JP4558549B2 - Manufacturing method of covering member - Google Patents

Description

  The present invention relates to a covering member obtained by coating a metal base material with a hard film or the like, and relates to a method for manufacturing a covering member having excellent adhesion between the base material and the covering film.

  For the purpose of improving surface characteristics, a covering member in which a coating film having wear resistance, corrosion resistance, insulation, and the like is formed on the surface of a metal substrate is widely used. Therefore, in order to maintain the characteristics obtained by forming the coating film over a long period of time, the adhesion between the substrate and the coating film is important.

Therefore, in Patent Document 1, as a pretreatment for forming the coating film, a high-strength nitride intermediate layer is formed on the surface of the substrate, and further, by ion bombardment with a cleaning gas such as a rare gas or hydrogen gas, By forming a concavo-convex surface of about several tens of nanometers on the surface of the intermediate layer, adhesion with a coating film formed thereafter is improved. In the method of Patent Document 1, the adhesion with the coating film is insufficient only by forming the nitride intermediate layer. Therefore, an uneven surface is further formed on the surface of the nitride intermediate layer by ion bombardment.
JP-A-11-310868

  The inventors of the present invention have conceived a method for producing a covering member that can form a desired uneven surface on the surface of the intermediate layer when forming the intermediate layer made of nitride and has excellent adhesion between the substrate and the covering film. did. That is, an object of this invention is to provide the manufacturing method of the novel coating | coated member from which the coating | coated member excellent in the adhesiveness of a base material and a coating film is obtained.

The method for producing a covering member of the present invention includes a nitride intermediate layer forming step of forming a nitride intermediate layer made of nitride on a surface portion of a base material, and a coating for forming a coating film on the nitride intermediate layer A method for producing a covering member comprising a film forming step,
Before SL nitride intermediate layer forming step, the irregular surface on the surface of the nitride intermediate layer and forming the nitride intermediate layer comprising a compound of nitrogen and iron by nitriding the base material made of carbon steel and forming a even One convex portion width of the average mean height in 10~100nm the surface of the nitride intermediate layer is 10~500nm by forming more than 1μm and the nitride intermediate layer characterized Rukoto obtain the uneven surface.
During this, the nitride intermediate layer forming step is desirably a step of forming the nitride intermediate layer by plasma containing at least nitrogen.

The nitride intermediate layer forming step is preferably a step of forming the nitride intermediate layer at a temperature of the base material of 420 to 590 ° C. Further, the nitride intermediate layer forming step is preferably a step of forming the nitride intermediate layer by generating the plasma at a power density of 0.12 W / cm ² or more.

  According to the manufacturing method of the covering member of the present invention, in the nitride intermediate layer forming step, the surface portion of the substrate is nitrided by forming the nitride intermediate layer to 1 μm or more, and the adhesiveness to the coating film is high. It is possible to form a concavo-convex surface sufficient to hold

Moreover, if the temperature of the base material in the nitride intermediate layer forming step is set to 420 to 590 ° C., a high-strength nitride intermediate layer can be formed. Further, if the power density at the time of forming the nitride intermediate layer is 0.12 W / cm ² or more, the uneven surface can be satisfactorily formed, and the adhesion between the substrate and the coating film is further improved. .

The covering member manufacturing method of the present invention mainly includes a nitride intermediate layer forming step of forming a nitride intermediate layer made of nitride on a surface portion of a base material, and a coating for forming a coating film on the nitride intermediate layer. And a covering film forming step. Since the substrate used in the present invention is not particularly limited in shape, various parts such as a sliding member and a structural member and a part of the apparatus may be used. Specific examples include various clutches and brake parts used in automatic transmissions, clutch plates, synchronizer rings, and CVT torque transmission members. The base material is preferably carbon steel if it is an iron- based metal. Moreover, although the surface roughness of a base material is based also on the use of a coating | coated member, if a use is a clutch board, it is preferable that it is 2-6 micrometers Rz by 10-point average roughness.

