JPH07300529A - Polysilane and its production - Google Patents

Polysilane and its production

Info

Publication number
JPH07300529A
JPH07300529A JP33588594A JP33588594A JPH07300529A JP H07300529 A JPH07300529 A JP H07300529A JP 33588594 A JP33588594 A JP 33588594A JP 33588594 A JP33588594 A JP 33588594A JP H07300529 A JPH07300529 A JP H07300529A
Authority
JP
Japan
Prior art keywords
group
polysilane
formula
fluoroalkyl
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33588594A
Other languages
Japanese (ja)
Other versions
JP3116759B2 (en
Inventor
Yoshitaka Hamada
吉隆 濱田
Mikio Aramata
幹夫 荒又
Motoo Fukushima
基夫 福島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
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Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP06335885A priority Critical patent/JP3116759B2/en
Publication of JPH07300529A publication Critical patent/JPH07300529A/en
Application granted granted Critical
Publication of JP3116759B2 publication Critical patent/JP3116759B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To produce, at a high yield under mild conditions, a polysilane which exhibits a high electric conductivity when doped and is suitable as a photoelectric conversion material or a conductive material by subjecting a specific trihydrosilane to condensation by dehydration. CONSTITUTION:A trihydrosilane of formula I [wherein X is halogen, alkyl, fluoroalkyl, alkoxy. (substd.) amino, acyl, or an aldehyde group; Y is H, halogen, alkyl, fluoroalkyl, (substd.) amino, acyl, or an aldehyde group provided that X and Y may combine with each other to form an alkylene or heteroalkylene group and that when Y is H, then X is not alkyl nor fluoroalkyl; m is 1-5; and k is 0-4 provided k+m is 1-5] is subjected to condensation by dehydration to give a polysilane of formula II (wherein X, Y, m, and k each is the same as described above; and n>=3). Thus, a polysilane exhibiting a high electric conductivity when doped and suitable as a photoelectric conversion material, an electric conductive material, etc., is obtd. at a high yield under relatively mild conditions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光電変換材料、導電性
材料、或いはセラミック前駆体等として有用な新規ポリ
シラン及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel polysilane useful as a photoelectric conversion material, a conductive material, a ceramic precursor and the like, and a method for producing the same.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
ポリシランの合成にはウルツ反応がよく用いられている
が、反応条件が厳しいために官能基含有のポリシランを
得るには多くの困難があった。また、早瀬ら((a)
R.Horiguchi,Y.Onishi,S.Ha
yase,Macromolecules,(199
2),25,3825.(b)S.Hayase,R.
Horiguchi,Y.Onishi,Macrom
olecules,(1989),22,2933.
(c)C.H.Yuan,R.West,Macrom
olecules,(1993),26,2654.)
はトリアルキルシリル保護基を用い、アルコール、ある
いはフェノール官能性のポリシランを報告しているが、
保護基の種類や反応条件を工夫する必要があり、また保
護基の脱離にも繊細な反応条件の調節が必要であり、こ
れらの合成は簡単ではない。更に、関ら(T.Sek
i,T.Tamaki,K.Ueno,Macromo
lecules,(1992),25,3825.)
は、ポリシランを合成した後、アンモニウム官能基の導
入を報告しているが、ポリマーに対して2段階に及ぶ変
性を行うことは、安定性及び反応率の点で問題があり、
これらの化合物を高収率、高純度で得ることが困難であ
った。
2. Description of the Related Art Conventionally, the problems to be solved by the invention
The Wurtz reaction is often used for the synthesis of polysilanes, but there are many difficulties in obtaining polysilanes containing a functional group due to severe reaction conditions. Also, Hayase et al. ((A)
R. Horiguchi, Y. Onishi, S .; Ha
yase, Macromolecules, (199
2), 25 , 3825. (B) S. Hayase, R .;
Horiguchi, Y. Onishi, Macrom
olecules, (1989), 22 , 2933.
(C) C.I. H. Yuan, R .; West, Macrom
olecules, (1993), 26 , 2654. )
Reports a polysilane with alcohol or phenol functionality using a trialkylsilyl protecting group.
It is necessary to devise the type of protecting group and reaction conditions, and delicate adjustment of reaction conditions is required for elimination of the protecting group, and thus their synthesis is not easy. Furthermore, Seki et al. (T. Sek
i, T. Tamaki, K .; Ueno, Macromo
lecules, (1992), 25 , 3825. )
Reported the introduction of an ammonium functional group after synthesizing a polysilane, but the two-step modification of the polymer had problems in stability and reaction rate,
It was difficult to obtain these compounds in high yield and high purity.

