JPH07256820A - Slide member - Google Patents
Slide memberInfo
- Publication number
- JPH07256820A JPH07256820A JP7942794A JP7942794A JPH07256820A JP H07256820 A JPH07256820 A JP H07256820A JP 7942794 A JP7942794 A JP 7942794A JP 7942794 A JP7942794 A JP 7942794A JP H07256820 A JPH07256820 A JP H07256820A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film layer
- layer
- base material
- sliding member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、耐摩耗性、高滑り性が
要求される摺動部材、例えばシャフト、滑り軸受け、ギ
ヤ、ステージなどのガイドレール、ガイドローラー、ヒ
ンジ等の摺動部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sliding member which is required to have wear resistance and high slipperiness, for example, a sliding member such as a shaft, a sliding bearing, a gear, a guide rail such as a stage, a guide roller and a hinge. .
【０００２】[0002]
【従来の技術】一般に、摺動部材の表面に耐摩耗性や高
滑り性を付与するには、部材表面に直接あるいは下地層
としてクロムメッキ層や樹脂層を形成した後に、フッ素
を含有する固体潤滑剤を塗布若しくはコーティングする
か、またはテフロン粒子を分散させたニッケルメッキを
施す等の方法が採られている。2. Description of the Related Art Generally, in order to impart wear resistance and high slipperiness to the surface of a sliding member, a fluorine-containing solid is formed directly on the surface of the member or after forming a chrome plating layer or a resin layer as an underlayer. A method of applying or coating a lubricant, or performing nickel plating in which Teflon particles are dispersed is adopted.
【０００３】従来、例えば特開平４−６４４３６号公報
には、摺動部材の基材表面に下地層としてエポキシ樹脂
等を被覆した後、固体潤滑剤としてフッ素樹脂等を被覆
する方法が開示されている。また、特公平２−２９７４
９号公報には、摺動部材の基材表面にプラズマ放電によ
り炭素膜を形成した後、Ｃ−Ｆ結合を含む化合物膜を形
成する方法が開示されている。Conventionally, for example, Japanese Patent Application Laid-Open No. 4-64436 discloses a method of coating a base material surface of a sliding member with an epoxy resin or the like as a base layer and then coating a fluororesin or the like as a solid lubricant. There is. Also, Japanese Patent Publication No. 2-2974
No. 9 discloses a method in which a carbon film is formed on the surface of a base material of a sliding member by plasma discharge and then a compound film containing a C—F bond is formed.
【０００４】[0004]
【発明が解決しようとする課題】しかし、特開平４−６
４４３６号公報に記載した方法では、樹脂自体の強度が
弱いので、大きな負荷が加わる摺動部材に適用すること
は困難である。また、樹脂層の厚みが１００〜１０００
μｍ程度にまでなるため、精密さを要求される摺動部材
に適用することも不可能である。However, JP-A-4-6 has
According to the method described in Japanese Patent No. 4436, since the strength of the resin itself is weak, it is difficult to apply it to a sliding member to which a large load is applied. The thickness of the resin layer is 100 to 1000.
Since it is up to about μm, it cannot be applied to a sliding member that requires precision.
【０００５】一方、特公平２−２９７４９号公報に記載
された方法では、下地層が炭素薄膜であるので、膜強度
や耐久性の点で問題がある。On the other hand, the method disclosed in Japanese Patent Publication No. 2-29749 has a problem in film strength and durability because the underlayer is a carbon thin film.
【０００６】本発明は、かかる従来の問題点に鑑みてな
されたもので、請求項１に係る発明は、高い滑り性を持
ちながら、耐摩耗性、耐久性に優れ、精密部品としての
利用も可能な摺動部材を提供することを目的とする。The present invention has been made in view of the above conventional problems, and the invention according to claim 1 has excellent wear resistance and durability while having high slipperiness, and can be used as a precision component. It is an object of the present invention to provide a possible sliding member.
【０００７】請求項２に係る発明は、たとえ基材とダイ
ヤモンド薄膜との密着性が悪い場合でも、請求項１に係
る発明の目的を達成することができる摺動部材を提供す
ることを目的とする。It is an object of the invention according to claim 2 to provide a sliding member which can achieve the object of the invention according to claim 1 even when the adhesion between the substrate and the diamond thin film is poor. To do.
