JPH06289379A - Production of liquid crystal display element - Google Patents
Production of liquid crystal display elementInfo
- Publication number
- JPH06289379A JPH06289379A JP7830393A JP7830393A JPH06289379A JP H06289379 A JPH06289379 A JP H06289379A JP 7830393 A JP7830393 A JP 7830393A JP 7830393 A JP7830393 A JP 7830393A JP H06289379 A JPH06289379 A JP H06289379A
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- liquid crystal
- refractive index
- crystal display
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、表示が均質であり、製
造安定性に優れた液晶表示素子の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device which has a uniform display and is excellent in manufacturing stability.
【0002】[0002]
【従来の技術】電極間に液晶層が挟持された構造からな
る液晶表示素子においては、導電性の異物に起因する電
極間ショートを防ぐため、絶縁層の形成が不可欠となっ
ている。従来の液晶表示素子における電極上の絶縁層と
しては、SiO2 などのスパッタ膜や、アルコキシシラ
ンを加水分解したゾル(例えばNTL6008、日産化
学社製)をコーティングした後焼成しSiO2を主成分
とする膜を用いていた。2. Description of the Related Art In a liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between electrodes, it is essential to form an insulating layer in order to prevent a short circuit between electrodes due to a conductive foreign substance. As an insulating layer on an electrode in a conventional liquid crystal display device, a sputtered film such as SiO 2 or a sol obtained by hydrolyzing an alkoxysilane (for example, NTL6008, manufactured by Nissan Kagaku Co., Ltd.) is coated and baked, and SiO 2 is contained as a main component. It was using a membrane.
【0003】[0003]
【発明が解決しようとする課題】しかし、前記従来の絶
縁膜においては、SiO2を主成分としており屈折率が
1.45前後である。これは透明電極(ITO)および
配向膜(ポリイミド等)の1.6〜1.7に比べ極めて
小さいため膜界面において光の反射や干渉が生じそのた
めにITO透明電極が画面上に見えてしまい表示外観が
悪くなるという課題があった。However, in the above-mentioned conventional insulating film, SiO 2 is the main component and the refractive index is around 1.45. This is much smaller than 1.6 to 1.7 of the transparent electrode (ITO) and the alignment film (polyimide etc.), so that light reflection or interference occurs at the film interface, so that the ITO transparent electrode can be seen on the screen and displayed. There was a problem that the appearance deteriorated.
【0004】本発明の目的は、基板ガラス上に形成され
る膜の屈折率の最適化する液晶表示素子の製造方法を提
供することによって、上記の課題を解決することにあ
る。An object of the present invention is to solve the above-mentioned problems by providing a method of manufacturing a liquid crystal display device in which the refractive index of a film formed on a substrate glass is optimized.
【0005】[0005]
【課題を解決するための手段】上記目的は、SiO2お
よびAl2O3を主成分とし1.45前後の屈折率を有す
る絶縁層の屈折率をCeO2あるいはTiO2あるいはT
hO2等の高屈折率成分の添加により1.6〜1.7に
することで達成可能となる。SUMMARY OF THE INVENTION The above-mentioned object is to make the refractive index of an insulating layer mainly composed of SiO 2 and Al 2 O 3 and having a refractive index of around 1.45 CeO 2 or TiO 2 or T.
This can be achieved by adding a high refractive index component such as hO 2 to 1.6 to 1.7.
【0006】[0006]
【作用】本発明の方法によれば、絶縁層とITO透明電
極および配向膜との屈折率差がなくなり膜の界面におけ
る反射や干渉によりITO透明電極が画面上に見えるこ
とを防止することができるものである。According to the method of the present invention, there is no difference in refractive index between the insulating layer and the ITO transparent electrode and the alignment film, and it is possible to prevent the ITO transparent electrode from being visible on the screen due to reflection or interference at the film interface. It is a thing.
【0007】[0007]
(実施例1)金属酸化物微粒子として平均粒子径100
〜200Åのアルミナゾル(アルミナゾル520、日産
化学社製)を、金属アルコキシドとしてエチルシリケー
トを用い、メタノール、エタノール、メチルセロソル
ブ、エチルセロソルブ等の溶剤により固形分濃度5〜1
0wt%に希釈したものを用いた。(Example 1) An average particle diameter of 100 as metal oxide fine particles.