【0003】一方、脱水素縮合法によるポリシランの合
成は、従来では重合度の向上が問題であるとされてお
り、研究の主眼はもっぱら触媒の活性を上げ、高重合物
を得ることに向けられ、置換基導入への応用はメチル基
やトリフロロメチル基などの官能性の低いもの(J.
P.Banovetz,H.Suzuki,R.M.W
aymouth,Organometallics,
(1993),12,4700.)についての研究例し
か報告されていなかった。
On the other hand, in the synthesis of polysilane by the dehydrogenative condensation method, the improvement of the degree of polymerization is conventionally considered to be a problem, and the main focus of the research is to raise the activity of the catalyst to obtain a high polymer. Application to the introduction of substituents has low functionality such as methyl group and trifluoromethyl group (J.
P. Banovetz, H .; Suzuki, R .; M. W
AYOUTH, Organometallics,
(1993), 12 , 4700. ) Was only reported.

【0004】[0004]

【課題を解決するための手段及び作用】本発明者は、光
変換材料、導電性材料として有用なポリシランにつき鋭
意検討を行った結果、下記一般式(2)で示される官能
基置換フェニルトリヒドロシランを脱水素縮合反応させ
ることにより、下記一般式(1)で示される官能基置換
フェニル基と側鎖水素基とを有するポリシランが比較的
温和な条件で得られることを見い出すと共に、この式
(1)のポリシランがヨウ素等の酸化性物質のドーピン
グにより高い導電性を示し、光変換材料、導電性材料と
して有用であり、更にセラミック前駆体としても有用で
あることを知見し、本発明をなすに至った。
Means and Actions for Solving the Problems The present inventor has conducted extensive studies on polysilane useful as a photoconversion material and a conductive material. As a result, the functional group-substituted phenyltrihydrosilane represented by the following general formula (2) It was found that the polysilane having a functional group-substituted phenyl group and a side chain hydrogen group represented by the following general formula (1) can be obtained under a relatively mild condition by subjecting the formula (1 ) Polysilane shows high conductivity by doping with an oxidizing substance such as iodine, is useful as a light conversion material and a conductive material, and is also useful as a ceramic precursor, and forms the present invention. I arrived.

【0005】[0005]

【化3】 (式中Xは、ハロゲン原子、アルキル基、フロロアルキ
ル基、アルコキシ基、置換もしくは非置換のアミノ基、
アシル基又はアルデヒド基を示し、また、Yは水素原
子、ハロゲン原子、アルキル基、フロロアルキル基、置
換もしくは非置換のアミノ基、アシル基又はアルデヒド
基を示す。又は、XとYとは合わせて2価のアルキレン
基又はヘテロアルキレン基を形成する。但し、Yが水素
原子のときはXはアルキル基及びフロロアルキル基では
ない。mは1〜5、kは0〜4の整数を示し、k+m=
1〜5であり、nは3以上の整数を示す。)
[Chemical 3] (In the formula, X represents a halogen atom, an alkyl group, a fluoroalkyl group, an alkoxy group, a substituted or unsubstituted amino group,
It represents an acyl group or an aldehyde group, and Y represents a hydrogen atom, a halogen atom, an alkyl group, a fluoroalkyl group, a substituted or unsubstituted amino group, an acyl group or an aldehyde group. Alternatively, X and Y together form a divalent alkylene group or heteroalkylene group. However, when Y is a hydrogen atom, X is not an alkyl group or a fluoroalkyl group. m is an integer of 1 to 5 and k is an integer of 0 to 4, and k + m =
1 to 5, and n represents an integer of 3 or more. )