【０００８】請求項３に係る発明は、請求項２に係る発
明の下地層を最適なものとした摺動部材を提供すること
を目的とする。An object of the invention according to claim 3 is to provide a sliding member in which the underlayer of the invention according to claim 2 is optimized.
【０００９】[0009]
【課題を解決するための手段】上記課題を解決するため
に、請求項１に係る発明は、基材表面にダイヤモンド薄
膜からなる層を形成するとともに、該層の最表層に前記
ダイヤモンド薄膜の炭素と共有結合したフッ素が存在す
るように、摺動部材を構成した。In order to solve the above-mentioned problems, the invention according to claim 1 forms a layer comprising a diamond thin film on the surface of a base material, and forms the carbon of the diamond thin film on the outermost layer of the layer. The sliding member was configured so that there was fluorine covalently bound to.
【００１０】請求項２に係る発明は、請求項１に係る発
明において、基材とダイヤモンド薄膜との間に下地層を
設けることとした。The invention according to claim 2 is the invention according to claim 1, in which an underlayer is provided between the substrate and the diamond thin film.
【００１１】請求項３に係る発明は、請求項２に係る発
明において、下地層を、金属層、金属炭化物層、金属窒
化物層または金属酸化物層により形成することとした。According to a third aspect of the invention, in the second aspect of the invention, the underlayer is formed of a metal layer, a metal carbide layer, a metal nitride layer or a metal oxide layer.
【００１２】請求項１〜３に係る発明において、ダイヤ
モンド薄膜を形成する手段としては、プラズマＣＶＤ等
の公知の薄膜形成技術が適用可能である。また、ダイヤ
モンド薄膜の表面をフッ素化する方法としては、ダイヤ
モンド薄膜の層を表面に形成した基材を真空中で加熱
し、例えばＦ2 、ＨＦ等のフッ素ガスを導入するか、あ
るいはフッ素化カーボン（ＣＦ4 ）または水素化フッ素
化カーボン（ＣＨＦ3 ）雰囲気中でプラズマ処理を施す
等の方法を採用することができる。In the inventions according to claims 1 to 3, as a means for forming a diamond thin film, a known thin film forming technique such as plasma CVD can be applied. As a method for fluorinating the surface of the diamond thin film, a base material having a diamond thin film layer formed on the surface is heated in a vacuum, and a fluorine gas such as F 2 or HF is introduced, or a fluorinated carbon A method such as plasma treatment in a (CF 4 ) or hydrogenated fluorinated carbon (CHF 3 ) atmosphere can be adopted.
【００１３】また、下地層を成膜する方法も特に限定さ
れるものではないが、例えばスパッタリング、蒸着、Ｃ
ＶＤ等の公知の薄膜形成技術が適用可能であり、下地層
としては、モリブデン，シリコン，アルミニウム，タン
グステン，コバルト，ニッケル等の金属層、炭化珪素，
炭化タングステン等の金属炭化物層、窒化珪素，窒化タ
ングステン，窒化チタン等の金属窒化物層、シリカ，ア
ルミナ，ジルコニア等の金属酸化物等が好ましい。The method for forming the underlayer is not particularly limited, but for example, sputtering, vapor deposition, C
A well-known thin film forming technique such as VD can be applied, and a metal layer of molybdenum, silicon, aluminum, tungsten, cobalt, nickel or the like, silicon carbide,
A metal carbide layer such as tungsten carbide, a metal nitride layer such as silicon nitride, tungsten nitride and titanium nitride, a metal oxide such as silica, alumina and zirconia are preferable.
【００１４】[0014]
【作用】以下、図１に示す本発明の摺動部材について作
用を説明する。The operation of the sliding member of the present invention shown in FIG. 1 will be described below.
【００１５】図１の摺動部材１は、基材２の表面（図１
では上面のみ）に、ダイヤモンド薄膜層３が形成されて
いる。そして、このダイヤモンド薄膜層３の最表面３ａ
はフッ素化され、フッ素がダイヤモンド薄膜層３の炭素
と共有結合した表面になっている。基材２とダイヤモン
ド薄膜層３とは、公知の薄膜形成技術により非常に高い
密着性を有し、また、ダイヤモンド薄膜層３は、極めて
薄くかつ均一に形成され、基材２の基礎形状をほとんど
変えることがないように設けられている。The sliding member 1 of FIG. 1 has a surface of a substrate 2 (see FIG.