  In the nitride intermediate layer forming step, the nitride intermediate layer is formed to have a thickness of 1 μm or more, and the surface of the nitride intermediate layer has an uneven surface having a convex portion with an average height of 10 to 100 nm and an average width of 10 to 500 nm. It is a process.

The nitride intermediate layer is formed by a so-called nitriding process. In the present invention, among various nitriding treatments, a plasma nitriding treatment for supplying nitrogen in a plasma state may be used. Glow discharge is generated by applying electric power between the two electrodes, the positive electrode and the negative electrode. In the plasma nitriding treatment, nitrogen gas or the like is introduced between the electrodes, and nitrogen atoms are activated by glow discharge to generate nitrogen plasma, and nitriding is performed by colliding nitrogen ions with the substrate. In the plasma nitriding treatment, it is desirable to nitride the surface portion of the base material by a plasma CVD method such as a direct current plasma CVD method or a high frequency plasma CVD method in which the base material is connected to the negative electrode and glow discharge is performed. In this case, the base material is preferably made of a conductive material, and specifically, the volume resistivity is preferably 10 ⁸ Ω · cm or less.

  In the plasma nitriding treatment, if plasma containing at least nitrogen is used, an uneven surface is formed together with nitriding. Nitrogen-containing gas such as nitrogen gas or ammonia may be used as nitrogen. Further, in addition to nitrogen, if one or more of hydrogen, a rare gas, and the like are used, a uniform and fine uneven surface can be easily formed. In particular, the use of a heavy rare gas such as argon is preferable because the surface of the substrate is ion-etched and an uneven surface is easily formed.

  Further, the formed nitride intermediate layer is preferably made of a nitride having at least one element belonging to Group 4 to Group 6 of the periodic table. Note that the composition of the nitride changes by adjusting the composition of the processing gas.

  In the nitride intermediate layer forming step, the nitride intermediate layer is formed with a thickness of 1 μm or more. If 1 μm or more is formed by the above-described method, a sufficient uneven surface is formed on the surface of the nitride intermediate layer. Therefore, after forming the nitride intermediate layer, there is no need to perform a step of forming an uneven surface on the surface of the intermediate layer by ion bombardment. When the thickness is less than 1 μm, the formation of the uneven surface is insufficient, and there is a portion where the convex portion is not formed on the surface of the nitride intermediate layer. Therefore, when the coating film is formed, the film is peeled off from the portion. Progress and poor adhesion. Therefore, the nitride intermediate layer is preferably formed to 1 to 15 μm, more preferably 3 to 10 μm.

  An uneven surface having an average height in the range of 10 to 100 nm and an average width in the range of 10 to 500 nm is formed on the surface of the nitride intermediate layer. The convex portion is formed in a hemispherical shape or a cone shape. Here, the height of the convex part is the distance from the bottom to the apex of the convex part of the hemispherical part when the convex part is considered hemispherical, and the width of the convex part is when the convex part is considered hemispherical The distance in the horizontal direction corresponding to the maximum diameter of the bottom of the hemispherical convex portion (the diameter when the bottom shape of the convex portion is a perfect circle, and the long axis diameter when the bottom shape of the convex portion is an ellipse).

  When the average height is in the range of 10 to 100 nm, a mechanical anchor effect is obtained, and the adhesion between the substrate and the coating film is improved. In addition, the range of a more preferable average height is 20-70 nm, and adhesiveness improves more. Moreover, if the average width is in the range of 10 to 500 nm, a suitable anchor effect is obtained, and the adhesion is improved. A more preferable average width is 30 to 400 nm, and if in this range, the adhesion is further improved. In addition, the magnitude | size of a convex part is a magnitude | size which is a grade which cannot be measured with the conventional surface roughness meter (stylus method). Therefore, the size and width of the convex portion can be measured by minute shape measurement such as SEM (scanning electron microscope) observation and AFM (atomic force microscope).