【0006】従って、本発明は、上記一般式(1)で示
されるポリシラン、及び、上記一般式(2)のトリヒド
ロシランを脱水素縮合することを特徴とする上記一般式
(1)のポリシランの製造方法を提供する。
Therefore, the present invention provides a polysilane represented by the general formula (1) and a polysilane represented by the general formula (1), characterized by dehydrogenative condensation of the trihydrosilane represented by the general formula (2). A manufacturing method is provided.

【0007】以下、本発明につき更に詳しく説明する
と、本発明のポリシランは下記一般式(1)で示される
ものである。
The present invention will be described in more detail below. The polysilane of the present invention is represented by the following general formula (1).

【0008】[0008]

【化4】 [Chemical 4]

【0009】ここで、Xは、Cl,Br等のハロゲン原
子、メチル基、エチル基等の好ましくは炭素数1〜2
0、特に1〜6のアルキル基、トリフロロプロピル基等
のCm2m+1(mは好ましくは1〜20、特に1〜3)
で示されるフロロアルキル基、メトキシ基、エトキシ基
等の好ましくは炭素数1〜20、特に1〜6のアルコキ
シ基、置換もしくは非置換のアミノ基、アシル基、又は
アルデヒド基を示す。また、Yは、水素原子、上記と同
様のハロゲン原子、アルキル基、フロロアルキル基、置
換もしくは非置換のアミノ基、アシル基、又はアルデヒ
ド基を示す。この場合、Yが水素原子であるときはXは
アルキル基及びフロロアルキル基となることはない。な
お、置換アミノ基としては、アミノ基の水素原子の1個
又は2個が炭素数1〜20、特に1〜4のアルキル基で
置換されたアルキルアミノ基などが挙げられる。又は、
XとYとは合わせて2価のアルキレン基又はヘテロアル
キレン基を形成し、例えばフェニル基等の芳香環や複素
環を形成する。従って上記X−(C63)−Yは例えば
ナフチル基等の多核芳香環や複素環類を包含する。ま
た、mは1〜5、kは0〜4の整数を示し、k+m=1
〜5である。
Here, X is a halogen atom such as Cl or Br, a methyl group, an ethyl group or the like, preferably having 1 to 2 carbon atoms.
0, especially 1 to 6 C m F 2m + 1 such as an alkyl group or trifluoropropyl group (m is preferably 1 to 20, particularly 1 to 3)
And preferably a C1-20, especially C1-6 alkoxy group such as a fluoroalkyl group, a methoxy group, an ethoxy group, a substituted or unsubstituted amino group, an acyl group, or an aldehyde group. Y represents a hydrogen atom, the same halogen atom as described above, an alkyl group, a fluoroalkyl group, a substituted or unsubstituted amino group, an acyl group, or an aldehyde group. In this case, when Y is a hydrogen atom, X does not become an alkyl group or a fluoroalkyl group. Examples of the substituted amino group include an alkylamino group in which one or two hydrogen atoms of the amino group are substituted with an alkyl group having 1 to 20 carbon atoms, particularly 1 to 4 carbon atoms. Or
X and Y together form a divalent alkylene group or heteroalkylene group, for example, an aromatic ring or a heterocycle such as a phenyl group. Thus the X- (C 6 H 3) -Y include, for example, polynuclear aromatic or heterocyclic rings such as naphthyl. Further, m represents an integer of 1 to 5 and k represents an integer of 0 to 4, and k + m = 1.
~ 5.