The diamond thin film layer 3 is formed on the upper surface only). The outermost surface 3a of the diamond thin film layer 3
Is fluorinated, and the surface of the diamond thin film layer 3 is covalently bonded to carbon. The base material 2 and the diamond thin film layer 3 have very high adhesion by a known thin film forming technique, and the diamond thin film layer 3 is formed extremely thin and uniform, and the basic shape of the base material 2 is almost the same. It is provided so that it cannot be changed.
【００１６】このような摺動部材１の製造においては、
ダイヤモンド薄膜層３を設けた基材２を真空中で加熱
し、フッ素ガスを導入すると、フッ素ガスは反応性に非
常に富んでいるために、フッ素（Ｆ）がダイヤモンド薄
膜層３中の炭素（Ｃ）と反応し、Ｃ−Ｆを含む化合物が
生成される。これにより、ダイヤモネンド薄膜層３の最
表面がフッ素で覆われた状態となって、摺動部材１が得
られる。In manufacturing such a sliding member 1,
When the base material 2 provided with the diamond thin film layer 3 is heated in a vacuum and fluorine gas is introduced, fluorine (F) is highly reactive, so that fluorine (F) causes carbon in the diamond thin film layer 3 ( It reacts with C) to produce a compound containing CF. As a result, the outermost surface of the diamond thin film layer 3 is covered with fluorine, and the sliding member 1 is obtained.
【００１７】ここで、物質として、Ｃ−Ｆ結合を持つも
のとしては、フッ素樹脂（ＰＴＦＥ：ポリ４フッ化エチ
レン，商品名テフロン、ＰＦＡ、ＣＴＦＥ等）や、フッ
化グラファイト（ＣＦ2 、ＣＦ3 ）等があるが、これら
の物質はいずれも化学的に安定であり、フッ素の持つ表
面エネルギーを低下させる作用により、高い滑り性を持
つことが知られている。Here, as the substance having a C—F bond, a fluororesin (PTFE: polytetrafluoroethylene, trade name: Teflon, PFA, CTFE, etc.) and graphite fluoride (CF 2 , CF 3). ) And the like, all of these substances are chemically stable, and are known to have high slip properties due to the action of lowering the surface energy of fluorine.
【００１８】また、Ｃ−Ｆ結合は、結合力が高く、熱的
にも安定で、耐久性が高いという特徴がある。例えば、
通常の接着剤、有機バインダーなどでの、密着性や強度
を支配する分子間力（ファンデルワールス力）は、５ｋ
ｃａｌ／ｍｏｌ以下なのに対し、Ｃ−Ｆの共有結合エネ
ルギーは約１００ｋｃａｌ／ｍｏｌ、Ｃ−Ｃ結合は約８
０ｋｃａｌ／ｍｏｌと、非常に強い結合といる。一方、
ダイヤモンド薄膜層３は、ダイヤモンド膜自体が非常に
硬く、高い耐久性を持つものである。Further, the C-F bond is characterized in that it has a high bond strength, is thermally stable, and has high durability. For example,
The intermolecular force (van der Waals force) that controls adhesion and strength with ordinary adhesives and organic binders is 5k
The caloric bond energy of C-F is about 100 kcal / mol, and that of C-C bond is about 8 in comparison with cal / mol or less.
It is a very strong bond with 0 kcal / mol. on the other hand,
The diamond thin film layer 3 is such that the diamond film itself is extremely hard and has high durability.
【００１９】また、請求項２に係る発明によれば、基材
２とダイヤモンド薄膜層３との間に下地層に形成するこ
とによって、より密着性の高いダイヤモンド薄膜層３を
得ることができる。According to the second aspect of the invention, the diamond thin film layer 3 having higher adhesion can be obtained by forming the base layer between the base material 2 and the diamond thin film layer 3 as an underlayer.
【００２０】請求項３に係る発明は、より密着性の高い
ダイヤモンド薄膜層３を得ることができる下地層の代表
である。The invention according to claim 3 is a typical underlayer capable of obtaining a diamond thin film layer 3 having higher adhesion.
【００２１】以上のように、請求項１〜３に係る発明に
あっては、優れた耐摩耗性と高い滑り性を持ち、基材の
基礎形状を変えることのない表面層を、高い密着性を得
つつ設けることができる。As described above, in the inventions according to claims 1 to 3, the surface layer having excellent wear resistance and high slipperiness, which does not change the basic shape of the substrate, has high adhesion. Can be provided while obtaining.