  Even if the size of the convex portion is a predetermined one, if the area of the convex portion is small, an effect on the adhesion of the film cannot be obtained. It is desirable that the area ratio of the protrusions on the uneven surface is at least 10%, preferably 30% or more, assuming that the area of the uneven surface is 100%. The mechanical anchor effect is increased and the adhesion of the film becomes high.

  The nitride intermediate layer forming step is preferably a step of forming the nitride intermediate layer by setting the temperature of the base material to 420 to 590 ° C. Here, the “temperature of the substrate” refers to the temperature of at least the surface of the substrate, as long as at least the surface of the substrate reaches the above temperature range. If the nitride intermediate layer is formed at the above temperature, a high-strength nitride intermediate layer can be formed. If the temperature of the substrate is too high, the structure of the nitride is changed, the layer thickness is reduced, and a brownite layer having a large strain is easily formed, which is not preferable. A more preferable temperature of the substrate is 475 to 550 ° C., and a high-strength nitride intermediate layer having a thickness of 1 μm or more can be satisfactorily formed.

The nitride intermediate layer forming step is preferably a step of forming a nitride intermediate layer by generating plasma at a power density of 0.12 W / cm ² or more. If the nitride intermediate layer is formed with the power density in the above range, a stable glow discharge is generated, and a uniform and fine nano-order uneven surface can be formed, and the adhesion between the substrate and the coating film Is further improved. A more desirable power density range is 0.2 W / cm ² or more, and an even higher adhesion can be obtained. From the viewpoint of discharge stability, the discharge density is preferably 0.49 W / cm ² or less.

  In addition, the processing time of the nitride intermediate layer forming step is desirably 30 to 90 minutes, and more desirably 50 to 70 minutes. If nitriding is performed within the time in the above range, a nitride intermediate layer having a uniform fine uneven surface on the surface can be formed at 1 μm or more.

  In the coating film forming step, a coating film is formed on the nitride intermediate layer. That is, as schematically shown in cross section in FIG. 1, the coating film 2 is formed on the uneven surface 11 of the nitride intermediate layer 10 formed on the surface portion of the substrate 1. The formation amount of the nitride intermediate layer is represented by “d” in FIG. 1, and “d” is 1 μm or more in the present invention.

  As a method for forming the coating film, the coating film can be formed by ion plating (arc, holocathode method, etc.), sputtering, vacuum deposition, plasma CVD, or the like. Since the formed coating film has a fine uneven surface on the surface of the intermediate layer, it firmly adheres to the substrate. In particular, if the coating film is formed by the plasma CVD method, the nitride intermediate layer forming step and the coating film forming step can be performed in the same apparatus, so that the work process is simplified and the uneven surface This is desirable because it can suppress contamination. Further, if the direct-current plasma CVD method is used, the film is formed along the surface shape of the concavo-convex surface, so that it is suitable for a member that requires a certain degree of surface roughness such as a clutch plate.

  The coating film covers at least a part of the surface of the substrate, adds functions such as corrosion resistance, abrasion resistance, and decorativeness to the surface, and is made of a film having a composition different from that of the intermediate layer. Specifically, the metal film for forming the coating film is chromium, nickel, tungsten or the like, and the ceramic film is a carbide film made of elements of groups IV to VI of the periodic table or a composite element containing one of them. An oxide film, a boride film, a nitride film, and the like, and examples of the carbon-based film include DLC (diamond-like carbon) and diamond. The coating film can be a combination of a plurality of types of the above films.

  The thickness of the coating film is preferably 0.5 μm to 20 μm, although it depends on the type of film and the function to be added, and can sufficiently exhibit the function of the coating film. A thickness of 20 μm or more is not desirable because the internal stress of the film increases and the coating film is easily peeled off.