【0010】また、式(1)において、nは3以上、好
ましくは6以上、より好ましくは10以上の整数であ
り、その上限は特に制限はないが、通常溶媒に可溶であ
る範囲で大きいことが好ましい。
Further, in the formula (1), n is an integer of 3 or more, preferably 6 or more, more preferably 10 or more, and the upper limit thereof is not particularly limited, but it is usually large as long as it is soluble in a solvent. It is preferable.

【0011】上記式(1)のポリシランの重量平均分子
量は400以上、特に600以上であることが、成膜性
の点から好ましい。
The weight average molecular weight of the polysilane of the above formula (1) is preferably 400 or more, particularly 600 or more from the viewpoint of film-forming property.

【0012】式(1)のポリシランは、下記一般式
(2)で示されるトリヒドロシランを脱水素縮合するこ
とによって得ることができる。
The polysilane of the formula (1) can be obtained by dehydrogenative condensation of trihydrosilane represented by the following general formula (2).

【0013】[0013]

【化5】 (但し、X,Y,m,kは上記と同様の意味を示す。)[Chemical 5] (However, X, Y, m, and k have the same meanings as above.)

【0014】ここで、式(2)のトリヒドロシランとし
ては、例えば、p−ジメチルアミノフェニルシラン、β
−シリルナフタレン、p−アニシルシラン、3,4−メ
チレンジオキシフェニルシランなどが挙げられる。
Here, as the trihydrosilane of the formula (2), for example, p-dimethylaminophenylsilane, β
Examples include -silylnaphthalene, p-anisylsilane, and 3,4-methylenedioxyphenylsilane.

【0015】上記トリヒドロシランの脱水素縮合反応
は、脱水素縮合反応用触媒を用い、室温又は加熱条件下
で行うことができる。触媒としては、一般の脱水素縮合
反応に用いられるいかなる触媒も用いることもできる
が、特にジルコノセン又はチタノセン系触媒が好まし
い。触媒の使用量は、通常の触媒量であり、シランに対
して0.001〜20重量%、特に0.01〜1重量%
とすることが好ましい。
The above dehydrogenative condensation reaction of trihydrosilane can be carried out at room temperature or under heating conditions using a catalyst for dehydrogenative condensation reaction. As the catalyst, any catalyst used in a general dehydrogenative condensation reaction can be used, but a zirconocene or titanocene-based catalyst is particularly preferable. The amount of the catalyst used is a usual amount of catalyst, and is 0.001 to 20% by weight, particularly 0.01 to 1% by weight, based on the silane.
It is preferable that

【0016】この反応には溶媒は必須ではないが、ヒド
ロシラン類と反応するおそれのない非プロトン性の溶
媒、例えばテトラヒドロフラン(THF)、トルエン、
ヘキサン等を用いることが好ましい。反応温度は0℃〜
200℃、特に室温〜110℃が好ましく、反応時間は
通常3〜240時間、特に12〜70時間である。
A solvent is not essential for this reaction, but an aprotic solvent that does not react with hydrosilanes, such as tetrahydrofuran (THF), toluene,
It is preferable to use hexane or the like. Reaction temperature is 0 ℃
The temperature is preferably 200 ° C., particularly room temperature to 110 ° C., and the reaction time is generally 3 to 240 hours, particularly 12 to 70 hours.

【0017】本発明の式(1)のポリシランは、セラミ
ック前駆体として使用されるほか、ヨウ素、塩化第二鉄
等の酸化性物質でドーピングすることにより10-2〜1
-5S/cm程度の高導電性を示すので、光電変換材
料、導電性材料として好適に用いられる。
The polysilane of the formula (1) according to the present invention is used as a ceramic precursor and is doped with an oxidizing substance such as iodine or ferric chloride to obtain a concentration of 10 -2 -1.
Since it has a high conductivity of about 0 −5 S / cm, it is suitably used as a photoelectric conversion material and a conductive material.