【００２２】[0022]
【実施例１】 ［構成］図２に本実施例の摺動部材４の表面を拡大した
縦縦断面図を示す。この摺動部材４の基材５は、ステン
レスにより作製されている。基材５の表面（上面）に
は、厚さ１μｍのダイヤモンド薄膜層６が形成されてい
る。そして、このダイヤモンド薄膜層６の最表層６ａ
は、フッ素化され、フッ素がダイヤモンド薄膜層６の炭
素と共有結合した表面になっている。[Embodiment 1] [Structure] FIG. 2 shows an enlarged vertical and vertical sectional view of a surface of a sliding member 4 of this embodiment. The base material 5 of the sliding member 4 is made of stainless steel. A diamond thin film layer 6 having a thickness of 1 μm is formed on the surface (upper surface) of the base material 5. Then, the outermost layer 6a of the diamond thin film layer 6
Is fluorinated, and has a surface in which fluorine is covalently bonded to carbon of the diamond thin film layer 6.
【００２３】以下に、摺動部材４の作製手順を示す。ま
ず基材５の真空室内に配置し、真空室内に炭化水素ガス
を導入して、基材５に対し、熱陰極フィラメントとその
まわりに設けられた陽極とからなるイオン化手段により
イオン化し、これに電圧を印加して加速し、４５０℃に
加熱した基材５上にダイヤモンド薄膜層６を生成させ
た。その後、再び真空室内を真空状態とし、基材５を４
００℃に加熱し、温度が安定したところでＦ2 ガスを導
入し、摺動部材４を得た。The procedure for producing the sliding member 4 will be described below. First, the base material 5 is placed in a vacuum chamber, a hydrocarbon gas is introduced into the vacuum chamber, and the base material 5 is ionized by an ionizing means composed of a hot cathode filament and an anode provided around the hot cathode filament. A diamond thin film layer 6 was formed on the substrate 5 heated to 450 ° C. by applying a voltage to accelerate it. After that, the inside of the vacuum chamber is brought into a vacuum state again, and the substrate 5 is placed in a vacuum state.
The sliding member 4 was obtained by heating to 00 ° C. and introducing F 2 gas when the temperature was stable.
【００２４】［作用］基材５の表面にはダイヤモンド薄
膜層６が形成されており、その最表面６ａは反応性の高
いフッ素ガスによりフッ素化されてＣ−Ｆ結合を持って
いるため、優れた耐摩耗性と、高い滑り性を発揮する。[Operation] The diamond thin film layer 6 is formed on the surface of the base material 5, and the outermost surface 6a thereof is excellent in that it is fluorinated by highly reactive fluorine gas and has a C--F bond. Abrasion resistance and high slipperiness.
【００２５】［効果］本実施例の摺動部材４は、耐摩耗
性や滑り性に優れた性能を持ち、特に耐久性に優れるこ
とから、部品交換のサイクルを長くすることができ、低
コスト化を図ることができる。また、ダイヤモンド薄膜
層６は極めて薄い層であるので、基材５の基礎形状をほ
とんど変えることがなく、精密部品としての利用が可能
である。[Effect] The sliding member 4 of this embodiment has excellent wear resistance and slipperiness, and particularly excellent durability, so that the cycle of parts replacement can be extended and the cost can be reduced. Can be realized. Moreover, since the diamond thin film layer 6 is an extremely thin layer, the basic shape of the substrate 5 is hardly changed, and it can be used as a precision component.
【００２６】[0026]
【実施例２】 ［構成］図３に本実施例の摺動部材７の表面を拡大した
縦断面図を示す。この摺動部材７の基材８は、焼き入れ
鋼により作製されている。基材８の表面（上面）には、
下地層として厚さ５００ｎｍのモリブデン薄膜層９が形
成されている。また、このモリブデン薄膜層９の上面に
は、厚さ９００ｎｍのダイヤモンド薄膜層１０が形成さ
れている。そして、ダイヤモンド薄膜層１０の最表面１
０ａは、フッ素化され、フッ素がダイヤモンド薄膜層１
０の炭素と共有結合した表面になっている。Second Embodiment [Structure] FIG. 3 is an enlarged vertical sectional view of the surface of a sliding member 7 of the present embodiment. The base material 8 of the sliding member 7 is made of hardened steel. On the surface (upper surface) of the base material 8,
A molybdenum thin film layer 9 having a thickness of 500 nm is formed as a base layer. Further, a diamond thin film layer 10 having a thickness of 900 nm is formed on the upper surface of the molybdenum thin film layer 9. The outermost surface 1 of the diamond thin film layer 10
0a is fluorinated and fluorine is diamond thin film layer 1
It has a surface covalently bonded to 0 carbons.
