JPH0728044A - Production of liquid crystal display element - Google Patents
Production of liquid crystal display elementInfo
- Publication number
- JPH0728044A JPH0728044A JP17323693A JP17323693A JPH0728044A JP H0728044 A JPH0728044 A JP H0728044A JP 17323693 A JP17323693 A JP 17323693A JP 17323693 A JP17323693 A JP 17323693A JP H0728044 A JPH0728044 A JP H0728044A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- film
- liquid crystal
- insulating layer
- sol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、表示が均質であり、製
造安定性に優れた液晶表示素子の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device which has a uniform display and is excellent in manufacturing stability.
【0002】[0002]
【従来の技術】電極間に液晶層が挟持された構造からな
る液晶表示素子においては、導電性の異物に起因する電
極間ショートを防ぐため、絶縁層の形成が不可欠となっ
ている。従来の液晶表示素子における電極上の絶縁層と
しては、SiO2 などのスパッタ膜や、アルコキシシラ
ンを加水分解したゾル(例えばNTL6008、日産化
学社製)をコーティングした後焼成しSiO2を主成分
とする膜を用いていた。2. Description of the Related Art In a liquid crystal display element having a structure in which a liquid crystal layer is sandwiched between electrodes, it is essential to form an insulating layer in order to prevent a short circuit between electrodes due to a conductive foreign substance. As an insulating layer on an electrode in a conventional liquid crystal display device, a sputtered film such as SiO 2 or a sol obtained by hydrolyzing an alkoxysilane (for example, NTL6008, manufactured by Nissan Kagaku Co., Ltd.) is coated and baked, and SiO 2 is used as a main component It was using a membrane.
【0003】[0003]
【発明が解決しようとする課題】しかし、前記従来の絶
縁膜においては、SiO2を主成分としており屈折率が
1.45前後である。これは透明電極(ITO)および
配向膜(ポリイミド等)の1.6〜1.7に比べ極めて
小さいため膜界面において光の反射や干渉が生じそのた
めにITO透明電極が画面上に見えてしまい表示外観が
悪くなるという課題があった。またSiO2 とTiO2
の混合膜を形成し高屈折率化することによりある程度の
改善が確認されているが、TiO2 を添加するため耐ア
ルカリ性に難がありアルカリ洗浄工程での膜減りにより
十分な強度が得られないという課題も有する。However, in the above-mentioned conventional insulating film, SiO 2 is the main component and the refractive index is around 1.45. This is much smaller than 1.6 to 1.7 of the transparent electrode (ITO) and the alignment film (polyimide etc.), so that light reflection or interference occurs at the film interface, so that the ITO transparent electrode can be seen on the screen and displayed. There was a problem that the appearance deteriorated. In addition, SiO 2 and TiO 2
It has been confirmed that a certain degree of improvement can be achieved by forming a mixed film of and increasing the refractive index, but due to the addition of TiO 2 , the alkali resistance is difficult, and sufficient strength cannot be obtained due to film reduction in the alkali cleaning step. There is also a problem.
【0004】本発明の目的は、基板ガラス上に形成され
る膜の屈折率を最適化すると共にプロセス流動安定性に
優れた液晶表示素子の製造方法を提供することによっ
て、上記の課題を解決することにある。An object of the present invention is to solve the above-mentioned problems by providing a method of manufacturing a liquid crystal display device having an optimized refractive index of a film formed on a substrate glass and excellent process flow stability. Especially.
【0005】[0005]
【課題を解決するための手段】上記目的は、SiO2 を
を主成分とし1.45前後の屈折率を有する絶縁層の屈
折率をTiO2 およびZrO2 の高屈折率成分の添加に
より1.6〜1.7にすることで達成可能となる。SUMMARY OF THE INVENTION The above object is to improve the refractive index of an insulating layer containing SiO 2 as a main component and having a refractive index of about 1.45 by adding high refractive index components of TiO 2 and ZrO 2 . It can be achieved by setting it to 6 to 1.7.