【0018】[0018]

【実施例】以下、実施例及び比較例を示し、本発明を具
体的に説明するが、本発明は下記の実施例に制限される
ものではない。
EXAMPLES The present invention will be specifically described below by showing Examples and Comparative Examples, but the present invention is not limited to the following Examples.

【0019】なお、以下のポリマーの平均分子量はGP
Cによるポリスチレン換算の重量平均分子量を示す。
The average molecular weights of the following polymers are GP
The polystyrene equivalent weight average molecular weight by C is shown.

【0020】〔実施例1〕p−(N,N−ジメチルアニ
リノ)シラン2.626g(17.35mmol)をT
HF中、下式に示すジルコノセン触媒3mgの存在下、
封管中で105℃、72時間反応させたところ、収率9
4.3%でMw=1330,Mn=1260の重合物が得
られた。
Example 1 2.626 g (17.35 mmol) of p- (N, N-dimethylanilino) silane was added to T
In HF, in the presence of 3 mg of a zirconocene catalyst represented by the following formula,
When the reaction was carried out at 105 ° C for 72 hours in a sealed tube, the yield was 9
A polymer of M w = 1330 and M n = 1260 was obtained at 4.3%.

【0021】[0021]

【化6】 [Chemical 6]

【0022】このポリマーは芳香族第3アミン、パラ置
換フェニル及びSi−H等の基本構造を保持しているこ
とが図1に示すIRスペクトルにより確かめられ、下記
式のポリシランであることが確認された。 IRスペクトル: 2973 C−H 2078 Si−H 1593,1508 p−置換芳香族C−C 1352 芳香族第3アミンC−N
It was confirmed by the IR spectrum shown in FIG. 1 that this polymer retains the basic structure of aromatic tertiary amine, para-substituted phenyl, Si--H, etc., and it was confirmed that the polymer was a polysilane of the following formula. It was IR spectrum: 2973 C-H 2078 Si-H 1593,1508 p-substituted aromatic C-C 1352 aromatic tertiary amine C-N.

【0023】[0023]

【化7】 [Chemical 7]

【0024】〔実施例2〕実施例1に準じて、p−アニ
シルシラン2.022g(14.62mmol)をTH
F中、ジルコノセン触媒2mgの存在下、封管中で10
5℃、72時間反応させたところ、収率87.3%でM
w=950,Mn=890の下記式で示されるポリシラン
が得られた。 IRスペクトル: 3059 芳香族C−H 2956,2835 C−H 2104 Si−H 1591,1498 p−置換芳香族C−C 1030 C−O−C
Example 2 According to Example 1, 2.022 g (14.62 mmol) of p-anisylsilane was added to TH.
10 mg in a sealed tube in the presence of 2 mg of zirconocene catalyst in F.
When reacted at 5 ° C. for 72 hours, the yield was 87.3% and M
A polysilane represented by the following formula with w = 950 and Mn = 890 was obtained. IR spectrum: 3059 aromatic C-H 2956,2835 C-H 2104 Si-H 1591,1498 p-substituted aromatic C-C 1030 C-O-C.

【0025】[0025]

【化8】 [Chemical 8]

【0026】〔実施例3〕実施例1に準じて、β−シリ
ルナフタレン1.225g(7.74mmol)をTH
F中、ジルコノセン触媒4mgの存在下、封管中で10
5℃、72時間反応させたところ、収率90.8%でM
w=1170,Mn=1140の下記式で示されるポリシ
ランが得られた。 IRスペクトル: 2080 Si−H 850,814,740 β−置換ナフタレンC−H
Example 3 According to Example 1, 1.225 g (7.74 mmol) of β-silylnaphthalene was added to TH.
10 mg in a sealed tube in the presence of 4 mg of zirconocene catalyst in F.
When reacted at 5 ° C for 72 hours, the yield was 90.8% and M
A polysilane represented by the following formula with w = 1170 and M n = 1140 was obtained. IR spectrum: 2080 Si-H 850,814,740 β-substituted naphthalene C-H