【００２７】以下に、摺動部材７の作製手順を示す。ま
ず基材８を真空室内を配置し、真空室内にＡｒガスを導
入して、イオンガンよりＡｒイオンをモリブデングリッ
ドに衝突させ、基材８の表面にモリブデン薄膜層９を被
覆した。その後、真空室内に炭化水素ガスを導入して、
同じくイオンガンより発射した炭化水素イオンに電圧を
印加して加速し、モリブデン薄膜層９の上面にダイヤモ
ンド薄膜層１０を成膜させた。次に、実施例１と同様に
して、Ｆ2 ガスを導入し、ダイヤモンド薄膜層１０の最
表面１０ａをフッ素化した。The procedure for producing the sliding member 7 will be described below. First, the substrate 8 was placed in a vacuum chamber, Ar gas was introduced into the vacuum chamber, and Ar ions were made to collide with a molybdenum grid by an ion gun to coat the surface of the substrate 8 with the molybdenum thin film layer 9. After that, introducing hydrocarbon gas into the vacuum chamber,
Similarly, a voltage was applied to the hydrocarbon ions emitted from the ion gun to accelerate them, and the diamond thin film layer 10 was formed on the upper surface of the molybdenum thin film layer 9. Next, in the same manner as in Example 1, F 2 gas was introduced to fluorinate the outermost surface 10a of the diamond thin film layer 10.
【００２８】［作用］本実施例において、基材８の焼き
入れ鋼は安価であるが、ダイヤモンド薄膜層１０の密着
性が悪い。しかし、モリブデン薄膜層９からなる下地層
を設けているので、実施例１と同様に、基材８とダイヤ
モンド薄膜層１０とは強く密着し、摺動部材７は、耐摩
耗性に優れ、高い滑り性を有する。[Operation] In this embodiment, the hardened steel of the base material 8 is inexpensive, but the adhesion of the diamond thin film layer 10 is poor. However, since the base layer made of the molybdenum thin film layer 9 is provided, the base material 8 and the diamond thin film layer 10 are firmly adhered to each other, and the sliding member 7 is excellent in abrasion resistance and high, as in the first embodiment. Has slipperiness.
【００２９】［効果］本実施例においても、実施例１と
同様の効果を奏する。特に、本実施例では、基材８の材
料に安価なものを使用しているため、よりコストの低減
を図ることができる。[Effect] In this embodiment, the same effect as that of the first embodiment can be obtained. In particular, in this embodiment, since the material of the base material 8 is inexpensive, it is possible to further reduce the cost.
【００３０】[0030]
【実施例３】 ［構成］図４に本実施例の摺動部材１１の表面を拡大し
た縦断面図を示す。この摺動部材１１の基材１２は、強
靱鋼により作製されている。基材１２の表面（上面）に
は、下地層として厚さ７００ｎｍの炭化タングステン薄
膜層１３が形成されている。また、この炭化タングステ
ン薄膜層１３の上面には、厚さ３μｍのダイヤモンド薄
膜層１４が形成されている。そして、ダイヤモンド薄膜
層１４の最表面１４ａは、フッ素化され、フッ素がダイ
ヤモンド薄膜層１４の炭素と共有結合した表面になって
いる。Third Embodiment [Structure] FIG. 4 shows an enlarged vertical sectional view of the surface of a sliding member 11 of the present embodiment. The base material 12 of the sliding member 11 is made of tough steel. On the surface (upper surface) of the base material 12, a 700-nm-thick tungsten carbide thin film layer 13 is formed as a base layer. A diamond thin film layer 14 having a thickness of 3 μm is formed on the upper surface of the tungsten carbide thin film layer 13. The outermost surface 14a of the diamond thin film layer 14 is fluorinated, and fluorine is a surface covalently bonded to carbon of the diamond thin film layer 14.