~ 200Å alumina sol (Alumina sol 520, manufactured by Nissan Kagaku Co., Ltd.), ethyl silicate as metal alkoxide, and solvent such as methanol, ethanol, methyl cellosolve, ethyl cellosolve, etc. with a solid concentration of 5 to 1
The one diluted to 0 wt% was used.
【0008】一方、屈折率調整のため塩化セリウムの4
0%水溶液を上記同様の溶剤にて希釈しCeO2にして
5〜10wt%にした後、上記溶液と混合した。On the other hand, in order to adjust the refractive index, 4 of cerium chloride is used.
The 0% aqueous solution was diluted with the same solvent as described above to make CeO 2 to 5 to 10 wt%, and then mixed with the above solution.
【0009】基板として表面を光学研磨したパイレック
スガラスあるいはソーダライムガラスを用いITOなど
の導電性膜をスパッターもしくは蒸着で形成しフォトエ
ッチングによってパターンを形成して電極としたものを
用いた。As the substrate, an electrode was used in which a conductive film such as ITO was formed by sputtering or vapor deposition using Pyrex glass or soda lime glass whose surface was optically polished, and a pattern was formed by photoetching to form an electrode.
【0010】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。さらに配向膜を積層し、回転ラビングを
行ったが、配向膜の剥離は生じなかった。液晶を挾持し
た液晶表示素子にして、表示特性を評価したところ、I
TO透明電極は見えることなくしかも長時間に渡り極め
て安定した表示特性を示した。The liquid sol was coated on this substrate by roll coating while controlling the film thickness to 800 to 900Å, and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. A liquid crystal display device having a liquid crystal sandwiched therebetween was used to evaluate the display characteristics.
The TO transparent electrode showed extremely stable display characteristics without being visible and for a long time.
【0011】(実施例2)金属酸化物微粒子として平均
粒子径100〜200Åのシリカゾル(スノーテックス
O、日産化学社製)を用いた。また金属アルコキシドと
してエチルシリケートを用い、0.02規定の塩酸に混
合し激しく攪拌することにより加水分解溶液を調製し
た。次に上記シリカゾルと加水分解溶液を混合しメタノ
ール、エタノール、メチルセロソルブ、エチルセロソル
ブ等の溶剤により固形分濃度5〜10%wtに希釈し液
状ゾルとした。Example 2 As the metal oxide fine particles, silica sol having an average particle diameter of 100 to 200Å (Snowtex O, manufactured by Nissan Chemical Co., Ltd.) was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the silica sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid concentration of 5 to 10% by weight to obtain a liquid sol.
【0012】一方、屈折率調整のため硝酸トリウムの4
0%水溶液を上記同様の溶剤にて希釈しThO2にして
5〜10wt%にした後、液状ゾルと混合した。On the other hand, in order to adjust the refractive index, thorium nitrate 4
The 0% aqueous solution was diluted with the same solvent as above to make ThO 2 to 5 to 10 wt%, and then mixed with the liquid sol.
【0013】実施例1と同様に、基板として表面を光学
研磨したパイレックスガラスあるいはソーダライムガラ
スを用いITOなどの導電性膜をスパッターもしくは蒸
着で形成しフォトエッチングによってパターンを形成し
て電極としたものを用いた。In the same manner as in Example 1, using a Pyrex glass or soda lime glass whose surface is optically polished as a substrate, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0014】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。さらに配向膜を積層し、回転ラビングを
行ったが、配向膜の剥離は生じなかった。液晶を挾持し
た液晶表示素子にして、表示特性を評価したところ、I
TO透明電極は見えることなくしかも長時間に渡り極め
て安定した表示特性を示した。The liquid sol was applied onto this substrate by roll coating while controlling the film thickness to 800 to 900Å, and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. A liquid crystal display device having a liquid crystal sandwiched therebetween was used to evaluate the display characteristics.
The TO transparent electrode showed extremely stable display characteristics without being visible and for a long time.
【0015】(実施例3)金属酸化物微粒子として平均
粒子径100〜200Åのアルミナゾル(アルミナゾル
520、日産化学社製)を用いた。また金属アルコキシ
ドとしてエチルシリケートを用い、0.02規定の塩酸
に混合し激しく攪拌することにより加水分解溶液を調製
した。次に上記アルミナゾルと加水分解溶液を混合しメ
タノール、エタノール、メチルセロソルブ、エチルセロ
ソルブ等の溶剤により固形分濃度5〜10%wtに希釈
し液状ゾルとした。Example 3 As the metal oxide fine particles, an alumina sol (alumina sol 520, manufactured by Nissan Chemical Co., Ltd.) having an average particle size of 100 to 200 Å was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the above-mentioned alumina sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid content concentration of 5 to 10% by weight to obtain a liquid sol.