【0027】[0027]

【化9】 [Chemical 9]

【0028】〔実施例4〕実施例1に準じて、p−フロ
ロフェニルシラン4.595g(36.4mmol)を
THF/キシレンの1:1の混合溶媒中、ジルコノセン
触媒3mgの存在下、封管中で105℃、72時間反応
させたところ、収率88.46%でMw=940,Mn
900の下記式で示されるポリシランが得られた。 IRスペクトル: 2960,2874 C−H 2127 Si−H 1588,1496 p−置換芳香族C−C 1235 芳香族C−F
Example 4 According to Example 1, 4.595 g (36.4 mmol) of p-fluorophenylsilane in a 1: 1 mixed solvent of THF / xylene in the presence of 3 mg of a zirconocene catalyst was sealed. When the reaction was carried out at 105 ° C. for 72 hours, the yield was 88.46% and M w = 940, M n =
A polysilane represented by the following formula of 900 was obtained. IR spectrum: 2960,2874 C-H 2127 Si-H 1588,1496 p-substituted aromatic C-C 1235 aromatic C-F.

【0029】[0029]

【化10】 [Chemical 10]

【0030】〔実施例5〕実施例1に準じて、3,4−
メチレンジオキシフェニルシラン3.789g(24.
9mmol)をTHF/キシレンの1:1の混合溶媒
中、ジルコノセン触媒4mgの存在下、封管中で105
℃、72時間反応させたところ、収率72%でMw=8
40,Mn=810の下記式で示されるポリシランが得
られた。
[Embodiment 5] In accordance with Embodiment 1, 3,4-
3.789 g of methylenedioxyphenylsilane (24.
105 mmol) in a 1: 1 mixture of THF / xylene in the presence of 4 mg of zirconocene catalyst in a sealed tube.
When the reaction was performed at 72 ° C for 72 hours, the yield was 72% and M w = 8.
As a result, a polysilane represented by the following formula with 40 and M n = 810 was obtained.

【0031】[0031]

【化11】 IRスペクトル: 2963,2900 C−H 2157 Si−H 1502,1480 置換芳香族C−C 1262,1235 C−O−C[Chemical 11] IR spectrum: 2963,2900 C-H 2157 Si-H 1502,1480 Substituted aromatic C-C 1262,1235 C-O-C.

【0032】〔参考例1〕実施例1のポリ(p−ジメチ
ルアミノフェニルシラン)(Mw=1170,Mn=11
30)のTHF溶液を基盤上にスピンコートし、気相ヨ
ウ素ドーピングを行いながら導電率を測定したところ、
7×10-3S/cmであった。
Reference Example 1 Poly (p-dimethylaminophenylsilane) of Example 1 (M w = 1170, M n = 11)
The THF solution of 30) was spin-coated on a substrate, and the conductivity was measured while performing vapor-phase iodine doping.
It was 7 × 10 −3 S / cm.

【0033】〔参考例2〕実施例3のポリ(β−ナフチ
ルシラン)(Mw=1170,Mn=1140)のTHF
溶液を基盤上にスピンコートし、気相ヨウ素ドーピング
を行いながら導電率を測定したところ、4×10-4S/
cmであった。
Reference Example 2 Poly (β-naphthylsilane) of Example 3 (M w = 1170, M n = 1140) THF
The solution was spin-coated on a substrate, and the conductivity was measured while performing vapor-phase iodine doping. The result was 4 × 10 -4 S /
It was cm.

【0034】なお、電気伝導度の測定は、スピンコート
したフィルムを気相ドーピングをしながら4端子法にて
直流抵抗の測定を行い、安定値を得たところで導電率の
算出に用いて行った。
The electrical conductivity was measured by measuring the direct current resistance by a four-terminal method while vapor phase doping the spin-coated film, and obtaining a stable value and then using it for calculating the electrical conductivity. .