【００３１】以下に、摺動部材１１の作製手順を示す。
まず、基材１２の表面にスパッタリング法により炭化タ
ングステン薄膜層１３を成膜し、その後、プラズマＣＶ
Ｄ法を用いて、反応ガスとしてＣＨＦ3 及び水素を使用
し、この反応ガスを反応管に導入しながら、マイクロ波
により反応ガスを励起させて活性種を形成し、炭化タン
グステン薄膜層１３の上にダイヤモンド薄膜層１４を形
成した。次に、その基材１２を平行平板型イオンエッチ
ング装置内に配置し、ＣＦ4 ガスを導入してＣＦ4 ガス
雰囲気中でプラズマを発生させることによりダイヤモン
ド薄膜層１４の最表面１４ａをフッ素化した。The procedure for producing the sliding member 11 will be described below.
First, the tungsten carbide thin film layer 13 is formed on the surface of the base material 12 by the sputtering method, and then the plasma CV is performed.
CHF 3 and hydrogen are used as the reaction gas by the method D, and while introducing this reaction gas into the reaction tube, the reaction gas is excited by microwaves to form active species, and the tungsten carbide thin film layer 13 is formed. Then, the diamond thin film layer 14 was formed. Next, the base material 12 is placed in a parallel plate type ion etching apparatus, and CF 4 gas is introduced to generate plasma in a CF 4 gas atmosphere to fluorinate the outermost surface 14 a of the diamond thin film layer 14. .
【００３２】［作用］実施例１と同様に、本実施例の摺
動部材１１も優れた耐摩耗性、高い滑り性を有する。ま
た、機械的強度の高い基材１２に、高強度な炭化タング
ステン薄膜層１３を形成し、その上にダイヤモンド薄膜
層１４を施すことにより、より高強度な摺動部材１１と
なる。[Operation] Similar to the first embodiment, the sliding member 11 of this embodiment also has excellent wear resistance and high slipperiness. Further, the high-strength tungsten carbide thin film layer 13 is formed on the base material 12 having high mechanical strength, and the diamond thin film layer 14 is applied thereon, whereby the sliding member 11 having higher strength is obtained.
【００３３】［効果］実施例１と同様に効果を奏する。
また、基材１２に炭化タングステン薄膜層１３およびダ
イヤモンド薄膜層１４共に強度が高いため、負荷の大き
な部材、例えばＸ−Ｙステージのガイドレールなどに適
用できる。[Effect] The same effect as the first embodiment is obtained.
Further, since both the tungsten carbide thin film layer 13 and the diamond thin film layer 14 have high strength on the base material 12, they can be applied to a member having a large load, such as a guide rail of an XY stage.
【００３４】[0034]
【実施例４】図５に本実施例の摺動部材１５の表面を拡
大した縦断面図を示す。この摺動部材１５の基材１６
は、アルミニウムにより作製されている。基材１６の表
面（上面）には、下地層として厚さ１０μｍのニッケル
薄膜層１７が形成されている。また、このニッケル薄膜
層１７の上面には、厚さ３μｍのダイヤモンド薄膜層１
８が形成されている。そして、ダイヤモンド薄膜層１８
の最表面１８ａは、フッ素化され、フッ素がダイヤモン
ド薄膜層１８の炭素と共有結合した表面になっている。Fourth Embodiment FIG. 5 is an enlarged vertical sectional view of the surface of the sliding member 15 of this embodiment. Base material 16 of this sliding member 15
Is made of aluminum. On the surface (upper surface) of the base material 16, a nickel thin film layer 17 having a thickness of 10 μm is formed as a base layer. Further, the diamond thin film layer 1 having a thickness of 3 μm is formed on the upper surface of the nickel thin film layer 17.
8 is formed. Then, the diamond thin film layer 18
The outermost surface 18a of the above is fluorinated, and fluorine is a surface covalently bonded to carbon of the diamond thin film layer 18.
【００３５】以下に、摺動部材１５の作製手順を示す。
まず基材１６の表面に電解メッキによりニッケルメッキ
を施した。その後、実施例２と同様の方法によりダイヤ
モンド薄膜層１８を形成し、またダイヤモンド薄膜層１
８の最表面１８ａをフッ素化した。The procedure for producing the sliding member 15 will be described below.