  When the coating film is a hard film, the coating member can be used as a sliding member that requires wear resistance. In particular, if the hard film is a DLC film, in addition to high wear resistance, the opponent attack is low, so it is suitable as a sliding member. For example, as mechanical parts with sliding, clutch parts and brake parts used in automatic transmissions, engine parts (pistons, piston rings, valve stems, shim plates, etc.), compressor parts (vanes, shoes, etc.), injection pumps ( (Rotor, plunger, needle, etc.).

  When the covering member of the present invention is a member that transmits torque such as a clutch plate by friction, when the covering film is peeled off, the torque transmission property is changed due to the change in surface properties. If the clutch sliding member of the present invention is a clutch plate used for an electromagnetic clutch, the pressing force of the clutch plate changes when the hard film is peeled off during use. The electromagnetic clutch transmits or discontinues torque by frictionally engaging / disengaging the clutch plate and the mating member with magnetic force. At this time, if peeling of the coating film occurs, the strength of the magnetic flux passing through the electromagnetic clutch increases. As a result, the force for frictionally engaging the clutch plate and the mating member also increases, so that the transmitted torque value increases. In particular, when the coating film is a non-magnetic DLC film, the magnetic resistance changes when the film is peeled off, which greatly affects the torque value. If the electromagnetic clutch has a coating film with excellent adhesion, the stability of the torque value can be maintained over a long period of time.

  Moreover, if the base material is a clutch plate used in a wet clutch used in oil, excellent μ-v characteristics are exhibited. The μ-v characteristic indicates the dependence of the coefficient of friction (μ) on the speed (v). In the clutch sliding member, the μ-v characteristic is a positive gradient (that is, dμ / dv ≧ 0). Is effective. However, if the coating film of the clutch sliding member peels off during use, the effect of cutting the oil film generated on the sliding surface due to wear of the convex portions on the substrate surface is reduced, and the oil film formed on the sliding surface Solid contact is inhibited and the μ-v characteristic has a negative slope. In the case of the covering member obtained by the production method of the present invention, the peeling of the covering film is reduced, so that the uneven surface cuts the oil film well to obtain an appropriate solid contact and exhibits excellent μ-v characteristics. To do.

  Below, the Example of the manufacturing method of the coating | coated member of this invention is described using drawing with a comparative example. First, a plasma CVD apparatus used for plasma nitriding and film formation of a DLC film will be described with reference to FIG.

[Plasma CVD equipment]
This apparatus is an apparatus for forming a DLC film on the nitrided surface after subjecting the front and back surfaces and outer peripheral surface of the base material 5 made of carbon tool steel to plasma nitriding. The film forming furnace uses a stainless steel chamber 41 having a cylindrical furnace chamber, and the chamber 41 has an exhaust system 43 communicating with the chamber 41 through an exhaust passage 42. The exhaust system 43 includes an oil rotary pump, a mechanical booster pump, and an oil diffusion pump, and adjusts a processing pressure in the chamber 41 by opening and closing an exhaust adjustment valve 45 disposed in the exhaust passage 42. The chamber 41 is provided with a translucent window 48 protruding from the side surface to the outside of the furnace, and the surface temperature of the substrate 5 is measured by an infrared radiation thermometer (not shown) through the translucent window 48.

  In the chamber 41, a base material fixing means 50 and a gas supply means 60 that are energized to the negative pole of a plasma power source (DC power source) 46 are disposed.

  The base material fixing means 50 includes a support base 54 connected to the negative pole of the plasma power source 46 and five base material fixtures 53 placed on the support base 54. The base material 5 is fixed to. The substrate 5 is an iron clutch plate having a ring-shaped disk having a thickness of 0.9 mm and having inner teeth on the inner peripheral surface thereof.

  The plate-like support base 54 has a disk shape and is fixed to the bottom of the furnace chamber coaxially with the chamber 41. The five base material fixtures 53 are made of carbon steel, and are arranged in a ring shape at equal intervals on the support base 54 so as to be coaxial with the cylindrical chamber 41.

