JPH07284738A - Washing apparatus - Google Patents

Washing apparatus

Info

Publication number
JPH07284738A
JPH07284738A JP8021794A JP8021794A JPH07284738A JP H07284738 A JPH07284738 A JP H07284738A JP 8021794 A JP8021794 A JP 8021794A JP 8021794 A JP8021794 A JP 8021794A JP H07284738 A JPH07284738 A JP H07284738A
Authority
JP
Japan
Prior art keywords
washing
cleaning
pipe
cleaned
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8021794A
Other languages
Japanese (ja)
Inventor
Masamichi Suzuki
雅道 鈴木
Masayuki Nagaie
正之 長家
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP8021794A priority Critical patent/JPH07284738A/en
Publication of JPH07284738A publication Critical patent/JPH07284738A/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To enable effective local washing in good yield by providing a washing apparatus with a washing device consisting of an inner pipe supplying a washing soln. under constant pressure and an outer peripheral pipe recovering the washing soln. by recovery force larger than supply force and a transfer mechanism moving the washing device and a surface to be washed in a contact state. CONSTITUTION:The washing apparatus is constituted of a washing device 10 consisting of an inner pipe 11 supplying a washing soln. under a specific pressure and an outer peripheral pipe 12 recovering the washing soln. by recovery force larger than the supply force of the washing soln. of the inner pipe 11, a transfer mechanism 20 moving the surface of an object 30 to be washed and the washing device 10 in an X-Y direction in a contact state and a pump supplying and recovering the washing soln. When the supply pressure of the washing soln. from the inner pipe 11 is set, for example, to 0.7kg/cm<2> or more and the suction and recovery pressure of the washing soln. of the outer peripheral pipe 12 is set to 1.2 times the supply pressure or more to recover the washing soln., air bubbles are formed on the surface to be washed and a cavitation phenomenon is generated to wash the object to be washed. Since this washing apparatus is constituted so as to be automatically subjected to ON/OFF control, only a necessary part can be selectively washed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶ディスプレィ用カ
ラーフィルタ基板、フォトマスク、半導体ウェハー等の
電子部品の洗浄装置に関し、特には、これら電子部品の
周辺部等の部分洗浄用の洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning electronic parts such as color filter substrates for liquid crystal displays, photomasks and semiconductor wafers, and more particularly to a cleaning apparatus for cleaning the peripheral parts of these electronic parts. .

【0002】[0002]

【従来の技術】従来、液晶ディスプレィ用カラーフィル
タ基板、フォトマスク等の電子部品の洗浄装置は、これ
ら電子部品の全面を洗浄する装置であって、この洗浄装
置を用いて洗浄を行うと、例えば、カラーフィルタ基板
中央のフィルター膜を疵つけることがあり、電子部品を
製造する上で、歩留りに影響を与えていた。また、手作
業でカラーフィルタ基板の周辺部のシール部等を局所的
に洗浄することも可能であるが、極めて能率の悪い作業
であった。
2. Description of the Related Art Conventionally, an apparatus for cleaning electronic parts such as a color filter substrate for a liquid crystal display and a photomask is an apparatus for cleaning the entire surface of these electronic parts. In some cases, the filter film in the center of the color filter substrate was flawed, which affected the yield in the production of electronic components. Further, although it is possible to locally wash the seal portion and the like in the peripheral portion of the color filter substrate by hand, the work is extremely inefficient.

【0003】[0003]

【発明が解決しようとする課題】本発明は、液晶ディス
プレィ用カラーフィルタ基板等の電子部品用の洗浄装置
の上記のような問題点を解決し、例えば部品中央のフィ
ルター膜面に影響を与えないように、カラーフィルター
の周辺部のシール部のみを選択的にかつ自動的に洗浄で
き、従って効果的かつ歩留り良く局所的洗浄のできる洗
浄装置を提供することを課題とする。
SUMMARY OF THE INVENTION The present invention solves the above problems of a cleaning apparatus for electronic parts such as color filter substrates for liquid crystal displays, and does not affect the filter film surface in the center of the parts, for example. As described above, it is an object of the present invention to provide a cleaning device that can selectively and automatically clean only the peripheral seal portion of a color filter, and therefore can effectively and locally perform local cleaning.