【0006】[0006]
【作用】本発明の方法によれば、絶縁層とITO透明電
極および配向膜との屈折率差がなくなり膜の界面におけ
る反射や干渉によりITO透明電極が画面上に見えるこ
とを防止することができ、耐アルカリ性の良好なZrO
2 の添加によりアルカリ洗浄工程の円滑な流動を達成可
能にするものである。According to the method of the present invention, there is no difference in refractive index between the insulating layer and the ITO transparent electrode and the alignment film, and it is possible to prevent the ITO transparent electrode from being visible on the screen due to reflection or interference at the interface of the film. , ZrO with good alkali resistance
The addition of 2 makes it possible to achieve a smooth flow in the alkali cleaning step.
【0007】[0007]
(実施例1)金属酸化物微粒子として平均粒子径100
〜200Åのアルミナゾル(アルミナゾル520、日産
化学社製)を、金属アルコキシドとしてエチルシリケー
トを用い、メタノール、エタノール、メチルセロソル
ブ、エチルセロソルブ等の溶剤により固形分濃度5〜1
0wt%に希釈したものを用いた。(Example 1) An average particle diameter of 100 as metal oxide fine particles.
~ 200Å alumina sol (Alumina sol 520, manufactured by Nissan Kagaku Co., Ltd.), ethyl silicate as metal alkoxide, and solvent such as methanol, ethanol, methyl cellosolve, ethyl cellosolve, etc. with a solid concentration of 5 to 1
The one diluted to 0 wt% was used.
【0008】一方、屈折率調整のためテトラエトキシチ
タンおよびテトラエトキシジルコニウムを上記同様の溶
剤にて希釈しTiO2 およびZrO2 にして5〜10w
t%にした後、上記溶液と混合した。On the other hand, in order to adjust the refractive index, tetraethoxytitanium and tetraethoxyzirconium are diluted with a solvent similar to the above to make TiO 2 and ZrO 2 , and 5 to 10 w.
After adjusting to t%, it was mixed with the above solution.
【0009】基板として表面を光学研磨したパイレック
スガラスあるいはソーダライムガラスを用いITOなど
の導電性膜をスパッターもしくは蒸着で形成しフォトエ
ッチングによってパターンを形成して電極としたものを
用いた。As the substrate, an electrode was used in which a conductive film such as ITO was formed by sputtering or vapor deposition using Pyrex glass or soda lime glass whose surface was optically polished, and a pattern was formed by photoetching to form an electrode.
【0010】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。 こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。この後の基板のアルカリ洗浄工程におい
ても特に問題は発生しなかった。さらに配向膜を積層
し、回転ラビングを行ったが、配向膜の剥離は生じなか
った。液晶を挾持した液晶表示素子にして、表示特性を
評価したところ、ITO透明電極は見えることなくしか
も長時間に渡り極めて安定した表示特性を示した。The liquid sol was coated on this substrate by roll coating while controlling the film thickness to 800 to 900Å, and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. No particular problems occurred in the subsequent substrate alkali cleaning step. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. When a liquid crystal display device having a liquid crystal sandwiched therein was used and the display characteristics were evaluated, the ITO transparent electrode did not appear and showed extremely stable display characteristics for a long time.
【0011】(実施例2)金属酸化物微粒子として平均
粒子径100〜200Åのシリカゾル(スノーテックス
O、日産化学社製)を用いた。また金属アルコキシドと
してエチルシリケートを用い、0.02規定の塩酸に混
合し激しく攪拌することにより加水分解溶液を調製し
た。次に上記シリカゾルと加水分解溶液を混合しメタノ
ール、エタノール、メチルセロソルブ、エチルセロソル
ブ等の溶剤により固形分濃度5〜10%wtに希釈し液
状ゾルとした。Example 2 As the metal oxide fine particles, silica sol having an average particle diameter of 100 to 200Å (Snowtex O, manufactured by Nissan Chemical Co., Ltd.) was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the silica sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid content concentration of 5 to 10% by weight to obtain a liquid sol.
【0012】一方、屈折率調整のためテトラエトキシチ
タンおよびテトラエトキシジルコニウムを上記同様の溶
剤にて希釈しTiO2 およびZrO2 にして5〜10w
t%にした後、上記溶液と混合した。On the other hand, in order to adjust the refractive index, tetraethoxytitanium and tetraethoxyzirconium are diluted with a solvent similar to the above to make TiO 2 and ZrO 2 , and 5 to 10 w.