  In addition, the base material fixture 53 is fixed on a cylindrical fixing column (not shown) that is supported on the support base 54 and extends vertically and a plurality of base materials 5 that are stacked at equal intervals in parallel and in the thickness direction. And a plurality of jigs (not shown). When fixing the base material 5 to the base material fixture 53, the internal teeth of the base material 5 are clamped and fixed between two jigs. Thus, 100 (total 500) base materials 5 were fixed to one base material fixing tool 53.

  The gas supply means 60 supplies the mixed gas to the chamber 41 at a specified flow rate ratio. The mixed gas is supplied into the chamber 41 through the gas supply valve 64 and the gas supply pipe 65 after the flow rate is adjusted by the mass flow controller (MFC) 63. The gas supply pipe 65 branches into a central gas nozzle 61 and six surrounding gas nozzles 62 in the chamber 41. The gas nozzle 61 is installed so as to be located at the center of the chamber 41. Further, the six gas nozzles 62 are arranged in a ring shape at equal intervals on the centrifugal direction side of the work fixture 53 arranged in a ring shape. The gas nozzle 61 has a plurality of holes formed at the tip thereof, and the mixed gas is ejected. In addition, the gas nozzle 62 has a plurality of holes at equal intervals in the length direction, and a mixed gas is supplied therefrom.

  The positive electrode of the plasma power supply 46 is energized to the chamber 41. The positive electrode is grounded, and the inner surface of the chamber 41 serves as a ground electrode (anode 40). That is, plasma nitriding and film formation of a DLC film are performed by plasma CVD using the substrate fixing means 50 and the substrate 5 held thereon as the cathode 50 and the chamber 41 as the anode 40.

[Plasma nitriding]
First, plasma nitriding treatment was performed on the surface of the substrate 5. The exhaust system 43 evacuated the chamber 41 to a vacuum degree of 6.7 × 10 ⁻³ Pa. Next, the gas supply valve 64 was opened and the flow rates of hydrogen gas and nitrogen gas were adjusted by the MFC 63 and supplied into the chamber 41. Thereafter, the opening degree of the exhaust adjustment valve 45 was adjusted, and the processing gas pressure in the chamber 41 was set to 133 Pa.

  Then, a voltage of 80 V was applied to the cathode 50 by the plasma power source 46. When voltage was applied, glow discharge was generated around the cathode 50, discharge power was adjusted (335V, 30A), and the substrate 5 was heated to 550 ° C. by this glow discharge. In addition, said infrared radiation thermometer was used for the measurement of the temperature of a base material. A nitride intermediate layer (hereinafter abbreviated as “intermediate layer”) was formed on the surface portion of the base material 5 by discharging (processing time) for 60 minutes after the base material 5 reached 550 ° C. The flow rate of the mixed gas was set to nitrogen gas: 500 cc / min and hydrogen gas: 500 cc / min at a temperature of 25 ° C.

[DLC film formation]
Subsequently, a DLC film was formed on the surface of the substrate 5 on which the intermediate layer was formed. Specifically, the gas supply valve 64 was opened, and the flow rate of hydrogen gas (dilution gas) was adjusted by the MFC 63 and supplied into the chamber 41. Thereafter, the opening degree of the exhaust adjustment valve 45 was adjusted, and the processing gas pressure in the chamber 41 was set to 466 Pa.

  Then, a voltage of 390 V was applied to the cathode 50 by the plasma power source 46. When voltage was applied, glow discharge was generated around the cathode 50, the discharge power was adjusted (390V, 30A), and the substrate 5 was heated to 530 ° C. by this glow discharge. In addition, said infrared radiation thermometer was used for the measurement of the temperature of a base material. When the base material 5 reached 530 ° C., source gases methane and TMS were supplied at a predetermined flow rate, and an amorphous carbon film was grown on the surface of the base material 5. The flow rate of the mixed gas was methane: 500 cc / min, TMS: 100 cc / min, hydrogen gas: 300 cc / min, and argon gas: 300 cc / min at a temperature of 25 ° C. In this way, a DLC film having a thickness of 3 μm was formed on the surface of the substrate 5 by discharging for 50 minutes, and a sample H was obtained.