【0004】[0004]

【課題を解決するための手段】本発明に於いて上記目的
を達成するために、被洗浄体の周辺部等局所表面を洗浄
する洗浄装置であって、洗浄液を一定の圧力で供給する
内管と、該内管の洗浄液供給力より大きい回収力で洗浄
液を回収する外周管とからなる洗浄器と、前記被洗浄体
の被洗浄面と洗浄器とを、接触状態で相対的にX−Y方
向に移動させる担送機構とからなることを特徴とする洗
浄装置としたものである。
In order to achieve the above object in the present invention, there is provided a cleaning device for cleaning a local surface such as a peripheral portion of an object to be cleaned, the inner tube supplying a cleaning liquid at a constant pressure. And a cleaning device including an outer peripheral pipe that recovers the cleaning liquid with a recovery power larger than the cleaning liquid supply power of the inner pipe, and the surface to be cleaned of the object to be cleaned and the cleaning device are relatively in contact with each other in the XY direction. And a transporting mechanism for moving the cleaning device in a predetermined direction.

【0005】[0005]

【作用】上記のように本発明によれば、洗浄器は、洗浄
液を一定の圧力で供給する内管と、該内管の洗浄液供給
力より大きい回収力で洗浄液を回収する外周管とを有し
ているので、被洗浄面を自動的に、清浄に洗浄すること
ができる。洗浄装置の洗浄器が、被洗浄体の被洗浄面と
接触状態で相対的にX−Y方向に移動させる機構を有し
ているので、必要な洗浄面だけを洗浄することができ
る。また、担持体に洗浄器が担持されているので、担持
体で担持された洗浄器を自由に移動させることができ、
あるいは、洗浄器は固定アームにより固定され、被洗浄
体は自由に移動させることができ、被洗浄体の周辺部等
局所表面を洗うことができる。
As described above, according to the present invention, the cleaning device has the inner pipe for supplying the cleaning liquid at a constant pressure and the outer peripheral pipe for recovering the cleaning liquid with a recovery force larger than the cleaning liquid supply force of the inner pipe. Therefore, the surface to be cleaned can be cleaned automatically and cleanly. Since the cleaning device of the cleaning device has a mechanism for moving in the XY direction relatively in contact with the surface to be cleaned of the object to be cleaned, only the necessary cleaning surface can be cleaned. Further, since the washing device is carried on the carrier, the washing device carried by the carrier can be freely moved,
Alternatively, the cleaning device is fixed by the fixed arm, and the object to be cleaned can be freely moved, and the local surface such as the peripheral portion of the object to be cleaned can be washed.

【0006】[0006]

【実施例】以下実施例により本発明を詳細に説明する。
被洗浄体の被洗浄面と洗浄器とを、接触状態でX−Y方
向に移動させる担送機構には、洗浄器をX−Y方向に移
動させる機構と、被洗浄体をX−Y方向に移動させる機
構との2つがあるが、各々の機構について説明する。
The present invention will be described in detail with reference to the following examples.
The transport mechanism for moving the surface to be cleaned of the object to be cleaned and the cleaning device in the XY direction in a contact state includes a mechanism for moving the cleaning device in the XY direction and a member to be cleaned in the XY direction. There are two mechanisms, namely, a mechanism for moving the mechanism to each other. Each mechanism will be described.

【0007】〈実施例1〉洗浄器がX−Y方向に移動す
る機構を有する洗浄装置の場合。図1および図2に示す
ように、本洗浄装置は、洗浄液を一定の圧力で供給する
洗浄液供給管である内管(11)と、該内管(11)の
洗浄液供給力より大きい回収力で洗浄液を回収する洗浄
液回収管である外周管(12)とからなる洗浄器(1
0)と、被洗浄体(30)の被洗浄面と洗浄器(10)
とを、接触状態でX−Y方向に移動させる担送機構(2
0)と、洗浄液を供給および回収するためのロータリー
式ポンプ(図示してない)等からなる。
<Embodiment 1> In the case of a cleaning device having a mechanism in which the cleaning device moves in the XY directions. As shown in FIG. 1 and FIG. 2, the present cleaning apparatus uses an inner pipe (11) which is a cleaning liquid supply pipe for supplying a cleaning liquid at a constant pressure, and a recovery force larger than the cleaning liquid supply force of the inner pipe (11). A cleaning device (1) including an outer peripheral pipe (12) which is a cleaning liquid recovery pipe for recovering the cleaning liquid
0), the cleaning surface of the cleaning object (30) and the cleaning device (10)
And a carrying mechanism (2 for moving the and in the XY direction in a contact state.
0) and a rotary pump (not shown) for supplying and collecting the cleaning liquid.