After adjusting to t%, it was mixed with the above solution.
【0013】実施例1と同様に、基板として表面を光学
研磨したパイレックスガラスあるいはソーダライムガラ
スを用いITOなどの導電性膜をスパッターもしくは蒸
着で形成しフォトエッチングによってパターンを形成し
て電極としたものを用いた。In the same manner as in Example 1, using a Pyrex glass or soda lime glass whose surface is optically polished as a substrate, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0014】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。この後の基板のアルカリ洗浄工程におい
ても特に問題は発生しなかった。さらに配向膜を積層
し、回転ラビングを行ったが、配向膜の剥離は生じなか
った。液晶を挾持した液晶表示素子にして、表示特性を
評価したところ、ITO透明電極は見えることなくしか
も長時間に渡り極めて安定した表示特性を示した。The liquid sol was applied onto this substrate by roll coating while controlling the film thickness to 800 to 900Å, and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. No particular problems occurred in the subsequent substrate alkali cleaning step. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. When a liquid crystal display device having a liquid crystal sandwiched therein was used and the display characteristics were evaluated, the ITO transparent electrode did not appear and showed extremely stable display characteristics for a long time.
【0015】(実施例3)金属酸化物微粒子として平均
粒子径100〜200Åのアルミナゾル(アルミナゾル
520、日産化学社製)を用いた。また金属アルコキシ
ドとしてエチルシリケートを用い、0.02規定の塩酸
に混合し激しく攪拌することにより加水分解溶液を調製
した。次に上記アルミナゾルと加水分解溶液を混合しメ
タノール、エタノール、メチルセロソルブ、エチルセロ
ソルブ等の溶剤により固形分濃度5〜10%wtに希釈
し液状ゾルとした。Example 3 As the metal oxide fine particles, an alumina sol (alumina sol 520, manufactured by Nissan Chemical Co., Ltd.) having an average particle size of 100 to 200 Å was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the above-mentioned alumina sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid content concentration of 5 to 10% by weight to obtain a liquid sol.
【0016】一方、屈折率調整のためテトラエトキシチ
タンおよびテトラエトキシジルコニウムを上記同様の溶
剤にて希釈しTiO2 およびZrO2 にして5〜10w
t%にした後、上記溶液と混合した。On the other hand, in order to adjust the refractive index, tetraethoxytitanium and tetraethoxyzirconium are diluted with a solvent similar to the above to make TiO 2 and ZrO 2 , and 5 to 10 w.
After adjusting to t%, it was mixed with the above solution.
【0017】前記実施例と同様に、基板として表面を光
学研磨したパイレックスガラスあるいはソーダライムガ
ラスを用いITOなどの導電性膜をスパッターもしくは
蒸着で形成しフォトエッチングによってパターンを形成
して電極としたものを用いた。In the same manner as in the above-mentioned embodiment, a Pyrex glass or soda lime glass whose surface is optically polished is used as a substrate, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0018】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。この後の基板のアルカリ洗浄工程におい
ても特に問題は発生しなかった。さらに配向膜を積層
し、回転ラビングを行ったが、配向膜の剥離は生じなか
った。液晶を挾持した液晶表示素子にして、表示特性を
評価したところ、ITO透明電極は見えることなくしか
も長時間に渡り極めて安定した表示特性を示した。The liquid sol was coated on this substrate by roll coating while controlling the film thickness to 800 to 900Å, and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. No particular problems occurred in the subsequent substrate alkali cleaning step. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. When a liquid crystal display device having a liquid crystal sandwiched therein was used and the display characteristics were evaluated, the ITO transparent electrode did not appear and showed extremely stable display characteristics for a long time.
【0019】(比較例)金属酸化物微粒子として平均粒
子径100〜200Åのアルミナゾル(アルミナゾル5
20、日産化学社製)を用いた。また金属アルコキシド
としてエチルシリケートを用い、0.02規定の塩酸に
混合し激しく攪拌することにより加水分解溶液を調製し
た。次に上記アルミナゾルと加水分解溶液を混合しメタ
ノール、エタノール、メチルセロソルブ、エチルセロソ
ルブ等の溶剤により固形分濃度5〜10%wtに希釈し
液状ゾルとした。Comparative Example Alumina sol (Alumina sol 5) having an average particle diameter of 100 to 200Å as fine particles of metal oxide.