First, the surface of the base material 16 was plated with nickel by electrolytic plating. Thereafter, the diamond thin film layer 18 is formed by the same method as in Example 2, and the diamond thin film layer 1 is formed.
The outermost surface 18a of No. 8 was fluorinated.
【００３６】［作用］本実施例においては、軽量である
が低強度なアルミニウム製の基材１６に対して、下地層
をメッキにより比較的厚く設けることによって、摺動部
材１５の強度を確保している。他の作用は上記各実施例
と同様である。[Operation] In this embodiment, the strength of the sliding member 15 is ensured by providing the base material 16 made of aluminum, which is lightweight but has low strength, with a relatively thick underlayer. ing. Other functions are the same as those in the above-mentioned respective embodiments.
【００３７】［効果］本実施例の摺動部材１５は、上記
各実施例と同様に、耐摩耗性、滑り性、耐久性に優れる
上、軽量である。[Effect] The sliding member 15 of the present embodiment is excellent in wear resistance, slipperiness, and durability, and is lightweight, as in the above-mentioned embodiments.
【００３８】なお、実施例２〜３においては、下地層の
材料として、モリブデン、炭化タングステン、ニッケル
を用いたが、本発明はかかる実施例に限定されるもので
はなく、シリコン，アルミニウム，タングステン，コバ
ルト等の金属層、、炭化珪素等の金属炭化物層、窒化珪
素，窒化タングステン，窒化チタン等の金属窒化物層、
シリカ，アルミナ，ジルコニア等の金属酸化物層等を下
地層として用いることが可能であり、また基材の基礎形
状を変化させない範囲であれば、下地層を複数層にして
もよい。In Examples 2 to 3, molybdenum, tungsten carbide, and nickel were used as the material of the underlayer, but the present invention is not limited to these Examples, and silicon, aluminum, tungsten, and A metal layer such as cobalt, a metal carbide layer such as silicon carbide, a metal nitride layer such as silicon nitride, tungsten nitride or titanium nitride,
A metal oxide layer of silica, alumina, zirconia or the like can be used as the underlayer, and a plurality of underlayers may be used as long as the basic shape of the base material is not changed.
【００３９】[0039]
【発明の効果】以上のように、請求項１〜３に係る摺動
部材によれば、優れた耐摩耗性、高い滑り性、十分な耐
久性を確保することができる。特に、請求項２、３に係
る摺動部材によれば、基材とダイヤモンド薄膜層との密
着性をより高くすることができ、たとえ基材ダイヤモン
ド薄膜層とに密着性の悪い材料を用いたとしても、下地
層を設けることにより解消することができる。As described above, according to the sliding member according to the first to third aspects, excellent wear resistance, high slipperiness, and sufficient durability can be secured. In particular, according to the sliding member according to claims 2 and 3, the adhesion between the base material and the diamond thin film layer can be further increased, and even if the material having poor adhesion is used for the base material diamond thin film layer. However, it can be solved by providing an underlayer.
【図１】本発明の摺動部材を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing a sliding member of the present invention.
【図２】実施例１の摺動部材の表面を拡大した縦断面図
である。FIG. 2 is an enlarged vertical cross-sectional view of the surface of the sliding member according to the first embodiment.
【図３】実施例２の摺動部材の表面を拡大した縦断面図
である。FIG. 3 is an enlarged vertical sectional view of a surface of a sliding member according to a second embodiment.
【図４】実施例３の摺動部材の表面を拡大した縦断面図
である。FIG. 4 is an enlarged vertical sectional view of a surface of a sliding member according to a third embodiment.
【図５】実施例４の摺動部材の表面を拡大した縦断面図
である。FIG. 5 is an enlarged vertical sectional view of a surface of a sliding member according to a fourth embodiment.
１，４，７，１１，１５ 摺動部材 ２，５，８，１２，１６ 基材 ３，６，１０，１４，１８ ダイヤモンド薄膜層 ３ａ，６ａ，１０ａ，１４ａ，１８ａ 最表層 ９ モリブデン薄膜層 １３ 炭化タングステン薄膜層 １７ ニッケル薄膜層 1, 4, 7, 11, 15 Sliding member 2, 5, 8, 12, 16 Base material 3, 6, 10, 14, 18 Diamond thin film layer 3a, 6a, 10a, 14a, 18a Outermost layer 9 Molybdenum thin film layer 13 Tungsten Carbide Thin Film Layer 17 Nickel Thin Film Layer
Claims (3)
を形成するとともに、該層の最表層に前記ダイヤモンド
薄膜の炭素と共有結合したフッ素が存在することを特徴
とする摺動部材。1. A sliding member, wherein a layer made of a diamond thin film is formed on a surface of a base material, and fluorine covalently bonded to carbon of the diamond thin film is present in the outermost surface layer of the layer.