【0008】担送機構(20)は、洗浄器を担持する担
持体(27)と、この担持体を載せてX方向の左右に移
動させるX軸レール(24)および担持体を左右に移動
させるワイヤー(25)と、X方向と直交するY方向に
移動させる支軸(23)等からなっている。その詳細な
構造はつぎの通りである。
The carrier mechanism (20) moves the carrier (27) carrying the cleaning device, the X-axis rail (24) for mounting the carrier and moving it to the left and right in the X direction, and the carrier to the left and right. It comprises a wire (25) and a support shaft (23) which moves in the Y direction orthogonal to the X direction. The detailed structure is as follows.

【0009】洗浄器(10)を担持した担持体(27)
がX軸レール(24)に載せられている。また、この担
持体(27)の端にはワイヤー(25)が取り付けられ
ており、このワイヤーの先端は、X軸レール(24)の
両端に設置されている回転輪(22,22)の片方を通
って、もう片方の回転輪(22)に達し、この回転輪
(22)を通って、ワイヤー(25)が取り付けられて
いない方の担持体(27)の端に繋がれている。この回
転輪(22)が駆動装置(21)からの動力によって回
転すると、担持体(27)はワイヤー(25)を介し
て、X軸レール(24)に沿って移動できる構造を有し
ている。X軸レール(24)の両端に設置されている回
転輪(22,22)近傍から、X軸レール(24)と直
交するY軸方向に向かって、支軸(23,23)が設け
られており、一方の支軸(23)の近傍には送りネジ
(26)が形成されている。この送りネジ(26)を前
後に回転させることにより、担持体(27)はY軸方向
にも移動させることが可能な構造を有している。そし
て、洗浄器(10)は被洗浄体(30)の全面を覆うこ
とができる構造を有している。なお、洗浄器(10)の
先端には、フェルト、布地、毛等からなるラビング体
(13)を付設してもよい。ラビング体の役割は洗浄範
囲の精度向上と洗浄液の回収効率向上とキャビテーショ
ンの効果の向上である。
A carrier (27) carrying a cleaner (10)
Are mounted on the X-axis rail (24). A wire (25) is attached to the end of the carrier (27), and the tip of the wire is one of the rotating wheels (22, 22) installed at both ends of the X-axis rail (24). To the other rotary wheel (22), and through this rotary wheel (22) is connected to the end of the carrier (27) to which the wire (25) is not attached. When the rotating wheel (22) is rotated by the power from the drive unit (21), the carrier (27) has a structure capable of moving along the X-axis rail (24) via the wire (25). . Support shafts (23, 23) are provided from the vicinity of the rotating wheels (22, 22) installed at both ends of the X-axis rail (24) toward the Y-axis direction orthogonal to the X-axis rail (24). A feed screw (26) is formed near one of the support shafts (23). The carrier (27) has a structure that can be moved also in the Y-axis direction by rotating the feed screw (26) back and forth. The cleaning device (10) has a structure capable of covering the entire surface of the object to be cleaned (30). A rubbing body (13) made of felt, cloth, bristles or the like may be attached to the tip of the washer (10). The role of the rubbing body is to improve the accuracy of the cleaning range, improve the efficiency of collecting the cleaning liquid, and improve the effect of cavitation.