【0016】一方、屈折率調整のためエトキシチタンを
上記同様の溶剤にて希釈しTiO2にして5〜10wt
%にした後、上記液状ゾルと混合した。On the other hand, in order to adjust the refractive index, ethoxy titanium is diluted with a solvent similar to the above to make TiO 2 , and 5 to 10 wt.
%, And then mixed with the above liquid sol.
【0017】前記実施例と同様に、基板として表面を光
学研磨したパイレックスガラスあるいはソーダライムガ
ラスを用いITOなどの導電性膜をスパッターもしくは
蒸着で形成しフォトエッチングによってパターンを形成
して電極としたものを用いた。In the same manner as in the above-mentioned embodiment, a Pyrex glass or soda lime glass whose surface is optically polished is used as a substrate, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0018】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。さらに配向膜を積層し、回転ラビングを
行ったが、配向膜の剥離は生じなかった。液晶を挾持し
た液晶表示素子にして、表示特性を評価したところ、I
TO透明電極は見えることなくしかも長時間に渡り極め
て安定した表示特性を示した。The liquid sol was applied onto this substrate by roll coating while controlling the film thickness to 800 to 900Å and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. A liquid crystal display device having a liquid crystal sandwiched therebetween was used to evaluate the display characteristics.
The TO transparent electrode showed extremely stable display characteristics without being visible and for a long time.
【0019】(実施例4)金属酸化物微粒子として平均
粒子径100〜200Åのアルミナゾル(アルミナゾル
520、日産化学社製)を用いた。また金属アルコキシ
ドとしてエチルシリケートを用い、0.02規定の塩酸
に混合し激しく攪拌することにより加水分解溶液を調製
した。次に上記アルミナゾルと加水分解溶液を混合しメ
タノール、エタノール、メチルセロソルブ、エチルセロ
ソルブ等の溶剤により固形分濃度5〜10%wtに希釈
し液状ゾルとした。Example 4 As the metal oxide fine particles, an alumina sol having an average particle size of 100 to 200 Å (alumina sol 520, manufactured by Nissan Chemical Co., Ltd.) was used. Further, ethyl silicate was used as the metal alkoxide, mixed with 0.02N hydrochloric acid and stirred vigorously to prepare a hydrolysis solution. Next, the above-mentioned alumina sol and the hydrolyzed solution were mixed and diluted with a solvent such as methanol, ethanol, methyl cellosolve or ethyl cellosolve to a solid content concentration of 5 to 10% by weight to obtain a liquid sol.
【0020】一方、屈折率調整のため塩化セリウムの4
0%水溶液を上記同様の溶剤にて希釈しCeO2にして
5〜10wt%にした後、上記液状ゾルと混合した。On the other hand, in order to adjust the refractive index, 4 of cerium chloride is used.
A 0% aqueous solution was diluted with the same solvent as described above to make CeO 2 to 5 to 10 wt%, and then mixed with the above liquid sol.
【0021】前記実施例と同様に、基板として表面を光
学研磨したパイレックスガラスあるいはソーダライムガ
ラスを用いITOなどの導電性膜をスパッターもしくは
蒸着で形成しフォトエッチングによってパターンを形成
して電極としたものを用いた。Similar to the above-described embodiment, a substrate is made of Pyrex glass or soda lime glass whose surface is optically polished, a conductive film such as ITO is formed by sputtering or vapor deposition, and a pattern is formed by photoetching to form an electrode. Was used.
【0022】この基板上に800〜900Åの膜厚とな
るように制御してロールコーテイングにより前記液状ゾ
ルを塗布し、400℃で1時間、加熱し安定な絶縁層と
した。こうして形成した絶縁層は、大面積ながら均質
で、金属針の加圧による膜硬度試験においても十分な信
頼性が得られ基板との密着性も確保されていた。またエ
リプソメ−タにより膜の屈折率を測定したところ1.7
程度であった。さらに配向膜を積層し、回転ラビングを
行ったが、配向膜の剥離は生じなかった。液晶を挾持し
た液晶表示素子にして、表示特性を評価したところ、I
TO透明電極は見えることなくしかも長時間に渡り極め
て安定した表示特性を示した。The liquid sol was applied onto this substrate by roll coating while controlling the film thickness to 800 to 900Å and heated at 400 ° C. for 1 hour to form a stable insulating layer. The insulating layer thus formed was homogeneous over a large area, sufficient reliability was obtained even in a film hardness test by pressing with a metal needle, and adhesion with the substrate was secured. When the refractive index of the film was measured by an ellipsometer, it was 1.7.
