K.K. | High-frequency switching device |
JP2005159157A (en) * | 2003-11-27 | 2005-06-16 | Renesas Technology Corp | Semiconductor device |
US8169008B2 (en) | 2003-11-27 | 2012-05-01 | Murata Manufacturing Co., Ltd. | Semiconductor device |
JP4672652B2 (en) * | 2004-03-24 | 2011-04-20 | 三菱電機株式会社 | Single pole single throw switch, single pole double throw switch and multipole multi throw switch |
US20110140764A1 (en) * | 2009-12-16 | 2011-06-16 | Electronics & Telecommunications Research | Cmos switch for use in radio frequency switching and isolation enhancement method |
US8653880B2 (en) | 2011-12-28 | 2014-02-18 | Mitsubishi Electric Corporation | Switch circuit having improved RF power characteristics |
US20230231550A1 (en) * | 2022-01-18 | 2023-07-20 | Psemi Corporation | Rf switch with improved isolation at target frequencies |
US11736102B1 (en) * | 2022-01-18 | 2023-08-22 | Psemi Corporation | RF switch with improved isolation at target frequencies |
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