【0010】被洗浄体の洗浄にあたっては、使用する洗
浄液の種類は、水、アルカリ性水溶液、中性洗剤等水系
のものが良く、内管(洗浄液供給管)(11)と外周管
(洗浄液回収管)(12)の口径等の望ましい寸法は図
2に示すように、内管の内径をa,外周管の内径をb,
洗浄器の先端は内管の方が少し凹んだ構造を形成してい
るが、この内管と外周管の段差をc,とすると、各々の
望ましい寸法範囲は洗浄する幅に応じて 2 mm≦a≦ 6 mm a×1.5 mm≦b≦a×3.0 mm a×0.3 mm≦c≦a×1.5 mm が良く、内管(洗浄液供給管)(11)からの供給液圧
を0.7kg/cm2 以上にし、外周管(洗浄液回収
管)(12)からの吸引回収液圧を供給液圧の1.2倍
以上にして、洗浄液を回収すると、被洗浄体の被洗浄面
に気泡が作られ、キャビテーション現象が発生し、この
現象を利用して被洗浄体の洗浄が行われる。洗浄装置は
自動的にON-OFF制御が可能な機構を採用しているので、
必要部分だけ選択的に洗浄することができる。すなわ
ち、周辺部等の局所表面を洗浄することができる。
When cleaning the object to be cleaned, the type of cleaning liquid used is preferably water, an alkaline aqueous solution, a neutral detergent such as water, and an inner pipe (cleaning liquid supply pipe) (11) and an outer peripheral pipe (cleaning liquid recovery pipe). ) Desirable dimensions such as the diameter of (12) are shown in FIG. 2, where the inner diameter of the inner tube is a, the inner diameter of the outer tube is b,
The tip of the washer has a structure in which the inner pipe is slightly recessed. If the step between the inner pipe and the outer pipe is c, the desired size range for each is 2 mm ≤ a ≦ 6 mm a × 1.5 mm ≦ b ≦ a × 3.0 mm a × 0.3 mm ≦ c ≦ a × 1.5 mm is good, and the supply liquid pressure from the inner pipe (cleaning liquid supply pipe) (11) is 0.7 kg / cm. When the cleaning liquid is recovered by setting the suction liquid recovery pressure from the outer peripheral pipe (cleaning liquid recovery pipe) (12) to 1.2 times the supply liquid pressure or more, bubbles are created on the surface to be cleaned of the object to be cleaned. A cavitation phenomenon occurs, and this phenomenon is used to clean an object to be cleaned. Since the cleaning device has a mechanism that can automatically control ON-OFF,
Only the required portion can be selectively washed. That is, the local surface such as the peripheral portion can be cleaned.

【0011】〈実施例2〉被洗浄体がX−Y方向に移動
する機構を有する洗浄装置の場合。図3に示すように、
本洗浄装置は、洗浄液を一定の圧力で供給する洗浄液供
給管である内管(51)と、該内管(51)の洗浄液供
給力より大きい回収力で洗浄液を回収する洗浄液回収管
である外周管(52)とからなる洗浄器(50)と、被
洗浄体(70)の被洗浄面と洗浄器(50)とを、接触
状態でX−Y方向に移動させる担送機構(60)と、洗
浄液を供給および回収するためのロータリー式ポンプ
(図示してない)等からなる。
<Embodiment 2> In the case of a cleaning apparatus having a mechanism in which an object to be cleaned moves in the XY directions. As shown in FIG.
The present cleaning apparatus includes an inner pipe (51) which is a cleaning liquid supply pipe for supplying the cleaning liquid at a constant pressure, and an outer periphery which is a cleaning liquid recovery pipe for recovering the cleaning liquid with a recovery force larger than the cleaning liquid supply force of the inner pipe (51). A cleaning device (50) including a pipe (52), a carrier mechanism (60) for moving the surface to be cleaned of the cleaning object (70) and the cleaning device (50) in the XY directions in a contact state. , A rotary pump (not shown) for supplying and collecting the cleaning liquid.

【0012】担送機構(60)は、被洗浄体(70)を
X方向に移動させるXステージ(62)と、Xステージ
の上に設けられた、X方向と直交するY方向に移動可能
な、Xステージよりも一回り小さいYステージ(63)
等からなっている。その詳細な構造はつぎの通りであ
る。
The carrier mechanism (60) is provided with an X stage (62) for moving the body to be cleaned (70) in the X direction, and is movable on the X stage in the Y direction orthogonal to the X direction. , Y stage which is slightly smaller than the X stage (63)
Etc. The detailed structure is as follows.