に下地層を有することを特徴とする請求項１に記載の摺
動部材。2. The sliding member according to claim 1, further comprising an underlayer between the base material and the diamond thin film.
金属窒化物層または金属酸化物層であることを特徴とす
る請求項２に記載の摺動部材。3. The underlayer is a metal layer, a metal carbide layer,
The sliding member according to claim 2, which is a metal nitride layer or a metal oxide layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7942794A JPH07256820A (en) | 1994-03-24 | 1994-03-24 | Slide member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7942794A JPH07256820A (en) | 1994-03-24 | 1994-03-24 | Slide member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07256820A true JPH07256820A (en) | 1995-10-09 |
Family
ID=13689582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7942794A Withdrawn JPH07256820A (en) | 1994-03-24 | 1994-03-24 | Slide member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07256820A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000213533A (en) * | 1999-01-27 | 2000-08-02 | Sankyo Seiki Mfg Co Ltd | Dynamic pressure bearing device and motor using it |
| JP2001032840A (en) * | 1999-07-22 | 2001-02-06 | Koyo Seiko Co Ltd | Slide bearing |
| JP2001082480A (en) * | 1999-09-17 | 2001-03-27 | Koyo Seiko Co Ltd | Gearing |
| JP2003098305A (en) * | 2001-09-19 | 2003-04-03 | Sumitomo Metal Mining Co Ltd | Antireflection film |
| JP2003212115A (en) * | 2002-11-07 | 2003-07-30 | National Institute Of Advanced Industrial & Technology | Linear motorcar or high-speed levitated vehicle |
| JP2003239994A (en) * | 2002-02-19 | 2003-08-27 | Nsk Ltd | Rolling sliding member and rolling device |
| JP2003239973A (en) * | 2002-02-19 | 2003-08-27 | Asahi Seiko Co Ltd | Sliding member and manufacturing method therefor |
| JP2005537616A (en) * | 2002-08-29 | 2005-12-08 | インテル・コーポレーション | Highly reliable facing contact structure and its manufacturing technology |
| JP2009138946A (en) * | 2001-11-16 | 2009-06-25 | Seagate Technology Llc | Device with hydrodynamic fluid bearing having coating |
| JP2018059605A (en) * | 2016-10-07 | 2018-04-12 | 自動車部品工業株式会社 | Rubber Coupling |
-
1994
- 1994-03-24 JP JP7942794A patent/JPH07256820A/en not_active Withdrawn
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000213533A (en) * | 1999-01-27 | 2000-08-02 | Sankyo Seiki Mfg Co Ltd | Dynamic pressure bearing device and motor using it |
| JP2001032840A (en) * | 1999-07-22 | 2001-02-06 | Koyo Seiko Co Ltd | Slide bearing |
| JP2001082480A (en) * | 1999-09-17 | 2001-03-27 | Koyo Seiko Co Ltd | Gearing |
| JP2003098305A (en) * | 2001-09-19 | 2003-04-03 | Sumitomo Metal Mining Co Ltd | Antireflection film |
| JP2009138946A (en) * | 2001-11-16 | 2009-06-25 | Seagate Technology Llc | Device with hydrodynamic fluid bearing having coating |
| JP2003239994A (en) * | 2002-02-19 | 2003-08-27 | Nsk Ltd | Rolling sliding member and rolling device |
| JP2003239973A (en) * | 2002-02-19 | 2003-08-27 | Asahi Seiko Co Ltd | Sliding member and manufacturing method therefor |
| JP2005537616A (en) * | 2002-08-29 | 2005-12-08 | インテル・コーポレーション | Highly reliable facing contact structure and its manufacturing technology |
| JP2003212115A (en) * | 2002-11-07 | 2003-07-30 | National Institute Of Advanced Industrial & Technology | Linear motorcar or high-speed levitated vehicle |
| JP2018059605A (en) * | 2016-10-07 | 2018-04-12 | 自動車部品工業株式会社 | Rubber Coupling |
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