  Samples A to G and I to Y were prepared in the same manner as the sample H except that the processing conditions of the plasma nitriding treatment were changed. For comparison, a sample Z having an intermediate layer thickness of less than 1 μm was prepared. The processing conditions for each sample are shown in Tables 1 to 3.

  The intermediate layer thickness was measured by cross-sectional observation using a scanning electron microscope (FE-SEM). The adhesion force is determined by a peel load measured by a scratch test method (based on JIS R3255). For sample Z, no scratch test was performed because film peeling occurred after DLC film formation. The results are summarized in the graphs of FIGS.

  FIG. 2 is a graph showing the adhesion of the DLC films of Samples A to J. Reference signs A to J in the graph correspond to samples A to J. The adhesion strength improved as the thickness of the intermediate layer increased. It can be seen that when the intermediate layer thickness is 1 μm or more, a covering member having a good adhesion of 4 N or more can be obtained.

  Moreover, FIG. 3 is a graph which shows the thickness of the intermediate | middle layer with respect to process temperature about sample KT. The symbols K to T in the graph correspond to the samples K to T. The higher the processing temperature, the greater the thickness of the intermediate layer. From the tendency of the graph, it can be seen that if the treatment temperature is 420 ° C. or higher, an intermediate layer of 1 μm or more is formed. In Sample S and Sample T at a processing temperature of 600 ° C., the thickness of the intermediate layer was about 5 μm, but a brownite layer having a large strain was formed.

  FIG. 4 is a graph showing the adhesion of the DLC film to the power density for samples U to Y. The symbols U to Y in the graph correspond to the samples U to Y. The higher the power density, the greater the adhesion of the DLC film. That is, the higher the power density, the better the uneven surface was formed on the surface of the intermediate layer.

  Furthermore, surface observation by FE-SEM was performed on sample K and sample Z (comparative example). FIG. 5 is an SEM image of sample K and FIG. 6 is an SEM image of sample Z, both of which were observed before the DLC film was formed. 5 is a cross-sectional view schematically showing the surface shape of the sample K. In the sample K in which the intermediate layer is 3 μm, the uneven surface 51 having the convex portions 52 having an average height of 10 to 100 nm and an average width of 10 to 500 nm is formed on the entire surface of the substrate 5. I was able to observe. In each of the samples A to J and L to Y, similarly to the sample K, the concavo-convex surface having convex portions having an average height of 10 to 100 nm and an average width of 10 to 500 nm on the entire surface of the substrate. Formed. On the other hand, in Sample Z in which the intermediate layer was formed to have a thickness of 0.5 μm, a portion where the uneven surface was not sufficiently formed (the dark portion on the right side in FIG. 6) was observed.

  Further, a durability test was performed on the sample Q and the sample Z, and the μ-v characteristics before and after the durability were evaluated. Here, a continuous slip durability test is performed between two clutch plates at a load energy of 780 W and a temperature of 85 ° C. for 35 hours, and the μ-v characteristics before and after the durability test are increased by the differential rotational speed ΔN. And when ΔN is lowered. The results are shown in FIGS. 8 and 10 show the results of surface analysis by EPMA (electron beam microanalyzer) before and after endurance (initial state) of sample Q and sample Z. FIG. In FIGS. 8 and 10, the black portion is the portion where the DLC film is peeled off.

  According to FIG. 7, in the sample Q having an intermediate layer of 1 μm or more, dμ / dv had a positive gradient even after endurance and had good μ-v characteristics. Further, as can be seen from FIG. 8, almost no peeling of the DLC film was observed in the initial state before the durability test, and the peeling of the DLC film was suppressed even on the surface after the durability test.