【0013】平盤なXステージ(62)には、このXス
テージ(62)をX方向に移動させるための駆動装置
(61)と、この駆動装置(61)の動きをXステージ
に伝える駆動軸(66)と、XステージをX方向に導く
2本のX軸レール(64)等が具備され、このXステー
ジ(62)の上に、X方向と直交するY方向に移動可能
な、Xステージよりも一回り小さい大きさの平盤をした
Yステージ(63)が、このYステージ(63)をY方
向に移動させる駆動装置(67)と、この駆動装置の動
力をYステージ(63)に伝える駆動軸(68)と、Y
ステージをY方向に導く2本のY軸レール(65)等が
具備されて、設置され、このYステージ(63)の上は
被洗浄体(70)が固定できるように工夫されている。
The flat X stage (62) has a drive unit (61) for moving the X stage (62) in the X direction, and a drive shaft for transmitting the movement of the drive unit (61) to the X stage. (66) and two X-axis rails (64) for guiding the X stage in the X direction, etc., and an X stage movable on the X stage (62) in the Y direction orthogonal to the X direction. The Y stage (63), which is a flat plate having a size slightly smaller than that of the Y stage (63), drives the Y stage (63) in the Y direction and transfers the power of the drive unit to the Y stage (63). Transmission drive shaft (68) and Y
Two Y-axis rails (65) for guiding the stage in the Y direction are provided and installed, and the Y stage (63) is designed so that the body (70) to be cleaned can be fixed.

【0014】被洗浄体(70)の洗浄は、つぎの通り行
う。すなわち、XステージとYステージとを自在に移動
させることによって、固定アーム(53)で一定部分に
固定された洗浄器(50)で、被洗浄体(70)の全
面、あるいは一部をラビングして行う。洗浄の際の諸条
件は、前記、洗浄器がXーY方向に移動する機構を有す
る洗浄装置の場合と同様である。
The object to be cleaned (70) is cleaned as follows. That is, by freely moving the X stage and the Y stage, the cleaning device (50) fixed to a fixed portion by the fixed arm (53) rubs the entire surface or a part of the object to be cleaned (70). Do it. Various conditions at the time of cleaning are the same as those in the case of the above-described cleaning device having a mechanism in which the cleaning device moves in the XY directions.

【0015】[0015]

【発明の効果】上記のように本発明によれば、被洗浄体
の局所表面を選択的に、かつ、自動的に洗浄することが
できるため、効率的で歩留りの良い洗浄が可能となり、
ひいては洗浄装置の小型化、ランニングコストの低減が
図れるという効果がある。
As described above, according to the present invention, since the local surface of the object to be cleaned can be selectively and automatically cleaned, efficient and high-yield cleaning can be performed.
As a result, the cleaning device can be downsized and the running cost can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す、横から見た説明図で
ある。
FIG. 1 is a side view illustrating an embodiment of the present invention.

【図2】本発明の同実施例を示す、洗浄器の先端部分の
拡大した説明図である。
FIG. 2 is an enlarged explanatory view of the tip portion of the cleaning device showing the embodiment of the present invention.

【図3】本発明の別の実施例を示す、斜視説明図であ
る。
FIG. 3 is a perspective explanatory view showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

10‥‥洗浄器 11‥‥内管(洗浄液供給管) 12‥‥外周管(洗浄液回収管) 13‥‥ラビング体 20‥‥担送機構 21‥‥駆動装置 22‥‥回転輪 23‥‥支軸 24‥‥X軸レール 25‥‥ワイヤー 26‥‥送りネジ 27‥‥担持体 30‥‥被洗浄体 50‥‥洗浄器 51‥‥内管(洗浄液供給管) 52‥‥外周管(洗浄液回収管) 53‥‥固定アーム 60‥‥担送機構 61‥‥駆動装置 62‥‥Xステージ 63‥‥Yステージ 64‥‥X軸レール 65‥‥Y軸レール 66‥‥駆動軸 67‥‥駆動装置 68‥‥駆動軸 70‥‥被洗浄体 a‥‥内管内径 b‥‥外周管内径 c‥‥内管と外周管の段差 10: Cleaning device 11: Inner pipe (cleaning liquid supply pipe) 12: Outer peripheral pipe (cleaning liquid recovery pipe) 13: Rubbing body 20: Carrying mechanism 21: Drive device 22: Rotating wheel 23: Support Shaft 24 X-axis rail 25 Wire 26 Feed screw 27 Carrier 30 Washer 50 Washer 51 Inner pipe (washing liquid supply pipe) 52 Outer pipe (washing liquid recovery) Pipe 53) Fixed arm 60 Carrying mechanism 61 Drive unit 62 X stage 63 Y stage 64 X axis rail 65 Y axis rail 66 Drive shaft 67 Drive unit 68 ... Drive shaft 70 ... Cleaning object a ... Inner tube inner diameter b ... Outer peripheral tube inner diameter c ... Step between inner tube and outer tube