20, manufactured by Nissan Chemical Co., Ltd.) was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the above-mentioned alumina sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid content concentration of 5 to 10% by weight to obtain a liquid sol.
【0020】一方、屈折率調整のためテトラエトキシチ
タンを上記同様の溶剤にて希釈しTiO2 にして5〜1
0wt%にした後、上記溶液と混合した。On the other hand, in order to adjust the refractive index, tetraethoxy titanium is diluted with a solvent similar to the above to make TiO 2 and the content is 5-1.
After adjusting to 0 wt%, it was mixed with the above solution.
【0021】前記実施例と同様に、基板として表面を光
学研磨したパイレックスガラスあるいはソーダライムガ
ラスを用いITOなどの導電性膜をスパッターもしくは
蒸着で形成しフォトエッチングによってパターンを形成
して電極としたものを用いた。Similar to the above-described embodiment, a substrate is made of Pyrex glass or soda lime glass whose surface is optically polished, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0022】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。しかしこの後の基板のアルカリ洗浄にお
いて膜成分が溶出してしまい膜硬度が不十分となり使用
不能となった。The liquid sol was applied onto this substrate by roll coating while controlling the film thickness to 800 to 900Å and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. However, in the subsequent alkali cleaning of the substrate, the film components were eluted and the film hardness became insufficient, making it unusable.
【0023】[0023]
【発明の効果】以上述べたように、本発明によれば比較
的低温で形成可能かつ基板との密着性、膜硬度の信頼
性、および配向膜との密着性に優れさらに外観の良好な
液晶表示素子を提供することで、安価で長期信頼性のあ
る表示装置を作成することが可能になる。本発明の液晶
表示素子は絶縁層形成が容易な上、配向不良をおこしに
くく、さらに表示外観が良好であるため、特に大きな面
積のものを作成するのには有利である。As described above, according to the present invention, a liquid crystal which can be formed at a relatively low temperature and which is excellent in adhesion to a substrate, reliability of film hardness, and adhesion to an alignment film and has a good appearance. Providing a display element makes it possible to manufacture a display device which is inexpensive and has long-term reliability. The liquid crystal display device of the present invention is easy to form an insulating layer, is less likely to cause alignment failure, and has a good display appearance. Therefore, it is advantageous for producing a particularly large area.
Claims (1)
り、少なくとも一方の電極上に絶縁層を有する液晶表示
素子において 絶縁層形成成分として少なくともSiO
2、TiO2、ZrO2の3成分を含むことを特徴とする
液晶表示素子の製造方法。1. A liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between electrodes and having an insulating layer on at least one electrode, wherein at least SiO is used as an insulating layer forming component.
A method of manufacturing a liquid crystal display device, which comprises three components of 2 , 2 , TiO 2 , and ZrO 2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17323693A JPH0728044A (en) | 1993-07-13 | 1993-07-13 | Production of liquid crystal display element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17323693A JPH0728044A (en) | 1993-07-13 | 1993-07-13 | Production of liquid crystal display element |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000100763A Division JP2000305071A (en) | 2000-01-01 | 2000-04-03 | Liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0728044A true JPH0728044A (en) | 1995-01-31 |
Family
ID=15956681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17323693A Pending JPH0728044A (en) | 1993-07-13 | 1993-07-13 | Production of liquid crystal display element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0728044A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007304529A (en) * | 2006-05-10 | 2007-11-22 | Trendon Touch Technology Corp | Method of hiding transparent electrode on transparent substrate |
-
1993
- 1993-07-13 JP JP17323693A patent/JPH0728044A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007304529A (en) * | 2006-05-10 | 2007-11-22 | Trendon Touch Technology Corp | Method of hiding transparent electrode on transparent substrate |
JP2014132469A (en) * | 2006-05-10 | 2014-07-17 | Trendon Touch Technology Corp | Treatment method of preventing transparent electrode in transparent substrate from being viewed |
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