【0035】[0035]

【発明の効果】本発明のポリシランは、ドーピングによ
り高導電性を示し、光電変換材料、導電性材料等として
好適に用いられる。また、本発明の製造方法によれば、
比較的温和な条件で上記ポリシランを高収率において製
造し得る。
EFFECT OF THE INVENTION The polysilane of the present invention exhibits high conductivity by doping, and is suitably used as a photoelectric conversion material, a conductive material and the like. Further, according to the manufacturing method of the present invention,
The polysilane can be produced in high yield under relatively mild conditions.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1のポリシランの赤外線吸収スペクトル
である。
1 is an infrared absorption spectrum of polysilane of Example 1. FIG.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 福島 基夫 神奈川県川崎市高津区坂戸3丁目2番1号 信越化学工業株式会社コーポレートリサ ーチセンター内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Motoo Fukushima 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, Kanagawa Shin-Etsu Chemical Co., Ltd. Corporate Research Center

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(1)で示されるポリシラ
ン。 【化1】 (式中Xは、ハロゲン原子、アルキル基、フロロアルキ
ル基、アルコキシ基、置換もしくは非置換のアミノ基、
アシル基又はアルデヒド基を示し、また、Yは水素原
子、ハロゲン原子、アルキル基、フロロアルキル基、置
換もしくは非置換のアミノ基、アシル基又はアルデヒド
基を示す。又は、XとYとは合わせて2価のアルキレン
基又はヘテロアルキレン基を形成する。但し、Yが水素
原子のときはXはアルキル基及びフロロアルキル基では
ない。mは1〜5、kは0〜4の整数を示し、k+m=
1〜5であり、nは3以上の整数を示す。)
1. A polysilane represented by the following general formula (1). [Chemical 1] (In the formula, X represents a halogen atom, an alkyl group, a fluoroalkyl group, an alkoxy group, a substituted or unsubstituted amino group,
It represents an acyl group or an aldehyde group, and Y represents a hydrogen atom, a halogen atom, an alkyl group, a fluoroalkyl group, a substituted or unsubstituted amino group, an acyl group or an aldehyde group. Alternatively, X and Y together form a divalent alkylene group or heteroalkylene group. However, when Y is a hydrogen atom, X is not an alkyl group or a fluoroalkyl group. m is an integer of 1 to 5 and k is an integer of 0 to 4, and k + m =
1 to 5, and n represents an integer of 3 or more. )
【請求項2】 下記一般式(2)で示されるトリヒドロ
シランを脱水素縮合することを特徴とする請求項1記載
のポリシランの製造方法。 【化2】 (但し、式中X及びY並びにm及びkは上記と同様の意
味を示す。)
2. The method for producing a polysilane according to claim 1, wherein the trihydrosilane represented by the following general formula (2) is dehydrogenated and condensed. [Chemical 2] (However, in the formula, X and Y and m and k have the same meanings as described above.)
JP06335885A 1994-03-11 1994-12-22 Polysilane and method for producing the same Expired - Fee Related JP3116759B2 (en)

Priority Applications (1)

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Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6797894 1994-03-11
JP6-67978 1994-03-11
JP06335885A JP3116759B2 (en) 1994-03-11 1994-12-22 Polysilane and method for producing the same

Publications (2)

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JPH07300529A true JPH07300529A (en) 1995-11-14
JP3116759B2 JP3116759B2 (en) 2000-12-11

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Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997046605A1 (en) * 1996-06-07 1997-12-11 Osaka Gas Company Limited Polysilanes and positive hole transporting materials
JP2009102224A (en) * 2003-06-13 2009-05-14 Jsr Corp Method for forming silicon film and composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997046605A1 (en) * 1996-06-07 1997-12-11 Osaka Gas Company Limited Polysilanes and positive hole transporting materials
JP2009102224A (en) * 2003-06-13 2009-05-14 Jsr Corp Method for forming silicon film and composition

Also Published As

Publication number Publication date
JP3116759B2 (en) 2000-12-11

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