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】被洗浄体の周辺部等局所表面を洗浄する洗
浄装置であって、 洗浄液を一定の圧力で供給する内管と、該内管の洗浄液
供給力より大きい回収力で洗浄液を回収する外周管とか
らなる洗浄器と、 前記被洗浄体の被洗浄面と洗浄器とを、接触状態で相対
的にX−Y方向に移動させる担送機構とからなることを
特徴とする洗浄装置。
1. A cleaning device for cleaning a local surface such as a peripheral portion of an object to be cleaned, wherein the inner pipe supplies the cleaning liquid at a constant pressure, and the cleaning liquid is recovered with a recovery force larger than the cleaning liquid supply force of the inner pipe. A cleaning device comprising: a cleaning device including an outer peripheral pipe, and a carrier mechanism for relatively moving the surface to be cleaned of the cleaning target and the cleaning device in the XY directions in a contact state. .
JP8021794A 1994-04-19 1994-04-19 Washing apparatus Pending JPH07284738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8021794A JPH07284738A (en) 1994-04-19 1994-04-19 Washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8021794A JPH07284738A (en) 1994-04-19 1994-04-19 Washing apparatus

Publications (1)

Publication Number Publication Date
JPH07284738A true JPH07284738A (en) 1995-10-31

Family

ID=13712218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8021794A Pending JPH07284738A (en) 1994-04-19 1994-04-19 Washing apparatus

Country Status (1)

Country Link
JP (1) JPH07284738A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10163153A (en) * 1996-11-29 1998-06-19 Tadahiro Omi Liquid-saving liquid-supply nozzle used for wet treatment including cleaning, etching, development, stripping, etc., as well as apparatus and method for wet treatment
JPH10177978A (en) * 1996-12-18 1998-06-30 Tadahiro Omi Liquid-saving liquid feed nozzle, liquid-saving liquid feed nozzle device, and wet processing device for wet processing such as cleaning, etching, development, separation and the like
WO2001050505A3 (en) * 2000-01-03 2002-01-31 Semitool Inc A microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece
US7313462B2 (en) 2003-06-06 2007-12-25 Semitool, Inc. Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces
US7390382B2 (en) 2003-07-01 2008-06-24 Semitool, Inc. Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods
US7393439B2 (en) 2003-06-06 2008-07-01 Semitool, Inc. Integrated microfeature workpiece processing tools with registration systems for paddle reactors
JP2012212032A (en) * 2011-03-31 2012-11-01 Toppan Printing Co Ltd Cleaning device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10163153A (en) * 1996-11-29 1998-06-19 Tadahiro Omi Liquid-saving liquid-supply nozzle used for wet treatment including cleaning, etching, development, stripping, etc., as well as apparatus and method for wet treatment
JPH10177978A (en) * 1996-12-18 1998-06-30 Tadahiro Omi Liquid-saving liquid feed nozzle, liquid-saving liquid feed nozzle device, and wet processing device for wet processing such as cleaning, etching, development, separation and the like
US7524406B2 (en) 2000-01-03 2009-04-28 Semitool, Inc. Processing apparatus including a reactor for electrochemically etching microelectronic workpiece
WO2001050505A3 (en) * 2000-01-03 2002-01-31 Semitool Inc A microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece
US6547937B1 (en) 2000-01-03 2003-04-15 Semitool, Inc. Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece
US6773559B2 (en) 2000-01-03 2004-08-10 Semitool, Inc. Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece
US7294244B2 (en) 2000-01-03 2007-11-13 Semitool, Inc. Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece
US7313462B2 (en) 2003-06-06 2007-12-25 Semitool, Inc. Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces
US7393439B2 (en) 2003-06-06 2008-07-01 Semitool, Inc. Integrated microfeature workpiece processing tools with registration systems for paddle reactors
US7371306B2 (en) 2003-06-06 2008-05-13 Semitool, Inc. Integrated tool with interchangeable wet processing components for processing microfeature workpieces
US7390382B2 (en) 2003-07-01 2008-06-24 Semitool, Inc. Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods
US7390383B2 (en) 2003-07-01 2008-06-24 Semitool, Inc. Paddles and enclosures for enhancing mass transfer during processing of microfeature workpieces
JP2012212032A (en) * 2011-03-31 2012-11-01 Toppan Printing Co Ltd Cleaning device

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