  On the other hand, according to FIG. 9, in the sample Z whose intermediate layer is less than 1 μm, dμ / dv after endurance had a negative gradient. Further, a shudder (self-excited vibration; see the boxed portion in FIG. 9) that was not seen in the sample Q occurred. According to EPMA, the DLC film was already peeled off in the initial state before the durability test, and most of the DLC film was peeled off on the surface after the durability test. That is, when the intermediate layer was less than 1 μm, the adhesion of the DLC film was low, and after the endurance, most of the DLC film was peeled off, and the projections on the concavo-convex surface were worn and smoothed.

It is sectional drawing which shows typically an example of the coating | coated member manufactured by the manufacturing method of the coating | coated member of this invention. It is a graph which shows the adhesive force of the base material with respect to the thickness of a nitride intermediate | middle layer, and a coating film regarding the sample AJ of an Example. It is a graph which shows the thickness of the nitride intermediate | middle layer with respect to the process time of a plasma nitriding process regarding the samples KT of an Example. It is a graph which shows the adhesive force of the base material with respect to the power density at the time of a plasma nitriding process, and the coating film regarding the sample UY of an Example. It is the SEM image which observed the nitride intermediate | middle layer surface of the sample K before coating film formation. It is the SEM image which observed the nitride intermediate | middle layer surface of the sample Z before coating film formation. It is a graph which shows the μ-v characteristic of the sample Q before and after durability. The result of the surface analysis by EPMA of the sample Q before and after durability is shown. It is a graph which shows the μ-v characteristic of the sample Z before and after durability. The result of the surface analysis by EPMA of the sample Z before and after durability is shown. It is a schematic explanatory drawing of the apparatus used for the manufacturing method of the coating | coated member of an Example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1,5: Base material 10: Nitride intermediate | middle layer 11, 51: Uneven surface 52: Convex part 2: Coating film

Claims (10)

A nitride intermediate layer forming step of forming a nitride intermediate layer made of nitride on the surface portion of the substrate, a coating film forming step of forming a coating film on the nitride intermediate layer, and a covering member comprising: A manufacturing method comprising:
The nitride intermediate layer forming step forms the nitride intermediate layer containing a compound of nitrogen and iron by nitriding the base material made of carbon steel , and has an uneven surface on the surface of the nitride intermediate layer. and forming, One also a convex portion which is the width of the average mean height to the surface of the nitride intermediate layer is in 10~100nm by forming more than 1μm and the nitride intermediate layer is 10~500nm the method of manufacturing a covering member, characterized in Rukoto give an uneven surface. The method for manufacturing a covering member according to claim 1, wherein the nitride intermediate layer forming step is a step of forming the nitride intermediate layer and the concavo-convex surface by a plasma containing at least nitrogen. The method for manufacturing a covering member according to claim 2, wherein the nitride intermediate layer forming step is a step of forming the nitride intermediate layer and the uneven surface by a plasma CVD method. The covering member according to any one of claims 1 to 3, wherein the nitride intermediate layer forming step is a step of forming the nitride intermediate layer and the uneven surface by setting the temperature of the base material to 420 to 590 ° C. Production method. The nitride intermediate layer forming step, in any one of claims 2-4 to generate the plasma at 0.12 W / cm ² power density of greater than a step of forming the nitride intermediate layer and the uneven surface The manufacturing method of the covering member of description. The method for manufacturing a covering member according to claim 2, wherein the nitride intermediate layer forming step is a step performed by a plasma CVD method using a mixed gas of nitrogen gas and hydrogen gas . The coating film, method of manufacturing a covering member according to any one of claims 1 to 6 that will be formed by a plasma CVD method. The said base material is a clutch board, The manufacturing method of the coating | coated member in any one of Claims 1-7 . The said covering film is a hard film | membrane, The manufacturing method of the covering member in any one of Claims 1-8 . The method for manufacturing a covering member according to any one of claims 1 to 9 , wherein the hard film is an amorphous carbon film.

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