It was about. Further, an alignment film was laminated and rotary rubbing was performed, but the alignment film was not peeled off. A liquid crystal display device having a liquid crystal sandwiched therebetween was used to evaluate the display characteristics.
The TO transparent electrode showed extremely stable display characteristics without being visible and for a long time.
【0023】[0023]
【発明の効果】以上述べたように、本発明によれば比較
的低温で形成可能かつ基板との密着性、膜硬度の信頼
性、および配向膜との密着性に優れさらに外観の良好な
液晶表示素子を提供することで、安価で長期信頼性のあ
る表示装置を作成することが可能になる。本発明の液晶
表示素子は絶縁層形成が容易な上、配向不良をおこしに
くく、さらに表示外観が良好であるため、特に大きな面
積のものを作成するのには有利である。As described above, according to the present invention, a liquid crystal which can be formed at a relatively low temperature and which is excellent in adhesion to a substrate, reliability of film hardness, and adhesion to an alignment film and has a good appearance. Providing a display element makes it possible to manufacture a display device which is inexpensive and has long-term reliability. The liquid crystal display device of the present invention is easy to form an insulating layer, is less likely to cause alignment failure, and has a good display appearance. Therefore, it is advantageous for producing a particularly large area.
Claims (3)
り、少なくとも一方の電極上に絶縁層を有する液晶表示
素子において絶縁層の屈折率が1.6〜1.7であるこ
とを特徴とする液晶表示素子の製造方法。1. A liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between electrodes, and the insulating layer has a refractive index of 1.6 to 1.7 in a liquid crystal display device having an insulating layer on at least one of the electrodes. And a method for manufacturing a liquid crystal display device.
粒子および金属アルコキシドを主原料とする液状ゾルの
塗布、加熱により形成することを特徴とする液晶表示素
子の製造方法。2. The method for producing a liquid crystal display device according to claim 1, wherein the insulating layer is formed by applying a liquid sol containing metal oxide fine particles and a metal alkoxide as main raw materials and heating the liquid sol.
O2とAl2O3およびCeO2,TiO2,ThO2のいず
れかの成分により形成されることを特徴とする液晶表示
素子の製造方法。3. The insulating layer according to claim 1 or 2, wherein the insulating layer is Si.
A method for producing a liquid crystal display device, which is formed of O 2 , Al 2 O 3, and any one of CeO 2 , TiO 2 , and ThO 2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7830393A JPH06289379A (en) | 1993-04-05 | 1993-04-05 | Production of liquid crystal display element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7830393A JPH06289379A (en) | 1993-04-05 | 1993-04-05 | Production of liquid crystal display element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06289379A true JPH06289379A (en) | 1994-10-18 |
Family
ID=13658165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7830393A Pending JPH06289379A (en) | 1993-04-05 | 1993-04-05 | Production of liquid crystal display element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06289379A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6356326B1 (en) | 1998-02-25 | 2002-03-12 | Matsushita Electric Industrial Co., Ltd. | Active matrix substrate of a liquid crystal display comprising an insulating layer being made of solid solution of SiOx /SINy |
US6765638B1 (en) | 1998-12-25 | 2004-07-20 | Seiko Epson Corporation | Reflective liquid crystal device and electronic equipment using the same |
KR100748047B1 (en) * | 2001-10-31 | 2007-08-09 | 옵트렉스 가부시키가이샤 | Liquid crystal display element |
-
1993
- 1993-04-05 JP JP7830393A patent/JPH06289379A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6356326B1 (en) | 1998-02-25 | 2002-03-12 | Matsushita Electric Industrial Co., Ltd. | Active matrix substrate of a liquid crystal display comprising an insulating layer being made of solid solution of SiOx /SINy |
US6765638B1 (en) | 1998-12-25 | 2004-07-20 | Seiko Epson Corporation | Reflective liquid crystal device and electronic equipment using the same |
KR100748047B1 (en) * | 2001-10-31 | 2007-08-09 | 옵트렉스 가부시키가이샤 | Liquid crystal display element |
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